CN108672223A - A kind of slit-type squash type coating apparatus and its substrate platform - Google Patents
A kind of slit-type squash type coating apparatus and its substrate platform Download PDFInfo
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- CN108672223A CN108672223A CN201810777027.XA CN201810777027A CN108672223A CN 108672223 A CN108672223 A CN 108672223A CN 201810777027 A CN201810777027 A CN 201810777027A CN 108672223 A CN108672223 A CN 108672223A
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- sump pit
- slit
- coating apparatus
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- 239000000758 substrate Substances 0.000 title claims abstract description 145
- 238000000576 coating method Methods 0.000 title claims abstract description 91
- 239000011248 coating agent Substances 0.000 title claims abstract description 90
- 235000009854 Cucurbita moschata Nutrition 0.000 title claims abstract description 36
- 240000001980 Cucurbita pepo Species 0.000 title claims abstract description 36
- 235000009852 Cucurbita pepo Nutrition 0.000 title claims abstract description 36
- 235000020354 squash Nutrition 0.000 title claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 79
- 230000000903 blocking effect Effects 0.000 claims description 36
- 238000000926 separation method Methods 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 16
- 238000004873 anchoring Methods 0.000 claims description 2
- 239000012530 fluid Substances 0.000 abstract description 29
- 102000001999 Transcription Factor Pit-1 Human genes 0.000 description 30
- 108010040742 Transcription Factor Pit-1 Proteins 0.000 description 30
- 239000010408 film Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 238000009825 accumulation Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 230000003319 supportive effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
Abstract
This application provides a kind of slit-type squash type coating apparatus and its substrate platform, substrate platform to include：Platform body；The first sump pit that the platform body upper surface is recessed, first sump pit is vertical with the coating head direction of motion, and has at least one sloped sidewall；The bottom of first sump pit is provided with negative-pressure liquid discharge hole.The program, to be conducive to make the excessive coating fluid for being at least partly piled up in base end to drain, therefore, can improve the film thickness uniformity of film by being provided with sloped sidewall in substrate platform and bottom is provided with first sump pit in negative-pressure liquid discharge hole.
Description
Technical field
This specification is related to a kind of slit-type squash type coating apparatus and its substrate platform.
Background technology
Currently, slit-type squash type coating (slot die coating) has been widely used in field of optical films manufacture
In, especially thin-film solar cells, why can fast development have benefited from that its coating speed is fast, the good, coating that applies film uniformity
The advantages that window is wide.But in actual coating, the film that slit-type squash type coating technique is coated with out is influenced by drain,
Part solution is easy to be deposited in base end (especially tail end), if cannot exclude in time, it will flows back into and is coated with before
Part, since the dry time is different, it will cause the thickness of front and back film inconsistent, cause to seriously affect to quality of forming film.
Invention content
The purpose of this specification is to provide a kind of slit-type squash type coating apparatus and its base improving film thickness uniformity
Bottom platform.
