CN108828904A - purification device and exposure machine - Google Patents
purification device and exposure machine Download PDFInfo
- Publication number
- CN108828904A CN108828904A CN201810676479.9A CN201810676479A CN108828904A CN 108828904 A CN108828904 A CN 108828904A CN 201810676479 A CN201810676479 A CN 201810676479A CN 108828904 A CN108828904 A CN 108828904A
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- China
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- gas
- light source
- source portion
- clarifier
- cycling element
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/64—Heavy metals or compounds thereof, e.g. mercury
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/60—Heavy metals or heavy metal compounds
- B01D2257/602—Mercury or mercury compounds
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Biomedical Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Invention provides a kind of purification device, and for the purification to light source portion in exposure machine, including first pipe, the first clarifier and the cycling element connecting with first clarifier, the light source portion is connect by the first pipe with first clarifier；Wherein, into the light source portion gas the impurity in the light source portion is taken out of after enter the first pipe, the gas after purified treatment and is output to the cycling element to gas progress purified treatment export from the first pipe by first clarifier；The impurity concentration of gas of the gas in the cycling element in the cycling element is discharged when being greater than threshold concentration.The present invention solves the exposure illumination of substrate caused by pollution of the impurity to light source portion unit microscope group and exposes the technical issues of homogeneity is affected.
Description
Technical field
The present invention relates to exposure machine field, in particular to a kind of purification device and the exposure machine with purification device.
Background technique
In LCD (Liquid Crystal Display, liquid crystal display) preparation process, exposure machine is substrate preparation essence
The key equipment of thin picture element pattern.In the light-source structure of existing exposure machine, using mercury lamp MLH (the Multi Lamp of miniaturization
House).But such small-sized mercury lamp can generate impurity, such as mercuryvapour, and then inevitably right in exposure production process
The unit microscope group in light source portion pollutes, and microscope group is caused to be atomized, and the exposure illumination and exposure homogeneity of substrate are affected.
The light channel structure figure of exposure machine is as shown in Figure 1, include luminescence unit 101, the first plane mirror 102, second is flat at present
Face mirror 103, object lens 108, fly's eye 104, arc mirror 105, third plane mirror 106, in exposure process, the luminescence unit 101
The light of sending passes through first plane mirror 102, second plane mirror 103, the object lens 108, the fly's eye 104, institute
It states arc mirror 105 and the third plane mirror 106 is irradiated on mask plate 107, realized by the mask plate 107 to substrate
The patterning of film layer on 100.Wherein, the luminescence unit 101, first plane mirror 102, second plane mirror 103,
The object lens 108 and the fly's eye 104 form light source portion 10, and the luminescence unit 101 uses mercury lamp, and the mercury lamp is shining
Impurity, such as mercuryvapour can be generated in the process, and impurity can be deposited on first plane mirror 102, second plane mirror 103, institute
It states on object lens 108 and the fly's eye 104, i.e., inevitably the unit microscope group in the light source portion 10 is polluted, led
The atomization of unit microscope group is caused, and then the exposure illumination of the substrate 100 and exposure homogeneity are affected.
Summary of the invention
The purpose of the present invention is to provide a kind of purification device and exposure machines, to solve impurity to light source portion unit microscope group
The technical issues of exposure illumination and exposure homogeneity of substrate caused by pollution are affected.
The present invention provides a kind of purification device, and for the purification to light source portion in exposure machine, including first pipe, first are only
The cycling element changing device and connecting with first clarifier, the light source portion are net with described first by the first pipe
Change device connection；
Wherein, into the light source portion gas the impurity in the light source portion is taken out of after enter the first pipe,
First clarifier carries out purified treatment to the gas exported from the first pipe, and the gas after purified treatment is exported
To the cycling element；Gas in the cycling element is discharged when impurity concentration is greater than threshold concentration.
Wherein, the purification device further includes second pipe, the cycling element include air storage chamber and be set to the storage
The indoor circulation piece of gas, first clarifier are connect with the air storage chamber, and the circulation piece passes through the second pipe and institute
The connection of light source portion is stated, the air storage chamber is used to the gas in the air storage chamber passing through institute for storing gas, the circulation piece
It states second pipe and is transported to the light source portion.
