CN114879293A - Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof - Google Patents
Large-bottom wide-small-sharp-angle pulse compression metal grating and preparation method and application thereof Download PDFInfo
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Abstract
The metal pulse compression grating is compatible with a large azimuth angle, a super 400nm bandwidth, a large bottom width and a small angle, and comprises grating parameter optimization design and a preparation process. The bottom width ratio of the grating is more than 0.6, the shape factor is 0.5-2.5, the groove depth is 160-250 nm, and the linear density is 1300-1650 g/mm. The preparation process comprises the steps of substrate cleaning, gluing, baking, exposure, development and metal film plating. The broadband high-efficiency grating has a structure with a large bottom, a wide width and a small sharp angle, and when TM polarized light is incident at a minus 1-level Littrow angle in a large azimuth angle of plus or minus 15 degrees or 20 degrees, the efficiency of the grating in a bandwidth of over 400nm exceeds 90 percent. The grating and related process parameters of the present invention can support hundreds of watts of monocycle pulse compression grating storage.
Description
Technical Field
The invention belongs to a reflective grating, and particularly relates to a metal pulse compression grating compatible with a large azimuth angle and a super 400nm bandwidth, a large-bottom width and a small-tip angle, and a preparation method and application thereof.
Background
The ultrastrong ultrashort laser field is in the key stage of making major breakthrough and exploiting application, and the ultrastrong ultrashort laser light source and the advanced technological innovation platform depending on the ultrastrong ultrashort laser light source are being vigorously developed internationally. All research institutes and scientific research institutions around the world effectively utilize a Chirped Pulse Amplification (CPA) technology and an Optical Parametric Chirped Pulse Amplification (OPCPA) technology to push the peak power of a laser to the order of tens of watts (PW). In the next decade, 100PW ultrashort laser devices with ultra-high power are delivered to use in succession around the world. Impacting higher peak power has become a competition in various countries.
In both CPA and OPCPA laser amplification techniques, the grating compressor is the core module. A key element of the grating compressor is the grating. The grating widely used in high peak power laser system includes metal grating, all-dielectric grating and metal-dielectric mixed grating. The all-dielectric grating and the metal dielectric mixed grating are limited by spectral bandwidth and size, and are not widely applied to femtosecond-level pulse compression systems at present. Metal gratings are favored in small to large laser devices due to their advantages of large bandwidth, high efficiency, excellent surface shape, wide angular spectrum, etc.
At present, under the pulse energy of hundreds of joules or even kilojoules, the pulse width can be compressed to hundreds of femtoseconds (fs) or even 18.6fs, and the peak power of the output pulse can reach the PW or even 10 PW. In the planning of ultrashort laser systems with very high peak pulse power, e.g. 100PW or even EW levels, the compressed pulse width further requires 10fs, few cycles or even a single cycle. At this point, the spectral bandwidth of the pulse is required to be up to 400 nanometers (nm).
Currently, commercially available standard gold grating densities (g/mm) are predominantly 1400g/mm, 1480g/mm and 1740g/mm, with center wavelengths at 800nm or 910nm, providing bandwidths typically 100nm and 200nm [ J.A. Britten et al, Optics Letters 21, 540 (1996); US20200142107a 1; CN 111580205A; alessi et al, Optics & Laser Technology 117, 239 (2019). Moreover, the design and application of gold gratings, whether for the grating manufacturer or the laser builder, is limited to the azimuthally-free case. In addition, although the gold grating process is mature, no detailed preparation process parameters are disclosed. To our knowledge, no one has designed, prepared and tested a metal grating with a large azimuth angle (more than plus or minus 15 degrees) and an azimuth angle exceeding 400nm bandwidth.
Disclosure of Invention
The invention aims to solve the technical problem of realizing the metal grating which is compatible with a large azimuth angle and has the spectral width covering 400 nm. The diffraction efficiency of the grating is more than 90% in the wavelength range from 750nm to more than 1150nm under the condition that TM polarized light is incident at a large azimuth angle of +/-15-20 degrees and a Littrow angle of-1 level. The detailed process parameters of the grating are suitable for metal gratings (1300-1600 g/mm) with large-range linear density, and the grating has practical value. The grating can be used for pulse spectrum broadening and compression with single period (3fs) and larger pulse width, and has important economic and application values.
