CN108976901A - High water oxygen rejection rate quantum dot ink and preparation method thereof - Google Patents
High water oxygen rejection rate quantum dot ink and preparation method thereof Download PDFInfo
- Publication number
- CN108976901A CN108976901A CN201810690947.8A CN201810690947A CN108976901A CN 108976901 A CN108976901 A CN 108976901A CN 201810690947 A CN201810690947 A CN 201810690947A CN 108976901 A CN108976901 A CN 108976901A
- Authority
- CN
- China
- Prior art keywords
- quantum dot
- high water
- rejection rate
- water oxygen
- dot ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
This application provides a kind of high water oxygen rejection rate quantum dot ink and preparation method thereof.The high water oxygen rejection rate quantum dot ink includes the raw material components of following portions by weight: 0.4~0.7 part of red light quantum point material, 1.3~1.6 parts of green light quantum point material, 82~92 parts of UV performed polymer, 4~10 parts of UV monomer, 0.5~2.5 part of coupling agent, 0.5~2.5 part of light diffusing agent and 0.5~2.5 part of levelling agent.The preparation method of the high water oxygen rejection rate quantum dot ink includes: to weigh above-mentioned raw materials component；UV performed polymer and UV monomer are mixed, stirred 10~60 minutes with 1000~2000 revs/min of speed, mixture is formed；Red light quantum point material is added in above-mentioned mixture；Green quanta point material is added in above-mentioned mixture；Coupling agent, light diffusing agent and levelling agent are added separately in above-mentioned mixture, finished product is formed.High water oxygen rejection rate quantum dot ink in the embodiment of the present application, stability is strong, has strong water resistance and oxidation resistance.
Description
Technical field
This application involves quantum dot light emitting technical fields, and in particular to a kind of high water oxygen rejection rate quantum dot ink and its system
Preparation Method.
Background technique
Quanta point material refers to partial size in the semiconductor grain of 1-20nm.Since the partial size of quanta point material is smaller, it is less than
Or the Exciton Bohr Radius close to corresponding body material, quantum confined effect is generated, the continuous band structure of bulk material can turn
Become discrete level structure, under the excitation of external light source, transition occurs for electrons, emits fluorescence.Quanta point material is this
Special discrete energy level structure keeps its half-wave money relatively narrow, thus the monochromatic light of capable of emitting higher degree, compared to traditional monitor
With higher luminous efficiency.
In recent years, technology of quantum dots is employed for improving the colour gamut of liquid crystal display, using in light guide plate side coated weight
The mode of son point film carrys out the blue light of sorption enhanced blue-ray LED lamp bar sending, and quantum dot film includes quantum dot ink, but due to amount
Son point ink is poor using water oxygen obstructing capacity after UV glue curing, can not protect well quanta point material, therefore
It needs to increase water oxygen barrier film to protect quanta point material, leads to the higher cost of quantum dot film.
Therefore, to overcome the problems, such as that existing product exists, provide a kind of quantum dot ink with high water oxygen rejection rate at
For technical problem urgently to be resolved.
Summary of the invention
The main purpose of the application is to provide a kind of high water oxygen rejection rate quantum dot ink and preparation method thereof, to solve
The poor technical problem of quantum dot ink water oxygen obstructing capacity in the prior art.
To achieve the goals above, according to the one aspect of the application, a kind of high water oxygen rejection rate quantum dot oil is provided
Ink.
The high water oxygen rejection rate quantum dot ink includes the raw material components of following portions by weight: 0.4~0.7 part of feux rouges amount
Son point material, 1.3~1.6 parts of green light quantum point material, 82~92 parts of UV performed polymer, 4~10 parts of UV monomer, 0.5~
2.5 parts of coupling agent, 0.5~2.5 part of light diffusing agent and 0.5~2.5 part of levelling agent.
Further, including the raw material components of following portions by weight: 0.5 part of red light quantum point material, 1.5 parts of green light
Quanta point material, 90 parts of UV performed polymer, 6 parts of UV monomer, 1 part of coupling agent, 1 part of light diffusing agent and 1 part of levelling agent.
Further, including the raw material components of following portions by weight: 0.6 part of red light quantum point material, 1.4 parts of green light
Quanta point material, 84 parts of UV performed polymer, 8 parts of UV monomer, 2 parts of coupling agent, 2 parts of light diffusing agent and 2 parts of levelling agent.
