CN104678469A - Graded-index material distributed bragg reflector (DBR) and manufacturing method thereof - Google Patents
Graded-index material distributed bragg reflector (DBR) and manufacturing method thereof Download PDFInfo
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- CN104678469A CN104678469A CN201510117057.4A CN201510117057A CN104678469A CN 104678469 A CN104678469 A CN 104678469A CN 201510117057 A CN201510117057 A CN 201510117057A CN 104678469 A CN104678469 A CN 104678469A
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- bragg reflector
- distributed bragg
- refractive index
- graded
- reflector mirror
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0883—Mirrors with a refractive index gradient
Abstract
The invention provides a graded-index material distributed bragg reflector (DBR) and a manufacturing method thereof. The method comprises the following steps: 1) providing a substrate, and preparing a transition layer on the surface of the substrate, wherein the refractive index of the lower surface of the transition layer is in match with that of the substrate, and the transition layer has the consistent, stepped or gradient reflective rate distribution; 2) preparing the DBR through high reflective rate material layers and low reflective rate material layers by alternating and repeating on the surface of the transition layer, wherein the high reflective rate material layers and/ or the low reflective rate material layers are the graded-index material layer; the DBR can be formed by overlapping one or more sets. According to the method, the graded-index materials are prepared by the grazing incidence angle coating process and used for forming the DBR structure; the DBR structure has less cycle, is high in performance, and can be effectively integrated with different substrates, so that the production cost can be obviously reduced, the light outgoing efficiency of a device can be increased, and application of the DBR is promoted.
Description
Technical field
The present invention relates to material and prepare manufacture field, particularly relate to a kind of graded index materials distributed bragg reflector mirror and manufacture method thereof.
Background technology
Distributed bragg reflector mirror (Distributed Bragg Reflector, DBR) is a kind of application optical device/structure very widely.Be mainly used in photoelectric device, such as semiconductor laser, light emitting diode (LED), the fields such as flat pannel display.General optics DBR is repeatedly alternately made up of a kind of low-refraction and a kind of high index of refraction, one deck low-index material and one deck high-index material composition one-period.It can be realized by multiple coating films technique, and technique is relatively simple.The performance of DBR is mainly manifested in high reflectance or the high-transmission rate of the wavelength band selected by it.Its high-transmission rate or high reflectance depend on the design of dbr structure, the refractive index difference of bi-material and periodicity.Typically, bi-material refractive index difference is larger, periodicity is more, then the transmissivity of DBR is lower or reflectivity is higher.Traditional DBR generally adopts two media material.In the dielectric material that we are familiar with, high-index material, as TiO
2, its refractive index ~ 2.6 in visible-range.Low-index material, as SiO
2, its refractive index ~ 1.4 in visible-range.Difference so is between the two 1.2.If low-index material can close to 1, difficult refractive index difference just has 1.6, greatly can improve the performance of DBR like this, reduces periodicity and process costs.
We, by the improvement to technique for vacuum coating, develop graded index materials.By changing the immanent structure of material, adjusting its effective refractive index, thus realizing its minimum effective refractive index close to 1.By adopting novel graded index materials, greatly can improve the performance of DBR, reducing costs.
Summary of the invention
The shortcoming of prior art in view of the above, the object of the present invention is to provide a kind of graded index materials distributed bragg reflector mirror and manufacture method thereof, refractive index for solving high and low refractive index material in prior art is unadjustable, and the cycle causes the problem that the plated film time is long, cost is high more.
