CN108732670A - A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength - Google Patents
A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength Download PDFInfo
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- CN108732670A CN108732670A CN201810742641.2A CN201810742641A CN108732670A CN 108732670 A CN108732670 A CN 108732670A CN 201810742641 A CN201810742641 A CN 201810742641A CN 108732670 A CN108732670 A CN 108732670A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Abstract
A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, its main feature is that being integrally formed on a quartz substrate from bottom outer layers metal layer, rest layers and grating layer successively, the grating layer is trapezoidal grating, and the material of the trapezoidal grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;860-930 nanometers of groove depth.The present invention is more than 90% in 65 ° of incident angle, in -1 grade of reflection diffraction efficiency of 750-850 nano wavebands TE polarizations.800 nanometer laser of incident wavelength is incident to grating surface with 65 ° or 17 °, and grating is more than 90% to -1 grade of reflection diffraction efficiency of TE polarised lights.The pulse surface damage threshold value of the present invention is 0.4J/cm2@35fs, 800 ± 35nm.The present invention can be used as the pulse compress gratings of high power ultra-short pulse laser system.
Description
Technical field
The present invention relates to high power laser light chirped pulse amplification system, especially a kind of metal of 800 nanometer centers wavelength
Deielectric-coating broadband pulse compress gratings.
Background technology
High power ultra-short pulse laser device based on chirped pulse amplification technique is mutual in plasma physics, light and substance
The fields such as effect and ultrafast observation have a wide range of applications demand.Reflective gratings for broadening and compressing femto-second laser pulse
It plays an important role in chirped pulse amplification system.Pulse compress gratings must have higher diffraction efficiency, anti-laser to damage
Hinder threshold value and sufficiently wide bandwidth of operation.Earliest pulse compress gratings are gold-plated gratings, its bandwidth of operation is relatively wide, but by
In with stronger absorption characteristic, it is difficult to obtain high-diffraction efficiency and threshold for resisting laser damage.Multi-layer dielectric gratings have height
The advantages that diffraction efficiency and high resisting laser damage ability, but its internal stress is larger and Bandwidth-Constrained.Metal dielectric film grating knot
The characteristic for having closed the wide spectrum and deielectric-coating high damage threshold of metal is ideal wide spectrum high-diffraction efficiency Pulse Compression light
Grid.It is all highly beneficial to extend laser system service life for the output power of raising pulse laser system for this.
However, the use high-index material HfO reported2Foot is ensure that Deng the metal dielectric film grating as grating layer
Enough diffraction bandwidth, but its laser damage threshold is relatively low, or even also it is slightly below golden light grid.With high power laser system to
The direction of more narrow spaces and higher energy output is developed, and invention while having enough high damage thresholds and sufficiently wide diffraction bandwidth
Metal dielectric-coating pulse compress gratings are that have strong application demand.
The diffraction theory of metal dielectric film grating cannot be parsed by scalar optical grating diffraction equation, and must be used stringent
The algorithm of coupled-mode theory【First technology 1:M.G.Moharam etal.,J.Opt.Soc.Am.A.12,1077(1995)】Essence
Really calculate result.As far as we know, nobody provides the metal dielectric-coating broadband pulsewidth of high threshold for 800 nano wavebands
Compressed grating.
Invention content
The technical problem to be solved in the present invention is to provide a kind of metal dielectric-coating broadband pulsewidth pressures of 800 nanometer centers wavelength
Contracting grating, which is 500-680 nanometers, near 65 ° and 20 ° of incident angle, 750-850 nano wavebands TE polarizations
- 1 grade of reflection diffraction efficiency be more than 90%.Grating layer is single SiO2Material ensures that grating has high resisting laser damage energy
Power.Therefore realize the metal dielectric-coating pulse compress gratings of wide spectrum, high-diffraction efficiency and high damage threshold to ultrahigh peak work(
There is important Practical significance for the laser system of rate.
In order to reach object above, solution of the present invention is:
A kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, its main feature is that on a quartz substrate
It is integrally formed from metal layer, rest layers and the grating layer of bottom outer layers successively, the grating layer is trapezoidal grating, this is trapezoidal
The material of grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;Groove depth 860-
930 nanometers.
The rest layers are also SiO2Material;Thickness is 580-620 nanometers.
The metal layer material is gold, silver or aluminium, and thickness is more than 50 nanometers.
The incident angle of 800 nanometer laser of incident wavelength is 65 ° or 17 °
Experiment shows that technique effect of the invention is as follows:
Metal dielectric-coating broadband of the present invention pulse compress gratings, it is inclined in 750-850 nano wavebands TE in 65 ° of incident angle
- 1 grade of reflection diffraction efficiency to shake is more than 90%.800 nanometer laser of incident wavelength is incident to grating surface, grating with 65 ° or 17 °
90% is more than to -1 grade of reflection diffraction efficiency of TE polarised lights.The simple venation impulse face of metal dielectric-coating broadband pulsewidth grating of the present invention damages
It is 0.4J/cm to hinder threshold value2@35fs, 800 ± 35nm.It is super that the metal dielectric-coating broadband pulse compress gratings may be used as high power
The pulse compress gratings of short pulse laser system.