Further, the UV performed polymer is acrylate prepolymer body, polyurethane acrylate prepolymer and propylene oxide
At least one of acid esters performed polymer.
Further, the UV monomer is at least one of acrylate monomer and modified acroleic acid ester monomer.
Further, the modified acroleic acid ester monomer includes neopentylglycol diacrylate, three acrylic acid of pentaerythrite
Ester or trimethylolpropane trimethacrylate.
Further, the coupling agent is silane coupling agent, titanate coupling agent, aluminate coupling agent or rare earth coupling
Agent.
Further, the light diffusing agent is silica, titanium dioxide, polymethyl methacrylate, polystyrene, gathers
Carbonic ester or organosilicon.
Further, the levelling agent is dimethyl silicone polymer, alkyl-modified organosiloxane, organic silicon modified by polyether
Oxygen alkane or polyester modified organic siloxane.
To achieve the goals above, according to the another aspect of the application, a kind of high water oxygen rejection rate quantum dot oil is provided
The preparation method of ink.
The preparation method of the high water oxygen rejection rate quantum dot ink the following steps are included:
Step 1, the raw material components of above-mentioned high water oxygen rejection rate quantum dot ink are weighed；
Step 2, UV performed polymer and UV monomer are mixed, are stirred 10~60 minutes with 1000~2000 revs/min of speed,
Form mixture；
Step 3, red light quantum point material is added in the mixture formed in step 2, with 1000~2000 revs/min
Speed stir 10~60 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1000~2000 revs/min
Speed stir 10~60 minutes；
Step 5, coupling agent, light diffusing agent and levelling agent are added separately in the mixture formed in step 4, with 1000
~2000 revs/min of speed stirs 10~60 minutes, forms finished product.
In the embodiment of the present application, the high water oxygen rejection rate quantum being prepared using the raw material components of above-mentioned parts by weight
Point ink, stability is strong, has strong water resistance and oxidation resistance, to realize quantum dot ink with high water oxygen rejection rate
Technical effect, and then solve the technical problem that quantum dot ink water oxygen obstructing capacity is poor in the prior art.
Specific embodiment
It, below will be to the skill in the embodiment of the present application in order to make those skilled in the art more fully understand application scheme
Art scheme is clearly and completely described, it is clear that and described embodiment is only the embodiment of the application a part, without
It is whole embodiments.Based on the embodiment in the application, those of ordinary skill in the art are not before making creative work
Every other embodiment obtained is put, shall fall within the protection scope of the present application.
It should be noted that term " includes " in the description and claims of this application and " having " and they
Any deformation, it is intended that cover it is non-exclusive include, for example, containing the process, method of a series of steps or units, being
System, product or equipment those of are not necessarily limited to be clearly listed step or unit, but may include be not clearly listed or
For the intrinsic other step or units of these process, methods, product or equipment.
It should be noted that in the absence of conflict, the features in the embodiments and the embodiments of the present application can phase
Mutually combination.
This application discloses a kind of high water oxygen rejection rate quantum dot ink, under which includes
State the raw material components of parts by weight: 0.4~0.7 part of red light quantum point material, 1.3~1.6 parts of green light quantum point material, 82
~92 parts of UV performed polymer, 4~10 parts of UV monomer, 0.5~2.5 part of coupling agent, 0.5~2.5 part of light diffusing agent and 0.5
~2.5 parts of levelling agent.
Preferably, UV performed polymer is that acrylate prepolymer body, polyurethane acrylate prepolymer and epoxy acrylate are pre-
At least one of aggressiveness, it can be understood as UV performed polymer is acrylate prepolymer body, polyurethane acrylate prepolymer or ring
Oxypropylene acid esters performed polymer, or acrylate prepolymer body, polyurethane acrylate prepolymer and epoxy acrylate are pre-
Any mixture between aggressiveness three, can select according to actual needs.
Urethane acrylate is a kind of reactive prepolymer, is solidified using ultraviolet light (UV), UV solidifies poly- ammonia
Ester acrylate prepolymer body has flexibility, wearability, adhesive force strong, ageing resistance and high-tear strength and weatherability and excellent
Many-sided overall merit such as optical property, the use of polyurethane acrylate prepolymer improves the water resistance of quantum dot ink
And oxidation resistance.
