CN108977791A - A kind of electric heating device for winding deposition film under high temperature - Google Patents
A kind of electric heating device for winding deposition film under high temperature Download PDFInfo
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- CN108977791A CN108977791A CN201810817978.5A CN201810817978A CN108977791A CN 108977791 A CN108977791 A CN 108977791A CN 201810817978 A CN201810817978 A CN 201810817978A CN 108977791 A CN108977791 A CN 108977791A
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- base band
- metal base
- electrode
- film
- metal
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Abstract
The present invention relates to the fields of depositing thin film at high temperature preparation, and in particular to a kind of for winding the electric heating device of deposition film under high temperature.The present invention has redesigned electrode wheel disc group；Metal base band is placed on the insulating drum of electrode wheel disc across each between of electrode bar, and is well contacted with each pair of electrode bar；Deformation occurs in the case that insulating drum makes metal base band not clamped stress by electrode bar the supporting role of metal base band, ensure that the later period application of its product；Bearing makes without relative friction between metal base band and insulating drum, in order to avoid damage metal base band surface；Insulating drum is directly fitted with metal base band and is contacted, and is rolled with the movement of metal base band, and the process continuously wound is completed.The present invention is suitable for the heating of various metal substrates, and heating rate is high, and uniformity of temperature profile, and efficiency is high, while can realize the continuous winding preparation of plural layers.
Description
Technical field
The present invention relates to the fields of depositing thin film at high temperature preparation, especially different in width metal base band or two-sided preparation
There is the winding of film in the metal substrate of buffer layer to prepare, can be used for evaporating, sputter, pulse laser deposition, metallorganic
Learn a variety of thin film preparation processes such as vapor deposition.More particularly to a kind of for winding the electrified regulation dress of deposition film under high temperature
It sets.
Background technique
In field of film preparation, no matter which kind of technology is used, in order to realize the controllable growth of film, it is thin to reach regulation
The purpose of film component, structure and performance, it usually needs to the silicon of film deposition.In order to simplify the structure of equipment, accordingly
Heating device should also carry out necessary optimization and improvement.Since film growth requires underlayer temperature stringent, development
The film deposition hot device for the features such as warming and cooling rate is fast out, homogeneous heating is stable, reliability is reproducible is especially important.
Preparing heating method used by film mainly at present has Resistant heating, electromagnetic induction heating and light heating.
Resistant heating is by being passed through high current into the biggish heating wire of resistance, by the heat of generation to needing to heat
Substrate transmitting, reach required temperature.Substrate temperature can be come by adjusting the size for being passed through heater strip electric current
Control, and the design of different heating device also can greatly influence to need to be passed through the size of electric current.Using the side of Resistant heating
Formula the advantage is that principle is simple, require base substrate low.Its disadvantage is mainly energy consumption height, and maintenance difficult, design is cumbersome,
Warming and cooling rate is slow.
Electromagnetic induction heating, or referred to as induction heating are a kind of methods for adding thermal conductor material.It is to utilize electromagnetism sense
It answers principle that material-to-be-heated inside is made to generate electric current, heating is achieved the purpose that by the energy that vortex generates.Induction heating with
Traditional heating mode, which is compared, has many advantages: heating temperature is high, and heating speed is fast, and heating efficiency is high, and energy consumption is relatively low.
And disadvantage is that its direct-fired substrate must be conductive material, regular shape, resistivity is evenly distributed, and can generate skin effect
It answers, and used high frequency alternating electromagnetic field can have an impact the equipment of surrounding, while not be suitable for relatively thin metal base band
Heating.
Light heating is that the glass of the light beam permeation high temperature resistant generated using fluorescent tube heats substrate material.Its advantage exists
In can be rapidly by silicon to the temperature needed, the thermal efficiency be higher.But with the deposition of film, on transparent glass
The unstable of heating temperature can be caused because of the attachment of thin-film material, affect the quality for preparing film.
For the metal substrate of long ribbon shape, the distribution of the shape and heater strip to heater is had to using Resistant heating
Carrying out design well just can guarantee that the uniformity of temperature profile along sheet metal strip length and width direction, entire development process are ratios
More complex.Using the long band substrate of induction heating metal, it is necessary to which frequency is very high could to reduce energy consumption.And in high frequency, vacuum
The coupling for being easy to generate high-frequency electric field in cavity has excited plasma, is unfavorable for the accurate control of temperature.
