CN108901114A - A kind of generating device of plasma jet - Google Patents
A kind of generating device of plasma jet Download PDFInfo
- Publication number
- CN108901114A CN108901114A CN201810845748.XA CN201810845748A CN108901114A CN 108901114 A CN108901114 A CN 108901114A CN 201810845748 A CN201810845748 A CN 201810845748A CN 108901114 A CN108901114 A CN 108901114A
- Authority
- CN
- China
- Prior art keywords
- outer conductor
- slit
- plasma jet
- guard mechanism
- flap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
The present invention relates to a kind of generating devices of plasma jet, the device is coupled with microwave power supply, the device includes waveguide assemblies and the bottom guard mechanism set on waveguide assemblies bottom, the waveguide assemblies include the inner conductor and outer conductor of coaxial arrangement, the inner conductor is set in outer conductor, air inlet is equipped with above the side wall of the outer conductor, it is equipped with below the side wall of the outer conductor and extends to outer conductor bottom, and the first slit penetrated through radially, the bottom guard mechanism is mobile in the downward vertical of outer conductor by the first slit, the bottom guard mechanism is equipped with the baffle component that can adjust shielded area.Compared with prior art, the present invention has many advantages, such as of simple structure and low cost, easy to adjust.
Description
Technical field
The present invention relates to technical field of plasma, more particularly, to a kind of generating device of plasma jet.
Background technique
Gas molecule partially or completely ionizes after obtaining energy, to reach plasma state.Gas in plasma state
Body is in quasi-electroneutrality, i.e., under the conditions of macroscopical spatial and temporal scales, has equivalent heterocharge.
In traditional industrial application, generally takes and generate plasma at low pressure.Typically, external by adjusting
Electric and magnetic fields, make energy priority transmitting electron rather than heavy particle, and the energy transmitted is transmitted to weight by the collision of electronics again
Particle makes its excitation ionization, to generate high active substance.Low pressure increases the mean free path of electronics, and therefore
Enough energy can be obtained.In practice, using extrinsic motivated source, when generated in a limited cavity plasma it
Afterwards, then with air-flow by generated plasma discharging chamber is blown out, to form plasma jet.
Plasma temperature caused by atmosphere pressure plasma jet flow technology is low, and activity concentration is high, therefore
Material modification, sterilizing, environmental protection etc. application are very wide.However, conventional atmosphere pressure plasma jet flow generation device knot
Structure is complicated, means with high costs and adjusting plasma jet are limited.
Summary of the invention
Simple, cost that it is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide a kind of structures
It is cheap, and can be easy to adjust plasma jet generating device.
The purpose of the present invention can be achieved through the following technical solutions：
A kind of generating device of plasma jet, the device are coupled with microwave power supply, the device include waveguide assemblies and
Bottom guard mechanism set on waveguide assemblies bottom, the waveguide assemblies include the inner conductor and outer conductor of coaxial arrangement, and
This coaxial configuration characteristic size will not end corresponding electromagnetic wave.
The inner conductor is set in outer conductor, and the length of inner conductor is less than the length of outer conductor, and inner conductor with lead outside
The relative size of body coaxial arrangement will not end corresponding electromagnetic wave.The upper end of inner conductor and outer conductor is close by sealing material
Envelope.The bottom of the outer conductor is open-like shape, is equipped with multiple air inlets, the side of the outer conductor above the side wall of outer conductor
It is equipped with the first slit for extending to outer conductor bottom and penetrating through radially below wall, the bottom guard mechanism passes through the
One slit is mobile in the downward vertical of outer conductor, and the bottom guard mechanism is equipped with the baffle that can adjust the level barrier area
Component.
Preferably, the bottom guard mechanism includes baffle component and the handle that connect with the baffle component, described
One end of baffle component is bonded with the inner surface of outer conductor, and the handle is limited in the first slit, and the handle is along
Axial path defined by one slit is mobile.
Preferably, the baffle component includes the first flap and second flap of setting concentric and stacked on top of one another, and first
Baffle is identical with the form and dimension of second flap, first flap, second flap each by disk carry out 2N equal part, and by
One compartment of terrain removes the sector as the 1/2N of the circle and is formed, and baffle component is adjusted by rotating the second flap positioned at lower layer
Whole opening area.
Preferably, the outer conductor is cylindrical structure.
