CN102289014B - Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers - Google Patents
Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers Download PDFInfo
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- CN102289014B CN102289014B CN 201110275141 CN201110275141A CN102289014B CN 102289014 B CN102289014 B CN 102289014B CN 201110275141 CN201110275141 CN 201110275141 CN 201110275141 A CN201110275141 A CN 201110275141A CN 102289014 B CN102289014 B CN 102289014B
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Abstract
The invention relates to a metal dielectric film reflection polarization beam splitting grating for a waveband of 1,053 nanometers, which is characterized in that the metal dielectric film reflection polarization beam splitting grating is formed in a mode that a silver layer, a high reflection film layer and a rectangular grating are plated on a quartz substrate sequentially; the rectangular grating has a period of 680.6 nanometers and a duty cycle of 0.2; a grating etching depth is in the range of 374 to 476 nanometers; the thickness of the silver layer is 100 nanometers; an intermediate layer of the high reflection film layer is a high refractive index layer; and inner and outer layers of the high reflection film layer are low refractive index layers. The metal dielectric film reflection polarization beam splitting grating disclosed by the invention has high extinction ratio and diffraction efficiency and wider bandwidth and angular width, can be used for a high-power laser system and has a good polarization beam splitting effect.
Description
Technical field
The present invention relates to high power laser system, a kind of metal dielectric-coating polarization beam-splitting grating particularly is a kind of metal dielectric-coating reflection type polarized beam splitting optical grating based on the width reflection belt of the high laser damage threshold of multilayer dielectric film and metal film for 1053 nano wave lengths.
Background technology
The characteristics such as laser is good with its distinctive monochromaticity, coherent length is long, directive property is high, energy density is high make it become a wonderful work in the natural science.High power laser light is having widely application aspect national economy, the front line science researchs such as physics, chemistry, material science, life science, environmental science, energy science; In national security fields such as space communtication, laser radar, photoelectronic warfares great application potential is arranged more.The development of laser aid be unable to do without the transmission of optical component, and along with the development of high power laser system, narrower its pulse frequency spectrum of pulsewidth is abundanter, thus bandwidth and the threshold value of optical component has all been proposed requirements at the higher level.
In high power laser system, polarization beam apparatus is one of important optical device, light can be divided into the orthogonal polarized light of two bundle polarization modes.Traditional polarization beam apparatus mainly is crystal or multilayer dielectric film.But the polarization beam apparatus volume of birefringece crystal is large, expensive; Film polarization beam apparatus bandwidth of operation is little, and the rete number is many, produces easily stress, and it is very high that extinction ratio is not allowed to be easy to do.Along with the development of micro-fabrication technology, sub-wave length grating is able to surface relief type grating as polarization beam apparatus, is easy to miniaturization and integrated.And based on the high laser damage threshold of multilayer dielectric film and the width reflection belt of metal film, the metal dielectric film grating of design has the performance of high laser damage threshold, high-diffraction efficiency, wide bandwidth and wide angular spectrum.The characteristic of the wide angular spectrum of metal dielectric film grating can be so that the laser system design be more flexible.The metal dielectric-coating polarization beam-splitting grating can be produced in a large number by ripe coating technique and lithographic technique, has important practical prospect.
The diffraction theory of metal dielectric film grating, can not be resolved by scalar optical grating diffraction equation, and must adopt the algorithm [formerly technology 1:M.G..Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory accurately to calculate the result.As far as we know, nobody provides wide spectrum for 1053 nano wavebands, the metal dielectric-coating reflection type polarized beam splitting device grating of wide angular spectrum.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of metal dielectric-coating polarization beam-splitting grating for 1053 nano wavebands, this grating can be divided into different directions with two kinds of orthogonal light of polarization mode of TE, TM and propagate, 50.7 ° of incident angles, at 0 grade of reflection diffraction efficiency of-1 grade of reflection diffraction efficiency of 1030～1070 nano waveband TE polarizations and TM polarization all greater than 97%, 0 grade and-1 grade of extinction ratio greater than 20dB.Operation wavelength is 1053 nanometers, and incident angle is 50.7 ° ,-1 grade of reflection diffraction efficiency of TE polarization and 0 grade of reflection diffraction efficiency of TM polarization all greater than 98%, 0 grade of extinction ratio and-1 grade of extinction ratio greater than 40dB.Therefore can realize the metal dielectric film grating of wide spectrum, wide angular spectrum, high-diffraction efficiency and High Extinction Ratio, have important Practical significance.
Technical solution of the present invention is as follows:
A kind of metal dielectric-coating polarization beam-splitting grating for 1053 nano wavebands, so its characteristics are on quartz substrate, the silver layer that is coated with successively, highly reflecting films layer and rectangular raster consist of, the cycle of this rectangular raster is 680.6 nanometers, dutycycle is 0.2, silver thickness is 100 nanometers, and etching depth is 374 ~ 476 nanometers.
