CN105911625A - Mixing absorption type infrared cut-off filter and preparation method thereof - Google Patents
Mixing absorption type infrared cut-off filter and preparation method thereof Download PDFInfo
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- CN105911625A CN105911625A CN201610305348.0A CN201610305348A CN105911625A CN 105911625 A CN105911625 A CN 105911625A CN 201610305348 A CN201610305348 A CN 201610305348A CN 105911625 A CN105911625 A CN 105911625A
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- 238000010521 absorption reaction Methods 0.000 title claims abstract description 12
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- 238000002156 mixing Methods 0.000 title abstract description 4
- 239000010410 layer Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 239000011248 coating agent Substances 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 34
- 239000011521 glass Substances 0.000 claims abstract description 28
- 230000031700 light absorption Effects 0.000 claims abstract description 3
- 239000000463 material Substances 0.000 claims description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 230000002745 absorbent Effects 0.000 claims description 22
- 239000002250 absorbent Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 16
- 239000011247 coating layer Substances 0.000 claims description 13
- 150000002500 ions Chemical class 0.000 claims description 13
- 230000008020 evaporation Effects 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000003667 anti-reflective effect Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 241001132374 Asta Species 0.000 claims description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 6
- 239000012790 adhesive layer Substances 0.000 abstract description 5
- 230000004075 alteration Effects 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 21
- 239000005321 cobalt glass Substances 0.000 description 12
- 238000013461 design Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000006117 anti-reflective coating Substances 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000009738 saturating Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 241000227425 Pieris rapae crucivora Species 0.000 description 1
- 229910009815 Ti3O5 Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 210000004379 membrane Anatomy 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 210000000713 mesentery Anatomy 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000005315 stained glass Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B11/00—Filters or other obturators specially adapted for photographic purposes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a mixing absorption type infrared cut-off filter and a preparation method thereof. The mixing absorption type infrared cut-off filter comprises a glass substrate; the upper surface of the glass substrate is provided with a coating adhesive layer possessing visible light absorption characteristics; the coating adhesive layer is provided with an antireflection film layer; the lower surface of the glass substrate is provided with an infrared cut-off film layer. The invention provides a visible region high transmittance and infrared band cut-off ultralow angle effect filter, which can realize lower edge aberration in wide angle incidence.
Description
Technical field
The present invention relates to optical filter production technical field, particularly to a kind of blended absorbent type IR-cut
Optical filter and preparation method thereof.
Background technology
Smalt is the coloured glass having and absorbing infrared ray character, is mainly composed of phosphoric acid salt material,
Important application is had in digital optical filter field.Smalt optical filter belongs to absorption-type optical filter, phase
For common interference-type cutoff filter, it significantly reduces the aberration through light and scattering
The problems such as light " ghost ", and its transflector curve is the least to angle interdependence.Based on these advantages, blue
Glass filter has obtained the favor of the manufacturer high to imaging requirements and consumer.
Smalt optical filter mainly used, at present with intelligence on high-end product digital camera/mono-anti-grade in the past
Energy mobile phone is all-round developing, and portrait quality there has also been higher requirement, and many high-end smart mobile phones are opened
Begin use smalt optical filter (such as: Fructus Mali pumilae, Samsung, HTC etc.), also have the most domestic from
Main brand mobile phone is progressively in the development trend of application smalt optical filter.Therefore along with smart mobile phone
With camera technique and the development in market, smalt optical filter (BG Filter) the most progressively replaces
Common cutoff filter, its market demand increases year by year.But smalt optical filter constantly increases
What long market was corresponding is but high cost and limited resources, due to smalt shortage of raw materials and processing
The feature that technical difficulty is big, market is faced with the awkward condition that BG Filter production cost is high.
In order to improve this situation, in addition to improving current process technology and expanding supplier, actively find honest and clean
Valency and high performance smalt succedaneum are particularly important.Exploitation has the absorption of similar optical property
Property material, this material is coated on common white glass (such as D263Teco) at 380-780nm wave band
There is similar absorption spectrum, and its spectral characteristic has obtained the accreditation of some chip manufacturers, carries out it
Following process and improvement, be expected to become the succedaneum of smalt or for requiring relatively low digital product.
The development of this novel absorbent type optical filter (Hybrid-IR Filter) is for reducing cost, abundant product
All have a very big significance with developing new customers etc..
