CN108550606B - Display screen manufacturing method, display screen and mobile terminal - Google Patents
Display screen manufacturing method, display screen and mobile terminal Download PDFInfo
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- CN108550606B CN108550606B CN201810404720.2A CN201810404720A CN108550606B CN 108550606 B CN108550606 B CN 108550606B CN 201810404720 A CN201810404720 A CN 201810404720A CN 108550606 B CN108550606 B CN 108550606B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
Abstract
The invention provides a manufacturing method of a display screen, the display screen and a mobile terminal, and solves the problem that an AMOLED screen is poor in display easily due to the fact that an organic light emitting layer absorbs light to emit light under illumination to generate a fluorescence effect. The display screen of the present invention includes: the pixel unit comprises a substrate and an anode region positioned on the substrate; a light shielding layer located between the substrate and the anode region. The light shielding layer is arranged between the light source and the organic light emitting layer of the pixel unit, and can be used for irradiating the light emitted by the light source of the shielding display screen to the effective organic light emitting layer, so that the organic light emitting layer can be prevented from absorbing light to generate fluorescence effect light emission, the problem of poor display is avoided, the light shielding layer is arranged in the pixel unit, the light shielding layer is not required to be arranged outside the pixel unit, less assembly space can be occupied, the appearance change of the pixel unit is not required to be considered when the pixel unit is integrally assembled with other circuits, and the subsequent circuit integration and assembly are facilitated.
Description
Technical Field
The invention relates to the technical field of electronic application, in particular to a manufacturing method of a display screen, the display screen and a mobile terminal.
Background
At present, a screen of a mobile phone enters a full screen from a non-full screen, in the non-full screen mobile phone, a Light Emitting lamp, a camera, a Light Emitting Diode (LED) lamp and the like on the mobile phone are all arranged on the periphery of the screen, in the full screen mobile phone, the screen occupies most area of the front of the mobile phone, and the Light Emitting lamp, the LED lamp, the camera and the like on the mobile phone are arranged below the screen. Light of each wave band including visible light emitted by the lamp below the screen needs to pass through the screen to be emitted, and in addition, external light needs to pass through the screen to be received by equipment such as a camera and an optical sensor. The Light includes visible Light, infrared Light, and X-ray, etc. passing through the pixels of an Active Matrix/Organic Light emitting diode (AMOLED). The AMOLED pixel design comprises a low-temperature polysilicon TFT (LTPS TFT) pixel driving circuit part and an Organic Light-Emitting Diode (OLED part for short), wherein the path of Light passing through the pixel is mainly 1, a gap region which is not shielded by metal wires in the pixel is passed through, and 2, the Organic Light-Emitting Diode has certain Light transmittance and penetrates through the LED region.
The AMOLED screen manufactured by the existing design and process will have the following problems when light including visible light passes through the screen from below the screen: the organic light emitting layer absorbs light to generate fluorescence effect light emission, so that poor display of the AMOLED screen occurs.
Disclosure of Invention
The invention aims to provide a manufacturing method of a display screen, the display screen and a mobile terminal, and aims to solve the problem that an AMOLED screen is poor in display due to the fact that an organic light emitting layer absorbs light to emit light under illumination and generate fluorescence effect.
In order to solve the technical problem, the invention is realized as follows:
in a first aspect, an embodiment of the present invention provides a display screen, including:
a pixel unit including a substrate and an anode region on the substrate;
a light-shielding layer between the substrate and the anode region.
In a second aspect, an embodiment of the present invention further provides a method for manufacturing a display screen, including:
forming a light-shielding layer between the substrate and the anode region of the pixel unit;
wherein the anode region is located on the substrate.
In a third aspect, an embodiment of the present invention further provides a mobile terminal, including the display screen as described above.