Described high-reflecting film layer is comprised of 3 tunics, and the middle layer is high refractive index layer, and its material is TiO
2Or Ta
2O
5, internal layer and skin are low-index film, its material is SiO
2, described highly reflecting films layer is regular film system or non-regular thin film.
The material of described rectangular raster is HfO
2
Foundation of the present invention is as follows:
Fig. 1 is the sectional view of metal dielectric-coating polarization beam-splitting grating structure of the present invention.The TE polarized incident light corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence, the TM polarized incident light corresponding to the direction of vibration of magnetic vector perpendicular to the plane of incidence.The grating top is air (refractive index is n=1) as seen from the figure, and light enters into rectangular raster from air, then enters into the high-reflecting film layer, arrives silver layer and is reflected afterwards, again passes through rete and grating, shines at last air.TE enters boundary condition corresponding to grating layer with the TM polarization, produces different equivalent refractive indexs.According to Maxwell equation, TE has different boundary conditions and equivalent refractive index equally with the TM polarization in rete.Like this, enter the metal dielectric-coating polarization beam-splitting grating at light and be reflected in this process again, light is modulated jointly by grating, rete, and the TE polarized light concentrates on-1 grade of reflection, and the TM polarized light concentrates on 0 grade of reflection, has produced the effect of polarization separation.
Under structure shown in Figure 1, the present invention adopts rigorous coupled wave theoretical [formerly technology 1] to calculate diffraction efficiency and extinction ratio based on the reflective contact metal deielectric-coating polarization beam-splitting grating of the width reflection belt of the high laser damage threshold of multilayer dielectric film and metal film, and we obtain conclusion:
By the grating degree of depth, shape, cycle, the rete number of plies and the thickness optimization design to described metal dielectric-coating polarization beam-splitting grating, can realize that reflected light is 0 grade of polarization separation with-1 grade.
The present invention calculates the numerical optimization result of metal dielectric-coating polarization beam-splitting grating according to understanding, and namely the etching degree of depth is between 374～476 nanometers, and dutycycle is between 0.174～0.36, and grating reflected extinction ratio under 45 °～55 ° incident angles is higher than 20dB.50.7 ° of incident angles, at 0 grade of reflection diffraction efficiency of-1 grade of reflection diffraction efficiency of 1030-1070 nano waveband TE polarization and TM polarization all greater than 97%, 0 grade and-1 grade of extinction ratio greater than 20dB.Operation wavelength is 1053 nanometers, and incident angle is 50.7 ° ,-1 grade of reflection diffraction efficiency of TE polarization and 0 grade of reflection diffraction efficiency of TM polarization all greater than 98%, 0 grade of extinction ratio and-1 grade of extinction ratio greater than 40dB.
Description of drawings
Fig. 1 is reflective contact metal deielectric-coating polarization beam-splitting grating section of structure of the present invention.
Fig. 2 is reflective contact metal deielectric-coating polarization beam-splitting grating incident wavelength and diffraction efficiency graph of a relation.
Fig. 3 is reflective contact metal deielectric-coating polarization beam-splitting grating incident wavelength and extinction ratio graph of a relation.
Fig. 4 is 0 grade of incident angle of reflective contact metal deielectric-coating polarization beam-splitting grating and diffraction efficiency graph of a relation.
Fig. 5 is reflective contact metal deielectric-coating polarization beam-splitting grating-1 grade incident angle and diffraction efficiency graph of a relation.
Fig. 6 is reflective contact metal deielectric-coating polarization beam-splitting grating incident angle and extinction ratio graph of a relation.
Embodiment
The cross-section structure of the reflective contact metal deielectric-coating polarization beam-splitting grating model of 1053 nano wavebands that the present invention proposes as shown in Figure 1.It is characterized in that by quartz substrate, highly reflecting films layer 5 and rectangular raster 1 one that silver layer 6,3 layer dielectrics form consist of, the middle layer 3 of highly reflecting films layer 5 is high refractive index layer, and internal layer 2 outer 4 is low-index layer, θ-incident angle Λ-grating cycle f-dutycycle.