The technical solution of the invention is as follows:
on one hand, the invention provides a large-base-width small-tip-angle pulse compression metal grating which is characterized in that the base width ratio of the metal grating is more than 0.6, the shape factor is 0.5-2.5, the groove depth is 160-250 nm, and the linear density is 1300-1650 g/mm.
On the other hand, the invention also provides a preparation method of the metal grating, which is characterized by comprising the following steps:
1) the grating parameter optimization design: according to requirements, a strict coupled wave calculation program is utilized to determine the optimal grating parameters for realizing high diffraction efficiency in a specific spectral bandwidth, an optimized single-layer grating structure or two-layer grating structure is selected, and the optimized initial wavelength is set in the range of 700 nm-1150 nm. According to the operation amount and the actual optimization efficiency curve effect, the number of the layers of the selected grating structure is more than 1, and the number of the wavelength sampling points of the selected evaluation function is more than 1. The metal grating mask structure is easy to have high diffraction efficiency of over 400nm bandwidth in the range of bottom width ratio of more than 0.6, shape factor of 0.5-2.5, groove depth of 160-250 nm and linear density of 1300-1650 g/mm;
2) cleaning a substrate; wiping the substrate with alcohol or acetone to remove impurities and pollution on the surface of the substrate to obtain a clean substrate;
3) gluing: coating the photoresist on the clean substrate at a coating speed of 1800-3800 r/r/min for 10-30 s, wherein the coating thickness is 150-300 nm, and thus obtaining the substrate coated with the photoresist;
4) baking: baking the substrate coated with the photoresist for 2-4 min at 100 ℃:
5) exposure: the exposure is to carry out interference exposure on the substrate coated with the photoresist layer for 200 seconds by using 325nm double light beams at the exposure power of 50-60 muW or to carry out interference exposure for 300 seconds by using 413nm double light beams at the exposure power of 13-16gW to obtain an exposed sample;
6) and (3) developing: soaking the exposed sample for 50-90 s or soaking the exposed sample for 5-14 s by using a sodium hydroxide solution with the mass fraction of 4 per mill to prepare a latent image grating;
7) plating a metal film: and plating a metal film with the thickness of 100-300 nm on the latent image grating by a magnetron sputtering or electron beam evaporation technology, wherein the metal film is made of gold, silver or a gold-silver alloy.
The invention also provides an application of the parallel-arranged large-bottom wide-small-sharp-angle pulse compression metal grating pair in a laser.
The invention has the following technical effects:
1) the grating of the invention can have a diffraction efficiency of greater than 90% over a spectral bandwidth of more than 400nm under conditions where TM polarized light is incident at a-1 st Littrow angle.
2) The grating of the present invention has a-1 order diffraction efficiency of greater than 90% over a wide angular spectrum of around 10 °.
3) The grating has-1-order diffraction efficiency higher than 90% under the condition that the positive and negative angles are within a large azimuth angle of 15-20 degrees.
4) The grating process parameters of the invention are compatible with a wide range of grating line densities.
5) The grating structure of the invention is definite, the technological parameter is stable, the grating and relevant technological parameter of the invention can support hundreds of kilowatts of monocycle pulse compression grating to store. Has important economic and practical values in the fields of spectrometers, high-power lasers and the like.
Drawings
Fig. 1 is a schematic diagram of an optimized grating structure of embodiment 1.
Figure 2 is a graph of grating azimuth and-1 order diffraction efficiency for example 1. The incident angle is 50.3 degrees, the grating linear density is 1443g/mm, the duty ratio is 0.634, the groove depth is 225nm, and the shape factor is 1.91. The azimuth angle is + -20 deg.
Figure 3 is a graph of grating incidence angle and-1 order diffraction efficiency for example 1. No azimuth angle, grating linear density 1443g/mm, duty cycle 0.634, groove depth 225nm, and shape factor 1.91. The incident angle is 0-90 degrees.
Figure 4 is a graph of grating groove depth and-1 order diffraction efficiency for example 1. No azimuth angle, an incidence angle of 50.3 degrees, grating linear density of 1443g/mm, duty ratio of 0.634 and shape factor of 1.91. The groove depth is 150-300 nm.