For achieving the above object and other relevant objects, the invention provides a kind of manufacture method of graded index materials distributed bragg reflector mirror, described manufacture method at least comprises step:
1) provide substrate, prepare transition bed at described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate;
2) prepare by high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer on described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described substrate is light-emitting diode chip for backlight unit or glass.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described transition bed is made up of traditional optical materials and/or graded index materials.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described transition bed is individual layer, bilayer, multilayer.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, the refractive index of described transition bed is different with position, in equal or ladder distribution everywhere or graded profile.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, the thickness range of described transition bed is 10 ~ 1000nm.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, adopt grazing angle coating process or prepare described graded index materials by chemical corrosion, described graded index materials is porous or nanometer columnar material, is regulated the effective refractive index of described graded index materials by the volume ratio changing material and space.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, the refractive index of described high refractive index material layer is greater than 2, and the refractive index of described low-index material is less than 1.5.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described distributed bragg reflector mirror is at least 1 cover, and in every suit distributed bragg reflector mirror, high refractive index material layer and low refractive index material layer replace 3 ~ 60 cycles of repetition.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, the thickness in monolayer scope of described high refractive index material layer and low refractive index material layer is 20 ~ 800nm.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described graded index materials layer is dielectric material or conductive material.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, described dielectric material is selected from TiO
2, SiO
2, Ta
2o
3or Si
3n
4in one or both combination, described conductive material is selected from one or both the combination in the zinc paste of ITO, FTO or doping.
As the scheme of a kind of optimization of the manufacture method of graded index materials distributed bragg reflector mirror of the present invention, the light of described distributed bragg reflector mirror to 450 ~ 480nm wave band has high permeability, has high reflectance to the light of 500 ~ 600nm wave band.
The present invention also provides a kind of graded index materials distributed bragg reflector mirror, and described graded index materials distributed bragg reflector mirror at least comprises:
Substrate;
Transition bed, is incorporated into described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate;
By high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer, be incorporated into described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.
As the scheme of a kind of optimization of graded index materials distributed bragg reflector mirror of the present invention, the surface of described distributed bragg reflector mirror is provided with fluorescence coating.
As the scheme of a kind of optimization of graded index materials distributed bragg reflector mirror of the present invention, between described distributed bragg reflector mirror and fluorescence coating, be also provided with encapsulated layer.
As mentioned above, graded index materials distributed bragg reflector mirror of the present invention and manufacture method thereof, comprise step: 1) provide substrate, prepare transition bed at described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate; 2) prepare by high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer on described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.The present invention adopts grazing angle coating process to prepare graded index materials, and adopts this material to form dbr structure, and this DBR cycle is few, performance is high, simultaneously can with different base effective integration, remarkable reduction production cost, improves the light extraction efficiency of device, promotes the application of DBR.
Accompanying drawing explanation
The Structure and Process schematic diagram that Fig. 1 ~ 2 are graded index materials distributed bragg reflector mirror of the present invention.
Fig. 3 is the reflectance curve of graded index materials distributed bragg reflector mirror of the present invention.
Fig. 4 is the luminous spectrum of white light LEDs of the present invention.
Element numbers explanation
101 substrates
102 transition beds
103 low-index materials
104 high-index materials
Embodiment
Below by way of specific instantiation, embodiments of the present invention are described, those skilled in the art the content disclosed by this instructions can understand other advantages of the present invention and effect easily.The present invention can also be implemented or be applied by embodiments different in addition, and the every details in this instructions also can based on different viewpoints and application, carries out various modification or change not deviating under spirit of the present invention.
Refer to accompanying drawing.It should be noted that, the diagram provided in the present embodiment only illustrates basic conception of the present invention in a schematic way, then only the assembly relevant with the present invention is shown in graphic but not component count, shape and size when implementing according to reality is drawn, it is actual when implementing, and the kenel of each assembly, quantity and ratio can be a kind of change arbitrarily, and its assembly layout kenel also may be more complicated.
The invention provides a kind of manufacture method of graded index materials distributed bragg reflector mirror, described manufacture method at least comprises the following steps:
First step 1 is performed), as shown in Figure 1, provide substrate 101, prepare transition bed 102 on described substrate 101 surface, the described refractive index of transition bed 102 lower surface and the index matching of described substrate 101.
Described substrate 101 can be LED chip or glass, and certainly, described substrate 101 also can be other suitable transparent or opaque materials.In the present embodiment, described substrate 101 is GaN blue-light LED chip, and its refractive index in visible-range is 2.4 ~ 2.6.