Embodiment:
Reflective contact metal deielectric-coating polarization beam-splitting grating, by on quartz substrate, the highly reflecting films layer 5 and rectangular raster 1 one that be coated with successively silver layer 6, are comprised of 3 layer dielectrics consist of, and the material of this rectangular raster 1 is HfO
2(refractive index 1.96), the cycle is 680.6 nanometers, and dutycycle is 0.2, and thickness is 417 nanometers.Middle layer 3 materials of highly reflecting films layer 5 are HfO
2, thickness is 95 nanometers, internal layer 4 and outer 2 membrane materials are SiO
2(refractive index 1.45), thickness are respectively 171 nanometers and 52 nanometers.Silver layer 6 thickness are 100 nanometers.When being 50.7 ° such as Fig. 2 incident angle, to 1053 nanometer incident lights ,-1 order diffraction efficient of grating TE and the 0 order diffraction efficient of TM are all very high, and is all very low greater than-1 order diffraction efficient of the 0 order diffraction efficient of 98%, TE and TM, less than 1%.As shown in Figure 3, under 1053 nano wave lengths the extinction ratio of two orders of reflection time all greater than 40dB, and in the 1030-1076 nanometer range extinction ratio all greater than 20dB.As shown in Figure 4, under incident wavelength 1053 nanometers, under 40 ° of-65 ° of incident angles, the 0 order diffraction efficient very high (〉 98% of TM), the 0 order diffraction efficient of TE is very low.As shown in Figure 5, under incident wavelength 1053 nanometers, under 40 ° of-65 ° of incident angles ,-1 order diffraction efficient very high (〉 98% of TE) ,-1 order diffraction efficient of TM is very low.As shown in Figure 6, in 44 ° of-57 ° of ranges of incidence angles, two level secondary reflection extinction ratios obtain the highest extinction ratio all greater than 20dB when incident angle is 50.7 °.This shows that device can work in larger incident angle scope.
The present invention's 1053 nanometer reflection formula metal dielectric-coating polarization beam-splitting gratings have very high extinction ratio and diffraction efficiency, and wider bandwidth and angular width can be used for high power laser system, play good polarization spectro effect.
Claims (2)
1. the metal dielectric-coating reflection type polarized beam splitting optical grating of a nano waveband, it is characterized in that on quartz substrate, the silver layer that is coated with successively (6), highly reflecting films layer (5) and rectangular raster (1) consist of, the cycle of this rectangular raster (1) is 680.6 nanometers, and dutycycle is 0.2, and silver layer (6) thickness is 100 nanometers, etching depth is 374～476 nanometers, described highly reflecting films layer (5) is comprised of 3 tunics, and middle layer (3) are high refractive index layer, and its material is TiO
2, Ta
2O
5Or HfO
2, internal layer (4) and outer (2) they are low-index film, its material is SiO
2, the material of described rectangular raster (1) is HfO
2
2. the metal dielectric-coating reflection type polarized beam splitting optical grating of 1053 nano wavebands as claimed in claim 1 is characterized in that described highly reflecting films layer is regular film system, or non-regular thin film.
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| CN102314040B (en) * | 2011-09-05 | 2013-04-17 | 青岛大学 | Wide spectrum metal dielectric film grating and optimization method thereof |
| CN102928905A (en) * | 2012-11-23 | 2013-02-13 | 中国科学院上海光学精密机械研究所 | Metal dielectric film wideband pulse compressed grating |
| CN104777532B (en) * | 2015-04-03 | 2017-02-22 | 中国科学院上海光学精密机械研究所 | Ultra-narrow-band TE (transverse electric) polarizing spectrum selective absorber based on cascaded fiber grating structure |
| CN104880755B (en) * | 2015-06-02 | 2017-08-25 | 中国科学院上海技术物理研究所 | A kind of sub-wave length metal grating polarizer for being monolithically integrated in high index of refraction substrate |
| CN104977734A (en) * | 2015-06-19 | 2015-10-14 | 安徽医科大学 | Reflection type broadband polarization rotator |
| US11693167B2 (en) | 2017-05-30 | 2023-07-04 | Lawrence Livermore National Security, Llc | System and method for improving the laser damage threshold of multilayer dielectric gratings |
| CN108008478B (en) * | 2017-12-01 | 2022-09-09 | 暨南大学 | Polarization selection reflection type grating based on metal multilayer dielectric film |
| CN110275233B (en) * | 2018-07-23 | 2021-04-16 | 西北工业大学深圳研究院 | Narrow-period long-wave infrared multilayer grating structure |
| CN110196464B (en) * | 2019-07-01 | 2022-07-29 | 江南大学 | Method for realizing ultra-wideband light absorption and composite microstructure |
| CN113253449B (en) * | 2021-04-08 | 2022-08-30 | 同济大学 | Optimized design method for small-angle high-diffraction-efficiency multilayer film rectangular grating structure |
| CN114460676B (en) * | 2022-03-03 | 2024-01-09 | 福建睿创光电科技有限公司 | 1030nm sinusoidal medium grating and manufacturing method thereof |
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| CN1322340C (en) * | 2005-06-08 | 2007-06-20 | 中国科学院上海光学精密机械研究所 | High-diffraction efficiency quartz transmission grating of 1053 nano wavelength |
| CN101546002B (en) * | 2009-04-22 | 2011-06-08 | 重庆文理学院 | Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band |
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