CN108873449B - Color filter substrate and liquid crystal display device - Google Patents
Color filter substrate and liquid crystal display device Download PDFInfo
- Publication number
- CN108873449B CN108873449B CN201810639386.9A CN201810639386A CN108873449B CN 108873449 B CN108873449 B CN 108873449B CN 201810639386 A CN201810639386 A CN 201810639386A CN 108873449 B CN108873449 B CN 108873449B
- Authority
- CN
- China
- Prior art keywords
- color
- sub
- resistance layer
- layer
- color resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 185
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 44
- 125000006850 spacer group Chemical group 0.000 claims abstract description 246
- 239000011159 matrix material Substances 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000010410 layer Substances 0.000 claims description 441
- 239000011241 protective layer Substances 0.000 claims description 21
- 239000010409 thin film Substances 0.000 claims description 18
- 230000000149 penetrating effect Effects 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 20
- 238000010586 diagram Methods 0.000 description 10
- 239000003086 colorant Substances 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 4
- 238000002161 passivation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
A color filter substrate comprises a transparent substrate, and a color resistance layer, a black matrix and a columnar spacer which are arranged on the transparent substrate, wherein the black matrix is arranged on a first surface of the transparent substrate, and the color resistance layer is arranged on the first surface of the transparent substrate and covers the black matrix; the color resistance layer is provided with a body part and a convex block extending and protruding from the body part to the direction far away from the transparent substrate; the columnar spacer comprises a main spacer and an auxiliary spacer, the main spacer is arranged above the position of the bump, and the auxiliary spacer is arranged above the body part. The color filter substrate of the invention does not need to use a half-tone photomask process when manufacturing the columnar spacer, thereby effectively reducing the production cost and ensuring that the manufactured columnar spacer has uniform supporting strength. The invention also relates to a liquid crystal display device.
Description
Technical Field
The invention relates to the technical field of liquid crystal display, in particular to a color filter substrate and a liquid crystal display device.
Background
A Thin Film Transistor-Liquid Crystal Display (TFT-LCD) has the advantages of good picture quality, small size, light weight, low driving voltage, low power consumption, no radiation, and relatively low manufacturing cost, and is currently dominant in the field of flat panel displays.
As shown in fig. 1 and 2, the tft lcd generally includes an array substrate 10, a color filter substrate 20, and a liquid crystal layer (not shown) sandwiched between the array substrate 10 and the color filter substrate 20. Thin Film Transistors (TFTs) 11 arranged in a Matrix are generally disposed on the array substrate 10, and a color resist layer 21 for filtering light, a Black Matrix (BM) 22 for shielding light and preventing color mixing of different colors of light, a protective layer 23, and a column Spacer (PS) 30 disposed on the protective layer 23 for supporting a Cell Gap (Cell Gap) between the array substrate 10 and the color filter substrate 20 are generally disposed on the color filter substrate 20. The column spacer 30 generally includes a Main spacer (Main PS)31 and an auxiliary spacer (Sub PS)32, and the height of the Main spacer 31 is higher than that of the auxiliary spacer 32, that is, the upper surface 31a of the Main spacer 31 on the side away from the color filter substrate 20 is closer to the array substrate 10 than the upper surface 32a of the auxiliary spacer 32 on the side away from the color filter substrate 20, and there is a height difference H between the Main spacer 31 and the auxiliary spacer 32, when the array substrate 10 of the tft lcd and the color filter substrate 20 are attached, the Main spacer 31 abuts against the array substrate 10, and the auxiliary spacer 32 is spaced apart from the array substrate 10. The main spacer 31 is a columnar spacer 30 that always supports the tft-lcd under normal operating conditions, and when the tft-lcd is subjected to excessive external pressure, the auxiliary spacer 32 is added to support the array substrate 10 together with the main spacer 31 to increase the supporting strength of the columnar spacer 30.
The material of the column spacer 30 is generally a photoresist material, and because the main spacers 31 and the auxiliary spacers 32 have different heights, when manufacturing the column spacer 30, a Half-tone Mask (Half-tone Mask) process is usually adopted to manufacture the main spacers 31 and the auxiliary spacers 32 having different heights in the same process through exposure, development and other steps. Since the halftone mask process is to form the columnar spacers 30 with different heights under different illumination intensities, the higher exposure intensity will affect the columnar spacers 30 with lower exposure intensity, so that the supporting strength is lowered. Moreover, the halftone mask has a long production period and high cost, which is not conducive to reducing the production cost.
Disclosure of Invention
The invention provides a color filter substrate and a liquid crystal display device, which do not need a halftone mask process when manufacturing a columnar spacer, effectively reduce the production cost, and make the supporting strength of the columnar spacer uniform.
The embodiment of the invention provides a color filter substrate, which comprises a transparent substrate, and a color resistance layer, a black matrix and a columnar spacer which are arranged on the transparent substrate, wherein the black matrix is arranged on the first surface of the transparent substrate, and the color resistance layer is arranged on the first surface of the transparent substrate and covers the black matrix; the color resistance layer is provided with a body part and a convex block extending and protruding from the body part to the direction far away from the transparent substrate; the columnar spacer comprises a main spacer and an auxiliary spacer, the main spacer is arranged above the position of the bump, and the auxiliary spacer is arranged above the body part.
The embodiment of the invention also provides a color filter substrate, which comprises a transparent substrate, and a color resistance layer, a black matrix and a columnar spacer which are arranged on the transparent substrate, wherein the black matrix is arranged on the first surface of the transparent substrate, and the color resistance layer is arranged on the first surface of the transparent substrate and covers the black matrix; the color resistance layer is provided with a body part, a convex block extending and protruding from the body part to the direction far away from the transparent substrate and a through hole penetrating through the body part; the columnar spacer comprises a main spacer and an auxiliary spacer, the main spacer is arranged above the position of the bump, the auxiliary spacer is arranged in the through hole, or the auxiliary spacer is respectively arranged above the body part and in the through hole.
The embodiment of the invention also provides a color filter substrate, which comprises a transparent substrate, and a color resistance layer, a black matrix and a columnar spacer which are arranged on the transparent substrate, wherein the black matrix is arranged on the first surface of the transparent substrate, and the color resistance layer is arranged on the first surface of the transparent substrate and covers the black matrix; the color resistance layer is provided with a body part and a through hole penetrating through the body part; the columnar spacer comprises a main spacer and an auxiliary spacer, the main spacer is arranged above the body part, and the auxiliary spacer is arranged in the through hole.
