CN108288580A - Optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity - Google Patents

Optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity Download PDF

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CN108288580A
CN108288580A CN201710873280.0A CN201710873280A CN108288580A CN 108288580 A CN108288580 A CN 108288580A CN 201710873280 A CN201710873280 A CN 201710873280A CN 108288580 A CN108288580 A CN 108288580A
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sample
photon crystal
soi
cavity
optical biosensor
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CN108288580B (en
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王卓然
袁国慧
彭芳草
管磊
彭真明
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University of Electronic Science and Technology of China
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University of Electronic Science and Technology of China
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

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  • General Physics & Mathematics (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Optical Integrated Circuits (AREA)

Abstract

The invention discloses a kind of optical biosensor preparation methods based on 1-D photon crystal coupled micro-cavity, include the following steps:S1, cleaning SOI samples;S2, SOI samples are placed on 2~5min of baking in the insulating box of 170~200 DEG C of temperature;S3, photoresist is coated on sample by the way of spin coating;S4, sample is placed on to 10~15min of baking in the insulating box of 170~200 DEG C of temperature;S5, electron beam exposure is carried out to sample, exposure figure is that 1-D photon crystal couples micro-ring resonant cavity configuration;S6, developed successively to the sample after exposure-processed, fixing operation;S7, operation is performed etching to sample using ICP;S8, it after being cleaned using Piranha solution to sample, is rinsed using DI water, then is cleaned using HF solution, finally DI water is used to rinse.The characteristics such as the optical biosensor that the preparation method of the present invention makes has high sensitivity, detection limit is small, is easily integrated, it is simple to equipment requirement, it is easy to implement in technique, it is suitble to mass production.

