CN108350117A - 硅氧烷单体和其聚合物、含有该聚合物的组合物、电子元件 - Google Patents
硅氧烷单体和其聚合物、含有该聚合物的组合物、电子元件 Download PDFInfo
- Publication number
- CN108350117A CN108350117A CN201680062534.4A CN201680062534A CN108350117A CN 108350117 A CN108350117 A CN 108350117A CN 201680062534 A CN201680062534 A CN 201680062534A CN 108350117 A CN108350117 A CN 108350117A
- Authority
- CN
- China
- Prior art keywords
- polymer
- methyl
- layer
- organic
- particularly limited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 73
- 229920000642 polymer Polymers 0.000 title claims abstract description 69
- 239000000178 monomer Substances 0.000 title claims abstract description 63
- 125000005401 siloxanyl group Chemical group 0.000 title abstract description 23
- 239000012776 electronic material Substances 0.000 claims abstract description 42
- 239000000463 material Substances 0.000 claims description 92
- 229920002554 vinyl polymer Polymers 0.000 claims description 20
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000005977 Ethylene Substances 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 5
- 238000000576 coating method Methods 0.000 abstract description 16
- 239000011248 coating agent Substances 0.000 abstract description 14
- 239000010410 layer Substances 0.000 description 123
- -1 methoxy, methoxy ethyl Chemical group 0.000 description 97
- 238000000034 method Methods 0.000 description 63
- 239000002585 base Substances 0.000 description 56
- 239000002904 solvent Substances 0.000 description 42
- 230000015572 biosynthetic process Effects 0.000 description 41
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 38
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 38
- 230000005540 biological transmission Effects 0.000 description 26
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 24
- 238000002347 injection Methods 0.000 description 22
- 239000007924 injection Substances 0.000 description 22
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 20
- 239000012528 membrane Substances 0.000 description 20
- 230000027756 respiratory electron transport chain Effects 0.000 description 18
- 239000004411 aluminium Substances 0.000 description 16
- 229910052782 aluminium Inorganic materials 0.000 description 16
- 239000003795 chemical substances by application Substances 0.000 description 16
- 239000002019 doping agent Substances 0.000 description 15
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 125000001118 alkylidene group Chemical group 0.000 description 13
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 13
- 150000002148 esters Chemical class 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 12
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000010538 cationic polymerization reaction Methods 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 235000010290 biphenyl Nutrition 0.000 description 8
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 229920002521 macromolecule Polymers 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 239000003505 polymerization initiator Substances 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 8
- 125000002947 alkylene group Chemical group 0.000 description 7
- 239000003849 aromatic solvent Substances 0.000 description 7
- 239000004305 biphenyl Substances 0.000 description 7
- 150000002170 ethers Chemical class 0.000 description 7
- 229930192474 thiophene Natural products 0.000 description 7
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- 125000000129 anionic group Chemical group 0.000 description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 125000001165 hydrophobic group Chemical group 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 238000010526 radical polymerization reaction Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 125000005504 styryl group Chemical group 0.000 description 6
- 150000005360 2-phenylpyridines Chemical class 0.000 description 5
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 5
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical class COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 5
- 125000003609 aryl vinyl group Chemical group 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000007646 gravure printing Methods 0.000 description 5
- 238000007644 letterpress printing Methods 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 229940083082 pyrimidine derivative acting on arteriolar smooth muscle Drugs 0.000 description 5
- 150000003230 pyrimidines Chemical class 0.000 description 5
- 150000003921 pyrrolotriazines Chemical class 0.000 description 5
- 150000003440 styrenes Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- YTZKOQUCBOVLHL-UHFFFAOYSA-N tert-butylbenzene Chemical compound CC(C)(C)C1=CC=CC=C1 YTZKOQUCBOVLHL-UHFFFAOYSA-N 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 4
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229960003540 oxyquinoline Drugs 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 125000006617 triphenylamine group Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 235000016804 zinc Nutrition 0.000 description 4
- JNBVLGDICHLLTN-DZUOILHNSA-N (2s)-2-acetamido-n-[(2s,3s)-4-[[[(2s)-2-acetamido-3-methylbutanoyl]amino]-(cyclohexylmethyl)amino]-3-hydroxy-1-phenylbutan-2-yl]-3-methylbutanamide Chemical compound C([C@H](NC(=O)[C@@H](NC(C)=O)C(C)C)[C@@H](O)CN(CC1CCCCC1)NC(=O)[C@@H](NC(C)=O)C(C)C)C1=CC=CC=C1 JNBVLGDICHLLTN-DZUOILHNSA-N 0.000 description 3
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical class C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 3
- NEKANQSSYILWHA-UHFFFAOYSA-N 1-bromopenta-1,3-diene Chemical class CC=CC=CBr NEKANQSSYILWHA-UHFFFAOYSA-N 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical group CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 3
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- NPRDEIDCAUHOJU-UHFFFAOYSA-N [Pt].N1C(C=C2N=C(C=C3NC(=C4)C=C3)C=C2)=CC=C1C=C1C=CC4=N1 Chemical class [Pt].N1C(C=C2N=C(C=C3NC(=C4)C=C3)C=C2)=CC=C1C=C1C=CC4=N1 NPRDEIDCAUHOJU-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- UFVXQDWNSAGPHN-UHFFFAOYSA-K bis[(2-methylquinolin-8-yl)oxy]-(4-phenylphenoxy)alumane Chemical compound [Al+3].C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC([O-])=CC=C1C1=CC=CC=C1 UFVXQDWNSAGPHN-UHFFFAOYSA-K 0.000 description 3
- 150000001716 carbazoles Chemical class 0.000 description 3
- 229920001577 copolymer Chemical group 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical group C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910003472 fullerene Inorganic materials 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229940091250 magnesium supplement Drugs 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920002098 polyfluorene Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000004260 weight control Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical class CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- WWMRJCUZPJJWBC-UHFFFAOYSA-N 4-methyl-2-phenylpyridine Chemical compound CC1=CC=NC(C=2C=CC=CC=2)=C1 WWMRJCUZPJJWBC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 2
