CN108562971A - A kind of waveguide optical grating filter and preparation method thereof - Google Patents

A kind of waveguide optical grating filter and preparation method thereof Download PDF

Info

Publication number
CN108562971A
CN108562971A CN201810409526.3A CN201810409526A CN108562971A CN 108562971 A CN108562971 A CN 108562971A CN 201810409526 A CN201810409526 A CN 201810409526A CN 108562971 A CN108562971 A CN 108562971A
Authority
CN
China
Prior art keywords
waveguide
optical grating
grating filter
waveguide optical
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201810409526.3A
Other languages
Chinese (zh)
Other versions
CN108562971B (en
Inventor
陈开�
段飞
余永林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huazhong University of Science and Technology
Original Assignee
Huazhong University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huazhong University of Science and Technology filed Critical Huazhong University of Science and Technology
Priority to CN201810409526.3A priority Critical patent/CN108562971B/en
Publication of CN108562971A publication Critical patent/CN108562971A/en
Application granted granted Critical
Publication of CN108562971B publication Critical patent/CN108562971B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12033Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for configuring the device, e.g. moveable element for wavelength tuning
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/138Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0147Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on thermo-optic effects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

The present invention provides a kind of waveguide optical grating filter, and the waveguide optical grating filter includes substrate (1) and waveguide (2), further includes the beam column construction (3) for being used to support waveguide (2);The beam column construction (3) includes positioned at waveguide (2) both sides, rod structure (302) of the setting on substrate (1) and the girder construction (301) for connecting rod structure (302);There is air-gap (201) between waveguide (2) and substrate (1).Waveguide optical grating filter of the present invention changes the spectral characteristic of waveguide optical grating filter using the method for thermal tuning, by constructing the local heat insulation structure between air-gap realization waveguide and substrate below waveguide, the perpendicular flow for hindering heat, to reduce the power consumption of waveguide optical grating filter.The waveguide optical grating filter of the present invention has many advantages, such as that low-power consumption, tuning are efficient, tunes very fast, stable structure, is easy of integration, there is significant application value in wavelength-division multiplex system.