There are also the modes of another energization self-heating, and heated current is gradually directed to by current dividing circuit
Inside sheet metal strip, achieve the purpose that heating using the Joule heat that sheet metal strip self-resistance generates, structure is simple and energy
It imitates higher.Currently, existing related patents (CN201610881886.4) by a similar method heats metal substrate.
But due to heating electrode bullet when the heating electrode in such method is larger to width and the metal base band of thinner thickness heats
The effect of pressure will cause base band deformation occurs or distortion between piece and base band, so as to cause electrode and base band poor contact
Sparking, to can not use in the later period, then just affecting the continuous preparation of long band.
Summary of the invention
For above-mentioned there are problem or deficiency, when preparing film to solve energization self-heating metal base band, width it is larger and
The metal base band of thinner thickness can deformation occurs or distortion, strikes sparks so as to cause electrode and base band poor contact, thus nothing
The problem of method later period uses.The present invention provides a kind of for winding the electric heating device of deposition film under high temperature.
This is for winding the electric heating device of deposition film under high temperature by the positive and negative electrode wheel that is mounted in vacuum cavity
Disk, film crystallizing field, external power supply and two winders are constituted.Metal base band is drawn from a winder to an electrode wheel
Disk is towed to another electrode wheel disc after film crystallizing field plated film, collects finally by another winder, external electricity
The heated current of source offer electrode wheel disc.
The electrode wheel disc includes electrode group, fixed disk, insulating drum and bearing.The principle of the heating method is: heating
Electric current is gradually imported into inside metal base band from the edge of base band two sides by electrode group, and in the gold being located in film crystallizing field
Belong to and being flowed in base band, temperature needed for reaching film growth because of the Joule heat that base band self-resistance generates, while passing through another phase
Isostructural electrode group outflow, forms a complete current path.
Electrode group is made of metal clips, electrode bar (such as Ag-W alloy electrode stick) and shunt resistance.
Fixed disk is insulating materials for installing entire electrode group, bearing and insulating drum.Bearing is for meeting Metal Substrate
The requirement of tape wrapping plated film, and make without relative friction between metal base band and insulating drum, in order to avoid damage metal base band surface.Absolutely
Edge roller is directly fitted with metal base band to be contacted, and is rolled with the movement of metal base band, and the process continuously wound is completed.
Electrode group is made of metal clips that is ipsilateral equidistant and being symmetrically arranged on fixed disk two sides；The upper end is fixed with electricity
Pole stick, each pair of electrode bar realizes electrical connection each other, and accesses external circuit.Metal base band is placed on insulating drum across each right
Between electrode bar；The width of metal base band is adapted and well contacts with each pair of electrode bar, two sides with the width size of idler wheel
Edge forms good contact with electrode bar because mutual pressure acts on.
The electrode bar, as electrode material, is to have highly conductive and dystectic characteristic because of it using Ag-W alloy,
Oxidation resistance is strong, and plays the role of inhibiting electric arc, greatly reduces the generation for the spark phenomenon that discharges between base band and electrode.
Due to being opposite sliding between metal base band and each pair of electrode bar, so the pass of metal base band electrified regulation mode
Key is how to guarantee that base band and electrode still have good electrical contact in the state of opposite sliding, then just needing metal clips
It is had a strong effect between base band border.But when the metal base band of use is wider relatively thin, metal clips and base band two sides
Power between edge will cause the torsional deformation of base band, so as to cause the phenomenon that side is burnt in bad generation sparking is contacted.Therefore, it will be equipped with
The metal clips of electrode bar is integrated on idler wheel, and base band can be obtained by good support, ensure that it is good with electrode bar
Electrical contact and deformation occurs, while also ensuring vertical with electrode bar holding always in base band moving process, improve broadband
The reliability and stability of winding film plating.
The present invention has redesigned electrode wheel disc group；Metal base band is placed on the insulating drum of electrode wheel disc across each to electricity
Between the stick of pole, and well contacted with each pair of electrode bar；Insulating drum makes metal base band will not be by the supporting role of metal base band
Deformation occurs in the case where electrode bar clamping stress, ensure that the later period application of its product；Bearing rolls metal base band and insulation
Without relative friction between cylinder, in order to avoid damage metal base band surface；Insulating drum is directly fitted with metal base band and is contacted, with metal
The movement of base band and roll, complete the process that continuously winds.The present invention is suitable for the heating of various metal substrates, and heating rate
Height, and uniformity of temperature profile, efficiency is high, while can realize the continuous winding preparation of plural layers.