Furthermore, the color resistance layer comprises a first color resistance layer, a second color resistance layer and a third color resistance layer, wherein the first color resistance layer, the second color resistance layer and the third color resistance layer are sequentially arranged in a circulating mode, the boundary position of the first color resistance layer, the second color resistance layer and the third color resistance layer corresponds to the range of the position of the black matrix, the lug is formed by overlapping two adjacent color resistance layers in the color filter substrate with the lug, and the through hole is formed by oppositely enclosing gaps of the two adjacent color resistance layers in the color filter substrate with the through hole.
Further, the first color resistance layer comprises a first sub color resistance layer and a second sub color resistance layer, the second color resistance layer comprises a third sub color resistance layer and a fourth sub color resistance layer, the third color resistance layer comprises a fifth sub color resistance layer and a sixth sub color resistance layer, the first sub color resistance layer, the third sub color resistance layer, the fifth sub color resistance layer, the second sub color resistance layer, the fourth sub color resistance layer and the sixth sub color resistance layer are sequentially arranged to form a group of patterns used for repeated arrangement, the patterns of the first sub color resistance layer, the third sub color resistance layer and the fifth sub color resistance layer are the same, and the patterns of the second sub color resistance layer, the fourth sub color resistance layer and the sixth sub color resistance layer are the same.
Furthermore, the main spacer and the auxiliary spacer are manufactured in the same photomask manufacturing process, and the main spacers and the auxiliary spacers have the same height.
Further, the main spacer has a second surface far away from the transparent substrate, the auxiliary spacer has a third surface far away from the transparent substrate, and the distance from the second surface of the main spacer to the first surface of the transparent substrate is greater than the distance from the third surface of the auxiliary spacer to the first surface of the transparent substrate.
Furthermore, the space height difference H between the main spacer and the auxiliary spacer in the direction vertical to the transparent substrate is less than or equal to 0.5 μm.
Furthermore, the color filter substrate further comprises a protective layer, the protective layer is arranged on the color resistance layer and covers the whole color resistance layer, and the columnar spacer is arranged on the protective layer.
The embodiment of the invention also provides a liquid crystal display device, which comprises the color filter substrate, and further comprises an array substrate, wherein the array substrate comprises a plurality of scanning lines and a plurality of data lines, and the plurality of scanning lines and the plurality of data lines are arranged in a crossed manner to define a plurality of pixel units; a thin film transistor is arranged at the crossing position of the scanning line and the data line; the main spacer and the auxiliary spacer are arranged corresponding to the thin film transistor in the array substrate.
In the color filter substrate and the liquid crystal display device provided by the embodiment of the invention, the color resistance layer is provided with the bump or the through hole, the main spacer of the columnar spacer is arranged on the bump or the auxiliary spacer of the columnar spacer is arranged in the through hole, so that the main spacer and the auxiliary spacer with space height difference can be formed by a common photomask process when the columnar spacer is manufactured, a half-tone photomask process is not needed, the production cost is effectively reduced, the exposure intensity of the main spacer and the exposure intensity of the auxiliary spacer are consistent, and the support intensity of the manufactured columnar spacer is uniform.
Drawings
Fig. 1 is a partial cross-sectional view of a conventional tft-lcd device.
Fig. 2 is a partial structural schematic diagram of the tft-lcd device of fig. 1.
Fig. 3 is a partial cross-sectional view of a liquid crystal display device according to a first embodiment of the invention.
Fig. 4 is a schematic partial structure diagram of the color filter substrate of the liquid crystal display device of fig. 3.
Fig. 5 is a schematic partial structure view of a color filter substrate of a liquid crystal display device according to a second embodiment of the invention.
Fig. 6 is a partial structural view of fig. 5.
Fig. 7 is a partial cross-sectional view of a liquid crystal display device according to a third embodiment of the present invention.
Fig. 8 is a schematic partial structure diagram of the color filter substrate of the liquid crystal display device of fig. 7.
Fig. 9 is a schematic partial structure view of a color filter substrate of a liquid crystal display device according to a fourth embodiment of the invention.
Fig. 10 is a partial structural schematic diagram of fig. 9.
Fig. 11 is a partial cross-sectional view of a liquid crystal display device according to a fifth embodiment of the invention.
Fig. 12 is a schematic partial structure view of the color filter substrate of the liquid crystal display device of fig. 11.
Fig. 13 is a schematic partial structure view of a color filter substrate of a liquid crystal display device according to a sixth embodiment of the invention.
Fig. 14 is a partial structural view of fig. 13.
Detailed Description
To further illustrate the technical means and effects of the present invention adopted to achieve the predetermined objects, the following detailed description of the embodiments, structures, features and effects of the present invention will be made with reference to the accompanying drawings and examples.
First embodiment
Fig. 3 is a partial cross-sectional view of a liquid crystal display device according to a first embodiment of the invention, and fig. 4 is a partial structural view of a color filter substrate of the liquid crystal display device of fig. 3. as shown in fig. 3 and 4, the liquid crystal display device includes an array substrate 100, a color filter substrate 200, and a liquid crystal layer (not shown) sandwiched between the array substrate 100 and the color filter substrate 200.
The array substrate 100 is provided with a plurality of scan lines (not shown) and a plurality of data lines (not shown) on a side facing the color filter substrate 200, and the plurality of scan lines and the plurality of data lines are arranged to intersect to define a plurality of pixel units. A thin film transistor 110 is provided at the crossing position of the scan line and the data line. The thin film transistor 110 includes a gate electrode connected to a scan line adjacent to the thin film transistor 110, a source electrode connected to a data line adjacent to the thin film transistor 110, a drain electrode connected to a pixel electrode in a pixel unit, and a multi-layered insulating protective layer, etc. The specific structure of the tft 110 is well known to those skilled in the art and will not be described in detail herein.
The color filter substrate 200 includes a transparent substrate 201, a color resist layer 210 for filtering light, a black matrix 220 for shielding light and preventing color mixing of different colors of light, a protective layer 230, and a columnar spacer 300 for supporting a cell thickness of a liquid crystal layer between the array substrate 100 and the color filter substrate 200, which are disposed on a first surface 201a of the transparent substrate 201 facing the array substrate 100.
The black matrix 220 is disposed on the first surface 201a of the transparent substrate 201. The color resist layer 210 is disposed on the first surface 201a of the transparent substrate 201 and covers the black matrix 220, the protective layer 230 is disposed on the color resist layer 210, and the column spacer 300 is disposed on the protective layer 230, the column spacer 300 including a main spacer 310 and an auxiliary spacer 320.
Specifically, the color resist layer 210 has a body portion 211 and a projection 212 extending from the body portion 211 in a direction away from the transparent substrate 201 (i.e., in a direction close to the array substrate 100). The bumps 212 are used to dispose the main spacers 310 in the column spacers 300, and thus, the distribution positions of the bumps 212 correspond to the positions of the main spacers 310. In this embodiment, the position of the main spacer 310 corresponds to the position of the portion of the tft 110 in the array substrate 100, and therefore, the position of the bump 212 corresponds to the position of the portion of the tft 110 in the array substrate 100, but not limited thereto.
