CN108628034B - Color film substrate, liquid crystal display panel and preparation method of color film substrate - Google Patents
Color film substrate, liquid crystal display panel and preparation method of color film substrate Download PDFInfo
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- CN108628034B CN108628034B CN201810515179.2A CN201810515179A CN108628034B CN 108628034 B CN108628034 B CN 108628034B CN 201810515179 A CN201810515179 A CN 201810515179A CN 108628034 B CN108628034 B CN 108628034B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
The invention provides a color film substrate, which comprises a substrate; the black matrixes are arranged on the substrate, and gaps between every two adjacent black matrixes are all light-transmitting areas in the projection area of the substrate; the color photoresist layer covers the light-transmitting area of the substrate and the black matrix, and comprises RGB color photoresist; a protective layer covering the color photoresist layer; the spacing column is arranged on the protective layer; further comprising: and the light-transmitting particles are arranged in the light-transmitting area of the substrate and doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistor layer, and light-focusing parts for polymerizing light emitted from the color light resistor layer towards the substrate direction and focusing and irradiating the light on the substrate to improve the light transmittance of the substrate are formed on the light-transmitting particles. By implementing the invention, the light transmittance is further improved on the traditional color film substrate to reduce the light-emitting loss of the backlight module, so that the liquid crystal display panel is more energy-saving and has richer presented colors.
Description
Technical Field
The invention relates to the technical field of liquid crystal display, in particular to a color film substrate, a liquid crystal display panel and a preparation method of the color film substrate.
Background
The Liquid Crystal display panel is mainly composed of a Thin Film Transistor Array (TFT Array) substrate, a Color Filter (CF) substrate, and a Liquid Crystal Layer (Liquid Crystal Layer) disposed between the two substrates, and its operating principle is to apply driving voltages to the two glass substrates to control the rotation of Liquid Crystal molecules LC of the Liquid Crystal Layer, so as to refract the light of the backlight module to generate pictures.
As shown in FIG. 1, in the prior art, a CF substrate, which is an important component for displaying colors on a liquid crystal display panel, mainly comprises a substrate 1/Black Matrix (BM) 2/Color resist layer (RGB) 3/Protective layer (OC) 4/And a spacer Pillar (PS) 5/(ii) a Wherein the black matrix 2/Used for shielding the light emitted from the adjacent pixels to prevent color mixing; color photoresist layer 3//For emitting light (such as white light) from backlight module except for RGBThe other component colors are absorbed, and only RGB colors are allowed to be transmitted to provide display colors for the LCD; protective layer 4/For protecting the color resist layer 3//The upper RGB color surface prevents ion precipitation and contamination, and makes the color photoresist layer 3//Is flattened so that the spacer 5/The height of the subsequent process is more uniform; spacing post 5/For supporting the TFT substrate and securing the thickness of the liquid crystal layer.
However, the inventor finds that the transmittance of the conventional CF substrate needs to be further improved to reduce the light loss of the backlight module, so that the liquid crystal display panel is more energy-saving and has richer colors.
Disclosure of Invention
The technical problem to be solved by the embodiments of the present invention is to provide a color film substrate, a liquid crystal display panel, and a method for manufacturing the color film substrate, in which light transmittance is further improved on a conventional color film substrate to reduce light loss of a backlight module, so that the liquid crystal display panel is more energy-saving and has richer colors.
In order to solve the above technical problem, an embodiment of the present invention provides a color film substrate, including:
a substrate base plate;
a black matrix disposed on the substrate base; the black matrixes are distributed on the substrate in a discrete mode, and the projection areas formed by the substrate in the gaps between two adjacent black matrixes are set as light-transmitting areas of the substrate;
the color photoresist layer covers the light-transmitting area of the substrate and the black matrix; the color light resistance layers comprise an R color light resistance, a G color light resistance and a B color light resistance which are filled into a corresponding light transmission area and respectively extend to two adjacent black matrixes along two sides of the filled light transmission area;
a protective layer covering the color photoresist layer; and
the spacing column is arranged on the protective layer;
wherein, still include:
and the light-transmitting particles are arranged in the light-transmitting area of the substrate and doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistance layer, and light-gathering parts for gathering the light emitted from the color light resistance layer towards the substrate direction and focusing and irradiating the light on the substrate to improve the light transmittance of the substrate are formed on the light-transmitting particles.
The light-gathering part is formed at one end, far away from the substrate base plate, of the light-transmitting particles, and the light-gathering part is a protrusion extending out along the direction far away from the substrate base plate at one end, far away from the substrate base plate, of the light-transmitting particles.