To achieve the above object, on the one hand, this specification provides a kind of substrate platform of slit-type squash type coating apparatus,
Including：Platform body；The first sump pit that the platform body upper surface is recessed, first sump pit are transported with coating head
Dynamic direction is vertical, and has at least one sloped sidewall；The bottom of first sump pit is provided with negative-pressure liquid discharge hole.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the inclination angle of the sloped sidewall be 20 °-
80°。
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the inclination angle of the sloped sidewall be 25 °-
75°。
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that first sump pit is at least two.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that be provided in first sump pit point
Baffles；The top of the separation baffles is without departing from first sump pit.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the bottom end of the separation baffles extends to
The top in the negative-pressure liquid discharge hole.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the bottom end of the separation baffles is provided with
Through-hole.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the substrate platform further includes described flat
The second sump pit that platform body upper surface is recessed, second sump pit is parallel with the coating head direction of motion, and with extremely
A few sloped sidewall；The bottom of second sump pit is provided with negative-pressure liquid discharge hole.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the sloped sidewall of the second sump pit inclines
Angle is 20 ° -80 °.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the sloped sidewall of the second sump pit inclines
Angle is 25 ° -75 °.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the substrate platform further includes for reducing
The anti-pollution component of backside of substrate pollution；The anti-pollution component includes that at least one gear liquid portion and the suction for inhaling solid substrate are consolidated
Part；The inside setting of first sump pit and/or the second sump pit is tightly attached in the gear liquid portion, including elastic liquid blocking strip and by
The elastic liquid blocking strip accommodating area that the platform body is recessed；When the suction firmware inhales solid substrate, substrate inhale firmware and/or
The platform body can be parallel under the support of elastic liquid blocking strip, also, the top of elastic liquid blocking strip is not less than platform body
Upper surface.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the top of the separation baffles is higher than suction
The top of elasticity liquid blocking strip when firmware inhales solid substrate.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the substrate platform include it is at least one by
The positioning area for placing substrate that two the first sump pits and two the second sump pits surround.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the suction firmware in the positioning area is negative
It calms the anger hole, for making the positioning area after placement substrate form subnormal ambient under the trap of elastic liquid blocking strip, to make suction firmware
Anchoring base in the state of the not direct contact with substrate.
In the substrate platform of above-mentioned slit-type squash type coating apparatus, it is preferable that the substrate platform further includes being set to institute
It states in positioning area, is used to support the elastic Auxiliary support portion in the middle part of substrate.
On the other hand, this specification additionally provides a kind of slit-type squash type coating apparatus, wherein for putting in the equipment
The substrate platform for setting substrate includes：Platform body；The first sump pit that the platform body upper surface is recessed, described first
Sump pit is vertical with the coating head direction of motion, and has at least one sloped sidewall；The bottom of first sump pit is provided with
Negative-pressure liquid discharge hole.
In above-mentioned slit-type squash type coating apparatus, it is preferable that the substrate platform further includes for reducing the substrate back of the body
The anti-pollution component of face pollution；The anti-pollution component includes at least one gear liquid portion and the suction firmware for inhaling solid substrate；Institute
It states the inside setting that first sump pit is tightly attached in gear liquid portion, including elastic liquid blocking strip and is recessed by the platform body
Elastic liquid blocking strip accommodating area；When the suction firmware inhales solid substrate, substrate can under the support for inhaling firmware and/or elastic liquid blocking strip
It is parallel to the platform body, also, the top of elastic liquid blocking strip is not less than the upper surface of platform body.
The slit-type squash type coating apparatus and its substrate platform that this specification provides, by the way that band is arranged in substrate platform
There are sloped sidewall and bottom to be provided with first sump pit in negative-pressure liquid discharge hole, so as to so as at least partly be piled up in base end
Excessive coating fluid drain, therefore, can get the film of evenly film thickness.Its principle is, when coating head from the end of substrate after
When continuous forward movement is started across the first sump pit, coating fluid is squeezed into the first sump pit, at this point, since the first sump pit tilts
The presence of side wall so that can keep continuous with the coating fluid that base end is accumulated into the coating fluid in the first sump pit.Into
One step, while the coating fluid in the first sump pit is inhaled into negative-pressure liquid discharge hole (negative pressure appropriate), due to coating
The dynamic viscous effect of liquid stream, can make at least partly solution that base end is accumulated also be brought into the first sump pit, to reduce
Accumulating amount of the coating fluid in base end.
Description of the drawings
Attached drawing described here is only used for task of explanation, and is not intended to limit model disclosed in the present application in any way
It encloses.In addition, the shape and proportional sizes etc. of each component in figure are only schematical, it is used to help the understanding to the application, and
It is not the specific shape and proportional sizes for limiting each component of the application.Those skilled in the art, can under teachings of the present application
Implement the application to select various possible shapes and proportional sizes as the case may be.In the accompanying drawings：
Fig. 1 is the vertical view of substrate platform in a kind of embodiment of this specification；
Fig. 2 is the front section view of Fig. 1 substrate platforms；
Fig. 3 is the vertical view of substrate platform in this specification another embodiment；
Fig. 4 is the front section view of Fig. 3 substrate platforms；
Fig. 5 is the vertical view of substrate platform in this specification another embodiment；
Fig. 6 is the front section view of Fig. 5 substrate platforms.
