CN108970935A - Color film top-baking equipment - Google Patents
Color film top-baking equipment Download PDFInfo
- Publication number
- CN108970935A CN108970935A CN201810524708.5A CN201810524708A CN108970935A CN 108970935 A CN108970935 A CN 108970935A CN 201810524708 A CN201810524708 A CN 201810524708A CN 108970935 A CN108970935 A CN 108970935A
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- Prior art keywords
- cavity
- air
- baking
- baked
- film top
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
- B05D3/0413—Heating with air
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Abstract
This application discloses a kind of color film top-baking equipments, which includes: apparatus for baking, and air inlet and air outlet equipped with a cavity and connection cavity, cavity is for accommodating substrate to be baked;Wind pushing mechanism, for conveying air into cavity by air inlet, so that generating an air-flow from air inlet to air outlet in cavity, air-flow is for taking away the sublimate generated when substrate to be baked is baked.By the above-mentioned means, the application can reduce sublimate in the intracorporal accumulation of apparatus for baking chamber, the quality of substrate production is improved.
Description
Technical field
This application involves field of display technology, more particularly to a kind of color film top-baking equipment.
Background technique
In the manufacture craft of display base plate, need to carry out prebake conditions after photoresist makes.Wherein, CF HPCP (color film
Pre-drier) the baking processing procedure after photoresist, main purpose are coated with via coating machine for each producing line in color membrane substrates procedure for producing
It is the solvent in film will to be remained on after being evacuated VCD in such a way that hot plate heats by the photoresist layer after coating
(Solvent) it removes, increases the adhesive force between photoresist and substrate.But it occur the problem that 1. in existing HPCP processing procedure
Membrane removal internal solvent is gone using heating, a large amount of Fume (sublimate) can be generated in Chamber inner wall, bulk deposition influences product product
Matter.2. if Fume leaks, to will cause overall situation Particle (particle) exceeded, influences other manufacturing process.
Summary of the invention
The application provides a kind of color film top-baking equipment, can reduce sublimate in the intracorporal accumulation of apparatus for baking chamber, improve
The quality of substrate production.
In order to solve the above technical problems, the technical solution that the application uses is: providing a kind of color film top-baking equipment, institute
Stating color film top-baking equipment includes: apparatus for baking, air inlet and air outlet equipped with a cavity and the connection cavity, the chamber
Body is for accommodating substrate to be baked;Wind pushing mechanism, for conveying air into the cavity by the air inlet, so that institute
It states and generates one in cavity from the air inlet to the air-flow of the air outlet, the air-flow is for taking away the substrate quilt to be baked
The sublimate generated when baking.
The beneficial effect of the application is: providing a kind of color film top-baking equipment, is blown by increasing in color film top-baking equipment
Mechanism, the wind pushing mechanism can convey air to the cavity of apparatus for baking, take away the distillation generated when substrate to be baked is baked
Object improves the quality of substrate production so as to reduce the accumulation of sublimate in the cavity.
Detailed description of the invention
In order to more clearly explain the technical solutions in the embodiments of the present application, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, the drawings in the following description are only some examples of the present application, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is the structural schematic diagram of the application coloured silk film top-baking equipment first embodiment;
Fig. 2 is the structural schematic diagram of the application coloured silk film top-baking equipment second embodiment;
Fig. 3 is the structural schematic diagram of the application coloured silk film top-baking equipment third embodiment;
Fig. 4 is the application air supply tube with the structural schematic diagram of embodiment;
Fig. 5 is the structural schematic diagram of the 4th embodiment of the application coloured silk film top-baking equipment;
Fig. 6 is the structural schematic diagram of the 5th embodiment of the application coloured silk film top-baking equipment;
Fig. 7 is the structural schematic diagram of the 5th embodiment of the application coloured silk film top-baking equipment.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation description, it is clear that described embodiment is only a part of the embodiment of the application, instead of all the embodiments.It is based on
Embodiment in the application, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall in the protection scope of this application.