- PQMOXTJVIYEOQL-UHFFFAOYSA-N Cumarin Natural products CC(C)=CCC1=C(O)C(C(=O)C(C)CC)=C(O)C2=C1OC(=O)C=C2CCC PQMOXTJVIYEOQL-UHFFFAOYSA-N 0.000 description 2
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- FSOGIJPGPZWNGO-UHFFFAOYSA-N Meomammein Natural products CCC(C)C(=O)C1=C(O)C(CC=C(C)C)=C(O)C2=C1OC(=O)C=C2CCC FSOGIJPGPZWNGO-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- PWATWSYOIIXYMA-UHFFFAOYSA-N Pentylbenzene Chemical compound CCCCCC1=CC=CC=C1 PWATWSYOIIXYMA-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 125000004858 cycloalkoxyalkyl group Chemical group 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000003205 fragrance Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- JKOBSQZGXNEPFJ-UHFFFAOYSA-N iridium;2-(4-methylphenyl)pyridine Chemical compound [Ir].C1=CC(C)=CC=C1C1=CC=CC=N1 JKOBSQZGXNEPFJ-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- SZAVVKVUMPLRRS-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].C[CH-]C SZAVVKVUMPLRRS-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 150000004866 oxadiazoles Chemical class 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 2
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000004032 porphyrins Chemical class 0.000 description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- VTGOHKSTWXHQJK-UHFFFAOYSA-N pyrimidin-2-ol Chemical compound OC1=NC=CC=N1 VTGOHKSTWXHQJK-UHFFFAOYSA-N 0.000 description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 2
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- HGXJDMCMYLEZMJ-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOOC(=O)C(C)(C)C HGXJDMCMYLEZMJ-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UDSWRXKMHZVDEL-UHFFFAOYSA-N 1-(2-chloroethyl)-4-ethenylbenzene Chemical compound ClCCC1=CC=C(C=C)C=C1 UDSWRXKMHZVDEL-UHFFFAOYSA-N 0.000 description 1
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 1
- LKNKAEWGISYACD-UHFFFAOYSA-N 1-bromobuta-1,3-diene Chemical compound BrC=CC=C LKNKAEWGISYACD-UHFFFAOYSA-N 0.000 description 1
- RQLNMZLEJJTAEJ-UHFFFAOYSA-N 1-bromohepta-1,3-diene Chemical compound CCCC=CC=CBr RQLNMZLEJJTAEJ-UHFFFAOYSA-N 0.000 description 1
- ADPNZTCDHSGHOG-UHFFFAOYSA-N 1-bromohexa-1,3-diene Chemical class CCC=CC=CBr ADPNZTCDHSGHOG-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical class ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- PCPYTNCQOSFKGG-UHFFFAOYSA-N 1-chlorobuta-1,3-diene Chemical compound ClC=CC=C PCPYTNCQOSFKGG-UHFFFAOYSA-N 0.000 description 1
- COMZORFLVUPZAU-UHFFFAOYSA-N 1-chlorohepta-1,3-diene Chemical compound CCCC=CC=CCl COMZORFLVUPZAU-UHFFFAOYSA-N 0.000 description 1
- YNHSMXYDYCINCR-UHFFFAOYSA-N 1-chlorohexa-1,3-diene Chemical class CCC=CC=CCl YNHSMXYDYCINCR-UHFFFAOYSA-N 0.000 description 1
- PEUWKAAVXXUTRM-UHFFFAOYSA-N 1-chloropenta-1,3-diene Chemical class CC=CC=CCl PEUWKAAVXXUTRM-UHFFFAOYSA-N 0.000 description 1
- QIUCYKBVFAPWRR-UHFFFAOYSA-N 1-ethenoxy-3-methylbutane Chemical class CC(C)CCOC=C QIUCYKBVFAPWRR-UHFFFAOYSA-N 0.000 description 1
- OUHXOFQWNHOALJ-UHFFFAOYSA-N 1-ethenoxy-4-fluorobenzene Chemical class FC1=CC=C(OC=C)C=C1 OUHXOFQWNHOALJ-UHFFFAOYSA-N 0.000 description 1
- SWZSKZZXXULJHU-UHFFFAOYSA-N 1-ethenoxyheptane Chemical class CCCCCCCOC=C SWZSKZZXXULJHU-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- IOSXLUZXMXORMX-UHFFFAOYSA-N 1-ethenoxypentane Chemical class CCCCCOC=C IOSXLUZXMXORMX-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical class CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- UALKQROXOHJHFG-UHFFFAOYSA-N 1-ethoxy-3-methylbenzene Chemical compound CCOC1=CC=CC(C)=C1 UALKQROXOHJHFG-UHFFFAOYSA-N 0.000 description 1
- BLMBNEVGYRXFNA-UHFFFAOYSA-N 1-methoxy-2,3-dimethylbenzene Chemical compound COC1=CC=CC(C)=C1C BLMBNEVGYRXFNA-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- XNCMQRWVMWLODV-UHFFFAOYSA-N 1-phenylbenzimidazole Chemical class C1=NC2=CC=CC=C2N1C1=CC=CC=C1 XNCMQRWVMWLODV-UHFFFAOYSA-N 0.000 description 1
- IBTLFDCPAJLATQ-UHFFFAOYSA-N 1-prop-2-enoxybutane Chemical compound CCCCOCC=C IBTLFDCPAJLATQ-UHFFFAOYSA-N 0.000 description 1
- YEBQUUKDSJCPIX-UHFFFAOYSA-N 12h-benzo[a]thioxanthene Chemical compound C1=CC=CC2=C3CC4=CC=CC=C4SC3=CC=C21 YEBQUUKDSJCPIX-UHFFFAOYSA-N 0.000 description 1
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 1
- XKLNOVWDVMWTOB-UHFFFAOYSA-N 2,3,4,9-tetrahydro-1h-carbazole Chemical class N1C2=CC=CC=C2C2=C1CCCC2 XKLNOVWDVMWTOB-UHFFFAOYSA-N 0.000 description 1
- MVWPVABZQQJTPL-UHFFFAOYSA-N 2,3-diphenylcyclohexa-2,5-diene-1,4-dione Chemical class O=C1C=CC(=O)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MVWPVABZQQJTPL-UHFFFAOYSA-N 0.000 description 1
- UOCMXZLNHQBBOS-UHFFFAOYSA-N 2-(1,3-benzoxazol-2-yl)phenol zinc Chemical compound [Zn].Oc1ccccc1-c1nc2ccccc2o1.Oc1ccccc1-c1nc2ccccc2o1 UOCMXZLNHQBBOS-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- FQJQNLKWTRGIEB-UHFFFAOYSA-N 2-(4-tert-butylphenyl)-5-[3-[5-(4-tert-butylphenyl)-1,3,4-oxadiazol-2-yl]phenyl]-1,3,4-oxadiazole Chemical compound C1=CC(C(C)(C)C)=CC=C1C1=NN=C(C=2C=C(C=CC=2)C=2OC(=NN=2)C=2C=CC(=CC=2)C(C)(C)C)O1 FQJQNLKWTRGIEB-UHFFFAOYSA-N 0.000 description 1
- QZVHYFUVMQIGGM-UHFFFAOYSA-N 2-Hexylthiophene Chemical compound CCCCCCC1=CC=CS1 QZVHYFUVMQIGGM-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- NBYLBWHHTUWMER-UHFFFAOYSA-N 2-Methylquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(C)=CC=C21 NBYLBWHHTUWMER-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 1
- IQHSSYROJYPFDV-UHFFFAOYSA-N 2-bromo-1,3-dichloro-5-(trifluoromethyl)benzene Chemical group FC(F)(F)C1=CC(Cl)=C(Br)C(Cl)=C1 IQHSSYROJYPFDV-UHFFFAOYSA-N 0.000 description 1
- XSDKSXYJOKNMQQ-UHFFFAOYSA-N 2-butyl-2-ethylheptanoic acid Chemical group CCCCCC(CC)(C(O)=O)CCCC XSDKSXYJOKNMQQ-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- POXIZPBFFUKMEQ-UHFFFAOYSA-N 2-cyanoethenylideneazanide Chemical group [N-]=C=[C+]C#N POXIZPBFFUKMEQ-UHFFFAOYSA-N 0.000 description 1
- QUTGXAIWZAMYEM-UHFFFAOYSA-N 2-cyclopentyloxyethanamine Chemical compound NCCOC1CCCC1 QUTGXAIWZAMYEM-UHFFFAOYSA-N 0.000 description 1
- PGYJSURPYAAOMM-UHFFFAOYSA-N 2-ethenoxy-2-methylpropane Chemical compound CC(C)(C)OC=C PGYJSURPYAAOMM-UHFFFAOYSA-N 0.000 description 1
- PIUJWWBOMGMSAY-UHFFFAOYSA-N 2-ethenoxybutane Chemical compound CCC(C)OC=C PIUJWWBOMGMSAY-UHFFFAOYSA-N 0.000 description 1
- XMHDLKFMJMNOAX-UHFFFAOYSA-N 2-methyl-3-(2-methylprop-2-enoxy)prop-1-ene Chemical compound CC(=C)COCC(C)=C XMHDLKFMJMNOAX-UHFFFAOYSA-N 0.000 description 1