Fig. 7 is the partial enlarged view that separation baffles bottom end is provided with through-hole in a kind of embodiment of this specification.
Drawing reference numeral explanation：
1, platform body；2, the first sump pit；3, substrate positioning area；4, negative-pressure liquid discharge hole；5, negative pressure stomata；6, separate gear
Plate；7, elastic liquid blocking strip；8, the second sump pit.
Specific implementation mode
Below in conjunction with the attached drawing in the application embodiment, the technical solution in the application embodiment is carried out clear
Chu is fully described by, it is clear that described embodiment is only a part of embodiment of the application, rather than whole realities
Apply mode.Based on the embodiment in the application, those of ordinary skill in the art institute without creative efforts
The all other embodiment obtained, shall fall in the protection scope of this application.
It should be noted that when element is referred to as " being set to " another element, it can be directly on another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ",
" right side " and similar statement for illustrative purposes only, are not offered as being unique embodiment.
Unless otherwise defined, all of technologies and scientific terms used here by the article and belong to the technical field of the application
The normally understood meaning of technical staff is identical.The term used in the description of the present application is intended merely to description tool herein
The purpose of the embodiment of body, it is not intended that in limitation the application.Term as used herein "and/or" includes one or more
Any and all combinations of relevant Listed Items.
As depicted in figs. 1 and 2, the substrate platform for the slit-type squash type coating apparatus that this specification embodiment provides,
It may include：Platform body 1；The first sump pit 2 that platform body upper surface is recessed, the first sump pit 2 and coating head
The direction of motion is vertical, and has at least one sloped sidewall；The bottom of first sump pit 2 is provided with negative-pressure liquid discharge hole 4.
In this specification embodiment, substrate platform is a kind of platform for placing substrate in coating process.It applies
During cloth, coating head makes a relative move relative to platform, and the extrusion coated liquid in moving process, coating fluid are applied to base
On bottom, to form film.In the prior art, under substrate platform, inside substrate platform or substrate platform surrounding, generally may be used
Heating device for promoting film drying, accelerating internal-response is set.
In this specification embodiment, coating head is usually to move linearly from a side of substrate to the other side, because
This, for substrate, the one end for most starting to be applied is known as beginning, and the one end being finally applied is known as tail end.
In the prior art, when the end of substrate has excessive coating fluid to accumulate, although liquid can be along the vertical of substrate
Wall surface walks a part, still, since coating fluid has certain viscosity, if relying only on gravity, most of superfluous painting
Cloth liquid is difficult to voluntarily drain.And in the implementation that this specification provides, on the one hand it is the be provided with for drawing coating fluid
One sump pit 2；On the other hand it is the external force that drain is provided by negative-pressure liquid discharge hole 4.In practical application, substrate can be positioned over tightly
The position for pasting sloped sidewall one end of the first sump pit 2, when coating head since continuing to move along the end of substrate across
When one sump pit 2, coating fluid is squeezed into the first sump pit, at this point, due to the presence in the first sump pit sloped sidewall (drainage face),
The coating fluid into the first sump pit is allow to keep continuous with the coating fluid that base end is accumulated.Further, work as place
While coating fluid in the first sump pit is inhaled into negative-pressure liquid discharge hole (negative pressure appropriate), due to the viscosity of coating fluid flowing
Effect can make at least partly solution that base end is accumulated also be brought into the first sump pit, to reduce coating fluid in substrate
The accumulating amount of end.
Can be plane or arc-shaped for the bottom shape of the first sump pit 2 in this specification embodiment.For
The residual for reducing coating fluid, is set as arc-shaped (such as Fig. 6) in some preferred embodiments.