In conclusion the present invention be suitable for different in width thickness metal base band or it is two-sided thereon be prepared with it is (conductive or absolutely
Edge) heating of the metal substrate of buffer layer.And heating rate is high, uniformity of temperature profile, and efficiency is high, while can realize multilayer
It is prepared by the continuous winding of film.These advantages are particularly important for the preparation of industrialization of film, and prepared film can be improved
Quality, while reducing the preparation cost of film.
Detailed description of the invention
Fig. 1 is electrode wheel disc schematic perspective view of the invention.
Fig. 2 is the forward sight direction schematic diagram of electrode wheel disc of the invention.
Fig. 3 is the equivalent circuit diagram of electrode wheel disc current dividing circuit.
Fig. 4 is to be prepared for Gd in embodiment strip metal base band0.5Y0.5Ba2Cu3O7-x(GdYBCO) XRD of film
2Theta scanning curve.
The ω scanning and φ scanning curve that Fig. 5 is the XRD of GdYBCO film in embodiment strip metal base band.
Appended drawing reference: 1- fixed disk, 2- bearing, 3- ceramic roller, 4- metal clips fixing bolt nut, 5- metal elastic
Piece, 6- electrode bar, 7- current sharing resistors.
Specific embodiment
The present invention is described in further detail with reference to the accompanying drawings and examples.
Electrode wheel disc shown in FIG. 1 is applied to the preparation of GdYBCO high-temperature superconducting thin film.
Metal base band is drawn from a winder to an electrode wheel disc, through film crystallizing field, then is drawn to another electricity
Pole wheel disc is collected finally by another winder, and external power supply provides the heated current of electrode wheel disc.
Insulating drum uses ceramic roller, and electrode bar uses Ag-W alloy.
Firstly, the Hastelloy alloy base band (LaMnO that buffer layer thin film will have been prepared3/homo-epi MgO/
IBAD-MgO/SDP-Y2O3/ Hastelloy) electrode wheel disc is passed through, realize good electrical contact, and base band is connected to two volumes
On drum, external power supply is connected, and the reaction chamber of MOCVD system is evacuated to 1Pa or less.
Then, Gd (tmhd) is weighed3、Y(tmhd)3、Ba(tmhd)2With Cu (tmhd)2(thmd:2,2,6,6- tetramethyls-
3,5- heptadione), it is completely dissolved in it in tetrahydrofuran solvent, forms uniformly clear metal organic source presoma.Adjustment
Current source is passed through heated current to metal substrate, and metal substrate is drawn to crystallizing field.Using peristaltic pump by metal organic source
Presoma is pumped into 300 DEG C of vaporization chamber and flashes to metal organic source steam, then under the drive of Ar gas with O2And N2O gas
Mixing is ejected into reaction on metal base band by spray head in film crystallizing field after 320 DEG C of gas pipeline and generates GdYBCO
Film.The metal base band that final deposition is completed is collected by another winder through another electrode wheel disc.
Taking-up GdYBCO sample, which is placed in, is connected with O2Tube furnace in, anneal 30 minutes at 500 DEG C, finally to film into
Row characterization.To the structural characterization for preparing film:
Fig. 4 is to be prepared for Gd on strip metal substrate0.5Y0.5Ba2Cu3O7-x(GdYBCO) the 2Theta scanning of the XRD of film
Curve.It can be seen that the diffraction peak intensity in the face film (00l) is stronger, and very sharp, without miscellaneous peak, show GdYBCO crystal grain
It is grown along pure c-axis direction, and crystalline quality is fine.
The ω scanning and φ scanning curve that Fig. 5 is the XRD of GdYBCO film in embodiment strip metal base band.By bent in figure
Line fitting it is found that value of a half width is respectively 1.6 ° and 2.9 ° in its face outside and face, show that the pellicular front is outer and face in be orientated very well.
In conclusion using being taken in the crystalline quality of GdYBCO film prepared by heating device of the invention and face outside
Tropism is good.This base band electrified regulation mode effectively overcomes the deficiency of original heating system, and principle, structure are simple, lifting
Warm speed is fast, and efficiency is high, easily extends, can be adapted for the heating of the metal base band of different in width and thickness, improve reliability,
The continuous-stable winding preparation of single or double YBCO long band may be implemented in the heating method.
