CN108943451B - Semiconductor-grade monocrystalline silicon crystal bar orientation test system - Google Patents
Semiconductor-grade monocrystalline silicon crystal bar orientation test system Download PDFInfo
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- CN108943451B CN108943451B CN201810915272.2A CN201810915272A CN108943451B CN 108943451 B CN108943451 B CN 108943451B CN 201810915272 A CN201810915272 A CN 201810915272A CN 108943451 B CN108943451 B CN 108943451B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20016—Goniometers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Abstract
The invention discloses a semiconductor-grade monocrystalline silicon crystal bar directional testing system which comprises a material plate mechanism, a material plate rotating mechanism, a lifting mechanism, a swinging mechanism and a driving mechanism, wherein the swinging mechanism comprises a mounting seat, a speed reducer is mounted at the top of the mounting seat, a second motor connected with the speed reducer is arranged at the top of the speed reducer, a first encoder is mounted at one side of the second motor, the driving mechanism is arranged at the other side of the second motor, a horizontally-arranged positioning probe is further mounted at one side of the second motor close to the driving mechanism, a second linear guide rail is further mounted at the bottom of the mounting seat, a lead screw is movably mounted at one side of the second linear guide rail, a third motor is mounted at one end of the lead screw through a first coupler, and the driving mechanism comprises a traveling part, two groups of X-ray generating parts moving along with the traveling part and two groups of signal systems. The invention has reasonable design, and the precision after slicing is controlled within +/-3' so as to meet the requirement of increasing the precision of sliced products of semiconductor grade monocrystalline silicon.
Description
Technical Field
The invention relates to the technical field of crystal testing, in particular to a semiconductor-grade monocrystalline silicon crystal bar directional testing system.
Background
Before a monocrystalline silicon crystal bar artificially grown is processed into wafers of various specifications, a blank crystal bar is oriented, a required direction is found, a grinding device is utilized to process a reference edge or notch on the cylindrical surface of the crystal bar, the crystal bar is bonded on a flitch according to a measured angle value, crystal bar bonding is carried out, and the reference edge or notch on the cylindrical surface of the crystal bar can be oriented to a required angle according to the requirement in the crystal bar orientation. The traditional material-sticking grade is carried out in a mode of separating orientation and adhesion, so that the requirement of pointing a reference edge or notch to a specific angle cannot be met, the adhesion precision is low by about +/-15', the monocrystalline silicon slicing precision is seriously influenced, the unqualified product proportion of a crystal slicing product is large, and the requirement of increasing the precision of the slicing product for producing semiconductor grade monocrystalline silicon cannot be met.
Disclosure of Invention
Based on the technical problems that the requirement that a reference edge or notch is pointed to a specific angle cannot be met in the background technology, the monocrystalline silicon slicing precision is seriously influenced, and the unqualified product proportion of a crystal slice product is large, the invention provides a semiconductor-grade monocrystalline silicon rod orientation testing system.
The invention provides a semiconductor-grade monocrystalline silicon crystal bar directional testing system which comprises a material plate mechanism, a material plate rotating mechanism, a lifting mechanism, a swing mechanism and a driving mechanism, wherein the material plate mechanism is arranged on the material plate rotating mechanism;
the swinging mechanism comprises a mounting seat, a speed reducer is mounted at the top of the mounting seat, a second motor connected with the speed reducer is arranged at the top of the speed reducer, a first encoder is mounted on one side of the second motor, a driving mechanism is arranged on the other side of the second motor, a positioning probe horizontally arranged is further mounted on one side of the second motor close to the driving mechanism, a second linear guide rail is further mounted at the bottom of the mounting seat, a lead screw is movably mounted on one side of the second linear guide rail, and a third motor is mounted at one end of the lead screw through a first coupler;
the driving mechanism comprises a walking part, two groups of X-ray generation parts moving along with the walking part and two groups of signal systems, wherein one side of the bottom of the walking part is provided with a worm part driving the walking part to move, the worm part comprises two groups of worms, a first encoder, a fourth motor, a worm wheel piece and an arc guide rail group, the first encoder and the fourth motor are correspondingly arranged at two ends of the worm, the worm is meshed with the worm wheel piece to further drive the X-ray generation parts and the signal systems to do arc motion on the arc guide rail group, and the moving angle is counted by the first encoder and is calculated through a reduction ratio to obtain an accurate numerical value.