UV monomer (reactive diluent) be influence ink rheology performance principal element, UV monomer play wetting pigment,
Dilution and the viscosity effect for adjusting ink, while decide the curing and drying and filming performance of ink.
Preferably, UV monomer is at least one of acrylate monomer and modified acroleic acid ester monomer, it can be understood as
UV monomer can be acrylate monomer or modified acroleic acid ester monomer, or acrylate monomer and modification acrylate
The mixture of monomer.Modified acroleic acid ester monomer includes neopentylglycol diacrylate (NPGDA), pentaerythritol triacrylate
(PETA) or trimethylolpropane trimethacrylate (TMPTA) etc. it, is not especially limited.
Coupling agent generally consists of two parts: a part is close inorganic group, can be made with inorganic filler or reinforcing material
With；Another part is organic-philic group, can be acted on synthetic resin.Coupling agent applies the leaching that can be improved bonding force in ink
Lubricant nature.
Preferably, coupling agent is silane coupling agent, titanate coupling agent, aluminate coupling agent or rare-earth coupling agent, coupling
Agent can be any one in silane coupling agent, titanate coupling agent, aluminate coupling agent or rare-earth coupling agent, can be according to reality
The selection of border demand.
Light diffusing agent is using high molecular polymerization technology, by be crosslinked, the microballoon class production of the means exploitation such as grafted functional group
Product.Light diffusing agent can be added in the transparent resins such as PC, PVC, PS, PMMA, PET, epoxy resin, increase light scattering and thoroughly
It penetrates, when can cover light emitting source, and entire resin can be made to issue softer, beautiful, graceful light, it is opaque to reach light transmission
Comfortable effect.
Preferably, light diffusing agent is silica, titanium dioxide, polymethyl methacrylate, polystyrene, polycarbonate
Or organosilicon, light diffusing agent can for silica, titanium dioxide, polymethyl methacrylate, polystyrene, polycarbonate or
Any one in organosilicon.
Levelling agent is a kind of common coating additive, it can promote coating formed during the drying and film forming process one it is smooth,
Smooth, uniform film.It can be effectively reduced and cover with paint, lacquer, colour wash, etc. liquid surface tension, improve a substance of its levelability and uniformity.It can change
The kind permeability for covering with paint, lacquer, colour wash, etc. liquid, increases spreadability at a possibility that generating spot and spot when can be reduced brushing, make film forming uniformly, from
So.
Preferably, levelling agent be dimethyl silicone polymer, alkyl-modified organosiloxane, organic silicon modified by polyether oxygen alkane or
Polyester modified organic siloxane, levelling agent can be dimethyl silicone polymer, alkyl-modified organosiloxane, polyether-modified organic
Any one in siloxanes or polyester modified organic siloxane.
Part is carried out to the embodiment of high water oxygen rejection rate quantum dot ink described herein below to enumerate:
Embodiment 1:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 1
0.4 part of red light quantum point material, 1.6 parts of green light quantum point material, 87.5 parts of acrylate prepolymer body, 9
The acrylate, 0.5 part of titanate coupling agent, 0.5 part of silica and 0.5 part of alkyl-modified organosiloxane of part.
In embodiment 1 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-described embodiment 1 are weighed；
Step 2, it by acrylate prepolymer body and crylic acid ester mixture, is stirred 10 minutes with 2000 revs/min of speed, shape
At mixture；
Step 3, red light quantum point material is added in the mixture formed in step 2, with 1500 revs/min of speed
Stirring 20 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1500 revs/min of speed
Stirring 20 minutes；
Step 5, titanate coupling agent, silica and alkyl-modified organosiloxane are added separately to shape in step 4
At mixture in, stirred 60 minutes with 1000 revs/min of speed, form finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 1, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 1
Every rate quantum dot ink.
(2) the quantum dot ink of high water oxygen rejection rate is evenly distributed on by the way of Slot-die coating poly- to benzene two
On formic acid second diester, quantum dot layer is formed.It is a kind of high-precision coating method that slit extrusion pressing type, which is coated with (Slot-die coating),
High water oxygen rejection rate quantum dot ink is sent to nozzle by feeding pipe by memory, and makes high water oxygen rejection rate quantum dot
Ink is sprayed by nozzle, to be transferred on the substrate of coating.The range of Slot-die coating is freely adjustable, will not generate
Spot phenomenon has the advantages that precision is high, effect is good.
