CN108677153A - A kind of sputter prevents that plate changes structure - Google Patents
A kind of sputter prevents that plate changes structure Download PDFInfo
- Publication number
- CN108677153A CN108677153A CN201810865789.5A CN201810865789A CN108677153A CN 108677153 A CN108677153 A CN 108677153A CN 201810865789 A CN201810865789 A CN 201810865789A CN 108677153 A CN108677153 A CN 108677153A
- Authority
- CN
- China
- Prior art keywords
- plate
- sputter
- fixed plate
- prevents
- transport platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Prevent that plate changes structure the invention discloses a kind of sputter, including rack, sputter source, transport platform and workbench are equipped in rack, workbench is arranged in transport platform, sputter source is arranged in the top of workbench, the both sides of transport platform, which are both provided with, prevents board group part, and the lower part of transport platform both sides is both provided with avoiding structure；Prevent that board group part includes fixed plate and changes plate, fixed plate is fixed by the bracket, and the lower end of fixed plate is connect with the upper end for changeing plate, forms an entirety, and fixed plate is made to be smoothly connected with the front side surface for changeing plate；The lower end for changeing plate is provided with extension, the avoiding structure cooperation of extension and transport platform；Prevent the middle and lower part of plate since the target sputtered is deposited on mostly, therefore, after long-time use, it only needs replacing and clears up and change plate part positioned at lower part, it need not be to preventing that board group part integrally carries out changeing cleaning, the use for reducing material reduces cost, and improves the efficiency for changeing and clearing up.
Description
Technical field
Prevent that plate changes structure the present invention relates to a kind of sputter.
Background technology
Vacuum splashing and plating be under vacuum conditions, using physics mode by material source gasification be gaseous molecular, atom or from
Son is deposited in matrix surface by low-pressure gas or gas ions process, makes it have the technology of certain specific function film；Because splashing
During plating, sputter source meeting random direction sputtering, other than adhering on target substrate surface, some can be attached to surrounding
The surface at other positions avoids attachment, depositional coating for protection other structures part, use is needed to prevent that plate carries out covered protection；
It is existing to prevent that plate is an integral structure mostly, integral replacing is needed after long-time use, and clear up the plank changed,
Cost is increased, and reduces efficiency.
Invention content
For the above technical problems, the purpose of the present invention is：Propose a kind of sputter prevents that plate changes knot
Structure.
What technical solution of the invention was realized in：A kind of sputter prevents that plate changes structure, including rack,
Sputter source, transport platform and workbench are equipped in rack, workbench is arranged in transport platform, and sputter source is arranged in the upper of workbench
Side, the both sides of transport platform, which are both provided with, prevents board group part, and the lower part of transport platform both sides is both provided with avoiding structure；It is described to prevent plate
Component includes fixed plate and changes plate, and fixed plate is fixed by the bracket, and the lower end of fixed plate is connect with the upper end for changeing plate, is formed
One entirety, and fixed plate is made to be smoothly connected with the front side surface for changeing plate；The lower end for changeing plate is provided with extension, prolongs
The avoiding structure of extending portion and transport platform coordinates.
Preferably, the fixed plate is spliced with plate is changed by interlaced bridging arrangement, and is bolted.
Preferably, the fixed plate is inclined-plane or arc surface with the working surface for changeing plate, and the working surface of extension is
Horizontal plane.
Preferably, the front side surface of the fixed plate is smooth surface, and the working surface for changeing plate and extension has uniform point
The particle bulge-structure of cloth.
Preferably, the cross sectional shape of the particle bulge-structure is trapezoidal.
Due to the application of the above technical scheme, the present invention has following advantages compared with prior art：
The sputter of the present invention prevents that plate changes structure, prevents board group part by fixed plate and changes plate two parts and form, by
The middle and lower part for preventing plate is deposited on mostly in the target sputtered, therefore, after long-time use, it is only necessary to replace and clear up and be located at
Lower part changes plate part, need not reduce the use of material to preventing that board group part integrally carries out changeing cleaning, reduce
Cost, and improve the efficiency for changeing and clearing up.
Description of the drawings
Technical scheme of the present invention is further explained below in conjunction with the accompanying drawings：
Attached drawing 1 prevents that plate changes the schematic diagram of structure for a kind of sputter of the invention；
Attached drawing 2 is the schematic diagram of the particle bulge-structure of the present invention.