Preferably, the arc guide rail group comprises a first arc guide rail and a second arc guide rail, wherein the length of the first arc guide rail is greater than that of the second arc guide rail, the number of the second arc guide rails is two, and the first arc guide rail is parallel to one of the second arc guide rails.
Preferably, the lifting mechanism comprises a lifting plate and a bottom plate which are arranged in parallel from top to bottom, a first motor is installed in the middle of one side of the bottom plate, an electric push rod is installed on an output shaft of the first motor, and one end of the electric push rod is connected with the lifting plate and drives the lifting plate to move up and down.
Preferably, a fixing plate is further arranged between the lifting plate and the bottom plate, two fixing side plates are connected between the bottom plate and the fixing plate, a first linear guide rail is installed on one side, far away from the two fixing side plates, two movable side plates are further installed on one side of the lifting plate, a sliding block is installed on one side, close to the two movable side plates, of the two movable side plates, and the sliding block slides in the first linear guide rail in a reciprocating mode.
Preferably, a through hole and a movable opening are formed in the fixed plate, wherein the movable opening is formed in two sides of the through hole, one end of the movable side plate penetrates through the movable opening and extends to one side, close to the bottom plate, of the fixed plate, and the sliding block is installed on one side, far away from the lifting plate, of the movable side plate.
Preferably, the flitch mechanism includes the sizing slide, and laser positioning sensor is installed to top one side of sizing slide, and the cylinder is installed to the top opposite side of sizing slide, is equipped with reference seat and keysets between laser positioning sensor and the cylinder, and wherein reference seat fixed mounting is on the sizing slide, and the keysets is installed on the piston rod of cylinder, and reference bar and layering are installed to the one side that reference seat and keysets are close to correspondingly, and reference bar and layering cooperate.
Preferably, flitch rotary mechanism includes the connecting seat and installs the swivel work head in the connecting seat top, and wherein the swivel work head still installs in the bottom of sizing slide, and the second encoder is installed through the second shaft coupling in the bottom of swivel work head, and one side of swivel work head is connected with the fifth motor through the third shaft coupling.
According to the invention, the semiconductor-grade monocrystalline silicon crystal bar orientation test system is reasonable in design and layout, orientation, bonding and rechecking are completed on one machine through an X-ray monocrystalline orientation principle, the specific orientation requirement of a reference edge or notch is completed, and the precision after slicing is controlled within +/-3', so that the requirement that the precision of sliced products of semiconductor-grade monocrystalline silicon is improved day by day is met.
Drawings
FIG. 1 is a schematic structural diagram of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
FIG. 2 is a schematic structural diagram of a material plate mechanism of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
FIG. 3 is a schematic structural diagram of a material plate rotating mechanism of a semiconductor-grade monocrystalline silicon ingot orientation testing system according to the present invention;
FIG. 4 is a schematic structural diagram of a lifting mechanism of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
FIG. 5 is a schematic structural diagram of a swing mechanism of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
FIG. 6 is a schematic structural diagram of a driving mechanism of a semiconductor-grade monocrystalline silicon ingot orientation testing system according to the present invention;
FIG. 7 is a schematic structural diagram of a worm part of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
FIG. 8 is a schematic structural diagram of a turbine blade portion of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention;
fig. 9 is a schematic structural diagram of an arc guide rail set of a semiconductor-grade monocrystalline silicon ingot orientation test system according to the present invention.