Wherein, the cycling element further includes the concentration monitoring device connecting with air storage chamber, the concentration monitoring device be used for than
The impurity concentration of the indoor gas of gas storage and the threshold concentration are with the degree of purification of the determination gas.
Wherein, the air storage chamber be also connected with spaced second clarifier of first clarifier, described second
Clarifier is used to purify extraneous gas.
Wherein, the purification device further includes gas collection unit and input channel, and the gas collection unit passes through the input pipe
Road is connect with second clarifier, and the gas collection unit is used to collect extraneous gas, and the gas collection unit is used for as institute
It states cycling element and gas is provided.
Wherein, the purification device further includes pumping part, and the pumping part is set on the input channel, the pumping part
For the gas in the gas collection unit to be pumped to second clarifier.
Wherein, the purification device further includes pressurizing device, and the pressurizing device is connect with the light source portion, the pressurization
Device is used to apply pressure to the light source portion so that the gas in the light source portion enters first clarifier.
Wherein, the cycling element is connected with temperature sensor, and the temperature sensor is for incuding the cycling element
Temperature.
Wherein, the cycling element is additionally provided with temperature regulating part, and the temperature regulating part is connect with the temperature sensor,
The temperature regulating part is used to adjust the temperature of the cycling element when the temperature of the cycling element changes.
The present invention also provides a kind of exposure machines, including above-mentioned purification device.
In conclusion the gas of the impurity carried in the light source portion is transported to by the present invention by the first pipe
First clarifier, first clarifier purify the impurity in the light source portion, reduce in the light source portion
Impurity, avoid the impurity and be deposited on first plane mirror, second plane mirror, the object lens and the fly's eye
On, that is, pollution of the impurity to the unit microscope group in the light source portion is avoided, unit microscope group will not be atomized, the substrate
Exposure illumination and exposure homogeneity be unaffected, improve the service life of exposure machine, at the same avoid production capacity damage
Product of becoming estranged is abnormal.Further, it when the impurity is not deposited in the unit microscope group in the light source portion, eliminates to unit mirror
The cleaning or replacement of group further improve production capacity and have saved cost.In the present invention, the gas of discharge carries out centralized recovery
Processing, reduces the pollution to atmosphere.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the light channel structure schematic diagram that exposure machine includes.
Fig. 2 is the structural schematic diagram of purification device provided in an embodiment of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Purification device of the invention can be applied to exposure machine.Exposure machine includes purification device as shown in Figure 2, described net
Makeup is set including first pipe 110, the first clarifier 20 and the cycling element 30 connecting with first clarifier 20, described
Light source portion 10 is connect by the first pipe 110 with first clarifier 20.
Wherein, into the light source portion 10 gas the impurity in the light source portion 20 is taken out of after enter it is described first pipe
Road 110, first clarifier 20 carry out purified treatment to the gas that exports from the first pipe 110, and by purified treatment
Gas afterwards is output to the cycling element 30.Gas in the cycling element 30 quilt when impurity concentration is greater than threshold concentration
Discharge.In the present invention, it is connected with the first pressurizing device 130 on the cycling element 30 and is connected to the cycling element 30
Output channel 120, when the impurity concentration of the gas in the cycling element 30 be greater than threshold concentration when, it is described first pressurization dress
It sets 130 and applies pressure so that the gas in the cycling element 30 passes through the output channel 120 into the cycling element 30
Discharge.The impurity of the purification device purification is mainly the mercury vapour in the light source portion 10.