Preferably, polytetrafluoroethylene (PTFE) can be used in sealing material.
Preferably, multiple air inlets are evenly distributed on the side wall of outer conductor centered on the center of circle of cylindrical structure.
Preferably, gap guard mechanism is additionally provided between the guard mechanism of bottom at the upper opening of the first slit, the gap
Guard mechanism is set on outer conductor, and the gap guard mechanism includes blocking item and fixing piece, and described blocks item along first
Axial direction where slit is set on the inner wall of outer conductor, on outer wall or in side wall.When blocking item along the axial direction where the first slit
When in the side wall of outer conductor, the side wall of outer conductor can be hollow structure.The lower section for blocking item, which is equipped with, radially to be penetrated through
Through-hole, size and the size of baffle component or the size of handle of the through-hole match, gap guard mechanism to be fixed on
On the guard mechanism of bottom.The top for blocking item is equipped with the second slit radially penetrated through, and the fixing piece passes through the second slit
Item will be blocked to be connected on the inner wall of outer conductor, on outer wall or in side wall.Gap can be driven to hide when adjusting with bottom guard mechanism
Retaining device moves up and down, and gap guard mechanism protects the gap formed between the guard mechanism of bottom at the upper opening of the first slit
It holds as occlusion state.
Preferably, the bottom of the outer conductor, which is equipped with, can open and be closed the first slit in outer conductor bottom opening
Block.
Gas enters in waveguide assemblies from air inlet, and microwave is transmitted in outer conductor by microwave power supply by waveguide assemblies
Portion, when outer conductor lower section is closed state, waveguide assemblies form resonant cavity, and microwave forms Stable distritation electricity in intra resonant cavity
Magnetic field, local enhancement electric field cause to ionize, and form plasma, in the process, by the position for adjusting bottom guard mechanism
The height of adjustable resonant cavity, meanwhile, the shielded area by adjusting baffle component can adjust openings of sizes, and then adjust etc. from
The flux of daughter jet stream.
Compared with prior art, the present invention has the following advantages that：
(1) present invention can be by blocking the volume of the discharge space for moving up and down adjusting waveguide assemblies of component, and then promotees
Into the power match of waveguide assemblies and microwave power supply；In addition, pass through the first flap and/or second flap of rotary setting, it can be square
Just change the opening area of baffle component, and then promote the power match of waveguide assemblies and microwave power supply, to adjust and excellent
Plasma jet degree, easy to adjust, flexible caused by changing；
(2) the configuration of the present invention is simple, low in cost, can be widely used to promote.
Detailed description of the invention
Fig. 1 is the schematic diagram of the section structure of the atmosphere pressure plasma jet flow generation device of one embodiment of the present invention；
Fig. 2 is the overlooking structure diagram of the baffle component of one embodiment of the present invention, wherein Fig. 2 (a) is baffle group
Part is in the overlooking structure diagram of original state, and Fig. 2 (b) is that the plan structure after baffle component relative rotation certain angle is shown
It is intended to；
Fig. 3 (a) is the schematic diagram of the section structure of the gap guard mechanism of one embodiment of the present invention, and Fig. 3 (b) is the sky
Gap guard mechanism is moved to the schematic diagram of the section structure of outer conductor partial below；
Fig. 4 (a) is the schematic diagram of the section structure of the gap guard mechanism of another position of the present invention, and Fig. 4 (b) is the gap
Guard mechanism is moved to the schematic diagram of the section structure of outer conductor partial below；
Fig. 5 (a) is the schematic diagram of the section structure of the gap guard mechanism of another position of the present invention, and Fig. 5 (b) is the gap
Guard mechanism is moved to the schematic diagram of the section structure of outer conductor partial below；
Shown in figure label：
110, inner conductor, 120, outer conductor, 130, sealing material, 121, air inlet, the 150, first slit, 160, hollow
Portion, 140, bottom guard mechanism, 141, baffle component, 142, handle, 300, gap guard mechanism, 310, block item, 320, solid
Determine part, the 311, second slit, 312, through-hole, 210-1, first flap do not remove portion, 220-1, first flap removal portion, 210-2,
Second flap does not remove portion, 220-3, removal part.
Specific embodiment
The present invention is described in detail with specific embodiment below in conjunction with the accompanying drawings.