Specific implementation mode
Illustrate the present invention below in conjunction with the accompanying drawings.
As shown in attached drawing 1-2, a kind of sputter of the present invention prevents that plate changes structure, including rack, in rack
Equipped with sputter source 1, transport platform 2 and workbench 3, workbench 3 is arranged in transport platform 2, and sputter source 1 is arranged in the upper of workbench 3
Side, the both sides of transport platform 2, which are both provided with, prevents board group part, and the lower part of 2 both sides of transport platform is both provided with avoiding structure 4.
Described to prevent that board group part includes fixed plate 11 and changes plate 12, fixed plate 11 is fixed by the bracket, fixed plate 11
Lower end and the upper end for changeing plate 12 are spliced by interlaced bridging arrangement, and are bolted, and an entirety is formed, Gu
Fixed board 11 and the front side working surface for changeing plate 12 are smoothly connected；The lower end for changeing plate 12 is provided with horizontal extension
13, extension 13 and the avoiding structure 4 of transport platform 2 coordinate.
The fixed plate 11 and the working surface for changeing plate 12 are inclined-plane or arc surface, receive target as sputter to improve entirety
Range；And set the front side surface of fixed plate 11 to smooth surface, it is equal in the working surface setting for changeing plate 12 and extension 13
The particle bulge-structure 21 of even distribution makes target mainly be attached to and changes on plate 12 and extension 13, and increases receiving area, long
Time is needed replacing using rear and cleaning changes plate 12, and the cross sectional shape of particle bulge-structure 21 could be provided as ladder
Shape.
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art
Scholar can understand present disclosure and be implemented, and it is not intended to limit the scope of the present invention, all according to the present invention
Equivalent change or modification made by Spirit Essence should all cover within the scope of the present invention.
Claims (5)
1. a kind of sputter prevents that plate changes structure, it is characterised in that：Including rack, rack is interior to be equipped with sputter source（1）, conveying
Platform（2）And workbench（3）, workbench（3）It is arranged in transport platform（2）On, sputter source（1）It is arranged in workbench（3）Top, it is defeated
Send platform（2）Both sides be both provided with and prevent board group part, transport platform（2）The lower part of both sides is both provided with avoiding structure（4）；It is described anti-
It includes fixed plate board group part（11）With change plate（12）, fixed plate（11）It is fixed by the bracket, fixed plate（11）Lower end with
Change plate（12）Upper end connection, form an entirety, and make fixed plate（11）With change plate（12）Front side surface smoothly connect
It connects；It is described to change plate（12）Lower end be provided with extension（13）, extension（13）With transport platform（2）Avoiding structure（4）Match
It closes.
2. sputter according to claim 1 prevents that plate changes structure, it is characterised in that：The fixed plate（11）With tear open
Change plate（12）Spliced by interlaced bridging arrangement, and is bolted.
3. sputter according to claim 1 prevents that plate changes structure, it is characterised in that：The fixed plate（11）With tear open
Change plate（12）Working surface be inclined-plane or arc surface, extension（13）Working surface be horizontal plane.
4. sputter according to claim 1 prevents that plate changes structure, it is characterised in that：The fixed plate（11）Before
Side surface is smooth surface, changes plate（12）And extension（13）Working surface have equally distributed particle bulge-structure（21）.
5. sputter according to claim 4 prevents that plate changes structure, it is characterised in that：The particle bulge-structure
（21）Cross sectional shape it is trapezoidal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810865789.5A CN108677153A (en) | 2018-08-01 | 2018-08-01 | A kind of sputter prevents that plate changes structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810865789.5A CN108677153A (en) | 2018-08-01 | 2018-08-01 | A kind of sputter prevents that plate changes structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108677153A true CN108677153A (en) | 2018-10-19 |
Family
ID=63815136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810865789.5A Withdrawn CN108677153A (en) | 2018-08-01 | 2018-08-01 | A kind of sputter prevents that plate changes structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108677153A (en) |
-
2018
- 2018-08-01 CN CN201810865789.5A patent/CN108677153A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20181019 |
|
| WW01 | Invention patent application withdrawn after publication |