CN108624849A - A kind of thermal resistance evaporation device - Google Patents
A kind of thermal resistance evaporation device Download PDFInfo
- Publication number
- CN108624849A CN108624849A CN201810794178.6A CN201810794178A CN108624849A CN 108624849 A CN108624849 A CN 108624849A CN 201810794178 A CN201810794178 A CN 201810794178A CN 108624849 A CN108624849 A CN 108624849A
- Authority
- CN
- China
- Prior art keywords
- crucible
- heater
- thermal resistance
- evaporation device
- evaporator body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
The invention discloses a kind of thermal resistance evaporation devices.The evaporator body of the thermal resistance evaporation device is arranged by flange-interface in vacuum equipment, and vacuum equipment is for making evaporator body be in vacuum environment；Water cooled electrode is connect with evaporator body, and is extended to outside vacuum equipment across flange-interface；Evaporator body includes crucible, heater, shielded layer, temperature-control heat couple and PID controller；Having heaters is wrapped up on the outer wall of the side of crucible, heater is electrically connected by water cooled electrode with the heating power supply outside vacuum equipment；Multilayer screen layer is correspondingly arranged on the outside of heater；One end of temperature-control heat couple is electrically connected with PID controller, and the other end is correspondingly arranged across shielded layer with heater；PID controller is electrically connected with heating power supply.The thermal resistance evaporation device can monitor the temperature of its local environment in real time, ensure that the stabilization of temperature in crucible, improve the stability of substance evaporation rate to be evaporated.
Description
Technical field
The present invention relates to material evaporation technique fields, more particularly to a kind of thermal resistance evaporation device.
Background technology
It is higher and higher to the requirement for being evaporated in vacuo the stability of rate in industries such as solar cell, OLED luminescent devices.
For example, when prepared by perovskite thin film solar cell, two kinds of lead iodide, iodine first ammonia materials is needed to be reached with stable evaporation rate
To certain proportioning；When preparing OLED luminescent devices, needs 4 kinds of organic materials to be mixed with certain proportioning and evaporate, stabilizing material
Evaporation rate be one of core technology；When preparing flexible solar battery and its display device, large area continuous steaming is needed
Plating, vapor deposition process need long-time stable rate to evaporate material to meet industrial stability.And existing evaporator
The stability of evaporation rate is not high, and there are no the evaporator appearance that the stability of evaporation rate reaches 0.1A/s ranks.
Invention content
Based on this, it is necessary to a kind of thermal resistance evaporation device is provided, to improve the stability of evaporation rate.
To achieve the above object, the present invention provides following schemes：
A kind of thermal resistance evaporation device, including：Evaporator body, water cooled electrode and flange-interface；The evaporator body passes through
The flange-interface is arranged in vacuum equipment, and the vacuum equipment is for making the evaporator body be in vacuum environment；
The water cooled electrode is connect with the evaporator body, and is extended to outside the vacuum equipment across the flange-interface；
The evaporator body includes crucible, heater, shielded layer, temperature-control heat couple and PID controller；The crucible is used
In placement substance to be evaporated；Having heaters is wrapped up on the outer wall of the side of the crucible, the heater passes through water cooling electricity
Pole is electrically connected with the heating power supply outside the vacuum equipment；Multilayer screen layer, the screen are correspondingly arranged on the outside of the heater
Layer is covered for absorbing the heat distributed on the outside of the heater；One end of the temperature-control heat couple and PID controller electricity
Connection, the other end are correspondingly arranged across the shielded layer with the heater, the temperature outside for detecting the heater；Institute
It states PID controller to be electrically connected with the heating power supply, the stabilization for controlling the heater heating temperature.
Optionally, the evaporator body further includes calibration thermocouple；It is controlled with the PID one end of the calibration thermocouple
Device electrical connection processed, the other end is inserted into the crucible, for being calibrated to the temperature inside the crucible.
Optionally, the evaporator body further includes protective cover；The protective cover is arranged in the top of the heater, and
Between the crucible and the shielded layer, for preventing the steam in the crucible to be diffused into the heater.
