CN108549198A - Across the scale minute manufacturing method of one kind - Google Patents
Across the scale minute manufacturing method of one kind Download PDFInfo
- Publication number
- CN108549198A CN108549198A CN201810288939.0A CN201810288939A CN108549198A CN 108549198 A CN108549198 A CN 108549198A CN 201810288939 A CN201810288939 A CN 201810288939A CN 108549198 A CN108549198 A CN 108549198A
- Authority
- CN
- China
- Prior art keywords
- sample surface
- pattern
- spatial light
- scale
- light modulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Abstract
The invention discloses across the scale minute manufacturing methods of one kind, belong to photoetching or 3D printing technique field, the pattern of spatial light modulator is projected on sample surface, and the mobile sample surface, so that the pattern after projection is exposed on the different location of sample surface, and then obtains required target pattern.The present invention realizes the photoetching and 3D printing across scale by the pattern of the movement and spatial light modulator of control sample surface, solves the exposure accuracy of manufacture and manufacture area（Volume）The micro-nano plus function manufacture of high-precision large scale may be implemented in the contradiction of size.
Description
Technical field
The invention belongs to photoetching or 3D printing technique field, especially a kind of across scale minute manufacturing method can be realized
Large area micro-nano rice structure fabricates, and can be widely applied for two-dimentional photoetching technique, stereo lithography
(stereolithographic) and 3D printing technique the high-precision micro-nano processing and manufacturing of large area, is realized.
Background technology
Current micro-nano processing technology all suffers from the contradiction of then precision and processing and manufacturing scale, it is difficult to take into account processing system simultaneously
Manufacturing accuracy and processing and manufacturing scale.
It is based especially on digital light processing（DLP-Digital Light Processing）Projection exposure principle, have more
Item can be used to fabricate application technology, such as mask-free photolithography technology, 3D printing technique of micro-nano device etc.；More it is faced with
Manufacture the contradiction of machining accuracy and scale.
The processing minimum precision and out to out of current mask-free photolithography technology, 3D printing technique, substantially by projection object
The multiplying power of mirror determines that high-precision necessarily brings small processing scale, when across the scale printing of needs use, generally requires and is related to spelling
It connects, piece when splicing is generally difficult to evade, and influences workmanship, or cannot achieve processing and manufacturing across scale.
Invention content
The present invention proposes a kind of across scale minute manufacturing method, realizes the photoetching and 3D printing across scale.
The invention is realized in this way：
Across the scale minute manufacturing method of one kind, the pattern of spatial light modulator is projected on sample surface, and the mobile sample
Face makes the pattern after projection be exposed on the different location of sample surface, and then obtains required target pattern.
As being further improved for invention, the pattern of the spatial light modulator is for single pixel or by arbitrary pixel group
It closes.
Further include a plurality of kinematic axis for making the sample surface movement as being further improved for invention.
As being further improved for invention, the kinematic axis includes X-axis along plane where the sample surface, Y-axis side
To mobile X kinematic axis, Y motion axis.
As being further improved for invention, the kinematic axis further includes the Z perpendicular to planar movement where the sample surface
Kinematic axis.
As being further improved for invention target figure of different shapes is obtained by controlling the movement velocity of each kinematic axis
Case.
As being further improved for invention, pass through the movement velocity of each kinematic axis, the exposure dose of light source or spatial light
The pixel number of modulator, and then the actual exposure dosage of control targe pattern.
As being further improved for invention, lighting system, the space are equipped between the light source and spatial light modulator
Projection objective is equipped between optical modulator and sample surface.
As being further improved for invention, the spatial light modulator includes DMD, LCD and LCOS.
As being further improved for invention, the sample surface includes photosensitive material and photoresist.
Compared with prior art, the beneficial effects of the invention are as follows：Movement and spatial light of the present invention by control sample surface
The pattern of modulator realizes photoetching and 3D printing across scale, solves the exposure accuracy of manufacture and manufacture area（Volume）Greatly
The micro-nano machining function manufacture of high-precision large scale may be implemented in small contradiction.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of across scale minute manufacturing method.
Fig. 2 is a kind of use schematic diagram of across scale minute manufacturing method.
Fig. 3 is a kind of use schematic diagram of across scale minute manufacturing method.
Fig. 4 is a kind of use schematic diagram of across scale minute manufacturing method.
Fig. 5 is a kind of use schematic diagram of across scale minute manufacturing method.
Fig. 6 is a kind of use schematic diagram of across scale minute manufacturing method.
Description of the drawings：1- light sources, 2- lighting systems, 3- spatial light modulators, 4- projection objectives, the pattern after 5- projections,
6- sample surfaces, 7- single pixel points, 8- maximum exposure breadths, the first pattern of 91-, second of pattern of 92-, the third pattern of 93-,
10-X kinematic axis, 20-Y kinematic axis, 30-Z kinematic axis, the triangle in the identical exposure broadbands 100-, 101- differences expose broadband
Triangle.
Specific implementation mode
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, below in conjunction with the accompanying drawings and specifically
The present invention is further described for embodiment.
The present invention discloses a kind of across scale minute manufacturing method, and the pattern of spatial light modulator is projected on sample surface,
And the mobile sample surface, so that the pattern after projection is exposed on the different location of sample surface, and then obtain required target figure
Case.
Embodiment 1
In the present embodiment, as shown in Figure 1, further including a plurality of kinematic axis for making the sample surface movement：Along the sample surface
The X-axis of place plane, X kinematic axis 10, the Y motion axis 20 of Y direction movement, and moved perpendicular to plane where the sample surface
Dynamic Z kinematic axis 30.
Further, lighting system 2, the spatial light modulator 3 are equipped between the light source 1 and spatial light modulator 3
Projection objective 4 is equipped between sample surface 6.
Further, the spatial light modulator includes DMD, LCD and LCOS.
Further, the sample surface includes photosensitive material and photoresist.
Further, spatial light modulator imaging is not limited to reflective, can be the light path of projection-type.
As shown in Figure 1, the light that light source 1 is sent out is by after lighting system 2, being incident in spatial light modulator 3, incident light
After the reflection of spatial light modulator 3, by projection objective 4, the emergent light of projection objective 4 is projected on sample surface 6, is formed and is thrown
The pattern 5 of movie queen.When X kinematic axis 10, Y motion axis 20 move, the pattern 5 after projection is exposed in 6 different location of sample surface,
And then expose different target patterns.
Embodiment 2
Further, the pattern of the spatial light modulator 3 is single pixel.Using this technical solution, minimum precision can be realized
Micro-nano processing.
As shown in Fig. 2, including single pixel point 7 of the actual exposure on sample surface, the maximum of spatial light modulator in Fig. 2
Expose breadth 8 and sample surface 6.Upon exposure, control X kinematic axis 10, Y motion axis 20 move, so that it may make actual exposure pixel
Various target patterns are realized on sample surface 6, and actual exposure precision is identical as the exposure minimum precision of single pixel point 7.
Embodiment 3
Further, the present embodiment obtains target pattern of different shapes by the movement velocity of each kinematic axis of control.
It, can be with as shown in figure 3, control X kinematic axis 10, movement velocity of the Y motion axis 20 in X, Y direction by priority
It realizes that actual exposure area is much larger than the manufacture across scale micro nano structure of spatial light modulator maximum exposure breadth, obtains such as
The target pattern of rectangle shown in Fig. 3.
As shown in figure 4, by controlling the movement velocity of X kinematic axis 10, Y motion axis 20 in X, Y direction respectively, realize
Much larger than the circular configuration that spatial light modulator exposes breadth.
Therefore, arbitrary shape under minimum precision can be realized, across ruler by controlling the movement velocity of each kinematic axis simultaneously
The manufacture of the target pattern of degree.
Embodiment 4
Difference lies in the pattern of the spatial light modulator is composed of the present embodiment arbitrary pixel with embodiment 3.
Further, pass through the movement locus of controlled motion axis, the picture of the exposure dose of light source or spatial light modulator
Prime number, and then the actual exposure dosage of control targe pattern.Using this technical solution, the target in different exposure broadbands can be obtained
Picture.
As shown in figure 5, when X axis of motion, it is exposed using the first pattern 91, after X kinematic axis stops, being changed into
Second of pattern 92, and then control the movement of Y motion axis.When X kinematic axis, Y-axis kinematic axis associated movement, the third pattern is used
93 are exposed, and obtain the triangle 100 in identical exposure broadband as shown in Figure 5.
As shown in fig. 6, being persistently exposed using the first pattern 91, pattern is not changed, it can be achieved that different exposure broadbands
Triangle 101.
Fig. 5, scheme shown in 6 can be by controlling the movement velocity of X kinematic axis, Y motion axis, and during the motion
Control targe pattern image prime number realizes control each regional exposure dosage of sample surface.
The present invention is by the way that the pattern of spatial light modulator to be projected on sample surface, and controlled motion axis mobile example position
It sets, realizes that projection pattern is exposed in sample different location, and then expose different projection patterns.For two-dimentional photoetching, the party
After the completion of case projection exposure, that is, photolithography process is completed, technological process below is similar with traditional optical technique.
For 3D printing, after the completion of the projection exposure of the program, one layer of 3D printing technique is just completed, tune can be passed through
Whole liquid level position realizes next layer of printing technology.
In the present solution, the minute manufacturing precision of photoetching and 3D printing is determined by the optical resolution of the pattern after projecting,
Fabricate area（Volume）By each kinematic axis of mobile example（Including Z kinematic axis）Stroke determine.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
All any modification, equivalent and improvement etc., should all be included in the protection scope of the present invention made by within refreshing and principle.
Claims (10)
1. a kind of across scale minute manufacturing method, which is characterized in that the pattern of spatial light modulator is projected on sample surface, and
The mobile sample surface, makes the pattern after projection be exposed on the different location of sample surface, and then obtains required target pattern.
2. across scale minute manufacturing method according to claim 1, which is characterized in that the pattern of the spatial light modulator
It is composed for single pixel or by arbitrary pixel.
3. across scale minute manufacturing method according to claim 2, which is characterized in that further include that the sample surface is made to move
A plurality of kinematic axis.
4. across scale minute manufacturing method according to claim 3, which is characterized in that the kinematic axis includes along described
X kinematic axis, the Y motion axis that the X-axis of plane, Y direction where sample surface move.
5. across scale minute manufacturing method according to claim 4, which is characterized in that the kinematic axis further include perpendicular to
The Z kinematic axis of planar movement where the sample surface.
6. according to across the scale minute manufacturing method of claim 3-5 any one of them, which is characterized in that by controlling each movement
The movement velocity of axis obtains target pattern of different shapes.
7. across scale minute manufacturing method according to claim 6, which is characterized in that by the movement for controlling each kinematic axis
The pixel number of speed, the exposure dose of light source or spatial light modulator, and then the actual exposure dosage of control targe pattern.
8. across scale minute manufacturing method according to claim 1, which is characterized in that the light source and spatial light modulator
Between be equipped with lighting system, between the spatial light modulator and sample surface be equipped with projection objective.
9. across scale minute manufacturing method according to claim 1, which is characterized in that the spatial light modulator includes
DMD, LCD and LCOS.
10. across scale minute manufacturing method according to claim 1, which is characterized in that the sample surface includes photosensitive tree
Fat material and photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810288939.0A CN108549198A (en) | 2018-03-30 | 2018-03-30 | Across the scale minute manufacturing method of one kind |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810288939.0A CN108549198A (en) | 2018-03-30 | 2018-03-30 | Across the scale minute manufacturing method of one kind |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108549198A true CN108549198A (en) | 2018-09-18 |
Family
ID=63513898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810288939.0A Pending CN108549198A (en) | 2018-03-30 | 2018-03-30 | Across the scale minute manufacturing method of one kind |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108549198A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110398881A (en) * | 2019-07-04 | 2019-11-01 | 大族激光科技产业集团股份有限公司 | Exposure device and exposure processing method |
| CN112279215A (en) * | 2020-10-16 | 2021-01-29 | 南京大学 | Micro-nano manufacturing device |
| CN112368127A (en) * | 2018-12-10 | 2021-02-12 | 深圳摩方新材科技有限公司 | Method for controlling size in projection micro-stereolithography |
| WO2021093634A1 (en) * | 2019-11-14 | 2021-05-20 | 苏州苏大维格科技集团股份有限公司 | Three-dimensional micro-nano structure photolithography system and method thereof |
| WO2021093631A1 (en) * | 2019-11-14 | 2021-05-20 | 苏州苏大维格科技集团股份有限公司 | Three-dimensional micro-nano structure photoetching system and method therefor |
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| US20060092491A1 (en) * | 2004-10-28 | 2006-05-04 | Bwt Property, Inc. | Optical pattern projection for lighting, marking and demarcation enhancement |
| RO125876B1 (en) * | 2009-02-12 | 2016-09-30 | Zoom Soft S.R.L. | Process for generating micro- and nano-structures |
| CN106707692A (en) * | 2015-07-27 | 2017-05-24 | 中国科学院理化技术研究所 | Maskless lithography system with cooperative work of trans-scale structure |
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2018
- 2018-03-30 CN CN201810288939.0A patent/CN108549198A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060092491A1 (en) * | 2004-10-28 | 2006-05-04 | Bwt Property, Inc. | Optical pattern projection for lighting, marking and demarcation enhancement |
| RO125876B1 (en) * | 2009-02-12 | 2016-09-30 | Zoom Soft S.R.L. | Process for generating micro- and nano-structures |
| CN106707692A (en) * | 2015-07-27 | 2017-05-24 | 中国科学院理化技术研究所 | Maskless lithography system with cooperative work of trans-scale structure |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112368127A (en) * | 2018-12-10 | 2021-02-12 | 深圳摩方新材科技有限公司 | Method for controlling size in projection micro-stereolithography |
| CN110398881A (en) * | 2019-07-04 | 2019-11-01 | 大族激光科技产业集团股份有限公司 | Exposure device and exposure processing method |
| CN110398881B (en) * | 2019-07-04 | 2022-01-04 | 大族激光科技产业集团股份有限公司 | Exposure apparatus and exposure processing method |
| WO2021093634A1 (en) * | 2019-11-14 | 2021-05-20 | 苏州苏大维格科技集团股份有限公司 | Three-dimensional micro-nano structure photolithography system and method thereof |
| WO2021093631A1 (en) * | 2019-11-14 | 2021-05-20 | 苏州苏大维格科技集团股份有限公司 | Three-dimensional micro-nano structure photoetching system and method therefor |
| CN112279215A (en) * | 2020-10-16 | 2021-01-29 | 南京大学 | Micro-nano manufacturing device |
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| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180918 |
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| RJ01 | Rejection of invention patent application after publication |