In the embodiment of the invention, the light shielding layer is arranged between the substrate and the anode region of the pixel unit and can be used for shielding the light emitted by the light source of the display screen from irradiating the effective organic light-emitting layer, so that the organic light-emitting layer can be prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
Drawings
FIG. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention;
FIG. 2 is a second schematic structural diagram of a display panel according to an embodiment of the present invention;
FIG. 3 is a third schematic structural diagram of a display panel according to an embodiment of the present invention;
FIG. 4 is a flowchart of a method for manufacturing a display screen according to an embodiment of the present invention;
fig. 5 is a schematic structural diagram obtained in step S1 of the method for manufacturing a display screen according to the embodiment of the present invention;
fig. 6 is a schematic structural diagram obtained in step S2 of the method for manufacturing a display screen according to the embodiment of the present invention;
fig. 7 is a schematic structural diagram obtained in step S3 of the method for manufacturing a display screen according to the embodiment of the present invention;
fig. 8 is a schematic structural diagram obtained in step S4 of the method for manufacturing a display screen according to the embodiment of the present invention;
fig. 9 is a schematic structural diagram obtained in step S5 of the method for manufacturing a display screen according to the embodiment of the present invention;
fig. 10 is a schematic structural diagram obtained in step S6 of the method for manufacturing a display screen according to the embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a display screen, including:
a pixel unit including a substrate and an anode region on the substrate;
a light-shielding layer between the substrate and the anode region.
Here, the substrate may be glass or flexible polyimide PI, and the light shielding layer may include a Gate2 electrode layer in a pixel unit or a Gate2 electrode layer and an M2 source drain electrode layer in a pixel unit.
In the embodiment of the invention, the light shielding layer is arranged in the pixel unit, the light shielding layer does not need to be arranged outside the pixel unit, less assembly space can be occupied, and the change of the appearance of the pixel unit does not need to be considered when the pixel unit is integrally assembled with other circuits, so that the subsequent circuit integration and assembly are facilitated.
Further, the pixel unit further includes: an organic light emitting layer over the anode region; the light shading layer is used for shading the irradiation of light emitted by a light source of the display screen on the effective organic light emitting layer; wherein the effective organic light emitting layer is a portion of the organic light emitting layer that is in contact with the anode region.
The light shielding layer is positioned between the anode region and the substrate, and can shield the irradiation of light to the effective organic light emitting layer, prevent the organic light emitting layer from absorbing the light to generate fluorescence effect light emission, and avoid the problem of poor display. For example, the light shielding layer may be located on a lower surface of the anode region.
As shown in fig. 1, the pixel unit includes: a substrate 2; an anode region 11, an organic light emitting layer 12 on the anode region 11, and a cathode region 13 on the organic light emitting layer 12, wherein a portion of the organic light emitting layer 12 is in contact with the anode region 11; the light source of the display screen may specifically include: the first LED, the second LED and the third LED are all positioned below the substrate, and light emitted by the light source enters the shading layer.
The coverage range of the orthographic projection area of the light shielding layer on the effective organic light emitting layer is larger than or equal to the coverage range of the effective organic light emitting layer. The orthographic projection area refers to a projection area when light rays emitted by a light source of the display screen are perpendicular to the effective organic light-emitting layer.
The coverage range of the orthographic projection area of the light shielding layer on the effective organic light emitting layer is larger than or equal to that of the effective organic light emitting layer, so that the light shielding layer can completely shield the irradiation of light rays on the effective organic light emitting layer, the organic light emitting layer is prevented from absorbing light rays to generate fluorescence effect light emission, and the problem of poor display is avoided.
As a first alternative implementation, as shown in fig. 1, the light-shielding layer includes:
a first gate electrode layer 31 and a metal layer 32 disposed between the substrate 2 and the anode region 11;
wherein, the coverage of the combined projection area of the first gate electrode layer 31 and the metal layer 32 on the organic light-emitting layer 12 is greater than or equal to the coverage of the effective organic light-emitting layer 12;
the combined projected area includes an orthographic projected area of the first gate electrode layer 31 on the organic light emitting layer 12 and an orthographic projected area of the metal layer on the organic light emitting layer 12.
The first Gate electrode layer 31 in this implementation is specifically a Gate2 electrode layer in a pixel unit, and the metal layer 32 is specifically an M2 source/drain electrode layer in the pixel unit.
In the implementation mode, the light shielding layer is formed by combining the Gate2 electrode layer and the M2 source and drain electrode layer to shield the organic light emitting layer, so that the organic light emitting layer is prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
In this implementation, as shown in fig. 1, the pixel unit further includes: a second gate electrode layer 33 disposed between the substrate 2 and the first gate electrode layer 31.
The second gate electrode layer 33 and the first gate electrode layer 31 form a storage capacitor.