Description of the drawings
Fig. 1 is the metal dielectric-coating broadband pulse compress gratings cross-sectional view of the structure of 800 nanometer centers wavelength of the invention.
Fig. 2 is that the metal dielectric-coating broadband pulse compress gratings incident wavelength of 800 nanometer centers wavelength and diffraction efficiency are closed
System's figure.
Fig. 3 is that the metal dielectric-coating broadband pulse compress gratings incident angle of 800 nanometer centers wavelength and diffraction efficiency are closed
System's figure.
Fig. 4 is that the metal dielectric-coating broadband pulse compress gratings duty ratio of 800 nanometer centers wavelength and wavelength imitate diffraction
Rate influence diagram.
Fig. 5 is the metal dielectric-coating broadband pulse compress gratings base angle of 800 nanometer centers wavelength and wavelength to diffraction efficiency
Influence diagram.
Specific implementation mode
Technical solution provided by the invention is described in detail below with reference to embodiment, it should be understood that following specific implementations
Mode is only illustrative of the invention and is not intended to limit the scope of the invention.
Fig. 1 is the metal dielectric-coating broadband pulse compress gratings cross-sectional view of the structure of 800 nanometer centers wavelength of the invention.By scheming
As it can be seen that the metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength of the invention, feature be in quartz substrate 1 from
Metal layer 2, rest layers 3 and the grating layer 4 of bottom outer layers successively are integrally formed, and the grating layer 4 is trapezoidal grating, the ladder
The material of the trapezoidal grating of shape grating is SiO2;Period A is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;Base angle
It is 83 ° -86 °;Groove depth D is 860-930 nanometers.
The rest layers 3 are also SiO2Material;Thickness is 580-620 nanometers.
The metal layer material is gold, silver or aluminium, and thickness is more than 50 nanometers.
The foundation of the present invention is as follows:
It is air (refractive index n=1) above grating, TE polarized incident lights enter trapezoidal grating layer 4 from air, then
By rest layers 3, high anti-metal layer 2 is entered, metal layer 2 is reached and is reflected later, again pass by rest layers 3 and grating layer 4,
Finally it is emitted to air.In this way, enter metal dielectric-coating broadband of the present invention pulse compress gratings in light is reflected this process again
In, for light by optical grating construction and film layer common modulation, TE polarised lights concentrate on -1 grade of reflection, produce high diffraction under wide wave-length coverage
The effect of efficiency.
Under structure shown in Fig. 1, the present invention uses rigorous coupled wave approach【First technology 1】It calculates and is based on SiO2Height
The diffraction efficiency of the reflective contact metal deielectric-coating pulse compress gratings of the width reflection belt of resisting laser damage ability and metal film, we
It is concluded that:
By being set to the grating depth of the metal dielectric-coating pulse compress gratings, shape, period, thicknesses of layers optimization
Meter may be implemented -1 order diffraction efficiency in wide wave-length coverage and be higher than 90%.
The numerical optimization result that the present invention obtains metal dielectric-coating broadband pulse compress gratings according to Modeling Calculation is as follows.Institute
The grating layer 4 stated is trapezoidal grating, and the material of the trapezoidal grating is SiO2;Period is 500-680 nanometers;Bottom duty ratio is
0.48-0.58;83 ° -86 ° of base angle;860-930 nanometers of groove depth.Rest layers are also SiO2Material;Thickness is 580-620 nanometers.Gold
Belong to thicknesses of layers and is more than 50 nanometers.Metal dielectric-coating broadband pulse compress gratings are in 65 ° of incident angle, in 750-850 nanometer waves
- 1 grade of reflection diffraction efficiency of section TE polarizations is more than 90%.800 nanometer laser of incident wavelength is incident to grating table with 65 ° or 17 °
Face, grating are more than 90% to -1 grade of reflection diffraction efficiency of TE polarised lights.
Embodiment 1:
The metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength, by quartz substrate 1, metal layer 2, residue
Layer 3 and trapezoidal grating layer 4 are integrally formed.The material of the trapezoidal grating is SiO2;Period A is 646 nanometers;Bottom duty ratio is
0.53;Base angle=85 °;D=900 nanometers of groove depth.Rest layers are also SiO2Material;Thickness is 600 nanometers.Golden film layer thickness is
200 nanometers.As shown in Figure 2 under the conditions of 65 ° of incident angle, in -1 grade of reflection diffraction effect of 750-850 nano wavebands TE polarizations
Rate is more than 90%.As shown in figure 3,800 nanometer laser of incident wavelength is incident to grating surface with 65 ° or 17 °, grating polarizes TE
- 1 grade of reflection diffraction efficiency of light is more than 90%.As shown in figure 4, under the conditions of 65 ° of incident angle, duty ratio is in 0.48-
0.58, -1 order diffraction efficiency is higher than 90% in 750-850 nanometer wavelength ranges.As shown in figure 5, in 65 ° of incident angle, accounting is
Under conditions of 0.53, within the scope of 83 ° -86 ° of grating base angle, grating all has the diffraction efficiency relatively done.It is wider that this shows that device has
Difraction spectrum, diffraction angular spectrum and preferable process allowance.