- DTFKRVXLBCAIOZ-UHFFFAOYSA-N 2-methylanisole Chemical compound COC1=CC=CC=C1C DTFKRVXLBCAIOZ-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N 2-methylbut-2-enoic acid Chemical compound CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 1
- SKPOBHBERPAXFE-UHFFFAOYSA-N 2-methylhepta-1,3-diene Chemical group CCCC=CC(C)=C SKPOBHBERPAXFE-UHFFFAOYSA-N 0.000 description 1
- DIHCXHRMHVDKKT-UHFFFAOYSA-N 2-n-(2-methylphenyl)-1-n,1-n,2-n-triphenylbenzene-1,2-diamine Chemical compound CC1=CC=CC=C1N(C=1C(=CC=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DIHCXHRMHVDKKT-UHFFFAOYSA-N 0.000 description 1
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 1
- ZEOMRHKTIYBETG-UHFFFAOYSA-N 2-phenyl-1,3,4-oxadiazole Chemical compound O1C=NN=C1C1=CC=CC=C1 ZEOMRHKTIYBETG-UHFFFAOYSA-N 0.000 description 1
- PGMVMQKSOQOICN-UHFFFAOYSA-N 2-phenyl-1,5-dihydropyrazole Chemical class C1=CCNN1C1=CC=CC=C1 PGMVMQKSOQOICN-UHFFFAOYSA-N 0.000 description 1
- QLPKTAFPRRIFQX-UHFFFAOYSA-N 2-thiophen-2-ylpyridine Chemical compound C1=CSC(C=2N=CC=CC=2)=C1 QLPKTAFPRRIFQX-UHFFFAOYSA-N 0.000 description 1
- MHIITNFQDPFSES-UHFFFAOYSA-N 25,26,27,28-tetrazahexacyclo[16.6.1.13,6.18,11.113,16.019,24]octacosa-1(25),2,4,6,8(27),9,11,13,15,17,19,21,23-tridecaene Chemical compound N1C(C=C2C3=CC=CC=C3C(C=C3NC(=C4)C=C3)=N2)=CC=C1C=C1C=CC4=N1 MHIITNFQDPFSES-UHFFFAOYSA-N 0.000 description 1
- RNKGDBXXIBUOTR-UHFFFAOYSA-N 3,6-dioxocyclohexa-1,4-diene-1-carbonitrile Chemical class O=C1C=CC(=O)C(C#N)=C1 RNKGDBXXIBUOTR-UHFFFAOYSA-N 0.000 description 1
- OJPSFJLSZZTSDF-UHFFFAOYSA-N 3-ethoxyprop-1-ene Chemical compound CCOCC=C OJPSFJLSZZTSDF-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical class COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- YHQXBTXEYZIYOV-UHFFFAOYSA-N 3-methylbut-1-ene Chemical group CC(C)C=C YHQXBTXEYZIYOV-UHFFFAOYSA-N 0.000 description 1
- GMEQIEASMOFEOC-UHFFFAOYSA-N 4-[3,5-bis[4-(4-methoxy-n-(4-methoxyphenyl)anilino)phenyl]phenyl]-n,n-bis(4-methoxyphenyl)aniline Chemical compound C1=CC(OC)=CC=C1N(C=1C=CC(=CC=1)C=1C=C(C=C(C=1)C=1C=CC(=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C=1C=CC(=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 GMEQIEASMOFEOC-UHFFFAOYSA-N 0.000 description 1
- XVMUGTFNHXHZIP-UHFFFAOYSA-N 4-[3,5-bis[4-(n-phenylanilino)phenyl]phenyl]-n,n-diphenylaniline Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=C(C=C(C=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 XVMUGTFNHXHZIP-UHFFFAOYSA-N 0.000 description 1
- DIVZFUBWFAOMCW-UHFFFAOYSA-N 4-n-(3-methylphenyl)-1-n,1-n-bis[4-(n-(3-methylphenyl)anilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 DIVZFUBWFAOMCW-UHFFFAOYSA-N 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- LTUJKAYZIMMJEP-UHFFFAOYSA-N 9-[4-(4-carbazol-9-yl-2-methylphenyl)-3-methylphenyl]carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(C=2C(=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C)C(C)=C1 LTUJKAYZIMMJEP-UHFFFAOYSA-N 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- JSCDRZWWKKKITM-UHFFFAOYSA-N C(C)(=O)OCCOCC.C1(CCCC1)C1CCCC1.CC(C(=O)O)=C Chemical compound C(C)(=O)OCCOCC.C1(CCCC1)C1CCCC1.CC(C(=O)O)=C JSCDRZWWKKKITM-UHFFFAOYSA-N 0.000 description 1
- KDOKHBNNNHBVNJ-UHFFFAOYSA-N C1=CC=CC=2C3=CC=CC=C3C3=CC=CC=C3C12.N1C=CC=CC=C1 Chemical group C1=CC=CC=2C3=CC=CC=C3C3=CC=CC=C3C12.N1C=CC=CC=C1 KDOKHBNNNHBVNJ-UHFFFAOYSA-N 0.000 description 1
- KRWRRPMZUJNIEF-UHFFFAOYSA-N C1=CC=CC=2C=CC=3SC=4C=CC=CC4CC3C21.N2C=CC=CC=C2 Chemical compound C1=CC=CC=2C=CC=3SC=4C=CC=CC4CC3C21.N2C=CC=CC=C2 KRWRRPMZUJNIEF-UHFFFAOYSA-N 0.000 description 1
- KCMZYCFSSYXEQR-UHFFFAOYSA-N CCCC[K] Chemical compound CCCC[K] KCMZYCFSSYXEQR-UHFFFAOYSA-N 0.000 description 1
- IRDQNLLVRXMERV-UHFFFAOYSA-N CCCC[Na] Chemical compound CCCC[Na] IRDQNLLVRXMERV-UHFFFAOYSA-N 0.000 description 1
- IZJWZHLIDBZPNZ-UHFFFAOYSA-N CCCC[Zn]CC Chemical compound CCCC[Zn]CC IZJWZHLIDBZPNZ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010011703 Cyanosis Diseases 0.000 description 1
- 229910016460 CzSi Inorganic materials 0.000 description 1
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Chemical group CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229910000574 NaK Inorganic materials 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 241001597008 Nomeidae Species 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- GWFGARXUJNKOMY-UHFFFAOYSA-N [3,5-di(carbazol-9-yl)phenyl]-triphenylsilane Chemical compound C1=CC=CC=C1[Si](C=1C=C(C=C(C=1)N1C2=CC=CC=C2C2=CC=CC=C21)N1C2=CC=CC=C2C2=CC=CC=C21)(C=1C=CC=CC=1)C1=CC=CC=C1 GWFGARXUJNKOMY-UHFFFAOYSA-N 0.000 description 1
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 1
- WIHKEPSYODOQJR-UHFFFAOYSA-N [9-(4-tert-butylphenyl)-6-triphenylsilylcarbazol-3-yl]-triphenylsilane Chemical compound C1=CC(C(C)(C)C)=CC=C1N1C2=CC=C([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)C=C2C2=CC([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=C21 WIHKEPSYODOQJR-UHFFFAOYSA-N 0.000 description 1
- PHSPFUQAZNIVCH-UHFFFAOYSA-M [Mg].[I-].C[N+]1=CC=CC=C1 Chemical compound [Mg].[I-].C[N+]1=CC=CC=C1 PHSPFUQAZNIVCH-UHFFFAOYSA-M 0.000 description 1
- NSIKFNOYIGGILA-UHFFFAOYSA-N [Na].[Na].[K] Chemical compound [Na].[Na].[K] NSIKFNOYIGGILA-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- MHICDEGMTGZTML-UHFFFAOYSA-N [Pt].CC1=CC=C(C=C1)C1=NC=CC=C1 Chemical compound [Pt].CC1=CC=C(C=C1)C1=NC=CC=C1 MHICDEGMTGZTML-UHFFFAOYSA-N 0.000 description 1
- GTYLEVMOSBBKCQ-UHFFFAOYSA-N acetic acid;2-(2-ethoxyethoxy)ethanol Chemical class CC(O)=O.CCOCCOCCO GTYLEVMOSBBKCQ-UHFFFAOYSA-N 0.000 description 1
- BYNPVFHVZRNRQD-UHFFFAOYSA-N acetic acid;benzene Chemical compound CC(O)=O.C1=CC=CC=C1 BYNPVFHVZRNRQD-UHFFFAOYSA-N 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical class COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000006231 alkoxy propyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 125000004653 anthracenylene group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229940049706 benzodiazepine Drugs 0.000 description 1
- UDEWPOVQBGFNGE-UHFFFAOYSA-N benzoic acid n-propyl ester Natural products CCCOC(=O)C1=CC=CC=C1 UDEWPOVQBGFNGE-UHFFFAOYSA-N 0.000 description 1
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 125000004541 benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- GQVWHWAWLPCBHB-UHFFFAOYSA-L beryllium;benzo[h]quinolin-10-olate Chemical compound [Be+2].C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21.C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21 GQVWHWAWLPCBHB-UHFFFAOYSA-L 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- ZPFKRQXYKULZKP-UHFFFAOYSA-N butylidene Chemical group [CH2+]CC[CH-] ZPFKRQXYKULZKP-UHFFFAOYSA-N 0.000 description 1