Wherein the protrusion is a semi-sphere arched along a direction away from the substrate base plate.
The light-transmitting particles are made of high-transparency light-resistant materials, and the high-transparency light-resistant materials comprise polymethyl methacrylate (PMMA), Polyimide (PI) and polyethylene terephthalate (PET).
The substrate base plate is a transparent base plate made of one of glass, quartz and transparent plastics.
The embodiment of the invention also provides a liquid crystal display panel which comprises the color film substrate.
The embodiment of the invention also provides a preparation method of the color film substrate, which comprises the following steps:
providing a substrate base plate;
discretely distributing black matrixes on the substrate, and taking projection areas formed on the substrate by gaps between two adjacent black matrixes as light-transmitting areas of the substrate;
arranging light-transmitting particles in a light-transmitting area of the substrate; wherein, a light-gathering part is formed on the light-transmitting particles;
covering a color light resistance layer on the black matrix and the light-transmitting area of the substrate; the color photoresist layer comprises a substrate base plate, a color photoresist layer, a light-transmitting particle, a light-gathering part, a light-transmitting particle and a color photoresist layer, wherein the color photoresist layer comprises a plurality of color photoresists, the color photoresists are arranged in the substrate base plate, the color photoresists are arranged in the color photoresist layer, the color photoresists are filled into a corresponding light-transmitting area and extend to two adjacent black matrixes along two sides of the filled light-transmitting area, one or more of the color photoresists, the color photoresists and the color photoresists are doped with the light-transmitting particle, so that light emitted from the;
and covering a protective layer on the color photoresist layer, and further arranging a spacing column on the protective layer.
Wherein, the specific step of arranging the transparent particles in the transparent area of the substrate comprises:
providing a high transparency photoresist material;
preparing the high-transparency light resistance material into liquid with certain surface tension, and discretely distributing the liquid high-transparency light resistance material on the light-transmitting area of the substrate and the black matrix in an ink-jet or sedimentation mode; wherein, the liquid high-transparency photoresist material forms a protrusion with a certain angle relation with the substrate at one end far away from the substrate due to the surface tension;
pre-baking the liquid high-transparency photoresist material for a certain time;
exposing, developing and removing the liquid high-transparency light resistance material which is positioned on the black matrix and is in the prebaked state by using a transparent light cover, and reserving the high-transparency light resistance material which is positioned in a light transmission area of the substrate;
baking and curing the reserved high-transparency photoresist material to obtain light-transmitting particles positioned in a light-transmitting area of the substrate; wherein, the light-gathering part of the light-transmitting particle is a protrusion after curing treatment.
The high-transparency photoresist material comprises polymethyl methacrylate (PMMA), Polyimide (PI) and polyethylene terephthalate (PET).
The substrate base plate is a transparent base plate made of one of glass, quartz and transparent plastics.
The embodiment of the invention has the following beneficial effects:
compared with the traditional color film substrate, the invention has the advantages that the transparent particles are doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistor layer positioned in the transparent area of the substrate, and the light-emitting part on the transparent particles has the light-gathering effect of the convex lens, so that the light emitted from the color light resistor layer towards the substrate direction can be polymerized and focused to irradiate on the substrate to improve the light transmittance of the substrate, thereby further improving the light transmittance, reducing the light-emitting loss of the backlight module, and leading the liquid crystal display panel to be more energy-saving and have richer presented colors.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is within the scope of the present invention for those skilled in the art to obtain other drawings based on the drawings without inventive exercise.
Fig. 1 is a cross-sectional view of a color filter substrate in the prior art;
fig. 2 is a cross-sectional view of a color filter substrate according to a first embodiment of the present invention;
fig. 3 is a flowchart of a method for manufacturing a color film substrate according to a third embodiment of the present invention;
fig. 4 is an application scene diagram of step S3 in the method for manufacturing a color film substrate according to the third embodiment of the present invention; wherein, a is an application scene graph of the transparent particles before exposure and development; b, an application scene graph of the light-transmitting particles after exposure and development treatment; 1-substrate base plate, 2-black matrix, 6-light-transmitting particles.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 2, a color filter substrate according to a first embodiment of the present invention includes:
a substrate base plate 1, wherein the substrate base plate 1 is a transparent base plate or a semitransparent base plate made of glass, quartz, transparent plastic and the like;
a black matrix 2 disposed on the base substrate 1; the black matrix 2 is made of inorganic materials and is a non-light-guiding shelter; the black matrixes 2 are distributed on the substrate 1 in a discrete mode, and the projection areas formed by the gaps between every two adjacent black matrixes 2 on the substrate 1 are all light-transmitting areas of the substrate 1;
a color photoresist layer 3 covering the light-transmitting area of the substrate 1 and the black matrix 2; the color photoresist layer 3 comprises an R color photoresist, a G color photoresist and a B color photoresist which are filled into a corresponding light transmission area and respectively extend to two adjacent black matrixes 2 along two sides of the filled light transmission area; it should be noted that the R color photoresist, the G color photoresist, and the B color photoresist may be only filled in the light-transmitting region of the substrate 1, as long as the subsequent processes are not affected;
a protective layer 4 covering the color photoresist layer 3, wherein the protective layer 4 is a planarized insulating layer formed by silicon nitride, silicon oxide, silicon oxynitride and the like; and
the spacing column 5 is arranged on the protective layer 4, and the spacing column 5 is made of polyester mixture;
further comprising:
the light-transmitting particles 6 are arranged in the light-transmitting area of the substrate base plate 1 and doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistor layer 3, and light-focusing parts for polymerizing light emitted from the color light resistor layer 3 towards the substrate base plate 1 and focusing and irradiating the light on the substrate base plate 1 to improve the light transmittance of the substrate base plate 1 are formed on the light-transmitting particles 6; the transparent particles 6 are made of a high transparency photoresist material, and the high transparency photoresist material includes but is not limited to PMMA, PI, and PET.
It can be understood that, when the light emitted from the backlight module enters the liquid crystal display panel for display, the light firstly enters the color film substrate after passing through the IFT array substrate, so that the light emitted from the color film substrate firstly enters the color photoresist layer 3 and then exits through the substrate 1, therefore, the light transmittance of the substrate 1 is improved by using the light-transmitting particles 6, and the light emitted from the color photoresist layer 3 towards the substrate 1 is polymerized and focused on the substrate 1 by using the light-condensing part of the light-transmitting particles 6, thereby reducing the loss of the light emitted from the backlight module, and making the liquid crystal display panel save more energy and have richer colors.
In the first embodiment of the present invention, in consideration of the color filter substrate layering process and the light entering and exiting direction of the color filter substrate, the end surface of one end of the transparent particle 6 facing the substrate 1 is in contact with the transparent region of the substrate 1 and is set to be a plane, and one end of the transparent particle 6 away from the substrate 1 forms a light-focusing portion, where the light-focusing portion is a protrusion extending from one end of the transparent particle 6 away from the substrate 1 in the direction away from the substrate 1, and the protrusion forms a certain angle with the transparent region of the substrate 1, so that the light-focusing portion has the light-focusing effect of a convex lens.
In the first embodiment of the present invention, since the light-transmitting particles 6 are prepared in a convex lens pattern, the protrusions are provided as hemispheres that are arched in a direction away from the substrate board 1.
Corresponding to the color film substrate in the first embodiment of the present invention, a second embodiment of the present invention further provides a liquid crystal display panel, including the color film substrate in the first embodiment of the present invention. Since the color filter substrate in the second embodiment of the present invention and the color filter substrate in the first embodiment of the present invention have the same structure and connection relationship, please refer to the color filter substrate in the first embodiment of the present invention, which is not described herein again.
As shown in fig. 3, a method for manufacturing a color filter substrate according to a third embodiment of the present invention includes the following steps:
step S1, providing a substrate base plate;
the specific process is to provide a transparent substrate or a semitransparent substrate made of one of glass, quartz and transparent plastics as a substrate.
Step S2, discretely distributing the black matrixes on the substrate, and taking projection areas formed on the substrate by gaps between two adjacent black matrixes as light transmission areas of the substrate;
the method comprises the following steps of firstly covering a layer of inorganic material capable of blocking light from passing through on the upper surface of a substrate base plate by a Chemical Vapor Deposition (CVD) method to serve as a blocking layer, and after a layer of photoresist is coated on the blocking layer, exposing by adopting a transparent photomask to ensure that the photoresist of the blocking layer is patterned into a required photoresist pattern; secondly, etching the area which is not covered by the photoresist in the corresponding photoresist pattern on the shielding layer by a dry etching process (such as etching gases SF6, Cl2, CF4, Ar, NF3 and the like); then, the photoresist pattern on the shielding layer is stripped by a wet etching process (e.g., using a high-concentration alkaline liquid NaOH, etc.), so as to obtain a black matrix discretely distributed on the substrate. At the moment, the black matrixes are distributed on the substrate in a discrete mode, a certain gap exists between every two adjacent black matrixes, and the projection areas of the gaps, corresponding to the substrate, on the substrate are all used as light-transmitting areas of the substrate.
Step S3, arranging transparent particles in the transparent area of the substrate base plate; wherein, a light-gathering part is formed on the light-transmitting particles;
the specific process is that a high-transparency light resistance material is provided, and the high-transparency light resistance material comprises but is not limited to PMMA, PI and PET;
making the high-transparency photoresist material into liquid with certain surface tension, and discretely distributing the liquid-like high-transparency photoresist material on the light-transmitting area of the substrate and the black matrix in an ink-jet or sedimentation mode (as shown in a in fig. 4); wherein, the liquid high-transparency photoresist material forms a protrusion with a certain angle relation with the substrate base plate on one end far away from the substrate base plate by utilizing the surface tension of the liquid high-transparency photoresist material, and the protrusion has the light-gathering effect of a convex lens;
pre-baking the liquid high-transparency photoresist material for a certain time, for example, baking for 10 minutes at a medium temperature of 30 ℃;
exposing, developing and removing the prebaked liquid high-transparency photoresist material on the black matrix by using a transparent photomask to reserve the high-transparency photoresist material in a light-transmitting area of the substrate (as shown in b in fig. 4); for example, a layer of photoresist is coated on the substrate, the black matrix and the high-transparency photoresist material, and a transparent photomask is used for exposure, so that the photoresist is patterned into a required photoresist pattern; secondly, etching the area which is not covered by the photoresist in the photoresist pattern by a dry etching process (such as etching gases SF6, Cl2, CF4, Ar, NF3 and the like), namely etching away the high-transparency photoresist material on the black matrix; then, stripping the photoresist pattern by a wet etching process (such as using high-concentration alkaline liquid NaOH, etc.), so as to obtain a high-transparency photoresist material located in the light-transmitting area of the substrate;
and (3) baking and curing the reserved high-transparency photoresist material, for example, curing at a high temperature of 100 ℃ for 30 minutes to obtain light-transmitting particles positioned in the light-transmitting area of the substrate, wherein the light-gathering parts of the light-transmitting particles are protrusions after curing.
Step S4, covering a color light resistance layer on the black matrix and the light transmission area of the substrate; the color photoresist layer comprises a substrate base plate, a color photoresist layer, a light-transmitting particle, a light-gathering part, a light-transmitting particle and a color photoresist layer, wherein the color photoresist layer comprises a plurality of color photoresists, the color photoresists are arranged in the substrate base plate, the color photoresists are arranged in the color photoresist layer, the color photoresists are filled into a corresponding light-transmitting area and extend to two adjacent black matrixes along two sides of the filled light-transmitting area, one or more of the color photoresists, the color photoresists and the color photoresists are doped with the light-transmitting particle, so that light emitted from the;
the specific process is that a Physical Vapor Deposition (PVD) method is adopted to cover the color light resistance layers on the black matrixes and the light transmission areas of the substrate, so that the R color light resistance, the G color light resistance and the B color light resistance of the color light resistance layers are filled into the corresponding light transmission areas and respectively extend to the two adjacent black matrixes along the two sides of the filled light transmission areas, one or more of the R color light resistance, the G color light resistance and the B color light resistance of the color light resistance layers are doped with light transmission particles, and the light emitted from the color light resistance layers towards the substrate direction is polymerized by the light condensation parts of the light transmission particles and is focused to irradiate on the substrate.
Step S5, covering a protection layer on the color photoresist layer, and further disposing a spacer on the protection layer.
The specific process is that a layer of silicon nitride, silicon oxide or silicon oxynitride is coated on the color photoresist layer by chemical vapor deposition CVD to form a flattened protective layer, and a layer of polyester mixture is further coated on the protective layer by chemical vapor deposition CVD to form a gray scale layer, and the gray scale layer is obtained by adopting the same manner of manufacturing the black matrix in the step S2.
The embodiment of the invention has the following beneficial effects:
compared with the traditional color film substrate, the invention has the advantages that the transparent particles are doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistor layer positioned in the transparent area of the substrate, and the light-emitting part on the transparent particles has the light-gathering effect of the convex lens, so that the light emitted from the color light resistor layer towards the substrate direction can be polymerized and focused to irradiate on the substrate to improve the light transmittance of the substrate, thereby further improving the light transmittance, reducing the light-emitting loss of the backlight module, and leading the liquid crystal display panel to be more energy-saving and have richer presented colors.
While the invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not to be limited to the disclosed embodiment, but on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.
Claims (8)
1. A color filter substrate, comprising:
a base substrate (1);
a black matrix (2) disposed on the base substrate (1); the black matrixes (2) are distributed on the substrate (1) in a discrete mode, and the projection areas formed by the substrate (1) in the gaps between two adjacent black matrixes (2) are set as the light transmission areas of the substrate (1);
a color photoresist layer (3) covering the light-transmitting area of the substrate (1) and the black matrix (2); the color light resistance layer (3) comprises an R color light resistance, a G color light resistance and a B color light resistance which are filled into a corresponding light transmission area and respectively extend to two adjacent black matrixes (2) along two sides of the filled light transmission area;
a protective layer (4) covering the color photoresist layer (3); and
the spacing columns (5) are arranged on the protective layer (4);
it is characterized by also comprising:
the light-transmitting particles (6) are arranged in the light-transmitting area of the substrate base plate (1) and doped in one or more of the R color light resistor, the G color light resistor and the B color light resistor of the color light resistance layer (3), and light-transmitting portions for polymerizing light emitted from the color light resistance layer (3) towards the substrate base plate (1) and focusing and irradiating the light on the substrate base plate (1) to improve the light transmittance of the substrate base plate (1) are formed on the light-transmitting particles (6);
the light-gathering part is formed at one end, far away from the substrate base plate (1), of the light-transmitting particles (6), and the light-gathering part is a protrusion extending out along the direction far away from the substrate base plate (1) at one end, far away from the substrate base plate (1), of the light-transmitting particles (6).
2. The color filter substrate according to claim 1, wherein the protrusions are semi-spherical balls that are arched in a direction away from the substrate (1).
3. The color filter substrate according to claim 2, wherein the light-transmitting particles (6) are made of a high-transparency photoresist material, and the high-transparency photoresist material comprises polymethyl methacrylate (PMMA), Polyimide (PI) and polyethylene terephthalate (PET).
4. The color filter substrate according to claim 3, wherein the substrate (1) is a transparent substrate made of one of glass, quartz and transparent plastic.
5. A liquid crystal display panel comprising the color film substrate according to any one of claims 1 to 4.
6. The preparation method of the color film substrate is characterized by comprising the following steps of:
providing a substrate base plate;
discretely distributing black matrixes on the substrate, and taking projection areas formed on the substrate by gaps between two adjacent black matrixes as light-transmitting areas of the substrate;
arranging light-transmitting particles in a light-transmitting area of the substrate; wherein, a light-gathering part is formed on the light-transmitting particles;
covering a color light resistance layer on the black matrix and the light-transmitting area of the substrate; the color photoresist layer comprises a substrate base plate, a color photoresist layer, a light-transmitting particle, a light-gathering part, a light-transmitting particle and a color photoresist layer, wherein the color photoresist layer comprises a plurality of color photoresists, the color photoresists are arranged in the substrate base plate, the color photoresists are arranged in the color photoresist layer, the color photoresists are filled into a corresponding light-transmitting area and extend to two adjacent black matrixes along two sides of the filled light-transmitting area, one or more of the color photoresists, the color photoresists and the color photoresists are doped with the light-transmitting particle, so that light emitted from the;
covering a protective layer on the color photoresist layer, and further arranging a spacer pillar on the protective layer;
wherein, the specific step of arranging the transparent particles in the transparent area of the substrate comprises:
providing a high transparency photoresist material;
preparing the high-transparency light resistance material into liquid with certain surface tension, and discretely distributing the liquid high-transparency light resistance material on the light-transmitting area of the substrate and the black matrix in an ink-jet or sedimentation mode; wherein, the liquid high-transparency photoresist material forms a protrusion with a certain angle relation with the substrate at one end far away from the substrate due to the surface tension;
pre-baking the liquid high-transparency photoresist material for a certain time;
exposing, developing and removing the liquid high-transparency light resistance material which is positioned on the black matrix and is in the prebaked state by using a transparent light cover, and reserving the high-transparency light resistance material which is positioned in a light transmission area of the substrate;
baking and curing the reserved high-transparency photoresist material to obtain light-transmitting particles positioned in a light-transmitting area of the substrate; wherein, the light-gathering part of the light-transmitting particle is a protrusion after curing treatment.
7. The method for preparing a color filter substrate according to claim 6, wherein the high-transparency photoresist material comprises polymethyl methacrylate (PMMA), Polyimide (PI) and polyethylene terephthalate (PET).
8. The method for manufacturing a color filter substrate according to claim 6, wherein the substrate is a transparent substrate made of one of glass, quartz and transparent plastic.
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