Experiment measures the simple venation impulse face damage of the metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength of the invention
It is 0.4J/cm to hinder threshold value2@35fs, 800 ± 35nm.
800 nanometer centers length metal deielectric-coating pulsewidth gratings of the invention have very wide bandwidth, and grating layer is SiO2
Material has higher laser damage threshold, can be used for high power laser system, play good impulse compressing result.
Finally, it should be noted that above example is only illustrating technical scheme of the present invention technical side and not restrictive
Case, it will be understood by those of skill in the art that those are modified or replaced equivalently technical scheme of the present invention, without de-
Objective from the technical program and range should all cover in the scope of the claims of the present invention.
Claims (4)
1. a kind of metal dielectric-coating broadband pulse compress gratings of 800 nanometer centers wavelength are characterized in that its composition is in quartz
Metal layer (2), rest layers (3) and the grating layer (4) of (1) from bottom to top successively are integrally formed in substrate, the grating layer (4)
Period for trapezoidal grating, the trapezoidal grating is 500-680 nanometers;Bottom duty ratio is 0.48-0.58;83 ° -86 ° of base angle;Slot
It is 860-930 nanometers deep.
2. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the metal layer (2)
Material be gold, silver or aluminium, thickness be more than 50 nanometers.
3. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the rest layers (3)
For SiO2Material, thickness are 580-620 nanometers.
4. metal dielectric-coating broadband according to claim 1 pulse compress gratings, it is characterised in that the incident wavelength
The incident angle of 800 nanometer lasers is 65 ° or 17 °.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111580205A (en) * | 2020-06-02 | 2020-08-25 | 中国科学院上海光学精密机械研究所 | Wide-spectrum pulse width compression grating for 54-62 degree incidence |
CN114879293A (en) * | 2022-04-12 | 2022-08-09 | 中国科学院上海光学精密机械研究所 | Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060140538A1 (en) * | 2004-12-24 | 2006-06-29 | Taisuke Isano | Surface reflection type phase grating |
CN102360090A (en) * | 2011-09-30 | 2012-02-22 | 中国科学院上海光学精密机械研究所 | Broadband metal dielectric reflection grating |
CN102928905A (en) * | 2012-11-23 | 2013-02-13 | 中国科学院上海光学精密机械研究所 | Metal dielectric film wideband pulse compressed grating |
CN103728685A (en) * | 2013-11-06 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Trapezoid metal dielectric film broadband pulse compressed grating |
CN104777537A (en) * | 2015-04-03 | 2015-07-15 | 中国科学院上海光学精密机械研究所 | 1*2 high-efficiency reflection-type grating |
CN207440322U (en) * | 2017-10-11 | 2018-06-01 | 上海矽安光电科技有限公司 | A kind of 800 nano waveband broadband reflection type diffraction grating |
-
2018
- 2018-07-09 CN CN201810742641.2A patent/CN108732670A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060140538A1 (en) * | 2004-12-24 | 2006-06-29 | Taisuke Isano | Surface reflection type phase grating |
CN102360090A (en) * | 2011-09-30 | 2012-02-22 | 中国科学院上海光学精密机械研究所 | Broadband metal dielectric reflection grating |
CN102928905A (en) * | 2012-11-23 | 2013-02-13 | 中国科学院上海光学精密机械研究所 | Metal dielectric film wideband pulse compressed grating |
CN103728685A (en) * | 2013-11-06 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Trapezoid metal dielectric film broadband pulse compressed grating |
CN104777537A (en) * | 2015-04-03 | 2015-07-15 | 中国科学院上海光学精密机械研究所 | 1*2 high-efficiency reflection-type grating |
CN207440322U (en) * | 2017-10-11 | 2018-06-01 | 上海矽安光电科技有限公司 | A kind of 800 nano waveband broadband reflection type diffraction grating |
Non-Patent Citations (1)
Title |
---|
孔伟金: "梯形介质膜光栅衍射特性分析", 《光学学报》 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111580205A (en) * | 2020-06-02 | 2020-08-25 | 中国科学院上海光学精密机械研究所 | Wide-spectrum pulse width compression grating for 54-62 degree incidence |
CN111580205B (en) * | 2020-06-02 | 2021-07-27 | 中国科学院上海光学精密机械研究所 | Wide-spectrum pulse width compression grating for 54-62 degree incidence |
CN114879293A (en) * | 2022-04-12 | 2022-08-09 | 中国科学院上海光学精密机械研究所 | Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof |
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Application publication date: 20181102 |