Optionally, the evaporator body further includes crucible supporting bar；One end of the crucible supporting bar is fixed on described
On shielded layer, the bottom of the other end and the crucible is fixed, and is used to support the crucible.
Optionally, the evaporator body further includes shielding supporting rod；One end of the shielding supporting rod is fixed on described
On flange-interface, the other end is fixed with the shielded layer, is used to support the shielded layer.
Optionally, the material of the heater is metal molybdenum or metal tantalum.
Optionally, the material of the crucible is AL2O3。
Optionally, the material of the crucible supporting bar is AL2O3。
Optionally, the material of the shielding supporting rod is metal molybdenum.
Optionally, the material of the protective cover is metal molybdenum.
Compared with prior art, the beneficial effects of the invention are as follows：
The present invention proposes a kind of thermal resistance evaporation device, including：Evaporator body, water cooled electrode and flange-interface；Evaporator
Ontology is arranged by flange-interface in vacuum equipment, and vacuum equipment is for making evaporator body be in vacuum environment；Water cooling
Electrode is connect with evaporator body, and is extended to outside vacuum equipment across flange-interface；Evaporator body includes crucible, heating
Device, shielded layer, temperature-control heat couple and PID controller；Having heaters is wrapped up on the outer wall of the side of crucible, heater passes through water cooling
Electrode is electrically connected with the heating power supply outside vacuum equipment；Multilayer screen layer is correspondingly arranged on the outside of heater；Temperature-control heat couple
One end is electrically connected with PID controller, and the other end is correspondingly arranged across shielded layer with heater；PID controller and heating power supply electricity
Connection.The thermal resistance evaporation device can monitor the temperature of its local environment in real time, it is made to stablize in fixed temperature range
It is interior, it ensure that the stabilization of temperature in crucible, improve the stability of substance evaporation rate to be evaporated.
Description of the drawings
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the present invention
Example, for those of ordinary skill in the art, without having to pay creative labor, can also be according to these attached drawings
Obtain other attached drawings.
Fig. 1 is a kind of structural schematic diagram of thermal resistance evaporation device of the embodiment of the present invention.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, below in conjunction with the accompanying drawings and specific real
Applying mode, the present invention is described in further detail.
Fig. 1 is a kind of structural schematic diagram of thermal resistance evaporation device of the embodiment of the present invention.
Referring to Fig. 1, the thermal resistance evaporation device of embodiment, including：Evaporator body, water cooled electrode 1 and flange-interface 2；It is described
Evaporator body is arranged by the flange-interface 2 in vacuum equipment, and the vacuum equipment is for making the evaporator body
In vacuum environment；The water cooled electrode 1 is connect with the evaporator body, and extends to institute across the flange-interface 2
It states outside vacuum equipment；The model DN100 flange-interfaces of the flange-interface 2.
The evaporator body includes crucible 3, heater 4, shielded layer 5, temperature-control heat couple 6 and PID controller；The earthenware
Crucible 3 is for placing substance to be evaporated；Having heaters 4 is wrapped up on the outer wall of the side of the crucible 3, the heater 4 passes through institute
It states water cooled electrode 1 to be electrically connected with the heating power supply outside the vacuum equipment, the heater 4 is used to heat the crucible 3；Institute
The outside for stating heater 4 is correspondingly arranged multilayer screen layer 5, what the shielded layer 5 was distributed for absorbing the outside of the heater 4
Heat；One end of the temperature-control heat couple 6 is electrically connected with the PID controller, and the other end passes through the shielded layer 5 to add with described
Hot device 4 is correspondingly arranged, the temperature outside for detecting the heater 4 in real time；The PID controller and heating power supply electricity
Connection, the temperature outside of the heater 4 for being fed back according to the temperature-control heat couple 6 received, to control the output of heating power supply
Power so that heater 4 stablizes in fixed range the temperature of its local environment, and then keeps object to be evaporated in crucible 3
The stabilization of matter evaporation rate.The control principle of the PID controller is as follows：PID controller can set temperature and heating-up time, work
The signal feedback of PID controller real-time reception temperature-control heat couple 6, passes through the ratio of the real time temperature and set temperature that measure when making
It is right, to judge and control the size of heating power supply output power, and then realize the balance control for reaching set temperature.
The material of the crucible 3 is oxidation aluminium material, and aluminium oxide has insulation, heat safe characteristic, evaporates temperature in material
Under the conditions of degree, crucible will not be by pyrolytic or thawing, and the material of the crucible 3 described in the present embodiment is AL2O3, the earthenware
Crucible 3 is by 4 metapyretic thermal radiation absorption heat of heater, with the substance to be evaporated of evaporation storage.
The material of the heater 4 is thermo electric material, and the material of heater 4 described in the present embodiment is metal molybdenum or metal
Tantalum, the resistance heating after heater 4 is powered, can change therewith according to the size of current temperature of energization.
Why the present embodiment is arranged the shielded layer 5, is used since the thermal resistance evaporation device uses under vacuum conditions
Be radiant type heating means, the medial and lateral of such heater 4 can be heated simultaneously, inside for crucible 3 heating be evaporated,
The temperature in outside can be excessively high.Heat, heat dissipation are absorbed by the way that shielded layer 5 is arranged, it is excessively high to avoid external temperature.And this implementation
1 one side of water cooled electrode in example is used to the lead of the heater 4 being connected to the heating power supply outside vacuum equipment, another party
It is excessively high to further avoid external temperature for being cooled down to entire thermal resistance evaporation device for face.
As an alternative embodiment, the evaporator body further includes calibration thermocouple 7；The calibration thermocouple
7 one end is electrically connected with the PID controller, and the other end is inserted into the crucible 3, for the temperature inside the crucible 3
Degree is calibrated, and the stability of 3 internal temperature of crucible is further ensured, to preferably keep substance steaming to be evaporated in crucible 3
Send out the stabilization of rate.In the present embodiment, the PID controller carries out the temperature outside of temperature and heater 4 inside crucible 3
Comparison makes its " outside after the practical setting-out of crucible by comparing the difference of crucible inside and outside temperature for specific evaporation material
Temperature-time in temperature-crucible " compares curve, after calibration, can remove calibration thermocouple 7, only pass through temperature control thermoelectricity
Even 6 real time temperature-time relationship can accurately judge the temperature inside crucible 3.
As an alternative embodiment, the evaporator body further includes protective cover 8；The setting of the protective cover 8 exists
The top of the heater 4, and between the crucible 3 and the shielded layer 5；The material of the protective cover 8 is metal molybdenum.
Be arranged protective cover 8 the reason of be：After substance to be evaporated evaporates, due to being carried out in vacuum environment, the steaming of substance to be evaporated
Gas can be spread to all directions, that is, can be diffused into inside evaporator, if blocking protection without any, substance to be evaporated
Steam can pollute heater or even can influence the insulation performance of the insulating part of heater.The protective cover 8 can be in crucible 3
Steam shielded, it is therefore prevented that the steam in crucible 3 is diffused into heater 4.
As an alternative embodiment, the evaporator body further includes crucible supporting bar 9；The crucible supporting bar
9 one end is fixed on the shielded layer 5, and the bottom of the other end and the crucible 3 is fixed, and is used to support the crucible 3；It is described
The material of crucible supporting bar 9 is AL2O3。
As an alternative embodiment, the evaporator body further includes shielding supporting rod 10；The shielding support
One end of bar 10 is fixed on the flange-interface 2, and the other end is fixed with the shielded layer 5, is used to support the shielded layer 5；
The material of the shielding supporting rod 9 is metal molybdenum.
Thermal resistance evaporation device in the present embodiment can monitor the temperature of its local environment in real time, it is made to stablize
Within the scope of fixed temperature, the stabilization of temperature in crucible ensure that, improve the stability of substance evaporation rate to be evaporated.
Principle and implementation of the present invention are described for specific case used herein, and above example is said
The bright method and its core concept for being merely used to help understand the present invention；Meanwhile for those of ordinary skill in the art, foundation
The thought of the present invention, there will be changes in the specific implementation manner and application range.In conclusion the content of the present specification is not
It is interpreted as limitation of the present invention.
Claims (10)
1. a kind of thermal resistance evaporation device, which is characterized in that including：Evaporator body, water cooled electrode and flange-interface；The evaporator
Ontology is arranged by the flange-interface in vacuum equipment, and the vacuum equipment is for making the evaporator body be in vacuum
In environment；The water cooled electrode is connect with the evaporator body, and extends to the vacuum equipment across the flange-interface
Outside；
The evaporator body includes crucible, heater, shielded layer, temperature-control heat couple and PID controller；The crucible is for putting
Set substance to be evaporated；Wrap up having heaters on the outer wall of the side of the crucible, the heater by the water cooled electrode with
Heating power supply electrical connection outside the vacuum equipment；Multilayer screen layer, the shielded layer are correspondingly arranged on the outside of the heater
For absorbing the heat distributed on the outside of the heater；One end of the temperature-control heat couple is electrically connected with the PID controller,
The other end is correspondingly arranged across the shielded layer with the heater, the temperature outside for detecting the heater；The PID
Controller is electrically connected with the heating power supply, the stabilization for controlling the heater heating temperature.
2. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the evaporator body further includes calibration heat
Galvanic couple；It is described calibration thermocouple one end be electrically connected with the PID controller, the other end is inserted into the crucible, be used for pair
Temperature inside the crucible is calibrated.
3. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the evaporator body further includes protection
Cover；The protective cover is arranged in the top of the heater, and between the crucible and the shielded layer, for preventing
The steam in crucible is stated to be diffused into the heater.
4. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the evaporator body further includes crucible branch
Strut；One end of the crucible supporting bar is fixed on the shielded layer, and the bottom of the other end and the crucible is fixed, for branch
Support the crucible.
5. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the evaporator body further includes shielding branch
Strut；One end of the shielding supporting rod is fixed on the flange-interface, and the other end is fixed with the shielded layer, is used to support
The shielded layer.
6. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the material of the heater be metal molybdenum or
Metal tantalum.
7. a kind of thermal resistance evaporation device according to claim 1, which is characterized in that the material of the crucible is AL2O3。
8. a kind of thermal resistance evaporation device according to claim 4, which is characterized in that the material of the crucible supporting bar is
AL2O3。
9. a kind of thermal resistance evaporation device according to claim 5, which is characterized in that the material of the shielding supporting rod is metal
Molybdenum.
10. a kind of thermal resistance evaporation device according to claim 3, which is characterized in that the material of the protective cover is metal molybdenum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810794178.6A CN108624849B (en) | 2018-07-19 | 2018-07-19 | Resistance evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810794178.6A CN108624849B (en) | 2018-07-19 | 2018-07-19 | Resistance evaporator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108624849A true CN108624849A (en) | 2018-10-09 |
| CN108624849B CN108624849B (en) | 2023-09-22 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810794178.6A Active CN108624849B (en) | 2018-07-19 | 2018-07-19 | Resistance evaporator |
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| CN206858646U (en) * | 2017-05-17 | 2018-01-09 | 大连交通大学 | A kind of cryogenic vacuum evaporation source |
| CN208917287U (en) * | 2018-07-19 | 2019-05-31 | 北京泰科诺科技有限公司 | A kind of thermal resistance evaporation device |
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| JPH04191364A (en) * | 1990-11-27 | 1992-07-09 | Nkk Corp | Method and device for ion plating |
| CN2585869Y (en) * | 2002-12-24 | 2003-11-12 | 中国科学院物理研究所 | Appts. for evaporation preparing lage area thin film by utilizing current for directly heating target material |
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|---|---|
| CN108624849B (en) | 2023-09-22 |
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