Figure 5 is a graph of the grating duty cycle and-1 order diffraction efficiency for example 1. No azimuth angle, incidence angle of 50.3 degrees, grating linear density of 1443g/mm, groove depth of 225nm and shape factor of 1.91. The duty ratio is 0.5-1.
Figure 6 is a graph of grating line density and-1 order diffraction efficiency for example 1. No azimuth angle, incident angle of 50.3 °, grating duty cycle of 0.634, groove depth of 225nm, and shape factor of 1.91. The linear density is 1300-1800 g/mm.
Figure 7 is a graph of the grating form factor and-1 order diffraction efficiency for example 1. No azimuth angle, incidence angle of 50.3 degrees, grating linear density of 1443g/mm, duty ratio of 0.634, and groove depth of 225 nm. The azimuth shape factor is 1-3.
Figure 8 is a plot of the measured-1 order diffraction efficiency of the grating of example 1.
Figure 9 is a plot of the measured-1 order diffraction efficiency of the grating of example 2.
Fig. 10 is a schematic diagram of an optimized grating structure of embodiment 3.
Figure 11 is a graph of grating azimuth and-1 order diffraction efficiency for example 3. The incidence angle is 63.4 degrees, the grating linear density is 1527g/mm, the duty ratio is 0.765, the groove depth is 216nm, the shape factor is 1.36, and the gold film thickness is 236 nm. The azimuth angle is + -20 deg.
Figure 12 is a graph of grating incidence angle and-1 order diffraction efficiency for example 3. No azimuth angle, 1527g/mm of grating linear density, 0.765 of duty ratio, 216nm of groove depth, 1.36 of shape factor and 236nm of gold film thickness. The incident angle is 0-90 degrees.
Figure 13 is a graph of grating groove depth and-1 order diffraction efficiency for example 3. No azimuth angle, an incidence angle of 63.4 degrees, a grating linear density of 1527g/mm, a duty ratio of 0.765, a shape factor of 1.36 and a gold film thickness of 236 nm. The groove depth is 150-300 nm.
Figure 14 is a graph of the grating duty cycle and-1 order diffraction efficiency for example 3. No azimuth angle, an incidence angle of 63.4 degrees, grating linear density of 1527g/mm, groove depth of 216nm, shape factor of 1.36 and gold film thickness of 236 nm. The duty ratio is 0.5-1.
Figure 15 is a graph of grating line density and-1 order diffraction efficiency for example 3. No azimuth angle, an incidence angle of 63.4 degrees, a duty ratio of 0.765, a groove depth of 216nm, a shape factor of 1.36 and a gold film thickness of 236 nm. The linear density is 1300-1800 g/mm.
Figure 16 is a graph of the grating form factor and-1 order diffraction efficiency for example 3. No azimuth angle, an incidence angle of 63.4 degrees, grating linear density of 1527g/mm, duty ratio of 0.765, groove depth of 216nm and gold film thickness of 236 nm. The shape factor is 0.5-3.
Figure 17 is a plot of the measured-1 order diffraction efficiency of the grating of example 3.
FIG. 18 is a schematic diagram of a pulse compressor consisting of a large base wide small tip angle metal grating.
In the figure: 1-metal layer, 2-mask layer, 3-metal grating with big bottom, wide bottom and small sharp angle, 4-input pulse and 5-output pulse.
Detailed Description
The present invention will be further described with reference to the following examples and drawings, but the scope of the present invention should not be limited thereto.