(3) side opposite with polyethylene terephthalate on quantum dot layer covers polyethylene terephthalate,
Then UV irradiation carried out to two layers of polyethylene terephthalate and quantum dot layer, after high water oxygen rejection rate quantum dot ink solidification
Form finished product.
Embodiment 2:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 2
0.5 part of red light quantum point material, 1.5 parts of green light quantum point material, 92 parts of polyurethane acrylate prepolymer are poly-
Body, 4 parts of neopentylglycol diacrylate, 1 part of aluminate coupling agent, 0.5 part of polymethyl methacrylate and 0.5 part
Organic silicon modified by polyether oxygen alkane.
In embodiment 2 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-described embodiment 2 are weighed；
Step 2, polyurethane acrylate prepolymer and neopentylglycol diacrylate are mixed, with 2000 revs/min
Speed stirs 20 minutes, forms mixture；
Step 3, red light quantum point material is added in the mixture that step 2 is formed, is stirred with 2000 revs/min of speed
It mixes 10 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 2000 revs/min of speed
Stirring 10 minutes；
Step 5, aluminate coupling agent, polymethyl methacrylate and organic silicon modified by polyether oxygen alkane are added separately to walk
It in the mixture formed in rapid 4, is stirred 60 minutes with 1000 revs/min of speed, forms finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 2, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 2
Every rate quantum dot ink.
(2) high water oxygen rejection rate quantum dot ink is evenly distributed on poly terephthalic acid second by the way of intaglio printing
On diester, quantum dot layer is formed.
(3) side opposite with polyethylene terephthalate on quantum dot layer covers polyimides, then to poly- pair
Polyethylene terephthalate, quantum dot layer and polyimides carry out UV irradiation, are formed after high water oxygen rejection rate quantum dot ink solidification
Finished product.
Embodiment 3:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 3
0.5 part of red light quantum point material, 1.5 parts of green light quantum point material, 90 parts of epoxy FRP pipe,
6 parts of trimethylolpropane trimethacrylate, 1 part of rare-earth coupling agent, 1 part of polymethyl methacrylate and poly- the two of 1 part
Methylsiloxane.
In embodiment 3 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-described embodiment 3 are weighed；
Step 2, epoxy FRP pipe and trimethylolpropane trimethacrylate are mixed, with 1000 revs/min
Speed stir 60 minutes, formed mixture；
Step 3, red light quantum point material is added in the mixture that step 2 is formed, is stirred with 1500 revs/min of speed
It mixes 30 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1500 revs/min of speed
Stirring 20 minutes；
Step 5, rare-earth coupling agent, polymethyl methacrylate and dimethyl silicone polymer are added separately in step 4
It in the mixture of formation, is stirred 10 minutes with 2000 revs/min of speed, forms finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 3, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 3
Every rate quantum dot ink.
(2) high water oxygen rejection rate quantum dot ink is evenly distributed on polycarbonate by the way of intaglio printing, shape
At quantum dot layer.
(3) side opposite with polycarbonate on quantum dot layer covers polyimides, then to polycarbonate, quantum dot
Layer and polyimides carry out UV irradiation, form finished product after high water oxygen rejection rate quantum dot ink solidification.
Embodiment 4:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 4
0.6 part of red light quantum point material, 1.4 parts of green light quantum point material, 84 parts of polyurethane acrylate prepolymer are poly-
Body and epoxy FRP pipe, 8 parts of pentaerythritol triacrylate and trimethylolpropane trimethacrylate, 2 parts
Aluminate coupling agent, 2 parts of silica and 2 parts of dimethyl silicone polymer.
In embodiment 4 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-described embodiment 4 are weighed；
Step 2, by polyurethane acrylate prepolymer, epoxy FRP pipe, pentaerythritol triacrylate and
Trimethylolpropane trimethacrylate mixing, is stirred 50 minutes with 1000 revs/min of speed, forms mixture；
Step 3, red light quantum point material is added in the mixture that step 2 is formed, is stirred with 1500 revs/min of speed
It mixes 30 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1000 revs/min of speed
Stirring 60 minutes；
Step 5, aluminate coupling agent, silica and dimethyl silicone polymer are added separately to be formed in step 4
It in mixture, is stirred 10 minutes with 2000 revs/min of speed, forms finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 4, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 4
Every rate quantum dot ink.