As shown in fig. 3 and 4, the color resist layer 210 includes a first color resist layer 215 (e.g., a red color resist layer), a second color resist layer 216 (e.g., a green color resist layer), and a third color resist layer 217 (e.g., a blue color resist layer), wherein the first color resist layer 215, the second color resist layer 216, and the third color resist layer 217 are sequentially and cyclically arranged. The boundary position of the first color-resist layer 215, the second color-resist layer 216, and the third color-resist layer 217 corresponds to the range where the black matrix 220 is located. In the present embodiment, the bump 212 is formed by overlapping two adjacent color-resist layers, such as the bump 212 shown in fig. 3 and 4 is formed by overlapping the second color-resist layer 216 and the third color-resist layer 217, but not limited thereto.
The overcoat layer 230 is disposed on the color resist layer 210 and covers the entire color resist layer 210.
The main spacer 310 of the pillar spacer 300 is disposed on the passivation layer 230 and above the position of the bump 212 of the color resist layer 210, and the main spacer 310 has a second surface 310a far from the transparent substrate 201. The auxiliary spacer 320 of the column spacer 300 is disposed on the protection layer 230 and above the body portion 211 of the color resist layer 210, and the auxiliary spacer 320 has a third surface 320a away from the transparent substrate 201. In this embodiment, the arrangement density of the main spacers 310 on the color filter substrate 200 is less than the arrangement density of the auxiliary spacers 320 on the color filter substrate 200 (i.e., the number of the auxiliary spacers 320 is greater than the number of the main spacers 310).
The column spacers 300 are generally made of photoresist, in this embodiment, the main spacers 310 and the auxiliary spacers 320 are fabricated by the same common mask process, therefore, the main spacers 310 and the auxiliary spacers 320 have the same height (i.e., the distance between the second surface 310a of the main spacer 310 and the surface thereof adjacent to the transparent substrate 201 is equal to the distance between the third surface 320a of the auxiliary spacer 320 and the surface thereof adjacent to the transparent substrate 201), however, since the main spacers 310 are disposed on the bumps 212, the distance from the second surface 310a of the main spacer 310 to the first surface 201a of the transparent substrate 201 is greater than the distance from the third surface 320a of the auxiliary spacer 320 to the first surface 201a of the transparent substrate 201, that is, there is a spatial height difference H between the main spacer 310 and the auxiliary spacer 320 in the direction perpendicular to the transparent substrate 201, and the spatial height difference H is preferably less than or equal to 0.5 μm.
In the liquid crystal display device and the color filter substrate 200 of the present embodiment, the bump 212 is disposed on the color resist layer 210, and the main spacer 310 of the pillar spacer 300 is disposed above the bump 212, so that the main spacer 310 and the auxiliary spacer 320 having a spatial height difference can be formed by a common mask process during the fabrication of the pillar spacer 300, without using a halftone mask process, thereby effectively reducing the production cost, and the exposure intensities of the main spacer 310 and the auxiliary spacer 320 are consistent, and the support intensities of the fabricated pillar spacers 300 are uniform.
Second embodiment
Fig. 5 is a partial structure diagram of a color filter substrate of a liquid crystal display device according to a second embodiment of the invention, and fig. 6 is a partial structure diagram of fig. 5, as shown in fig. 5 and fig. 6, in this embodiment, six rows of pixel units in a scanning line direction of a color resist layer 210 are repeatedly arranged as a group, and the patterns of the first row to the third row in each group are the same, and the patterns of the fourth row to the sixth row in each group are the same.
Specifically, the color resist layer 210 includes a first color resist layer 215 (e.g., a red resist layer), a second color resist layer 216 (e.g., a green resist layer), and a third color resist layer 217 (e.g., a blue resist layer).
The first color resist layer 215 includes a first sub-color resist layer 215a and a second sub-color resist layer 215b, the first sub-color resist layer 215a is located in the first column of pixel units in each group, and the second sub-color resist layer 215b is located in the fourth column of pixel units in each group; the second color resist layer 216 includes a third sub-color resist layer 216a and a fourth sub-color resist layer 216b, the third sub-color resist layer 216a is located in the second column of pixel units in each group, and the fourth sub-color resist layer 216b is located in the fifth column of pixel units in each group; the third color-resist layer 217 includes a fifth sub-color-resist layer 217a and a sixth sub-color-resist layer 217b, the fifth sub-color-resist layer 217a is located in the third column of pixel units in each group, and the sixth sub-color-resist layer 217b is located in the sixth column of pixel units in each group. That is, the first sub-color resist layer 215a of the first color resist layer 215, the third sub-color resist layer 216a of the second color resist layer 216, the fifth sub-color resist layer 217a of the third color resist layer 217, the second sub-color resist layer 215b of the first color resist layer 215, the fourth sub-color resist layer 216b of the second color resist layer 216, and the sixth sub-color resist layer 217b of the third color resist layer 217 are sequentially arranged to form a set of patterns for repeated arrangement, in addition, the patterns of the first sub-color resist layer 215a of the first color resist layer 215, the third sub-color resist layer 216a of the second color resist layer 216, and the fifth sub-color resist layer 217a of the third color resist layer 217 in each set are the same, the patterns of the second sub-color resist layer 215b of the first color resist layer 215, the fourth sub-color resist layer 216b of the second color resist layer 216, and the sixth sub-color resist layer 217b of the third color resist layer 217 in each set are the same, that is, the first color-resist layer 215, the second color-resist layer 216, and the third color-resist layer 217 may be formed by the same mask.
In fabricating the color resist layer 210, a first color resist layer 215, a second color resist layer 216 and a third color resist layer 217 are sequentially formed by exposing and developing negative resist materials of different colors. The first color-resisting layer 215, the second color-resisting layer 216 and the third color-resisting layer 217 of the embodiment have the same pattern profile, so that the first color-resisting layer, the second color-resisting layer and the third color-resisting layer can be manufactured by the same mask plate, and the production cost is effectively saved.
In this embodiment, the overlapped region of the first sub-color-resist layer 215a and the third sub-color-resist layer 216a, the overlapped region of the third sub-color-resist layer 216a and the fifth sub-color-resist layer 217a, and the overlapped region of the fifth sub-color-resist layer 217a and the second sub-color-resist layer 215b are formed with bumps 212, and the main spacers 310 may be selectively disposed on the bumps 212.
Other structures of this embodiment can be seen from the first embodiment, and are not described herein again.