Claims (3)
1. a kind of for winding the electric heating device of deposition film under high temperature, it is characterised in that:
Including positive and negative electrode wheel disc, film crystallizing field, external power supply and two winders being mounted in vacuum cavity；Metal Substrate
Band is drawn from a winder to an electrode wheel disc, after film crystallizing field plated film, is towed to another electrode wheel disc, most
It is collected afterwards by another winder, external power supply provides the heated current of electrode wheel disc；
The electrode wheel disc is made of electrode group, fixed disk, insulating drum and bearing；Heated current is by electrode group gradually from base
Edge with two sides is imported into inside metal base band, and is flowed on the metal base band being located in film crystallizing field, certainly because of base band
Temperature needed for the Joule heat that body resistance generates reaches film growth, while being flowed out by another mutually isostructural electrode group, shape
At a complete current path；
Electrode group is made of metal clips, electrode bar and shunt resistance；
Fixed disk is insulating materials for installing entire electrode group, bearing and insulating drum；
Bearing is used to meet the requirement of metal base band winding film plating, and makes between metal base band and insulating drum without relative friction,
In order to avoid damage metal base band surface；
Insulating drum is directly fitted with metal base band and is contacted, and is rolled with the movement of metal base band, and the mistake continuously wound is completed
Journey；
Electrode group is made of metal clips that is ipsilateral equidistant and being symmetrically arranged on fixed disk two sides；The upper end is fixed with electrode
Stick, each pair of electrode bar realizes electrical connection each other, and accesses external circuit；
Metal base band is placed on insulating drum across each between of electrode bar；The width of metal base band and the width size of idler wheel are mutually fitted
Each pair of electrode bar of Ying Bingyu well contacts, and both sides of the edge form good contact with electrode bar because mutual pressure acts on.
2. as described in claim 1 for winding the electric heating device of deposition film under high temperature, it is characterised in that: the electrode
Stick is using Ag-W alloy as electrode material.
3. as described in claim 1 for winding the electric heating device of deposition film under high temperature, it is characterised in that: the insulation
Roller is ceramic roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810817978.5A CN108977791B (en) | 2018-07-24 | 2018-07-24 | A ohmic heating device for coiling deposit film under high temperature |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810817978.5A CN108977791B (en) | 2018-07-24 | 2018-07-24 | A ohmic heating device for coiling deposit film under high temperature |
Publications (2)
| Publication Number | Publication Date |
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| CN108977791A true CN108977791A (en) | 2018-12-11 |
| CN108977791B CN108977791B (en) | 2020-03-27 |
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| CN201810817978.5A Active CN108977791B (en) | 2018-07-24 | 2018-07-24 | A ohmic heating device for coiling deposit film under high temperature |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090127102A1 (en) * | 2007-11-15 | 2009-05-21 | Korea Institute Of Science And Technology | Plasma deposition apparatus and method |
| CN103276366A (en) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | Box-type heater suitable for preparation process of roll-to-roll continuous strips |
| CN104046963A (en) * | 2014-06-08 | 2014-09-17 | 电子科技大学 | Thin film sedimentation preparation device and method |
| CN106521457A (en) * | 2016-10-10 | 2017-03-22 | 电子科技大学 | Heating device for high-temperature thin film deposition |
| CN206279263U (en) * | 2016-12-30 | 2017-06-27 | 浙江尚越新能源开发有限公司 | A kind of volume to volume magnetic-controlled sputtering coating equipment of substrate infrared heating |
| CN108220888A (en) * | 2017-12-27 | 2018-06-29 | 上海超导科技股份有限公司 | Heating unit and its pulse laser coating apparatus suitable for pulse laser plated film |
-
2018
- 2018-07-24 CN CN201810817978.5A patent/CN108977791B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090127102A1 (en) * | 2007-11-15 | 2009-05-21 | Korea Institute Of Science And Technology | Plasma deposition apparatus and method |
| CN103276366A (en) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | Box-type heater suitable for preparation process of roll-to-roll continuous strips |
| CN104046963A (en) * | 2014-06-08 | 2014-09-17 | 电子科技大学 | Thin film sedimentation preparation device and method |
| CN106521457A (en) * | 2016-10-10 | 2017-03-22 | 电子科技大学 | Heating device for high-temperature thin film deposition |
| CN206279263U (en) * | 2016-12-30 | 2017-06-27 | 浙江尚越新能源开发有限公司 | A kind of volume to volume magnetic-controlled sputtering coating equipment of substrate infrared heating |
| CN108220888A (en) * | 2017-12-27 | 2018-06-29 | 上海超导科技股份有限公司 | Heating unit and its pulse laser coating apparatus suitable for pulse laser plated film |
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