(2) high water oxygen rejection rate quantum dot ink is evenly distributed on polymethyl by the way of Slot-die coating
On acid esters, quantum dot layer is formed.
(3) side opposite with polymethacrylates on quantum dot layer covers polycarbonate, then to poly- methyl-prop
Olefin(e) acid ester, quantum dot layer and polycarbonate carry out UV irradiation, form finished product after high water oxygen rejection rate quantum dot ink solidification.
Embodiment 5:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 5
0.6 part of red light quantum point material, 1.4 parts of green light quantum point material, 82 parts of acrylate prepolymer body, poly- ammonia
Ester acrylate prepolymer body and epoxy FRP pipe, 10 parts of trimethylolpropane trimethacrylate, acrylate and
Neopentylglycol diacrylate monomer, 2.5 parts of titanate coupling agent, 2.5 parts of polystyrene and 1 part of polyester modification are organic
Siloxanes.
In embodiment 5 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-described embodiment 5 are weighed；
Step 2, by acrylate prepolymer body, polyurethane acrylate prepolymer, epoxy FRP pipe, three hydroxyl first
Base propane triacrylate, acrylate and neopentylglycol diacrylate mixing, stir 60 points with 1500 revs/min of speed
Clock forms mixture；
Step 3, red light quantum point material is added in the mixture formed in step 2, with 1000 revs/min of speed
Stirring 40 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1000 revs/min of speed
Stirring 40 minutes；
Step 5, titanate coupling agent, polystyrene and polyester modified organic siloxane are added separately to shape in step 4
At mixture in, stirred 10 minutes with 2000 revs/min of speed, form finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 5, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 5
Every rate quantum dot ink.
(2) high water oxygen rejection rate quantum dot ink is evenly distributed on optical material by the way of Slot-die coating
On COP, quantum dot layer is formed.
(3) side opposite with optical material COP covers polycarbonate on quantum dot layer, then to optical material COP,
Quantum dot layer and polycarbonate carry out UV irradiation, form finished product after high water oxygen rejection rate quantum dot ink solidification.
Embodiment 6:
The raw material components of high water oxygen rejection rate quantum dot ink include: in embodiment 6
0.7 part of red light quantum point material, 1.3 parts of green light quantum point material, 85.5 parts of epoxy acrylate pre-polymerization
Body, 5 parts of pentaerythritol triacrylate, 2.5 parts of aluminate coupling agent, 2.5 parts of organosilicon and 2.5 parts of poly dimethyl
Siloxanes.
In embodiment 6 high water oxygen rejection rate quantum dot ink preparation method the following steps are included:
Step 1, the raw material components of high water oxygen rejection rate quantum dot ink in above-mentioned implementation 6 are weighed；
Step 2, epoxy FRP pipe and pentaerythritol triacrylate are mixed, with 1500 revs/min of speed
Degree stirring 30 minutes, forms mixture；
Step 3, red light quantum point material is added in the mixture formed in step 2, with 1500 revs/min of speed
Stirring 20 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 2000 revs/min of speed
Stirring 10 minutes；
Step 5, aluminate coupling agent, organosilicon and dimethyl silicone polymer are added separately to be formed in step 4 mixed
It in zoarium, is stirred 60 minutes with 1000 revs/min of speed, forms finished product.
The method of high water oxygen rejection rate quantum dot ink manufacture quantum dot film in embodiment 6, comprising the following steps:
(1) high water oxygen resistance is prepared using the preparation method of high water oxygen rejection rate quantum dot ink in above-described embodiment 6
Every rate quantum dot ink.
(2) high water oxygen rejection rate quantum dot ink is evenly distributed on polypropylene by the way of intaglio printing, is formed
Quantum dot layer.
(3) side opposite with polypropylene covers polyethylene terephthalate on quantum dot layer, then to polypropylene,
Quantum dot layer and polyethylene terephthalate carry out UV irradiation, form finished product after high water oxygen rejection rate quantum dot ink solidification.
The high water oxygen rejection rate quantum dot ink and quantum dot film being prepared using the above method have stronger water-fast
Property and oxidation resistance.
Now the application bring beneficial effect is illustrated according to following experiment:
1, experimental material
Experimental group be using in the embodiment of the present application 1 to 6 by high water oxygen rejection rate quantum dot ink manufacture quantum dot film,
Control group is the commercially available quantum dot film being prepared using quantum dot ink.