- DLIJPAHLBJIQHE-UHFFFAOYSA-N butylphosphane Chemical group CCCCP DLIJPAHLBJIQHE-UHFFFAOYSA-N 0.000 description 1
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- QZHPTGXQGDFGEN-UHFFFAOYSA-N chromene Chemical compound C1=CC=C2C=C[CH]OC2=C1 QZHPTGXQGDFGEN-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical class C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000004212 difluorophenyl group Chemical group 0.000 description 1
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 229920000775 emeraldine polymer Polymers 0.000 description 1
- ORAFCUXGWRDXAC-UHFFFAOYSA-N ethenoxycyclooctane Chemical class C=COC1CCCCCCC1 ORAFCUXGWRDXAC-UHFFFAOYSA-N 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical group C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229940035423 ethyl ether Drugs 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- TZMFJUDUGYTVRY-UHFFFAOYSA-N ethyl methyl diketone Natural products CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N glycolonitrile Natural products N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- OGQVROWWFUXRST-UHFFFAOYSA-N hepta-1,3-diene Chemical compound CCCC=CC=C OGQVROWWFUXRST-UHFFFAOYSA-N 0.000 description 1
- KDEZIUOWTXJEJK-UHFFFAOYSA-N heptacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC6=CC7=CC=CC=C7C=C6C=C5C=C4C=C3C=C21 KDEZIUOWTXJEJK-UHFFFAOYSA-N 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- YJSSCAJSFIGKSN-UHFFFAOYSA-N hex-1-en-2-ylbenzene Chemical compound CCCCC(=C)C1=CC=CC=C1 YJSSCAJSFIGKSN-UHFFFAOYSA-N 0.000 description 1
- QSQIGGCOCHABAP-UHFFFAOYSA-N hexacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC6=CC=CC=C6C=C5C=C4C=C3C=C21 QSQIGGCOCHABAP-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- GRPQBOKWXNIQMF-UHFFFAOYSA-N indium(3+) oxygen(2-) tin(4+) Chemical class [Sn+4].[O-2].[In+3] GRPQBOKWXNIQMF-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- YERGTYJYQCLVDM-UHFFFAOYSA-N iridium(3+);2-(4-methylphenyl)pyridine Chemical compound [Ir+3].C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1 YERGTYJYQCLVDM-UHFFFAOYSA-N 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- IHLVCKWPAMTVTG-UHFFFAOYSA-N lithium;carbanide Chemical compound [Li+].[CH3-] IHLVCKWPAMTVTG-UHFFFAOYSA-N 0.000 description 1
- YNXURHRFIMQACJ-UHFFFAOYSA-N lithium;methanidylbenzene Chemical compound [Li+].[CH2-]C1=CC=CC=C1 YNXURHRFIMQACJ-UHFFFAOYSA-N 0.000 description 1
- XBEREOHJDYAKDA-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].CC[CH2-] XBEREOHJDYAKDA-UHFFFAOYSA-N 0.000 description 1
- SKEDXQSRJSUMRP-UHFFFAOYSA-N lithium;quinolin-8-ol Chemical compound [Li].C1=CN=C2C(O)=CC=CC2=C1 SKEDXQSRJSUMRP-UHFFFAOYSA-N 0.000 description 1
- 238000010550 living polymerization reaction Methods 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- IWCVDCOJSPWGRW-UHFFFAOYSA-M magnesium;benzene;chloride Chemical compound [Mg+2].[Cl-].C1=CC=[C-]C=C1 IWCVDCOJSPWGRW-UHFFFAOYSA-M 0.000 description 1
- KJJBSBKRXUVBMX-UHFFFAOYSA-N magnesium;butane Chemical compound [Mg+2].CCC[CH2-].CCC[CH2-] KJJBSBKRXUVBMX-UHFFFAOYSA-N 0.000 description 1
- NXPHGHWWQRMDIA-UHFFFAOYSA-M magnesium;carbanide;bromide Chemical compound [CH3-].[Mg+2].[Br-] NXPHGHWWQRMDIA-UHFFFAOYSA-M 0.000 description 1
- CCERQOYLJJULMD-UHFFFAOYSA-M magnesium;carbanide;chloride Chemical compound [CH3-].[Mg+2].[Cl-] CCERQOYLJJULMD-UHFFFAOYSA-M 0.000 description 1
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- HJYKVGWOAOLIKY-UHFFFAOYSA-N methyl 2-methylidenenonanoate Chemical compound CCCCCCCC(=C)C(=O)OC HJYKVGWOAOLIKY-UHFFFAOYSA-N 0.000 description 1
- OLXYLDUSSBULGU-UHFFFAOYSA-N methyl pyridine-4-carboxylate Chemical compound COC(=O)C1=CC=NC=C1 OLXYLDUSSBULGU-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- MHNNAWXXUZQSNM-UHFFFAOYSA-N methylethylethylene Natural products CCC(C)=C MHNNAWXXUZQSNM-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical class C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- SLBHRPOLVUEFSG-UHFFFAOYSA-N naphthalene-2,6-dione Chemical class O=C1C=CC2=CC(=O)C=CC2=C1 SLBHRPOLVUEFSG-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- LKEDKQWWISEKSW-UHFFFAOYSA-N nonyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCOC(=O)C(C)=C LKEDKQWWISEKSW-UHFFFAOYSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- SJHHDDDGXWOYOE-UHFFFAOYSA-N oxytitamium phthalocyanine Chemical compound [Ti+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 SJHHDDDGXWOYOE-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- AOCTZXQONZALCQ-UHFFFAOYSA-N phenol;selenium Chemical compound [Se].OC1=CC=CC=C1 AOCTZXQONZALCQ-UHFFFAOYSA-N 0.000 description 1
- DYUMLJSJISTVPV-UHFFFAOYSA-N phenyl propanoate Chemical compound CCC(=O)OC1=CC=CC=C1 DYUMLJSJISTVPV-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 1
- ANRQGKOBLBYXFM-UHFFFAOYSA-M phenylmagnesium bromide Chemical compound Br[Mg]C1=CC=CC=C1 ANRQGKOBLBYXFM-UHFFFAOYSA-M 0.000 description 1
- MTZWHHIREPJPTG-UHFFFAOYSA-N phorone Chemical compound CC(C)=CC(=O)C=C(C)C MTZWHHIREPJPTG-UHFFFAOYSA-N 0.000 description 1
- 229930193351 phorone Natural products 0.000 description 1
- 150000003004 phosphinoxides Chemical class 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000035935 pregnancy Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- 125000006233 propoxy propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DSNYFFJTZPIKFZ-UHFFFAOYSA-N propoxybenzene Chemical compound CCCOC1=CC=CC=C1 DSNYFFJTZPIKFZ-UHFFFAOYSA-N 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- MKWQJYNEKZKCSA-UHFFFAOYSA-N quinoxaline Chemical compound N1=C=C=NC2=CC=CC=C21 MKWQJYNEKZKCSA-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- JLAVCPKULITDHO-UHFFFAOYSA-N tetraphenylsilane Chemical compound C1=CC=CC=C1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 JLAVCPKULITDHO-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- XFFLUQVYZHRJOA-UHFFFAOYSA-N triphenyl-(2-phenylphenyl)silane Chemical group C1(=CC=CC=C1)[Si](C1=C(C=CC=C1)C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 XFFLUQVYZHRJOA-UHFFFAOYSA-N 0.000 description 1
- XQKGOOYAZCXERG-UHFFFAOYSA-N triphenyl-(2-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C(=CC=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XQKGOOYAZCXERG-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical class C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- HEPBQSXQJMTVFI-UHFFFAOYSA-N zinc;butane Chemical compound [Zn+2].CCC[CH2-].CCC[CH2-] HEPBQSXQJMTVFI-UHFFFAOYSA-N 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
- C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/068—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F30/08—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