Third embodiment
Fig. 7 is a partial cross-sectional view of a liquid crystal display device according to a third embodiment of the invention, and fig. 8 is a partial structural view of a color filter substrate of the liquid crystal display device of fig. 7. as shown in fig. 7 and 8, the liquid crystal display device includes an array substrate 100, a color filter substrate 200, and a liquid crystal layer (not shown) sandwiched between the array substrate 100 and the color filter substrate 200.
The side of the array substrate 100 facing the color filter substrate 200 is provided with a plurality of scan lines (not shown) and a plurality of data lines (not shown), and the plurality of scan lines and the plurality of data lines are arranged in an intersecting manner to define a plurality of pixel units. A thin film transistor 110 is provided at the crossing position of the scan line and the data line. The thin film transistor 110 includes a gate electrode connected to a scan line adjacent to the thin film transistor 110, a source electrode connected to a data line adjacent to the thin film transistor 110, a drain electrode connected to a pixel electrode in a pixel unit, and a multi-layered insulating protective layer, etc. The specific structure of the tft 110 is well known to those skilled in the art and will not be described in detail herein.
The color filter substrate 200 includes a transparent substrate 201, a color resist layer 210 for filtering light, a black matrix 220 for shielding light and preventing color mixing of different colors of light, a protective layer 230, and a columnar spacer 300 for supporting a cell thickness of a liquid crystal layer between the array substrate 100 and the color filter substrate 200, which are disposed on a first surface 201a of the transparent substrate 201 facing the array substrate 100.
The black matrix 220 is disposed on the first surface 201a of the transparent substrate 201. The color resist layer 210 is disposed on the first surface 201a of the transparent substrate 201 and covers the black matrix 220, the protective layer 230 is disposed on the color resist layer 210, and the column spacer 300 is disposed on the protective layer 230, the column spacer 300 including a main spacer 310 and an auxiliary spacer 320.
Specifically, the color resist layer 210 has a body portion 211 and a through hole 213 penetrating the body portion 211. The through holes 213 are used to dispose the auxiliary spacers 320 in the columnar spacers 300, and thus, the distribution positions of the through holes 213 correspond to the positions of the auxiliary spacers 320. In this embodiment, the position of the auxiliary spacer 320 corresponds to the position of the partial tft 110 in the array substrate 100, and therefore, the position of the through hole 213 corresponds to the position of the partial tft 110 in the array substrate 100, but not limited thereto.
As shown in fig. 7 and 8, the color resist layer 210 includes a first color resist layer 215 (e.g., a red color resist layer), a second color resist layer 216 (e.g., a green color resist layer), and a third color resist layer 217 (e.g., a blue color resist layer), wherein the first color resist layer 215, the second color resist layer 216, and the third color resist layer 217 are sequentially and cyclically arranged. The boundary position of the first color-resist layer 215, the second color-resist layer 216, and the third color-resist layer 217 corresponds to the range where the black matrix 220 is located. In this embodiment, the through hole 213 is formed by surrounding two adjacent color resist layers, that is, two adjacent color resist layers have a gap, and two gaps are opposite and surround to form one through hole 213, as shown in fig. 8, a plurality of through holes 213 are illustrated, each through hole 213 is formed by surrounding two adjacent color resist layers, and the black matrix 220 is exposed from the through holes 213.
The overcoat layer 230 is disposed on the color resist layer 210 and covers the entire color resist layer 210 and the black matrix 220 exposed from the through-hole 213 of the color resist layer 210.
The main spacer 310 of the column spacer 300 is disposed on the protection layer 230 and above the body portion 211 of the color resist layer 210, and the main spacer 310 has a second surface 310a far from the transparent substrate 201. The auxiliary spacer 320 of the pillar spacer 300 is disposed on the passivation layer 230 and in the through hole 213 of the color resist layer 210, and the auxiliary spacer 320 has a third surface 320a away from the transparent substrate 201. In this embodiment, the arrangement density of the main spacers 310 on the color filter substrate 200 is less than the arrangement density of the auxiliary spacers 320 on the color filter substrate 200 (i.e., the number of the auxiliary spacers 320 is greater than the number of the main spacers 310).
The column spacers 300 are generally made of photoresist, in this embodiment, the main spacers 310 and the auxiliary spacers 320 are fabricated by the same common mask process, therefore, the main spacers 310 and the auxiliary spacers 320 have the same height (i.e., the distance between the second surface 310a of the main spacer 310 and the surface thereof adjacent to the transparent substrate 201 is equal to the distance between the third surface 320a of the auxiliary spacer 320 and the surface thereof adjacent to the transparent substrate 201), however, since the auxiliary spacers 320 are disposed in the through holes 213, the distance from the second surface 310a of the main spacer 310 to the first surface 201a of the transparent substrate 201 is greater than the distance from the third surface 320a of the auxiliary spacer 320 to the first surface 201a of the transparent substrate 201, that is, there is a spatial height difference H between the main spacer 310 and the auxiliary spacer 320 in the direction perpendicular to the transparent substrate 201, and the spatial height difference H is preferably less than or equal to 0.5 μm.
In the liquid crystal display device and the color filter substrate 200 of the present embodiment, the through hole 213 is formed in the color resist layer 210, and the auxiliary spacers 320 of the columnar spacers 300 are disposed in the through hole 213, so that the main spacers 310 and the auxiliary spacers 320 having a spatial height difference can be formed by a common mask process during manufacturing the columnar spacers 300, without using a halftone mask process, thereby effectively reducing the production cost, and the exposure intensities of the main spacers 310 and the auxiliary spacers 320 are consistent, and the manufactured columnar spacers 300 have uniform supporting strength.
Fourth embodiment
Fig. 9 is a partial structure diagram of a color filter substrate of a liquid crystal display device according to a fourth embodiment of the invention, and fig. 10 is a partial structure diagram of fig. 9, as shown in fig. 9 and fig. 10, in this embodiment, six rows of pixel units in a scanning line direction of a color resist layer 210 are repeatedly arranged as a group, and the patterns of the first row to the third row in each group are the same, and the patterns of the fourth row to the sixth row in each group are the same.
Specifically, the color resist layer 210 includes a first color resist layer 215 (e.g., a red resist layer), a second color resist layer 216 (e.g., a green resist layer), and a third color resist layer 217 (e.g., a blue resist layer).