In addition, as shown in fig. 1, in this implementation, the pixel unit further includes:
a polysilicon layer 35 located between the second gate electrode layer 33 and the substrate 2;
a buffer layer 37 between the polysilicon layer 35 and the substrate 2.
Here, the metal layer 32(M2 source-drain electrode layer) is connected to the polysilicon layer 35 and the anode region 11, respectively.
In this implementation, on the basis of the existing pixel unit, the length of the Gate2 electrode layer disposed under the organic light emitting layer is extended, so that the coverage of the orthographic projection area on the organic light emitting layer is larger than that of the effective organic light emitting layer in the combination of the Gate2 electrode layer under the effective organic light emitting layer area and other metal layers, such as the M2 source/drain electrode layer, and thus, when the light source of the display screen irradiates, the Gate2 layer and other metal layers effectively shield the effective OLED area. In addition, the gate2 layer can shield the effective organic OLED layer by combining with the vertical projection of other metal layers such as gate1 on the effective OLED layer.
Under certain illumination intensity of certain wavelength light, for example, the visible light is 3000cd/m2Under the luminance, the TFT characteristic is hardly influenced, but the organic light-emitting layer is influenced by long-term illumination, and the problem of poor display caused by illumination of the organic light-emitting layer can be improved without increasing the light shielding layer.
As a second alternative implementation, as shown in fig. 2 and 3, the light-shielding layer includes:
the third gate electrode layer 34;
the pixel unit further includes:
a polysilicon layer 35 and a metal layer 32 between the substrate 2 and the anode region 11, the metal layer 32 being located above the polysilicon layer 35;
the third gate electrode layer 34 is located between the substrate 2 and the polysilicon layer 35;
wherein the coverage of the combined projection area of the third gate electrode layer 34 and the metal layer 32 on the organic light-emitting layer 12 is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of the third gate electrode layer 34 on the organic light-emitting layer 12 and an orthographic projection area of the metal layer on the organic light-emitting layer;
alternatively, the coverage of the orthographic projection area of the third gate electrode layer 34 on the organic light-emitting layer 12 is greater than or equal to the coverage of the effective organic light-emitting layer.
In this embodiment, the third Gate electrode layer 34 is a Gate2 electrode layer, and the metal layer 32 is an M2 source/drain electrode layer.
As shown in fig. 2, the coverage of the combined projection area of the third gate electrode layer 34 and the metal layer 32 on the organic light emitting layer is greater than or equal to the coverage of the effective organic light emitting layer, and in this case, the metal layer 32 is used as a light shielding layer in addition to the light shielding layer of the third gate electrode layer 34. As shown in fig. 3, the coverage of the orthographic projection area of the third gate electrode layer 34 on the organic light-emitting layer 12 is greater than or equal to the coverage of the effective organic light-emitting layer, and in this case, only the third gate electrode layer 34 is used as a light-shielding layer.
In this implementation, as shown in fig. 2 and 3, the pixel unit further includes: a fourth gate electrode layer 36 located between the polysilicon layer 35 and the anode region 11; and a buffer layer 37 between the polysilicon layer 35 and the substrate 2;
the third gate electrode layer 34 is located in the buffer layer 37.
As shown in fig. 3, the Gate2 electrode layer is disposed on the substrate as a light-shielding layer, and the polysilicon layer and the Gate (including Gate1 and Gate2) form a capacitor C1, the polysilicon layer and the Gate1 form a capacitor C2, and C1 and C2 form a storage capacitor of the circuit.
In this implementation, the Gate2 electrode layer is disposed on the substrate material as the first layer for light shielding, and is used as the Gate2 layer, and some of the modules of Gate2 are electrically connected to the outside. The Gate2 electrode layer may be combined with a metal layer to serve as a barrier layer for the organic light emitting layer and also to serve as a light blocking layer for the TFT channel.
According to the display screen provided by the embodiment of the invention, the light shielding layer is arranged between the substrate and the anode region of the pixel unit, and the light shielding layer can be used for shielding the light emitted by the light source of the display screen to irradiate the effective organic light emitting layer, so that the organic light emitting layer can be prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
The embodiment of the present invention further provides a method for manufacturing a display screen, as shown in fig. 4, the method includes:
step 401: a pixel cell is provided.
The pixel unit is a pixel unit of a display screen.
Step 402: forming a light-shielding layer between the substrate and the anode region of the pixel unit; wherein the anode region is located on the substrate.
The light shading layer is used for shading the irradiation of light emitted by a light source of the display screen on the effective organic light emitting layer; the effective organic light-emitting layer is a part of the organic light-emitting layer of the pixel unit, which is in contact with the anode region; the organic light emitting layer is positioned above the anode region.
As shown in fig. 1, the pixel unit includes: a substrate 2; an anode region 11, an organic light emitting layer 12 on the anode region 11, and a cathode region 13 on the organic light emitting layer 12, wherein a portion of the organic light emitting layer 12 is in contact with the anode region 11; the light source of the display screen may specifically include: the first LED, the second LED and the third LED are all positioned below the substrate, and light emitted by a light source of the display screen enters the shading layer.
In the embodiment of the invention, the light shielding layer is arranged between the light source of the display screen and the organic light emitting layer, and the light shielding layer can shield the light emitted by the light source of the display screen from irradiating the effective organic light emitting layer, so that the organic light emitting layer can be prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
Wherein, the coverage of the orthographic projection area of the light shielding layer on the effective organic light emitting layer is larger than or equal to the coverage of the effective organic light emitting layer. The orthographic projection area refers to a projection area when light rays emitted by the light source are perpendicular to the effective organic light-emitting layer.
The coverage range of the orthographic projection area of the light shielding layer on the effective organic light emitting layer is larger than or equal to that of the effective organic light emitting layer, so that the light shielding layer can completely shield the irradiation of light rays on the effective organic light emitting layer, the organic light emitting layer is prevented from absorbing light rays to generate fluorescence effect light emission, and the problem of poor display is avoided.
As a first optional implementation manner, the step of forming a light shielding layer between the substrate of the pixel unit and the anode region in step 402 includes:
sequentially arranging a second grid electrode layer, a first grid electrode layer and a metal layer on the substrate;
wherein the coverage of the combined projection area of the first gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of the first grid electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer.
In the method for manufacturing a display panel, it is necessary to form the organic light emitting layer, the anode region and the cathode region after forming the light shielding layer.
The following describes a specific implementation flow of this implementation.
The implementation process comprises the following steps:
step S1: a buffer layer 37 of SiOx material is formed to a thickness of about 300nm on a substrate 2 of glass or flexible polyimide PI material, an amorphous silicon layer having a thickness of about 50nm is formed on the buffer layer 37 by chemical vapor deposition, and a polysilicon layer 35 is formed by laser annealing, thereby obtaining the structure shown in fig. 5.
Step S2: a SiOx film layer with a thickness of about 60nm and a SiNx film layer with a thickness of about 60nm are chemically vapor-deposited on the polysilicon pattern to obtain a first gate insulating layer 4, then a Mo metal layer with a thickness of about 200nm is physically vapor-deposited to obtain a second gate electrode layer 33, a mask plate designed by gate1 pixel layout is used, and a gate1 gate 331 patterning process is completed by using the processes of photolithography, etching and photoresist removal to obtain the structure shown in fig. 6.
Step S3: on the basis, SiNx with the thickness of about 130nm is deposited to serve as a second gate insulating layer 5, then a Mo metal layer with the thickness of about 250nm is physically vapor deposited to serve as a first gate electrode layer 31, and the gate2 gate 311 patterning process is completed through photoetching, developing, etching and photoresist removing processes, so that the structure shown in FIG. 7 is obtained.
Step S4: SiN with a thickness of about 250nm and SiOx with a thickness of about 300nm are deposited by chemical vapor deposition to form the interlayer insulating layer 6, and the patterning process of opening the interlayer insulating layer is completed, so as to form the first Via 61, i.e., Via1, thereby obtaining the structure shown in FIG. 8.
Step S5: and (3) carrying out physical vapor deposition on an M2 metal layer with the thickness of 50nm Ti, 500nm Al and 100nm Ti, and finishing the patterning process of the M2 source and drain electrode layer, namely the metal layer 32, by utilizing the pattern designed by the layout, so as to obtain the structure shown in FIG. 9.
Step S6: by using a pattern mask designed by layout, a second Via hole 71, namely Via2, is formed by using a photolithography technique on the planarized organic film layer 7 with a thickness of about 1.5 μm manufactured by a coating process for electrical connection, resulting in the structure shown in fig. 10.
Step S7: carrying out physical vapor deposition on an ITO film layer with the thickness of about 50nm, an Ag film layer with the thickness of 15nm and an ITO film layer of a pixel electrode with the thickness of 50nm, finishing the patterning process, and manufacturing an anode to obtain an anode region 11; coating a transparent organic film layer with the thickness of about 1.5 mu m as a pixel defining layer 8 to finish the patterning process; coating an organic film layer with the thickness of about 1.5 mu m, finishing the patterning process, manufacturing a support pillar 9, and when the screen is pressed, supporting the pressing to avoid the pressing of the packaging glass to the pixel film layer; according to the mask of the metal grid manufactured by the layout design, an OLED organic layer is evaporated on the exposed anode region of the pixel defining layer by using a thermal evaporation method to obtain an organic light-emitting layer 12; by means of thermal evaporation, metal Mg, Ag alloy is evaporated onto the organic layer as a cathode, resulting in a cathode region 13, and finally the structure shown in fig. 1 is obtained.
In the implementation mode, the light shielding layer is formed by combining the Gate2 electrode layer and the M2 source and drain electrode layer to shield the organic light emitting layer, so that the organic light emitting layer is prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
As a second optional implementation manner, the step 401 of forming a light-shielding layer between the substrate and the anode region of the pixel unit includes:
sequentially arranging a third gate electrode layer, a polycrystalline silicon layer, a fourth gate electrode layer and a metal layer on the substrate;
wherein the coverage of the combined projection area of the third gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of a third gate electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer;
or the coverage range of the orthographic projection area of the third gate electrode layer on the organic light-emitting layer is larger than or equal to the coverage range of the effective organic light-emitting layer.
The third Gate electrode layer is a Gate2 electrode layer, and the metal layer is an M2 source/drain electrode layer. As shown in fig. 2, the coverage of the combined projection area of the third gate electrode layer 34 and the metal layer 32 on the organic light emitting layer is greater than or equal to the coverage of the effective organic light emitting layer, and in this case, the metal layer 32 is used as a light shielding layer in addition to the light shielding layer of the third gate electrode layer 34. As shown in fig. 3, the coverage of the orthographic projection area of the third gate electrode layer 34 on the organic light-emitting layer 12 is greater than or equal to the coverage of the effective organic light-emitting layer, and in this case, only the third gate electrode layer 34 is used as a light-shielding layer.
The specific implementation flow in this implementation differs from the specific implementation flow of the above implementation in that the order of fabricating the third gate electrode layer, the polysilicon layer, the fourth gate electrode layer, and the metal layer is different, in which the buffer layer, the polysilicon layer, the first gate insulating layer, the second gate electrode layer (equivalent to the third gate electrode layer in this implementation), the second gate insulating layer, the first gate electrode layer (equivalent to the third gate electrode layer in this implementation), and the metal layer are sequentially fabricated in this implementation, and in this implementation, the third gate electrode layer, the buffer layer, the polysilicon layer, the first gate insulating layer, the fourth gate electrode layer, and the metal layer are sequentially fabricated.
In the implementation mode, the Gate2 electrode layer is arranged on the substrate, and the light shielding layer is formed by combining the Gate2 electrode layer and the M2 source-drain electrode layer to shield the organic light emitting layer, so that the organic light emitting layer is prevented from absorbing light to generate fluorescence effect light emission, and the problem of poor display is avoided.
In the embodiment of the present invention, the light shielding layer may be made of a light absorbing material, such as graphene or a graphite layer carbon material layer, which absorbs light, and the bottom Gate2 electrode layer is used to shield the via1 small holes on the screen, so as to prevent the small holes from scattering light under light irradiation.
The embodiment of the invention also provides a mobile terminal which comprises the display screen. In the embodiment of the present invention, the mobile terminal includes, but is not limited to, a mobile phone, a tablet computer, a notebook computer, a palm computer, a vehicle-mounted terminal, a wearable device, a pedometer, and the like.
The embodiments in the present specification are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.
While preferred embodiments of the present invention have been described, additional variations and modifications of these embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the embodiments of the invention.
Finally, it should also be noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or terminal that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or terminal. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or terminal that comprises the element.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (12)
1. A display screen, comprising:
a pixel unit including a substrate and an anode region on the substrate;
a light-shielding layer between the substrate and the anode region;
the pixel unit further includes:
an organic light emitting layer over the anode region;
the light shielding layer is used for shielding the irradiation of light emitted by the light source of the display screen on the effective organic light emitting layer, wherein the light source of the display screen is positioned below the substrate;
wherein the effective organic light emitting layer is a portion of the organic light emitting layer that is in contact with the anode region.
2. The display screen of claim 1, wherein the coverage of the orthographic projection area of the light shielding layer on the effective organic light emitting layer is greater than or equal to the coverage of the effective organic light emitting layer.
3. The display screen of claim 2, wherein the light shielding layer comprises:
a first gate electrode layer and a metal layer disposed between the substrate and the anode region;
wherein the coverage of the combined projection area of the first gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of the first grid electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer.
4. A display screen in accordance with claim 3, wherein the pixel cell further comprises:
a second gate electrode layer disposed between the substrate and the first gate electrode layer.
5. The display screen of claim 2, wherein the light shielding layer comprises: a third gate electrode layer;
the pixel unit further includes:
a polysilicon layer and a metal layer located between the substrate and the anode region, the metal layer being located above the polysilicon layer;
the third gate electrode layer is positioned between the substrate and the polycrystalline silicon layer;
wherein the coverage of the combined projection area of the third gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of a third gate electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer;
or the coverage range of the orthographic projection area of the third gate electrode layer on the organic light-emitting layer is larger than or equal to the coverage range of the effective organic light-emitting layer.
6. The display screen of claim 5, wherein the pixel cell further comprises:
a fourth gate electrode layer between the polysilicon layer and the anode region.
7. A display screen as recited in claim 5 or 6, wherein the pixel cell further comprises:
a buffer layer between the polysilicon layer and the substrate;
the third gate electrode layer is located in the buffer layer.
8. A manufacturing method of a display screen is characterized by comprising the following steps:
providing a pixel unit;
forming a light-shielding layer between the substrate and the anode region of the pixel unit;
wherein the anode region is located on the substrate;
the light shielding layer is used for shielding light emitted by a light source of the display screen from irradiating the effective organic light emitting layer, wherein the light source of the display screen is positioned below the substrate;
the effective organic light-emitting layer is a part of the organic light-emitting layer of the pixel unit, which is in contact with the anode region; the organic light emitting layer is positioned above the anode region.
9. The method as claimed in claim 8, wherein the coverage of the orthographic projection area of the light-shielding layer on the effective organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer.
10. The method of claim 9, wherein the step of forming a light-shielding layer between the substrate and the anode region of the pixel unit comprises:
sequentially arranging a second grid electrode layer, a first grid electrode layer and a metal layer on a substrate;
wherein the coverage of the combined projection area of the first gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of the first grid electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer.
11. The method of claim 9, wherein the step of forming a light-shielding layer between the substrate and the anode region of the pixel unit comprises:
sequentially arranging a third gate electrode layer, a polycrystalline silicon layer, a fourth gate electrode layer and a metal layer on the substrate;
wherein the coverage of the combined projection area of the third gate electrode layer and the metal layer on the organic light-emitting layer is greater than or equal to the coverage of the effective organic light-emitting layer;
the combined projection area comprises an orthographic projection area of a third gate electrode layer on the organic light-emitting layer and an orthographic projection area of the metal layer on the organic light-emitting layer;
or the coverage range of the orthographic projection area of the third gate electrode layer on the organic light-emitting layer is larger than or equal to the coverage range of the effective organic light-emitting layer.
12. A mobile terminal, characterized in that it comprises a display screen according to any one of claims 1-7.
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| CN109599425B (en) * | 2018-12-07 | 2020-10-30 | 武汉华星光电半导体显示技术有限公司 | OLED touch display screen and manufacturing method thereof |
| CN109950290B (en) * | 2019-04-03 | 2023-04-07 | 维沃移动通信有限公司 | AMOLED display screen, display equipment and mobile terminal |
| CN110957346B (en) * | 2019-11-29 | 2022-09-23 | 维沃移动通信有限公司 | Display module and electronic equipment |
| CN113690223B (en) * | 2021-08-11 | 2023-10-31 | 武汉华星光电半导体显示技术有限公司 | Display panel and display device |
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