CN108873136A - Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing - Google Patents
Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing Download PDFInfo
- Publication number
- CN108873136A CN108873136A CN201810888638.1A CN201810888638A CN108873136A CN 108873136 A CN108873136 A CN 108873136A CN 201810888638 A CN201810888638 A CN 201810888638A CN 108873136 A CN108873136 A CN 108873136A
- Authority
- CN
- China
- Prior art keywords
- ultra
- thin plastic
- cutoff filter
- plastic rubber
- rubber substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- 239000004033 plastic Substances 0.000 title claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 39
- 238000007747 plating Methods 0.000 claims abstract description 16
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 238000005566 electron beam evaporation Methods 0.000 claims abstract description 6
- 238000003384 imaging method Methods 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000000047 product Substances 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 6
- 230000003667 anti-reflective effect Effects 0.000 abstract description 2
- 239000006227 byproduct Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 22
- 230000003287 optical effect Effects 0.000 description 13
- 239000011521 glass Substances 0.000 description 6
- 239000005321 cobalt glass Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 3
- 239000004568 cement Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 241001062009 Indigofera Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Abstract
The present invention relates to one kind using ultra-thin sheet as substrate cutoff filter, carries out high low-index material by way of electron beam evaporation plating in substrate surface and reaches infrared cutoff and the antireflective optics purpose of visible region to alternate plating.The present invention uses ultra-thin sheet to be used for electronic imaging field, such as mobile phone camera for the coating technique of substrate and by product；Product thickness, since plastic parts has flexibility, can effectively avoid while being thinned to 0.11mm and fall broken quality problems.
Description
Technical field
The present invention relates to optical component manufacturing technology fields, and in particular to a kind of infrared medium optical filter and its preparation side
Method.
Background technique
Cutoff filter (IRCF) is that optical film is plated on optical base-substrate using precision optics coating technique, and realization can
See that Qu Gaotou, the optical filter of near infrared prevention are mainly used for digital image-forming field, for eliminating infrared light to CCD/
The influence of cmos imaging.
In recent years, in order to adapt to the development trend of the digital optical images equipment such as mobile phone, computer, optical filter is on the one hand required
It is thinner, on the other hand require image that can utmostly restore.At present mainly using smalt and white glass as filter in industry
The substrate of mating plate reaches infrared cutoff and the antireflective optics purpose of visible region after plated film.But no matter smalt or white glass
Glass, thickness (general thickness is 0.21mm in industry) become an important factor for restricting optical imagery mould group height.With thickness
Reduce, mechanical property meeting straight line decline is unable to satisfy the demand of normal use.
Summary of the invention
In view of the above-mentioned problems, the present invention is intended to provide a kind of thinner, while there is preferable intensity, it can avoid falling damage
Bad cutoff filter and its preparation method and application.
In order to solve the above-mentioned technical problem, the technical scheme adopted by the invention is as follows：
A kind of cutoff filter, the composite film including substrate and positioned at substrate two sides, which is characterized in that institute
Stating substrate is ultra-thin plastic substrate, and the composite film is the high refractive index and low-index material of alternate plating.
The high-index material is titanium pentoxide, and the low-index material is silica.
The high refractive index and low-index material are plated on base by way of the electron beam evaporation plating under vacuum state
On plate.
The low-index material coating film thickness is 80-250nm, and the high-index material coating film thickness is 20-
200nm。
The high refractive index and low-index material complete plating by the way of symmetrical plated film, effectively control plated film production
The deformation problems of product.
The cutoff filter is with a thickness of 0.10-0.20mm, preferably 0.11-0.15mm, more preferably 0.11mm.
Meanwhile the present invention provides a kind of preparation methods of cutoff filter, by a ultra-thin plastic substrate two
Side uses the e-beam evaporation alternating high low-index material of plating under vacuum state to be made, it is preferred to use symmetrical plated film mode
It carries out.
The high-index material is titanium pentoxide, and the low-index material is silica.
The high refractive index and low-index material are plated on base by way of the electron beam evaporation plating under vacuum state
On plate.
The low-index material coating film thickness is 80-250nm, and the high-index material coating film thickness is 20-
200nm。
Further, the present invention provides a kind of ultra-thin plastic rubber substrate type cutoff filter material in mobile phone camera
Application.
The present invention is based on carrying out high low-index material (five by way of electron beam evaporation plating in plastic parts substrate surface
Oxidation Tritanium/Trititanium and silica) alternate plating mode reach ultraviolet-near infrared band selectivity penetrate and reflection mesh
, high low-index material is completed by the electron beam evaporation plating mode under vacuum state, low-index material coating film thickness
It is distributed between 80-250nm according to different optical requirements, and high-index material is distributed according to its optical requirement coating film thickness
Between 20-200nm.In view of the flexibility of plastic parts former material, process of the present invention is completed using symmetrical plated film mode, is effectively controlled
The deformation problems of coated product.
Detailed description of the invention
With reference to the accompanying drawings and embodiments, structure and features of the invention is further described.
Fig. 1 is the structural schematic diagram of heretofore described ultra-thin plastic rubber substrate type cutoff filter.
Fig. 2 is the embodiment of the present invention and comparative example breaking type variable test result figure.
It include the high low-index material of ultra-thin plastic substrate and alternate plating in Fig. 1, as space is limited, wherein
The number of plies of each thickness degree and high low-index material is only used as exemplary illustration.
Abscissa is sample serial number in Fig. 2, and ordinate is tear type variable (mm).