Embodiment 1
The present invention relates to a kind of generating devices of plasma jet, as shown in Figure 1, the device includes waveguide assemblies, bottom
Portion's guard mechanism 140 and gap guard mechanism 300.
Waveguide assemblies include inner conductor 110 and outer conductor 120, inner conductor 110 and the coaxial arrangement of outer conductor 120 and inner conductor
110 are set in outer conductor 120.Outer conductor 120 is cylinder.Outer conductor 120 is greater than the length of inner conductor 110 along axial length
Degree, so that the lower end of inner conductor 110 is surrounded by outer conductor 120, the coaxial configuration characteristic size of outer conductor 120 and inner conductor 110
Corresponding electromagnetic wave will not be ended.The lower end of outer conductor 120 is unlimited.The upper end of inner conductor 110 and outer conductor 120 passes through close
Closure material 130 seals.Polytetrafluoroethylene (PTFE) (PTFE) can be used in sealing material 130.
The upper end of inner conductor 110 and outer conductor 120 is coupled with N-type resonator (not shown), which can be by same
Shaft cable is coupled with microwave power supply (not shown), so that the power that microwave power supply is provided is supplied to atmosphere pressure plasma jet flow
The waveguide assemblies of generation device.
Outer conductor 120 is provided with multiple air inlets 121 on side wall.Air inlet 121 centered on the center of circle of cylindrical structure,
It is evenly distributed on the side wall of outer conductor 120.Multiple gas flow valve (not shown) can be with multiple 121 fluid-type couplings of air inlet
It closes.The first slit 150 that the side wall of outer conductor 120 is provided with the bottom end for extending to outer conductor 120 and penetrates through radially.
Bottom guard mechanism 140 includes baffle component 141 and the handle 142 connecting with the baffle component 141.Baffle group
One end of part 141 is bonded with the inner surface of outer conductor 120.Handle 142 is limited in the first slit 150, and can be along first
Axial path defined by slit 150 is mobile, so that baffle component 141 be driven to move together.Shown in Fig. 1 with two dashed patterns
The extreme higher position and extreme lower position that bottom guard mechanism 140 can be moved to.Extreme higher position is the top position of the first slit 150
It sets, extreme lower position is the bottom position of outer conductor 120.Atmosphere pressure plasma jet flow generation device can pass through bottom guard mechanism
140 movement easily adjusts the volume of the discharge space of waveguide assemblies, this can promote the function of waveguide assemblies and microwave power supply
Rate matching, to adjust and optimize generated plasma jet.
The bottom end of outer conductor 120 is equipped with block (not shown).The block can open and be closed the first slit 150 and lead outside
The opening of the bottom end of body 120.When the block, which is closed, to be open, the movement of bottom guard mechanism 140 can be fully defined in the
In one slit 150, without being dropped out along the first slit 150 from the bottom end of outer conductor 120.It, can be from when the block, which is opened, to be open
The opening of first slit 150 takes out bottom guard mechanism 140, to be safeguarded and be adjusted.
Baffle component 141 includes first flap and second flap, in the top view shown in Fig. 2 (a) and Fig. 2 (b), due to
First flap and second flap are overlapped, therefore only show the profile of a baffle.First flap and second flap are laminated with one heart
Ground setting, and shapes and sizes are identical.First flap and second flap are spaced one by one each by carrying out 2N equal part to circle
Ground removes the sector as the 1/2N of the circle and is formed, wherein N is positive integer.N in the present embodiment is taken as 3.
Fig. 2 (a) shows first flap and does not remove portion 210-1 and first flap removal portion 220-1.For clarity, do not have
Show the first flap remaining do not remove part and removal part.Under original state shown in Fig. 2 (a), first flap
The each of portion (or removal portion) and second flap is not removed respectively not remove portion (or removal portion) and be aligned respectively, therefore, baffle component 141
Opening area determined by the area of three first flap removal portion 220-1.Fig. 2 (b) shows second flap relative to first gear
Piece rotate by a certain angle after situation.In this case, a part of second flap leaves, i.e., second flap does not remove portion 210-
2, and the area for removing part 220-3 that the removal part of first flap and second flap determines jointly is relative to institute in Fig. 2 (a)
The first flap removal portion 220-1 shown reduces.Pass through the first flap and/or second flap of rotary setting, it is convenient to change
The opening area of baffle component 141, and then promote the power match of waveguide assemblies and microwave power supply, it further adjusts and optimizes institute
The plasma jet of generation.