- C08L51/085—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/22—Luminous paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/12—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
- H10K85/342—Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/001—Conductive additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
- C08K5/3417—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1059—Heterocyclic compounds characterised by ligands containing three nitrogen atoms as heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/18—Metal complexes
- C09K2211/185—Metal complexes of the platinum group, i.e. Os, Ir, Pt, Ru, Rh or Pd
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/10—Triplet emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/12—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants
- H10K50/121—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants for assisting energy transfer, e.g. sensitization
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Silicon Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
目的在于,提供:通过添加至涂布成膜中使用的电子材料组合物·墨从而改善所得涂膜的平滑性(流平性)、且不使电子元件的驱动稳定性降低的、由新型单体得到的聚合物、含有该聚合物的组合物、电子材料组合物、以及电子元件。本发明的新型的硅氧烷单体、该聚合物、含有该聚合物的组合物、电子材料组合物能制作平滑的有机薄膜,含有这些组合物的电子元件的元件寿命长,且驱动稳定性得到改善。
Description
技术领域
本发明涉及硅氧烷单体和其聚合物、进而含有该聚合物的组合物、电子材料组合物、和以含有电子材料组合物为特征的电子元件。
背景技术
近年来,TFT、太阳能电池、有机电致发光元件等电子元件的研究遍及各方面地推进。以往,这些电子元件通过真空成膜而制作,但近年来,要求基板的大面积化、制品的低成本化,因此,利用印刷的电子元件制造法受到关注。
若从材料的方面出发将该电子元件分类,则可以分为低分子系材料和高分子系材料。
关于低分子系电子材料,在以往使用的真空成膜的基础上,近年来,进行了利用喷墨、喷嘴喷射、柔性印刷、转印法等各种涂布方法将含电子材料的层成膜的技术的研究开发。另一方面,对于高分子系电子材料,由于分子量大,因此不适于真空成膜,从而与低分子系材料同样地主要使用上述的涂布方法。
由涂布成膜得到的半导体膜与真空成膜相比,平滑性差,使电子元件的特性降低,因此,对于能形成电子元件的平坦性优异的含半导体的层的含有机半导体的层形成用流平剂和其使用方法、含有机半导体的层形成用组合物·墨、以及有机器件和其制造方法进行了研究,例如专利文献1中提出了,含有具有特定的结构的硅氧烷化合物、(甲基)丙烯酸类聚合物或它们两者的含有机半导体的层形成用流平剂。
现有技术文献
专利文献
专利文献1:日本特开2014-205830号公报
发明内容
发明要解决的问题
然而,根据专利文献1中记载的发明,作为流平效果,所得涂膜能具有一定的平坦性,但从面向高性能的有机发光元件的观点出发,无法充分确保其平坦性。进而,对于(甲基)丙烯酸类聚合物而言,在电子元件中羰基成为电荷的捕获位点,因此,担心电子元件的发光效率、寿命等驱动稳定性的降低。其结果,有时无法得到作为所得电子元件的期望的性能。
因此,本发明的目的在于,提供:通过添加至涂布成膜中使用的电子材料组合物·墨从而改善所得涂膜的平滑性(流平性)、且不使电子元件的驱动稳定性降低的、由新型单体得到的聚合物、含有该聚合物的组合物、电子材料组合物、以及电子元件。
用于解决问题的方案
本发明人等为了解决上述课题进行了深入研究,结果发现:由本发明的新型单体得到的聚合物、含有该聚合物的组合物、电子材料组合物能制作平滑的有机薄膜,含有这些组合物的电子元件能改善驱动稳定性,至此完成了本发明。
即,本发明涉及新型单体、它的聚合物、含有该聚合物的组合物、电子材料组合物、和以含有电子材料组合物为特征的电子元件。
提供:一种通式(1)所示的单体。
[化1]
(通式(1)中,n表示1~1000,R1和R2表示任选具有醚键的烃基。另外,R3表示乙烯基、或具有乙烯基的有机基团。(其中,该有机基团在结构中不具有羰基。))
另外,一种聚合物,其是将至少选自前述通式(1)中的单体聚合而成的。
另外,一种聚合物,其是将至少选自前述通式(1)中的单体和除通式(1)以外的单体共聚而成的。
另外,一种组合物,其特征在于,含有前述聚合物。
另外,一种电子材料组合物,其特征在于,含有前述聚合物。
进而,一种电子元件,其特征在于,含有前述组合物和前述电子材料组合物。
发明的效果
根据本发明发现,含有由本发明的新型单体得到的聚合物的组合物能制作平滑的有机薄膜,由这些有机薄膜得到的电子元件的发光效率、寿命等驱动稳定性得到改善。
具体实施方式
以下,对用于实施本发明的方式进行详细说明。
[硅氧烷单体]
本发明的硅氧烷单体用下述通式(1)表示
[化2]
(通式(1)中,n表示1~1000,R1和R2表示任选具有醚键的烃基。另外,R3表示乙烯基、或具有乙烯基的有机基团。(其中,该有机基团在结构中不具有羰基。))
作为R1,没有特别限制,可以举出C1~C10烷基、C2~C10烷氧基烷基、C3~C30环烷基、C4~C30环烷氧基烷基、C6~C20的芳基、C6~C20的芳氧基。
作为前述C1~C10烷基,没有特别限制,可以举出甲基、乙基、丙基、异丙基、丁基、异丁基、仲丁基、叔丁基、戊基、己基、癸基等。
作为前述C2~C10烷氧基烷基,没有特别限制,可以举出甲氧基甲基、甲氧基乙基、乙氧基乙基、丙氧基乙基、丙氧基丙基、丁氧基丙基、丁氧基丁基、丁氧基戊基、戊氧基戊基等。
作为前述C3~C30环烷基,没有特别限制,可以举出环丙基、环丁基、环戊基、环己基、环庚基、三环[5.2.1.0(2,6)]癸基、金刚烷基等,优选碳原子数为3~18的基团。
作为前述C4~C30环烷氧基烷基,没有特别限制,可以举出环丙氧基甲基、环丁氧基乙基、环戊氧基丙基、环己氧基丙基、环庚氧基丙基、三环[5.2.1.0(2,6)]癸氧基丙基、金刚烷氧基丙基等,优选碳原子数为3~18的基团。
作为前述C6~C20的芳基,可以举出苯基、萘基、蒽基、联苯基等。
作为前述C6~C20的芳氧基,可以举出苯氧基、萘氧基、蒽氧基、联苯氧基等。
此时,构成前述C1~C10烷基、C2~C10烷氧基烷基、C3~C30环烷基、C4~C30环烷氧基烷基、C6~C20的芳基、C6~C20的芳氧基的氢原子的至少1个可以被前述记载的C1~C10烷基所取代。
其中,为了提高流平性,R1优选C1~C10烷基,为了提高与溶剂的相溶性,更优选甲基、乙基、丙基、异丙基、丁基、异丁基、仲丁基、叔丁基,为了改善电子元件特性,进一步优选甲基、乙基、丙基、丁基。
作为R2,没有特别限制,可以举出C1~C10亚烷基、C2~C10亚烷基氧亚烷基、C3~C30环亚烷基、C4~C30环亚烷基氧亚烷基、C6~C20的亚芳基、C7~C20的亚芳基氧亚烷基。
作为前述C1~C10亚烷基,没有特别限制,可以举出亚甲基、亚乙基、亚丙基、异亚丙基、亚丁基、异亚丁基、亚戊基、亚己基、亚癸基等。
作为前述C2~C10亚烷基氧亚烷基,没有特别限制,可以举出亚甲基氧亚甲基、亚乙基氧亚甲基、亚丙基氧亚乙基、亚丙基氧亚丙基、亚丙基氧亚丁基、亚丁基氧亚丁基、亚丁基氧亚戊基、亚戊基氧亚戊基等。
作为前述C3~C30环亚烷基,没有特别限制,可以举出环亚丙基、环亚丁基、环亚戊基、环亚己基、环亚庚基等,优选碳原子数为3~10的基团。
作为前述C4~C30环亚烷基氧亚烷基,没有特别限制,可以举出环亚丙基氧亚乙基、环亚丁基氧亚丙基、环亚戊基氧亚丙基、环亚己基氧亚丙基、环亚庚基氧亚丙基等,优选碳原子数为3~10的基团。
作为前述C6~C20的亚芳基,可以举出亚苯基、亚萘基、亚蒽基、亚联苯基等。
作为前述C7~C20的亚芳基氧亚烷基,可以举出亚苯基氧亚丙基、亚萘基氧亚丙基、亚蒽基氧亚丙基、亚联苯基氧亚丙基等。
此时,构成前述C1~C10亚烷基、C2~C10亚烷基氧亚烷基、C3~C30环亚烷基、C4~C30环亚烷基氧亚烷基、C6~C20的亚芳基、C7~C20的亚芳基氧亚烷基的氢原子的至少1个可以被前述记载的C1~C10烷基所取代。
其中,对于R2,为了提高流平性,优选C2~C10亚烷基氧亚烷基,为了提高溶解性,特别优选亚甲基氧亚甲基、亚甲基氧亚乙基、亚乙基氧亚乙基、亚乙基氧亚丙基、亚丙基氧亚丙基、亚丙基氧亚丁基、亚丁基氧亚丁基,为了改善电子元件特性,进一步优选亚乙基氧亚乙基、亚乙基氧亚丙基、亚丙基氧亚丙基。
R3为乙烯基或具有乙烯基的有机基团。
作为具有乙烯基的有机基团,可以举出烯丙基、2-丁烯基、3-丁烯基、3-戊烯基、4-戊烯基、5-己烯基、丁二烯基、2,4-戊二烯基、3,5-己二烯基、4,6-庚二烯基、5,7-辛二烯基等具有乙烯基的脂肪族烃基类;乙烯基氧亚甲基、乙烯基氧亚乙基、乙烯基氧亚丙基、乙烯基氧亚丁基等乙烯基氧亚烷基类;苯乙烯基;苯乙烯基亚甲基、苯乙烯基亚乙基、苯乙烯基亚丙基、苯乙烯基亚丁基等具有乙烯基的芳烷基类;苯乙烯基氧亚甲基、苯乙烯基氧亚乙基、苯乙烯基氧亚丙基、苯乙烯基氧亚丁基等苯乙烯基氧亚烷基类等。
其中,从聚合性优异的方面出发,优选乙烯基、具有乙烯基的脂肪族烃基、苯乙烯基、具有乙烯基的芳烷基,从容易设计宽范围的分子量的聚合物的方面出发,特别优选乙烯基、丁二烯基、戊二烯基、苯乙烯基、具有乙烯基的芳烷基,从所得聚合物改善电子元件的驱动稳定性的方面出发,进一步优选乙烯基、丁二烯基、2,4-戊二烯基、苯乙烯基、苯乙烯基亚甲基。
通式中,n为1~1000,从由电子材料组合物·墨得到的涂膜的平滑性优异的方面出发,优选3~500,从电子元件的驱动稳定性提高的方面出发,更优选5~200。
以下示出本发明的硅氧烷单体的具体例,但不限定于这些。
[化3]
(上述化学式中,n为1~1000的整数。)
[硅氧烷单体的制造方法]
作为本发明的硅氧烷单体的制造方法,没有特别限制,可以举出如下方法:使具有羟基的硅氧烷化合物与具有卤素基团的乙烯基化合物在碱存在下反应。
[化4]
(JNC株式会社制的Silaplane FM-0411等)
(上述化学式中,n为1~1000的整数。)
作为具有卤素基团的乙烯基化合物,例如可以举出乙烯基溴、乙烯基氯等卤代乙烯基化合物;烯丙基溴、烯丙基氯、乙烯基亚乙基溴、乙烯基亚乙基氯、乙烯基亚丙基溴、乙烯基亚丙基氯等卤代乙烯基亚烷基化合物;4-溴-1,3-丁二烯、4-氯-1,3-丁二烯等卤代丁二烯化合物;5-溴-1,3-戊二烯、5-氯-1,3-戊二烯、6-溴-1,3-己二烯、6-氯-1,3-己二烯、7-溴-1,3-庚二烯、7-氯-1,3-庚二烯等卤代烷基二烯化合物;4-溴苯乙烯、4-氯苯乙烯等卤代苯乙烯基化合物;4-溴甲基苯乙烯、4-氯甲基苯乙烯、4-溴乙基苯乙烯、4-氯乙基苯乙烯等卤代亚烷基苯乙烯基化合物等,但不限定于这些。
作为碱,没有特别限制,可以举出氢氧化钠、氢氧化钾、氢氧化铯、氢化钠、叔丁醇钠、叔丁醇钾、甲醇钠、甲醇钾等。
上述反应中,对材料的投入量没有特别限制,从收率的观点出发,优选相对于具有羟基的硅氧烷化合物加入具有卤素基团的乙烯基化合物1~5当量。另外,对于碱的投入量,从收率的观点出发,优选相对于具有羟基的硅氧烷加入1~5当量。优选在反应温度为10~80℃、反应气氛为非活性气体气氛下进行。进而,也可以添加碘化钾等催化剂。
[使硅氧烷单体聚合而成的聚合物]
使本发明的硅氧烷单体聚合而成的聚合物可以为使通式(1)所示的硅氧烷单体均聚而成的聚合物,也可以为使通式(1)所示的硅氧烷单体与除通式(1)以外的单体共聚而成的聚合物。
除通式(1)以外的单体没有特别限制,例如可以使用公知常用的(甲基)丙烯酸酯单体、苯乙烯基单体、乙烯基醚单体、烯丙基单体等。
作为(甲基)丙烯酸酯单体,没有特别限制,可以举出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸-正丁酯、(甲基)丙烯酸-叔丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸十二烷酯、(甲基)丙烯酸十四烷酯、(甲基)丙烯酸十六烷酯、(甲基)丙烯酸十八烷酯、(甲基)丙烯酸二十二烷酯等(甲基)丙烯酸烷基酯类;(甲基)丙烯酸环己酯、(甲基)丙烯酸异冰片酯、(甲基)丙烯酸二环戊酯、(甲基)丙烯酸二环戊基氧乙酯等(甲基)丙烯酸环烷基酯类;(甲基)丙烯酸苯甲酰氧乙酯、(甲基)丙烯酸苄基酯、(甲基)丙烯酸苯基乙酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基二乙二醇酯、(甲基)丙烯酸2-羟基-3-苯氧基丙酯等(甲基)丙烯酸芳基酯类等。
作为苯乙烯基单体,没有特别限制,可以举出苯乙烯;α-甲基苯乙烯、α-乙基苯乙烯、α-丁基苯乙烯或、4-甲基苯乙烯等烷基取代苯乙烯类;氯苯乙烯等苯乙烯和苯乙烯衍生物等。
作为乙烯基醚单体,没有特别限制,可以举出甲基乙烯基醚、乙基乙烯基醚、丙基乙烯基醚、异丙基乙烯基醚、正丁基乙烯基醚、仲丁基乙烯基醚、叔丁基乙烯基醚、异丁基乙烯基醚、正戊基乙烯基醚、异戊基乙烯基醚等烷基乙烯基醚类;环戊基乙烯基醚、环己基乙烯基醚、环庚基乙烯基醚、环辛基乙烯基醚、2-双环[2.2.1]庚基乙烯基醚、2-双环[2.2.2]辛基乙烯基醚、8-三环[5.2.1.0(2,6)]癸基乙烯基醚、1-金刚烷基乙烯基醚、2-金刚烷基乙烯基醚等环烷基乙烯基醚类;苯基乙烯基醚、4-甲基苯基乙烯基醚、4-三氟甲基苯基乙烯基醚、4-氟苯基乙烯基醚等芳基乙烯基醚类;苄基乙烯基醚、4-氟苄基乙烯基醚等芳基乙烯基醚类;等。
作为烯丙基单体,没有特别限制,可以举出甲基烯丙基醚、乙基烯丙基醚、丙基烯丙基醚、丁基烯丙基醚等烷基烯丙基醚类;苯基烯丙基醚等芳基烯丙基醚类;乙酸烯丙酯、烯丙醇、烯丙基胺。
这些(甲基)丙烯酸酯单体、苯乙烯基单体、乙烯基醚单体、烯丙基单体中特别优选包含疏水性基团。本说明书中,“疏水性基团”是指,疏水性基团与氢原子键合而成的分子对水的溶解度(25℃、25%RH)为100mg/L以下。
作为前述疏水性基团,没有特别限制,可以举出C1~C18烷基、C3~C20环烷基、C6~C30的芳基。
作为前述C1~C18烷基,没有特别限制,可以举出甲基、乙基、丙基、异丙基、丁基、异丁基、仲丁基、叔丁基、戊基、己基、癸基、十一烷基、十二烷基、十八烷基、2-乙基己基等。
作为前述C3~C20环烷基,没有特别限制,可以举出环丙基、环丁基、环戊基、环己基、环庚基、三环[5.2.1.0(2,6)]癸基、金刚烷基等。
作为前述C6~C30的芳基,可以举出苯基、萘基、蒽基、联苯基等。
