CN108369385A - 生物芯片制作用紫外线曝光装置 - Google Patents

生物芯片制作用紫外线曝光装置 Download PDF

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Publication number
CN108369385A
CN108369385A CN201680072701.3A CN201680072701A CN108369385A CN 108369385 A CN108369385 A CN 108369385A CN 201680072701 A CN201680072701 A CN 201680072701A CN 108369385 A CN108369385 A CN 108369385A
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CN
China
Prior art keywords
mounting portion
exposure apparatus
exposed mask
biochip
ultraviolet exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201680072701.3A
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English (en)
Chinese (zh)
Inventor
郭凤燮
郑錤洙
李强昈
朴庆泽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Institute of Machinery and Materials KIMM
Original Assignee
Korea Institute of Machinery and Materials KIMM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Institute of Machinery and Materials KIMM filed Critical Korea Institute of Machinery and Materials KIMM
Publication of CN108369385A publication Critical patent/CN108369385A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
CN201680072701.3A 2015-12-14 2016-12-02 生物芯片制作用紫外线曝光装置 Pending CN108369385A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020150178081A KR101764836B1 (ko) 2015-12-14 2015-12-14 바이오칩 제작용 자외선 노광 장치
KR10-2015-0178081 2015-12-14
PCT/KR2016/014103 WO2017105014A1 (ko) 2015-12-14 2016-12-02 바이오칩 제작용 자외선 노광 장치

Publications (1)

Publication Number Publication Date
CN108369385A true CN108369385A (zh) 2018-08-03

Family

ID=59056966

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680072701.3A Pending CN108369385A (zh) 2015-12-14 2016-12-02 生物芯片制作用紫外线曝光装置

Country Status (3)

Country Link
KR (1) KR101764836B1 (ko)
CN (1) CN108369385A (ko)
WO (1) WO2017105014A1 (ko)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0943849A (ja) * 1995-08-02 1997-02-14 Dainippon Screen Mfg Co Ltd 両面露光装置
CN101363984A (zh) * 2007-08-10 2009-02-11 庄添财 一种载物台升降机构
KR101256791B1 (ko) * 2012-08-27 2013-04-19 주식회사 필옵틱스 노광 장치
JP5200622B2 (ja) * 2008-03-28 2013-06-05 ウシオ電機株式会社 光照射装置におけるマスクの取り外し方法
KR101464706B1 (ko) * 2014-07-16 2014-11-28 마이다스시스템주식회사 스캔 앤 스텝 노광기
CN104637854A (zh) * 2013-11-13 2015-05-20 沈阳新松机器人自动化股份有限公司 一种用于吸附硅片的吸盘
CN104934356A (zh) * 2015-07-16 2015-09-23 北京工业大学 一种大尺寸晶圆真空吸盘

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070027013A (ko) * 2005-08-29 2007-03-09 삼성전자주식회사 노광 장치 및 이의 제어 방법
JP2007219242A (ja) 2006-02-17 2007-08-30 Mitsubishi Precision Co Ltd コンタクト露光方法及びコンタクト露光装置
KR101110790B1 (ko) * 2011-07-14 2012-02-15 주식회사 옵티레이 노광 장치
JP5867916B2 (ja) 2011-12-06 2016-02-24 国立研究開発法人産業技術総合研究所 露光装置および露光方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0943849A (ja) * 1995-08-02 1997-02-14 Dainippon Screen Mfg Co Ltd 両面露光装置
CN101363984A (zh) * 2007-08-10 2009-02-11 庄添财 一种载物台升降机构
JP5200622B2 (ja) * 2008-03-28 2013-06-05 ウシオ電機株式会社 光照射装置におけるマスクの取り外し方法
KR101256791B1 (ko) * 2012-08-27 2013-04-19 주식회사 필옵틱스 노광 장치
CN104637854A (zh) * 2013-11-13 2015-05-20 沈阳新松机器人自动化股份有限公司 一种用于吸附硅片的吸盘
KR101464706B1 (ko) * 2014-07-16 2014-11-28 마이다스시스템주식회사 스캔 앤 스텝 노광기
CN104934356A (zh) * 2015-07-16 2015-09-23 北京工业大学 一种大尺寸晶圆真空吸盘

Also Published As

Publication number Publication date
WO2017105014A1 (ko) 2017-06-22
KR101764836B1 (ko) 2017-08-14
KR20170070498A (ko) 2017-06-22

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Application publication date: 20180803