When bottom guard mechanism 140 is when the lower end of outer conductor 120 is mobile, the top of bottom guard mechanism 140 is by first
The part of the exposure of slit 150 forms gap, which fails to obstruct the flowing of gas between 120 inside of outer conductor and outside, because
This can generate flow-disturbing, this can generate certain interference to generated plasma jet.For the envelope for guaranteeing single unit system work
Closing property, the present invention arrive at the upper opening of the first slit 150 and are provided with gap guard mechanism 300 between bottom guard mechanism 140.
The gap guard mechanism 300 is set on the inner wall of outer conductor 120.As shown in Fig. 3 (a), Fig. 3 (b), gap guard mechanism 300 is wrapped
It includes and blocks item 310 and fixing piece 320.Block the inner wall that item 310 is set to outer conductor 120 along the axial direction where the first slit 150.It hides
Blend stop 310 is provided with the second slit 311 radially penetrated through near upper end, and lower end be provided with radially penetrate through it is logical
Hole 312.The inner wall that fixing piece 320 will be blocked item 310 and be connected to outer conductor 120 by the second slit 311.Block component in bottom
140 baffle component 141 passes through through-hole 312.Component 140 is blocked by during moving down, by logical in bottom as a result,
Hole 312 drives and blocks item 310 and move down, and blocks the 311 occlusion item 310 of the second slit of item 310 along axial direction in certain model
Interior movement is enclosed, while blocking can blocking during component 140 moves down in bottom without slit section for item 310 and blocking first
The gap that slit 150 generates.
Gap guard mechanism 300 can be also set on the outer wall of outer conductor 120.As shown in Fig. 4 (a) and Fig. 4 (b).Gap hides
Retaining device 300 includes blocking item 310 and fixing piece 320.It blocks item 310 and is set to outer conductor along the axial direction where the first slit 150
120 outer wall.It blocks item 310 and is provided with the second slit 311 radially penetrated through near upper end, and be provided with edge in lower end
The through-hole 312 radially penetrated through.The outer wall that fixing piece 320 will be blocked item 310 and be connected to outer conductor 120 by the second slit 311.Bottom
The handle 142 that component 140 is blocked in portion passes through through-hole 312.
Gap guard mechanism 300 can be also set in the side wall of outer conductor 120.Outer conductor 120 is equipped with hollow portion 160.Such as Fig. 5
(a) and shown in Fig. 5 (b).Gap guard mechanism 300 includes blocking item 310 and fixing piece 320.Item 310 is blocked along the first slit
Axial direction where 150 is set in the hollow portion 160 of outer conductor 120.It blocks articles 310 and is provided with radially penetrated through near upper end
Two slits 311, and the through-hole 312 radially penetrated through is provided in lower end.Fixing piece 320 will be hidden by the second slit 311
Blend stop 310 is connected to the outer wall of outer conductor 120.The handle 142 that component 140 is blocked in bottom passes through through-hole 312.
The operation principle of the present invention is that：
Gas enters in waveguide assemblies from air inlet 121, and microwave is transmitted to outer conductor by waveguide assemblies by microwave power supply
When 120 inside below outer conductor 120 is closed state, waveguide assemblies form resonant cavity, and microwave formed in intra resonant cavity
Stable distritation electromagnetic field, local enhancement electric field cause to ionize, and form plasma, in the process, adjust bottom guard mechanism
The height of the adjustable resonant cavity in 140 position, meanwhile, the adjustable openings of sizes of shielded area of baffle component 141 is adjusted,
And then adjust the flux of plasma jet.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
The staff for being familiar with the art in the technical scope disclosed by the present invention, can readily occur in various equivalent modifications or replace
It changes, these modifications or substitutions should be covered by the protection scope of the present invention.Therefore, protection scope of the present invention should be with right
It is required that protection scope subject to.