The gas of the impurity carried in the light source portion 10 is transported to described by the present invention by the first pipe 110
First clarifier 20, first clarifier 20 purify the impurity in the light source portion 10, reduce the light source portion
Impurity in 10 avoids the impurity and is deposited on first plane mirror 10, second plane mirror 103, the object lens 108
And on the fly's eye 104, that is, pollution of the impurity to the unit microscope group in the light source portion 10 is avoided, unit microscope group will not
It is atomized, the exposure illumination and exposure homogeneity of the substrate 100 are unaffected, and improve exposure machine uses the longevity
Life, while avoiding capacity loss and product exception.Further, when the impurity is not deposited on the unit mirror in the light source portion 10
When in group, the cleaning or replacement to unit microscope group are eliminated, further improve production capacity and has saved cost.In the present invention,
The gas of discharge carries out centralized recovery processing, reduces the pollution to atmosphere.
Therefore, after the impurity in the light source portion 10 is cleaned, mist will not occur for the unit microscope group in the light source portion 10
Change, outgoing is irradiated to the arc mirror 105, the third plane mirror 106 and is irradiated to mask plate out of described light source portion 10
Light on 107 is unaffected, and then by the mask plate 107 to the process of the film pattern on substrate 100
It will not be affected.
The purification device further includes second pipe 140, and the cycling element 30 includes air storage chamber 301 and is set to described
Circulation piece 302 in air storage chamber 301, first clarifier 20 are connect with the air storage chamber 301, and the circulation piece 302 passes through
The second pipe 140 is connect with the light source portion 10, and for storing gas, the circulation piece 302 is used for the air storage chamber 301
Gas in the air storage chamber 301 is transported to the light source portion 10 by the second pipe 140.The air storage chamber 301 connects
It is connected to concentration monitoring device 40, impurity concentration and threshold of the concentration monitoring device 40 for the gas in the air storage chamber 301
It is worth concentration with the degree of purification of the determination gas.Specifically, when miscellaneous in the gas of the concentration monitoring device 40 monitoring
When matter concentration is less than the threshold concentration, that is, show that the purification function of first clarifier 20 is preferably, through described first
Impurity content in 20 purified gas of clarifier is less, the circulation piece 302 gas that impurity content is less
Body, which is transported to, to be continued to take the impurity in the light source portion 10 out of the light source portion 10 in the light source portion 10；When the concentration is supervised
When the impurity concentration surveyed in the gas that device 40 monitors is more than or equal to the threshold concentration, that is, show first clarifier 20
Purification function be that insufficient or described first clarifier 20 is damaged, through in 20 purified gas of the first clarifier
Impurity content be it is more, such as mercury vapour content is more or the mercury vapour and first clarifier 20 in
It is more that scavenging material reacts content of organics generated, at this point, the circulation piece 302 stops working, the first pressurization dress
It sets 130 and applies pressure so that the gas in the cycling element 30 passes through the output channel 120 into the cycling element 30
It is discharged to the external world.First clarifier 20 is replaced simultaneously, to guarantee by described in first clarifier 20 purification and entrance
The gas in light source portion 10 can take the impurity in the light source portion 10 out of the light source portion 10, avoid impurity to the light source portion 10
Unit microscope group pollution, and then guarantee that unit microscope group will not be atomized, the exposure illumination of the substrate 100 and exposure are uniform
Property is unaffected.Therefore, the circulation piece 302 of cycling element 30 of the present invention realizes in the gas
When impurity concentration is less than the threshold concentration, the gas in the air storage chamber 301 is transported to the light source portion 10, realizes institute
Recycling for gas is stated, gas has been saved, has saved cost.First clarifier 20 can be chemical filter.It is described
Concentration monitoring device 40 is with the detector for monitoring organic concentration and concentration of element simultaneously.
The air storage chamber 301 be also connected with spaced second clarifier 50 of first clarifier 20, described
Two clarifiers 50 are used to purify extraneous gas.Specifically, second clarifier 50 that the air storage chamber 301 connects is for net
Change the gas for entering the cycling element 30, i.e., described second clarifier 50 is filtered extraneous gas, is eliminated outer
Influence of boundary's bring impurity to the clean-up effect in the light source portion 10, while the purification for reducing first clarifier 20 is strong
Degree, and then improve the service life of first clarifier 20.Second clarifier 50 can be chemical filter.At this
In embodiment, the gas into second clarifier 50 is atmosphere.
The purification device further includes gas collection unit 60 and input channel 150, and the gas collection unit 60 passes through the input
Pipeline 150 is connect with second clarifier 50, and the gas collection unit 60 is used to collect extraneous gas, and the gas collection unit
60 for providing gas for the cycling element 30.The purification device further includes pumping part 70, and the pumping part 70 is set to institute
It states on input channel 150, the pumping part 70 is used to the gas in the gas collection unit 60 pumping to second clarifier
50。
Specifically, the pumping after gas collection unit 60 collects the gas in atmosphere, on the input channel 150
Gas in the gas collection unit 60 is pumped to second clarifier 50 by part 70, and the gas passes through second clarifier
Enter the air storage chamber 301 after 50 filterings.And when the gas enters in the air storage chamber 301, the circulation piece 302 is by institute
It states the gas in air storage chamber 301 and is transported to the light source portion 10.
The purification device further includes the second pressurizing device 80, and second pressurizing device 80 connects with the light source portion 10
It connects, second pressurizing device 80 is used to apply pressure so that the gas in the light source portion 10 enters institute to the light source portion 10
State the first clarifier 20.Specifically, being mixed when the gas enters in the light source portion 10 with the impurity in the light source portion 10
Afterwards, in order to rapidly enter the gas in the light source portion 10 in first clarifier 20, second pressurizing device 80 is opened
It opens and the gas is pressed into first clarifier 20, reduce residence time of the impurity in the light source portion 10, reduce
Impurity is deposited on the probability of the unit microscope group in the light source portion 10, and then guarantees that unit microscope group will not be atomized, the base
The exposure illumination and exposure homogeneity of plate 100 are unaffected.
The cycling element 30 is connected with temperature sensor 90, and the temperature sensor 90 is for incuding the cycling element
Temperature in 30.Temperature regulating part (not shown), the temperature regulating part and the temperature are equipped in the cycling element 30
It spends sensor 90 to connect, and the temperature regulating part is used to follow described in adjusting when the temperature of the cycling element 30 changes
The temperature of ring element 30.Specifically, the clean-up effect in order to guarantee first clarifier 20 and second clarifier 50, institute
Steady temperature need to be set as by stating the first clarifier 20 and second clarifier 50, and then exclude temperature to the shadow of filter effect
It rings.Therefore, the temperature of the cycling element 30 need to be adjusted to constant, then to connect with the air storage chamber 301 first purification
The temperature of device 20 and second clarifier 50 is constant.Meanwhile in order to guarantee the impurity in the gas not in the circulation
Deposition in unit 30, the cycling element 30 also need to be set as temperature constant.And the temperature for working as the cycling element 30 is constant, institute
When stating that impurity does not deposit in the cycling element 30 in gas, the cleaning to the cycling element 30 is eliminated, is further saved
About cost.Further, when the temperature of the cycling element 30 changes, the temperature sensor 90 can incude described
The temperature change of cycling element 30, and then send the result of induction to the temperature regulating part, the temperature regulating part is by institute
The temperature for stating cycling element 30 is adjusted to preset temperature, ensure that the temperature of the cycling element 30 is constant, and ensure that with
The temperature of first clarifier 20 and second clarifier 50 that the air storage chamber 301 connects is constant.Therefore, the application
The temperature sensor 90 and the temperature regulating part ensure that the temperature of the cycling element 30 is constant and ensure that described
The temperature of first clarifier 20 and second clarifier 50 is constant, and then ensure that first clarifier 20 and described second
The clean-up effect of clarifier 50 avoids deposition of the impurity in the cycling element 30, eliminates to the cycling element 30
Cleaning, saved cost.In the present embodiment, the temperature sensor 90 is connect with the air storage chamber 301, the temperature tune
Part is saved to be set in the air storage chamber 301.
The above disclosure is only the preferred embodiments of the present invention, cannot limit the right model of the present invention with this certainly
It encloses, those skilled in the art can understand all or part of the processes for realizing the above embodiment, and wants according to right of the present invention
Made equivalent variations is sought, is still belonged to the scope covered by the invention.
Claims (10)
1. a kind of purification device, for the purification to light source portion in exposure machine, which is characterized in that only including first pipe, first
The cycling element changing device and connecting with first clarifier, the light source portion are net with described first by the first pipe
Change device connection；
Wherein, into the light source portion gas the impurity in the light source portion is taken out of after enter the first pipe, it is described
First clarifier carries out purified treatment to the gas exported from the first pipe, and the gas after purified treatment is output to institute
State cycling element；Gas in the cycling element is discharged when impurity concentration is greater than threshold concentration.
2. purification device according to claim 1, which is characterized in that the purification device further includes second pipe, described
Cycling element includes air storage chamber and is set to the indoor circulation piece of the gas storage, and first clarifier and the air storage chamber connect
It connects, the circulation piece is connect by the second pipe with the light source portion, and the air storage chamber is for storing gas, the circulation
Part is used to the gas in the air storage chamber being transported to the light source portion by the second pipe.
3. purification device according to claim 2, which is characterized in that the cycling element further includes connecting with air storage chamber
Concentration monitoring device, the concentration monitoring device for the indoor gas of the gas storage impurity concentration and the threshold concentration with
Determine the degree of purification of the gas.
4. purification device according to claim 3, which is characterized in that the air storage chamber is also connected with and first purification
Spaced second clarifier of device, second clarifier are used to purify extraneous gas.
5. purification device according to claim 4, which is characterized in that the purification device further includes gas collection unit and input
Pipeline, the gas collection unit are connect by the input channel with second clarifier, and the gas collection unit is outer for collecting
The gas on boundary, and the gas collection unit is used to provide gas for the cycling element.
6. purification device according to claim 5, which is characterized in that the purification device further includes pumping part, the pumping
Gas part is set on the input channel, and the pumping part is used to pump to the gas in the gas collection unit second purification
Device.
7. purification device according to claim 1, which is characterized in that the purification device further includes pressurizing device, described
Pressurizing device is connect with the light source portion, and the pressurizing device is used to apply pressure so that in the light source portion to the light source portion
Gas enter first clarifier.
8. purification device according to claim 1, which is characterized in that the cycling element is connected with temperature sensor, institute
Temperature sensor is stated for incuding the temperature of the cycling element.
9. purification device according to claim 8, which is characterized in that the cycling element is additionally provided with temperature regulating part, institute
It states temperature regulating part to connect with the temperature sensor, the temperature regulating part is used to become in the temperature of the cycling element
The temperature of the cycling element is adjusted when change.
10. a kind of exposure machine, which is characterized in that including such as described in any item purification devices of claim 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810676479.9A CN108828904A (en) | 2018-06-27 | 2018-06-27 | purification device and exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810676479.9A CN108828904A (en) | 2018-06-27 | 2018-06-27 | purification device and exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108828904A true CN108828904A (en) | 2018-11-16 |
Family
ID=64138912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810676479.9A Pending CN108828904A (en) | 2018-06-27 | 2018-06-27 | purification device and exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108828904A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050091781A1 (en) * | 2003-11-03 | 2005-05-05 | Samsung Electronics Co., Ltd. | Device for cleaning reticle box |
| CN105849887A (en) * | 2013-12-13 | 2016-08-10 | 布鲁克斯Ccs股份有限公司 | Recirculation substrate container purging systems and methods |
| CN105223786A (en) * | 2015-10-30 | 2016-01-06 | 武汉华星光电技术有限公司 | For preventing method and the device of camera lens atomized inside |
| CN106052053A (en) * | 2016-06-23 | 2016-10-26 | 蔡贞贞 | Clean room |
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| CN107246667A (en) * | 2017-07-11 | 2017-10-13 | 无锡商业职业技术学院 | A kind of electric field-assisted indoor air-purification device |
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| CN107999501A (en) * | 2017-11-13 | 2018-05-08 | 京华建设科技有限公司 | A kind of intelligence ventilating type vent cabinet |
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Application publication date: 20181116 |
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| RJ01 | Rejection of invention patent application after publication |