CN108398449A - X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized - Google Patents
X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized Download PDFInfo
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- CN108398449A CN108398449A CN201810366332.XA CN201810366332A CN108398449A CN 108398449 A CN108398449 A CN 108398449A CN 201810366332 A CN201810366332 A CN 201810366332A CN 108398449 A CN108398449 A CN 108398449A
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- ray
- combination refractor
- array combination
- dioptric apparatus
- refractive power
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
Abstract
A kind of X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized, the X-ray dioptric apparatus and X-ray array combination refractor are close to placement, the X-ray dioptric apparatus has the reshaping structure for realizing incident X-ray beam shaping, the reshaping structure refers to X-ray dioptric apparatus to the positive and negative level-one compound lens refractive power θ angles in X-ray array combination refractor, to the positive and negative 2 θ angles of two level compound lens refractive power in X-ray array combination refractor, the rest may be inferred, it is final to realize that the class directional light of combination refractor single to each in X-ray array combination refractor is incident.The present invention is applied to micromation X-ray array combination refractor integrated package, high microcell resolution ratio and high sensitivity can be achieved at the same time, and can carry out field assay.
Description
Technical field
The present invention relates to X-ray detections and imaging field, especially a kind of X for MICRO-BEAM XRF ANALYSIS system
The X-ray dioptric apparatus of ray array combination refractor integrated package.
Background technology
X-ray fluorescence (XRF, X-Ray Fluorescence) analysis system can be under normal pressure to various forms (solid-state/liquid
State/powder etc.) sample carries out simple and quick, high-resolution and lossless element quantitative measurment is analyzed.And micro-beam X-ray fluorescence point
Analysis system (micro-XRF) is received significant attention because it is with higher microcell resolution ratio.
MICRO-BEAM XRF ANALYSIS system (micro-XRF) is usually required for being equipped with X-ray focusing device.X has been used to penetrate
The X-ray fluorescence analyzing system of line focus device, although microcell resolution ratio, which increases substantially, (can usually improve an order of magnitude
More than), but counting rate can decline, and affect detectivity.Fluorescence Spectrometer of the prior art based on X-ray capillary tube device
(the patent No.：201010180956.6) it, is focused using X-ray capillary tube device, microcell resolution ratio is typically only capable to reach several
Ten microns, not only microcell resolution ratio is not high enough, and because counting rate decline leads to detectivity also decrease to some degree；Together
When complicated, bulky dimensions, cannot achieve portable.Inventor also proposed a kind of portable micro-beam X-ray fluorescence light before
Spectrometer (the patent No.：201310356270.1 it is and the immediate prior art of the present invention), it is obtained with X-ray combination refractor
Microbeam must be detected, although microcell resolution ratio increases substantially, counting rate is low, affects detectivity.
X-ray combination refractor is integrated-type micro structural component, and numerical aperture is small, and the light that X-ray light pipe is sent out cannot
The lens reception that is all combined also adds noise not only so that counting rate reduces but also wastes X-ray light energy.If
New device architecture can be invented, the X-ray light as much as possible sent out using X-ray light pipe can not only then increase considerably meter
Digit rate and then raising detectivity, while energy consumption can also be reduced, reduce noise.
Invention content
In order to overcome existing Xray fluorescence spectrometer microcell resolution ratio high not enough, especially cause because counting rate is low
Detectivity is not high enough and complicated, bulky dimensions, cannot achieve portable deficiency, the present invention provides a kind of miniature
The X-ray dioptric apparatus for changing X-ray array combination refractor integrated package is applied to miniaturization micro-beam X-ray fluorescence point
Analysis system can be achieved at the same time high microcell resolution ratio and high sensitivity, and can carry out field assay.
The technical solution adopted by the present invention to solve the technical problems is：
A kind of X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized, the X-ray folding
With X-ray array combination refractor close to placement, the X-ray dioptric apparatus has for realizing incident X-ray beam light device
The reshaping structure of shaping, the reshaping structure refer to X-ray dioptric apparatus to the positive and negative level-one in X-ray array combination refractor
Compound lens refractive power θ angles, to the positive and negative 2 θ angles of two level compound lens refractive power in X-ray array combination refractor, according to this
Analogize, it is final to realize that the class directional light of combination refractor single to each in X-ray array combination refractor is incident.
Further, the X-ray dioptric apparatus selective refraction characteristic meets any simple substance or compound-material of following equation,
The refraction coefficient of X-ray band material：
Wherein, NARepresent Avgadro constant, r0Electron radius is represented, λ represents wavelength, and A represents atomic mass, subscript i
Indicate that the element species in compound, subscript j are positive integer, ρ represents electron density, and subscript i indicates the Element Species in compound
Class, the i=1 when material is simple substance, v represent atom number, and subscript i indicates that the element species in compound, subscript j are just whole
Number, Z represent atomic number, and subscript i indicates the element species in compound.