With continued reference to Fig. 1 and Fig. 2, in this specification embodiment, for the ease of the discharge of coating fluid, negative-pressure liquid discharge hole
It is preferably disposed on the lowest point of the first sump pit 2.
With continued reference to Fig. 1 and Fig. 2, in this specification embodiment, sloped sidewall refers to relative to the first sump pit 2
Bottom is in the slope surface of inverted triangle.In some embodiments, inclination angle size can be 20 ° -80 °.In other embodiments,
Inclination angle size can be preferably 25 ° -75 °；Further preferably 30 ° -60 °.
In some embodiments of this specification, the width and depth of the first sump pit 2 can determines according to actual conditions,
Its length is generally at least equal with the width of substrate.For one piece of substrate, since the coating fluid accumulation of tail end becomes apparent from,
Can one the first sump pit 2 be set in tail end.It certainly, can be at its both ends in order to reduce the accumulation of both ends coating fluid simultaneously
First sump pit 2 is respectively set in portion (end along coating direction).
In some embodiments of this specification, when holding multiple pieces substrate is coated with together in substrate platform, two pieces
Adjacent substrate can share first sump pit 2.At this point, the first sump pit 2 can have there are two sloped sidewall, to meet two
The end drain demand of block substrate.
Referring to figure 5 and figure 6, in some embodiments of this specification, separation baffles can be also set in the first sump pit 2
6；The top of separation baffles is without departing from the first sump pit.When reaching substrate tail end due to coating head, the slit of coating head also in
Going out liquid status, this partially liq not only can be preferably introduced into the first sump pit 2 by separation baffles 6,；Moreover, baffle and glass
The gap effect formed between glass substrate be conducive to maintain coating fluid to the first 2 flows of sump pit when continuity, convenient for from
The better drain in end.In addition, separation baffles 6 be also particularly suitable two pieces of substrates share first sump pit 2 when the case where.
Due to two pieces of substrates share first sump pit 2 when, it is sometimes desirable to the first sump pit 2 is designed it is wider, at this point, can make
With the inner space of separation baffles the first sump pit 2 of separation, influencing each other when can reduce front and back two pieces of substrate drains in this way,
It can maintain preferable drain effect.In addition, separation baffles 6 generally can be isometric with the first sump pit 2.Separation baffles 6 may be used
The modes such as welding, embedded are fixed in the first sump pit 2, it is of course also possible to be fixed by the bracket.
In some embodiments of this specification, the bottom end of separation baffles 6 can be extended to the top in negative-pressure liquid discharge hole 4
Portion.In other embodiments, it in order to preferably be connected to the compartment in bottom, can also be set in the bottom end of separation baffles 6
Set at least one through-hole.It is of course also possible in the both sides of separation baffles 6, negative-pressure liquid discharge hole 4 is respectively set.
With continued reference to Fig. 1 and Fig. 2, in some embodiments of this specification, substrate platform further includes by platform body
The second sump pit 8 that upper surface is recessed, the second sump pit 8 is parallel with the coating head direction of motion, and inclines at least one
Oblique side wall；The bottom of second sump pit 8 is provided with negative-pressure liquid discharge hole.The main function of second sump pit 8 is discharge in substrate side
Hold the coating fluid of (being parallel to the coating head direction of motion) accumulation.Other than the position of setting and 2 different from of the first sump pit,
It can refer to the setting of the first sump pit 2.In some embodiments, the inclination angle of sloped sidewall is 20 ° -80 °；Inclination angle size can
To be preferably 25 ° -75 °；Further preferably 30 ° -60 °.In some embodiments, every piece of substrate can be in two sides point
Second sump pit 2 is not set.
With continued reference to Fig. 1 and Fig. 2, in some embodiments of this specification, the first sump pit 2 and the second sump pit 8
Connection can be formed.For a substrate, when two the first sump pits 2 and two the second sump pits 8 is respectively set, they are total
With the positioning area surrounded for placing substrate.At this point, coating head can select to be coated from any one in four direction,
Good Painting effect can be obtained.In addition, adjacent sump pit can interconnect, lead to form the ring-like of connection
Road.
In some embodiments of this specification, when drawing the coating fluid of base end accumulation, under normal circumstances, need
To drain along the side wall of substrate.At this point, since backside of substrate and platform surface often have some gaps, coating fluid can be in hair
Basad back side diffusion under spy uses, so as to cause the pollution of backside of substrate.In this case, the translucency of substrate can be caused
It influences.For solar cell, the reduction of translucency has significant impact to working efficiency.Meanwhile in this case, substrate
Platform also can be inevitably contaminated, to cause long lasting effect to the coating of follow-up substrate.For this purpose, this specification provides
Anti-pollution component can be set in substrate platform, to solve the scheme of backside of substrate pollution.
In some embodiments of this specification, anti-pollution component, anti-pollution component packet are provided in substrate platform
Include at least one gear liquid portion and the suction firmware for inhaling solid substrate；Liquid portion is kept off including elastic liquid blocking strip and by platform body concave shaped
At elastic liquid blocking strip accommodating area；When suction firmware inhales solid substrate, substrate can be put down under the support for inhaling firmware and/or elastic liquid blocking strip
Row is in platform body, also, the top of elastic liquid blocking strip is higher than the surface of platform body.Fig. 3 and Fig. 4 show said program
A kind of embodiment is the application mode for combining sump pit and anti-pollution component being arranged.But above-mentioned prevent back pollution
Mode can be used alone completely, be not necessarily to setting sump pit scheme be combined.Realizing antipollution principle is, when
When the end of substrate is placed on the elastic liquid blocking strip of the anti-pollution component, under the active force for inhaling firmware, elastic liquid blocking strip
It can deform upon, it is tightly packed to be formed between the back side and platform of base end, coating fluid is obstructed to the base end
The diffusion at the back side.Under normal circumstances, when placing substrate, the side wall of substrate can laterally be flushed with the outer of liquid blocking strip (that is, gear liquid
Item is fully located under substrate).
In the embodiment for the anti-pollution component of setting that this specification provides, in order to obstruct the basad back of the body of coating fluid as possible
Elastic shelves liquid item can be generally slightly longer than base end by the diffusion in face.Certainly, the length of accommodating area at least with elastic liquid blocking strip
Length adaptation.
In the embodiment for the anti-pollution component of setting that this specification provides, since elastic shelves liquid item is filled out by its deformation
The minute asperities of solid surfaces' (backside of substrate, substrate platform) are filled, therefore, suitable elastic material system in this field may be selected
Make.Generally require its not with coating solution reaction, be not easy to substrate bonding or react.In addition, those skilled in the art can root
According to the elastic liquid blocking strip for needing selection proper height, as long as satisfaction suction firmware inhales solid substrate, the top of elastic liquid blocking strip is higher than
The surface of platform body.
In the embodiment for the anti-pollution component of setting that this specification provides, since the coating fluid of substrate tail end is accumulated most
Seriously, therefore, preferentially gear liquid portion can be placed in the tail end of substrate (in practical application, place the substrate above suitable position i.e.
Can).Certainly, can also be as needed for substrate head end and two sides, it is set in substrate platform according to suitably sized
Set gear liquid portion.
In the embodiment for the anti-pollution component of setting that this specification provides, if only substrate some or it is a few
A anti-pollution component of end set, the horizontality (when suction firmware inhales solid substrate) of substrate when in order to keep coating, can be in substrate
The support member of the suitable position setting auxiliary of platform.In some embodiments of this specification, also can will inhale firmware as
Support member makes substrate reach horizontality.At this point, directly contacted with backside of substrate due to inhaling firmware needs, it may be selected
The suctorial suction firmware of top tape.But if these Auxiliary support components have sealing effect simultaneously, Auxiliary support can be made
Component and one or certain several end surround closed area, when substrate being made to be placed on the closed area, can be formed under negative pressure close
Seal space.It is played a supportive role at this point, inhaling firmware due to being not necessarily to, non-connect may be used in the suction firmware in closed area
Touch form, such as negative pressure stomata etc..For example, in Fig. 3 and embodiment illustrated in fig. 4, in the substrate platform there are four settings
Elastic liquid blocking strip, elastic liquid blocking strip is end to end to surround closed area, at this point, the suction firmware in closed area can be several
Negative pressure stomata.In practice, four elastic liquid blocking strips can be substituted by an elastic ring 7.
In some embodiments of this specification, setting sump pit and the anti-pollution component of setting can be combined,
To achieve the effect that can effectively discharge ends accumulation coating fluid be avoided that again backside of substrate pollution.In combination, can incite somebody to action
Anti-pollution component is arranged close to the first sump pit 2 or the second sump pit 8, when placing substrate, as long as the first sump pit 2 or the second
Sump pit 8 is in the outside of base end, and the elastic liquid blocking strip in anti-pollution component is on the inside of base end (under base end
Side).
In some embodiments of this specification, when the first sump pit 2 is provided with separation baffles 6, top can be high
The top of elasticity liquid blocking strip 7 when inhaling firmware and inhaling solid substrate.Separation baffles 6 can in this way given full play to, and it is drained, the row of helping acts on.
Certainly, in other embodiments, when necessary, separation baffles 6 can also be set in the second sump pit 8.
In some embodiments of this specification, anti-pollution component is arranged close to sump pit, at this point, the two can be close to
Setting, the limit being close to are by upper bit to dig out elastic liquid blocking strip accommodating cavity in the sloped sidewall of sump pit.For example, Fig. 3 and
Embodiment shown in Fig. 5.
With continued reference to Fig. 3 and Fig. 4, which includes one by two the first sump pits 2 and two the second sump pits 8
The positioning area for placing substrate surrounded；The inside setting of the first sump pit 2 and the second sump pit 8 is tightly attached in gear liquid portion, fixed
Suction firmware in the area of position is 6 negative pressure stomatas 5 being evenly arranged.
Referring to figure 5 and figure 6, which is on the basis of Fig. 3 and Fig. 4 embodiments, in the first sump pit 2 and two
It is also provided with separation baffles 6 in a second sump pit 8, and through-hole is provided in the bottom of separation baffles 6.Mono- embodiments of Fig. 7
In, separation baffles bottom end is provided with the partial enlarged view of through-hole.
It should be noted that in the description of this specification, term " first ", " second " etc. are used for description purposes only and area
Between the two and sequencing is not present in not similar object, can not be interpreted as indicating or implying relative importance.In addition,
In the description of this specification, unless otherwise indicated, the meaning of " plurality " is two or more.
It should be understood that above description is to illustrate rather than to be limited.By reading above-mentioned retouch
It states, many embodiments and many applications except the example provided all will be apparent for a person skilled in the art
's.Therefore, the range of this introduction should not be determined with reference to foregoing description, but should with reference to preceding claims and these
The full scope of the equivalent that claim is possessed determines.For comprehensive purpose, all articles and reference include patent
The disclosure of application and bulletin is all by reference to being incorporated herein.Appointing for theme disclosed herein is omitted in preceding claims
Where face is not intended to abandon the body matter, also should not be considered as applicant and the theme is not thought of as disclosed say
A part for bright book theme.
Claims (10)
1. a kind of substrate platform of slit-type squash type coating apparatus, which is characterized in that including：
Platform body；
The first sump pit that the upper surface of the platform body is recessed, first sump pit hang down with the coating head direction of motion
Directly, and there is at least one sloped sidewall；The bottom of first sump pit is provided with negative-pressure liquid discharge hole.