In the figure: the device comprises a 1 flitch mechanism, a 2 flitch rotating mechanism, a 3 lifting mechanism, a 4 swinging mechanism, a 5 driving mechanism, a 11 sticky material sliding plate, a 12 laser positioning sensor, a 13 reference seat, a 14 cylinder, a 15 adapter plate, a 16 pressing strip, a 17 reference strip, a 21 connecting seat, a 22 rotary worktable, a 23 second coupler, a 24 second encoder, a 25 third coupler, a 26 fifth motor, a 31 lifting plate, a 32 bottom plate, a 33 first motor, a 34 electric push rod, a 35 fixing plate, a 36 movable side plate, a 37 fixed side plate, a 38 first linear guide rail, a 39 sliding block, a 41 mounting seat, a 42 speed reducer, a 43 second motor, a 44 first encoder, a 45 third motor, a 46 positioning probe, a 47 second linear guide rail, a 48 screw rod, a 49 first coupler, a 51 driving walking part, a 52X light generating part, a 53 worm part, a 54 signal system, a 531 worm, a 532 first encoder, a 533 fourth motor, a 534 worm wheel sheet, a 535 first arc guide rail and a second arc guide rail.
Detailed Description
The present invention will be further illustrated with reference to the following specific examples.
Examples
Referring to fig. 1-9, a semiconductor-grade monocrystalline silicon crystal bar orientation test system comprises a material plate mechanism 1, a material plate rotating mechanism 2, a lifting mechanism 3, a swinging mechanism 4 and a driving mechanism 5; the swinging mechanism 4 comprises a mounting base 41, a speed reducer 42 is mounted at the top of the mounting base 41, a second motor 43 connected with the speed reducer 42 is arranged at the top of the speed reducer 42, a first encoder 44 is mounted at one side of the second motor 43, the driving mechanism 5 is arranged at the other side of the second motor 43, a positioning probe 46 horizontally arranged is further mounted at one side of the second motor 43 close to the driving mechanism 5, a second linear guide rail 47 is further mounted at the bottom of the mounting base 41, a lead screw 48 is movably mounted at one side of the second linear guide rail 47, a third motor 45 is mounted at one end of the lead screw 48 through a first coupler 49, and the third motor 45 drives the lead screw 48 through the first coupler 49 to enable the mounting base 41 and the components above the mounting base 41 to move back and forth on the second linear guide rail 47, so that the positioning probe 46 determines that an X-ray measuring point is accurately positioned on the end surface of a measured crystal bar. The second motor 43 drives the driving mechanism 5 to rotate horizontally and vertically through the speed reducer 42, so that the horizontal axis and the vertical axis of the crystal bar are measured, and the rotation precision is controlled by the first encoder 44;
the driving mechanism 5 comprises a walking part 51, two groups of X-ray generating parts 52 moving along with the walking part 51 and two groups of signal systems 54, wherein a worm part 53 driving the walking part 51 to move is arranged on one side of the bottom of the walking part 51, the worm part 53 comprises two groups of worms 531, a first encoder 532, a fourth motor 533, a worm wheel 534 and an arc guide rail group, the first encoder 532 and the fourth motor 533 are correspondingly arranged at two ends of the worm 531, the worm 531 is meshed with the worm wheel 534 to drive the X-ray generating parts 52 and the signal systems 54 to do arc motion on the arc guide rail group, and the moving angle is counted by the first encoder 532 and is calculated through a reduction ratio to obtain an accurate numerical value.
In this embodiment, the circular arc guide set includes a first circular arc guide 535 and a second circular arc guide 536, wherein the length of the first circular arc guide 535 is greater than the length of the second circular arc guide 536, and there are two second circular arc guides 536, and the first circular arc guide 535 is parallel to one of the second circular arc guides 536.
