CN108546942A - A kind of Treatment of Metal Surface passivating solution - Google Patents
A kind of Treatment of Metal Surface passivating solution Download PDFInfo
- Publication number
- CN108546942A CN108546942A CN201810396294.2A CN201810396294A CN108546942A CN 108546942 A CN108546942 A CN 108546942A CN 201810396294 A CN201810396294 A CN 201810396294A CN 108546942 A CN108546942 A CN 108546942A
- Authority
- CN
- China
- Prior art keywords
- acid
- metal surface
- treatment
- passivating solution
- polyacid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 34
- 239000002184 metal Substances 0.000 title claims abstract description 34
- 239000002086 nanomaterial Substances 0.000 claims abstract description 25
- 239000002270 dispersing agent Substances 0.000 claims abstract description 22
- 230000004048 modification Effects 0.000 claims abstract description 15
- 238000012986 modification Methods 0.000 claims abstract description 15
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 34
- 239000002253 acid Substances 0.000 claims description 24
- 239000011734 sodium Substances 0.000 claims description 18
- 229910052708 sodium Inorganic materials 0.000 claims description 18
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 17
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 claims description 16
- 229940120146 EDTMP Drugs 0.000 claims description 15
- -1 polyoxypropylene Polymers 0.000 claims description 15
- 229920000570 polyether Polymers 0.000 claims description 13
- 239000002518 antifoaming agent Substances 0.000 claims description 12
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 6
- 229920000141 poly(maleic anhydride) Polymers 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 claims description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 4
- 239000004327 boric acid Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000003921 oil Substances 0.000 claims description 4
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 3
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 3
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 claims description 3
- 229920001083 polybutene Polymers 0.000 claims description 3
- 229920001451 polypropylene glycol Polymers 0.000 claims description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims 1
- 239000001488 sodium phosphate Substances 0.000 claims 1
- 229910000162 sodium phosphate Inorganic materials 0.000 claims 1
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 abstract description 30
- 238000005260 corrosion Methods 0.000 abstract description 14
- 230000007797 corrosion Effects 0.000 abstract description 13
- 239000000853 adhesive Substances 0.000 abstract description 7
- 230000001070 adhesive effect Effects 0.000 abstract description 7
- 238000010129 solution processing Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 63
- 229910052814 silicon oxide Inorganic materials 0.000 description 58
- 239000000243 solution Substances 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 19
- 238000004140 cleaning Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000002161 passivation Methods 0.000 description 10
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 9
- 230000032683 aging Effects 0.000 description 9
- 239000000908 ammonium hydroxide Substances 0.000 description 9
- 239000008367 deionised water Substances 0.000 description 9
- 229910021641 deionized water Inorganic materials 0.000 description 9
- 239000011259 mixed solution Substances 0.000 description 9
- 238000010189 synthetic method Methods 0.000 description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 8
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical class [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 239000013335 mesoporous material Substances 0.000 description 7
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 6
- 230000035484 reaction time Effects 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 150000003376 silicon Chemical class 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- GBQYMXVQHATSCC-UHFFFAOYSA-N 3-triethoxysilylpropanenitrile Chemical class CCO[Si](OCC)(OCC)CCC#N GBQYMXVQHATSCC-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229920002125 Sokalan® Polymers 0.000 description 3
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 239000004584 polyacrylic acid Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical group [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- 229910052799 carbon Inorganic materials 0.000 description 2
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- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004532 chromating Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
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- 230000009849 deactivation Effects 0.000 description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
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- 230000003628 erosive effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
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- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N methyl pentane Natural products CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 2
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- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 2
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- 235000002906 tartaric acid Nutrition 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
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- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical compound Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 description 1
- LLNAMUJRIZIXHF-CLFYSBASSA-N (z)-2-methyl-3-phenylprop-2-en-1-ol Chemical compound OCC(/C)=C\C1=CC=CC=C1 LLNAMUJRIZIXHF-CLFYSBASSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 1
- AURFNYPOUVLIAV-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]-2-hydroxyacetic acid Chemical compound OC(=O)C(O)N(CC(O)=O)CCN(CC(O)=O)CC(O)=O AURFNYPOUVLIAV-UHFFFAOYSA-N 0.000 description 1
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- NVTRPRFAWJGJAJ-UHFFFAOYSA-L EDTA monocalcium salt Chemical compound [Ca+2].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O NVTRPRFAWJGJAJ-UHFFFAOYSA-L 0.000 description 1
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000001994 activation Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- 229940059265 ammonium lactate Drugs 0.000 description 1
- 235000019286 ammonium lactate Nutrition 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- RZOBLYBZQXQGFY-HSHFZTNMSA-N azanium;(2r)-2-hydroxypropanoate Chemical compound [NH4+].C[C@@H](O)C([O-])=O RZOBLYBZQXQGFY-HSHFZTNMSA-N 0.000 description 1
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 150000004074 biphenyls Chemical class 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- MVWDMDKITGEAOA-UHFFFAOYSA-N ctk5i5455 Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)S([O-])(=O)=O MVWDMDKITGEAOA-UHFFFAOYSA-N 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical class NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005909 ethyl alcohol group Chemical group 0.000 description 1
- GTUVXOOHBUUGBH-UHFFFAOYSA-N furan;methanol Chemical compound OC.C=1C=COC=1 GTUVXOOHBUUGBH-UHFFFAOYSA-N 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011302 mesophase pitch Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- UQJSLVWCKFZHFO-UHFFFAOYSA-N molybdenum(4+) oxygen(2-) titanium(4+) Chemical compound [O-2].[O-2].[Ti+4].[Mo+4] UQJSLVWCKFZHFO-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- FJVZDOGVDJCCCR-UHFFFAOYSA-M potassium periodate Chemical compound [K+].[O-]I(=O)(=O)=O FJVZDOGVDJCCCR-UHFFFAOYSA-M 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 235000019394 potassium persulphate Nutrition 0.000 description 1
- VZOPRCCTKLAGPN-ZFJVMAEJSA-L potassium;sodium;(2r,3r)-2,3-dihydroxybutanedioate;tetrahydrate Chemical compound O.O.O.O.[Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O VZOPRCCTKLAGPN-ZFJVMAEJSA-L 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 229940074446 sodium potassium tartrate tetrahydrate Drugs 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- GUDPKKXDXURUSS-UHFFFAOYSA-M sodium;fluoride;hydrate Chemical compound O.[F-].[Na+] GUDPKKXDXURUSS-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- KBLZDCFTQSIIOH-UHFFFAOYSA-M tetrabutylazanium;perchlorate Chemical compound [O-]Cl(=O)(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC KBLZDCFTQSIIOH-UHFFFAOYSA-M 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 229940038773 trisodium citrate Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/12—Orthophosphates containing zinc cations
- C23C22/17—Orthophosphates containing zinc cations containing also organic acids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention relates to a kind of Treatment of Metal Surface passivating solutions, the Treatment of Metal Surface passivating solution includes the inorganic acid of the zinc nitrate of 1 20g/L, 5 40g/L, the modification meso-porous nano material of the dispersant of 5 50g/L and 1 10g/L, the modified meso-porous nano material is that poly- polyacid is grafted meso-porous nano material, and the grafting rate of the poly- polyacid is 1wt% 5wt%.After the passivating solution processing of the present invention, metal surface obtains the film layer that corrosion resistance and adhesive force can be fabulous.
Description
Technical field
The present invention relates to a kind of Treatment of Metal Surface passivating solutions.
Background technology
In an atmosphere, with oxygen, water and other impurity chemical action or electrochemical action can occur for metal under certain condition
And generate metal erosion.Metal erosion not only makes metal material itself in its shape, color and luster and mechanical properties by broken
It is bad, more important is so that the credit rating of its product is declined, accuracy and sensitivity it is impaired.Although the rust that corrosion generates
Spot can be removed from metallic matrix, but usually time-consuming and can also reduce the intensity of metal for these methods.In addition, when in metal
When surface coated polymer coating, adhesive or rubber anti-corrosive agent, the corrosion of metal surface can cause preservative coating and metal
The forfeiture of adhesive force or decrease between surface, cannot play good anti-corrosion effect.It therefore, must be to gold before coating preservative
Metal surface carries out pre-processing, just can effectively prevent metal product in transport, storage and its surface corrosion during using etc.
Occur, extends the service life of metal product.
Passivation (or conversion) processing is the common process for treating surface of metal material.Chromating is because of its obtained passivating film
It is excellent corrosion resistance, of low cost, easy to operate and be widely used.Traditional Cr VI passivation technology, although with behaviour
Make the advantages that simple, of low cost.But due to its toxicity and the implementation of European Union's WEEE, RoSH environmental system instruction（Instruction rule
It is fixed：Into in the electronic and electrical equipment of European market, it is prevented or restricted from the harmful substance being previously mentioned in being instructed using RoHS, such as
Lead, mercury, cadmium, Cr VI, polybrominated biphenyls and polybrominated diphenyl ethers）, as the substitute of sexavalence chromium passivating, the trivalent chromium of environment-friendly type is blunt
Chemical conversion is the emphasis developed, and be widely used to household electrical appliance, electronic component and auto parts and components etc..
Therefore, the passivating technique of complete Chrome-free becomes following prevailing technology.Domestic and international main chromium-free deactivation work at present
The research of skill has molybdate passivation film, silicate passivation, titanium salt passivation, rare earth alloy passivation, organic matter passivation and phytic acid passivation, but
It is that a kind of chromium-free deactivation can replace traditional chromating technique completely in production not yet.
Invention content
In order to solve the above technical problem, the present invention provides a kind of Treatment of Metal Surface passivating solution, the nitric acid of 1-20g/L
The inorganic acid of zinc, 5-40g/L, the dispersant of 5-50g/L and the modification meso-porous nano material of 1-10g/L, the modification are mesoporous
Nano material is that poly- polyacid is grafted meso-porous nano material, and the grafting rate of the poly- polyacid is 1wt%-5wt%.
The Treatment of Metal Surface passivating solution further includes the film forming accelerating of 5-50g/L.
The inorganic acid is selected from one or more of sulfuric acid, phosphoric acid, boric acid.
The dispersant is selected from calgon, aminotrimethylenephosphonic acid, ethylene diamine tetra methylene phosphonic acid sodium, hydroxy ethylidene two
One or more of phosphonic acids, diethylene triamine pentamethylene phosphonic.
The aperture of the meso-porous nano material is 2nm-30nm.
The polyacid is selected from one or more of polyacrylic acid, polybutene acid, poly, polymaleic anhydride.
The molecular weight of the polyacid is 500-1500.
The grafting rate of the poly- polyacid is 3wt%-7wt%.
The Treatment of Metal Surface passivating solution further includes the antifoaming agent of 1-10g/L, and the antifoaming agent is selected from glycerine trihydroxy
Polyethers, polyoxypropylene glyceryl, polyoxyethylene oxypropylene glycerine, the alcohol of C7-C9, one kind in polyether modified silicon oil class antifoaming agent or
It is several.
Bichromate and nitrite are free of in passivating solution of the present invention, using corrosion resistant after the metal material passivation of the passivating solution
Corrosion and adhesive force can be excellent.
The above-mentioned of the application and other features, aspect and advantage is more readily understood with reference to following detailed description.
Specific implementation mode
Unless otherwise defined, all technologies used herein and scientific terminology have and the common skill of fields of the present invention
The normally understood identical meaning of art personnel.When there is a conflict, the definition in this specification shall prevail.
A kind of Treatment of Metal Surface passivating solution, the zinc nitrate of 1-20g/L, the inorganic acid of 5-40g/L, the dispersion of 5-50g/L
The modification meso-porous nano material of agent and 1-10g/L, the modified meso-porous nano material are that poly- polyacid is grafted meso-porous nano material
The grafting rate of material, the poly- polyacid is 1wt%-5wt%.
Inorganic acid
Herein described inorganic acid can enumerate sulfuric acid, phosphoric acid, perchloric acid, metasilicic acid, boric acid, metatitanic acid, inclined ferrous acid, inclined phosphorus
Acid, metaphosphorous acid, one or more of metavanadic acid, metaperiodic acid, fluoboric acid, fluosilicic acid, it is preferable that the inorganic acid is
One or more of sulfuric acid, phosphoric acid, boric acid.
Film forming accelerating
Film forming accelerating is the substance that can shorten the Passivation Treatment time, improve quality of forming film, and herein described film forming promotes
Agent be substance and metal-chelator with oxidisability, it is specific enumerable go out ammonium vanadate, strontium chloride, hydrofluoric acid, malonic acid, grass
Acid, glutaric acid, malic acid, maleic acid, hydrogen peroxide, potassium permanganate, trisodium citrate, brown lead oxide, sodium hypochlorite, titanium dioxide
Molybdenum, Potassiumiodate, potassium metaperiodate, permanganic acid, chloric acid, chlorous acid, perchloric acid, nitrous acid, ammonium nitrate, ammonium lactate, ammonium formate, acetic acid
Ammonium, ammonium oxalate, tetrabutylammonium perchlorate, tetrabutyl ammonium nitrate, ammonium iodide, ammonium bromide, ATS (Ammonium thiosulphate), potassium peroxydisulfate, over cure
Sour sodium, ammonium persulfate, ammonium dithionate, ammonium tartrate, ammonium citrate, ammonium aluminum fluoride, ammonium metavanadate, ammonium hypophosphite, seven molybdic acids
Ammonium, ammonium fluozirconate, calcium disodium edetate, diethylene triamine pentacetic acid (DTPA), chelating carboxylic acids, Hedta, 2,2-
Bis- [two（Carboxymethyl）Amine] diethyl ether, 1,2- diamino cyclohexanes tetraacethyl, hydroxyethyl diamine triacetic acid trisodium salt, ethoxy two
Amine tetraacethyl trisodium salt, disodium ethylene diamine tetraacetate, tetrasodium ethylenediamine tetraacetate, oxalic acid, citric acid, 1,3,6- hexane tricarboxylics
Acid, tartaric acid, D-sorbite, 1,3- malonic acid, 1, 4- succinic acid, aminotriacetic acid, diethylene-triamine pentaacetic acid, ethoxy
Ethylenediamine triacetic acid, butene dioic acid, hydroxyl ethylenediaminetetraacetic acid, dihydroxy glycine, two methene phosphonate of amino, three methene of amino
One kind in phosphonate, ethylene diamine tetra methylene phosphonic acid salt, diethylene triamine pentamethylene phosphonic salt, three methene phosphoric acid of hydroxyethyl diamine
Or it is several, it is preferable that the film forming accelerating be ammonium vanadate, strontium chloride, hydrofluoric acid, malonic acid, oxalic acid, glutaric acid, malic acid,
One or more of maleic acid..
Dispersant
Dispersant of the present invention is chelated dispersants, and the chelated dispersants are a kind of organic chelates, can be with softened water
Matter has very strong sequestering power to calcium ion, magnesium ion, iron ion etc..The chelated dispersants include but not limited to amino three
Methylenephosphonic acid, ethylene diamine tetra methylene phosphonic acid sodium, 1-hydroxy ethylidene-1,1-diphosphonic acid, diethylene triamine pentamethylene phosphonic, Sodium Polyacrylate, second
The adjacent sodium of diamines two, calgon, sodium tripolyphosphate, sodium pyrophosphate, tertiary sodium phosphate, sodium citrate, gluconic acid
One or more of sodium, sodium potassium tartrate tetrahydrate, it is preferable that the chelated dispersants be calgon, aminotrimethylenephosphonic acid,
One or more of ethylene diamine tetra methylene phosphonic acid sodium, 1-hydroxy ethylidene-1,1-diphosphonic acid, diethylene triamine pentamethylene phosphonic.
Modified Nano mesoporous material
Modified meso-porous nano material of the present invention refers to being modified to meso-porous nano material with poly- polyacid, with more
Excellent ground physical and chemical performance；Meso-porous nano material of the present invention refers to the nano material in the aperture with 2-50nm；Described
Poly- polyacid refers to that more than two hydrionic substances can be ionized out in a molecule, and the molecular weight of the poly- polyacid is 500-
1500。
Meso-porous nano material of the present invention be the well-regulated periodical pore passage structure of tool, highly homogeneous aperture, compared with
The novel nano-material of big pore volume and high-specific surface area, meso-porous nano material have had both pair of mesoporous material and nano material
The features such as weight characteristic and very high chemical stability, biocompatibility, convenient and of low cost synthesis.It is of the present invention
The preferred mesoporous silicon oxide of meso-porous nano material or mesoporous carbon.
The specific surface area of mesoporous silicon oxide of the present invention is 300-2000m2/ g, porosity 60%-90.5%, institute
The specific surface area for the mesoporous carbon stated is 500-2000m2/ g, porosity 50%-99.5%.
The mesoporous silicon oxide or mesoporous carbon may be used hydrothermal synthesis method, room temperature synthetic method, phase transition method, microwave and close
The synthesis such as Cheng Fa, the precipitation method, sol-gel method, template can also be bought from the market.
Synthesis step：（a）The 2- cyanoethyl triethoxysilanes of the tetraethoxysilane of 0.1mol and 0.05mol are configured
At mixed solution.（b）Ammonium hydroxide is added in 0.03mol cetyl trimethylammonium bromides and stirs 1-2h, 50-75 °C of still aging 1-
2 days, reaction terminated that reaction solution is made, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Modification procedure：Mesoporous silicon oxide prepared by 1-3g above-mentioned steps is added in the 5-10ml concentrated sulfuric acids, 70-80 DEG C
Lower heat preservation 2-4 hours, is cooled to 60-70 DEG C, is slowly added to poly- polyacid, and addition is 0.5-1 times of mesoporous silicon oxide, instead
It is 1-3 hours between seasonable, filters, cleaning is dry to get the poly- modified by polyacid mesoporous silicon oxide, at this point, poly- polyacid
It is grafted in mesoporous silicon oxide, the grafting rate of polyacid is 1wt%-10wt%.
The mesoporous carbon can be bought from the market, can also synthesize to obtain.When synthesis, the mesoporous carbon uses hard template
Method selects carbon source presoma appropriate such as glucose, sucrose acetylene, mesophase pitch, furancarbinol, phenol/formaldehyde resins
Deng by the methods of impregnating or being vapor-deposited, being introduced into the duct of mesopore silicon oxide, make predecessor hot under acid catalysis
Carbonization is decomposed, and is deposited in the duct of template mesoporous material, silica template is dissolved away to get Jie with sodium hydroxide hydrofluoric acid
Hole carbon.Such as：6g phenol is melted under the conditions of 40-42 DEG C, is slowly added to the sodium hydroxide solution of 1.3g20wt%, is stirred
10min is allowed to dissolve, and the formalin that 10g37wt% is added dropwise continues to stir, and is to slowly warm up to 70 DEG C, reacts 1h, is cooled to room
Temperature adjusts pH to neutrality with dilute hydrochloric acid solution；Rotary distillation is depressurized at 45 DEG C, distillation time 1-2h is reduced sticky as possible
Water content in liquid obtains phenolic resin performed polymer；Obtained phenolic resin is dissolved in ethyl alcohol, the sodium chloride of precipitation is taken out
It filters out.
10gF127 is dissolved in 50g absolute ethyl alcohols, the phenolic resin performed polymer drop transparent, 50g is taken to synthesize is stirred to clarify
In the alcoholic solution for entering F127, at room temperature volatilize 8h is moved into culture dish after stirring evenly, then culture dish is placed in 100 DEG C of baking ovens
Interior solidification for 24 hours, obtains transparent thin-film material.The transparent thin-film material is taken out, is placed in tube furnace, under nitrogen protection, 800
DEG C roasting 55h, obtain meso-porous carbon material.
The experimental procedure of the modified by polyacid mesoporous carbon is：Meso-porous carbon material prepared by 3-5g above-mentioned steps is added to
In the 15ml concentrated sulfuric acids, 2-4 hours are kept the temperature at 70-80 DEG C, is cooled to 60-70 DEG C, is slowly added to polyacid, addition is mesoporous carbon
0.5-1 times, the reaction time be 1-3 hour, filter, cleaning, dry to get the modified by polyacid mesoporous carbon, at this point, polynary
In acid grafting mesoporous carbon, the grafting rate of polyacid is 1wt%-10wt%.
The one kind or several of polyacid of the present invention in polyacrylic acid, polybutene acid, poly, polymaleic anhydride
Kind, it is preferable that the polyacid selection macromolecular multi-component acid, the molecular weight of the macromolecular multi-component acid is 500-1500.
In the modified by polyacid meso-porous nano material, the aperture of the meso-porous nano material is 2nm-30nm,
The grafting rate of the poly- polyacid is 1wt%-10wt%, it is preferable that the grafting rate of the poly- polyacid is 3wt%-7wt%.Due to
During Treatment of Metal Surface, a large amount of iron ion or other metal ions enter in solution in acid condition, use
Main component of the zinc nitrate as film forming, is influenced, the film layer corrosion resistance after film forming is not high, in the prior art by iron ion
It is all made of finer and close filmogen.The present invention on mesoporous material by introducing poly- polyacid so that mesoporous material has
A large amount of hapto, mesoporous material pass through acidic treatment, and there is also a large amount of coordinating group, poly- polyacid and mesoporous materials on surface
The coordinating group on material surface can form good cooperation, and it is mesoporous to substantially increase modification for the deficiency for the complexation reaction that complements each other
The Complexing Iron of material, the ability of nickel, copper ion reduce the iron, nickel, copper ion to dissociate in solution so that film forming consistency is big
It is big to improve, obtain the film layer that corrosion resistance and adhesive force can be fabulous.
Antifoaming agent of the present invention can be grease, higher alcohols, polyethers, silicon class, polyether-modified silicon class, preferred, polyethers
Class, higher alcohols, silicone oil and mineral oils, as glycerine trihydroxy polyethers, polyoxypropylene glyceryl, polyoxyethylene oxypropylene glycerine,
More preferably, antifoaming agent of the present invention is that organic silicon antifoaming agent and polyethers change for the alcohol of C7-C9, polyether modified silicon oil class antifoaming agent
Property silicone oil antifoaming agent, the polyether modified silicon oil class antifoaming agent is to introduce polyether segment by modified on silicone oil.In silicon ether
In the molecule of copolymer, silicon segment has lipophile, polyethers section to have hydrophily.Polyethylene oxide link can provide parent in polyether segment
Aqueous and defoaming, silicone oil link can provide hydrophobicity and permeability, and number-average molecular weight is between 2000-5000.
Hereinafter, the present invention is explained in more detail by embodiment, it should be appreciated that these embodiments are only
Illustrate and not restrictive.If raw materials used to be all commercially available without other explanations.
The present invention is described in detail referring to several examples.
Modified mesoporous silicon oxide A1
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to polymaleic anhydride（Molecular weight 1000）, addition is 0.8 times of mesoporous silicon oxide in parts by weight,
Reaction time is 2 hours, is filtered, cleaning, dry to get the modified by polyacid mesoporous silicon oxide, grafting rate 5wt%.
Modified mesoporous silicon oxide A2
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to polyacrylic acid（Molecular weight 1200）, addition is 0.8 times of mesoporous silicon oxide in parts by weight, instead
It is 2 hours between seasonable, filters, cleaning is dry to get the modified by polyacid mesoporous silicon oxide, grafting rate 4wt%.
Modified mesoporous silicon oxide A3
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to benzoic acid, addition is 0.8 times of mesoporous silicon oxide in parts by weight, and the reaction time is 2 hours,
Filtering, cleaning are dry to get the modified mesoporous silicon oxide of the acid, grafting rate 5wt%.
Modified mesoporous silicon oxide A4
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to maleic anhydride, addition is 0.8 times of mesoporous silicon oxide in parts by weight, and the reaction time is 2 small
When, it filters, cleaning, it is dry to get the modified mesoporous silicon oxide of the acid, grafting rate 6wt%.
Modified mesoporous silicon oxide A5
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to polymaleic anhydride（Molecular weight 3000）, addition is 0.8 times of mesoporous silicon oxide in parts by weight,
Reaction time is 2 hours, is filtered, cleaning, dry to get the modified mesoporous silicon oxide of the acid, grafting rate 6wt%.
Modified mesoporous silicon oxide A6
The synthetic method of mesoporous silicon oxide is：（a）By three second of 2- cyanoethyls of the tetraethoxysilane of 0.1mol and 0.05mol
Oxysilane is configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides be added ammonium hydroxide stir 1.5h, 60 °C
Still aging reaction terminates that reaction solution is made for 24 hours, dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Mesoporous silicon oxide prepared by 2g above-mentioned steps is added in the 8ml concentrated sulfuric acids, 3 hours are kept the temperature at 80 DEG C, is cooled down
To 60 DEG C, it is slowly added to tartaric acid, addition is 0.8 times of mesoporous silicon oxide in parts by weight, and the reaction time is 2 hours,
Filtering, cleaning are dry to get the modified mesoporous silicon oxide of the acid, grafting rate 4wt%.
Embodiment 1
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A1 of 5g/L.
Embodiment 2
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A2 of 5g/L.
Embodiment 3
Passivating solution forms：The zinc nitrate of 20g/L, the phosphoric acid of 30g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 40g/L and
The modification mesoporous silicon oxide A2 of 5g/L.
Comparative example 1
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A3 of 5g/L.
Comparative example 2
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A4 of 5g/L.
Comparative example 3
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A5 of 5g/L.
Comparative example 4
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The modification mesoporous silicon oxide A6 of 5g/L.
Comparative example 5
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The mesoporous silicon oxide of 5g/L.The synthetic method of mesoporous silicon oxide is：（a）By the tetraethoxysilane of 0.1mol with
The 2- cyanoethyl triethoxysilanes of 0.05mol are configured to mixed solution；（b）By 0.03mol cetyl trimethylammonium bromides
Ammonium hydroxide is added and stirs 1.5h, 60 °C still aging, and reaction terminates that reaction solution is made for 24 hours, dry with deionized water eccentric cleaning,
Up to mesoporous silicon oxide.
Comparative example 6
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The mesoporous silicon oxide of 4.8g/L, the polymaleic anhydride of 0.25g/L（Molecular weight 1000）.The synthetic method of mesoporous silicon oxide
For：（a）The 2- cyanoethyl triethoxysilanes of the tetraethoxysilane of 0.1mol and 0.05mol are configured to mixed solution；（b）
Ammonium hydroxide is added in 0.03mol cetyl trimethylammonium bromides and stirs 1.5h, 60 °C it is still aging for 24 hours, reaction terminates to be made anti-
Liquid is answered, it is dry to get mesoporous silicon oxide with deionized water eccentric cleaning.
Comparative example 7
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L and
The silica of 4.8g/L.
Comparative example 8
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L, the dispersant ethylene diamine tetra methylene phosphonic acid sodium of 30g/L.
Comparative example 9
Passivating solution forms：The zinc nitrate of 10g/L, the phosphoric acid of 20g/L.
Evaluation method：
One layer of metallic nickel is plated after taking the three-dimension mobile phone antenna workpiece after 5PCS laser activations, surface to plate copper, 3 points of washing at once
Then clock is respectively put into the passivating solution of embodiment and comparative example and impregnates 10min, each passivating solution temperature is 35 DEG C.After dipping
2min is washed, is dried immediately.
Passivating film adhesive force is tested：It is measured by GB9791-88.With no sand rubber strip with certain pressure come
Friction 10 times is returned, film layer, which is not worn, to fall off for qualification.
Neutral salt spray test：With the corrosion resistance of salt-fog resistant test Time evaluation passivating film, evaluation index is that experiment starts
Occurs the time of white corrosion product to sample.Neutral salt spray test (NSS) is carried out by GB/T6458-86.Laboratory apparatus is nothing
The salt-mist corrosion tester of tin city Xi Hua testing equipments Co., Ltd production.Experimental solutions：5% (mass fraction) NaCl solution；
Mode：Continuous spraying；pH：6.5~7.2；Test piece placed angle：15°；Experimental temperature：(35±2)℃；Settling amount：1~2mL/
(80cm2·h)。
As can be seen that after the passivating solution processing of the present invention, metal surface obtains corrosion resistance and adhesive force can be fabulous
Film layer.
The foregoing is only a preferred embodiment of the present invention, is not intended to limit the scope of the present invention.It is every
The equivalent changes and modifications done according to the content of present invention are encompassed by the scope of the claims of the present invention.
Claims (9)
1. a kind of Treatment of Metal Surface passivating solution, which is characterized in that the Treatment of Metal Surface passivating solution includes the nitre of 1-20g/L
The inorganic acid of sour zinc, 5-40g/L, the dispersant of 5-50g/L and the modification meso-porous nano material of 1-10g/L, modified Jie
Hole nano material is that poly- polyacid is grafted meso-porous nano material, and the grafting rate of the poly- polyacid is 1wt%-5wt%.
2. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the Treatment of Metal Surface is blunt
Change the film forming accelerating that liquid further includes 5-50g/L.
3. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the inorganic acid is selected from sulphur
One or more of acid, phosphoric acid, boric acid.
4. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the dispersant is selected from six partially
Sodium phosphate, aminotrimethylenephosphonic acid, ethylene diamine tetra methylene phosphonic acid sodium, 1-hydroxy ethylidene-1,1-diphosphonic acid, diethylene triamine pentamethylene phosphonic
One or more of.
5. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the meso-porous nano material
Aperture be 2nm-30nm.
6. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the polyacid is selected from poly- third
One or more of olefin(e) acid, polybutene acid, poly, polymaleic anhydride.
7. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the molecular weight of the polyacid
For 500-1500.
8. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the grafting rate of the polyacid
For 3wt%-7wt%.
9. a kind of Treatment of Metal Surface passivating solution according to claim 1, which is characterized in that the Treatment of Metal Surface is blunt
Change the antifoaming agent that liquid further includes 1-10g/L, the antifoaming agent is selected from glycerine trihydroxy polyethers, polyoxypropylene glyceryl, polyoxyethylene
One or more of oxypropylene glycerine, the alcohol of C7-C9, polyether modified silicon oil class antifoaming agent.
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| CN111455365A (en) * | 2020-06-02 | 2020-07-28 | 德锡化学(山东)有限公司 | Environment-friendly trivalent chromium cobalt-free color passivation solution for zinc layer and passivation process |
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| CN112522704A (en) * | 2020-11-27 | 2021-03-19 | 安徽吉利电气设备有限公司 | Corrosion prevention method for stainless steel outdoor power cabinet |
| CN114134493A (en) * | 2021-11-23 | 2022-03-04 | 沈阳加克科技有限公司 | Metal surface passivation solution |
| CN114086168A (en) * | 2021-11-26 | 2022-02-25 | 山西汾西重工有限责任公司 | Passivation solution and preparation method of colorful passivation film |
| CN114703470A (en) * | 2022-03-10 | 2022-07-05 | 福建宏贯路桥防腐科技股份有限公司 | Environment-friendly passivation solution and passivation process for metal component |
| CN115044895A (en) * | 2022-05-12 | 2022-09-13 | 华南理工大学 | Corrosion-resistant phosphating solution using enalapril maleate and preparation method and application thereof |
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