作为具有这样的疏水性基团的单体,可以举出前述记载的(甲基)丙烯酸烷基酯类、(甲基)丙烯酸环烷基酯类、(甲基)丙烯酸芳基酯类、苯乙烯、烷基取代苯乙烯类、烷基乙烯基醚类、环烷基乙烯基醚类、芳基乙烯基醚类、烷基烯丙基醚类、芳基烯丙基醚类。
具有前述疏水性基团的单体中,为了与通式(1)所示的单体的共聚性良好、且能得到宽范围的分子量的聚合物,优选前述记载的(甲基)丙烯酸烷基酯类、(甲基)丙烯酸环烷基酯类、(甲基)丙烯酸芳基酯类、苯乙烯、烷基取代苯乙烯类、烷基乙烯基醚类、环烷基乙烯基醚类、芳基乙烯基醚类。进而,从更适合得到提高所得聚合物的流平性的效果的观点出发,优选使用(甲基)丙烯酸芳基酯类、苯乙烯、烷基取代苯乙烯类、芳基乙烯基醚类等包含芳基的含芳香族单体,从电子元件的驱动稳定性的观点出发,进一步优选苯乙烯、烷基取代苯乙烯类、芳基乙烯基醚类,在苯乙烯、烷基取代苯乙烯类、苯基乙烯基醚、苄基乙烯基醚的情况下,本发明的效果特别显著。
需要说明的是,上述单体可以单独使用,也可以组合2种以上使用。
本发明的聚合物的重均分子量(Mw)优选500~100000,从平滑性的观点出发,更优选3000~40000。需要说明的是,本说明书中,“重均分子量(Mw)”的值采用通过实施例的测定方法而测定的值。
另外,本发明的聚合物的数均分子量(Mn)优选500~100000,从平滑性的观点出发,更优选3000~40000。需要说明的是,本说明书中,“数均分子量(Mn)”的值采用通过实施例的测定方法而测定的值。
[聚合物的制造方法]
为了得到本发明的聚合物,可以使用上述单体和聚合引发剂,用公知常用的方法进行聚合(共聚),可以为无规共聚物、嵌段共聚物、接枝共聚物等的任意者。
作为聚合方法,可以举出自由基聚合、阴离子聚合、阳离子聚合等。
作为自由基聚合,反应条件没有特别限定,例如,可以使用单体和自由基聚合引发剂,在溶剂中进行聚合。
作为自由基聚合引发剂,可以使用一般已知的自由基聚合引发剂,例如可以举出2,2’-偶氮双异丁腈、2,2’-偶氮双-(2,4-二甲基戊腈)、2,2’-偶氮双-(4-甲氧基-2,4-二甲基戊腈)等偶氮化合物;过氧化苯甲酰、过氧化月桂酰、过氧化新戊酸叔丁酯、过氧化乙基己酸叔丁酯、1,1’-双-(过氧化叔丁基)环己烷、过氧化叔戊基-2-乙基己酸酯、过氧化叔己基-2-乙基己酸酯等有机过氧化物和过氧化氢等。它们可以单独使用1种,也可以组合使用2种以上。
另外,自由基聚合引发剂的用量没有特别限制,一般而言,相对于单体100质量份为0.001~1质量份。为了在前述优选的重均分子量的范围内得到本发明的聚合物,相对于单体100质量份,自由基聚合引发剂的用量优选0.005~0.5质量份、进一步优选0.01~0.3质量份。
如果列举作为自由基聚合中能使用的溶剂的代表性的例子,则例如可以举出:丙酮、甲乙酮、甲基-正丙基酮、甲基异丙基酮、甲基-正丁基酮、甲基异丁基酮、甲基-正戊基酮、甲基-正己基酮、二乙基酮、乙基-正丁基酮、二-正丙基酮、二异丁基酮、环己酮、佛尔酮等酮系溶剂;
乙基醚、异丙基醚、正丁基醚、二异戊基醚、乙二醇二甲基醚、乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇、二噁烷、四氢呋喃等醚系溶剂;
甲酸乙酯、甲酸丙酯、甲酸-正丁酯、乙酸乙酯、乙酸-正丙酯、乙酸异丙酯、乙酸-正丁酯、乙酸-正戊酯、乙二醇单甲基醚乙酸酯、乙二醇单乙基醚乙酸酯、二乙二醇单甲基醚乙酸酯、二乙二醇单乙基醚乙酸酯、丙二醇单甲基醚乙酸酯、乙基-3-乙氧基丙酸酯等酯系溶剂;
甲醇、乙醇、异丙醇、正丁醇、异丁醇、二丙酮醇、3-甲氧基-1-丙醇、3-甲氧基-1-丁醇、3-甲基-3-甲氧基丁醇等醇系溶剂;
甲苯、二甲苯、Solvesso 100、Solvesso 150、Swazole 1800、Swazole 310、IsoparE、Isopar G、Exxon Naphtha 5号、Exxon Naphtha 6号等烃系溶剂。
这些溶剂可以单独使用,也可以组合使用2种以上。
自由基聚合反应中的溶剂的用量没有特别限制,相对于单体的投入量100质量份,从搅拌性的观点出发,优选0~3000质量份,从反应性的观点出发,更优选10~1000质量份,从分子量控制的观点出发,进一步优选10~500质量份。
作为阴离子聚合,反应条件没有特别限定,例如可以使用单体和阴离子聚合引发剂,在溶剂中进行聚合。
作为阴离子聚合引发剂,可以使用一般已知的阴离子聚合引发剂,例如可以举出甲基锂、正丁基锂、仲丁基锂、叔丁基锂、异丙基锂、正丙基锂、异丙基锂、苯基锂、苄基锂、己基锂、丁基钠、丁基钾等有机碱金属;甲基氯化镁、甲基溴化镁、甲基碘化镁、乙基溴化镁、丙基溴化镁、苯基氯化镁、苯基溴化镁、二丁基镁等有机碱土类金属;锂、钠、钾等碱金属;二乙基锌、二丁基锌、乙基丁基锌等有机锌;三甲基铝、三乙基铝、甲基双苯氧基铝、异丙基双苯氧基铝、双(2,6-二叔丁基苯氧基)甲基铝、双(2,6-二叔丁基-4-甲基苯氧基)甲基铝等有机铝等。它们可以单独使用1种,也可以组合使用2种以上。
另外,阴离子聚合引发剂的用量没有特别限制,相对于单体100质量份,优选0.001~1质量份、更优选0.005~0.5质量份、进一步优选0.01~0.3质量份。
作为阴离子聚合中能使用的溶剂,可以举出上述溶剂。
阴离子聚合反应中的溶剂的用量没有特别限制,相对于单体的投入量100质量份,从搅拌性的观点出发,优选0~3000质量份,从反应性的观点出发,更优选10~1000质量份,从分子量控制的观点出发,进一步优选10~500质量份。
作为阳离子聚合,反应条件没有特别限定,例如可以使用单体和阳离子聚合引发剂,在溶剂中进行聚合。
作为阳离子聚合引发剂,可以使用一般已知的阳离子聚合引发剂,例如可以举出盐酸、硫酸、高氯酸、三氟乙酸、甲磺酸、三氟甲磺酸、氯磺酸、氟磺酸等质子酸;三氟化硼、氯化铝、四氯化钛、氯化锡、氯化铁等路易斯酸等。它们可以单独使用1种,也可以组合使用2种以上。
另外,阳离子聚合引发剂的用量没有特别限制,一般而言,相对于单体100质量份为0.001~1质量份。为了在前述优选的重均分子量的范围内得到本发明的聚合物,阳离子聚合引发剂的用量相对于单体100质量份优选0.005~0.5质量份、进一步优选0.01~0.3质量份。
作为阳离子聚合中能使用的溶剂,可以举出上述自由基聚合中能使用的溶剂。
阳离子聚合反应中的溶剂的用量没有特别限制,相对于单体的投入量100质量份,从搅拌性的观点出发,优选0~3000质量份,从反应性的观点出发,更优选10~51000质量份,从分子量控制的观点出发,进一步优选10~500质量份。
需要说明的是,上述自由基聚合、阴离子聚合、阳离子聚合可以为活性聚合,例如可以使用“季刊化学综述No.18,1993精密聚合日本化学会编(学会出版中心)”中记载的方法。
[组合物]
含有本发明的聚合物的组合物由于具有提高成膜后的流平性的功能,因此,可以举出利用热、光的固化组合物、墨组合物、涂布组合物、电子材料组合物等,但不限定于这些。其中,本发明的聚合物由于不使电子元件的电特性降低,因此对电子材料组合物是有用的。
[电子材料组合物]
含有本发明的聚合物的电子材料组合物包含有机半导体材料、本发明的聚合物(流平剂)和溶剂。需要说明的是,前述电子材料组合物中,除此之外,根据需要也可以包含表面活性剂等。
有机半导体材料的含量相对于电子材料组合物总量优选0.01~10质量%,从电特性的观点出发,更优选0.01~5质量%。
本发明的聚合物的含量相对于电子材料组合物总量优选0.001~5.0质量%,从流平性的观点出发,更优选0.001~1.0质量%。
溶剂的含量相对于电子材料组合物总量优选90~99质量%,从成膜性的观点出发,更优选95~99质量%。
(有机半导体材料)
作为有机半导体材料,可以举出有机TFT材料、有机太阳能电池材料、有机EL材料等,但不限定于这些。
作为有机TFT材料,只要为在构成有机TFT元件的层中使用的材料就没有特别限制,例如可以举出萘、蒽、并四苯、并五苯、并六苯、并七苯等可以带有取代基的并苯类,作为例子,可以举出1,4-双苯乙烯基苯、1,4-双(2-甲基苯乙烯基)苯、1,4-双(3-甲基苯乙烯基)苯(4MSB)、1,4-双(4-甲基苯乙烯基)苯、聚苯撑乙烯等具有C6H5-CH=CH-C6H5所示的苯乙烯基结构的化合物、这样的化合物的低聚物、聚合物、α-4T、α-5T、α-6T、α-7T、α-8T的衍生物等任选具有取代基的噻吩低聚物、聚己基噻吩、聚(9,9-二辛基芴基-2,7-二基-共-联噻吩)等噻吩系高分子等噻吩系高分子、双苯并噻吩衍生物、α,α’-双(二噻吩并[3,2-b:2’,3’-d]噻吩)、二噻吩并噻吩-噻吩的共聚低聚物、并五噻吩等缩合低聚噻吩,特别是具有噻吩并苯骨架或二噻吩并苯骨架的化合物、[1]苯并噻吩并[3,2-b][1]苯并噻吩衍生物、另外,硒酚低聚物、无金属酞菁、酞菁铜、酞菁铅、氧钛酞菁、铂卟啉、卟啉、苯并卟啉等卟啉类、四硫富瓦烯(TTF)和其衍生物、红荧烯和其衍生物等、四氰基苯醌二甲烷(TCNQ)、11,11,12,12-四氰基萘-2,6-醌二甲烷(TCNNQ)等醌型低聚物、C60、C70、PCBM等富勒烯类、N,N’-二苯基-3,4,9,10-苝四羧酸二酰亚胺、N,N’-二辛基-3,4,9,10-苝四羧酸二酰亚胺(C8-PTCDI)、NTCDA、1,4,5,8-萘四羧基二酰亚胺(NTCDI)等四羧酸类等。
作为有机太阳能电池材料,只要为构成有机太阳能电池元件的层中使用的材料就没有特别限制,例如可以举出C60和C70的富勒烯、富勒烯衍生物、碳纳米管、苝衍生物、多环醌、喹吖啶酮等、高分子系中为CN-聚(亚苯基-亚乙烯基)、MEH-CN-PPV、含-CN基或CF3基的聚合物、它们的-CF3取代聚合物、聚(芴)衍生物等。
作为有机EL材料,只要为构成有机EL元件的层中使用的材料就没有特别限制。一实施方式中,作为电子材料组合物能含有的有机EL材料,可以举出发光层中使用的发光材料、空穴注入层中使用的空穴注入材料、空穴传输层中使用的空穴传输材料、电子传输层中使用的电子传输材料。
(发光材料)
发光材料包含基质材料和掺杂材料。
基质材料与掺杂材料的组成比对其没有限定,相对于基质100质量份,掺杂优选1~50质量份,从发光效率的观点出发,进一步优选5~20质量份。
前述基质材料分为高分子基质材料和低分子基质材料。需要说明的是,本说明书中,“低分子”是指,重均分子量(Mw)为5000以下。另一方面,本说明书中,“高分子”是指,重均分子量(Mw)超过5000。此时,本说明书中,“重均分子量(Mw)”采用的是,使用以聚苯乙烯为标准物质的凝胶渗透色谱(GPC)而测定的值。
作为高分子基质材料,没有特别限制,可以举出聚(9-乙烯基咔唑)(PVK)、聚芴(PF)、聚对苯乙炔(PPV)、和包含它们的单体单元的共聚物等。
高分子基质材料的重均分子量(Mw)优选超过5000且5000000以下,从成膜性的观点出发,更优选超过5000且1000000以下。
作为低分子基质材料,没有特别限制,可以举出4,4’-双(9H-咔唑-9-基)联苯(CBP)、4,4’-双(9-咔唑基)-2,2’-二甲基联苯(CDBP)、N,N’-二咔唑基-1,4-二甲基苯(DCB)、1,3-二咔唑基苯(mCP)、3,5-双(9-咔唑基)四苯基硅烷(SimCP)、9,9’-(对叔丁基苯基)-1,3-双咔唑等咔唑衍生物、4,4’-二(二(三苯基甲硅烷基)-联苯(BSB)、9-(4-叔丁基苯基)-3,6-双(三苯基甲硅烷基)-9H-咔唑(CzSi)、1,3-双(三苯基甲硅烷基)苯(UGH3)等硅烷衍生物、双(2-甲基-8-羟基喹啉)-4-(苯基苯氧基)铝(BAlq)等金属配合物、2,7-双(二苯基氧化膦)-9,9-二甲基荧光素(P06)等氧化膦衍生物、1,3,5-三[4-(二苯基氨基)苯基]苯(TDAPB)等胺衍生物、噁二唑衍生物、咪唑衍生物、三嗪衍生物、吡啶衍生物、嘧啶衍生物等杂环化合物等。
低分子基质材料的重均分子量(Mw)优选100~5000,从成膜性的观点出发,更优选300~5000。
上述基质材料中,作为基质材料,优选使用低分子基质材料,更优选使用4,4’-双(9H-咔唑-9-基)联苯(CBP)、9,9’-(对叔丁基苯基)-1,3-双咔唑等咔唑衍生物、双(2-甲基-8-羟基喹啉)-4-(苯基苯氧基)铝(BAlq)、噁二唑衍生物、咪唑衍生物、三嗪衍生物、吡啶衍生物、嘧啶衍生物等杂环化合物,进一步优选使用4,4’-双(9H-咔唑-9-基)联苯(CBP)、9,9’-(对叔丁基苯基)-1,3-双咔唑、咪唑衍生物、三嗪衍生物、吡啶衍生物、嘧啶衍生物等杂环化合物。
上述基质材料可以单独使用,也可以组合2种以上使用。
前述掺杂材料通常分为高分子掺杂材料和低分子掺杂材料。
作为高分子掺杂材料,没有特别限制,可以举出聚对苯乙炔(PPV)、氰基聚对苯乙炔(CNPPV)、聚(芴基乙炔)(PFE)、聚芴(PFO)、聚噻吩聚合物、聚吡啶、和包含它们的单体单元的共聚物等。
高分子掺杂材料的重均分子量(Mw)优选超过5000且5000000以下,从发光效率的观点出发,更优选超过5000且1000000以下。
作为低分子掺杂材料,没有特别限制,可以举出荧光发光材料、磷光发光材料等。
作为前述荧光发光材料,可以举出萘、苝、芘、蒽、香豆素、对-双(2-苯基乙烯基)苯、喹吖啶酮、香豆素、Al(C9H6NO)3等铝配合物等、红荧烯、嘧啶酮(Pyrimidone)、二氰基亚甲基-2-甲基-6-(对二甲基氨基苯乙烯基)-4H-吡喃(DCM)、苯并吡喃、罗丹明、苯并噻吨、氮杂苯并噻吨、和它们的衍生物等。
作为前述磷光发光材料,可以举出:包含周期表第7族~第11族的中心金属和配位于前述中心金属的芳香族系配体的配合物。
作为前述周期表第7族~第11族的中心金属,可以举出钌、铑、钯、锇、铱、金、铂、银、铜等。其中,从发光效率的观点出发,中心金属优选铱。
作为前述配体,可以举出苯基吡啶、对甲苯基吡啶、噻吩基吡啶、二氟苯基吡啶、苯基异喹啉、芴并吡啶、芴并喹啉、乙酰基丙酮、和它们的衍生物。其中,配体优选苯基吡啶、对甲苯基吡啶、和它们的衍生物,从成膜性的观点出发,更优选对甲苯基吡啶和其衍生物。
作为具体的磷光发光材料,可以举出三(2-苯基吡啶)铱(Ir(ppy)3)、三(2-苯基吡啶)钌、三(2-苯基吡啶)钯、双(2-苯基吡啶)铂、三(2-苯基吡啶)锇、三(2-苯基吡啶)铼、三[2-(对甲苯基)吡啶]铱(Ir(mppy)3)、三[2-(对甲苯基)吡啶]钌、三[2-(对甲苯基)吡啶]钯、三[2-(对甲苯基)吡啶]铂、三[2-(对甲苯基)吡啶]锇、三[2-(对甲苯基)吡啶]铼、八乙基铂卟啉、八苯基铂卟啉、八乙基钯卟啉、八苯基钯卟啉等。
上述中,掺杂材料优选低分子掺杂材料,从发光效率的观点出发,优选磷光发光材料。
低分子掺杂材料的重均分子量(Mw)优选100~5000、更优选100~3000。
上述掺杂材料可以单独使用,也可以组合2种以上使用。
上述中,作为发光材料,从能得到更高的发光效率的观点出发,优选使用低分子发光材料,更优选使用低分子基质材料和低分子掺杂材料。
(空穴注入材料)
作为空穴注入材料,没有特别限制,可以举出酞菁铜等酞菁化合物;4,4’,4”-三[苯基(间甲苯基)氨基]三苯基胺等三苯基胺衍生物;1,4,5,8,9,12-六氮杂三亚苯基六甲腈、2,3,5,6-四氟-7,7,8,8-四氰基-苯醌二甲烷等氰基化合物;氧化钒、氧化钼等氧化物;无定形碳;聚苯胺(翠绿亚胺)、聚(3,4-亚乙基二氧噻吩)-聚(苯乙烯磺酸)(PEDOT-PSS)、聚吡咯等高分子。其中,从成膜性的观点出发,空穴注入材料优选高分子。
上述空穴注入材料可以单独使用,也可以组合2种以上使用。
(空穴传输材料)
作为空穴传输材料,没有特别限制,可以举出TPD(N,N'-二苯基-N,N’-二(3-甲基苯基)-1,1’-联苯-4,4’二胺)、α-NPD(4,4’-双[N(1-萘基)-N-苯基氨基]联苯)、m-MTDATA(4,4’,4”-三(3-甲基苯基苯基氨基)三苯基胺)等低分子三苯基胺衍生物;聚乙烯基咔唑;下述化学式HT-2所示的向三苯基胺衍生物中导入取代基并聚合而得到的高分子化合物等。其中,从空穴传输性的观点出发,空穴传输材料优选三苯基胺衍生物、向三苯基胺衍生物中导入取代基并聚合而得到的化5所示的HT-2那样的高分子化合物。
上述空穴传输材料可以单独使用,也可以组合2种以上使用。
[化5]
(电子传输材料)
作为电子传输材料,没有特别限制,可以举出三(8-羟基喹啉)铝(Alq)、三(4-甲基-8-羟基喹啉)铝(Almq3)、双(10-羟基苯并[h]羟基喹啉)铍(BeBq2)、双(2-甲基-8-羟基喹啉)(对羟基联苯合)铝(BAlq)、双(8-羟基喹啉)锌(Znq)等具有喹啉骨架或苯并喹啉骨架的金属配合物;双[2-(2’-羟基苯基)苯并噁唑基]锌(Zn(BOX)2)等具有苯并噁唑啉骨架的金属配合物;双[2-(2’-羟基苯基)苯并噻唑基]锌(Zn(BTZ)2)具有苯并噻唑啉骨架的金属配合物;2-(4-联苯基)-5-(4-叔丁基苯基)-1,3,4-噁二唑(PBD)、3-(4-联苯基)-4-苯基-5-(4-叔丁基苯基)-1,2,4-三唑(TAZ)、1,3-双[5-(对叔丁基苯基)-1,3,4-噁二唑-2-基]苯(OXD-7)、9-[4-(5-苯基-1,3,4-噁二唑-2-基)苯基]咔唑(CO11)、2,2’,2”-(1,3,5-苯三基)三(1-苯基-1H-苯并咪唑)(TPBI)、2-[3-(二苯并噻吩-4-基)苯基]-1-苯基-1H-苯并咪唑(mDBTBIm-II)等聚唑衍生物;化6所示的ET-1那样的苯并咪唑衍生物;喹啉衍生物;苝衍生物;吡啶衍生物;嘧啶衍生物;三嗪衍生物;喹喔啉衍生物;二苯基醌衍生物;硝基取代芴衍生物等。其中,从电子传输性的观点出发,电子传输材料优选苯并咪唑衍生物、吡啶衍生物、嘧啶衍生物、三嗪衍生物。
[化6]
上述电子传输材料可以单独使用,也可以组合2种以上使用。
(溶剂)
作为溶剂,没有特别限制,可以使用适宜公知的溶剂。具体而言,可以举出芳香族系溶剂、烷烃系溶剂、醚系溶剂、醇系溶剂、酯系溶剂、酰胺系溶剂、其他溶剂等。
作为前述芳香族系溶剂,可以举出甲苯、二甲苯、乙基苯、异丙苯、戊基苯、己基苯、环己基苯、十二烷基苯、均三甲苯、二苯基甲烷、二甲氧基苯、苯乙醚、甲氧基甲苯、苯甲醚、甲基苯甲醚、二甲基苯甲醚等单环式芳香族溶剂;环己基苯、四氢萘、萘、甲基萘等缩合环式芳香族溶剂;甲基苯基醚、乙基苯基醚、丙基苯基醚、丁基苯基醚等醚系芳香族溶剂;乙酸苯酯、丙酸苯酯、苯甲酸乙酯、苯甲酸丙酯、苯甲酸丁酯等酯系芳香族溶剂等。
作为前述烷烃系溶剂,可以举出戊烷、己烷、辛烷、环己烷等。
作为前述醚系溶剂,可以举出二噁烷、乙二醇二甲基醚、乙二醇二乙基醚、丙二醇-1-单甲基醚乙酸酯、四氢呋喃等。
作为前述醇系溶剂,可以举出甲醇、乙醇、异丙醇等。
作为前述酯系溶剂,可以举出乙酸乙酯、乙酸丁酯、乳酸乙酯、乳酸丁酯等。
作为前述酰胺系溶剂,可以举出N,N-二甲基甲酰胺、N,N-二甲基乙酰胺等。
作为前述其他溶剂,可以举出水、二甲基亚砜、丙酮、氯仿、二氯甲烷等。
其中,作为溶剂,从有机半导体材料的溶解性的观点出发,优选芳香族系溶剂,从流平性的观点出发,更优选包含选自由缩合环式芳香族溶剂、醚系芳香族溶剂和酯系芳香族溶剂组成的组中的至少1种,从成膜性的观点出发,进一步优选使用缩合环式芳香族溶剂和/或醚系芳香族溶剂。
需要说明的是,上述溶剂可以单独使用,也可以组合2种以上使用。
将本方式的电子材料组合物涂布而形成涂膜时,成为流平剂的本发明的聚合物由于具有硅氧烷结构,因此,在涂膜表面进行取向使表面张力降低。而且,通过将以这样的状态得到的涂膜干燥,可以防止基于干燥的弯曲的发生,可以得到高度实现了平坦性的层、进而具有高性能的有机功能层。
另外,一实施方式中,在将电子材料组合物用于有机EL元件的发光层的形成时,还能体现提高有机EL元件的驱动稳定性的功能。认为这样的功能是由于,在本发明的聚合物所具有的硅氧烷结构中,不具有成为载体的捕获位点的羰基。
如果更详细地进行说明,则一实施方式中,发光材料包含基质材料和掺杂材料。而且,发光层中,通过基质材料传输空穴和/或电子,利用通过传输掺杂材料的空穴与电子的再结合而产生的能量,发光层从而发光。因此,如果在发光层中能有效地引起空穴和电子的传输,则能进行有效的发光,驱动稳定性提高。
电子材料组合物中含有的以往的流平剂在涂布墨组合物而得到的涂膜的表面进行取向,使表面张力降低,能制作平滑的涂膜,但在流平剂具有的硅氧烷结构中,具有成为载体的捕获位点的、电荷能极化的官能团,因此,妨碍电荷的传输,元件的驱动可能变得不稳定。即,使用以往的流平剂时,虽然可以得到一定程度的弯曲的防止效果,但是作为其代价,驱动稳定性可能会降低。
与此相反,在流平剂的硅氧烷结构中不包含电荷能极化的官能团时,可以抑制电荷传输的妨碍。其结果,在发光层中有效地传输电荷,元件的驱动稳定性可以提高。
[电子元件]
接着,对本发明的电子元件进行说明。是在任意方式中均包含含有本发明的聚合物的组合物或电子材料组合物的电子元件。作为电子元件的具体例,可以举出太阳能电池、受光元件等光电转换元件、场效应型晶体管、静电感应型晶体管、双极晶体管等晶体管、有机电致发光元件(以下,简记作有机EL元件)、温度传感器、气体传感器、湿度传感器、辐射线传感器等,但不限定于这些。
作为一例,以下,对有机EL元件进行说明。
<有机EL元件>
根据本发明的一方式,提供包含阳极、发光层和阴极的有机EL元件。此时,前述发光层的特征在于,由电子材料组合物形成。
需要说明的是,前述有机EL元件可以包含1个以上的空穴注入层、空穴传输层、电子传输层和电子注入层等其他层。另外,也可以包含密封构件等公知的部分。
另外,根据另一实施方式,提供一种有机EL元件,其包含:阳极、发光层和阴极;以及,选自由空穴注入层、空穴传输层、电子传输层和电子注入层组成的组中的至少1个层。此时,选自由发光层、空穴注入层、空穴传输层和电子传输层组成的组中的至少1个层的特征在于,包含本发明的聚合物(流平剂)。
即,有机EL元件有时包含阳极、发光层和阴极作为最小构成单元,进而,包含选自由空穴注入层、空穴传输层、电子传输层和电子注入层组成的组中的至少1个层作为任意的构成单元。此时,流平剂可以仅包含于发光层,也可以仅包含于选自由空穴注入层、空穴传输层和电子传输层组成的组中的至少1个层(例如:仅空穴传输层;空穴传输层和电子传输层),还可以包含于发光层、以及空穴注入层、空穴传输层和电子传输层中的至少1个层。其中,优选发光层和/或空穴传输层包含流平剂,更优选发光层包含流平剂。
以下,对有机EL元件的各构成进行详细说明。
[阳极]
作为阳极,没有特别限制,可以使用金(Au)等金属、碘化亚铜(CuI)、氧化铟锡(ITO)、氧化锡(SnO2)、氧化锌(ZnO)等。这些材料可以单独使用,也可以组合2种以上使用。
作为阳极的膜厚,没有特别限制,优选10~1000nm、更优选10~200nm。
阳极可以通过蒸镀、溅射等方法而形成。此时,可以通过光刻法、使用掩模的方法而进行图案形成。
[空穴注入层]
空穴注入层是有机发光元件中任意的构成要素,具有从阳极获得空穴的功能。通常,从阳极获得的空穴被传输至空穴传输层或发光层。
空穴注入层中能使用的材料可以使用与上述同样的材料,因此,此处省略说明。
作为空穴注入层的膜厚,没有特别限制,优选0.1nm~5μm。
空穴注入层可以为单层,也可以为层叠有2层以上者。
空穴注入层可以通过湿式成膜法和干式成膜法而形成。
用湿式成膜法形成空穴注入层的情况下,通常包括如下工序:涂布上述有机发光元件用墨组合物,将所得涂膜干燥。此时,作为涂布的方式,没有特别限制,可以举出喷墨印刷法、凸版印刷法、凹版印刷法、丝网印刷法、喷嘴打印印刷法等。
另外,用干式成膜法形成空穴注入层的情况下,可以应用真空蒸镀法、旋涂法等。
[空穴传输层]
空穴传输层是有机发光元件中任意的构成要素,具有有效地传输空穴的功能。另外,空穴传输层可以具有防止空穴的传输的功能。空穴传输层通常从阳极或空穴注入层获得空穴,向发光层传输空穴。
空穴传输层中能使用的材料可以使用与上述同样的材料,因此,此处省略说明。
作为空穴传输层的膜厚,没有特别限制,优选1nm~5μm、更优选5nm~1μm、进一步优选10~500nm。
空穴传输层可以为单层,也可以为层叠有2层以上者。
空穴传输层可以通过湿式成膜法和干式成膜法而形成。
用湿式成膜法形成空穴传输层的情况下,通常包括如下工序:涂布上述有机发光元件用墨组合物,将所得涂膜干燥。此时,作为涂布的方式,没有特别限制,可以举出喷墨印刷法、凸版印刷法、凹版印刷法、丝网印刷法、喷嘴打印印刷法等。
另外,用干式成膜法形成空穴传输层的情况下,可以应用真空蒸镀法、旋涂法等。
[发光层]
发光层具有如下功能:利用通过注入至发光层的空穴和电子的再结合而产生的能量而产生发光。
发光层中能使用的材料可以使用与上述同样的材料,因此,此处省略说明。
作为发光层的膜厚,没有特别限制,优选2~100nm、更优选2~20nm。
发光层可以通过湿式成膜法和干式成膜法而形成。
用湿式成膜法形成发光层的情况下,通常包括如下工序:涂布上述有机发光元件用墨组合物,将所得涂膜干燥。此时,作为涂布的方式,没有特别限制,可以举出喷墨印刷法、凸版印刷法、凹版印刷法、丝网印刷法、喷嘴打印印刷法等。
另外,用干式成膜法形成发光层的情况下,可以应用真空蒸镀法、旋涂法等。
[电子传输层]
电子传输层是有机发光元件中任意的构成要素,具有有效地传输电子的功能。另外,电子传输层可以具有防止电子的传输的功能。电子传输层通常从阴极或电子注入层获得电子,向发光层传输电子。
电子传输层中能使用的材料可以使用与上述同样的材料,因此,此处省略说明。
作为电子传输层的膜厚,没有特别限制,优选5nm~5μm、更优选5~200nm。
电子传输层可以为单层,也可以为层叠有2层以上者。
电子传输层可以通过湿式成膜法和干式成膜法而形成。
用湿式成膜法形成电子传输层的情况下,通常包括如下工序:涂布上述有机发光元件用墨组合物,将所得涂膜干燥。此时,作为涂布的方式,没有特别限制,可以举出喷墨印刷法、凸版印刷法、凹版印刷法、丝网印刷法、喷嘴打印印刷法等。
另外,用干式成膜法形成电子传输层的情况下,可以应用真空蒸镀法、旋涂法等。
[电子注入层]
电子注入层是有机发光元件中任意的构成要素,具有从阴极获得电子的功能。通常从阴极获得的电子被传输至电子传输层或发光层。
作为电子注入材料,没有特别限制,可以举出锂、钙等碱金属;锶、铝等金属;氟化锂、氟化钠等碱金属盐;8-羟基喹啉锂等碱金属化合物;氟化镁等碱土类金属盐;氧化铝等氧化物等。其中,电子注入材料优选碱金属、碱金属盐、碱金属化合物,更优选碱金属盐、碱金属化合物。
上述电子注入材料可以单独使用,也可以组合2种以上使用。
作为电子注入层的膜厚,没有特别限制,优选0.1nm~5μm。
电子注入层可以为单层,也可以为层叠有2层以上者。
电子注入层可以通过湿式成膜法和干式成膜法而形成。
用湿式成膜法形成电子注入层的情况下,通常包括如下工序:涂布上述有机发光元件用墨组合物,将所得涂膜干燥。此时,作为涂布的方式,没有特别限制,可以举出喷墨印刷法、凸版印刷法、凹版印刷法、丝网印刷法、喷嘴打印印刷法等。
另外,用干式成膜法形成电子注入层的情况下,可以应用真空蒸镀法、旋涂法等。
[阴极]
作为阴极,没有特别限制,可以举出锂、钠、镁、铝、钠-钾合金、镁/铝混合物、镁/铟混合物、铝/氧化铝(Al2O3)混合物、稀土类金属等。这些材料可以单独使用,也可以组合2种以上使用。
阴极通常可以通过蒸镀、溅射等方法而形成。
作为阴极的膜厚,没有特别限制,优选10~1000nm、更优选10~200nm。
一实施方式中,包含使用上述电子材料组合物而形成的层的有机EL元件能适合地防止形成的层的弯曲。由此,所得有机EL元件具有能防止亮度不均等高的性能。
另外,另一实施方式中,使用上述电子材料组合物形成发光层的情况下,所得有机EL元件可以实现高的驱动稳定性。
实施例
以下,列举实施例对本发明进行具体说明。
<硅氧烷单体的合成>
[实施例1]
将100g的Silaplane FM-0411(JNC株式会社制)和16.8g的叔丁醇钾投入装有100g的四氢呋喃(THF)且经氩气置换的500mL的三口烧瓶中,在室温下搅拌1小时。向其中滴加11.8g的5-溴-1,3-戊二烯,在室温下搅拌18小时。之后,将THF减压蒸馏去除,用甲苯提取,用水清洗3次后,用硫酸钠干燥。之后,用硅胶柱色谱法纯化,得到本发明的硅氧烷单体a。收量为18g。
将硅氧烷单体a的结构示于以下。
[化7]
[实施例2]
使用12.2g的4-(氯甲基)苯乙烯代替5-溴-1,3-戊二烯,除此之外,用与实施例1同样的方法合成本发明的硅氧烷单体b。收量为12g。
将硅氧烷单体b的结构示于以下。
[化8]
<聚合物的合成>
[实施例3]
将700mg的苯乙烯和672mg的实施例1中得到的硅氧烷单体a、27.6mg的PERBUTYL Z(日本油脂株式会社制)、3.3g的环己酮放入至10mL的三口烧瓶,在氮气封入下,以110℃搅拌30小时。在甲醇中滴加所得反应液,使聚合物沉淀后,滤除、干燥,从而得到本发明的聚合物A1.3g。
测定所得聚合物A的数均分子量(Mn)和重均分子量(Mw),结果分别为7900和20000。需要说明的是,数均分子量和重均分子量是使用高速GPC装置(东曹株式会社制)、以聚苯乙烯为标准物质而测定的。
[实施例4]
使用实施例2中得到的硅氧烷单体b代替硅氧烷单体a,除此之外,用与实施例3同样的方法合成本发明的聚合物B。
测定所得聚合物B的数均分子量(Mn)和重均分子量(Mw),结果分别为8100和21000。
[实施例5]
使用苄基乙烯基醚代替苯乙烯,除此之外,用与实施例4同样的方法合成本发明的聚合物C。
测定所得聚合物C的数均分子量(Mn)和重均分子量(Mw),结果分别为8500和22000。
[合成例1]
使用FM-0711代替硅氧烷单体A,除此之外,用与实施例3同样的方法合成聚合物D。
测定所得聚合物D的数均分子量(Mn)和重均分子量(Mw),结果分别为9500和24000。
将FM-0711的结构示于以下。
[化9]
<基质材料的合成>
[合成例2]中间体1的合成
[化10]
在250mL四口烧瓶中依次加入1,2,3,4-四氢咔唑(12g,72mmol)、活性炭(12g)、1,2-二氯苯120mL,边以500mL/分钟加入空气边在150℃下搅拌反应液15小时。将反应液冷却至室温后,将反应液过滤,减压去除有机溶剂,用柱色谱法纯化。减压去除有机溶剂后,得到黄色固体(中间体1)3.2g
(收率:10%)。
[合成例3]9,9’-(对叔丁基苯基)-1,3-双咔唑的合成
[化11]
在氩气气氛下,在200mL三口烧瓶中依次加入中间体1(0.836g,2.52mmol)、1-溴4-叔丁基苯(1.287g,6.04mmol)、三(二亚苄基)二钯(0.130g,0.13mmol)、三-叔丁基膦(0.076g,0.38mmol)、叔丁醇钠(0.725g,7.55mmol)、甲苯50mL,加热回流8小时。将反应液冷却至室温后,加入水,用分液漏斗将有机层回收。将有机溶剂减压去除后,用硅胶色谱法纯化,得到白色固体(化合物6)0.9g(收率60%)。
<电子材料组合物的制造>
使用实施例3~5中得到的本发明的聚合物A~C、以及合成例1中得到的聚合物D,制造使用发光材料作为有机EL材料的电子材料组合物。
[实施例6]
使实施例3中合成的聚合物A0.001g溶解于作为溶剂的四氢萘9.9g。在所得溶液中,添加0.04g的三[2-(对甲苯基)吡啶]铱(Ir(mppy)3)(Lumtec公司制)、和合成例3中合成的0.26g的9,9’-(对叔丁基苯基)-1,3-双咔唑,以60℃进行加热,从而制造电子材料组合物。
[实施例7]
将聚合物A变更为实施例4中合成的聚合物B,除此之外,用与实施例6同样的方法制造电子材料组合物。
[实施例8]
将聚合物A变更为实施例5中合成的聚合物C,除此之外,用与实施例6同样的方法制造电子材料组合物。
[比较例]
将聚合物A变更为合成例1中得到的聚合物D,除此之外,用与实施例6同样的方法制造电子材料组合物。
<评价>
对实施例6~8和比较例中制造的电子材料组合物进行以下的各种评价。
[平滑性评价]
在铟锡氧化物(ITO)基板上滴加0.1μL的电子材料组合物,在25℃、1Torr下减压干燥。用光干渉表面形状計测装置(Ryoka Systems Inc.制)测定所得有机薄膜的凸部和凹部之差(凹凸差),按照以下的基准进行评价。需要说明的是,前述凸部是指,有机薄膜表面中以水平面为基准最高者,前述凹部是指,有机薄膜表面中以水平面为基准最低者。
[发光效率评价]
制作有机EL元件,对于所得有机发光元件评价发光效率。
有机EL元件如以下制作。
即,对经过清洗的ITO基板照射UV/O3,通过旋涂将聚(3,4-亚乙基二氧噻吩)-聚(苯乙烯磺酸)(PEDOT-PSS)成膜45nm,在大气中、以180℃加热15分钟,形成空穴注入层。接着,通过旋涂将下述式所示的HT-2的0.3重量%二甲苯溶液在空穴注入层上成膜10nm,在氮气气氛下、以200℃干燥30分钟,从而形成空穴传输层。接着,通过旋涂将实施例6~8和比较例中得到的电子材料组合物在空穴传输层上成膜30nm,在25℃、1Torr下减压干燥3分钟后,在氮气气氛下、以110℃干燥15分钟,从而形成发光层。然后,在5×10-3Pa的真空条件下,将作为电子传输层的下述式所示的ET-1 45nm、作为电子注入层的氟化锂0.5nm、作为阴极的铝100nm依次成膜。最后,将基板搬运至手套箱,用玻璃基板密封,从而制作有机发光元件。
[化12]
[发光效率]
使用制作好的有机EL元件,对发光效率进行评价。
更详细而言,对于制作好的有机EL元件,与外部电源连接,用BM-9(株式会社TOPCON制)测定来自有机EL元件的发光。此时,由电流值算出10mA/cm2时的发光效率。
[寿命]
使用制作好的有机EL元件,对寿命进行评价。
更详细而言,对于制作好的有机EL元件,施加10mA/cm2的电流,用光电二极管式寿命测定装置(System Engineering Laboratory Co.,Ltd.制)测定亮度半衰寿命。
将所得结果示于下述表1。
[表1]
硅氧烷单体 | 疏水性单体 | 凹凸差(nm) | 发光效率(%) | 寿命(%) | |
比较例 | FM-0711 | 苯乙烯 | 85 | 100 | 100 |
实施例6 | a | 苯乙烯 | 47 | 115 | 171 |
实施例7 | b | 苯乙烯 | 22 | 129 | 182 |
实施例8 | b | 苄基乙烯基醚 | 31 | 119 | 165 |
由上述表1的结果表明,与比较例相比,使用实施例6~8的电子材料组合物形成涂膜的情况下,可以得到凹凸差少的膜,元件寿命得到提高。即,可知,通过使用本发明的电子材料组合物,所得涂膜的平滑性得到改善,显示出优异的元件的驱动稳定性。
Claims (6)
1.一种通式(1)所示的单体,
通式(1)中,n表示1~1000,R1和R2表示任选具有醚键的烃基,R3表示乙烯基或具有乙烯基的有机基团,其中,该有机基团在结构中不具有羰基。
2.一种聚合物,其是将至少选自所述通式(1)中的单体聚合而成的。
3.一种聚合物,其是将至少选自所述通式(1)中的单体和除通式(1)以外的单体共聚而成的。
4.一种组合物,其特征在于,含有权利要求2或3所述的聚合物。
5.一种电子材料组合物,其特征在于,含有权利要求2或3所述的聚合物。
6.一种电子元件,其特征在于,含有权利要求4所述的组合物或权利要求5所述的电子材料组合物。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-212956 | 2015-10-29 | ||
JP2015212956 | 2015-10-29 | ||
PCT/JP2016/081840 WO2017073650A1 (ja) | 2015-10-29 | 2016-10-27 | シロキサンモノマーおよびその重合体、該重合体を含有する組成物、電子素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108350117A true CN108350117A (zh) | 2018-07-31 |
Family
ID=58630496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201680062534.4A Pending CN108350117A (zh) | 2015-10-29 | 2016-10-27 | 硅氧烷单体和其聚合物、含有该聚合物的组合物、电子元件 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20180223181A1 (zh) |
JP (1) | JP6245411B2 (zh) |
KR (1) | KR20180077156A (zh) |
CN (1) | CN108350117A (zh) |
TW (1) | TW201723029A (zh) |
WO (1) | WO2017073650A1 (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007137944A (ja) * | 2005-11-15 | 2007-06-07 | Fujifilm Corp | 硬化性樹脂組成物、硬化膜、反射防止フィルム、偏光板、及び表示装置 |
JP2007153914A (ja) * | 2005-11-30 | 2007-06-21 | Fujifilm Corp | 硬化性組成物、フィルム、偏光板および画像表示装置 |
JP2007238675A (ja) * | 2006-03-06 | 2007-09-20 | Fujifilm Corp | 硬化性組成物、硬化性組成物の製造方法、光学フィルム、反射防止フィルム、偏光板、および画像表示装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6649722B2 (en) * | 1999-12-10 | 2003-11-18 | Novartis Ag | Contact lens |
JP2010249933A (ja) * | 2009-04-13 | 2010-11-04 | Konica Minolta Business Technologies Inc | クリアトナー、画像形成方法 |
BR112012005626A2 (pt) * | 2009-09-15 | 2016-08-02 | Novartis Ag | pré-polímeros adequados para tornar lentes de contato de absorção de ultravioleta |
-
2016
- 2016-10-27 TW TW105134669A patent/TW201723029A/zh unknown
- 2016-10-27 CN CN201680062534.4A patent/CN108350117A/zh active Pending
- 2016-10-27 US US15/772,003 patent/US20180223181A1/en not_active Abandoned
- 2016-10-27 JP JP2017529091A patent/JP6245411B2/ja not_active Expired - Fee Related
- 2016-10-27 WO PCT/JP2016/081840 patent/WO2017073650A1/ja active Application Filing
- 2016-10-27 KR KR1020187008762A patent/KR20180077156A/ko unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007137944A (ja) * | 2005-11-15 | 2007-06-07 | Fujifilm Corp | 硬化性樹脂組成物、硬化膜、反射防止フィルム、偏光板、及び表示装置 |
JP2007153914A (ja) * | 2005-11-30 | 2007-06-21 | Fujifilm Corp | 硬化性組成物、フィルム、偏光板および画像表示装置 |
JP2007238675A (ja) * | 2006-03-06 | 2007-09-20 | Fujifilm Corp | 硬化性組成物、硬化性組成物の製造方法、光学フィルム、反射防止フィルム、偏光板、および画像表示装置 |
Also Published As
Publication number | Publication date |
---|---|
US20180223181A1 (en) | 2018-08-09 |
KR20180077156A (ko) | 2018-07-06 |
JP6245411B2 (ja) | 2017-12-13 |
TW201723029A (zh) | 2017-07-01 |
JPWO2017073650A1 (ja) | 2017-10-26 |
WO2017073650A1 (ja) | 2017-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10319912B2 (en) | Charge-transporting material and organic light-emitting device including the same | |
EP3489276A1 (en) | Organic electronic material and use of same | |
CN102781979A (zh) | 有机电致发光元件用聚合物及使用了该聚合物的有机电致发光元件 | |
KR20140020975A (ko) | 유기전계발광 소자용 중합체 및 그 경화물을 이용한 유기전계발광 소자 | |
EP3457449A1 (en) | Charge transport material, organic electronic element and organic electroluminescent element | |
Xie et al. | A π‐stacked and conjugated hybrid based on poly (N‐vinylcarbazole) postfunctionalized with terfluorene for stable deep‐blue hole‐transporting materials | |
EP3579293A1 (en) | Organic electronics material and use thereof | |
Peng et al. | An Efficient Blue‐Emitting Conjugated Copolymer Based on Fluorene and Carbazole with a Peripheral Dendritic Carbazole Pendant at the 9‐Position | |
US20200083456A1 (en) | Organic electronic material, organic electronic element, and organic electroluminescent element | |
Yoon et al. | Novel 9, 9′‐(1, 3‐phenylene) bis‐9H‐carbazole‐containing copolymers as hole‐transporting and host materials for blue phosphorescent polymer light‐emitting diodes | |
CN108368198A (zh) | 含杂环的硅氧烷聚合物、含有该聚合物的组合物、电子元件 | |
Islam et al. | Highly emissive fluorene and thiophene based π-conjugated A-alt-B copolymers: Synthesis, characterization and electroluminescence properties | |
CN109983054A (zh) | 具有不对称重复单元的聚合物 | |
CN110352508A (zh) | 有机电子材料及其利用 | |
US11476421B2 (en) | Organic electronics material and organic electronics element | |
CN108350117A (zh) | 硅氧烷单体和其聚合物、含有该聚合物的组合物、电子元件 | |
Lee et al. | Synthesis and characterization of naphthyl‐substituted poly (p‐phenylenevinylene) s with few structural defects for polymer light‐emitting diodes | |
Song et al. | Synthesis and characterization of a fluorene–quinoxaline copolymer for light-emitting applications | |
US11118005B2 (en) | Composition, hole transport material composition, and ink composition | |
US20200028108A1 (en) | Charge transport material and use of same | |
WO2020067300A1 (ja) | 有機エレクトロニクス材料及び有機エレクトロニクス素子 | |
US20200017631A1 (en) | Branched polymer production method, branched polymer, and organic electronic element | |
US20200032001A1 (en) | Branched polymer production method, branched polymer, and organic electronic element | |
JP2024085535A (ja) | インク組成物及び有機エレクトロニクス素子 | |
KR20220157083A (ko) | 공중합체, 이를 포함하는 조성물 및 이를 이용한 유기 발광 소자 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
AD01 | Patent right deemed abandoned | ||
AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20201030 |