Description

Optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity
Technical field
It is the invention belongs to optical bio field of sensing technologies, more particularly to a kind of based on 1-D photon crystal coupled micro-cavity Optical biosensor preparation method.
Background technology
The biosensor being applied at present has electrochemica biological sensor, optical bio to pass for having its detection mechanism Sensor, hot biosensor, semiconductor biosensor, conductance/impedance biosensor and acoustic wave biosensor etc..Its In, there is optical biosensor lossless operation pattern, electromagnetism interference, high sensitivity, high speed signal to generate, read at a high speed The advantages that rate, has boundless foreground, by more and more extensive concern.
SOI optical biosensors are the research hotspots of this field, from it is existing based on the optical biosensor of SOI come It sees, use evanescent wave detection principle mostly, i.e. the change of the refractive index or concentration of surrounding medium can cause waveguide effectively to reflect The change of rate, and the change of effective refractive index can lead to the movement of spectrum.The movement composed with photodetector detection light can obtain Know the concentration or refractive index information of measured matter.The SOI biosensors haveing excellent performance in order to obtain, preparation method become outstanding For key.
The experiment preparation of SOI optical biosensors mainly has two kinds of wet etching and dry etching.Wherein wet etching It is to be blocked by mask plate, so that etchant solution is only performed etching to being exposed to outer sample part, be exactly based on this selectivity Etching, ultimately forms required sensor structure.During wet etching, due to be etched sample and etching solution Reaction is influenced by factors so that etching process is not easy to control, and the width of lateral etching is all close to vertical etch Depth.Therefore, pattern etching fidelity is undesirable, and the minimum feature of etched features is difficult to control.For dry etching, Most common method is plasma etching (Plasma Etching).Compared to wet etching, this method etch rate is inclined It is low, but good control can be reached to etching process.In addition, for the side wall of optical waveguide, vertical extent can obtain one Determine the improvement of degree.
Therefore, how with excellent technique the high-performance biology that a kind of high sensitivity, detection limit is small, is easily integrated is prepared Sensor becomes new research direction.
Invention content
It is an object of the invention to overcome the deficiencies of the prior art and provide a kind of based on 1-D photon crystal coupled micro-cavity Optical biosensor preparation method removes attachment, oxide and the organic matter on the surfaces SOI by cleaning first and dries, Then it coating photoresist and is dried on preliminary drying treated sample by the way of spin coating, then carries out 1-D photon crystal coupling The electron beam exposure simultaneously aobvious fixing for closing microcavity, performs etching and cleans to sample finally by ICP, obtain a kind of high sensitivity, Detection limit is small, is easily integrated.
The purpose of the present invention is achieved through the following technical solutions:Optics based on 1-D photon crystal coupled micro-cavity Biosensor preparation method, includes the following steps:
SOI samples are cleaned in S1, pretreatment;
S2, preliminary drying, by by pretreated SOI samples be placed in the insulating box of 170~200 DEG C of temperature dry 2~ 5min is cooled to room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;
Sample after gluing is placed on 10~15min of baking in the insulating box of 170~200 DEG C of temperature by S4, rear baking, then It is cooled to room temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples Annular resonant cavity structure;
S6, development, fixing develop successively to the sample after exposure-processed, fixing operation, then are carried out with IPA solution Cleaning;
S7, etching, using ICP (Inductively Coupled Plasma inductively coupled plasmas) to developing fixing Treated, and sample performs etching operation;
Then S8, post-processing are rinsed after first using the cleaning of Piranha solution to the sample after etching processing using DI water, It is cleaned again using HF solution, finally DI water is used to rinse.
Further, the step S1 specifically includes following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, it is laggard using 5~10min of ultrasonic cleaning Row is dried, and is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, it will be rushed with DI water through step S11 treated SOI samples are put into Piranha solution 10~15min of cleaning It washes, processing is dried;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio mixing and At being to remove the organic matter for removing SOI surfaces using Piranha solution;
S13, will be through step S12 treated SOI samples are put into HF solution 15~20s of cleaning, the oxygen on the surfaces removal SOI Compound is dried after being rinsed with DI water;
Further, it is to be dried using nitrogen to be dried in described step S11, S12, S13.
Further, the step S3 concrete methods of realizing is:First 4~6s of spin coating under the rotating speed of 1000~1500rpm, Then 1~1.5min of spin coating under the rotating speed of 2000~3000rpm uses nitrogen pressure-vaccum SOI samples during spin coating. The photoresist is positive electronic beam resist ZEP520A.
Further, concrete methods of realizing is in the step S6:Sample after exposure is developed in ZED-N50 solvents Then 1~1.5min is fixed with MIBK, fixing time is 30~60s.
Further, etching depth is 200~300nm in the step S7, and the etching gas used is SF6/C4F8
Further, in the step S8,10~15min is cleaned using Piranha solution, is cleaned using HF solution 15~20s.
The beneficial effects of the invention are as follows:The present invention removes the attachment on SOI surfaces, oxide and organic by cleaning first Object is simultaneously dried, and then coating photoresist and is dried on preliminary drying treated sample by the way of spin coating, then carry out one-dimensional light The electron beam exposure of sub- crystal coupled micro-cavity and aobvious fixing, perform etching and clean to sample finally by ICP, obtain one kind Based on the optical biosensor of 1-D photon crystal coupled micro-cavity, the optical bio of preparation method making using the present invention The characteristics such as sensor has high sensitivity, detection limit is small, is easily integrated, contribute to the sensing of improving optical biosensor Performance.The preparation method of the present invention is simple to equipment requirement, easy to implement in technique, can reduce and make optical bio sensing The cost of manufacture of device is suitble to mass production.
Description of the drawings
Fig. 1 is the flow of the optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity of the present invention Figure;
Fig. 2 is the SOI sample structure schematic diagrames that the present invention uses;
Fig. 3 is the optical biosensor structural schematic diagram one based on 1-D photon crystal coupled micro-cavity of the present invention;
Fig. 4 is the optical biosensor structural schematic diagram two based on 1-D photon crystal coupled micro-cavity of the present invention;
Reference sign:21, silicon base;22, silicon oxide layer;23, silicon ducting layer;31, input and output straight wave guide; 32、 Straight wave guide output;33, Coupling point;34, micro-ring resonant cavity;401~402,433~434, uniform circular hole;403~432, non-equal Nicely rounded hole.
Specific implementation mode
The technical solution further illustrated the present invention below in conjunction with the accompanying drawings.
As shown in Figure 1, the optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, including following step Suddenly:
SOI samples are cleaned in S1, pretreatment;
S2, preliminary drying, by by pretreated SOI samples be placed in the insulating box of 170~200 DEG C of temperature dry 2~ 5min is cooled to room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;
Sample after gluing is placed on 10~15min of baking in the insulating box of 170~200 DEG C of temperature by S4, rear baking, then It is cooled to room temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples Annular resonant cavity structure;
S6, development, fixing develop successively to the sample after exposure-processed, fixing operation, then are carried out with IPA solution Cleaning;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation;
Then S8, post-processing are rinsed after first using the cleaning of Piranha solution to the sample after etching processing using DI water, It is cleaned again using HF solution, finally DI water is used to rinse.
As shown in Fig. 2, the SOI samples that the present invention uses are by lower layer's silicon base 21, intermediate silicon oxide layer 22 and upper layer of silicon wave Conducting shell 23 is constituted.
As shown in figure 3, for the optical biosensor based on 1-D photon crystal coupled micro-cavity prepared using the present invention, Including an input and output straight wave guide 31, straight wave guide output 32 and a silicon-based micro ring resonator 34.Input and output straight wave guide 31, straight wave guide output 32 is coupled with micro-ring resonant cavity 34 constitutes 1-D photon crystal coupled micro-cavity.On input and output straight wave guide 31 It is etched with several non-homogeneous circular holes and several uniform circular holes.Non-homogeneous circular hole region and uniform circular hole region are defeated about inputting The Coupling point 33 for going out straight wave guide 31 and silicon-based micro ring resonator is centrosymmetric distribution.The number of non-homogeneous circular hole is 2N, and N is 15。
As shown in figure 4, the non-homogeneous circular hole on input and output straight wave guide 31 includes 403~432 non-homogeneous circular holes constituted Region and the uniform circular hole area of 401~402,433~434 compositions.The number of non-homogeneous circular hole is 30.Uniform circular hole Number is 4, and 2 are distributed per side.The radius of non-homogeneous circular hole 417,418 is r1, 416,419 radius is r2, 415, 420 radius is r3, 414,421 radius is r4, 413,422 radius is r5, 412,423 radius is r6, 411,424 Radius is r7, 410,425 radius is r8, 409,426 radius is r9, 408,427 radius is r10, 407,428 radius For r11, 406,429 radius is r12, 405,430 radius is r13, 404,431 radius is r14, non-homogeneous circular hole 403, 432 radius is r15;The r1> r2> ... > r15,(i=1,2 ..., 15).And r1= 0.1025um, r15=0.0725um.The radius of uniform circular hole 401~402,433~434 is r16=0.0725um, described one Cycle T=0.325um of dimensional photonic crystal.
Technical scheme of the present invention is further detailed below by way of specific embodiment, further to show this hair Bright operating process and advantage.
Embodiment 1
A kind of optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, includes the following steps:
SOI samples are cleaned in S1, pretreatment;Specifically include following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using after ultrasonic cleaning 5min use nitrogen Processing is dried in gas, is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, will through step S11, treated that SOI samples are put into Piranha solution cleans 10min, rinsed with DI water, Processing is dried using nitrogen;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio It mixes, is to remove the organic matter for removing the surfaces SOI using Piranha solution;
S13, will through step S12, treated that SOI samples are put into HF solution cleans 15s, the oxidation on the surfaces removal SOI Processing is dried using nitrogen after being rinsed with DI water in object;
S2, preliminary drying dry 2min by being placed in the insulating box of 180 DEG C of temperature by pretreated SOI samples, then cool down To room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;Concrete methods of realizing is: The first spin coating 5s under the rotating speed of 1500rpm, then the spin coating 1.5min under the rotating speed of 3000rpm, uses during spin coating Nitrogen pressure-vaccum SOI samples, the thickness of the gluing of acquisition areThe photoresist is positive electronic beam resist ZEP520A.
S4, rear baking, the sample after gluing is placed on and dries 10min in the insulating box of 180 DEG C of temperature, is cooled to room Temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples The duct width of annular resonant cavity structure, the structure is 500nm;
S6, development, fixing develop the sample after exposure-processed 1min in ZED-N50 solvents, then use MIBK into Row fixing, fixing time 30s, then cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation, and etching depth 220nm makes Etching gas is SF6/C4F8
S8, post-processing are first used Piranha solution to clean 10min in the sample after etching processing, are then rushed using DI water It washes, then 15s is cleaned using HF solution, finally DI water is used to rinse.
Embodiment 2
A kind of optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, includes the following steps:
SOI samples are cleaned in S1, pretreatment;Specifically include following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using after ultrasonic cleaning 8min use nitrogen Processing is dried in gas, is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, will through step S11, treated that SOI samples are put into Piranha solution cleans 12min, rinsed with DI water, Processing is dried using nitrogen;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio It mixes, is to remove the organic matter for removing the surfaces SOI using Piranha solution;
S13, will through step S12, treated that SOI samples are put into HF solution cleans 18s, the oxidation on the surfaces removal SOI Processing is dried using nitrogen after being rinsed with DI water in object;
S2, preliminary drying dry 3min by being placed in the insulating box of 180 DEG C of temperature by pretreated SOI samples, then cool down To room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;Concrete methods of realizing is: The first spin coating 5s under the rotating speed of 1500rpm, then the spin coating 1.5min under the rotating speed of 2500rpm, uses during spin coating Nitrogen pressure-vaccum SOI samples, the thickness of the gluing of acquisition areThe photoresist is positive electronic beam resist ZEP520A.
S4, rear baking, the sample after gluing is placed on and dries 15min in the insulating box of 180 DEG C of temperature, is cooled to room Temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples The duct width of annular resonant cavity structure, the structure is 500nm;
Sample after exposure-processed is developed 1.2min in ZED-N50 solvents, then uses MIBK by S6, development, fixing It is fixed, fixing time 45s, then cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation, and etching depth 250nm makes Etching gas is SF6/C4F8
S8, post-processing are first used Piranha solution to clean 12min in the sample after etching processing, are then rushed using DI water It washes, then 18s is cleaned using HF solution, finally DI water is used to rinse.
Embodiment 3
A kind of optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, includes the following steps:
SOI samples are cleaned in S1, pretreatment;Specifically include following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using after ultrasonic cleaning 10min use nitrogen Processing is dried in gas, is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, will through step S11, treated that SOI samples are put into Piranha solution cleans 15min, rinsed with DI water, Processing is dried using nitrogen;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio It mixes, is to remove the organic matter for removing the surfaces SOI using Piranha solution;
S13, will through step S12, treated that SOI samples are put into HF solution cleans 20s, the oxidation on the surfaces removal SOI Processing is dried using nitrogen after being rinsed with DI water in object;
S2, preliminary drying dry 5min by being placed in the insulating box of 180 DEG C of temperature by pretreated SOI samples, then cool down To room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;Concrete methods of realizing is: The first spin coating 5s under the rotating speed of 1500rpm, then the spin coating 1.5min under the rotating speed of 2000rpm, uses during spin coating Nitrogen pressure-vaccum SOI samples, the thickness of the gluing of acquisition areThe photoresist is positive electronic beam resist ZEP520A.
S4, rear baking, the sample after gluing is placed on and dries 12min in the insulating box of 180 DEG C of temperature, is cooled to room Temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples The duct width of annular resonant cavity structure, the structure is 500nm;