The first color resist layer 215 includes a first sub-color resist layer 215a and a second sub-color resist layer 215b, the first sub-color resist layer 215a is located in the first column of pixel units in each group, and the second sub-color resist layer 215b is located in the fourth column of pixel units in each group; the second color resist layer 216 includes a third sub-color resist layer 216a and a fourth sub-color resist layer 216b, the third sub-color resist layer 216a is located in the second column of pixel units in each group, and the fourth sub-color resist layer 216b is located in the fifth column of pixel units in each group; the third color-resist layer 217 includes a fifth sub-color-resist layer 217a and a sixth sub-color-resist layer 217b, the fifth sub-color-resist layer 217a is located in the third column of pixel units in each group, and the sixth sub-color-resist layer 217b is located in the sixth column of pixel units in each group. The patterns of the first sub-color-resisting layer 215a of the first color-resisting layer 215, the third sub-color-resisting layer 216a of the second color-resisting layer 216 and the fifth sub-color-resisting layer 217a of the third color-resisting layer 217 are the same, the patterns of the second sub-color-resisting layer 215b of the first color-resisting layer 215, the fourth sub-color-resisting layer 216b of the second color-resisting layer 216 and the sixth sub-color-resisting layer 217b of the third color-resisting layer 217 are the same, that is, the first color-resisting layer 215, the second color-resisting layer 216 and the third color-resisting layer 217 can be manufactured by the same mask.
In fabricating the color resist layer 210, a first color resist layer 215, a second color resist layer 216 and a third color resist layer 217 are sequentially formed by exposing and developing negative resist materials of different colors. The first color-resisting layer 215, the second color-resisting layer 216 and the third color-resisting layer 217 of the embodiment have the same pattern profile, so that the first color-resisting layer, the second color-resisting layer and the third color-resisting layer can be manufactured by the same mask plate, and the production cost is effectively saved.
In this embodiment, the through holes 213 are not formed in some positions of the first sub-color resist layer 215a, the third sub-color resist layer 216a, and the fifth sub-color resist layer 217a, and the main spacers 310 may be selectively disposed in these positions, and the auxiliary spacers 320 may be disposed in other positions having the through holes 213.
Other structures of this embodiment can be seen from the third embodiment, and are not described herein again.
Fifth embodiment
Fig. 11 is a partial cross-sectional view of a liquid crystal display device according to a fifth embodiment of the invention, and fig. 12 is a partial structural view of a color filter substrate of the liquid crystal display device of fig. 11. as shown in fig. 11 and 12, the liquid crystal display device includes an array substrate 100, a color filter substrate 200, and a liquid crystal layer (not shown) interposed between the array substrate 100 and the color filter substrate 200.
The side of the array substrate 100 facing the color filter substrate 200 is provided with a plurality of scan lines (not shown) and a plurality of data lines (not shown), and the plurality of scan lines and the plurality of data lines are arranged in an intersecting manner to define a plurality of pixel units. A thin film transistor 110 is provided at the crossing position of the scan line and the data line. The thin film transistor 110 includes a gate electrode connected to a scan line adjacent to the thin film transistor 110, a source electrode connected to a data line adjacent to the thin film transistor 110, a drain electrode connected to a pixel electrode in a pixel unit, and a multi-layered insulating protective layer, etc. The specific structure of the tft 110 is well known to those skilled in the art and will not be described in detail herein.
The color filter substrate 200 includes a transparent substrate 201, a color resist layer 210 for filtering light, a black matrix 220 for shielding light and preventing color mixing of different colors of light, a protective layer 230, and a columnar spacer 300 for supporting a cell thickness of a liquid crystal layer between the array substrate 100 and the color filter substrate 200, which are disposed on a first surface 201a of the transparent substrate 201 facing the array substrate 100.
The black matrix 220 is disposed on the first surface 201a of the transparent substrate 201. The color resist layer 210 is disposed on the first surface 201a of the transparent substrate 201 and covers the black matrix 220, the protective layer 230 is disposed on the color resist layer 210, and the column spacer 300 is disposed on the protective layer 230, the column spacer 300 including a main spacer 310 and an auxiliary spacer 320.
Specifically, the color resist layer 210 has a body portion 211, a protrusion 212 extending from the body portion 211 in a direction away from the transparent substrate 201 (i.e., in a direction close to the array substrate 100), and a through hole 213 penetrating through the body portion 211. The bumps 212 are used to dispose the main spacers 310 in the column spacers 300, and thus, the distribution positions of the bumps 212 correspond to the positions of the main spacers 310. The through holes 213 are used to dispose the auxiliary spacers 320 in the columnar spacers 300, and thus, the distribution positions of the through holes 213 correspond to the positions of the auxiliary spacers 320. In this embodiment, the positions of the main spacers 310 and the auxiliary spacers 320 correspond to the positions of the partial tfts 110 in the array substrate 100, and therefore, the positions of the bumps 212 and the through holes 213 correspond to the positions of the partial tfts 110 in the array substrate 100, but not limited thereto.
As shown in fig. 12, the color resist layer 210 includes a first color resist layer 215 (e.g., a red color resist layer), a second color resist layer 216 (e.g., a green color resist layer), and a third color resist layer 217 (e.g., a blue color resist layer), wherein the first color resist layer 215, the second color resist layer 216, and the third color resist layer 217 are sequentially and cyclically arranged. The boundary position of the first color-resist layer 215, the second color-resist layer 216, and the third color-resist layer 217 corresponds to the range where the black matrix 220 is located. In this embodiment, the bump 212 is formed by overlapping two adjacent color resist layers; the through hole 213 is formed by enclosing two adjacent color resistance layers, that is, two adjacent color resistance layers both have a notch, and two notches are oppositely arranged and enclosed to form one through hole 213.
The overcoat layer 230 is disposed on the color resist layer 210 and covers the entire color resist layer 210 and the black matrix 220 exposed from the through-hole 213 of the color resist layer 210.
The main spacer 310 of the pillar spacer 300 is disposed on the passivation layer 230 and above the position of the bump 212 of the color resist layer 210, and the main spacer 310 has a second surface 310a far from the transparent substrate 201. The auxiliary spacer 320 of the pillar spacer 300 is disposed on the passivation layer 230 and in the through hole 213 of the color resist layer 210, and the auxiliary spacer 320 has a third surface 320a away from the transparent substrate 201.
In this embodiment, the arrangement density of the main spacers 310 on the color filter substrate 200 is less than the arrangement density of the auxiliary spacers 320 on the color filter substrate 200 (i.e., the number of the auxiliary spacers 320 is greater than the number of the main spacers 310).
The pillar spacers 300 are generally made of photoresist, in this embodiment, the main spacers 310 and the auxiliary spacers 320 are made by the same common mask process, so that the main spacers 310 and the auxiliary spacers 320 have the same height (i.e. the distance between the second surface 310a of the main spacers 310 and the surface thereof close to the transparent substrate 201 is equal to the distance between the third surface 320a of the auxiliary spacers 320 and the surface thereof close to the transparent substrate 201), but since the main spacers 310 are disposed on the bumps 212 and the auxiliary spacers 320 are disposed in the through holes 213, the distance from the second surface 310a of the main spacers 310 to the first surface 201a of the transparent substrate 201 is greater than the distance from the third surface 320a of the auxiliary spacers 320 to the first surface 201a of the transparent substrate 201, that is, there is a spatial height difference H between the main spacers 310 and the auxiliary spacers 320 in the direction perpendicular to the transparent substrate 201, preferably, the spatial height difference H is less than or equal to 0.5 μm.