Further, the non-refractive power area material thickness t of the X-ray dioptric apparatusZ0It indicates, the X-ray dioptric apparatus
Non- refractive power sector width size TZ=T0+2G2, T0For the width of zero level euphotic zone；tZ0For the material thickness in non-refractive power area, refractive power area
Material thickness tZMIt is calculated by following equation：
tZM=tZ0+TM·tan(0.5M·θ) (2)。
Wherein, G2For the width of positive and negative two level light blocking band, TMFor the width of euphotic zones at different levels.
Beneficial effects of the present invention are mainly manifested in：1, invented X-ray dioptric apparatus is utilized, X-ray beam is carried out
Shaping, it is simple in structure, can integrated batch making；2, X-ray array combination refractor is worked based on refraction effect, to X
Need not turn back light path when beam focusing, therefore be formed by that detection device or apparatus structure are compact, size is small, light-weight,
It is suitble to make portable instrument device, field assay may be implemented.
Description of the drawings
Fig. 1 is the structure of X-ray dioptric apparatus of the present invention for X-ray array combination refractor integrated package to be miniaturized
Schematic diagram (partial structurtes for only depicting M≤2), wherein TZFor the width in non-refractive power area, tZ0For non-refractive power area material thickness,
tZMFor the material thickness in refractive power area, (a) front view, (b) vertical view.
Fig. 2 is that the structure of x-ray diAN_SNhragm in a kind of micromation X-ray array combination refractor integrated package of the present invention is shown
It is intended to (partial structurtes for only depicting M≤2), wherein T0For the width of zero level euphotic zone, T2For the width of positive and negative level-one euphotic zone
Degree, t are the thickness of x-ray diAN_SNhragm, (a) front view, (b) vertical view.
Fig. 3 is a kind of structural schematic diagram of micromation X-ray array combination refractor integrated package of the present invention, wherein 1
X-ray diAN_SNhragm is represented, 2 X-ray dioptric apparatus is represented, 3 represents X-ray array combination refractor, 4 proxy component plummers.
Fig. 4 is that X-ray array combination reflects in a kind of micromation X-ray array combination refractor integrated package of the present invention
The structural schematic diagram (partial structurtes for only depicting M≤2) of lens, wherein T0It is refractive elements for bore, the l of refractive elements
Axial width size.
Specific implementation mode
The invention will be further described below in conjunction with the accompanying drawings.
Referring to Fig.1~Fig. 4, a kind of X-ray refractive power for X-ray array combination refractor integrated package to be miniaturized
Device, the X-ray dioptric apparatus and X-ray array combination refractor close to placement, the X-ray dioptric apparatus have for realizing
The reshaping structure of incident X-ray beam shaping, the reshaping structure refer to that X-ray dioptric apparatus reflects thoroughly X-ray array combination
Positive and negative level-one compound lens refractive power θ angles in mirror roll over the positive and negative two level compound lens in X-ray array combination refractor
2 θ angles of light, and so on, the final class for realizing combination refractor single to each in X-ray array combination refractor
Directional light is incident.
Further, the X-ray dioptric apparatus selective refraction characteristic meets any simple substance or compound-material of following equation,
The refraction coefficient of X-ray band material：
Wherein, NARepresent Avgadro constant, r0Electron radius is represented, λ represents wavelength, and A represents atomic mass, subscript i
Indicate that the element species in compound, subscript j are positive integer, ρ represents electron density, the Element Species in subscript i representation compounds
Class, the i=1 when material is simple substance, v represent atom number, and subscript i indicates that the element species in compound, subscript j are just whole
Number, Z represent atomic number, and subscript i indicates the element species in compound.
Further, the non-refractive power area material thickness t of the X-ray dioptric apparatusZ0It indicates, the X-ray dioptric apparatus
Non- refractive power sector width size TZ=T0+2G2, T0For the width of zero level euphotic zone；tZ0For the material thickness in non-refractive power area, refractive power area
Material thickness tZMIt is calculated by following equation：
tZM=tZ0+TM·tan(0.5M·θ) (2)。
Wherein, G2For the width of positive and negative two level light blocking band, it is calculated when taking M=2 by formula (8)；TMFor the width of euphotic zone
Degree, is calculated by formula (7).
The X-ray dioptric apparatus of the present embodiment is applied to micromation X-ray array combination refractor integrated package, it is described
Integrated package includes x-ray diAN_SNhragm 1, X-ray dioptric apparatus 2, X-ray array combination lens 3 and component plummer 4, X-ray beam
It is radiated on the X-ray array combination refractor integrated package, is received first by x-ray diAN_SNhragm, and carry out whole for the first time
Shape and filtering, the first time shaping refer to being penetrated to incident X according to the numerical aperture of the X-ray array combination refractor
Linear light wave carries out shaping；The filtering refers to dividing incident X-rays light wave to form multiple beamlets, the number and X of beamlet
Combination refractor number in ray array combination refractor is identical.The X-ray light wave for having split into multiple beamlets connects
It into the X-ray dioptric apparatus is injected, second of shaping of light beam, second of shaping of the light beam is carried out through X-ray dioptric apparatus
Ensure the multiple X-ray beamlets being emitted from X-ray dioptric apparatus, corresponding X is penetrated in incidence array in a manner of class directional light
Line combines refractor.The X-ray array combination refractor is focused incident multiple X-ray beamlets respectively,
The array structure of the X-ray array combination refractor is laid out, and ensures that each beamlet is formed by focusing spot same
One position, and on optical axis.The component plummer is for carrying the x-ray diAN_SNhragm, X-ray dioptric apparatus, X-ray array
Combine refractor, and the x-ray diAN_SNhragm, X-ray dioptric apparatus, X-ray array combination refractor relative position and
Optical axis is fixed after adjusting.
Further, include (M+1) a X-ray combination refractor in the X-ray array combination refractor, it is described
M is positive integer and is even number.The X-ray array combination refractor is axisymmetricly distributed along its optical axis, the X-ray array
Combine the optical axis coincidence of zero level X-ray combination refractor in the optical axis and array of refractor, the X-ray array combination folding
The optical axis included angle for penetrating the positive and negative level-one X-ray combination refractor in the optical axis and array of lens is θ, the X-ray array group
The optical axis for closing refractor combines the optical axis included angle of refractor with the positive and negative secondary X-ray in array as 2 θ, and so on.
Further, (M+1) a layout structure for combining refractor in the X-ray array combination refractor, makes
Must own the focal spot of (M+1) a X-ray combination refractor focusing in same position, and on optical axis.
Further, the structure and performance parameters of described (M+1) a X-ray combination refractor are obtained according to following equation
Go out：
The optical constant of X-ray wave band：N=1- δ+i β (3)
The focal length of X-ray combination refractor：
The focal spot size of X-ray combination refractor：
The numerical aperture of X-ray combination refractor：
Wherein n represents optical constant, and δ represents the refraction of X-ray band material, and β represents the absorption of X-ray band material, N
The number for representing refractive elements in X-ray combination refractor combines refractor parabolic by taking parabolic shape refractive elements as an example
The radius of curvature of vertex of surface is R, and paraboloidal opening size is R0, f represents the focal length of X-ray combination refractor, and λ represents wave
Long, μ represents the linear absorption coefficient of X-ray,
Further, the X-ray dioptric apparatus is realized incident with the X-ray array combination refractor close to placement
Second of shaping of X-ray beam, second of shaping refer to that X-ray dioptric apparatus can be to X-ray array combination refractor
In positive and negative level-one compound lens refractive power θ angles, to the positive and negative two level compound lens refractive power in X-ray array combination refractor
2 θ angles, and so on, it is final to realize that the class of combination refractor single to each in X-ray array combination refractor is flat
Row light is incident.
Further, the structure size of the x-ray diAN_SNhragm, according to the structure of the X-ray array combination refractor
Size determines, realizes the first time shaping and filtering of incident X-ray beam, the first time shaping of the light beam, refers to being penetrated using X
The stray light that linear light door screen construction insulation is injected except X-ray array combination refractor and the work(that light beam is tentatively collimated
Energy；The filtering refers to the filter structure of euphotic zone and light blocking tape alternation arrangement in x-ray diAN_SNhragm structure, and passes through filter structure
X-ray light wave is split into multiple beamlets.
The number of the euphotic zone is that (M+1) is a, and refractor is combined with the X-ray array combination refractor
Number is identical.The width of the euphotic zone and light blocking band is calculated by following equation respectively：
Zero level euphotic zone T0, positive and negative level-one euphotic zone, just identical as the numerical aperture size of X-ray combination refractor
Negative two level euphotic zone ..., and so on, euphotic zone width means are：
Positive and negative level-one light blocking band, positive and negative two level light blocking band ..., and so on, light blocking bandwidth is expressed as：
GM=Ltan (0.5M θ) (8)
Wherein L represents the geometrical length of X-ray combination refractor, is expressed as L=Nl, and wherein l is refractive elements axis
To thickness.
Any material that absorption characteristic meets following equation may be selected in the x-ray diAN_SNhragm, generally selects the metals such as copper, lead
Material,
The absorption coefficient of X-ray band material：
Wherein NARepresent Avgadro constant, r0Electron radius is represented, A represents atomic mass, f2Represent atomic scattering because
Son, ρ represent electron density, and the element species in i representation compounds are i=1 when material is simple substance.
The material thickness t of the x-ray diAN_SNhragm meets expression formula e-β·t＜ ＜ 1.
Claims (3)
1. a kind of X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized, which is characterized in that institute
X-ray dioptric apparatus is stated with X-ray array combination refractor close to placement, the X-ray dioptric apparatus has for realizing incident X
The reshaping structure of ray beam shaping, the reshaping structure refer to X-ray dioptric apparatus in X-ray array combination refractor
Positive and negative level-one compound lens refractive power θ angles, to positive and negative 2 angles θ of two level compound lens refractive power in X-ray array combination refractor
Degree, and so on, the final class directional light for realizing combination refractor single to each in X-ray array combination refractor
It is incident.
2. the X-ray dioptric apparatus as described in claim 1 for X-ray array combination refractor integrated package to be miniaturized,
It is characterized in that, the X-ray dioptric apparatus selective refraction characteristic meets any simple substance or compound-material of following equation,
The refraction coefficient of X-ray band material：
Wherein, NARepresent Avgadro constant, r0Electron radius is represented, λ represents wavelength, and A represents atomic mass, and subscript i is indicated
Element species in compound, subscript j are positive integer, and ρ represents electron density, and subscript i indicates the element species in compound, when
I=1 when material is simple substance, v represent atom number, and subscript i indicates that the element species in compound, subscript j are positive integer, Z generations
Table atomic number, subscript i indicate the element species in compound.
3. the X-ray refractive power as claimed in claim 1 or 2 for X-ray array combination refractor integrated package to be miniaturized
Device, which is characterized in that the non-refractive power area material thickness t of the X-ray dioptric apparatusZ0It indicates, the non-folding of the X-ray dioptric apparatus
Light sector width size TZ=T0+2G2, T0For the width of zero level euphotic zone；tZ0For the material thickness in non-refractive power area, the material in refractive power area
Expect thickness tZMIt is calculated by following equation：
tZM=tZ0+TM·tan(0.5M·θ) (2)。
Wherein, G2For the width of positive and negative two level light blocking band, TMFor the width of euphotic zone.
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| CN201810366332.XA CN108398449B (en) | 2018-04-23 | 2018-04-23 | X-ray refractor for miniaturized integrated assembly of X-ray array combined with refractive lens |
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| CN201810366332.XA CN108398449B (en) | 2018-04-23 | 2018-04-23 | X-ray refractor for miniaturized integrated assembly of X-ray array combined with refractive lens |
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| CN108398449B CN108398449B (en) | 2020-06-30 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06245122A (en) * | 1993-02-17 | 1994-09-02 | Toshiba Corp | Image pickup device |
| KR20060086076A (en) * | 2005-01-26 | 2006-07-31 | 최재호 | Fabrication method of the x-ray compound refractive lens system |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | Device and method for focusing and leveling based on microlens array |
| CN103454298A (en) * | 2013-08-15 | 2013-12-18 | 浙江工业大学 | Microbeam X-ray fluorescence analytical method |
| CN208432556U (en) * | 2018-04-23 | 2019-01-25 | 浙江工业大学 | For the X-ray dioptric apparatus of X-ray array combination refractor integrated package to be miniaturized |
-
2018
- 2018-04-23 CN CN201810366332.XA patent/CN108398449B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06245122A (en) * | 1993-02-17 | 1994-09-02 | Toshiba Corp | Image pickup device |
| KR20060086076A (en) * | 2005-01-26 | 2006-07-31 | 최재호 | Fabrication method of the x-ray compound refractive lens system |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | Device and method for focusing and leveling based on microlens array |
| CN103454298A (en) * | 2013-08-15 | 2013-12-18 | 浙江工业大学 | Microbeam X-ray fluorescence analytical method |
| CN208432556U (en) * | 2018-04-23 | 2019-01-25 | 浙江工业大学 | For the X-ray dioptric apparatus of X-ray array combination refractor integrated package to be miniaturized |
Non-Patent Citations (1)
| Title |
|---|
| 乐孜纯等: "高能X射线组合透镜聚焦性能的实验结果", 《光学学报》 * |
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