The lifting mechanism 3 comprises a lifting plate 31 and a bottom plate 32 which are arranged in an up-and-down parallel mode, a first motor 33 is installed at the middle position of one side of the bottom plate 32, an electric push rod 34 is installed on an output shaft of the first motor 33, one end of the electric push rod 34 is connected with the lifting plate 31 and drives the lifting plate 31 to move up and down, a fixing plate 35 is further arranged between the lifting plate 31 and the bottom plate 32, two fixing side plates 37 are connected between the bottom plate 32 and the fixing plate 35, a first linear guide rail 38 is installed on one side, away from the two fixing side plates 37, of the two fixing side plates 36, two movable side plates 36 are further installed on one side, close to the two movable side plates 36, a sliding block 39 is installed on one side, close to the two movable side plates 36, the sliding block 39 slides in the first linear guide rail 38 in a reciprocating mode, a through hole and a movable opening are formed in the fixing plate 35, the two sides of the through hole are formed in the movable opening, one end of each movable side plate 36 penetrates through the movable opening to extend to one side, close to the bottom plate 35, and the movable side plate 36 is far away from the lifting plate 31.
First, the bottom plate 32 and the fixed side plate 37 are connected by screws, the fixed plate 35 forms a stable box-type mechanism by screws, then the first linear guide rail 38 and the sliding block 39 are connected by screws, the sliding block 39 is connected with the movable side plate 36 by screws, then the lifting plate 31 is connected by the accuracy control lifting plate 31 of the first linear guide rail 38 and the sliding block 39, no deflection occurs in the lifting process, the electric push rod 34 is connected to the fixed plate 35 by one end of a screw, the other end of the screw is connected to the lifting plate 31, the electric push rod 34 is driven by the first motor 33 to stretch in the vertical direction, and then the lifting plate 31 is driven to move up and down.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (7)
1. The utility model provides a directional test system of semiconductor level monocrystalline silicon crystal stick, includes flitch mechanism (1), flitch rotary mechanism (2), elevating system (3), pendulum changes mechanism (4) and actuating mechanism (5), its characterized in that:
the material plate mechanism (1) comprises a bonding sliding plate (11), an air cylinder (14) is installed on one side of the top of the bonding sliding plate (11), a reference seat (13) is fixedly installed on the bonding sliding plate (11), and an adapter plate (15) is installed on a piston rod of the air cylinder (14);
the swing mechanism (4) comprises a mounting seat (41), a speed reducer (42) is mounted at the top of the mounting seat (41), a second motor (43) connected with the speed reducer (42) is arranged at the top of the speed reducer (42), a first encoder (44) is mounted at one side of the second motor (43), the driving mechanism (5) is arranged at the other side of the second motor (43), a positioning probe (46) which is horizontally arranged is further mounted at one side of the second motor (43) close to the driving mechanism (5), a second linear guide rail (47) is further mounted at the bottom of the mounting seat (41), a lead screw (48) is movably mounted at one side of the second linear guide rail (47), and a third motor (45) is mounted at one end of the lead screw (48) through a first coupler (49);
the driving mechanism (5) comprises a walking part (51), an X-ray generation part (52) and a signal system (54) which move along with the walking part (51), wherein a worm part (53) which drives the walking part (51) to move is arranged on one side of the bottom of the walking part (51), the worm part (53) comprises two sets of worms (531), a third encoder (532), a fourth motor (533), a worm wheel (534) and an arc guide rail set, the third encoder (532) and the fourth motor (533) are correspondingly installed at two ends of the worm (531), the worm (531) is meshed with the worm wheel (534) to further drive the X-ray generation part (52) and the signal system (54) to do arc motion on the arc guide rail set, and the moving angle is counted by the third encoder (532) to obtain an accurate numerical value through reduction ratio calculation.
2. A semiconductor grade single crystal silicon ingot orientation test system as claimed in claim 1, characterized in that the circular arc rail group comprises a first circular arc rail (535) and a second circular arc rail (536), wherein the length of the first circular arc rail (535) is greater than the length of the second circular arc rail (536), and the second circular arc rail (536) is provided in two, the first circular arc rail (535) and one of the second circular arc rails (536) are parallel.