In one embodiment of the present invention, a portion of the auxiliary spacer 320 may be further disposed on the protective layer 230 and above the body portion 211 of the color resist layer 210 (e.g., the auxiliary spacer 320 in the dotted line position in fig. 11). That is, the auxiliary spacers 320 may be simultaneously disposed on the body portion 211 of the color resist layer 210 and in the through holes 213 of the color resist layer 210, and the distance from the second surface 310a of the main spacer 310 to the first surface 201a of the transparent substrate 201, the distance from the third surface 320a of the auxiliary spacer 320 on the body portion 211 of the color resist layer 210 to the first surface 201a of the transparent substrate 201, and the distance from the third surface 320a of the auxiliary spacer 320 in the through holes 213 of the color resist layer 210 to the first surface 201a of the transparent substrate 201 are sequentially decreased. When the liquid crystal display device of the embodiment is subjected to external pressure, the supporting strength of the columnar spacer 300 is gradually increased along with the gradual addition of the auxiliary spacers 320 at different positions and different heights, so that the pressure resistance of the liquid crystal display device is more effectively improved.
In the liquid crystal display device and the color filter substrate 200 of the embodiment, the bump 212 is disposed on the color resist layer 210, the main spacer 310 of the column spacer 300 is disposed above the bump 212, and the auxiliary spacer 320 is disposed in the through hole 213, so that the main spacer 310 and the auxiliary spacer 320 having a spatial height difference can be formed by a common mask process during the fabrication of the column spacer 300, without using a halftone mask process, thereby effectively reducing the production cost, and the exposure intensities of the main spacer 310 and the auxiliary spacer 320 are the same, and the support intensity of the fabricated column spacer 300 is uniform.
Sixth embodiment
Fig. 13 is a partial structure diagram of a color filter substrate of a liquid crystal display device according to a fifth embodiment of the invention, and fig. 14 is a partial structure diagram of fig. 13, as shown in fig. 13 and fig. 14, in this embodiment, six rows of pixel units in a scanning line direction of a color resist layer 210 are repeatedly arranged as a group, and the patterns of the first row to the third row in each group are the same, and the patterns of the fourth row to the sixth row in each group are the same.
Specifically, the color resist layer 210 includes a first color resist layer 215 (e.g., a red resist layer), a second color resist layer 216 (e.g., a green resist layer), and a third color resist layer 217 (e.g., a blue resist layer).
The first color resist layer 215 includes a first sub-color resist layer 215a and a second sub-color resist layer 215b, the first sub-color resist layer 215a is located in the first column of pixel units in each group, and the second sub-color resist layer 215b is located in the fourth column of pixel units in each group; the second color resist layer 216 includes a third sub-color resist layer 216a and a fourth sub-color resist layer 216b, the third sub-color resist layer 216a is located in the second column of pixel units in each group, and the fourth sub-color resist layer 216b is located in the fifth column of pixel units in each group; the third color-resist layer 217 includes a fifth sub-color-resist layer 217a and a sixth sub-color-resist layer 217b, the fifth sub-color-resist layer 217a is located in the third column of pixel units in each group, and the sixth sub-color-resist layer 217b is located in the sixth column of pixel units in each group. That is, the first sub-color resist layer 215a of the first color resist layer 215, the third sub-color resist layer 216a of the second color resist layer 216, the fifth sub-color resist layer 217a of the third color resist layer 217, the second sub-color resist layer 215b of the first color resist layer 215, the fourth sub-color resist layer 216b of the second color resist layer 216, and the sixth sub-color resist layer 217b of the third color resist layer 217 are sequentially arranged to form a set of patterns for repeated arrangement, in addition, the patterns of the first sub-color resist layer 215a of the first color resist layer 215, the third sub-color resist layer 216a of the second color resist layer 216, and the fifth sub-color resist layer 217a of the third color resist layer 217 in each set are the same, the patterns of the second sub-color resist layer 215b of the first color resist layer 215, the fourth sub-color resist layer 216b of the second color resist layer 216, and the sixth sub-color resist layer 217b of the third color resist layer 217 in each set are the same, that is, the first color-resist layer 215, the second color-resist layer 216, and the third color-resist layer 217 may be formed by the same mask.
In fabricating the color resist layer 210, a first color resist layer 215, a second color resist layer 216 and a third color resist layer 217 are sequentially formed by exposing and developing negative resist materials of different colors. The first color-resisting layer 215, the second color-resisting layer 216 and the third color-resisting layer 217 of the embodiment have the same pattern profile, so that the first color-resisting layer, the second color-resisting layer and the third color-resisting layer can be manufactured by the same mask plate, and the production cost is effectively saved.
In this embodiment, the overlapped region of the first sub-color-resist layer 215a and the third sub-color-resist layer 216a, and the overlapped region of the third sub-color-resist layer 216a and the fifth sub-color-resist layer 217a are formed with bumps 212, the main spacers 310 may be selectively disposed on the bumps 212, and the auxiliary spacers 320 may be selectively disposed at other positions having the through holes 213. The first sub color resist layer 215a and the fifth sub color resist layer 217a have portions where neither the bump 212 nor the through hole 213 is formed, and the auxiliary spacers 320 may be selectively provided at these portions.
Other structures of this embodiment can be seen from the fifth embodiment, and are not described herein again.
Although the present invention has been described with reference to the above embodiments, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (8)
1. A color filter substrate (200) comprises a transparent substrate (201), and a color resistance layer (210), a black matrix (220) and a columnar spacer (300) which are arranged on the transparent substrate (201), wherein the black matrix (220) is arranged on a first surface (201a) of the transparent substrate (201), and the color resistance layer (210) is arranged on the first surface (201a) of the transparent substrate (201) and covers the black matrix (220); the color resistance layer (210) comprises a first color resistance layer (215), a second color resistance layer (216) and a third color resistance layer (217), wherein the first color resistance layer (215), the second color resistance layer (216) and the third color resistance layer (217) are sequentially arranged in a circulating mode, and the boundary position corresponds to the position range of the black matrix (220), the color resistance layer is characterized in that the first color resistance layer (215) comprises a first sub color resistance layer (215a) and a second sub color resistance layer (215b), the second color resistance layer (216) comprises a third sub color resistance layer (216a) and a fourth sub color resistance layer (216b), the third color resistance layer (217) comprises a fifth sub color resistance layer (217a) and a sixth sub color resistance layer (217b), wherein the first sub color resistance layer (215a), the third sub color resistance layer (216a), the fifth sub color resistance layer (217a), the second sub color resistance layer (215b) and the third sub color resistance layer (217b), The fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are sequentially arranged to form a group of patterns for repeated arrangement, the patterns of the first sub-color-resisting layer (215a), the third sub-color-resisting layer (216a) and the fifth sub-color-resisting layer (217a) are the same, the patterns of the second sub-color-resisting layer (215b), the fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are the same, and the first color-resisting layer (215), the second color-resisting layer (216) and the third color-resisting layer (217) are manufactured and formed through the same mask plate; the color resistance layer (210) is provided with a body part (211) and a convex block (212) extending and protruding from the body part (211) to the direction far away from the transparent substrate (201), and the convex block (212) is formed by overlapping two adjacent color resistance layers; the columnar spacer (300) comprises a main spacer (310) and an auxiliary spacer (320), wherein the main spacer (310) is arranged above the position of the bump (212), and the auxiliary spacer (320) is arranged above the body part (211).