2, experimental method
The quantum dot film of experimental group and control group is placed in high temperature and humidity test box, in temperature 60 C, humidity 90%
Under conditions of, it places 1000 hours, detects the light decay and chromaticity coordinates drift results of quantum dot film later.
3, experimental result
The experimental result of experimental group and control group is counted, comparing result is shown in Table 1:
1 experimental group of table and control set product light decay and chromaticity coordinates drift testing result
| Group | Light decay (%) | Chromaticity coordinates drift |
| Control group | 50 | 0.1 |
| Embodiment 1 | 9 | 0.005 |
| Embodiment 2 | 7 | 0.006 |
| Embodiment 3 | 8 | 0.006 |
| Embodiment 4 | 7 | 0.007 |
| Embodiment 5 | 6 | 0.004 |
| Embodiment 6 | 8 | 0.007 |
As can be seen from the table, the light decay of the quantum dot film in embodiment 1 to 6 is respectively less than 10%, and chromaticity coordinates drift is small
In 0.01.Therefore, the quantum dot film being prepared using the high water oxygen rejection rate quantum dot ink of the embodiment of the present application 1 to 6
With strong water resistance and oxidation resistance, it is able to extend the service life of quantum dot film in the actual use process.
The foregoing is merely preferred embodiment of the present application, are not intended to limit this application, for the skill of this field
For art personnel, various changes and changes are possible in this application.Within the spirit and principles of this application, made any to repair
Change, equivalent replacement, improvement etc., should be included within the scope of protection of this application.
Claims (10)
1. a kind of high water oxygen rejection rate quantum dot ink, which is characterized in that the raw material components including following portions by weight: 0.4~
0.7 part of red light quantum point material, 1.3~1.6 parts of green light quantum point material, 82~92 parts of UV performed polymer, 4~10 parts
UV monomer, 0.5~2.5 part of coupling agent, 0.5~2.5 part of light diffusing agent and 0.5~2.5 part of levelling agent.
2. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that including following portions by weight
Raw material components: 0.5 part of red light quantum point material, 1.5 parts of green light quantum point material, 90 parts of UV performed polymer, 6 parts of UV are mono-
Body, 1 part of coupling agent, 1 part of light diffusing agent and 1 part of levelling agent.
3. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that including following portions by weight
Raw material components: 0.6 part of red light quantum point material, 1.4 parts of green light quantum point material, 84 parts of UV performed polymer, 8 parts of UV are mono-
Body, 2 parts of coupling agent, 2 parts of light diffusing agent and 2 parts of levelling agent.
4. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that the UV performed polymer is propylene
At least one of acid esters performed polymer, polyurethane acrylate prepolymer and epoxy FRP pipe.
5. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that the UV monomer is acrylic acid
At least one of ester monomer and modified acroleic acid ester monomer.
6. high water oxygen rejection rate quantum dot ink according to claim 6, which is characterized in that the modification acrylate list
Body includes neopentylglycol diacrylate, pentaerythritol triacrylate or trimethylolpropane trimethacrylate.
7. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that the coupling agent is that silane is even
Join agent, titanate coupling agent, aluminate coupling agent or rare-earth coupling agent.
8. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that the light diffusing agent is dioxy
SiClx, titanium dioxide, polymethyl methacrylate, polystyrene, polycarbonate or organosilicon.
9. high water oxygen rejection rate quantum dot ink according to claim 1, which is characterized in that the levelling agent is poly- diformazan
Radical siloxane, alkyl-modified organosiloxane, organic silicon modified by polyether oxygen alkane or polyester modified organic siloxane.