Specific embodiment
Below with reference to embodiment, technical solution of the present invention is clearly and completely described, it is clear that described implementation
Example only a part of the embodiment of the present invention, and not all embodiments.Based on embodiment, those skilled in the art are not being made
Every other embodiment obtained, all belongs to the scope of protection of the present invention under the premise of creative work.
Embodiment：
A kind of Ultrathin infrared edge filter, the composite film including ultra-thin plastic substrate and positioned at substrate two sides, institute
The composite film stated is the high-index material and low-index material of the alternate plating by the way of electronics vapor deposition.Different from indigo plant
Glass and white glass base optical filter, due to making the flexibility of plastic substrate, above-mentioned plated film is carried out by the way of symmetrical plated film, is kept away
Exempt from the stress after the plated film of side and change to lead to product deformation.
According to optical requirement, the low-index material coating film thickness is 80-250nm, high-index material coating film thickness
For 20-200nm, final product thickness 0.11mm.
Performance test：
According to the method for above-described embodiment, control low-index material coating film thickness is 150nm, high-index material plated film
With a thickness of 100nm, filter thickness 0.11mm, sample is made to the sample of 5.5*5.5mm, tear type variable is tested, due to a
Body difference takes 24 above-mentioned samples to be tested, averages.
Comparative example：
Take it is commercially available using smalt as substrate, titanium pentoxide be high low-index material, silica be low-refraction material
The optical filter (thickness 0.21mm) of material carries out fracture deformation test, takes 24 samples, averages.
Test results are shown in figure 2.
It is computed, the tear type variable of plastic cement products is averaged 0.72mm, and the tear type variable of smalt product is average
0.06mm.It can be seen that the present invention is using ultra-thin plastic cement as the optical filter of substrate, thickness is smaller, and has certain flexibility, answers
The case where for optical imaging apparatus, when such as mobile phone camera, receiving slight squeeze or fall, being not susceptible to damage.And it is existing
Smalt product in technology, one side thickness is larger, on the other hand due to the rigidity of glass, when by external force, is easy broken
Rhegma is bad.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (10)
1. a kind of ultra-thin plastic rubber substrate type cutoff filter, the composite film including substrate and positioned at substrate two sides,
It is characterized in that, the substrate is ultra-thin plastic substrate, the composite film is the high refractive index and low-refraction of alternate plating
Material.
2. ultra-thin plastic rubber substrate type cutoff filter according to claim 1, wherein the high-index material is
Titanium pentoxide, the low-index material are silica.
3. ultra-thin plastic rubber substrate type cutoff filter according to claim 1, wherein the high refractive index and low folding
The rate material of penetrating is plated on substrate by way of the electron beam evaporation plating under vacuum state.
4. ultra-thin plastic rubber substrate type cutoff filter according to claim 1, wherein the low-index material plates
Film thickness is 80-250nm, and the high-index material coating film thickness is 20-200nm.
5. ultra-thin plastic rubber substrate type cutoff filter according to claim 1, wherein the high refractive index and low folding
It penetrates rate material and completes plating by the way of symmetrical plated film.
6. ultra-thin plastic rubber substrate type cutoff filter according to claim 1, wherein the cutoff filter
With a thickness of 0.10-0.20mm, preferably 0.11-0.15mm, more preferably 0.11mm.
7. the preparation method of ultra-thin plastic rubber substrate type cutoff filter described in claim 1-6, it is characterised in that by
One ultra-thin plastic substrate two sides use the e-beam evaporation alternating high low-index material of plating under vacuum state to be made.
8. a kind of application of the ultra-thin plastic rubber substrate type cutoff filter described in claim 1-6 in digital imaging device.
9. application of the ultra-thin plastic rubber substrate type cutoff filter that claim 7 is made in digital imaging device.
10. according to application described in claim 8-9, wherein the digital imaging device is mobile phone camera.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810888638.1A CN108873136A (en) | 2018-08-07 | 2018-08-07 | Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810888638.1A CN108873136A (en) | 2018-08-07 | 2018-08-07 | Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108873136A true CN108873136A (en) | 2018-11-23 |
Family
ID=64307938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810888638.1A Pending CN108873136A (en) | 2018-08-07 | 2018-08-07 | Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108873136A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113416927A (en) * | 2021-05-31 | 2021-09-21 | 江苏星浪光学仪器有限公司 | Novel optical filter manufacturing method using FILM material as substrate |
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|---|---|---|---|---|
| CN102759768A (en) * | 2012-07-31 | 2012-10-31 | 杭州科汀光学技术有限公司 | Optical filter |
| TW201339655A (en) * | 2012-03-30 | 2013-10-01 | Sintai Optical Shenzhen Co Ltd | Infrared cut filter structure |
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| CN107678081A (en) * | 2017-09-14 | 2018-02-09 | 利达光电股份有限公司 | A kind of low haze cutoff filter and its film plating process |
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-
2018
- 2018-08-07 CN CN201810888638.1A patent/CN108873136A/en active Pending
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| TW201339655A (en) * | 2012-03-30 | 2013-10-01 | Sintai Optical Shenzhen Co Ltd | Infrared cut filter structure |
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| CN103454709A (en) * | 2012-05-30 | 2013-12-18 | 鸿富锦精密工业（深圳）有限公司 | Infrared cut-off filter and lens module |
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| CN113416927A (en) * | 2021-05-31 | 2021-09-21 | 江苏星浪光学仪器有限公司 | Novel optical filter manufacturing method using FILM material as substrate |
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