2. A color filter substrate (200) comprises a transparent substrate (201), and a color resistance layer (210), a black matrix (220) and a columnar spacer (300) which are arranged on the transparent substrate (201), wherein the black matrix (220) is arranged on a first surface (201a) of the transparent substrate (201), and the color resistance layer (210) is arranged on the first surface (201a) of the transparent substrate (201) and covers the black matrix (220); the color resistance layer (210) comprises a first color resistance layer (215), a second color resistance layer (216) and a third color resistance layer (217), wherein the first color resistance layer (215), the second color resistance layer (216) and the third color resistance layer (217) are sequentially arranged in a circulating mode, and the boundary position corresponds to the position range of the black matrix (220), the color resistance layer is characterized in that the first color resistance layer (215) comprises a first sub color resistance layer (215a) and a second sub color resistance layer (215b), the second color resistance layer (216) comprises a third sub color resistance layer (216a) and a fourth sub color resistance layer (216b), the third color resistance layer (217) comprises a fifth sub color resistance layer (217a) and a sixth sub color resistance layer (217b), wherein the first sub color resistance layer (215a), the third sub color resistance layer (216a), the fifth sub color resistance layer (217a), the second sub color resistance layer (215b) and the third sub color resistance layer (217b), The fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are sequentially arranged to form a group of patterns for repeated arrangement, the patterns of the first sub-color-resisting layer (215a), the third sub-color-resisting layer (216a) and the fifth sub-color-resisting layer (217a) are the same, the patterns of the second sub-color-resisting layer (215b), the fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are the same, and the first color-resisting layer (215), the second color-resisting layer (216) and the third color-resisting layer (217) are manufactured and formed through the same mask plate; the color resistance layer (210) is provided with a body part (211), a convex block (212) extending and protruding from the body part (211) in the direction away from the transparent substrate (201), and a through hole (213) penetrating through the body part (211), wherein the convex block (212) is formed by overlapping two adjacent color resistance layers, and the through hole (213) is formed by oppositely enclosing the gaps of the two adjacent color resistance layers; the columnar spacer (300) comprises a main spacer (310) and an auxiliary spacer (320), the main spacer (310) is arranged above the position of the bump (212), the auxiliary spacer (320) is arranged in the through hole (213), or the auxiliary spacer (320) is respectively arranged above the body part (211) and in the through hole (213).
3. A color filter substrate (200) comprises a transparent substrate (201), and a color resistance layer (210), a black matrix (220) and a columnar spacer (300) which are arranged on the transparent substrate (201), wherein the black matrix (220) is arranged on a first surface (201a) of the transparent substrate (201), and the color resistance layer (210) is arranged on the first surface (201a) of the transparent substrate (201) and covers the black matrix (220); the color resistance layer (210) comprises a first color resistance layer (215), a second color resistance layer (216) and a third color resistance layer (217), wherein the first color resistance layer (215), the second color resistance layer (216) and the third color resistance layer (217) are sequentially arranged in a circulating mode, and the boundary position corresponds to the position range of the black matrix (220), the color resistance layer is characterized in that the first color resistance layer (215) comprises a first sub color resistance layer (215a) and a second sub color resistance layer (215b), the second color resistance layer (216) comprises a third sub color resistance layer (216a) and a fourth sub color resistance layer (216b), the third color resistance layer (217) comprises a fifth sub color resistance layer (217a) and a sixth sub color resistance layer (217b), wherein the first sub color resistance layer (215a), the third sub color resistance layer (216a), the fifth sub color resistance layer (217a), the second sub color resistance layer (215b) and the third sub color resistance layer (217b), The fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are sequentially arranged to form a group of patterns for repeated arrangement, the patterns of the first sub-color-resisting layer (215a), the third sub-color-resisting layer (216a) and the fifth sub-color-resisting layer (217a) are the same, the patterns of the second sub-color-resisting layer (215b), the fourth sub-color-resisting layer (216b) and the sixth sub-color-resisting layer (217b) are the same, and the first color-resisting layer (215), the second color-resisting layer (216) and the third color-resisting layer (217) are manufactured and formed through the same mask plate; the color resistance layer (210) is provided with a body part (211) and a through hole (213) penetrating through the body part (211), and the through hole (213) is formed by oppositely enclosing gaps of two adjacent color resistance layers; the columnar spacer (300) comprises a main spacer (310) and an auxiliary spacer (320), wherein the main spacer (310) is arranged above the body part (211), and the auxiliary spacer (320) is arranged in the through hole (213).
4. The color filter substrate (200) according to any of claims 1 to 3, wherein the main spacers (310) and the auxiliary spacers (320) are formed in the same mask process, and the main spacers (310) and the auxiliary spacers (320) have the same height.
5. The color filter substrate (200) according to any of claims 1 to 3, wherein the primary spacer (310) has a second surface (310a) away from the transparent substrate (201), the secondary spacer (320) has a third surface (320a) away from the transparent substrate (201), and the distance from the second surface (310a) of the primary spacer (310) to the first surface (201a) of the transparent substrate (201) is greater than the distance from the third surface (320a) of the secondary spacer (320) to the first surface (201a) of the transparent substrate (201).
6. The color filter substrate (200) of claim 5, wherein the difference H between the height of the primary spacer (310) and the height of the secondary spacer (320) in the direction perpendicular to the transparent substrate (201) is less than or equal to 0.5 μm.
7. The color filter substrate (200) according to any one of claims 1 to 3, wherein the color filter substrate (200) further comprises a protective layer (230), the protective layer (230) is disposed on the color resist layer (210) and covers the entire color resist layer (210), and the columnar spacers (300) are disposed on the protective layer (230).