Summary of the invention
It is an object of the invention to provide a kind of blended absorbent type cutoff filter, be that one is visible
Optical band is high thoroughly, the optical filter of the ultralow angular effect of infrared band cut-off, it is possible to realize wide-angle and enter
Relatively low edge aberration when penetrating.
Present invention also offers the preparation method of this blended absorbent type cutoff filter, simple,
Low cost, it is simple to extensive, mass production.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of blended absorbent type cutoff filter, including glass substrate, the upper surface of described glass substrate
Being provided with the coating glue-line with visible light absorption, coating glue-line is provided with antireflection film layer, described
The lower surface of glass substrate is provided with infrared cut coating layer.
Present invention surface-coated one layer on the glass substrate has the glue of absorption characteristic to form painting at visible ray
Cover glue-line, coating glue-line plates the antireflective coating of visible light-transmissive, base lower surface plates IR-cut
Film, utilizes the coating absorption characteristic of glue-line, antireflective coating and infrared cut coating cut-off ultrared common
Same-action effect, constitutes a kind of novel visible light wave range high thoroughly, the ultralow angle of infrared band cut-off
The optical filter of effect.
As preferably, the visible ray of described coating glue-line (coating adhesive layer thickness value range is in 5-100 μm) is inhaled
Receive wave band at 380-760nm, high transmission rate T > 90%.
As preferably, (antireflection film layer thickness range is at 0.2-0.5 at 4-7 layer for the number of plies of described antireflection film layer
μm), antireflection film layer is high refractive index material layer and low refractive index material layer is alternately stacked and forms.
As preferably, the number of plies of described infrared cut coating layer is in 40-52 layer (IR-cut thicknesses of layers scope
In 3-6 μm), infrared cut coating layer is high refractive index material layer and low refractive index material layer is alternately stacked
Form.
As preferably, the high-index material of described high refractive index material layer is selected from titanium dioxide, five oxidations three
In titanium, zirconium dioxide, tantalum pentoxide, niobium pentaoxide, H4 (optical filming material lanthanium titanate)
One or more.
As preferably, the low-index material of described low refractive index material layer is silicon dioxide or Afluon (Asta).
As preferably, the thickness of described glass substrate is at 0.1-1mm.
A kind of method preparing blended absorbent type cutoff filter, comprises the steps:
(1) glass substrate is put into after ultrasonic cleaning, drying sol evenning machine rotation, and rotation is put into after terminating
The nitrogen oven of regulating flow quantity toasts, and machines coating glue-line；
(2) the vacuum coating method deposition on coating glue-line using electron gun evaporation, ion source auxiliary obtains
Antireflective film layer, obtains infrared cut coating layer in glass substrate lower surface deposition, finally gives blended absorbent
Type cutoff filter.
As preferably, in step (1), sol evenning machine rotates speed at 1000-5000r/min, baking oven nitrogen flow
At 10-60Sccm, baking time 30-120min, baking temperature 100-250 DEG C.
As preferably, the voltage of step (2) intermediate ion source auxiliary is 350-1100V.
The invention has the beneficial effects as follows:
The present invention has the characteristic of absorption, ion on coated face based on coating glue-line at visible light wave range
Assistant depositing antireflective coating and the infrared cut coating of substrate back optimization design, construct a kind of mixing
Absorption-type cutoff filter, it is achieved that the cutoff filter that angle is insensitive.
The present invention compared with the smalt cutoff filter of traditional low angle effect, production cost
Being remarkably decreased, cutting efficiency significantly promotes, it is simple to extensive, mass production.
Accompanying drawing explanation
Fig. 1 is blended absorbent type cutoff filter structural representation of the present invention；
Fig. 2 coated substrates of the present invention curve of spectrum and the normal smalt curve of spectrum；
Fig. 3 mixed type of the present invention 0-30 ° of curve of spectrum of cutoff filter.
In figure:
1. antireflection film layer (AR film)；2. coating glue-line；3.D263T glass substrate；4. IR-cut
Film layer (IR film).
Detailed description of the invention
Below by specific embodiment, technical scheme is described in further detail.
In the present invention, if not refering in particular to, the raw material used and equipment etc. are all commercially available or this
Field is commonly used.Method in following embodiment, if no special instructions, is the routine side of this area
Method.