Claims (10)
1. a kind of generating device of plasma jet, which is characterized in that the device is coupled with microwave power supply, which includes wave
Guide assembly and bottom guard mechanism set on waveguide assemblies bottom, the waveguide assemblies include the inner conductor of coaxial arrangement and outer
Conductor, the inner conductor are set in outer conductor, and the upper end of the inner conductor and outer conductor is sealing state, described outer to lead
The bottom of body is open-like shape, and multiple air inlets, the side wall lower section of the outer conductor are equipped with above the side wall of the outer conductor
Equipped with the first slit for extending to outer conductor bottom and penetrating through radially, the bottom guard mechanism passes through the first slit
Mobile in the downward vertical of outer conductor, the bottom guard mechanism is equipped with the baffle component that can adjust the level barrier area；
Gas enters in waveguide assemblies from air inlet, and microwave is transmitted to the inside of outer conductor by microwave power supply by waveguide assemblies,
When being closed state below outer conductor, waveguide assemblies form resonant cavity, and microwave forms Stable distritation electromagnetism in intra resonant cavity
, local enhancement electric field causes to ionize, and forms plasma, in the process, adjusts the position of bottom guard mechanism to adjust
Resonant cavity height adjusts the shielded area of baffle component to adjust openings of sizes, and then adjusts the flux of plasma jet.
2. a kind of generating device of plasma jet according to claim 1, which is characterized in that block the bottom
Mechanism includes baffle component and the handle that connect with the baffle component, one end of the baffle component and the inner surface of outer conductor
Fitting, the handle is limited in the first slit, and handle axial path defined by the first slit moves.
3. a kind of generating device of plasma jet according to claim 2, which is characterized in that the baffle component
The form and dimension phase of first flap and second flap including setting concentric and stacked on top of one another, first flap and second flap
Together, first flap, second flap carry out 2N equal part each by disk, and compartment of terrain removes the 1/2N's as the circle one by one
Fan-shaped and is formed, baffle component adjusts opening area by rotating the second flap positioned at lower layer.
4. a kind of generating device of plasma jet according to claim 1, which is characterized in that the inner conductor
Length is less than the length of outer conductor, and inner conductor meets the corresponding electromagnetic wave of conducting with relative size that outer conductor is coaxially disposed
For condition.
5. a kind of generating device of plasma jet according to claim 1, which is characterized in that the outer conductor is
Cylindrical structure.
6. a kind of generating device of plasma jet according to claim 1, which is characterized in that the inner conductor with
The upper end of outer conductor is sealed by sealing material.
7. a kind of generating device of plasma jet according to claim 5, which is characterized in that multiple air inlets are with circle
Centered on the center of circle of column construction, it is evenly distributed on the side wall of outer conductor.
8. a kind of generating device of plasma jet according to claim 2, which is characterized in that opened on the first slit
Gap guard mechanism is additionally provided between the guard mechanism of bottom at mouthful, which includes blocking item and fixing piece, institute
That states blocks item along the inner wall that the axial direction where the first slit is set to outer conductor, on outer wall or in side wall, and described blocks item
Lower section be equipped with to the through-hole that is fixed on the guard mechanism of bottom, the size of the through-hole and the size of baffle component or handle
Size matches.
9. a kind of generating device of plasma jet according to claim 8, which is characterized in that the described item that blocks
Top is equipped with the second slit radially penetrated through, and the fixing piece is connected in outer conductor by the second slit by item is blocked
On wall, on outer wall or in side wall.
10. a kind of generating device of plasma jet according to claim 1, which is characterized in that the outer conductor
Bottom be equipped with can open and be closed the first slit in the block of outer conductor bottom opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810845748.XA CN108901114B (en) | 2018-07-27 | 2018-07-27 | Plasma jet generating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810845748.XA CN108901114B (en) | 2018-07-27 | 2018-07-27 | Plasma jet generating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108901114A true CN108901114A (en) | 2018-11-27 |