According to the optical property of substrate 101, select suitable transition bed 102 material, the refractive index of the refractive index of transition bed 102 and substrate 101 is matched.Particularly, require the described refractive index of transition bed 102 lower surface and the index matching of described substrate 101, light farthest can be coupled out from substrate 101 like this, guarantee the characteristic from substrate 101 light out with the low reflection of high transmission.
Exemplarily, described transition bed 102 is made up of traditional optical materials and/or graded index materials, and described transition bed 102 can be individual layer, bilayer or multilayer, and the refractive index of transition bed is with longitudinally highly different, can be equal everywhere, also can distribute or graded profile in ladder.It should be noted that, traditional optical materials adopts technique for vacuum coating to prepare, and have fixing refractive index, material structure is comparatively fine and close, such as, and SiO
2, TiO
2deng.In the present embodiment, adopt traditional material and graded index materials to be combined into double layer material and form transition bed 102, as shown in Figure 1, such as traditional material can be TiO
2, refractive index is 2.6; Graded index materials can be SiO
2, can 1.08 be accomplished by its refractive index of coating process is minimum.Certainly, in other embodiments, transition bed 102 also can be made up of traditional optical materials or graded index materials separately, does not limit at this.The transition bed 102 formed containing graded index materials adopts grazing angle coating process to prepare, and grazing angle coating process comprises the physical vapor coating process such as electron beam plated film, thermal evaporation, magnetron sputtering, pulse laser plated film.
Exemplarily, the thickness range of described transition bed 102 can control within the scope of 10 ~ 1000nm.In the present embodiment, the thickness of described transition bed 102 elects 100nm as temporarily.In other embodiments, the thickness of described transition bed 102 also can be 200nm, 250nm, 300nm, 500nm or 700nm etc.
Then step 2 is performed), in described transition bed 102 surface preparation by high refractive index material layer 104 and the alternately repeated distributed bragg reflector mirror of low refractive index material layer 103, wherein, described high refractive index material layer 104 and/or low refractive index material layer 103 are graded index materials layer.
The distributed bragg reflector mirror of design, require that it optically can mate with transition bed 102, substrate 101 and encapsulating material, guarantee light to be farthest coupled out from substrate 101 on the one hand, realize integrally-built transmissivity maximum, distributed bragg reflector mirror also must take into account the optical characteristics of fluorescence luminescent material simultaneously, reduce the probability that fluorescence is absorbed by substrate 101, realize the maximum reflection of fluorescence.
Described distributed bragg reflector mirror is at least 1 cover, and be mutually alternately made up of one deck high refractive index material layer 104 and one deck low refractive index material layer 103 in every suit, alternately repeated periodicity is from 3 ~ 60.The thickness in monolayer of high refractive index material layer 104 and low refractive index material layer 103 can within the scope of 20 ~ 800nm.
Described high refractive index material layer 104 and low refractive index material layer 103 can be graded index materials entirely, also can only high refractive index material layer 104 adopt graded index materials or independent low refractive index material layer 103 to be graded material layer.In the present embodiment, high refractive index material layer 104 adopts ordinary optical materials, and low refractive index material layer 103 adopts graded index materials.
Further, described graded index materials can be dielectric material also can be conductive material, if conduction material material, then corresponding graded index layer has electric conductivity.Described dielectric material can be selected from TiO
2, SiO
2, Ta
2o
3or Si
3n
4in one or both combination, certainly, also can be other suitable dielectric materials.Described conductive material can be selected from one or both the combination in the zinc paste of ITO, FTO or doping, also can be other suitable conductive materials, not limit at this.
Described high refractive index material layer 104 and low-index material 103 can be commaterial, also can be different materials.If commaterial, then by changing the technological parameter in coating process, changing the effective refractive index of material, realizing the difference of high and low refractive index value.Usually, the refractive index of described high-index material 104 is greater than 2, and the refractive index of low refractive index material layer 103 is less than 1.5.