Total embodiment:
As it is shown in figure 1, a kind of blended absorbent type cutoff filter by glass substrate 3 (D263T without
Color Pyrex), coating glue-line 2, antireflection film layer 1 and infrared cut coating layer 4 form.Glass
Substrate thickness between 0.1mm-1.0mm, conventional specification is 0.11mm, 0.21mm, 0.3mm,
0.45mm、0.7mm、1.0mm.(glue of coating adhesive is commercially available, Co., Ltd. for described coating glue-line
Japan catalyst, model: IX-2-GQ-AE2) visible absorption wave band at 380-760nm, the highest
Light rate T > 90%.Coating adhesive layer thickness value range is in 5-100 μm.Coating glue-line is at visible light wave range
(380-760nm) there is absorption characteristic, utilize this characteristic of this absorption to greatly reduce due to angle
The edge aberration problem that effect causes.The antireflective coating number of plies is at 4-7 layer, antireflection film layer thickness range
In 0.2-0.5 μm, at 420-680nm wave band, there is antireflective effect, can be by coated substrates (coating adhesive
Layer+glass substrate) maximum transmission rise to about 93% from 90%.The infrared cut coating number of plies exists
40-52 layer, IR-cut thicknesses of layers scope, in 3-6 μm, utilizes the principle interfering light cancellation red
Outer wave band 780-1200nm carries out ending infrared band.Described antireflection film layer and infrared cut coating layer
It is alternately stacked by high refractive index material layer and low refractive index material layer and forms, wherein, high index of refraction material
Material is TiO2、Ti3O5、ZrO2、Ta2O5、Nb2O5, one or several in H4, low refraction
Rate material is SiO2Or MgF2In one.
The preparation method of a kind of blended absorbent type cutoff filter, comprises the following steps,
(1) according to required transmitance wave band, transmitance centre wavelength value range and IR-cut wave band
Requirement, design coating technique draws coated substrates, by optimizing design antireflection film system and cut film
System draws film thickness, is determined for compliance with coated substrates and the plating membrane system required；
(2) glass substrate is put into after ultrasonic cleaning, drying sol evenning machine, the coating designed as requested
Technological parameter revolves, and rotation is put into the nitrogen oven of regulating flow quantity and toasted after terminating, warp
Take out after spending the some time and measure, determine that coated substrates meets design requirement；Sol evenning machine rotates speed and exists
1000-5000r/min, baking oven nitrogen flow is in 10-60Sccm, baking time 30-120min, baking
Temperature 100-250 DEG C.
(3) vacuum coating method using electron gun evaporation, ion source auxiliary deposits the film mesentery layer designed,
Obtain blended absorbent type cutoff filter.The voltage of ion source auxiliary is 350-1100V.
The present invention is combined with the optical filter i.e. absorption-type+interference of two types structure on the glass substrate and cuts
Only type, in the case of the front top layer of gluing adds plating antireflective film, utilizes coating adhesive special in the absorption of visible ray
Property and infrared cut coating pile up infrared part and have infrared light effect jointly to realize center during large angle incidence
The blended absorbent type cutoff filter that side-play amount is little, transmitance is high, the cut-off degree of depth is high.
Specific embodiment:
Embodiment 1:
A kind of mixed type cutoff filter curve requirement: visible light wave range 440-550nm is the most saturating
Cross rate Tave> 93%, IR center cutoff wavelength T50%=660 ± 5,0-30 ° of center offset < 5nm, red
Outer cut-off wave band 725-750nm mean transmissivity Tave< 1%, 750-1100nm mean transmissivity
Tave< 0.5%, maximum transmission Tmax< 1%.
By thickness T=0.21mm, size Φ=150mm glass substrate is put after ultrasonic cleaning, drying
Entering sol evenning machine, arrange rotation speed 1800-2200r/min as requested, the time keeps 20-40s, rotation
The nitrogen oven putting into regulating flow quantity after end toasts, and nitrogen flow is in 20-40sccm, baking
Take out after time 40-80min and measure, determine that coated substrates meets design requirement.
Employing electron gun evaporation, the method depositing antireflection film layer of ion source auxiliary and infrared cut coating layer,
Wherein high refractive index material layer evaporation rate 2-4A/s, low refractive index material layer evaporation rate 10-14A/s,
Ion source boost voltage BV value 350-800V, substrate thermostat temperature 180-220 DEG C, the time exists
40-80min。
The cutoff filter obtained after coating, baking, plated film is tested, result: visible
Optical band 440-550nm mean transmissivity Tave=94.8%, IR center cutoff wavelength
T50%=658.04nm, 0-30 ° of center offset=1.47nm, wave band 725-750nm is average for IR-cut
Transmitance Tave=0.598%, 750-1100nm mean transmissivity Tave=0.097%, maximum transmission
Tmax=0.566%, meet design requirement.
Embodiment 2:
A kind of mixed type cutoff filter curve requirement: visible light wave range 440-550nm is the most saturating
Cross rate Tave> 93%, IR center cutoff wavelength T50%=650 ± 5,0-30 ° of center offset < 5nm, red
Outer cut-off wave band 725-750nm mean transmissivity Tave< 1%, 750-1100nm mean transmissivity
Tave< 0.5%, maximum transmission Tmax< 1%.
By thickness T=0.21mm, size Φ=150mm glass substrate is put after ultrasonic cleaning, drying
Entering sol evenning machine, arrange rotation speed 1200-1600r/min as requested, the time keeps 20-40s, rotation
The nitrogen oven putting into regulating flow quantity after end toasts, and nitrogen flow is in 20-40sccm, baking
Take out after time 40-80min and measure, determine that coated substrates meets design requirement.
Employing electron gun evaporation, the method depositing antireflection film layer of ion source auxiliary and infrared cut coating layer,
Wherein high refractive index material layer evaporation rate 2-4A/s, low refractive index material layer evaporation rate 10-14A/s,
Ion source boost voltage BV value 350-1100V, substrate thermostat temperature 130-180 DEG C, the time exists
40-80min。
The cutoff filter obtained after coating, baking, plated film is tested, result: visible
Optical band 440-550nm mean transmissivity Tave=93.8%, IR center cutoff wavelength
T50%=651.09nm, 0-30 ° of center offset=2.4nm, wave band 725-750nm is average for IR-cut
Transmitance Tave=0.223%, 750-1100nm mean transmissivity Tave=0.069%, maximum transmission
Tmax=0.28%, meet design requirement, as shown in Figure 3.
Embodiment 3:
A kind of mixed type cutoff filter curve requirement, it is seen that optical band 440-550nm is the most saturating
Cross rate Tave> 93%, IR center cutoff wavelength T50%=655 ± 5,0-30 ° of center offset < 5nm, red
Outer cut-off wave band 725-750nm mean transmissivity Tave< 1%, 750-1100nm mean transmissivity
Tave< 0.5%, maximum transmission Tmax< 1%.
By thickness T=0.21mm, size Φ=150mm glass substrate is put after ultrasonic cleaning, drying
Entering sol evenning machine, arrange rotation speed 1800-2200r/min as requested, the time keeps 20-40s, rotation
The nitrogen oven putting into regulating flow quantity after end toasts, and nitrogen flow is in 20-40sccm, baking
Take out after time 40-80min and measure, determine that coated substrates meets design requirement, as shown in Figure 2.
Employing electron gun evaporation, the method depositing antireflection film layer of ion source auxiliary and infrared cut coating layer,
Wherein high refractive index material layer evaporation rate 2-4A/s, low refractive index material layer evaporation rate 10-14A/s,
Ion source boost voltage BV value 350-1100V, substrate thermostat temperature 130-180 DEG C, the time exists
40-80min。
The cutoff filter obtained after coating, baking, plated film is tested, result: visible
Optical band 440-550nm mean transmissivity Tave=94.2%, IR center cutoff wavelength
T50%=654.95nm, 0-30 ° of center offset=2.01nm, wave band 725-750nm is average for IR-cut
Transmitance Tave=0.43%, 750-1100nm mean transmissivity Tave=0.078%, maximum transmission
Tmax=0.27%, meet design requirement.
Embodiment described above is the one preferably scheme of the present invention, not appoints the present invention
What pro forma restriction, also has other on the premise of without departing from the technical scheme described in claim
Variant and remodeling.
Claims (10)
1. a blended absorbent type cutoff filter, including glass substrate, it is characterised in that: described glass
The upper surface of glass substrate is provided with the coating glue-line with visible light absorption, and coating glue-line is provided with and subtracts
Reflective coating, the lower surface of described glass substrate is provided with infrared cut coating layer.
A kind of blended absorbent type cutoff filter the most according to claim 1, it is characterised in that:
The visible absorption wave band of described coating glue-line at 380-760nm, high transmission rate T > 90%.
A kind of blended absorbent type cutoff filter the most according to claim 1, it is characterised in that:
The number of plies of described antireflection film layer is at 4-7 layer, and antireflection film layer is high refractive index material layer and low refraction
Rate material layer is alternately stacked and forms.
A kind of blended absorbent type cutoff filter the most according to claim 1, it is characterised in that:
The number of plies of described infrared cut coating layer at 40-52 layer, infrared cut coating layer be high refractive index material layer and
Low refractive index material layer is alternately stacked and forms.
5., according to a kind of blended absorbent type cutoff filter described in claim 3 or 4, its feature exists
In: the high-index material of described high refractive index material layer selected from titanium dioxide, five oxidation Tritanium/Trititaniums, two
One or more in zirconium oxide, tantalum pentoxide, niobium pentaoxide, H4.
6., according to a kind of blended absorbent type cutoff filter described in claim 3 or 4, its feature exists
In: the low-index material of described low refractive index material layer is silicon dioxide or Afluon (Asta).
A kind of blended absorbent type cutoff filter the most according to claim 1 and 2, its feature exists
In: the thickness of described glass substrate is at 0.1-1mm.
8. the method for the preparation a kind of blended absorbent type cutoff filter described in claim 1, its feature
It is, comprises the steps:
(1) glass substrate is put into after ultrasonic cleaning, drying sol evenning machine rotation, and rotation is put into after terminating
The nitrogen oven of regulating flow quantity toasts, and machines coating glue-line；
(2) the vacuum coating method deposition on coating glue-line using electron gun evaporation, ion source auxiliary obtains
Antireflective film layer, obtains infrared cut coating layer in glass substrate lower surface deposition, finally gives blended absorbent
Type cutoff filter.
Method the most according to claim 8, it is characterised in that: in step (1), sol evenning machine rotates
Speed at 1000-5000r/min, baking oven nitrogen flow at 10-60Sccm, baking time 30-120min,
Baking temperature 100-250 DEG C.
Method the most according to claim 8, it is characterised in that: step (2) intermediate ion source auxiliary
Voltage is 350-1100V.
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| CN201610305348.0A CN105911625A (en) | 2016-05-09 | 2016-05-09 | Mixing absorption type infrared cut-off filter and preparation method thereof |
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| CN201610305348.0A CN105911625A (en) | 2016-05-09 | 2016-05-09 | Mixing absorption type infrared cut-off filter and preparation method thereof |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106526733A (en) * | 2016-12-27 | 2017-03-22 | 苏州思创源博电子科技有限公司 | Preparation method of infrared filter |
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| CN107678081B (en) * | 2017-09-14 | 2024-02-23 | 南阳利达光电有限公司 | Low-haze infrared cut-off filter and film coating method thereof |
| WO2020029579A1 (en) * | 2018-08-06 | 2020-02-13 | 信阳舜宇光学有限公司 | Optical filter and infrared image sensing system comprising same |
| US11828961B2 (en) | 2018-08-06 | 2023-11-28 | Xinyang Sunny Optics Co., Ltd. | Optical filter and infrared image sensing system including the same |
| CN108873136A (en) * | 2018-08-07 | 2018-11-23 | 湖北五方光电股份有限公司 | Ultra-thin plastic rubber substrate type cutoff filter and its technology of preparing |
| CN110824601A (en) * | 2019-11-12 | 2020-02-21 | Oppo广东移动通信有限公司 | Bi-pass filter, camera assembly and electronic equipment |
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| CN111580193A (en) * | 2020-06-08 | 2020-08-25 | 华天慧创科技（西安）有限公司 | Ultrathin film-coated optical wafer and preparation method thereof |
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| CN113759454A (en) * | 2021-09-22 | 2021-12-07 | 厦门大学 | Incident light angle low-sensitivity structural color film of all-silicon material |
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Application publication date: 20160831 |