2. the substrate platform of slit-type squash type coating apparatus according to claim 1, which is characterized in that the inclined side
The inclination angle of wall is 20 ° -80 °；Preferably 25 ° -75 °.
3. the substrate platform of slit-type squash type coating apparatus according to claim 1, which is characterized in that on platform body
It is provided at least two the first sump pits.
4. the substrate platform of slit-type squash type coating apparatus according to claim 1, which is characterized in that the first row
Separation baffles are provided in liquid bath；The top of the separation baffles is without departing from first sump pit；
Preferably, the bottom end of the separation baffles extends to the top in the negative-pressure liquid discharge hole；
It is further preferred that the bottom end of the separation baffles is provided with through-hole.
5. the substrate platform of slit-type squash type coating apparatus according to claim 1, which is characterized in that the substrate is flat
Platform further includes the second sump pit that the platform body upper surface is recessed, second sump pit and the coating head direction of motion
It is parallel, and there is at least one sloped sidewall；The bottom of second sump pit is provided with negative-pressure liquid discharge hole；
Preferably, the inclination angle of the sloped sidewall is 20 ° -80 °.
6. according to the substrate platform of claim 1-5 any one of them slit-type squash type coating apparatus, which is characterized in that should
Substrate platform further includes the anti-pollution component for reducing backside of substrate pollution；
The anti-pollution component includes at least one gear liquid portion and the suction firmware for inhaling solid substrate；
The inside setting of first sump pit and/or the second sump pit is tightly attached in the gear liquid portion, including elastic liquid blocking strip and
The elastic liquid blocking strip accommodating area being recessed by the platform body；
When the suction firmware inhales solid substrate, substrate can be parallel to the platform under the support for inhaling firmware and/or elastic liquid blocking strip
Ontology, also, the top of elastic liquid blocking strip is not less than the upper surface of platform body；
Preferably, when being provided with separation baffles, elasticity liquid blocking strip when solid substrate is inhaled in the top of separation baffles higher than suction firmware
Top.
7. the substrate platform of slit-type squash type coating apparatus according to claim 6, which is characterized in that the substrate platform
Including at least one positioning area for placing substrate surrounded by two the first sump pits and two the second sump pits；
Preferably, the suction firmware in the positioning area is negative pressure stomata, for making the positioning area after placement substrate keep off liquid in elasticity
Subnormal ambient is formed under the trap of item, to make suction firmware anchoring base in the state of the not direct contact with substrate.
8. the substrate platform of slit-type squash type coating apparatus according to claim 7, which is characterized in that the substrate platform
Further include being set in the positioning area, is used to support the elastic Auxiliary support portion in the middle part of substrate.
9. a kind of slit-type squash type coating apparatus, which is characterized in that the substrate platform in the equipment for placing substrate includes：
Platform body；
The first sump pit that the platform body upper surface is recessed, first sump pit hang down with the coating head direction of motion
Directly, and there is at least one sloped sidewall；The bottom of first sump pit is provided with negative-pressure liquid discharge hole.
10. slit-type squash type coating apparatus according to claim 9, which is characterized in that the substrate platform further includes
Anti-pollution component for reducing backside of substrate pollution；
The anti-pollution component includes at least one gear liquid portion and the suction firmware for inhaling solid substrate；
The inside setting of first sump pit is tightly attached in the gear liquid portion, including elastic liquid blocking strip and by the platform body
Spill at elastic liquid blocking strip accommodating area；
When the suction firmware inhales solid substrate, substrate can be parallel to the platform under the support for inhaling firmware and/or elastic liquid blocking strip
Ontology, also, the top of elastic liquid blocking strip is not less than the upper surface of platform body.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810777027.XA CN108672223A (en) | 2018-07-16 | 2018-07-16 | A kind of slit-type squash type coating apparatus and its substrate platform |
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| CN201810777027.XA CN108672223A (en) | 2018-07-16 | 2018-07-16 | A kind of slit-type squash type coating apparatus and its substrate platform |
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