10. a kind of preparation method of high water oxygen rejection rate quantum dot ink, which comprises the following steps:
Step 1, the raw material group of the high water oxygen rejection rate quantum dot ink as described in any one of claim 1~9 claim is weighed
Point；
Step 2, UV performed polymer and UV monomer are mixed, is stirred 10~60 minutes with 1000~2000 revs/min of speed, formed
Mixture；
Step 3, red light quantum point material is added in the mixture formed in step 2, with 1000~2000 revs/min of speed
Degree stirring 10~60 minutes；
Step 4, green quanta point material is added in the mixture formed in step 3, with 1000~2000 revs/min of speed
Degree stirring 10~60 minutes；
Step 5, coupling agent, light diffusing agent and levelling agent are added separately in the mixture formed in step 4, with 1000~
2000 revs/min of speed stirs 10~60 minutes, forms finished product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810690947.8A CN108976901A (en) | 2018-06-28 | 2018-06-28 | High water oxygen rejection rate quantum dot ink and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810690947.8A CN108976901A (en) | 2018-06-28 | 2018-06-28 | High water oxygen rejection rate quantum dot ink and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108976901A true CN108976901A (en) | 2018-12-11 |
Family
ID=64539540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810690947.8A Pending CN108976901A (en) | 2018-06-28 | 2018-06-28 | High water oxygen rejection rate quantum dot ink and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108976901A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109722097A (en) * | 2018-12-26 | 2019-05-07 | 珠海天威新材料股份有限公司 | Quantum dot ink, quantum dot diaphragm and preparation method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106154400A (en) * | 2016-09-19 | 2016-11-23 | 福州大学 | A kind of method improving inkjet printing quantum dot dot light guide plate |
| CN106863935A (en) * | 2017-01-04 | 2017-06-20 | 武汉保丽量彩科技有限公司 | A kind of quantum dot film and preparation method thereof |
-
2018
- 2018-06-28 CN CN201810690947.8A patent/CN108976901A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106154400A (en) * | 2016-09-19 | 2016-11-23 | 福州大学 | A kind of method improving inkjet printing quantum dot dot light guide plate |
| CN106863935A (en) * | 2017-01-04 | 2017-06-20 | 武汉保丽量彩科技有限公司 | A kind of quantum dot film and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 王文广: "《塑料改性实用技术》", 31 March 2000, 中国轻工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109722097A (en) * | 2018-12-26 | 2019-05-07 | 珠海天威新材料股份有限公司 | Quantum dot ink, quantum dot diaphragm and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107360719A (en) | Feature composite membrane and Wavelength conversion film | |
| TWI606074B (en) | Sealant composition | |
| TWI782946B (en) | Polymer composites and films comprising reactive additives having thiol groups for improved quantum dot dispersion and barrier properties | |
| CN108712966A (en) | Gas barrier film and wavelength conversion film | |
| TW200900816A (en) | Hardening resin composition for liquid crystal sealing and manufacturing method for liquid crystal display panel using the same | |
| JP7318225B2 (en) | Inkjet ink for color filter, light conversion layer and color filter | |
| JP2009229507A (en) | Sealing film | |
| CN109021669A (en) | The preparation method and its usage of high water oxygen rejection rate quantum dot film | |
| CN105579477B (en) | Light wet-cured type resin combination, electronic component-use bonding agent and display element bonding agent | |
| CN107001496A (en) | Actinic energy ray curable resion composition, coating, film and film | |
| CN102816296A (en) | Preparation method of modified epoxy acrylate and photo-thermal dual-curing paint | |
| KR101548342B1 (en) | Artificial Marble Chip, Artificial Marble Using Same, and Method for Preparing thereof | |
| JP2022536259A (en) | Photocurable compositions for stereolithography, stereolithographic methods using the compositions, polymeric components formed by the stereolithographic methods, and devices containing the polymeric components | |
| CN106280687A (en) | Aramid paper UV base gravure ink | |
| CN102834262B (en) | Cured multilayer sheet production method and cured multilayer sheet | |
| CN108976901A (en) | High water oxygen rejection rate quantum dot ink and preparation method thereof | |
| CN105359034A (en) | Sealant for liquid crystal dropping method, vertical-conduction material, liquid crystal display element, and light-shielding flexible silicone particles | |
| CN109096823A (en) | The preparation method of quantum dot film and its application in a liquid crystal display | |
| CN109072040A (en) | Adhesive composite, solidified body, electronic component and assembling parts | |
| CN104910756A (en) | Modified nanometer titanium dioxide ultraviolet-curable coating | |
| JP7087775B2 (en) | Ink composition, light conversion layer and color filter | |
| CN107250903A (en) | Sealing material for liquid crystal display device, up and down conductive material and liquid crystal display cells | |
| CN102807814A (en) | Nano silica-modified recoatable ultraviolet (UV) varnish used on plastic and preparation method for varnish | |
| CN105229525A (en) | Sealant for liquid crystal dripping process, up and down conductive material and liquid crystal display cells | |
| US20200263023A1 (en) | Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181211 |
|
| RJ01 | Rejection of invention patent application after publication |