3. The semiconductor-grade monocrystalline silicon ingot orientation test system according to claim 1, wherein the lifting mechanism (3) comprises a lifting plate (31) and a bottom plate (32) which are arranged in parallel up and down, a first motor (33) is installed at the middle position of one side of the bottom plate (32), an electric push rod (34) is installed on an output shaft of the first motor (33), and one end of the electric push rod (34) is connected with the lifting plate (31) and drives the lifting plate (31) to move up and down.
4. A semiconductor-grade monocrystalline silicon ingot orientation test system according to claim 3, characterized in that a fixed plate (35) is further arranged between the lifting plate (31) and the bottom plate (32), two fixed side plates (37) are connected between the bottom plate (32) and the fixed plate (35), a first linear guide rail (38) is mounted on the side, away from the two fixed side plates (37), of the lifting plate (31), two movable side plates (36) are further mounted on one side of the lifting plate (31), a slide block (39) is mounted on the side, close to the two movable side plates (36), of the slide block (39) slides in the first linear guide rail (38) in a reciprocating manner.
5. The semiconductor-grade monocrystalline silicon ingot orientation test system according to claim 4, wherein the fixed plate (35) is provided with a through hole and a movable opening, wherein the movable opening is arranged at two sides of the through hole, one end of the movable side plate (36) extends to one side of the fixed plate (35) close to the bottom plate (32) through the movable opening, and the slide block (39) is arranged at one side of the movable side plate (36) far away from the lifting plate (31).
6. A semiconductor-grade monocrystalline silicon crystal rod orientation test system according to claim 1, characterized in that a laser positioning sensor (12) is installed on the other side of the top of the binder sliding plate (11), a reference base (13) and an adapter plate (15) are arranged between the laser positioning sensor (12) and the cylinder (14), a reference bar (17) and a pressing bar (16) are correspondingly installed on one side, close to the reference base (13) and the adapter plate (15), of the reference bar (17) and the pressing bar (16) are matched with each other.
7. A semiconductor grade monocrystalline silicon crystal rod orientation test system according to claim 1 or 6, characterized in that the flitch rotating mechanism (2) comprises a connecting seat (21) and a rotary table (22) arranged on the top of the connecting seat (21), wherein the rotary table (22) is also arranged on the bottom of the adhesive sliding plate (11), the bottom of the rotary table (22) is provided with a second encoder (24) through a second coupler (23), and one side of the rotary table (22) is connected with a fifth motor (26) through a third coupler (25).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810155255.3A CN108362720A (en) | 2018-02-23 | 2018-02-23 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
| CN2018101552553 | 2018-02-23 |
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| Publication Number | Publication Date |
|---|---|
| CN108943451A CN108943451A (en) | 2018-12-07 |
| CN108943451B true CN108943451B (en) | 2022-12-02 |
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| CN201810155255.3A Pending CN108362720A (en) | 2018-02-23 | 2018-02-23 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
| CN201821143349.0U Active CN208547592U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar oriented detection system |
| CN201821143259.1U Active CN209207769U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar hold-down mechanism |
| CN201821143255.3U Active CN209078925U (en) | 2018-02-23 | 2018-07-19 | A kind of flitch lifting mechanism |
| CN201821143269.5U Active CN208528735U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar adjustment mechanism |
| CN201810794228.0A Pending CN108760780A (en) | 2018-02-23 | 2018-07-19 | Crystal bar oriented detection system |