| CN108901114B CN108901114B (en) | 2020-07-10 |
Family
ID=64352329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810845748.XA Active CN108901114B (en) | 2018-07-27 | 2018-07-27 | Plasma jet generating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108901114B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110267425A (en) * | 2019-06-21 | 2019-09-20 | 电子科技大学 | A kind of combined type double coaxial line atmos low-temperature microwave plasma jet source |
| CN110677969A (en) * | 2019-10-24 | 2020-01-10 | 上海工程技术大学 | Plasma jet device |
| CN110996487A (en) * | 2019-11-08 | 2020-04-10 | 上海工程技术大学 | Plasma jet device and method for controlling power supply through feedback link |
| WO2021259133A1 (en) * | 2020-06-22 | 2021-12-30 | 江苏鲁汶仪器有限公司 | Stopper for ion beam etching chamber |
| CN114184567A (en) * | 2021-12-03 | 2022-03-15 | 渤海大学 | Infrared radiation shielding device and infrared detector calibration method based on same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2327093A1 (en) * | 1998-04-02 | 1999-10-14 | Heinz-Jurgen Blum | Plasma torch with a microwave transmitter |
| JP4127660B2 (en) * | 2003-03-28 | 2008-07-30 | 三菱電機株式会社 | Microwave plasma torch device |
| CN101998747A (en) * | 2009-08-19 | 2011-03-30 | 中国科学院金属研究所 | Low-temperature plasma device |
| CN106304602A (en) * | 2016-09-26 | 2017-01-04 | 吉林大学 | A kind of microwave coupling plasma resonant |
-
2018
- 2018-07-27 CN CN201810845748.XA patent/CN108901114B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2327093A1 (en) * | 1998-04-02 | 1999-10-14 | Heinz-Jurgen Blum | Plasma torch with a microwave transmitter |
| JP4127660B2 (en) * | 2003-03-28 | 2008-07-30 | 三菱電機株式会社 | Microwave plasma torch device |
| CN101998747A (en) * | 2009-08-19 | 2011-03-30 | 中国科学院金属研究所 | Low-temperature plasma device |
| CN106304602A (en) * | 2016-09-26 | 2017-01-04 | 吉林大学 | A kind of microwave coupling plasma resonant |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110267425A (en) * | 2019-06-21 | 2019-09-20 | 电子科技大学 | A kind of combined type double coaxial line atmos low-temperature microwave plasma jet source |
| CN110677969A (en) * | 2019-10-24 | 2020-01-10 | 上海工程技术大学 | Plasma jet device |
| CN110996487A (en) * | 2019-11-08 | 2020-04-10 | 上海工程技术大学 | Plasma jet device and method for controlling power supply through feedback link |
| WO2021259133A1 (en) * | 2020-06-22 | 2021-12-30 | 江苏鲁汶仪器有限公司 | Stopper for ion beam etching chamber |
| CN114184567A (en) * | 2021-12-03 | 2022-03-15 | 渤海大学 | Infrared radiation shielding device and infrared detector calibration method based on same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108901114B (en) | 2020-07-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108901114A (en) | A kind of generating device of plasma jet | |
| US7619363B2 (en) | Electronic energy switch | |
| EP2428103B1 (en) | Isotope production system and cyclotron having a magnet yoke with a pump acceptance cavity | |
| ES2367914T3 (en) | ENERGY SYSTEM FOR STERILIZATION SYSTEMS THAT USE LOW FREQUENCY PLASMA. | |
| US10083815B2 (en) | Adjustable mass resolving aperture | |
| EP3456159B1 (en) | Ion beam filter for a neutron generator | |
| WO2009051697A1 (en) | Charged particle accelerators, radiation sources, systems, and methods | |
| WO2010129100A1 (en) | Isotope production system and cyclotron | |
| CN102307426A (en) | Plasma generating device | |
| CN107946159A (en) | A kind of adjustable ion gun and electrostatic confinement fusion reactor | |
| US11114760B2 (en) | Magnetic shutter antenna | |
| CN206401038U (en) | A kind of spallation neutron target fast neutron filtering device | |
| CN206237662U (en) | A kind of electron gun anti-return not coaxial with linear accelerating pipe bangs electron linear accelerator | |
| KR101880433B1 (en) | Apparatus for Magic-Tee Waveguide for High Frequency Power Conversion | |
| US20120235602A1 (en) | Linear accelerator | |
| CN110364060A (en) | It is a kind of for studying the experimental provision of magnetic coil line | |
| CN110234195A (en) | Resonant cavity type ecr plasma source device and method | |
| CN106531598B (en) | Can mechanical frequency modulation L-band transit-time oscillator | |
| KR101621374B1 (en) | Rotatable vacuum head of vacuum suction device | |
| JP3121669B2 (en) | Microwave plasma generator | |
| JP3953940B2 (en) | High frequency acceleration cavity and particle beam accelerator using the same | |
| CN106394875B (en) | A kind of spark-type synthesizing jet-flow exciter and its control method based on solenoid valve | |
| CN105691585A (en) | Hydrogen ion gas-filled aircraft | |
| CN106130509B (en) | Rotate radial impulse generator and its method for generation | |
| CN110329784A (en) | Conveying device and process equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |