CN108842153A - Utilize the method for potassium hydroxide solution removing aluminium film - Google Patents
Utilize the method for potassium hydroxide solution removing aluminium film Download PDFInfo
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- CN108842153A CN108842153A CN201810469103.0A CN201810469103A CN108842153A CN 108842153 A CN108842153 A CN 108842153A CN 201810469103 A CN201810469103 A CN 201810469103A CN 108842153 A CN108842153 A CN 108842153A
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- Prior art keywords
- potassium hydroxide
- hydroxide solution
- aluminium film
- removing aluminium
- solution removing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
- Detergent Compositions (AREA)
Abstract
A method of aluminium film being removed using potassium hydroxide solution, including：1, immersion treatment is carried out to workpiece using potassium hydroxide solution, the potassium hydroxide solution used is KOH for mass ratio：H2O=1：10 potassium hydroxide aqueous solution, soaking temperature are 40 DEG C ~ 60 DEG C, and the reaction time is 1-12 hours, until estimating workpiece surface noresidue aluminium film；2, it is rinsed using flowing water, rinsing time is greater than or equal to 1 minute；3, neutralization reaction is carried out using nitre fluoric acid, nitre fluoric acid is matched using nitric acid and hydrofluoric acid, and the volume ratio of each component is HNO3：HF：H2O=20：1：20, it reacts to carry out immersion reaction, reaction time 10-30S at a temperature of room temperature；4, it is carried out soaking flushing 30 minutes or more using flowing water, when immersion should keep the flowing of ultrapure water；5, the workpiece after soaking and washing is placed on the jig of drying oven and is dried.
Description
Technical field
The present invention discloses a kind of overlay film stripping means, especially a kind of method using potassium hydroxide solution removing aluminium film.
Background technique
With the continuous development of semiconductor and liquid crystal display panel industry, the semiconductor industry and liquid crystal display panel industry in China
Very big promotion is obtained, industry production capacity is also higher and higher.The industries such as semiconductor and liquid crystal display panel belong to fining industry,
It is very high to production equipment requirement, therefore the components of equipment is required to need to carry out periodic maintenance, to guarantee to produce precision.
The components of some equipment need to adhere to one layer of aluminium film on its surface, to increase the spies such as its wearability, corrosion resistance
Different performance, still, since aluminium film will cause certain abrasion in use, it is therefore desirable to periodic maintenance be carried out to it, led to
Normal workpiece maintenance is to re-form one layer of new aluminium film in workpiece surface.However, being needed in such components maintenance maintenance
The aluminium film of original attachment is removed, just can be carried out new aluminium film operation, and in the prior art, removal workpiece surface attachment
Aluminium film is usually had the molten bubble of chemical solution or is removed by the way of mechanical stripping, and removal effect is bad, and is easy to damage work
Part itself.
Summary of the invention
For workpiece surface in the prior art mentioned above aluminium film removal when the bad disadvantage of effect, the present invention mentions
For a kind of method using potassium hydroxide solution removing aluminium film, work is removed with the method that potassium hydroxide solution is chemically reacted
The aluminium film of part surface attachment, effect are preferable.
The technical solution used to solve the technical problems of the present invention is that：A kind of side using potassium hydroxide solution removing aluminium film
Method, this method include the following steps：
（1）, potassium hydroxide solution impregnate：Immersion treatment is carried out to workpiece using potassium hydroxide solution, the potassium hydroxide of use is molten
Liquid is that mass ratio is KOH：H2O=（0.5~1.5）：（8~12）Potassium hydroxide aqueous solution, soaking temperature be 40 DEG C ~ 60 DEG C, reaction
Time is 1-12 hours, until estimating workpiece surface noresidue aluminium film；
（2）, rinsing：It is rinsed using flowing water, rinsing time is greater than or equal to 1 minute；
（3）, neutralization reaction：Neutralization reaction is carried out using nitre fluoric acid, nitre fluoric acid is matched using nitric acid and hydrofluoric acid, each component
Volume ratio be HNO3：HF：H2O=（17~23）：（0.5~1.5）：（17~23）, react anti-to carry out impregnating at a temperature of room temperature
It answers, reaction time 10-30S；
（4）, pure water impregnate：It is carried out soaking flushing 30 minutes or more using flowing water, when immersion should keep the flowing of ultrapure water；
（5）, it is dry：Workpiece after soaking and washing is placed on the jig of drying oven and is dried.
The technical scheme adopted by the invention to solve the technical problem further comprises：
The step（1）The middle potassium hydroxide aqueous solution used is KOH：H2O=1：10.
The step（1）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
The step（1）The middle hydrogen peroxide used is the hydrogen peroxide of concentration 30-32%.
The step（2）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
The step（2）Middle rinsing is 2 times or more.
The step（3）The middle nitre aqueous fluorine acid solution used is HNO3：HF：H2O=20：1：20.
The step（3）The hydrofluoric acid that the middle hydrofluoric acid used is 55% for concentration.
The step（4）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
The step（5）Middle to be dried up using CDA, drying temperature is 150 ± 5 °, and drying time is 6 hours or more.
The beneficial effects of the invention are as follows：The present invention removes workpiece table using the method that potassium hydroxide solution is chemically reacted
The aluminium film of face attachment, it is not only high-efficient, and also removal is clean, thorough, and small to workpiece self-inflicted injury, effect is preferable.
Below in conjunction with the drawings and specific embodiments, the present invention will be further described.
Detailed description of the invention
Fig. 1 is operation of the present invention flow chart.
Specific embodiment
The present embodiment is the preferred embodiment for the present invention, other its all principles and basic structure are identical or close as the present embodiment
As, within that scope of the present invention.
Attached drawing 1 is please referred to, the present invention is mainly a kind of method using potassium hydroxide solution removing aluminium film comprising following
Step：
（1）, workpiece（It or is component）Confirmation compares the kind of quantity sheet content check workpiece to be processed, mainly includes：Workpiece
Base material whether be SUS（That is stainless steel）,Ti（Titanium）, quartz or ceramics, film quality Al（Aluminium）, the quantity of workpiece and specifically production
Whether product are consistent with inventory, whether workpiece surface has scuffing, breakage etc.；
（2）, potassium hydroxide solution impregnate：In the present embodiment, immersion treatment is carried out to workpiece using potassium hydroxide solution, is impregnated
When, potassium hydroxide solution of being subject to did not had workpiece, i.e. guarantee workpiece is all soaked into potassium hydroxide solution, adopts in the present embodiment
Potassium hydroxide solution is that mass ratio is KOH：H2O=（0.5~1.5）：（8~12）Potassium hydroxide aqueous solution, preferably
KOH：H2O=1：10, in the present embodiment, the water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity, and soaking temperature is
40 DEG C ~ 60 DEG C, the reaction time is 1-12 hours, until estimating workpiece surface noresidue aluminium film, in the present embodiment, and hydroxide
Potassium uses commercially available mass percent concentration to be matched for 90% potassium hydroxide solution as mother liquor；
In the present embodiment, when replacing liquid, it need to be measured using dedicated measurer, need to carry out relevant note when replacing liquid medicine
Work is recorded, pays attention to handling with care, in order to avoid cause unnecessary loss.
In the present embodiment, then need to replace when concentration of potassium hydroxide is lower than 3%, replacement will be relevant record, KOH mono-
Surely it to take out, be not placed in liquid chamber wash from pharmaceutical warehouse, using rear remaining KOH, have to return to pharmaceutical warehouse.
（3）, rinsing：It is rinsed using the ultrapure water of flowing, rinsing time is greater than or equal to 1 minute, to clean up
Workpiece surface, in the present embodiment, the water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity, in the present embodiment, drift
It washes progress 2 times or more；
（4）, neutralization reaction：Neutralization reaction is carried out using nitre fluoric acid, in the present embodiment, the nitre fluoric acid of use uses nitric acid and hydrogen fluorine
Acid matches, and when proportion, the volume ratio of each solution is HNO3：HF：H2O=（17~23）：（0.5~1.5）：（17~23）, preferably
HNO3：HF=20：1：20, in the present embodiment, to react to carry out immersion reaction at a temperature of room temperature, the reaction time is 10 ~ 30S, this
In embodiment, the concentrated nitric acid that the nitric acid used is 68% for commercially available mass percent concentration, when it is implemented, can also use
The nitric acid of other concentration carries out equivalent proportion, and in the present embodiment, the hydrofluoric acid used is for commercially available mass percent concentration
55% hydrofluoric acid, when it is implemented, equivalent proportion can also be carried out using the nitric acid of other concentration；
In the present embodiment, when concentration of nitric acid is lower than 10%, nitre fluorspar acid solution is needed replacing, when replacing liquid, need to be used dedicated
Measurer is measured, and is needed to carry out relevant record work when replacing liquid medicine, is paid attention to handling with care, in order to avoid cause unnecessary damage
It loses.
（5）, pure water impregnate：It is carried out soaking flushing 30 minutes or more using the ultrapure water of flowing, when immersion should keep ultrapure
The flowing of water, in the present embodiment, the water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity；
（6）, it is dry：Workpiece after soaking and washing is placed on the jig of drying oven and is dried, (is deoiled using CDA
Water compressed air) it dries up, room temperature is blown to surface object circulating water, puts to drying box and be dried, and drying temperature is 150 ± 5 DEG C, dries
It is 2 hours or more roasting.
（7）, confirmation：Whether there is or not residual films for range estimation confirmation, if there is residual film then needs to be handled again, if not residual
Film is stayed then to be confirmed as qualified product.
The aluminium film for the method removal workpiece surface attachment that the present invention is chemically reacted using potassium hydroxide solution, is not only imitated
Rate is high, and removal is clean, thorough, and small to workpiece self-inflicted injury, effect is preferable.
Claims (9)
1. a kind of method using potassium hydroxide solution removing aluminium film, it is characterized in that：The method includes the following steps：
（1）, potassium hydroxide solution impregnate：Immersion treatment is carried out to workpiece using potassium hydroxide solution, the potassium hydroxide of use is molten
Liquid is that mass ratio is KOH：H2O=（0.5~1.5）：（8~12）Potassium hydroxide aqueous solution, soaking temperature be 40 DEG C ~ 60 DEG C, reaction
Time is 1-12 hours, until estimating workpiece surface noresidue aluminium film；
（2）, rinsing：It is rinsed using flowing water, rinsing time is greater than or equal to 1 minute；
（3）, neutralization reaction：Neutralization reaction is carried out using nitre fluoric acid, nitre fluoric acid is matched using nitric acid and hydrofluoric acid, each component
Volume ratio be HNO3：HF：H2O=（17~23）：（0.5~1.5）：（17~23）, react anti-to carry out impregnating at a temperature of room temperature
It answers, reaction time 10-30S；
（4）, pure water impregnate：It is carried out soaking flushing 30 minutes or more using flowing water, when immersion should keep the flowing of ultrapure water；
（5）, it is dry：Workpiece after soaking and washing is placed on the jig of drying oven and is dried.
2. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（1）The middle potassium hydroxide aqueous solution used is KOH：H2O=1：10.
3. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（1）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
4. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（2）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
5. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（2）Middle rinsing is 2 times or more.
6. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（3）The middle nitre aqueous fluorine acid solution used is HNO3：HF：H2O=20：1：20.
7. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（3）The hydrofluoric acid that the middle hydrofluoric acid used is 55% for concentration.
8. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（4）The middle water used is greater than or equal to the ultrapure water of 12M Ω .CM for resistivity.
9. the method according to claim 1 using potassium hydroxide solution removing aluminium film, it is characterized in that：The step
（5）Middle to be dried up using CDA, drying temperature is 150 ± 5 °, and drying time is 6 hours or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810469103.0A CN108842153A (en) | 2018-05-16 | 2018-05-16 | Utilize the method for potassium hydroxide solution removing aluminium film |
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| CN201810469103.0A CN108842153A (en) | 2018-05-16 | 2018-05-16 | Utilize the method for potassium hydroxide solution removing aluminium film |
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| CN108842153A true CN108842153A (en) | 2018-11-20 |
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| CN201810469103.0A Withdrawn CN108842153A (en) | 2018-05-16 | 2018-05-16 | Utilize the method for potassium hydroxide solution removing aluminium film |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111151502A (en) * | 2020-01-10 | 2020-05-15 | 深圳仕上电子科技有限公司 | Method for cleaning oxide ceramic workpiece |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3898095A (en) * | 1974-01-07 | 1975-08-05 | Gould Inc | Method of etching aluminum |
| JPS5950182A (en) * | 1982-09-13 | 1984-03-23 | Sumitomo Metal Ind Ltd | Removing method of al melt-sprayed film |
| AU5047193A (en) * | 1992-11-23 | 1994-06-02 | Sony Music Entertainment Inc. | Method for removing coatings from compact discs |
| CN101413123A (en) * | 2008-11-25 | 2009-04-22 | 广东东南薄膜科技股份有限公司 | Locating dealuminzation method for surface of aluminum plating film |
| CN101664745A (en) * | 2008-09-05 | 2010-03-10 | 中芯国际集成电路制造(上海)有限公司 | Method for removing aluminum film deposited on surface of heat exchanger in aluminum technology |
-
2018
- 2018-05-16 CN CN201810469103.0A patent/CN108842153A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3898095A (en) * | 1974-01-07 | 1975-08-05 | Gould Inc | Method of etching aluminum |
| JPS5950182A (en) * | 1982-09-13 | 1984-03-23 | Sumitomo Metal Ind Ltd | Removing method of al melt-sprayed film |
| AU5047193A (en) * | 1992-11-23 | 1994-06-02 | Sony Music Entertainment Inc. | Method for removing coatings from compact discs |
| CN101664745A (en) * | 2008-09-05 | 2010-03-10 | 中芯国际集成电路制造(上海)有限公司 | Method for removing aluminum film deposited on surface of heat exchanger in aluminum technology |
| CN101413123A (en) * | 2008-11-25 | 2009-04-22 | 广东东南薄膜科技股份有限公司 | Locating dealuminzation method for surface of aluminum plating film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111151502A (en) * | 2020-01-10 | 2020-05-15 | 深圳仕上电子科技有限公司 | Method for cleaning oxide ceramic workpiece |
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Application publication date: 20181120 |
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