| CN201810915272.2A Active CN108943451B (en) | 2018-02-23 | 2018-08-13 | Semiconductor-grade monocrystalline silicon crystal bar orientation test system |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810155255.3A Pending CN108362720A (en) | 2018-02-23 | 2018-02-23 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
| CN201821143349.0U Active CN208547592U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar oriented detection system |
| CN201821143259.1U Active CN209207769U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar hold-down mechanism |
| CN201821143255.3U Active CN209078925U (en) | 2018-02-23 | 2018-07-19 | A kind of flitch lifting mechanism |
| CN201821143269.5U Active CN208528735U (en) | 2018-02-23 | 2018-07-19 | A kind of crystal bar adjustment mechanism |
| CN201810794228.0A Pending CN108760780A (en) | 2018-02-23 | 2018-07-19 | Crystal bar oriented detection system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108362720A (en) * | 2018-02-23 | 2018-08-03 | 丹东新东方晶体仪器有限公司 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
| CN110000692B (en) * | 2019-04-29 | 2024-01-09 | 青岛高测科技股份有限公司 | Loading and unloading device for grinding process of semiconductor crystal bar and using method |
| CN110435024A (en) * | 2019-07-29 | 2019-11-12 | 浦江县恒凯水晶有限公司 | Crystal blank material cutting equipment |
| CN113829650B (en) * | 2020-06-24 | 2023-03-21 | 沈阳新松机器人自动化股份有限公司 | Rotary centering device and centering method |
| CN112289603B (en) * | 2020-11-12 | 2022-12-20 | 国网新疆电力有限公司巴州供电公司 | Trigger device for detecting effect of electronic fence |
| CN112606233B (en) * | 2020-12-15 | 2022-11-04 | 西安奕斯伟材料科技有限公司 | Crystal bar processing method and wafer |
| CN113608101B (en) * | 2021-06-28 | 2022-05-31 | 昆山兢美电子科技有限公司 | Flying probe testing device |
| CN113977785B (en) * | 2021-11-03 | 2023-05-09 | 丹东新东方晶体仪器有限公司 | Automatic crystal orientation measurement and polycrystalline rod bonding rechecking equipment |
| CN114910496B (en) * | 2022-05-23 | 2023-09-22 | 丹东奇伟企业管理咨询有限公司 | Crystal automatic orientation measurement device and measurement method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108362720A (en) * | 2018-02-23 | 2018-08-03 | 丹东新东方晶体仪器有限公司 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
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| CN203595676U (en) * | 2014-02-13 | 2014-05-14 | 南京京晶光电科技有限公司 | Device for confirming crystal face of crystal bar |
| CN104359928B (en) * | 2014-11-28 | 2017-01-11 | 温岭市朗杰机械设备有限公司 | Oscillation angle mechanism of automatic X-ray directional material sticking machine for round bar crystal |
| CN204214795U (en) * | 2014-11-28 | 2015-03-18 | 温岭市朗杰机械设备有限公司 | The directed sizing machine of the automatic X-ray of a kind of pole crystal |
| CN204666539U (en) * | 2015-06-08 | 2015-09-23 | 丹东新东方晶体仪器有限公司 | A kind of crystal three-dimensional orientation instrument |
| CN205951057U (en) * | 2016-08-30 | 2017-02-15 | 台州市双辉机械设备有限公司 | Directional sizing machine of crystal bar |
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2018
- 2018-02-23 CN CN201810155255.3A patent/CN108362720A/en active Pending
- 2018-07-19 CN CN201821143349.0U patent/CN208547592U/en active Active
- 2018-07-19 CN CN201821143259.1U patent/CN209207769U/en active Active
- 2018-07-19 CN CN201821143255.3U patent/CN209078925U/en active Active
- 2018-07-19 CN CN201821143269.5U patent/CN208528735U/en active Active
- 2018-07-19 CN CN201810794228.0A patent/CN108760780A/en active Pending
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108362720A (en) * | 2018-02-23 | 2018-08-03 | 丹东新东方晶体仪器有限公司 | A kind of semiconductor grade monocrystalline silicon crystal bar orientation test system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108362720A (en) | 2018-08-03 |
| CN108760780A (en) | 2018-11-06 |
| CN108943451A (en) | 2018-12-07 |
| CN208547592U (en) | 2019-02-26 |
| CN209207769U (en) | 2019-08-06 |
| CN208528735U (en) | 2019-02-22 |
| CN209078925U (en) | 2019-07-09 |
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