CN108517565A - Crucible process system - Google Patents
Crucible process system Download PDFInfo
- Publication number
- CN108517565A CN108517565A CN201810400375.5A CN201810400375A CN108517565A CN 108517565 A CN108517565 A CN 108517565A CN 201810400375 A CN201810400375 A CN 201810400375A CN 108517565 A CN108517565 A CN 108517565A
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- China
- Prior art keywords
- crucible
- main body
- fixed
- ring stand
- process system
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- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 49
- 230000008569 process Effects 0.000 title claims abstract description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000010453 quartz Substances 0.000 claims abstract description 50
- 230000001590 oxidative effect Effects 0.000 claims abstract description 32
- 239000002826 coolant Substances 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- 239000003708 ampul Substances 0.000 claims description 22
- 239000000498 cooling water Substances 0.000 claims description 15
- 241001442589 Convoluta Species 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 9
- 239000002937 thermal insulation foam Substances 0.000 claims description 5
- 230000003471 anti-radiation Effects 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 abstract description 17
- 238000007254 oxidation reaction Methods 0.000 abstract description 17
- 238000005265 energy consumption Methods 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 12
- 230000000007 visual effect Effects 0.000 description 12
- 230000006872 improvement Effects 0.000 description 9
- 238000001816 cooling Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006213 oxygenation reaction Methods 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 206010020843 Hyperthermia Diseases 0.000 description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 229910052571 earthenware Inorganic materials 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 230000036031 hyperthermia Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The present invention relates to a kind of crucible process systems, it includes a vertical baking oxidative system and the mechanical grabbing system for installing or splitting vertical baking oxidative system, vertical baking oxidative system includes a furnace body, the insulating layer being coated on outside furnace body, the tripod assembly being fixed in furnace body, a quartz tube heater for heating, for closed furnace body and the coolant seal connector for gripping quartz tube heater and the shell outside insulating layer, mechanical grabbing system includes a manipulator, one vertical lifting device, one horizontally moving device and a pair of guide rails, manipulator is fixed on vertical lifting device, vertical lifting device can be moved horizontally along horizontally moving device, the horizontally moving device can be slided along guide rail.This crucible process system, compared to the prior art, can reduce energy consumption, film forming uniformly, booster probability reduce, and mechanical automation degree is high, can also reduce the risk that oxidation film is abraded in transfer process.
Description
Technical field
The present invention relates to semi-conducting material preparation field more particularly to a kind of crucible process systems.
Background technology
In semi-conducting material preparation process, PBN crucibles are a kind of important parts, qualified PBN crucibles need through
The process of baking oxidation is gone through, CN206927963U is improved in the prior art, by high-temperature baking in burner hearth and is taken out true
Empty real shows crucible dehydration, by the way that persistently the oxidation to PBN crucible inside and outside wall boron nitride is realized in oxygenation under the conditions of 880 ~ 980 DEG C,
The crucible internal walls oxidation film of formation contributes to during GaAs, indium phosphide long monocrystalline, with improve fluid-tight boron oxide to PBN
The wettability of crucible internal walls, to improve crystal growth yields.
However the device still has following not foot point.
1, energy loss is big：The equipment is persistently oxygenated in 880 ~ 980 DEG C of high temperature, and normal temperature state oxygen continues with about 0.1 ~
The pressure of 0.55 MPa is oxygenated into furnace body, and the temperature difference is big, and causing oxygen to consume, big, energy loss is big.
2, crucible internal walls thermal oxide is insufficient：The equipment is since PBN crucibles lie down, 12 from furnace body heater strips of PBN crucibles
Non-equidistant, the thermal field residing for PBN crucibles differ greatly；Simultaneously in the case where the external world continues oxygenation, hot and cold gas are in high temperature action
It is lower to form rambling turbulent flow, in some instances it may even be possible to because reaction temperature is insufficient or oxygen pressure not enough cause PBN crucible internal walls part not by
Oxidation.Eventually lead to two influences：One is boron oxide wettability deficiency forms heteronuclear contraction crystalline substance in crystal growth technique, to crystal
Growth yields adversely affects；The second is the PBN crucibles of the technique are since oxide thickness is not uniform enough, crystal growth is complete
The degree of Cheng Hou, PBN crucible internal walls boron nitride demoulding absciss layer differs, and reduces the service life of PBN crucibles.
3, easily there is cooling line connector booster phenomenon：Existing cooling device design aspect is because cooling water sandwich is relatively thin, greatly
About 2cm, under the conduction of heat of 880 ~ 980 DEG C of hyperthermia radiations and quartz glass tube, cooling flow is relatively small, in clamp
Cooling water in cavity can boil rapidly at a temperature of 100 ~ 300 DEG C, and cavity air gap pressure increased dramatically, and lead to cooling tube
Pipeline connector bursts, and baking aerobic process terminates.
4, lie down equipment baking after the completion of to stretch into quartz ampoule take out oxidation after PBN, during taking-up with PBN crucibles
Inner wall contact has the risk of scratch oxidation boron film, and subsequently GaAs wettability not enough causes heteronuclear contraction brilliant when long monocrystalline.
The device is improved based on the oxygenation mode to vacuum bakeout machine, and the baking method for oxidation which is provided is still
There are drawbacks described above, therefore, it is necessary to design a kind of new system or device to solve the above technical problems.
Invention content
It is an object of the invention to overcome above-mentioned technical problem, a kind of high degree of automation is proposed, using high temperature static pressure oxygen
Change method handles the crucible process system of crucible.
To realize that foregoing purpose, the present invention adopt the following technical scheme that：A kind of crucible process system comprising a vertical baking
Bake oxidative system and the mechanical grabbing system for installing or splitting vertical baking oxidative system, the vertical baking oxidation
System includes a furnace body, is coated on outside furnace body a insulating layer, the tripod assembly being fixed in furnace body, for heating one
Quartz tube heater, for closed furnace body and grip quartz tube heater a coolant seal connector and be set to insulating layer
An outer shell, the mechanical grabbing system include a manipulator, a vertical lifting device, a horizontally moving device and a pair
Guide rail, the manipulator are fixed on vertical lifting device, and the vertical lifting device can be along horizontally moving device level
Mobile, the horizontally moving device can be slided along guide rail.
As a further improvement on the present invention, if the tripod assembly includes a chassis, is perpendicularly fixed on chassis
Dry tripod, one first handle for being perpendicularly fixed at center chassis, the chassis are fixed on by a crucible locking bolt in furnace body.
As a further improvement on the present invention, each tripod includes a support shank, one first ring stand, one second ring stand,
First ring stand, the equal level of the second ring stand are fixed on the side of support shank, and the inner ring radius of first ring stand is more than second
The inner ring radius of ring stand, the first ring stand are located at the top of the second ring stand.
As a further improvement on the present invention, the support shank includes a pars convoluta and from the portion always that pars convoluta extends downwardly,
The straight portion is fixed perpendicular to chassis, and for the pars convoluta between the first ring stand, the second ring stand, the straight portion is located at the second ring stand
Between chassis.
As a further improvement on the present invention, the quartz tube heater includes a long tubular quartz ampoule and is placed in quartz
An at least heating wire in pipe is plugged with a heat insulation foam in the quartz ampoule nozzle, is additionally provided with for close outside the quartz ampoule nozzle
One metalwork of envelope, the metalwork are covered on outside quartz ampoule nozzle, and one end of the heating wire is fixed on metalwork, described
The other end of heating wire is suspended in quartz ampoule, the metalwork includes a main body, protrude from main body one second handle and
Several buckles being set in main body wall.
As a further improvement on the present invention, metalwork forms a card slot with quartz ampoule junction, is placed in the card slot
One sealing ring.
As a further improvement on the present invention, a bosh is offered in the metalwork.
As a further improvement on the present invention, the coolant seal connector including a cylinder-shaped body and is attached at main body
One layer of antiradiation heat insulating mattress of lower section offers several putting holes placed for heating device, the placement in the main body
Main body is run through in hole up and down, and the body upper surface center is convexly equipped with a third handle, and the main body lateral margin is provided with several fastenings
Part, is arranged an annular cooling water slot in the main body, and the main body wall is equipped with several cooling water connectors, the bosh with
Cooling water connector is connected to.
As a further improvement on the present invention, main body side bottom is equipped with a groove, a sealing built in the groove
Circle.
As a further improvement on the present invention, the body upper surface is provided with several conduits, and several putting holes are logical
Conduit is crossed to interconnect.
This crucible process system, compared to the prior art, can reduce energy consumption, film forming uniformly, booster probability reduce, and machinery
High degree of automation can also reduce the risk that oxidation film is abraded in transfer process, and integral structure layout is reasonable, is very suitable for
The preparation of semi-conducting material.
Description of the drawings
Fig. 1 is the overall structure diagram of crucible process system of the present invention.
Fig. 2 is the overall structure diagram under another state of crucible process system of the present invention.
Fig. 3 is overall structure signal of the vertical baking oxidative system of crucible process system of the present invention under the first visual angle
Figure.
Fig. 4 is overall structure signal of the vertical baking oxidative system of crucible process system of the present invention under the second visual angle
Figure.
Fig. 5 is sectional views of the Fig. 4 along the directions A-A.
Fig. 6 is Structure explosion diagram of the vertical baking oxidative system of crucible process system of the present invention under third visual angle.
Fig. 7 is Structure explosion diagram of the vertical baking oxidative system of crucible process system of the present invention under the 4th visual angle.
Fig. 8 be crucible process system of the present invention vertical baking oxidative system tripod assembly and crucible at the 5th visual angle
Under structural schematic diagram.
Fig. 9 is knot of the tripod assembly of the vertical baking oxidative system of crucible process system of the present invention under the 6th visual angle
Structure schematic diagram.
Figure 10 is structure of the tripod of the vertical baking oxidative system of crucible process system of the present invention under the 7th visual angle
Schematic diagram.
Figure 11 is the quartz tube heater of the vertical baking oxidative system of crucible process system of the present invention under the 8th visual angle
Structural schematic diagram.
Figure 12 is the quartz tube heater of the vertical baking oxidative system of crucible process system of the present invention under the 9th visual angle
Structural schematic diagram.
Figure 13 is sectional views of the Figure 12 along the directions B-B.
Figure 14 is the coolant seal connector of the vertical baking oxidative system of crucible process system of the present invention under the tenth visual angle
Structural schematic diagram.
Figure 15 is the coolant seal connector of the vertical baking oxidative system of crucible process system of the present invention at the 11st visual angle
Under structural schematic diagram.
Figure 16 is the coolant seal connector of the vertical baking oxidative system of crucible process system of the present invention at the 12nd visual angle
Under structural schematic diagram.
Figure 17 is sectional views of the Figure 16 along the directions C-C.
Specific implementation mode
Technical solution is clearly and completely described below in conjunction with the embodiment of the present invention, it is clear that described implementation
Example is only a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, this field is common
The every other embodiment that technical staff is obtained without making creative work belongs to the model that the present invention protects
It encloses.
- 2 are please referred to Fig.1, the present invention proposes a kind of crucible process system 4000, for handling crucible 2000, crucible process
System 4000 includes a vertical baking oxidative system 1000 and the machinery for installing or splitting vertical baking oxidative system
Grasping system 3000.
Mechanical grabbing system 3000 includes a manipulator 3100, a vertical lifting device 3200, a horizontally moving device
3300 and a pair of guide rails 3400, the manipulator 3100 be fixed on vertical lifting device 3200, the vertical lifting device
3200 can move horizontally along horizontally moving device 3300, and the horizontally moving device 3300 can be slided along guide rail 3400
It is dynamic.Manipulator 3100 can complete the installation and fractionation of vertical baking oxidative system 1000.Mechanical grabbing system 3000 can make
The mobile formation automation for obtaining manipulator 3100, accelerates transmission and the treatment effeciency of whole system, raises labour productivity.
Please refer to Fig. 3-7, vertical baking oxidative system 1000, for handling crucible 2000, vertical baking oxidative system
1000 include a furnace body 1100, the insulating layer 1200 being coated on outside furnace body 1100, the tripod being fixed in furnace body 1100
Assembly 1300 is placed in a quartz tube heater 1500 for heating in crucible 2000, for closed furnace body 1100 and is clamped solid
Determine a coolant seal connector 1600 of quartz tube heater 1500 and the shell 1700 outside insulating layer 1200.This is vertical
Toast oxidative system 1000 and be used for semi-conducting material preparation field, PBN crucibles are toasted and aoxidized so that through overbaking and
PBN crucibles after oxidation have good inner wall oxide film, help to improve PBN during GaAs, indium phosphide long monocrystalline
The wettability of crucible internal walls, to improve crystal growth yields.
The furnace body 1100 is at columnar structured, upper end opening.
The insulating layer 1200 is used to keep the temperature to furnace body 1100.
Crucible 2000 includes a vertical tube part 2010, a transition part 2020 and the mouth 2030 extended from up to down, directly
The section radius of canister portion 2010 is more than the section radius of transition part 2020, and transition part 2020 gradually narrows.
Fig. 8-10, the tripod assembly 1300 are please referred to, crucible 2000 is positioned on tripod assembly 1300 fixed, earthenware
Crucible frame assembly 1300 includes a chassis 1310, several tripods 1320 being perpendicularly fixed on chassis 1310, is perpendicularly fixed at bottom
One first handle 1330 at 1310 center of disk, chassis 1310 are fixed on by a crucible locking bolt 1800 in furnace body 1100.
Chassis 1310 is a circular flat face, and the first handle 1330 and tripod 1320 are fixed on the same of chassis 1310
Face.First handle 1330 is set it is for the ease of the entire tripod assembly of movement 1300.Several abnormal shapes are offered on chassis 1310
Hole 1311, several profiled holes 1311 are evenly distributed on chassis 1310.Profiled holes 1311 are used to chassis 1310 being fixed on crucible
On locking bolt 1800, fixed support of the crucible locking bolt 1800 as tripod assembly 1300.
The tip height of first handle 1330 is higher than the tip height of tripod 1320, such setting convenient for manipulator or
Person manually moves entire tripod assembly 1300.
Each tripod 1320 includes a support shank 1321, one first ring stand 1322, one second ring stand 1323, the first ring stand
1322,1323 equal level of the second ring stand is fixed on the side of support shank 1321, and the inner ring radius of the first ring stand 1322 is more than second
The inner ring radius of ring stand 1323, the first ring stand 1322 are located at the top of the second ring stand 1323, and crucible 2000 can be placed from top
In on tripod 1320, transition part 2020 is fixed on the first ring stand 1322, while mouth 1420 is fixed on the second ring stand 1323
On.The structure of tripod 1320 is specific to the structure of crucible 2000 and is arranged, the first ring stand 1322, the second ring stand 1323
Purpose is set and is that the contact fixation by multiple spot can stablize crucible 2000 is positioned on tripod 1320.
Support shank 1321 includes a pars convoluta 1321a and the portion 1321b always, straight portion 1321b that are extended downwardly from pars convoluta 1321a
It is fixed perpendicular to chassis 1310, in the present embodiment, straight portion 1321b is welded on chassis.Pars convoluta 1321a is located at the first ring stand
1322, between the second ring stand 1323, straight portion 1321b is between the second ring stand 1322 and chassis 1310.
Manipulator 3100 can be very convenient transfer tripod assembly 1300, detailed process is：Manipulator 3100 is opened
Be switched on machinery claw, and the first handle 1330 of crawl tripod assembly 1300 is transferred to specified place, realizes tripod 1300 and earthenware
The mechanical automation of crucible 2000 is moved.
Please refer to Fig.1 1-13, quartz tube heater 1500 comprising a long tubular quartz ampoule 1510 and be placed in quartz ampoule
An at least heating wire 1520 in 1510 is plugged with a heat insulation foam 1530, the quartz ampoule 1510 in 1510 nozzle of the quartz ampoule
The metalwork 1540 for sealing is additionally provided with outside nozzle, the metalwork 1540 is covered on outside 1510 nozzle of quartz ampoule, described
One end of heating wire 1520 is fixed on metalwork 1540, and the other end of the heating wire 1520 is suspended in quartz ampoule 1510,
The metalwork 1540 includes a main body 1541, protrudes from one second handle 1542 of main body 1541 and be set to main body 1541
Several buckles 1543 on side wall.
The metalwork 1540 forms a card slot 1544 with 1510 junction of quartz ampoule.Card slot 1544 is heated for quartz ampoule
Device 1500 is connected and fixed with coolant seal connector 1600.
Several outlet circular holes 1545 are offered on the metalwork 1540.Power cord（It is not shown on figure）Across outlet circular hole
1545 are electrically connected with heating wire 1520.
A bosh 1546 is offered in the metalwork 1540.Pass through inlet and outlet（It is not shown on figure）,
Bosh 1546 can realize that following for cooling water is bad, quartz tube heater 1500 can be given to cool down.Meanwhile heat insulation foam 1530 is right
Hundreds of degrees Celsius of high temperature plays good heat-blocking action, greatly alleviates the cooling load of bosh 1546, and heat insulation foam
1530 effective heat-insulated improve efficiency of utilization.
Buckle 1543 is also used for being clamped with 1600 phase of coolant seal connector.
Second handle 1542 is used for the transfer of entire quartz tube heater 1500, can pass through manipulator or other fixtures
Capture the second handle 1542 transfer quartz tube heater 1500.
Quartz tube heater 1500 has circulating water cooling function, is more applicable for the system of semiconductor crystalline material
It is standby.
Please refer to Fig.1 4-17, coolant seal connector 1600 comprising a cylinder-shaped body 1610 and be attached under main body
One layer of antiradiation heat insulating mattress 1620 of side offers several putting holes placed for heating device in the main body 1610
1611, about 1611 putting hole runs through main body 1610, and 1610 upper surface center of the main body is convexly equipped with a third handle
1612,1610 lateral margin of the main body is provided with several fasteners 1613, and an annular cooling water slot 1614, institute is arranged in the main body
It states 1610 side wall of main body and is equipped with several cooling water connectors 1615, the bosh 1614 is connected to cooling water connector 1615.
1610 upper surface of the main body is provided with several conduits 1616, and several putting holes 1611 are mutual by conduit 1616
It is connected.
Several string holes 1616a are provided in the conduit 1616, string holes 1616a and conduit 1616a are used to place quartz
The conductor wire of pipe heater 1500（It is not shown on figure）.
1610 upper table of the main body is towards several latches 1617 are protruded out in putting hole 1611, putting hole 1611 is for placing
Quartz tube heater 1500, latch 1617 are used to be fixedly connected with quartz tube heater 1500.
1610 side bottom of the main body is equipped with a groove 1618, a sealing ring 1900 built in the groove 1618.
Several stomatas 1619, coolant seal connector 1600 and quartz tube heater 1500 are additionally provided in the main body 1610
After secure bond, these stomatas 1619 are connected to furnace body 1100, these stomatas 1619 for furnace body 1100 vacuumize and air inlet.
Third handle 1612 is convenient for the separation of coolant seal connector 1600 and quartz tube heater 1500.
For being used in combination with quartz tube heater 1500, this coolant seal connector 1600 exists this coolant seal connector 1600
Quartz tube heater 1500 is for when heating, antiradiation heat insulating mattress 1620 can to reduce heat effusion, and reduction hyperthermia radiation is to cold
But the influence of the cooling water in sink 1614；Meanwhile the cooling water in bosh 1614 enables to sealing ring 1900 to keep
In low temperature, it is ensured that the air-tightness and stability of coolant seal connector 1600.
Shell 1700 is that entire vertical baking oxidative system 1000 provides hard outer protection, and system is aoxidized from vertical baking
Structure in system 1000 is damaged easily.
Said modules be assembled forming vertical baking oxidative system 1000, are formed and are isolated from the outside in furnace body 1100
A cavity, different from the dynamic pressure of prior art oxidation, this vertical baking oxidative system 1000 oxidation process at high temperature is
The process of one static pressure oxidation, advantageously to the formation of crucible internal oxidition film.
For vertical baking oxidative system 1000, tripod assembly 1300, quartz tube heater 1500 and coolant seal
Connector 1600 is respectively arranged with handle, and manipulator 3100 can be used and shifted to capture handle, is handling a collection of crucible
Afterwards, the mode of mechanical automation may be used to split entire vertical baking oxidative system 1000, then exchange another batch of crucible for
It continues with, the degree of automation can reduce the risk that oxidation film is abraded in transfer process compared with prior art height.
Because in the baking oxidation processes of crucible 2000, coolant seal connector 1600 can ensure at sealing ring 1900
In low-temperature condition, then the air-tightness of entire vertical baking oxidative system 1000 is guaranteed, while the probability of booster is significantly
It reduces；The relative position of quartz tube heater 1500 and crucible 2000 can ensure that crucible 2000 is heated evenly, therefore, crucible
2000 inner wall oxide films formed, can be with it is also ensured that be in homogeneous thickness, and the thermal efficiency of quartz tube heater 1500 is high
It is appropriate to reduce baking temperature, to reduce energy consumption.
This crucible process system 4000, compared to the prior art, can reduce energy consumption, film forming uniformly, booster probability reduce, and
Mechanical automation degree improves, and can also reduce the risk that oxidation film is abraded in transfer process, integral structure layout is reasonable, very
It is suitable for the preparation of semi-conducting material.
Although being example purpose, the preferred embodiment of the present invention, the ordinary skill people of this field are had been disclosed for
Member will realize in the case where not departing from the scope and spirit of the present invention disclosed in appended claims, various to change
Into, increase and substitution be possible.
Claims (10)
1. a kind of crucible process system, it is characterised in that：It includes a vertical baking oxidative system and for installing or splitting
One mechanical grabbing system of vertical baking oxidative system, the vertical baking oxidative system include a furnace body, are coated on outside furnace body
An insulating layer, be fixed in furnace body a tripod assembly, a quartz tube heater for heating, for closed furnace body simultaneously
The coolant seal connector and the shell outside insulating layer for gripping quartz tube heater, the mechanical grabbing system
It is fixed on vertical liter including a manipulator, a vertical lifting device, a horizontally moving device and a pair of guide rails, the manipulator
On falling unit, the vertical lifting device can be moved horizontally along horizontally moving device, and the horizontally moving device being capable of edge
Guide rail sliding.
2. crucible process system according to claim 1, it is characterised in that：The tripod assembly includes a chassis, hangs down
The straight several tripods being fixed on chassis, one first handle for being perpendicularly fixed at center chassis, the chassis rely on a crucible
Locking bolt is fixed in furnace body, and the crucible is fixed on tripod assembly.
3. crucible process system according to claim 2, it is characterised in that：Each tripod includes a support shank, one the
One ring stand, one second ring stand, first ring stand, the equal level of the second ring stand are fixed on the side of support shank, first ring stand
Inner ring radius be more than the inner ring radius of the second ring stand, the first ring stand is located at the top of the second ring stand.
4. crucible process system according to claim 3, it is characterised in that：The support shank includes a pars convoluta and from pars convoluta
The portion always extended downwardly, the straight portion is fixed perpendicular to chassis, and the pars convoluta is between the first ring stand, the second ring stand, institute
Straight portion is stated between the second ring stand and chassis.
5. crucible process system according to claim 1, it is characterised in that：The quartz tube heater includes a long tubular
Quartz ampoule and at least heating wire being placed in quartz ampoule are plugged with a heat insulation foam, the quartz ampoule in the quartz ampoule nozzle
The metalwork for sealing is additionally provided with outside nozzle, the metalwork is covered on outside quartz ampoule nozzle, one end of the heating wire
It is fixed on metalwork, the other end of the heating wire is suspended in quartz ampoule, and the metalwork includes a main body, protrudes from master
One second handle of body and several buckles being set in main body wall.
6. crucible process system according to claim 5, it is characterised in that：The metalwork is formed with quartz ampoule junction
One card slot, the card slot is interior to place a sealing ring.
7. crucible process system according to claim 5, it is characterised in that：A cooling water is offered in the metalwork
Slot.
8. crucible process system according to claim 1, it is characterised in that：The coolant seal connector includes one cylindrical
Main body and one layer of antiradiation heat insulating mattress being attached at below main body are placed if being offered in the main body for heating device
Dry putting hole, the putting hole run through main body up and down, and the body upper surface center is convexly equipped with a third handle, the main body side
Edge is provided with several fasteners, an annular cooling water slot is arranged in the main body, the main body wall connects equipped with several cooling waters
Mouthful, the bosh is connected to cooling water connector.
9. crucible process system according to claim 8, it is characterised in that：Main body side bottom is equipped with a groove,
A sealing ring built in the groove.
10. crucible process system according to claim 8, it is characterised in that：The body upper surface is provided with several slots
Road, several putting holes are interconnected by conduit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810400375.5A CN108517565B (en) | 2018-04-28 | 2018-04-28 | Crucible processing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810400375.5A CN108517565B (en) | 2018-04-28 | 2018-04-28 | Crucible processing system |
Publications (2)
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111348936A (en) * | 2018-12-21 | 2020-06-30 | 汉能新材料科技有限公司 | Crucible oxidation device and oxidation method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5584929A (en) * | 1994-03-11 | 1996-12-17 | Sumitomo Electric Industries, Ltd. | Method for preparing compound semiconductor crystal |
| CN1888126A (en) * | 2005-06-30 | 2007-01-03 | 中国科学院半导体研究所 | Boron nitride pyrolyzing crucible coating method and apparatus |
| CN201605350U (en) * | 2010-02-21 | 2010-10-13 | 晶科能源有限公司 | Thermal field device used for reducing crystal drawing power of single crystal furnace |
| CN101880909A (en) * | 2010-06-25 | 2010-11-10 | 上海汉虹精密机械有限公司 | Full-automatic crucible manipulator |
| CN202297855U (en) * | 2011-11-10 | 2012-07-04 | 常州华盛恒能光电有限公司 | Furnace detaching device for graphite thermal field of single crystal furnace |
| CN103695998A (en) * | 2013-03-21 | 2014-04-02 | 北京志光伯元科技有限公司 | Kyropoulos furnace thermal field system with low heat loss |
| CN206927963U (en) * | 2017-05-25 | 2018-01-26 | 广东先导先进材料股份有限公司 | Crucible apparatus for baking |
-
2018
- 2018-04-28 CN CN201810400375.5A patent/CN108517565B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5584929A (en) * | 1994-03-11 | 1996-12-17 | Sumitomo Electric Industries, Ltd. | Method for preparing compound semiconductor crystal |
| CN1888126A (en) * | 2005-06-30 | 2007-01-03 | 中国科学院半导体研究所 | Boron nitride pyrolyzing crucible coating method and apparatus |
| CN201605350U (en) * | 2010-02-21 | 2010-10-13 | 晶科能源有限公司 | Thermal field device used for reducing crystal drawing power of single crystal furnace |
| CN101880909A (en) * | 2010-06-25 | 2010-11-10 | 上海汉虹精密机械有限公司 | Full-automatic crucible manipulator |
| CN202297855U (en) * | 2011-11-10 | 2012-07-04 | 常州华盛恒能光电有限公司 | Furnace detaching device for graphite thermal field of single crystal furnace |
| CN103695998A (en) * | 2013-03-21 | 2014-04-02 | 北京志光伯元科技有限公司 | Kyropoulos furnace thermal field system with low heat loss |
| CN206927963U (en) * | 2017-05-25 | 2018-01-26 | 广东先导先进材料股份有限公司 | Crucible apparatus for baking |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111348936A (en) * | 2018-12-21 | 2020-06-30 | 汉能新材料科技有限公司 | Crucible oxidation device and oxidation method |
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