In the present embodiment, high refractive index material layer 104 and low-index material 103 are different materials, first adopt traditional technique for vacuum coating to prepare high-index material TiO
2, then adopt grazing angle coating process or chemical etching technology to prepare low refractive index material layer SiO
2, so repeat, obtain distributed bragg reflector mirror.Grazing angle deposition plating technique adopts the method changing material source incident angle, is plated to the different porous of voidage or nanometer columnar material, thus control filming parameter, and then control the effective refractive index of graded index materials.
Particularly, in the present embodiment, the technique of electron beam evaporation deposition is adopted to prepare low refractive index material layer SiO
2, incident source material is pure SiO
2, the incident direction in incident source and the normal of substrate are arranged to 85 °, and process chamber pressure is set to 2 × 10
-6holder, sedimentation velocity is set to 0.5nm/s, and the thickness of the low refractive index material layer that deposition obtains is 150nm, and voidage is about 80.5%, and in this material, refractive index is equal everywhere, is 1.08.
After preparing alternately repeated distributed bragg reflector mirror, directly can also place phosphor powder layer on described distributed bragg reflector mirror surface, or on encapsulated layer, place phosphor powder layer by containing after the LED of distributed bragg reflector mirror again, realize the maximum light emission rate of total.
Be illustrated in figure 3 the reflectance curve of distributed bragg reflector mirror provided by the invention, can find out, the blue light of this distributed bragg reflector mirror to 450 ~ 480nm wavelength is utilized to have high-transmission rate, but to the gold-tinted of 500 ~ 600nm wavelength, there is high reflectivity, largely can reduce the absorption of LED chip to gold-tinted like this, thus improve the light emission rate of gold-tinted and the colour temperature of whole LED.
Be the luminous spectrum of white light LEDs as shown in Figure 4, can find out, the blue light that LED chip produces mainly concentrates in 450nm to 460nm scope, and the gold-tinted that blue-light excited fluorescent powder produces mainly concentrates between 500nm to 600nm.Composition graphs 3, this dbr structure known enhances the light emission rate of gold-tinted, can improve the probability being combined into white light of blue light and gold-tinted, better meet white color purity requirement.
The present invention also provides a kind of graded index materials distributed bragg reflector mirror manufactured by said method, and as shown in Figure 2, described catoptron at least comprises following structure:
Substrate 101;
Transition bed 102, is incorporated into described substrate 101 surface, the described refractive index of transition bed 02 lower surface and the index matching of described substrate 101;
By high refractive index material layer 104 and the alternately repeated distributed bragg reflector mirror of low refractive index material layer 103, be incorporated into described transition bed 102 surface, wherein, described high refractive index material layer 104 and/or low refractive index material layer 103 are graded index materials layer.
Exemplarily, directly can place phosphor powder layer (diagram) on described distributed bragg reflector mirror surface, encapsulate total more afterwards; In addition, also first can place phosphor powder layer again on encapsulated layer by containing after the LED of distributed bragg reflector mirror, that is, encapsulated layer (diagram) is between catoptron and phosphor powder layer.By catoptron by being designed to different cycles, different-thickness to mate the difference of phosphor powder layer position, to reach the highest light emission rate.
In sum, the invention provides a kind of graded index materials distributed bragg reflector mirror and manufacture method thereof, comprise step: 1) provide substrate, prepare transition bed at described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate; 2) prepare by high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer on described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.The present invention adopts grazing angle coating process to prepare graded index materials, and adopts this material to form dbr structure, and this DBR cycle is few, performance is high, simultaneously can with different base effective integration, remarkable reduction production cost, improves the light extraction efficiency of device, promotes the application of DBR.
So the present invention effectively overcomes various shortcoming of the prior art and tool high industrial utilization.
Above-described embodiment is illustrative principle of the present invention and effect thereof only, but not for limiting the present invention.Any person skilled in the art scholar all without prejudice under spirit of the present invention and category, can modify above-described embodiment or changes.Therefore, such as have in art usually know the knowledgeable do not depart from complete under disclosed spirit and technological thought all equivalence modify or change, must be contained by claim of the present invention.
Claims (16)
1. a manufacture method for graded index materials distributed bragg reflector mirror, is characterized in that, described manufacture method at least comprises:
1) provide substrate, prepare transition bed at described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate;
2) prepare by high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer on described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.
2. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: described substrate is light-emitting diode chip for backlight unit or glass.
3. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: described transition bed is made up of traditional optical materials and/or graded index materials.
4. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: described transition bed is individual layer, bilayer or multilayer.
5. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: the refractive index of described transition bed is different with position, in equal or ladder distribution everywhere or graded profile.
6. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: the thickness range of described transition bed is 10 ~ 1000nm.
7. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, it is characterized in that: adopt grazing angle coating process or prepare described graded index materials by chemical corrosion, described graded index materials is porous or nanometer columnar material, is regulated the effective refractive index of described graded index materials by the volume ratio changing material and space.
8. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, it is characterized in that: the refractive index of described high refractive index material layer is greater than 2, the refractive index of described low-index material is less than 1.5.
9. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, it is characterized in that: described distributed bragg reflector mirror is at least 1 cover, in every suit distributed bragg reflector mirror, high refractive index material layer and low refractive index material layer replace 3 ~ 60 cycles of repetition.
10. the manufacture method of graded index materials distributed bragg reflector mirror according to claim 1, is characterized in that: the thickness in monolayer scope of described high refractive index material layer and low refractive index material layer is 20 ~ 800nm.
The manufacture method of 11. graded index materials distributed bragg reflector mirrors according to claim 1, is characterized in that: described graded index materials layer is dielectric material or conductive material.
The manufacture method of 12. graded index materials distributed bragg reflector mirrors according to claim 11, is characterized in that: described dielectric material is selected from TiO
2, SiO
2, Ta
2o
3or Si
3n
4in one or both combination, described conductive material is selected from one or both the combination in the zinc paste of ITO, FTO or doping.
The manufacture method of 13. graded index materials distributed bragg reflector mirrors according to claim 1, it is characterized in that: the light of described distributed bragg reflector mirror to 450 ~ 480nm wave band has high permeability, has high reflectance to the light of 500 ~ 600nm wave band.
14. utilize the graded index materials distributed bragg reflector mirror that manufacture method manufactures as described in any one of claim 1 ~ 13, and it is characterized in that, described graded index materials distributed bragg reflector mirror at least comprises:
Substrate;
Transition bed, is incorporated into described substrate surface, the refractive index of described transition bed lower surface and the index matching of described substrate;
By high refractive index material layer and the alternately repeated distributed bragg reflector mirror of low refractive index material layer, be incorporated into described transition bed surface, wherein, described high refractive index material layer and/or low refractive index material layer are graded index materials layer.
15. graded index materials distributed bragg reflector mirrors according to claim 14, is characterized in that: the surface of described distributed bragg reflector mirror is provided with phosphor powder layer.
16. graded index materials distributed bragg reflector mirrors according to claim 15, is characterized in that: between described distributed bragg reflector mirror and phosphor powder layer, be also provided with encapsulated layer.
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106025035A (en) * | 2016-07-08 | 2016-10-12 | 太原理工大学 | Multi-layer plate heterostructure for improving the luminous efficiency of white LED |
| CN108987518A (en) * | 2017-06-05 | 2018-12-11 | 杭州朗旭新材料科技有限公司 | A kind of flexibility condenser mirror |
| CN109283601A (en) * | 2017-07-17 | 2019-01-29 | 张家港康得新光电材料有限公司 | Gradually changed refractive index laminated film and preparation method thereof |
| CN110398798A (en) * | 2018-04-24 | 2019-11-01 | 帕洛阿尔托研究中心公司 | The insensitive multi-wavelength of angle |
| CN110998872A (en) * | 2019-03-01 | 2020-04-10 | 厦门市三安光电科技有限公司 | Light emitting diode and manufacturing method thereof |
| CN114552382A (en) * | 2022-02-18 | 2022-05-27 | 北京京东方技术开发有限公司 | Reflective film structure and preparation method thereof |
| CN115039238A (en) * | 2019-10-10 | 2022-09-09 | 太阳密度公司 | Optical coating for spectral conversion |
| US11515508B2 (en) * | 2019-12-04 | 2022-11-29 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Display panel and manufacturing method thereof |
| CN115039238B (en) * | 2019-10-10 | 2024-04-26 | 太阳密度公司 | Optical coating for spectral conversion |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100013902A1 (en) * | 2008-07-17 | 2010-01-21 | Samsung Electronics Co., Ltd | Print head and image forming apparatus employing the same |
| CN102142501A (en) * | 2010-01-28 | 2011-08-03 | 海洋王照明科技股份有限公司 | LED encapsulation structure |
| CN103730601A (en) * | 2013-12-26 | 2014-04-16 | 京东方科技集团股份有限公司 | Bragg reflection reflector distribution structure, preparation method thereof and organic light-emitting diode structure |
-
2015
- 2015-03-17 CN CN201510117057.4A patent/CN104678469B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100013902A1 (en) * | 2008-07-17 | 2010-01-21 | Samsung Electronics Co., Ltd | Print head and image forming apparatus employing the same |
| CN102142501A (en) * | 2010-01-28 | 2011-08-03 | 海洋王照明科技股份有限公司 | LED encapsulation structure |
| CN103730601A (en) * | 2013-12-26 | 2014-04-16 | 京东方科技集团股份有限公司 | Bragg reflection reflector distribution structure, preparation method thereof and organic light-emitting diode structure |
Non-Patent Citations (2)
| Title |
|---|
| J.- Q.XI等: "Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection", 《NATURE PHOTONICS》 * |
| 侯仕东: "GaN基发光二极管光取出分析与模拟", 《中国优秀硕士学位论文全文数据库信息科技辑》 * |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106025035A (en) * | 2016-07-08 | 2016-10-12 | 太原理工大学 | Multi-layer plate heterostructure for improving the luminous efficiency of white LED |
| CN108987518A (en) * | 2017-06-05 | 2018-12-11 | 杭州朗旭新材料科技有限公司 | A kind of flexibility condenser mirror |
| CN109283601A (en) * | 2017-07-17 | 2019-01-29 | 张家港康得新光电材料有限公司 | Gradually changed refractive index laminated film and preparation method thereof |
| CN110398798A (en) * | 2018-04-24 | 2019-11-01 | 帕洛阿尔托研究中心公司 | The insensitive multi-wavelength of angle |
| CN110398798B (en) * | 2018-04-24 | 2022-09-20 | 帕洛阿尔托研究中心公司 | Optical filter and manufacturing method thereof |
| CN110998872A (en) * | 2019-03-01 | 2020-04-10 | 厦门市三安光电科技有限公司 | Light emitting diode and manufacturing method thereof |
| US11862752B2 (en) | 2019-03-01 | 2024-01-02 | Quanzhou San'an Semiconductor Technology Co., Ltd. | Light-emitting diode and method for manufacturing the same |
| CN115039238A (en) * | 2019-10-10 | 2022-09-09 | 太阳密度公司 | Optical coating for spectral conversion |
| CN115039238B (en) * | 2019-10-10 | 2024-04-26 | 太阳密度公司 | Optical coating for spectral conversion |
| US11515508B2 (en) * | 2019-12-04 | 2022-11-29 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Display panel and manufacturing method thereof |
| CN114552382A (en) * | 2022-02-18 | 2022-05-27 | 北京京东方技术开发有限公司 | Reflective film structure and preparation method thereof |
| CN114552382B (en) * | 2022-02-18 | 2023-08-29 | 北京京东方技术开发有限公司 | Reflective film structure and preparation method thereof |
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