8. A liquid crystal display device comprising the color filter substrate (200) according to any one of claims 1 to 3, the liquid crystal display device further comprising an array substrate (100), the array substrate (100) comprising a plurality of scan lines and a plurality of data lines, the plurality of scan lines and the plurality of data lines being arranged to intersect to define a plurality of pixel units; a thin film transistor (110) is arranged at the crossing position of the scanning line and the data line; the main spacer (310) and the auxiliary spacer (320) are arranged corresponding to the position of the thin film transistor (110) in the array substrate (100).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810639386.9A CN108873449B (en) | 2018-06-20 | 2018-06-20 | Color filter substrate and liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810639386.9A CN108873449B (en) | 2018-06-20 | 2018-06-20 | Color filter substrate and liquid crystal display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108873449A CN108873449A (en) | 2018-11-23 |
| CN108873449B true CN108873449B (en) | 2021-05-28 |
Family
ID=64340076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810639386.9A Active CN108873449B (en) | 2018-06-20 | 2018-06-20 | Color filter substrate and liquid crystal display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108873449B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109143672A (en) * | 2018-09-30 | 2019-01-04 | 惠科股份有限公司 | Color filter and liquid crystal panel |
| CN110543046A (en) * | 2018-11-26 | 2019-12-06 | 友达光电股份有限公司 | display panel |
| CN110333635A (en) * | 2019-06-24 | 2019-10-15 | 深圳市华星光电半导体显示技术有限公司 | A kind of array substrate and display panel |
| CN111610660B (en) | 2020-05-29 | 2021-08-06 | 厦门天马微电子有限公司 | Array substrate, display panel and display device |
| CN115840314B (en) * | 2021-09-18 | 2024-07-30 | 武汉京东方光电科技有限公司 | Display panel, preparation method thereof and display device |
| CN114791681A (en) * | 2022-04-27 | 2022-07-26 | 广州华星光电半导体显示技术有限公司 | Display panel, preparation method thereof and display device |
| CN114967212B (en) * | 2022-05-24 | 2024-03-19 | 苏州华星光电技术有限公司 | Color film substrate and liquid crystal display panel |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1892346A (en) * | 2005-06-30 | 2007-01-10 | Lg.菲利浦Lcd株式会社 | Liquid crystal display panel and method of fabricating the same |
| CN101334561A (en) * | 2007-06-29 | 2008-12-31 | 群康科技(深圳)有限公司 | Liquid crystal display panel and liquid crystal display panel assembling method |
| CN104298010A (en) * | 2014-08-28 | 2015-01-21 | 合肥京东方光电科技有限公司 | Display substrate, display substrate manufacturing method and display device |
| JP2016031513A (en) * | 2014-07-30 | 2016-03-07 | 大日本印刷株式会社 | High-definition color filter |
| CN205427389U (en) * | 2016-03-17 | 2016-08-03 | 京东方科技集团股份有限公司 | Display substrate and display device |
| CN205539834U (en) * | 2016-02-03 | 2016-08-31 | 上海天马微电子有限公司 | Color filter substrate and display panel |
| CN107615150A (en) * | 2015-05-21 | 2018-01-19 | 奥特司科技株式会社 | Liquid crystal display device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103901659B (en) * | 2012-12-27 | 2016-09-14 | 上海仪电显示材料有限公司 | Filter, liquid crystal indicator for IPS mode liquid crystal display panel |
| KR102113630B1 (en) * | 2013-12-31 | 2020-05-21 | 엘지디스플레이 주식회사 | Liquid crystal display device and method of fabrication the same |
-
2018
- 2018-06-20 CN CN201810639386.9A patent/CN108873449B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1892346A (en) * | 2005-06-30 | 2007-01-10 | Lg.菲利浦Lcd株式会社 | Liquid crystal display panel and method of fabricating the same |
| CN101334561A (en) * | 2007-06-29 | 2008-12-31 | 群康科技(深圳)有限公司 | Liquid crystal display panel and liquid crystal display panel assembling method |
| JP2016031513A (en) * | 2014-07-30 | 2016-03-07 | 大日本印刷株式会社 | High-definition color filter |
| CN104298010A (en) * | 2014-08-28 | 2015-01-21 | 合肥京东方光电科技有限公司 | Display substrate, display substrate manufacturing method and display device |
| CN107615150A (en) * | 2015-05-21 | 2018-01-19 | 奥特司科技株式会社 | Liquid crystal display device |
| CN205539834U (en) * | 2016-02-03 | 2016-08-31 | 上海天马微电子有限公司 | Color filter substrate and display panel |
| CN205427389U (en) * | 2016-03-17 | 2016-08-03 | 京东方科技集团股份有限公司 | Display substrate and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108873449A (en) | 2018-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108873449B (en) | Color filter substrate and liquid crystal display device | |
| CN110515243B (en) | Display screen and electronic equipment | |
| KR101954979B1 (en) | Color filter substrate, Liquid crystal display apparatus and method for fabricating color filter | |
| US7545466B2 (en) | Liquid crystal display device and substrate therefor | |
| US7123333B2 (en) | Color filter panel and its fabrication method using back exposure | |
| US20120147314A1 (en) | Display device and color filter substrate | |
| US20100238387A1 (en) | Liquid crystal display device and method of manufacturing color filter substrate | |
| KR101031166B1 (en) | Liquid crystal display panel | |
| US10459276B2 (en) | Liquid crystal display including black column spacer and manufacturing method of the same | |
| US20110141425A1 (en) | Liquid crystal display panel | |
| US6975379B2 (en) | Liquid crystal display panel and method of fabricating the same | |
| CN107561769B (en) | Packed substrate, method of manufacturing the same, display device, and method of repairing bright spot | |
| KR20170054598A (en) | Display device and manufacturing method thereof | |
| US20190049804A1 (en) | Active switch array substrate, manufacturing method therfor, and display panel | |
| CN104749812A (en) | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display device comprising color filter substrate | |
| CN107870490B (en) | Display device | |
| JP3938680B2 (en) | LIQUID CRYSTAL DISPLAY SUBSTRATE, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE EQUIPPED WITH THE SAME | |
| CN111474774A (en) | Array substrate, manufacturing method thereof, display panel and display device | |
| CN109407389B (en) | Display panel and manufacturing method thereof | |
| KR101483024B1 (en) | Liquid crystal display device and method of fabricating the same | |
| US20190049803A1 (en) | Active switch array substrate, manufacturing method therefor same, and display device using same | |
| KR102367955B1 (en) | Display device | |
| US8421961B2 (en) | Active device array substrate and fabrication method thereof | |
| JP5292594B2 (en) | LCD panel | |
| CN210894896U (en) | Light shield for curing frame glue |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Applicant after: InfoVision Optoelectronics(Kunshan)Co.,Ltd. Address before: 215301, 1, Longteng Road, Kunshan, Jiangsu, Suzhou Applicant before: INFOVISION OPTOELECTRONICS (KUNSHAN) Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |