CN108423433A - substrate transfer system - Google Patents
substrate transfer system Download PDFInfo
- Publication number
- CN108423433A CN108423433A CN201810201634.1A CN201810201634A CN108423433A CN 108423433 A CN108423433 A CN 108423433A CN 201810201634 A CN201810201634 A CN 201810201634A CN 108423433 A CN108423433 A CN 108423433A
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- China
- Prior art keywords
- substrate
- air inlet
- inlet pipe
- transfer system
- substrate transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
Abstract
The present invention provides a kind of substrate transfer systems, by guiding means supports substrate, the substrate are transmitted by transmission device, so as to realize the transmission for the substrate；Further, there are gaps between the guider and the substrate, thus during the substrate transmits, can greatly reduce, even avoid friction between the guider and the substrate；Further, the transmission device fixes the substrate by way of absorption, to can also avoid the friction between the transmission device and the substrate, thus, it is possible to rub in the transmit process of entire substrate it is minimum, even without friction, to also greatly reduce, even avoid the generation of particle in substrate transmit process, the reliability of substrate transmission is improved.
Description
Technical field
The present invention relates to display manufacturing equipment technical field, more particularly to a kind of substrate transfer system.
Background technology
Flat-panel monitor (Flat Panel Display, FPD) inherently one flat plate, without CRT (Cathode
Ray Tube) electron-beam tube in display, it is very thin so as to be made, it is a kind of more satisfactory display.Tablet is aobvious
Show that device includes plasma scope (PDP), liquid crystal display (LCD), organic-electricity display (OLED) etc..
Existing flat-panel monitor in the production process, generally require utilize substrate transfer system transmission flat-panel monitor
Used in substrate, to carry out the conversion between different processing procedures, to forming different function elements on the substrate.
Existing substrate transfer system generally uses idler wheel conveyer system, as shown in Figure 1, the idler wheel conveyer system 1 is led
Including transmission shaft 10 and to be arranged the multiple idler wheels 11 being fixed on the transmission shaft 10.Substrate 2 is lain against by multiple rollings
On the horizontal plane that wheel 11 is constituted, when transmission shaft 10 rotates, multiple idler wheels 11 are driven to rotate, with multiple idler wheels 11
Rotation drive the substrate 2 to move again, to realize transmission to the substrate 2.
This idler wheel conveyer system belongs to the mode that idler wheel is in contact with substrate, due to the shadow by idler wheel cleanliness factor and vibrations
It rings, substrate meeting chronic pollution and vibrations, influence substrate cleanliness factor and increases the risk that fragmentation and crackle generate.In addition, by
In the idler wheel spacing the problem of, corresponding substrate thickness also compares limitation.Further, this transmission mode is because transmitting object (herein
For substrate) friction between idler wheel, idler wheel can wear, to cause to slide and to occur transfer not in place, so needing
Periodic replacement idler wheel, thus also increases manufacturing cost.Further, substrate obtains idler wheel according to the friction with idler wheel
When turning power, because the pollution of particle (Particle) can occur for friction, need to periodically it be cleaned；And in order to ensure to transmit position
Precision, can increase directive wheel (as shown in 12 in Fig. 1) in two sections of idler wheel, substrate during transmission can and directive wheel generate
Friction further increases the quantity of particle (Particle) pollution of substrate.
How to improve the friction problem in substrate transmit process as a result, reduces the particle generated in substrate transmit process, carry
The problem that the reliability of high basic transmission needs to solve at those skilled in the art.
Invention content
The purpose of the present invention is to provide a kind of substrate transfer systems, to solve to rub in substrate transmit process in the prior art
Wipe serious problem.
In order to solve the above technical problems, the present invention provides a kind of substrate transfer system, the substrate transfer system is for passing
The substrate, the substrate transfer system is sent to include：
Guider, the guider, which is used to support between the substrate and the guider and the substrate, to be existed
Gap；
Transmission device, the transmission device for transmitting the substrate, by way of absorption fixed by the transmission device
The substrate is simultaneously transmitted.
Optionally, in the substrate transfer system, the guider includes at least one guide plate, each described to lead
It is open at least provided with one on plate, can spray gas in the opening.
Optionally, in the substrate transfer system, the guider further includes regulating valve, and the regulating valve can
Adjust the gas flow sprayed in each opening.
Optionally, in the substrate transfer system, the regulating valve can adjust the size being each open to adjust
The gas flow sprayed in each opening.
Optionally, in the substrate transfer system, the guider further includes at least one air inlet pipe, Mei Gesuo
It states in guide plate and provides gas to the opening at least provided with an air inlet pipe, the air inlet pipe.
Optionally, in the substrate transfer system, the regulating valve can adjust the gas supply of the air inlet pipe
Amount is to adjust the gas flow sprayed in each opening.
Optionally, in the substrate transfer system, multiple air inlet pipe are provided in each guide plate, it is multiple
The flow direction of gas differs or not exactly the same completely in the air inlet pipe.
Optionally, in the substrate transfer system, multiple openings, Duo Gesuo are provided on each guide plate
Opening is stated uniformly to be distributed on the guide plate along the direction of transfer of the substrate.
Optionally, in the substrate transfer system, the transmission device includes movement parts and is set to the movement
Adsorption piece on part, the adsorption piece can be moved along the direction of transfer of the substrate, and the adsorption piece can adsorb
The substrate.
Optionally, in the substrate transfer system, the adsorption piece is moved relative to the movement parts；Alternatively, described
Movement parts include the first movement parts and the second movement parts, and first movement parts can be moved relative to second movement parts, institute
Adsorption piece is stated to be fixed in first movement parts.
Optionally, in the substrate transfer system, the substrate transfer system further includes power plant, the power
Device can drive the adsorption piece mobile or driving first movement parts move.
In substrate transfer system provided by the invention, by guiding means supports substrate, institute is transmitted by transmission device
Substrate is stated, so as to realize the transmission for the substrate；Further, exist between the guider and the substrate
Gap can greatly reduce thus during the substrate transmits, even avoid the guider and the substrate
Between friction；Further, the transmission device fixes the substrate by way of absorption, to can also avoid institute
The friction between transmission device and the substrate is stated, it is minimum, even thus, it is possible to rub in the transmit process of entire substrate
Without friction, to also greatly reduce, even avoid the generation of particle in substrate transmit process, improve substrate transmission can
By property.
Description of the drawings
Fig. 1 is the structural schematic diagram of the idler wheel conveyer system of the prior art；
Fig. 2 is the structural schematic diagram of the substrate transfer system of the embodiment of the present invention one；
Fig. 3 is the structural schematic diagram of the substrate transfer system of the embodiment of the present invention two；
Wherein, 1- idler wheels conveyer system；10- transmission shafts；11- idler wheels；12- directive wheels；
2- substrates；
3- substrate transfer systems；30- guiders；31- transmission devices；300- guide plates；301- is open；302- air inlet pipe；
302a- air inlet pipe；302b- air inlet pipe；302c- air inlet pipe；302d- air inlet pipe；302e- air inlet pipe；302f- air inlet pipe；302g-
Air inlet pipe；302h- air inlet pipe；302i- air inlet pipe；302j- air inlet pipe；310- movement parts；311- adsorption pieces；32- power plants；
S1- substrate direction of transfers；
4- substrate transfer systems；40- guiders；41- transmission devices；400- guide plates；400a- guide plates；400b- guide plates；
400c- guide plates；401- is open；402- air inlet pipe；402a- air inlet pipe；402b- air inlet pipe；402c- air inlet pipe；402d- air inlets
Pipe；402e- air inlet pipe；402f- air inlet pipe；410- movement parts；The first movement parts of 410a-；The first movement parts of 410b-；411- inhales
Attachment；42- power plants；S2- substrate direction of transfers.
Specific implementation mode
Substrate transfer system proposed by the present invention is described in further detail below in conjunction with the drawings and specific embodiments.Root
According to following explanation and claims, advantages and features of the invention will become apparent from.It should be noted that attached drawing be all made of it is very simple
The form of change and use non-accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
【Embodiment one】
Referring to FIG. 2, its structural schematic diagram for the substrate transfer system of the embodiment of the present invention one.As shown in Fig. 2, at this
Apply in embodiment, the substrate transfer system 3 is specifically included for transmitting a substrate 2, the substrate transfer system 3：It is oriented to
Device 30, the guider 30 is used to support exist between the substrate 2 and the guider 30 and the substrate 2 between
Gap；Transmission device 31, the transmission device 31 are consolidated for transmitting the substrate 2, the transmission device 31 by way of absorption
The fixed substrate 2 is simultaneously transmitted.
Specifically, the guider 30 can spray gas, the guider is realized by the gas of ejection
There are gaps between 30 and the substrate 2.Preferably, the gap is (namely between the substrate 2 and the guider 30
Range difference) it is 0.1mm~1mm, for example, the gap is 0.2mm, 0.3mm, 0.5mm, 0.65mm, 0.8mm or 0.99mm
Deng.By the way that the clearance control between the guider 30 and the substrate 2 in 0.1mm~1mm, thus can either be made institute
It states guider 30 and preferably supports the substrate 2, and can avoid/reduce between the guider 30 and the substrate 2
It rubs.Further, the guider 30 spray other be the inactive gas of properties such as nitrogen, argon gas, for example,
It can also be other inert gases such as helium.
In the embodiment of the present application, the guider 30 includes a guide plate 300.Wherein, the guide plate 300 is along institute
The direction of transfer S1 for stating substrate 2 extends, and as a result, in the transmit process of entire substrate 2, it is fine can to give the substrate 2
Support.
Further, it is provided with multiple openings 301 on the guide plate 300, can spray gas in the opening 301.Its
In, the opening 301 can be the regular shapes such as a circle, rectangular or the through-hole of irregular shape, can also be one
Bar-shaped trough, the application is to this and is not construed as limiting.Preferably, multiple openings 301 are equal along the direction of transfer S1 of the substrate 2
Even is distributed on the guide plate 300.It, can by multiple openings 301 as a result, in the transmit process of the substrate 2
Gas uniformly is sprayed to the substrate 2, keeps basic 2 stabilization.Further, it is multiple it is described opening 301 with institute
State also uniform distribution on the vertical directions direction of transfer S1 of substrate 2.Thus, it is possible to so that 2 each position of the substrate all
It can preferably be supported, keep basic 2 stabilization.
Further, the guider 30 further includes regulating valve (being not shown in Fig. 2), and the regulating valve can be adjusted often
The gas flow sprayed in a opening 301.It, can be by adjusting the regulating valve as a result, in the case of multiple openings 301
So that the gas flow that each opening 301 sprays is identical or essentially identical, so that the substrate 2 can be good at holding one
A horizontality, to the transmission conducive to the substrate 2.
In the embodiment of the present application, the regulating valve can adjust the size of each opening 301 to adjust each opening 301
The gas flow of middle ejection.For example, each opening 301 is circular open and each the diameter of opening 301 can be in certain model
Interior adjusting is enclosed, is adjusted by adjusting the diameter of each opening 301 and can adjust the size of each opening 301 as a result,
Save the gas flow sprayed in each opening 301.For another example, each opening 301 is square openings and each side of opening 301
Length can be adjusted in a certain range, can adjust each opening by adjusting the length of side stool and urine of each opening 301 as a result,
301 size adjusts the gas flow sprayed in each opening 301 in turn.
Further, the guider 30 further includes air inlet pipe 302, specifically, in the guide plate 300 there are one settings
Or multiple air inlet pipe 302, the air inlet pipe 302 provide gas to the opening 301.Preferably, in the guide plate 300
The flow direction for being provided with gas in multiple air inlet pipe 302 and multiple air inlet pipe 302 differs or not completely
It is identical.Thus, it is possible to so that the time that obtains gas of multiple openings 301, flow, flow velocity are identical or essentially identical, from
And it is easy to so that the gas flow sprayed in multiple openings 301 is identical or essentially identical.
With continued reference to FIG. 2, for example, the quantity of air inlet pipe described herein 302 be ten, for ease of description, claim respectively
For air inlet pipe 302a, air inlet pipe 302b, air inlet pipe 302c, air inlet pipe 302d, air inlet pipe 302e, air inlet pipe 302f, air inlet pipe
302g, air inlet pipe 302h, air inlet pipe 302i and air inlet pipe 302j；Wherein, air inlet pipe 302a and air inlet pipe 302b is located at described lead
The same side of plate 300, and the flow direction of the air inlet pipe 302a and air inlet pipe 302b gases provided is identical；Air inlet pipe 302c and into
Tracheae 302d is located at the same side of the guide plate 300, and the flow direction of air inlet pipe 302c and the gas of air inlet pipe 302d offers
It is identical, further, the flow direction for the gas that air inlet pipe 302c and air inlet pipe 302d are provided and air inlet pipe 302a and air inlet pipe
The flow direction for the gas that 302b is provided is opposite；Air inlet pipe 302e, air inlet pipe 302f and air inlet pipe 302g are located at the guide plate 300
The same side, and air inlet pipe 302e, air inlet pipe 302f are identical with the flow direction of the air inlet pipe 302g gases provided；Air inlet pipe
302h, air inlet pipe 302i and air inlet pipe 302j are located at the same side of the guide plate 300, and air inlet pipe 302h, air inlet pipe 302i and
The flow direction for the gas that air inlet pipe 302j is provided is identical, further, air inlet pipe 302h, air inlet pipe 302i and air inlet pipe 302j
The flow direction phase of the flow direction of the gas of offer and air inlet pipe 302e, air inlet pipe 302f and air inlet pipe the 302g gas provided
Instead.That is, in above-mentioned ten air inlet pipe 302, the gas provided forms four flow directions.
Then, with continued reference to FIG. 2, in the embodiment of the present application, the transmission device 31 includes movement parts 310 and setting
In the adsorption piece 311 in the movement parts 310, the adsorption piece 311 can be moved along the direction of transfer of the substrate 2, and
And the adsorption piece 311 can adsorb the substrate 2.Preferably, the adsorption piece 311 passes through described in negative pressure or vacuum suction
Substrate 2.Here, since the adsorption piece 311 fixes the substrate 2 by way of absorption, to can also avoid itself and institute
State the friction between substrate 2.
In the embodiment of the present application, the movement parts 310 along the substrate 2 direction of transfer S1 extensions/arrangement,
The adsorption piece 311 is moved relative to the movement parts 310, to which the substrate 2 can be sent to purpose by the adsorption piece 311
Position.
Further, the substrate transfer system 3 further includes power plant 32, and the power plant 32 can drive described
Adsorption piece 311 moves, i.e., drives the adsorption piece 311 to be moved along the movement parts 310 herein, to pass the substrate 2
It send to destination locations.Wherein, the power plant 32 can be motor etc..
To sum up, in substrate transfer system provided in an embodiment of the present invention, by guiding means supports substrate, pass through
Transmission device transmits the substrate, so as to realize the transmission for the substrate；Further, the guider and institute
It states between substrate that there are gaps, thus during the substrate transmits, can greatly reduce, even avoid the guiding
Friction between device and the substrate；Further, the transmission device fixes the substrate by way of absorption, from
And the friction between the transmission device and the substrate can be also avoided, thus, it is possible to make in the transmit process of entire substrate
Rub it is minimum, even without friction, to also greatly reduce, even avoid the generation of particle in substrate transmit process, improve
The reliability of substrate transmission.
【Embodiment two】
Referring to FIG. 3, its structural schematic diagram for the substrate transfer system of the embodiment of the present invention two.As shown in figure 3, at this
Apply in embodiment, the substrate transfer system 4 is specifically included for transmitting a substrate 2, the substrate transfer system 4：It is oriented to
Device 40, the guider 40 is used to support exist between the substrate 2 and the guider 40 and the substrate 2 between
Gap；Transmission device 41, the transmission device 41 are consolidated for transmitting the substrate 2, the transmission device 41 by way of absorption
The fixed substrate 2 is simultaneously transmitted.
Specifically, the guider 40 can spray gas, the guider is realized by the gas of ejection
There are gaps between 40 and the substrate 2.Preferably, the gap is (namely between the substrate 2 and the guider 40
Range difference) it is 0.1mm~1mm, for example, the gap is 0.2mm, 0.3mm, 0.5mm, 0.65mm, 0.8mm or 0.99mm
Deng.By the way that the clearance control between the guider 40 and the substrate 2 in 0.1mm~1mm, thus can either be made institute
It states guider 40 and preferably supports the substrate 2, and can avoid/reduce between the guider 40 and the substrate 2
It rubs.Further, the guider 40 spray other be the inactive gas of properties such as nitrogen, argon gas, for example,
It can also be other inert gases such as helium.
In the embodiment of the present application, the guider 40 includes multiple guide plates 400.Three are schematically illustrated herein
Guide plate 400 is referred to as guide plate 400a, guide plate 400b and guide plate 400c for ease of description.Wherein, each guide plate 400
Extend along the direction of transfer S2 of the substrate 2, multiple guide plates 400 are along vertical with the direction of transfer S2 of the substrate 2
Direction arrangement, as a result, in the transmit process of entire substrate 2, can give the substrate 2 well support.
Further, it on each guide plate 300 at least provided with an opening 401, can be sprayed in the opening 401
Gas.Wherein, the opening 401 can be the regular shapes such as a circle, rectangular or the through-hole of irregular shape, can also
It is a bar-shaped trough, the application is to this and is not construed as limiting.Preferably, multiple openings 401 are provided on each guide plate 400,
Multiple openings 401 are uniformly distributed in along the direction of transfer S2 of the substrate 2 on each guide plate 400.Exist as a result,
In the transmit process of the substrate 2, can gas uniformly be sprayed to the substrate 2 by multiple openings 401, keep institute
State basic 2 stabilization.Further, multiple openings 401 are on the direction vertical with the direction of transfer S2 of the substrate 2
Uniform distribution.Thus, it is possible to so that 2 each position of the substrate can access preferable support, described basic 2 are kept
Stablize.
In the embodiment of the present application, the guider 40 further includes air inlet pipe 402, specifically, each guide plate 400
In be provided with one or more air inlet pipe 402, the air inlet pipe 402 provides gases to the opening 401.Preferably,
The flow direction that gas in multiple air inlet pipe 402 and multiple air inlet pipe 402 is provided in the guide plate 400 is complete
It differs or not exactly the same.Thus, it is possible to so that the time that obtains gas of multiple openings 401, flow, flow velocity it is identical or
It is essentially identical, to be easy to so that the gas flow sprayed in multiple openings 401 is identical or essentially identical.
For example, the quantity of air inlet pipe 402 described herein be six, for ease of description, be referred to as air inlet pipe 402a, into
Tracheae 402b, air inlet pipe 402c, air inlet pipe 402d, air inlet pipe 402e and air inlet pipe 402f；Wherein, air inlet pipe 402a and air inlet pipe
402b is set in the guide plate 400a, and the gas provided positioned at the opposite both sides of the guide plate 400a, air inlet pipe 402a
Flow direction and the flow direction of gas that provides air inlet pipe 402b it is opposite；Air inlet pipe 402c and air inlet pipe 402d are set to institute
The flow direction for the gas stated in guide plate 400b, and provided positioned at the opposite both sides of the guide plate 400b, air inlet pipe 402c and
The flow direction for the gas that air inlet pipe 402d is provided is opposite；Air inlet pipe 402e and air inlet pipe 402f is set to the guide plate 400c
In, and positioned at the opposite both sides of the guide plate 400c, the flow direction of the gas of air inlet pipe 402e offers and air inlet pipe 402f
The flow direction of the gas of offer is opposite.
Further, the guider 40 further includes regulating valve (being not shown in Fig. 3), and the regulating valve can be adjusted often
The gas flow sprayed in a opening 401.It, can be by adjusting the regulating valve as a result, in the case of multiple openings 401
So that the gas flow that each opening 401 sprays is identical or essentially identical, so that the substrate 2 can be good at holding one
A horizontality, to the transmission conducive to the substrate 2.
In the embodiment of the present application, it is every to adjust can to adjust the gas supply of the air inlet pipe 402 for the regulating valve
The gas flow sprayed in a opening 401.Further, the regulating valve can also adjust the gas supply of the air inlet pipe 402
Time, gas flow rate etc. adjust the gas flow sprayed in each opening 401 to further accurate.
Then, with continued reference to FIG. 3, in the embodiment of the present application, the transmission device 41 includes movement parts 410 and setting
In the adsorption piece 411 in the movement parts 410, the adsorption piece 411 can be moved along the direction of transfer of the substrate 2, and
And the adsorption piece 411 can adsorb the substrate 2.Preferably, the adsorption piece 411 passes through described in negative pressure or vacuum suction
Substrate 2.Here, since the adsorption piece 411 fixes the substrate 2 by way of absorption, to can also avoid itself and institute
State the friction between substrate 2.
In the embodiment of the present application, the movement parts include the first movement parts 410a and the second movement parts 410b, the fortune
Moving part 410 along the substrate 2 direction of transfer S2 extensions/arrangement, herein namely the second movement parts 410b along
Direction of transfer S2 extensions/arrangement of the substrate 2, the first movement parts 410a being capable of relatively described second movement parts
410b is moved, and the adsorption piece 411 is fixed on the first movement parts 410a.To which the adsorption piece 411 can will be described
Substrate 2 is sent to destination locations.
Further, the substrate transfer system 4 further includes power plant 42, and the power plant 42 can drive described
First movement parts 410a movements, i.e., drive the first movement parts 410a to be moved along the second movement parts 410b herein, from
And the adsorption piece 411 can be driven to be moved along the second movement parts 410b, and then the substrate 2 is sent to purpose position
It sets.Wherein, the power plant 42 can be motor etc..
To sum up, in substrate transfer system provided in an embodiment of the present invention, by guiding means supports substrate, pass through
Transmission device transmits the substrate, so as to realize the transmission for the substrate；Further, the guider and institute
It states between substrate that there are gaps, thus during the substrate transmits, can greatly reduce, even avoid the guiding
Friction between device and the substrate；Further, the transmission device fixes the substrate by way of absorption, from
And the friction between the transmission device and the substrate can be also avoided, thus, it is possible to make in the transmit process of entire substrate
Rub it is minimum, even without friction, to also greatly reduce, even avoid the generation of particle in substrate transmit process, improve
The reliability of substrate transmission.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair
Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims
Range.
Claims (11)
1. a kind of substrate transfer system, the substrate transfer system is for transmitting a substrate, which is characterized in that the substrate transmission
System includes：
Guider, the guider is used to support exist between the substrate and the guider and the substrate between
Gap；
Transmission device, the transmission device is for transmitting the substrate, described in the transmission device is fixed by way of absorption
Substrate is simultaneously transmitted.
2. substrate transfer system as described in claim 1, which is characterized in that the guider includes at least one guide plate,
It is open at least provided with one on each guide plate, can spray gas in the opening.
3. substrate transfer system as claimed in claim 2, which is characterized in that the guider further includes regulating valve, described
Regulating valve can adjust the gas flow sprayed in each opening.
4. substrate transfer system as claimed in claim 3, which is characterized in that the regulating valve can adjust each be open it is big
The gas flow sprayed in small each opening with adjusting.
5. substrate transfer system as claimed in claim 3, which is characterized in that the guider further includes at least one air inlet
Pipe each provides gas at least provided with an air inlet pipe, the air inlet pipe in the guide plate to the opening.
6. substrate transfer system as claimed in claim 5, which is characterized in that the regulating valve can adjust the air inlet pipe
Gas supply is to adjust the gas flow sprayed in each opening.
7. substrate transfer system as claimed in claim 5, which is characterized in that be provided in each guide plate it is multiple it is described into
Tracheae, the flow direction of gas differs or not exactly the same completely in multiple air inlet pipe.
8. the substrate transfer system as described in any one of claim 2~7, which is characterized in that be arranged on each guide plate
There are multiple openings, multiple openings to be uniformly distributed on the guide plate along the direction of transfer of the substrate.
9. such as substrate transfer system according to any one of claims 1 to 7, which is characterized in that the transmission device includes fortune
Moving part and the adsorption piece being set in the movement parts, the adsorption piece can be moved along the direction of transfer of the substrate, and
And the adsorption piece can adsorb the substrate.
10. substrate transfer system as claimed in claim 9, which is characterized in that the adsorption piece is moved relative to the movement parts；
Alternatively, the movement parts include the first movement parts and the second movement parts, first movement parts being capable of relatively described second movement
Part moves, and the adsorption piece is fixed in first movement parts.
11. substrate transfer system as claimed in claim 10, which is characterized in that the substrate transfer system further includes power dress
It sets, the power plant can drive the adsorption piece mobile or driving first movement parts move.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810201634.1A CN108423433A (en) | 2018-03-12 | 2018-03-12 | substrate transfer system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810201634.1A CN108423433A (en) | 2018-03-12 | 2018-03-12 | substrate transfer system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108423433A true CN108423433A (en) | 2018-08-21 |
Family
ID=63157850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810201634.1A Pending CN108423433A (en) | 2018-03-12 | 2018-03-12 | substrate transfer system |
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| Country | Link |
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| CN (1) | CN108423433A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110355117A (en) * | 2019-06-10 | 2019-10-22 | 惠科股份有限公司 | A kind of crystal liquid substrate distribution of goods method and its distribution of goods system |
| CN113085393A (en) * | 2021-04-06 | 2021-07-09 | Tcl华星光电技术有限公司 | Substrate conveying system with cleaning function |
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| CN107316834A (en) * | 2017-07-31 | 2017-11-03 | 武汉华星光电半导体显示技术有限公司 | Base plate transfer device |
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| CN1810608A (en) * | 2005-01-26 | 2006-08-02 | 三发机电有限公司 | Substrate transferring apparatus |
| CN103381965A (en) * | 2013-07-02 | 2013-11-06 | 深圳市华星光电技术有限公司 | Air floating type guide wheel transmission device for liquid crystal panel |
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| CN113085393A (en) * | 2021-04-06 | 2021-07-09 | Tcl华星光电技术有限公司 | Substrate conveying system with cleaning function |
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Application publication date: 20180821 |