Referring to Fig. 1, Fig. 1 is the structural schematic diagram of the application coloured silk film top-baking equipment first embodiment.Such as Fig. 1, this Shen
Please in color film top-baking equipment include apparatus for baking 10 and wind pushing mechanism 11.
Apparatus for baking 10 is equipped with a cavity A and is connected to the air inlet B and air outlet C of cavity A, and cavity A is for accommodating
Substrate a to be baked, the substrate a to be baked in the present embodiment can be color membrane substrates, naturally it is also possible to thin film transistor (TFT) array base
Plate does not further limit herein.
Optionally, which further comprises baking table 101 and cover 102, and baking table 101 and cover 102 connect
It connects to form above-mentioned cavity A.
Wherein, baking table 101 is for carrying the substrate A to be baked being contained in cavity A to dry to substrate a to be baked
Roasting, air inlet B and air outlet C are set on cover 102.
Optionally, cover 102 includes upper cover plate 1021 and surrounding plate 1022, and air inlet B and air outlet C may be disposed at upper cover
It is optional by taking air inlet B and air outlet C are set on plate 1022 around as an example in the present embodiment on plate 1021 or surrounding plate 1022
, air inlet B is respectively arranged at the two sides that around plate 1022 is opposite with air outlet C.
Optionally, Fig. 2 is further regarded to, Fig. 2 is the structural schematic diagram of the application coloured silk film top-baking equipment second embodiment.
Such as Fig. 2, the apparatus for baking 10 in the present embodiment is additionally provided with the transmission mouth D being connected to cavity A, which is used for into cavity A
It is placed or taken out substrate a to be baked, namely the substrate a to be baked not being baked can be placed into cavity A by transmission mouth D,
And after the completion of placement, transmission mouth D is closed with seal cavity A, so that baking table 101 treats baking in the cavity A of sealing
Roasting substrate a is toasted, and after baking, opens transmission mouth D to take out the substrate a to be baked that baking is completed.
Optionally, transmission mouth D is set on plate 1022 around, and is located at surrounding plate 1022 with air inlet B and air outlet C
It is not ipsilateral.
Wind pushing mechanism 11 is used to convey air into cavity A by air inlet B, so that generating one in cavity A from air inlet
The air-flow of mouth B to air outlet C, and the air-flow is used to take away the sublimate generated when substrate a to be baked is baked, so as to subtract
Few accumulation of the sublimate in cavity A, improves the quality of substrate production.
Specifically, referring to Fig. 3, Fig. 3 is the structural schematic diagram of the application coloured silk film top-baking equipment third embodiment, as schemed
3, wind pushing mechanism 11 includes pressure fan 111 and air supply tube 112, and air supply tube 112 connect with pressure fan 111 and worn by air inlet B
Set on surrounding plate 1022, to extend in cavity A, so that pressure fan 111 is conveyed by air supply tube 112 into cavity A
Air.
Optionally, the air that pressure fan 111 is conveyed into cavity A is hot-air, it is possible to understand that, in above-mentioned air-flow band
During walking the sublimate generated when substrate a to be baked is baked, the heat in cavity A can also follow the air-flow and by band
It walks, is reduced so as to cause the temperature in cavity A, above-mentioned hot-air can increase the temperature after heat is pulled away in cavity A, from
And the temperature for preventing the temperature in cavity A required when being baked lower than baking substrate a, and then lead to substrate a baking to be baked not
Completely.
Air supply tube 112 is arranged in plate 1022 around by air inlet B and extends towards upper cover plate 1021, so that air-flow
Upper cover plate 1021 (as shown in phantom in FIG.) is passed through in path.
It should be understood that due to the lighter weight of sublimate, substrate a to be baked be baked on baking table 101 and
The sublimate of generation can be flowed towards upper cover plate 1021, be more than other so as to cause the sublimate being deposited on upper cover plate 1021
Position, therefore, the path of the air-flow upper cover plate 1021 more by accumulation sublimate can be improved the efficiency that sublimate is pulled away
And quantity.
It optionally, is the application air supply tube with the structural schematic diagram of embodiment refering to Fig. 4, Fig. 4, such as Fig. 4 air supply tube 112
Including the first tube body 1121 and the second tube body 1122.Wherein, the first tube body 1121 connect with pressure fan 111 and by air inlet B
Plate 1022 around are arranged in, the second tube body 1122 is set in cavity A and extends towards upper cover plate 1021, and the second tube body 1122
It is flexibly connected with the first tube body 1121, so that the second tube body 1122 is adjustable towards the direction that upper cover plate 1021 extends, thus
The path position of air-flow is adjusted in the accumulation position of upper cover plate 1021 according to sublimate.
Jointly refering to Fig. 5 and Fig. 6, when accumulation position difference of the sublimate on the direction for being parallel to upper cover plate 1021,
Second tube body 1122 relative to the first tube body 1121 adjusting direction also parallel with upper cover plate 1021, thus being parallel to upper cover plate
The path of 1021 direction up-regulation solar term stream.
Jointly refering to Fig. 5 and Fig. 6, when accumulation position difference of the sublimate on the direction perpendicular to upper cover plate 1021,
Namely when sublimate is piled up in the thickness difference on upper cover plate 1021, tune of second tube body 1122 relative to the first tube body 1121
Section direction is also perpendicularly to upper cover plate 1021, thus in the path of the direction up-regulation solar term stream perpendicular to upper cover plate 1021, and then make
The path of air-flow is obtained according to the ulking thickness of sublimate, as shown in Figure 5 to Figure 6 moves closer to upper cover plate 1021, with gradually band
Walk to be piled up in sublimate on upper cover plate 1021.Color film top-baking equipment in the present embodiment still further comprises air draft mechanism 12, should
Air draft mechanism 12 is used to extract air out of cavity A by air outlet C, so that toasting the sublimate that substrate a to be baked is generated
Air-flow is followed to be discharged by air draft mechanism 12, to improve the efficiency and quantity that sublimate is entrained by the flow of air.
Specifically, air draft mechanism 12 includes exhaust fan 121 and exhaust column 122, exhaust column 122 and exhaust fan refering to Fig. 3
121 connect and are arranged in plate 1022 around by air outlet C, so that exhaust fan 121 is by exhaust column 122 out of cavity A
Extract air.
Optionally, exhaust column 122 extends towards upper cover plate 1021, and principle is identical as above-mentioned air supply tube 112, herein not
It repeats again.
Optionally, in a particular embodiment, the intensity of draft that air draft mechanism 12 is arranged is strong greater than the air-supply of wind pushing mechanism 11
Degree, so that as above-mentioned, substrate a to be baked is baked and cavity A when being sealed, and the cavity A of the sealing is in negative pressure state, thus
When substrate a to be baked baking finishes and opens transmission mouth D, the pressure in cavity A is less than the atmospheric pressure outside apparatus for baking 10, into
And prevent transmission mouth D sublimate when taking out substrate a to be baked that is opened from leaking, it avoids sublimate from leaking and causes the particle of overall situation
It is exceeded, influence other manufacturing process.Optionally, the color film top-baking equipment in the application still further comprises elevating mechanism 13,
The elevating mechanism 13 is used to or be lifted substrate a to be baked so that substrate a to be baked be carried on baking table 101 or from
It is taken out in cavity A.
It is general by the way of manipulator clamping when substrate a to be baked baking finishes and needs to take out, elevating mechanism 13
It is lifted substrate a to be baked after substrate a to be baked baking, so that substrate a to be baked is separated with baking table 101, to be
Manipulator provides clamping space, and therefore, when substrate a to be baked is placed in and is baked in cavity A, elevating mechanism 13 sinks wait dry
Roasting substrate a, so that substrate a to be baked is carried on baking table 101.
Optionally, the elevating mechanism 13 in the application can be hydraulicefficiency elevation structure, pressure liftable mechanism etc., such as liquid
Cylinder pressure or pneumatic cylinder, do not further limit herein.
It optionally, can be in order to increase stability of the elevating mechanism 13 during sinking or being lifted substrate a to be baked
One adsorbing mechanism (not shown), such as sucker are set on elevating mechanism 13, to pass through the adsorbing mechanism for substrate to be baked
It is adsorbed on elevating mechanism 13.
Optionally, apparatus for baking 10 is equipped with insulation layer E close to the side of cavity A, in the present embodiment namely cover 102
Inner wall be equipped with insulation layer E, insulation layer E is used to prevent heat losses in cavity A, so that the temperature in cavity A is greater than
Or it is equal to threshold value.
In a specific embodiment, according to the material property of substrate a to be baked, generally when temperature is lower than a threshold value, to
Baking substrate a, which is baked, can generate sublimate, therefore, insulation layer E be arranged in the inner wall of cover 102 in the present embodiment, can
It prevents the heat in cavity A from the temperature in cavity A being caused to decline by the outside that cover 102 is transferred to cover 102, and then makes
The temperature obtained in cavity A is greater than or equal to threshold value, can reduce even to be eliminated that sublimate is generated when substrate a to be baked is baked
Risk.
Optionally, substrate a to be baked is color membrane substrates, and above-mentioned threshold value is greater than or equal to 75 DEG C~80 DEG C, specifically can be
It 75 DEG C, 77.5 DEG C, 80 DEG C etc., does not further limit herein.
Optionally, as the color film top-baking equipment in Fig. 7 further can also include in another embodiment herein
Heating mechanism 14, which is used to increase the heat in cavity A, so that the temperature in cavity A is greater than or equal to threshold
Value, and then reduce the risk for even being eliminated and having generated sublimate when substrate a to be baked is baked.
Optionally, which can be set on upper cover plate 1021 or being set in shutter (transmission mouth), this
Heating mechanism 14 in embodiment is set on upper cover plate 1021, and the heating mechanism 14 can be a heater.
In above embodiment, by increasing wind pushing mechanism in color film top-baking equipment, which can be to baking
The cavity of device conveys air, the sublimate generated when substrate to be baked is baked is taken away, so as to reduce sublimate in chamber
Intracorporal accumulation improves the quality of substrate production.
In conclusion it should be readily apparent to one skilled in the art that the application provides a kind of color film top-baking equipment, by color film
Increase wind pushing mechanism in top-baking equipment, which can convey air to the cavity of apparatus for baking, take away substrate to be baked
The sublimate generated when being baked improves the quality of substrate production so as to reduce the accumulation of sublimate in the cavity.
The foregoing is merely presently filed embodiments, are not intended to limit the scope of the patents of the application, all to utilize this
Equivalent structure or equivalent flow shift made by application specification and accompanying drawing content, it is relevant to be applied directly or indirectly in other
Technical field similarly includes in the scope of patent protection of the application.
Claims (10)
1. a kind of coloured silk film top-baking equipment, which is characterized in that the coloured silk film top-baking equipment includes:
Apparatus for baking, air inlet and air outlet equipped with a cavity and the connection cavity, the cavity is for accommodating wait dry
Roasting substrate;
Wind pushing mechanism, for conveying air into the cavity by the air inlet so that generated in the cavity one from
The air inlet is to the air-flow of the air outlet, and the air-flow is for taking away the distillation generated when the substrate to be baked is baked
Object.
2. coloured silk film top-baking equipment according to claim 1, which is characterized in that the coloured silk film top-baking equipment further comprises taking out
Blower structure, the air draft mechanism are used to extract air out of described cavity by the air outlet so that the sublimate with
It is discharged with the air-flow by the air draft mechanism.
3. coloured silk film top-baking equipment according to claim 2, which is characterized in that the apparatus for baking includes baking table and cover
Body, the baking table for carrying the substrate to be baked to toast to the substrate to be baked, and the baking table with
To form the cavity, the air inlet and the air outlet are set on the cover for the cover connection.
4. coloured silk film top-baking equipment according to claim 3, which is characterized in that the cover includes upper cover plate and surrounding plate,
The air inlet is set on the surrounding plate, and the wind pushing mechanism includes pressure fan and air supply tube, the air supply tube with it is described
Pressure fan connects and is arranged in the surrounding plate by the air inlet, and extends towards the upper cover plate, so that the gas
The upper cover plate is passed through in the path of stream.
5. coloured silk film top-baking equipment according to claim 4, which is characterized in that the air supply tube includes the first tube body and second
Tube body, first tube body connect with the pressure fan and are arranged in the surrounding plate, second pipe by the air inlet
Body is set in the cavity and extends towards the upper cover plate, and second tube body is flexibly connected with first tube body,
So that second tube body is adjustable towards the direction that the upper cover plate extends.
6. coloured silk film top-baking equipment according to claim 4, which is characterized in that the air outlet is set to the surrounding plate
On, the air draft mechanism includes exhaust fan and exhaust column, and the exhaust column connect with the exhaust fan and passes through the air outlet
It is arranged in the surrounding plate, and is extended towards the upper cover plate.
7. according to color film top-baking equipment as claimed in claim 3, which is characterized in that the coloured silk film top-baking equipment further comprises lifting
Mechanism, the elevating mechanism is used to or be lifted the substrate to be baked, so that the base plate carrying to be baked is in described
It is taken out on baking table or out of described cavity.
8. coloured silk film top-baking equipment according to claim 2, which is characterized in that the apparatus for baking be further provided with it is described
The transmission mouth of cavity connection, the transmission mouth are used to place the substrate to be baked into the cavity, and described to be baked
After substrate is placed in the cavity, the transmission mouth is closed to seal the cavity, and the exhausting of the air draft mechanism is strong
Degree is greater than the blast intensity of the wind pushing mechanism, so that the cavity of the sealing is in negative pressure state, and then prevents the transmission
When mouth is opened to take out the substrate to be baked, the sublimate leaks.
9. coloured silk film top-baking equipment according to claim 1, which is characterized in that the apparatus for baking close to the cavity one
Side is equipped with insulation layer, and the insulation layer is for preventing the intracorporal heat losses of the chamber, so that the intracorporal temperature of the chamber is big
In or equal to threshold value.
10. coloured silk film top-baking equipment according to claim 1, which is characterized in that the coloured silk film top-baking equipment further comprises
Heating mechanism, the heating mechanism is for increasing the intracorporal heat of the chamber, so that the intracorporal temperature of the chamber is greater than or waits
In threshold value.
Priority Applications (1)
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CN201810524708.5A CN108970935A (en) | 2018-05-28 | 2018-05-28 | Color film top-baking equipment |
Applications Claiming Priority (1)
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CN201810524708.5A CN108970935A (en) | 2018-05-28 | 2018-05-28 | Color film top-baking equipment |
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CN108970935A true CN108970935A (en) | 2018-12-11 |
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CN201810524708.5A Pending CN108970935A (en) | 2018-05-28 | 2018-05-28 | Color film top-baking equipment |
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CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
CN107362953A (en) * | 2017-09-01 | 2017-11-21 | 深圳市华星光电半导体显示技术有限公司 | Photoresistance roasting plant |
CN107561747A (en) * | 2017-10-12 | 2018-01-09 | 惠科股份有限公司 | Pre-baking device and pre-baking system of display substrate |
CN108227411A (en) * | 2018-01-18 | 2018-06-29 | 武汉华星光电技术有限公司 | Photoresist prebake conditions cooling system |
-
2018
- 2018-05-28 CN CN201810524708.5A patent/CN108970935A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
CN107362953A (en) * | 2017-09-01 | 2017-11-21 | 深圳市华星光电半导体显示技术有限公司 | Photoresistance roasting plant |
CN107561747A (en) * | 2017-10-12 | 2018-01-09 | 惠科股份有限公司 | Pre-baking device and pre-baking system of display substrate |
CN108227411A (en) * | 2018-01-18 | 2018-06-29 | 武汉华星光电技术有限公司 | Photoresist prebake conditions cooling system |
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Application publication date: 20181211 |