Description

A kind of waveguide optical grating filter and preparation method thereof
【Technical field】
The invention belongs to optical filtering technology fields, are related to integrated optical wave guide device technical field, and in particular to Yi Zhongbo Guide-lighting grating filter and preparation method thereof.
【Background technology】
Optical filter is one important photonic device, and silicon (SOI) substrate being mainly used on insulator is optics In the integrated optical circuit of platform.The major function of optical filter is the light progress frequency separation that will include multi-frequency ingredient, is obtained One of which or multi-frequency ingredient.Under the frame of optical communication system, filter mainly has Fabry-Perot (F-P) filter The types such as wave device, Mach-Ze De (MZ) filter, grating filter and micro-loop filter.Compared to other three kinds of structures, light Grating filter has many advantages, such as that making is simple, spectral characteristic is easily designed, has obtained extensive concern.
Tunable waveguide optical grating filter is a kind of light that centre wavelength can continuously be changed in a certain range filter Wave device, there are many Tuning mechanisms, the electric current tuning such as based on plasma dispersion effect, the electric tuning based on electrooptic effect, Thermal tuning based on thermo-optic effect and the MEMS tunings based on MEMS etc..Wherein, due to the thermo-optical coeffecient of silicon compared with Greatly, so, wherein since the thermo-optical coeffecient of silicon is larger, so, silicon substrate thermal tuning waveguide optical grating filter is in integrated photon light path Aspect has the advantage of bigger.
General silicon substrate thermal tuning waveguide optical grating filter often carves waveguiding structure with the top layer silicon of SOI wafer, in waveguide Rectangular is the substrate of oxide layer and bottom silicon composition, tuning effect at evaporated film heater layer again after oxide layer, below waveguide Rate is relatively low (being less than 100pm/mW).There are mainly two types of improved structures at present:First, being formed in waveguide side setting air-gap Thermal insulation, second is that etching air-gap below waveguide.The first side air-gap structure can guarantee that relatively high structure is steady It is qualitative, but the tuning efficiency of thermal tuning waveguide optical grating filter cannot be effectively improved.Second of structure is to hollow out silica-based waveguides Oxide layer immediately below grating filter waveguide makes formation office between waveguide and substrate to hinder the heat flow in vertical direction Portion is thermally isolated, to reduce power consumption, improve its thermal tuning efficiency.But this structure has two:One is the increase in The response time (about in hundred musec orders) of tuning, that is, reduce response speed;Second is that due to this wave containing air-gap structure Guide-lighting grating filter does not have good support construction, waveguide to will produce larger deformation, significantly reduces the steady of mechanical mechanism It is qualitative.In conclusion current silicon substrate thermal tuning waveguide optical grating filter generally tunes inefficient, and response speed is slower, Structural stability is poor.
【Invention content】
Purpose of the present invention is to overcome prior art defect, it is opposite to provide a kind of high tuning efficiency, fast response time and structure Stable waveguide optical grating filter, with and preparation method thereof.
The thinking of the present invention is to construct a kind of waveguide optical grating filter of thermal tuning, is changed by way of being heated or cooled Device temperature realizes wavelength selection.By combining air-gap and periodically lateral beam column support construction, can greatly carry Under the premise of the humorous efficiency of rising tune, ensure its response speed and mechanical structure stability, to improve the yield rate in manufacturing process.
To achieve the goals above, the present invention provides a kind of waveguide optical grating filter, and the waveguide optical grating filter includes Substrate 1 and the waveguide 2 being arranged on substrate 1, the waveguide 2 include waveguide body 202, set on the two of 202 or more waveguide body Silica top covering 203 and layers for thin film heaters 204 set on 203 or more silica top covering, 202 liang of the waveguide body It is carved with grating in side;
Wherein, the waveguide optical grating filter further includes the beam column construction 3 for being used to support waveguide 2;
The beam column construction 3 includes positioned at 2 both sides of waveguide, the rod structure 302 being arranged on substrate 1 and being used for connecting pole knot The girder construction 301 of structure 302;
There is air-gap 201 between waveguide 2 and substrate 1.
As a preferred embodiment, the rod structure 302 includes being symmetricly set on 202 both sides of waveguide body, week Multiple beam-column units of phase property setting, adjacent beam-column unit spacing are 5~20 μm.
As a preferred embodiment, the waveguide body 202 is ridge waveguide, the grating is engraved in ridge waveguide Interior ridge both sides.
In the present invention, the cross sectional shape of ridge waveguide (single ridged waveguides) is as shown in figure 3, W, H, h, l are respectively that interior ridge is wide Degree, overall thickness, lower slab-thickness and lower sheet width.Those skilled in the art pass through this four sizes of reasonably optimization design Parameter may be implemented stringent single transverse mode transmission, effectively reduce optical transmission loss.
In the present invention, the grating selects rectangular raster, it is highly preferred that its centre wavelength is in communication band C-band, i.e., 1525-1565nm。
The parameter of rectangular raster includes modulation width Δ w, periods lambda and duty ratio, and those skilled in the art are according to existing The introduction of technology can be by rationally designing the selections of these parameters, to by the transmission spectrum centre wavelength of waveguide optical grating filter And bandwidth is set in certain initial value.
According to a kind of preferred embodiment, the height of the air-gap 201 is 200-300nm.
According to another preferred embodiment, the layers for thin film heaters 204 is Metal Membrane Heater layer comprising Positioned at the nickel layer of lower part and positioned at top layer gold.
Make its fever when applying electric current to Metal Membrane Heater layer 204, is realized to metallic resistance by controlling electric current The control of calorific value, to control the temperature of waveguide 202.The temperature change of waveguide makes the refractive index of material change, in turn So that the spectrum of waveguide optical grating moves, to realize thermal tuning filter action.Positioned at layer gold and silica top covering it Between nickel layer can play the role of well viscous glutinous, so that layer gold and silicon dioxide layer is adhered to more securely and convenient for heat transmission.
Further, waveguide optical grating filter of the invention further includes being arranged at 2 both ends of waveguide, by tapering transition Duan Lian The light input end 4 and light output end 5 connect.
The present invention also provides the production methods of above-mentioned waveguide optical grating filter, include the following steps:
(1) SOI wafer is taken, layer coats photoresist on the wafer, constructs waveguide 2 and beam column construction 3;The SOI is brilliant Piece has silicon materials substrate, silicon dioxide intermediate layer and top layer silicon;
(2) to the photoresist layer exposure imaging, the photoresist layer other than waveguide 2 and beam column construction 3 is removed, and with remainder Photoresist layer performed etching for mask, remove mask other than top layer silicon, obtain both sides have grating waveguide;
(3) silicon dioxide intermediate layer for falling 2 lower section of the waveguide by wet etching, constitutes air-gap 201, and retain beam 3 part of silica middle layer of rod structure is to constitute rod structure 302;
(4) in 2 overburden silica top covering 203 of waveguide;
(5) the upper table surface construction layers for thin film heaters 204 of covering 203 on silica.
The present invention below waveguide by constructing air-gap, using air-gap to realize the heat between waveguide and substrate substantially absolutely Edge;Waveguide, silica top covering and thin film heater are supported by the beam column construction being made of girder construction and rod structure;It is described Layers for thin film heaters on covering, can generate heat, and will be hot by the mode of heat transfer to its Injection Current on silica Amount is transmitted to waveguide, and waveguide is made to heat up;The filter of the present invention thus can be changed by controlling the Injection Current of thin film heater Temperature, so that the Refractive Index of Material of the waveguide is changed using thermo-optic effect, to change the transmission spectrum of waveguide optical grating, by This realizes wavelength selection.
Compared with prior art, the present invention has the following advantages:
Waveguide optical grating filter of the present invention changes the spectral characteristic of waveguide optical grating filter using the method for thermal tuning, passes through Air-gap is constructed below waveguide, realizes the local heat insulation structure between waveguide and substrate, hinders the perpendicular flow of heat, from And reduce the power consumption of waveguide optical grating filter;
On the other hand, the present invention is realized by the beam column construction that is periodically arranged to waveguide, silica top covering and thin The support of film heater layer is arranged corresponding beam column construction parameter according to the stress of waveguide and profiling temperatures, can make wave Guide-lighting grating filter has good mechanical stability, temperature uniformity, while can increase response speed;
Further, since support construction and the contact area of grating waveguide are smaller, waveguide optical grating filter of the invention work Hot crosstalk in the process between adjacent devices is relatively low, can be perfectly suitable for being densely integrated.
To sum up, the waveguide optical grating filter of the present invention has, low-power consumption, tuning are efficient, tuning is very fast, structure is steady The advantages that fixed, easy of integration, there is significant application value in wavelength-division multiplex system (WDM).
【Description of the drawings】
Fig. 1 is the overall structure diagram of the waveguide optical grating filter of the present invention;
Fig. 2 is SOI wafer cross-sectional view;
Fig. 3 is the local overlooking mechanism map of waveguide and beam column construction;
Fig. 4 is waveguide body and the cross-sectional view of air-gap;
Fig. 5 is the structural schematic diagram of ridge waveguide;
Fig. 6 is rectangular raster structural representation;
Fig. 7 is the partial enlarged view of beam column construction unit;
Fig. 8 is the cross-sectional view of the waveguide body with silica top covering;
Fig. 9 is the cross-sectional view of the waveguide body with Metal Membrane Heater layer;
Figure 10 is that temperature rises the waveguide optical grating filter local temperature distribution simulated at 60 DEG C;
Transmission spectrum when Figure 11 modulation widths are 60nm under different heating power;
The response curve test result of the waveguide optical grating filter of Figure 12 present invention;
Figure 13 is the production process block diagram of the waveguide optical grating filter of the present invention.
【Specific implementation mode】
Following embodiment for explaining technical scheme of the present invention without limitation.
Embodiment 1
Construct waveguide optical grating filter as shown in Figure 1.
Usage profile structure SOI wafer as shown in Figure 2, with silicon materials substrate 1, silicon dioxide intermediate layer 6 and top Layer silicon 202.
The spin coating photoresist in the top layer silicon of SOI wafer, and performed etching as mask, obtain waveguide 2 and be located at wave The beam column construction 3 that both sides are in periodic arrangement is led, plan structure is as shown in Figure 3.Then, for having made above structure SOI wafer removes the silicon dioxide layer below ridge waveguide, and member-retaining portion silica using hydrofluoric acid (HF) wet etching As column 302a, the structure with air-gap as shown in Figure 4 is obtained, while constituting beam column construction.
Waveguide body 202, light input end 4 and light input end 5 are all the couplers made in the top layer silicon of SOI wafer Structure.In the present embodiment, waveguide 2 is ridge waveguide, and interior ridge both sides have grating.Ridge waveguide as figure 5 illustrates, W, H, h, l Respectively interior ridge width, overall thickness, lower slab-thickness and lower sheet width pass through this four size ginsengs of reasonably optimization design Number may be implemented stringent single transverse mode transmission, greatly reduce optical transmission loss.In the present embodiment, for most common top layer Silicon thickness is the SOI wafer of 220nm, and the present embodiment separately designs W, H, h, l for 500nm, 220nm, 120nm and 1.2 μm.
It is carved with rectangular raster as shown in FIG. 6 on the interior ridge of ridge waveguide 202, to realize filter action.Pass through design Modulation width Δ w, periods lambda and the duty ratio of rectangular raster, can by the transmission spectrum centre wavelength of waveguide optical grating filter with And bandwidth is set in certain initial value.The peak wavelength initial value of the present embodiment is 1550nm, modulation width Δ w=60nm, period Λ=300nm, duty ratio 1:1, etching depth 100nm, grating segment length are 600 μm.
In the present embodiment, beam column construction unit is as shown in Figure 7.There is one layer of air-gap 201 between waveguide 202 and substrate 1, leads to Beam column construction 3 is crossed to support waveguide 202.The beam column construction unit of the present embodiment is made of girder construction 301 and rod structure 302, Cross-section structure is as shown in Figure 8,9, and rod structure 302 includes:Setting is carved by SOI wafer by wet method in 202 both sides of waveguide body Erosion is formed on the column 302a constituted after air-gap 201, column 302b identical with the ectoloph thickness of waveguide body 202 and silica The column 302c that the deposition of covering 203 is formed.To ensure the stability and temperature uniformity of mechanical structure, set in waveguide optical grating filter The beam-column unit of several periodic distributions is set, the spacing of adjacent beam-column unit is 10 μm.
On the chip for having made above-mentioned air-gap and ridge waveguide, PECVD is used under conditions of cavity temperature is 100 DEG C Silica top covering is grown, silica top covering 203, column 302c and the tie-beam between them shown in Fig. 8 are obtained Structure.
On the chip that grown silica top covering, deposition obtains Metal Membrane Heater layer as shown in Figure 9 204.In the present embodiment, the spin coating photoresist layer first on the chip that grown silica top covering, then to photoresist layer Exposure imaging removes the photoresist for making the Metal Membrane Heater layer region;Again the mode of deposited by electron beam evaporation (EBE) according to Secondary deposited nickel layer and layer gold metallic film;Finally peeling off lower section with acetone has the metallic film of photoresist, obtains metallic film Heater layer 204.
Layers for thin film heaters 204 selects metal material, to realize the heating by changing Metal Membrane Heater layer 204 Electric current and the calorific value for controlling metallic resistance are obtained and are adjusted to the temperature of waveguide body 202 so that the refractive index of material becomes Change, so that the spectrum of waveguide optical grating moves, to realize thermal tuning filter action.Metal Membrane Heater layer 204 Including nickel layer and layer gold;Nickel layer mainly acts to glue sticking, makes layer gold and silica between layer gold and silica top covering Layer adherency is more secured;Nickel layer thickness is 40nm, and layer gold thickness is 160nm.
So far, the total length for the waveguide optical grating that the present embodiment obtains is 600 μm, the overall dimensions of device be less than 1mm × 0.1mm.Air-gap 201 makes waveguide body 202 be not in direct contact with substrate 1, and thermal insulation is realized substantially by air.Optionally, lead to The depth and silicon dioxide growth thickness that control air-gap 201 etches are crossed, the space height that the present embodiment obtains is 200nm.
The maximum temperature rise of the waveguide optical grating filter of the present embodiment is 60 DEG C or so, this temperature rises Imitating and obtains the office of waveguide Portion's Temperature Distribution is as shown in Figure 10, and waveguide temperature is evenly distributed along longitudinal direction as seen from the figure, and the temperature of each position is 87 DEG C of left sides Right (temperature rises 60 DEG C).
Under different heating power, the waveguide optical grating filter transmission spectrum of the present embodiment is as shown in figure 11.Each heating power Under obtained good transmission spectrum, demonstrate simulation find the equally distributed result of temperature.As seen from the figure, the present embodiment The transmission spectrum bandwidth of (modulation width 60nm) is 7nm or so;Compared to the transmission spectrum of Wen Shengqian (long dotted line), transmission spectrum after heating Apparent drift has occurred;It tunes efficiency and is more than 250pm/mW.
In addition, a length of 1557nm of light wave of fixed input, one frequency of application is the square wave electric signal of 2KHz in metal foil On film heater, the response curve for measuring the present embodiment waveguide optical grating filter is as shown in figure 12.It can be obtained by figure, rising edge 78 μ s of 10%-90% response times, the 52 μ s of 10%-90% response times of failing edge.So the waveguide optical grating of the present embodiment Filter can get the thermal tuning time less than 100 μ s, and tuned speed is very fast.
Above-described embodiment is the waveguide optical grating filter containing air-gap structure supported based on beam column.This field professional technique Personnel can realize or use the present invention through this embodiment, but be built upon and the reality in same or like thought and principle herein It applies example and belongs to the scope of the present invention.

Claims (10)

1. a kind of waveguide optical grating filter, the waveguide optical grating filter includes the waveguide of substrate (1) and setting on substrate (1) (2), the waveguide (2) include waveguide body (202), be set to waveguide body (202) more than silica top covering (203) and Grating is carved in layers for thin film heaters (204) more than silica top covering (203), waveguide body (202) both sides;
It is characterized in that the waveguide optical grating filter further includes the beam column construction (3) for being used to support waveguide (2);
The beam column construction (3) includes positioned at waveguide (2) both sides, the rod structure (302) being arranged on substrate (1) and for connecting The girder construction (301) of rod structure (302);
There is air-gap (201) between waveguide (2) and substrate (1).
2. waveguide optical grating filter according to claim 1, it is characterised in that the beam column construction (302) includes symmetrically setting Set waveguide body (202) both sides, multiple beam-column units for being periodically arranged, adjacent beam-column unit spacing is 5~20 μm.
3. waveguide optical grating filter according to claim 1, it is characterised in that the waveguide body (202) is ridged wave It leads, the grating is engraved in the interior ridge both sides of ridge waveguide.
4. waveguide optical grating filter according to claim 3, it is characterised in that the grating is rectangular raster.
5. waveguide optical grating filter according to claim 3, it is characterised in that the centre wavelength of the grating is in communication wave Section C-band.
6. waveguide optical grating filter according to claim 1, it is characterised in that the height of the air-gap (201) is 200- 300nm。
7. waveguide optical grating filter according to claim 1, it is characterised in that the layers for thin film heaters (204) is metal Layers for thin film heaters comprising be located at the nickel layer of lower part and be located at top layer gold.
8. waveguide optical grating filter according to claim 1, it is characterised in that the waveguide optical grating filter further includes setting It sets in waveguide (2) both ends, the light input end (4) connected by tapering transition section and light output end (5).
9. the production method of waveguide optical grating filter, includes the following steps described in any one of claim 1-8 claims:
(1) SOI wafer is taken, layer coats photoresist, construction waveguide (2) and beam column construction (3) on the wafer;The SOI is brilliant Piece has silicon materials substrate, silicon dioxide intermediate layer and top layer silicon;
(2) to the photoresist layer exposure imaging, the photoresist layer other than waveguide (2) and beam column construction (3) is removed, and with remainder Photoresist layer performed etching for mask, remove mask other than top layer silicon, obtain both sides have grating waveguide;
(3) silicon dioxide intermediate layer below the waveguide (2) is fallen by wet etching, constitutes air-gap (201), and retain beam Rod structure (3) part of silica middle layer is to constitute rod structure (302);
(4) in waveguide (2) overburden silica top covering (203);
(5) the upper table surface construction layers for thin film heaters (204) of covering (203) on silica.
10. production method according to claim 8, it is characterised in that in the step (4), pass through plasma enhancing Vapour deposition process is learned in waveguide (2) overburden silica top covering (203).
CN201810409526.3A 2018-05-02 2018-05-02 Waveguide grating filter and manufacturing method thereof Active CN108562971B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810409526.3A CN108562971B (en) 2018-05-02 2018-05-02 Waveguide grating filter and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810409526.3A CN108562971B (en) 2018-05-02 2018-05-02 Waveguide grating filter and manufacturing method thereof

Publications (2)

Publication Number Publication Date
CN108562971A true CN108562971A (en) 2018-09-21
CN108562971B CN108562971B (en) 2020-04-28

Family

ID=63537623

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810409526.3A Active CN108562971B (en) 2018-05-02 2018-05-02 Waveguide grating filter and manufacturing method thereof

Country Status (1)

Country Link
CN (1) CN108562971B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109581586A (en) * 2019-01-10 2019-04-05 上海理工大学 A kind of sub- chip of compact type silicon nitride wavelength division multiplexed light
CN112099150A (en) * 2020-09-28 2020-12-18 武汉驿路通科技股份有限公司 Optical fiber array and manufacturing method thereof
CN114428377A (en) * 2020-10-29 2022-05-03 格芯(美国)集成电路科技有限公司 Grating coupler integrated with one or more air gaps
CN114859467A (en) * 2022-04-11 2022-08-05 上海交通大学 Filter based on reverse binary blazed grating and manufacturing method
JP7154457B1 (en) * 2021-08-20 2022-10-17 三菱電機株式会社 Ultrasound imaging device and imaging system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102200667A (en) * 2011-05-06 2011-09-28 中国科学院上海微系统与信息技术研究所 Silicone tunable optical filter and making method thereof
CN102478686A (en) * 2010-11-26 2012-05-30 中国科学院微电子研究所 Grating coupler and coupling structure and packaging structure of grating coupler and optical fiber
CN102486550A (en) * 2010-12-06 2012-06-06 中国科学院微电子研究所 Silicon-based composite medium spot-size converter and preparation method thereof
EP2866317A1 (en) * 2013-07-01 2015-04-29 Imec Hybrid waveguide lasers and methods for fabricating hybrid waveguide lasers
CN104635298A (en) * 2015-02-11 2015-05-20 深圳太辰光通信股份有限公司 Planar optical waveguide and manufacturing method thereof
US20170194764A1 (en) * 2016-01-04 2017-07-06 Infinera Corporation Tunable waveguide devices

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102478686A (en) * 2010-11-26 2012-05-30 中国科学院微电子研究所 Grating coupler and coupling structure and packaging structure of grating coupler and optical fiber
CN102486550A (en) * 2010-12-06 2012-06-06 中国科学院微电子研究所 Silicon-based composite medium spot-size converter and preparation method thereof
CN102200667A (en) * 2011-05-06 2011-09-28 中国科学院上海微系统与信息技术研究所 Silicone tunable optical filter and making method thereof
EP2866317A1 (en) * 2013-07-01 2015-04-29 Imec Hybrid waveguide lasers and methods for fabricating hybrid waveguide lasers
CN104635298A (en) * 2015-02-11 2015-05-20 深圳太辰光通信股份有限公司 Planar optical waveguide and manufacturing method thereof
US20170194764A1 (en) * 2016-01-04 2017-07-06 Infinera Corporation Tunable waveguide devices

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109581586A (en) * 2019-01-10 2019-04-05 上海理工大学 A kind of sub- chip of compact type silicon nitride wavelength division multiplexed light
CN109581586B (en) * 2019-01-10 2021-03-23 上海理工大学 Compact structure type silicon nitride wavelength division multiplexing photon chip
CN112099150A (en) * 2020-09-28 2020-12-18 武汉驿路通科技股份有限公司 Optical fiber array and manufacturing method thereof
CN114428377A (en) * 2020-10-29 2022-05-03 格芯(美国)集成电路科技有限公司 Grating coupler integrated with one or more air gaps
CN114428377B (en) * 2020-10-29 2024-06-25 格芯(美国)集成电路科技有限公司 Grating coupler integrated with one or more air gaps
JP7154457B1 (en) * 2021-08-20 2022-10-17 三菱電機株式会社 Ultrasound imaging device and imaging system
WO2023021695A1 (en) * 2021-08-20 2023-02-23 三菱電機株式会社 Ultrasonic imaging element and imaging system
CN114859467A (en) * 2022-04-11 2022-08-05 上海交通大学 Filter based on reverse binary blazed grating and manufacturing method
CN114859467B (en) * 2022-04-11 2023-02-17 上海交通大学 Filter based on reverse binary blazed grating and manufacturing method

Also Published As

Publication number Publication date
CN108562971B (en) 2020-04-28

Similar Documents

Publication Publication Date Title
CN108562971A (en) A kind of waveguide optical grating filter and preparation method thereof
US7973265B2 (en) Coupled optical waveguide resonators with heaters for thermo-optic control of wavelength and compound filter shape
KR100299662B1 (en) Thermo-optical variable wavelength filter manufacturing method
CN107735707A (en) For tuning the Optical devices and method of optical signalling
CN110911961B (en) Tunable narrow linewidth laser
CN103091783A (en) Tunable array waveguide grating based on liquid crystal waveguides
CN107037532A (en) Long-period waveguide grating and waveguide preparation method, optical modulator and light modulating method
CN113534504A (en) Electric control adjustable polarization beam splitting method and device based on thin-film lithium niobate
CN101210979B (en) Photon crystal tunable filter and its manufacture method
US9091807B2 (en) Compact tunable photonic crystal nanobeam cavity with low power consumption
JP4638749B2 (en) Thermo-optic phase modulator and manufacturing method thereof
US20030056546A1 (en) Photonic crystal materials and devices
US6807349B2 (en) Planer waveguide and method of formation
JP2001021930A (en) Thermooptical switch, manufacture thereof and optical line changing method using the switch
JP2003228031A (en) Optical circuit component
JPH0534525A (en) Optical circuit
JP2848144B2 (en) Tunable optical filter
CN211348702U (en) Micro-ring integrated arrayed waveguide grating wavelength division multiplexer
Manganelli et al. Low-power-consumption integrated tunable filters for WDM switching applications in silicon photonics
JP4267888B2 (en) OPTICAL CIRCUIT, OPTICAL CIRCUIT DEVICE, AND OPTICAL CIRCUIT MANUFACTURING METHOD
JP2004325536A (en) Nonlinear optical device
CN116520486B (en) Reconfigurable wavelength division multiplexer and preparation method thereof
JP4052082B2 (en) Demultiplexer and optical switching device using the same
CN104714311A (en) MEMS thermo-optic tunable filter with low optical loss
JP2008165014A (en) Quartz-based optical waveguide and manufacturing method for the same

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant