CN108732670A - A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength - Google Patents

A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength Download PDF

Info

Publication number
CN108732670A
CN108732670A CN201810742641.2A CN201810742641A CN108732670A CN 108732670 A CN108732670 A CN 108732670A CN 201810742641 A CN201810742641 A CN 201810742641A CN 108732670 A CN108732670 A CN 108732670A
Authority
CN
China
Prior art keywords
grating
gratings
metal dielectric
nanometers
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810742641.2A
Other languages
Chinese (zh)
Inventor
孔钒宇
晋云霞
邵建达
张益彬
王勇禄
曹红超
陈俊明
陈鹏
徐姣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Institute of Optics and Fine Mechanics of CAS
Original Assignee
Shanghai Institute of Optics and Fine Mechanics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Institute of Optics and Fine Mechanics of CAS filed Critical Shanghai Institute of Optics and Fine Mechanics of CAS
Priority to CN201810742641.2A priority Critical patent/CN108732670A/en
Publication of CN108732670A publication Critical patent/CN108732670A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1861Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials

Abstract

A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, its main feature is that being integrally formed on a quartz substrate from bottom outer layers metal layer, rest layers and grating layer successively, the grating layer is trapezoidal grating, and the material of the trapezoidal grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;860-930 nanometers of groove depth.The present invention is more than 90% in 65 ° of incident angle, in -1 grade of reflection diffraction efficiency of 750-850 nano wavebands TE polarizations.800 nanometer laser of incident wavelength is incident to grating surface with 65 ° or 17 °, and grating is more than 90% to -1 grade of reflection diffraction efficiency of TE polarised lights.The pulse surface damage threshold value of the present invention is 0.4J/cm2@35fs, 800 ± 35nm.The present invention can be used as the pulse compress gratings of high power ultra-short pulse laser system.

Description

A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength
Technical field
The present invention relates to high power laser light chirped pulse amplification system, especially a kind of metal of 800 nanometer centers wavelength Deielectric-coating broadband pulse compress gratings.
Background technology
High power ultra-short pulse laser device based on chirped pulse amplification technique is mutual in plasma physics, light and substance The fields such as effect and ultrafast observation have a wide range of applications demand.Reflective gratings for broadening and compressing femto-second laser pulse It plays an important role in chirped pulse amplification system.Pulse compress gratings must have higher diffraction efficiency, anti-laser to damage Hinder threshold value and sufficiently wide bandwidth of operation.Earliest pulse compress gratings are gold-plated gratings, its bandwidth of operation is relatively wide, but by In with stronger absorption characteristic, it is difficult to obtain high-diffraction efficiency and threshold for resisting laser damage.Multi-layer dielectric gratings have height The advantages that diffraction efficiency and high resisting laser damage ability, but its internal stress is larger and Bandwidth-Constrained.Metal dielectric film grating knot The characteristic for having closed the wide spectrum and deielectric-coating high damage threshold of metal is ideal wide spectrum high-diffraction efficiency Pulse Compression light Grid.It is all highly beneficial to extend laser system service life for the output power of raising pulse laser system for this.
However, the use high-index material HfO reported2Foot is ensure that Deng the metal dielectric film grating as grating layer Enough diffraction bandwidth, but its laser damage threshold is relatively low, or even also it is slightly below golden light grid.With high power laser system to The direction of more narrow spaces and higher energy output is developed, and invention while having enough high damage thresholds and sufficiently wide diffraction bandwidth Metal dielectric-coating pulse compress gratings are that have strong application demand.
The diffraction theory of metal dielectric film grating cannot be parsed by scalar optical grating diffraction equation, and must be used stringent The algorithm of coupled-mode theory【First technology 1:M.G.Moharam etal.,J.Opt.Soc.Am.A.12,1077(1995)】Essence Really calculate result.As far as we know, nobody provides the metal dielectric-coating broadband pulsewidth of high threshold for 800 nano wavebands Compressed grating.
Invention content
The technical problem to be solved in the present invention is to provide a kind of metal dielectric-coating broadband pulsewidth pressures of 800 nanometer centers wavelength Contracting grating, which is 500-680 nanometers, near 65 ° and 20 ° of incident angle, 750-850 nano wavebands TE polarizations - 1 grade of reflection diffraction efficiency be more than 90%.Grating layer is single SiO2Material ensures that grating has high resisting laser damage energy Power.Therefore realize the metal dielectric-coating pulse compress gratings of wide spectrum, high-diffraction efficiency and high damage threshold to ultrahigh peak work( There is important Practical significance for the laser system of rate.
In order to reach object above, solution of the present invention is:
A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, its main feature is that on a quartz substrate It is integrally formed from metal layer, rest layers and the grating layer of bottom outer layers successively, the grating layer is trapezoidal grating, this is trapezoidal The material of grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;Groove depth 860- 930 nanometers.
The rest layers are also SiO2Material;Thickness is 580-620 nanometers.
The metal layer material is gold, silver or aluminium, and thickness is more than 50 nanometers.
The incident angle of 800 nanometer laser of incident wavelength is 65 ° or 17 °
Experiment shows that technique effect of the invention is as follows:
Metal dielectric-coating broadband of the present invention pulse compress gratings, it is inclined in 750-850 nano wavebands TE in 65 ° of incident angle - 1 grade of reflection diffraction efficiency to shake is more than 90%.800 nanometer laser of incident wavelength is incident to grating surface, grating with 65 ° or 17 ° 90% is more than to -1 grade of reflection diffraction efficiency of TE polarised lights.The simple venation impulse face of metal dielectric-coating broadband pulsewidth grating of the present invention damages It is 0.4J/cm to hinder threshold value2@35fs, 800 ± 35nm.It is super that the metal dielectric-coating broadband pulse compress gratings may be used as high power The pulse compress gratings of short pulse laser system.
Description of the drawings
Fig. 1 is the metal dielectric-coating broadband pulse compress gratings cross-sectional view of the structure of 800 nanometer centers wavelength of the invention.
Fig. 2 is that the metal dielectric-coating broadband pulse compress gratings incident wavelength of 800 nanometer centers wavelength and diffraction efficiency are closed System's figure.
Fig. 3 is that the metal dielectric-coating broadband pulse compress gratings incident angle of 800 nanometer centers wavelength and diffraction efficiency are closed System's figure.
Fig. 4 is that the metal dielectric-coating broadband pulse compress gratings duty ratio of 800 nanometer centers wavelength and wavelength imitate diffraction Rate influence diagram.
Fig. 5 is the metal dielectric-coating broadband pulse compress gratings base angle of 800 nanometer centers wavelength and wavelength to diffraction efficiency Influence diagram.
Specific implementation mode
Technical solution provided by the invention is described in detail below with reference to embodiment, it should be understood that following specific implementations Mode is only illustrative of the invention and is not intended to limit the scope of the invention.
Fig. 1 is the metal dielectric-coating broadband pulse compress gratings cross-sectional view of the structure of 800 nanometer centers wavelength of the invention.By scheming As it can be seen that the metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength of the invention, feature be in quartz substrate 1 from Metal layer 2, rest layers 3 and the grating layer 4 of bottom outer layers successively are integrally formed, and the grating layer 4 is trapezoidal grating, the ladder The material of the trapezoidal grating of shape grating is SiO2;Period A is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;Base angle It is 83 ° -86 °;Groove depth D is 860-930 nanometers.
The rest layers 3 are also SiO2Material;Thickness is 580-620 nanometers.
The metal layer material is gold, silver or aluminium, and thickness is more than 50 nanometers.
The foundation of the present invention is as follows:
It is air (refractive index n=1) above grating, TE polarized incident lights enter trapezoidal grating layer 4 from air, then By rest layers 3, high anti-metal layer 2 is entered, metal layer 2 is reached and is reflected later, again pass by rest layers 3 and grating layer 4, Finally it is emitted to air.In this way, enter metal dielectric-coating broadband of the present invention pulse compress gratings in light is reflected this process again In, for light by optical grating construction and film layer common modulation, TE polarised lights concentrate on -1 grade of reflection, produce high diffraction under wide wave-length coverage The effect of efficiency.
Under structure shown in Fig. 1, the present invention uses rigorous coupled wave approach【First technology 1】It calculates and is based on SiO2Height The diffraction efficiency of the reflective contact metal deielectric-coating pulse compress gratings of the width reflection belt of resisting laser damage ability and metal film, we It is concluded that:
By being set to the grating depth of the metal dielectric-coating pulse compress gratings, shape, period, thicknesses of layers optimization Meter may be implemented -1 order diffraction efficiency in wide wave-length coverage and be higher than 90%.
The numerical optimization result that the present invention obtains metal dielectric-coating broadband pulse compress gratings according to Modeling Calculation is as follows.Institute The grating layer 4 stated is trapezoidal grating, and the material of the trapezoidal grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;860-930 nanometers of groove depth.Rest layers are also SiO2Material;Thickness is 580-620 nanometers.Gold Belong to thicknesses of layers and is more than 50 nanometers.Metal dielectric-coating broadband pulse compress gratings are in 65 ° of incident angle, in 750-850 nanometer waves - 1 grade of reflection diffraction efficiency of section TE polarizations is more than 90%.800 nanometer laser of incident wavelength is incident to grating table with 65 ° or 17 ° Face, grating are more than 90% to -1 grade of reflection diffraction efficiency of TE polarised lights.
Embodiment 1:
The metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, by quartz substrate 1, metal layer 2, residue Layer 3 and trapezoidal grating layer 4 are integrally formed.The material of the trapezoidal grating is SiO2;Period A is 646 nanometers;Bottom duty ratio is 0.53;Base angle=85 °;D=900 nanometers of groove depth.Rest layers are also SiO2Material;Thickness is 600 nanometers.Golden film layer thickness is 200 nanometers.As shown in Figure 2 under the conditions of 65 ° of incident angle, in -1 grade of reflection diffraction effect of 750-850 nano wavebands TE polarizations Rate is more than 90%.As shown in figure 3,800 nanometer laser of incident wavelength is incident to grating surface with 65 ° or 17 °, grating polarizes TE - 1 grade of reflection diffraction efficiency of light is more than 90%.As shown in figure 4, under the conditions of 65 ° of incident angle, duty ratio is in 0.48- 0.58, -1 order diffraction efficiency is higher than 90% in 750-850 nanometer wavelength ranges.As shown in figure 5, in 65 ° of incident angle, accounting is Under conditions of 0.53, within the scope of 83 ° -86 ° of grating base angle, grating all has the diffraction efficiency relatively done.It is wider that this shows that device has Difraction spectrum, diffraction angular spectrum and preferable process allowance.
Experiment measures the simple venation impulse face damage of the metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength of the invention It is 0.4J/cm to hinder threshold value2@35fs, 800 ± 35nm.
800 nanometer centers length metal deielectric-coating pulsewidth gratings of the invention have very wide bandwidth, and grating layer is SiO2 Material has higher laser damage threshold, can be used for high power laser system, play good impulse compressing result.
Finally, it should be noted that above example is only illustrating technical scheme of the present invention technical side and not restrictive Case, it will be understood by those of skill in the art that those are modified or replaced equivalently technical scheme of the present invention, without de- Objective from the technical program and range should all cover in the scope of the claims of the present invention.

Claims (4)

1. a kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength are characterized in that its composition is in quartz Metal layer (2), rest layers (3) and the grating layer (4) of (1) from bottom to top successively are integrally formed in substrate, the grating layer (4) Period for trapezoidal grating, the trapezoidal grating is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;Slot It is 860-930 nanometers deep.
2. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the metal layer (2) Material be gold, silver or aluminium, thickness be more than 50 nanometers.
3. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the rest layers (3) For SiO2Material, thickness are 580-620 nanometers.
4. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the incident wavelength The incident angle of 800 nanometer lasers is 65 ° or 17 °.
CN201810742641.2A 2018-07-09 2018-07-09 A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength Pending CN108732670A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810742641.2A CN108732670A (en) 2018-07-09 2018-07-09 A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810742641.2A CN108732670A (en) 2018-07-09 2018-07-09 A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength

Publications (1)

Publication Number Publication Date
CN108732670A true CN108732670A (en) 2018-11-02

Family

ID=63926382

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810742641.2A Pending CN108732670A (en) 2018-07-09 2018-07-09 A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength

Country Status (1)

Country Link
CN (1) CN108732670A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111580205A (en) * 2020-06-02 2020-08-25 中国科学院上海光学精密机械研究所 Wide-spectrum pulse width compression grating for 54-62 degree incidence
CN114879293A (en) * 2022-04-12 2022-08-09 中国科学院上海光学精密机械研究所 Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060140538A1 (en) * 2004-12-24 2006-06-29 Taisuke Isano Surface reflection type phase grating
CN102360090A (en) * 2011-09-30 2012-02-22 中国科学院上海光学精密机械研究所 Broadband metal dielectric reflection grating
CN102928905A (en) * 2012-11-23 2013-02-13 中国科学院上海光学精密机械研究所 Metal dielectric film wideband pulse compressed grating
CN103728685A (en) * 2013-11-06 2014-04-16 中国科学院上海光学精密机械研究所 Trapezoid metal dielectric film broadband pulse compressed grating
CN104777537A (en) * 2015-04-03 2015-07-15 中国科学院上海光学精密机械研究所 1*2 high-efficiency reflection-type grating
CN207440322U (en) * 2017-10-11 2018-06-01 上海矽安光电科技有限公司 A kind of 800 nano waveband broadband reflection type diffraction grating

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060140538A1 (en) * 2004-12-24 2006-06-29 Taisuke Isano Surface reflection type phase grating
CN102360090A (en) * 2011-09-30 2012-02-22 中国科学院上海光学精密机械研究所 Broadband metal dielectric reflection grating
CN102928905A (en) * 2012-11-23 2013-02-13 中国科学院上海光学精密机械研究所 Metal dielectric film wideband pulse compressed grating
CN103728685A (en) * 2013-11-06 2014-04-16 中国科学院上海光学精密机械研究所 Trapezoid metal dielectric film broadband pulse compressed grating
CN104777537A (en) * 2015-04-03 2015-07-15 中国科学院上海光学精密机械研究所 1*2 high-efficiency reflection-type grating
CN207440322U (en) * 2017-10-11 2018-06-01 上海矽安光电科技有限公司 A kind of 800 nano waveband broadband reflection type diffraction grating

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
孔伟金: "梯形介质膜光栅衍射特性分析", 《光学学报》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111580205A (en) * 2020-06-02 2020-08-25 中国科学院上海光学精密机械研究所 Wide-spectrum pulse width compression grating for 54-62 degree incidence
CN111580205B (en) * 2020-06-02 2021-07-27 中国科学院上海光学精密机械研究所 Wide-spectrum pulse width compression grating for 54-62 degree incidence
CN114879293A (en) * 2022-04-12 2022-08-09 中国科学院上海光学精密机械研究所 Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof

Similar Documents

Publication Publication Date Title
CN103728685A (en) Trapezoid metal dielectric film broadband pulse compressed grating
CN102289014B (en) Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers
CN108008478A (en) Polarization selective reflection formula grating based on metallic multilayer deielectric-coating
CN102928905A (en) Metal dielectric film wideband pulse compressed grating
Eisele et al. Periodic light coupler gratings in amorphous thin film solar cells
CN105891925B (en) 1064 nanometers of polarization independent wideband high-diffraction efficiency bilayer reflection-type all dielectric gratings
CN108732670A (en) A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength
US20120093191A1 (en) Metal diffraction grating with high reflection resistance to a femtosecond mode flow, system including such an grating, and method for improving the damage threshold of a metal diffraction grating
CN106772734A (en) The asymmetric pattern reflection type optical grid of broadband high-diffraction efficiency
EP2413440A3 (en) High-stability light source system and method of manufacturing
CN102520471A (en) Polarization-independent wide band reflection grating
CN102360090A (en) Broadband metal dielectric reflection grating
Svakhin et al. Diffraction gratings with high optical strength for laser resonators
CN104330847A (en) Reflective broadband 1/4 wave plate
Liau et al. Accurate fabrication of anamorphic microlenses and efficient collimation of tapered unstable‐resonator diode lasers
CN107942425A (en) Buried-metal type broadband reflection grating and preparation method thereof
CN104300367B (en) Suppress the method for GaAs base laser high-order modes
US20230105777A1 (en) Mid-infrared semiconductor saturable absorber mirror based on inas/gasb superlattice and preparation method thereof
CN208672830U (en) The unrelated reflective dielectric grating of polarization based on refractive index regulation film
Takada et al. Broadband high-energy mirror for ultrashort pulse amplification system
Butaev et al. Semiconductor laser based on a CdS/ZnSe heterostructure with longitudinal optical pumping by a laser diode
Yashchuk et al. Random lasing in porous scattering medium
CN108761598A (en) Sandwich-type vitreous silica polarizes unrelated 1 × 2 beam-splitting optical grating
Andreani et al. Towards the lambertian limit in thin film silicon solar cells with photonic structures
Flamand et al. New MLD gratings adapted for tiling in petawatt-class lasers

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20181102