Example 1:
selecting a single-layer grating structure, setting the number of layers of the grating structure to be 15, the optimized initial wavelengths to be 750nm and 1150nm, and setting the number of wavelength sampling points of an evaluation function to be 50. As shown in FIG. 1, the parameters of the grating obtained by optimization are respectively the linear density 1443g/mm, the duty ratio 0.634, the groove depth 225nm and the shape factor 1.91. As shown in FIG. 2, under the condition of existence of azimuth angles of-15 degrees to 15 degrees, the-1 st order diffraction efficiency bandwidth of the grating can still reach 400 nm. As shown in FIG. 3, when TM polarized light is incident within a range of 45-61 °, the-1 order diffraction efficiency bandwidth of the grating can still reach 400nm under the condition of no azimuth angle. As shown in FIG. 4, the tolerance range of the groove depth is 183-235 nm. As shown in fig. 5, the large base width (duty cycle greater than 0.6) helps the-1 st order diffraction efficiency bandwidth to reach 400 nm. As shown in FIG. 6, the linear density tolerance is 1400-1500 g/mm. As shown in FIG. 7, small sharp angles (shape factor 1.3-2) contribute to a-1 order diffraction efficiency bandwidth of 400 nm. And preparing the grating with the specification. The substrate is wiped with alcohol or acetone. The substrate was spin coated with a spin coater at 2500r/min for 30s, a photoresist layer about 230nm thick was applied to the substrate, and the substrate was then baked at 100 ℃ for 2 min. Then, the substrate coated with the photoresist layer was exposed to light of 325nm for 200s at an exposure power of 50 μ W using a two-beam interference exposure method. And soaking the exposed sample for 50s by using a sodium hydroxide solution with the mass fraction of 4 per mill. And finally, plating a gold film with the thickness of about 150nm by a magnetron sputtering technology. As shown in fig. 8, the-1 order diffraction efficiency of the prepared grating is higher than 90% in the range of 750-1150 nm.
Example 2:
selecting a single-layer grating structure, setting the number of layers of the grating structure to be 15, the optimized initial wavelengths to be 750m and 1150m, and setting the number of wavelength sampling points of the evaluation function to be 100. As shown in FIG. 1, the parameters of the grating obtained by optimization are respectively the linear density 1443g/mm, the duty ratio 0.634, the groove depth 225nm and the shape factor 1.91. As shown in FIG. 2, under the condition of existence of azimuth angles of-15 degrees to 15 degrees, the-1 st order diffraction efficiency bandwidth of the grating can still reach 400 nm. As shown in FIG. 3, when TM polarized light is incident within a range of 45-61 °, the-1 order diffraction efficiency bandwidth of the grating can still reach 400nm under the condition of no azimuth angle. As shown in FIG. 4, the tolerance range of the groove depth is 183-235 nm. As shown in fig. 5, the large base width (duty cycle greater than 0.6) helps the-1 st order diffraction efficiency bandwidth to reach 400 nm. As shown in FIG. 6, the linear density tolerance is 1400-1500 g/mm. As shown in FIG. 7, small sharp angles (shape factor 1.3-2) contribute to a-1 order diffraction efficiency bandwidth of 400 nm. And preparing the grating with the specification. The substrate is wiped with alcohol or acetone. The substrate was spin coated with a spin coater at 3200r/min for 30s, a photoresist layer about 200nm thick was applied on the substrate, and then the substrate was baked at 100 ℃ for 2 min. Then, the substrate coated with the photoresist layer was exposed for 300s at an exposure power of 35 μ W for 325nm by using a two-beam interference exposure method. And soaking the exposed sample for 12 seconds by using a sodium hydroxide solution with the mass fraction of 6 per mill. And finally, plating a gold film with the thickness of limited 210nm by a magnetron sputtering technology. As shown in fig. 9, the-1 order diffraction efficiency of the prepared grating is higher than 90% in the range of 750-1150 nm.
Example 3:
selecting a double-layer grating structure, setting the number of layers of the grating structure to be 50, the optimized initial wavelengths to be 750nm and 1150nm, and setting the number of wavelength sampling points of the evaluation function to be 50. As shown in FIG. 10, the obtained grating parameters by optimization are respectively the linear density 1527g/mm, the duty ratio 0.765, the groove depth 216nm, the shape factor 1.36 and the gold film thickness 236 nm. As shown in FIG. 11, the-1-order diffraction efficiency bandwidth of the grating can still reach 400nm under the condition of existence of an azimuth angle of-20 degrees. As shown in FIG. 12, when the TM polarized light is incident within the range of 61.4-71 degrees, the-1 order diffraction efficiency bandwidth of the grating can still reach 400nm under the condition of no azimuth angle. As shown in FIG. 13, the tolerance range of the groove depth is 166-238 nm. As shown in fig. 14, the large base width (duty cycle greater than 0.5) helps the-1 st order diffraction efficiency bandwidth to reach 400 nm. As shown in FIG. 15, the linear density tolerance is 1384-1611 g/mm. As shown in FIG. 16, small sharp angles (shape factor between 0.83 and 2.21) contribute to a-1 order diffraction efficiency bandwidth of 400 nm. And preparing the grating with the specification. The substrate is wiped with alcohol or acetone. The substrate was spin coated with a spin coater at a rate of 2100r/min for 30s, a photoresist layer about 250nm thick was applied to the substrate, and the substrate was then baked at 100 ℃ for 2 min. Then, the substrate coated with the photoresist layer was exposed to light of 325nm for 200s at an exposure power of 55 μ W by a two-beam interference exposure method. And soaking the exposed sample for 12 seconds by using a sodium hydroxide solution with the mass fraction of 6 per mill. And finally, plating a gold film with the thickness of about 236nm by a magnetron sputtering technology. As shown in fig. 17, the-1 order diffraction efficiency of the prepared grating is higher than 90% in the range of 742 to more than 1150 nm.
As shown in fig. 18, the embodiment of the present invention further provides a pulse compressor, which includes at least two metal gratings disposed in parallel, and the front-end input broad-spectrum short pulse is compressed into a single-period or near-single-period laser pulse after passing through two ultra-wideband metal grating pairs. In the compressor provided by the embodiment of the invention, the metal pulse compression grating with large bottom, wide width and small sharp angle is used as a pulse compression element, has the advantages of high-1-order diffraction efficiency, flexible use, wide bandwidth and the like, is an ideal diffraction optical device, and has good practical prospect in the field of high-power laser.
The above examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. Modifications and equivalents may be made by those skilled in the art without departing from the spirit of the invention, and these are within the scope of the invention. The protection scope of the present invention shall be subject to the claims.
Claims (7)
1. The pulse compression metal grating with the large base width and the small sharp angle is characterized in that the base width ratio of the metal grating is larger than 0.6, the shape factor is 0.5-2.5, the groove depth is 160-250 nm, and the linear density is 1300-1650 g/mm.
2. The large-base wide small-tip pulse-compressed metal grating of claim 1, wherein the diffraction efficiency is greater than 90% over a spectral bandwidth of more than 400nm at an angle of incidence of TM polarized light at the-1 st Littrow angle.
3. The pulse compression metal grating with the large base width and the small tip angle as claimed in claim 1, wherein the diffraction efficiency of the order-1 is higher than 90% under the condition of a large azimuth angle within plus or minus 15-20 degrees.
4. A method for preparing a large-substrate wide small-tip-angle pulse-compressed metal grating according to any one of claims 1 to 3, comprising the steps of:
step 1) grating parameter optimization design: determining an optimized single-layer grating structure or two-layer grating structure according to requirements, setting the initial wavelength in the range of 700-1150 nm, setting the number of layers of the grating structure to be more than 1, and setting the number of wavelength sampling points of an evaluation function to be more than 1;
designing a metal grating with a base width ratio of more than 0.6, a shape factor of 0.5-2.5, a groove depth of 160-250 nm and a linear density of 1300-1650 g/mm;
step 2) substrate cleaning and gluing: coating photoresist on the cleaned substrate at a coating speed of 1800-3800 r/min for 10-30 s, wherein the thickness is 150-300 nm;
step 4), baking: baking the substrate coated with the photoresist at 100 ℃ for 2-4 min:
step 5) exposure: subjecting to interference exposure with 325nm double light beam at 50-60 μ W exposure power for 200s or 413nm double light beam at 13-16 μ W exposure power for 300s to obtain exposed sample;
step 6) developing: soaking the exposed sample for 50-90 s or soaking the exposed sample for 5-14 s by using a sodium hydroxide solution with the mass fraction of 4 per mill to obtain a latent image grating;
step 7) metal film plating: and plating a metal film with the thickness of 100-300 nm on the latent image grating by magnetron sputtering or electron beam evaporation technology.
5. The method according to claim 4, wherein the metal film is made of gold, silver or a gold-silver alloy.
6. The method according to claim 4, wherein the substrate cleaning is performed by wiping the substrate with alcohol or acetone to remove impurities and contaminants on the surface of the substrate, thereby obtaining a clean substrate.
7. A pulse compressor comprising at least two parallel arranged large-base wide small-tip pulse-compressed metal gratings according to any one of claims 1 to 6.
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