Sample after exposure-processed is developed 1.5min in ZED-N50 solvents, then uses MIBK by S6, development, fixing It is fixed, fixing time 60s, then cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation, and etching depth 200nm makes Etching gas is SF6/C4F8
S8, post-processing are first used Piranha solution to clean 15min in the sample after etching processing, are then rushed using DI water It washes, then 20s is cleaned using HF solution, finally DI water is used to rinse.
Embodiment 4
A kind of optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, includes the following steps:
SOI samples are cleaned in S1, pretreatment;Specifically include following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using after ultrasonic cleaning 7min use nitrogen Processing is dried in gas, is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, will through step S11, treated that SOI samples are put into Piranha solution cleans 13min, rinsed with DI water, Processing is dried using nitrogen;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio It mixes, is to remove the organic matter for removing the surfaces SOI using Piranha solution;
S13, will through step S12, treated that SOI samples are put into HF solution cleans 17s, the oxidation on the surfaces removal SOI Processing is dried using nitrogen after being rinsed with DI water in object;
S2, preliminary drying dry 5min by being placed in the insulating box of 170 DEG C of temperature by pretreated SOI samples, then cool down To room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;Concrete methods of realizing is: The first spin coating 6s under the rotating speed of 1000rpm, then the spin coating 1.5min under the rotating speed of 2000rpm, uses during spin coating Nitrogen pressure-vaccum SOI samples, the photoresist are positive electronic beam resist ZEP520A.
S4, rear baking, the sample after gluing is placed on and dries 15min in the insulating box of 170 DEG C of temperature, is cooled to room Temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples The duct width of annular resonant cavity structure, the structure is 500nm;
Sample after exposure-processed is developed 1.3min in ZED-N50 solvents, then uses MIBK by S6, development, fixing It is fixed, fixing time 50s, then cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation, and etching depth 300nm makes Etching gas is SF6/C4F8
S8, post-processing are first used Piranha solution to clean 13min in the sample after etching processing, are then rushed using DI water It washes, then 17s is cleaned using HF solution, finally DI water is used to rinse.
Embodiment 5
A kind of optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, includes the following steps:
SOI samples are cleaned in S1, pretreatment;Specifically include following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using after ultrasonic cleaning 5min use nitrogen Processing is dried in gas, is to remove the attachment on the surfaces SOI using acetone soln and ultrasonic cleaning;
S12, will through step S11, treated that SOI samples are put into Piranha solution cleans 10min, rinsed with DI water, Processing is dried using nitrogen;The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio It mixes, is to remove the organic matter for removing the surfaces SOI using Piranha solution;
S13, will through step S12, treated that SOI samples are put into HF solution cleans 15s, the oxidation on the surfaces removal SOI Processing is dried using nitrogen after being rinsed with DI water in object;
S2, preliminary drying dry 2min by being placed in the insulating box of 200 DEG C of temperature by pretreated SOI samples, then cool down To room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;Concrete methods of realizing is: The first spin coating 4s under the rotating speed of 1200rpm, then the spin coating 1.5min under the rotating speed of 3000rpm, uses during spin coating Nitrogen pressure-vaccum SOI samples, the photoresist are positive electronic beam resist ZEP520A.
S4, rear baking, the sample after gluing is placed on and dries 10min in the insulating box of 200 DEG C of temperature, is cooled to room Temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is micro- that exposure figure is that 1-D photon crystal couples The duct width of annular resonant cavity structure, the structure is 500nm;
S6, development, fixing develop the sample after exposure-processed 1min in ZED-N50 solvents, then use MIBK into Row fixing, fixing time 30s, then cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation, and etching depth 270nm makes Etching gas is SF6/C4F8
S8, post-processing are first used Piranha solution to clean 10min in the sample after etching processing, are then rushed using DI water It washes, then 15s is cleaned using HF solution, finally DI water is used to rinse.
Those of ordinary skill in the art will understand that the embodiments described herein, which is to help reader, understands this hair Bright principle, it should be understood that protection scope of the present invention is not limited to such specific embodiments and embodiments.This field Those of ordinary skill can make according to the technical disclosures disclosed by the invention various does not depart from the other each of essence of the invention The specific variations and combinations of kind, these variations and combinations are still within the scope of the present invention.

Claims (10)

1. the optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity, it is characterised in that:Including following step Suddenly:
SOI samples are cleaned in S1, pretreatment;
S2, preliminary drying will be placed on 2~5min of baking in the insulating box of 170~200 DEG C of temperature by pretreated SOI samples, then It is cooled to room temperature;
S3, gluing coat photoresist by the way of spin coating on preliminary drying treated sample;
Sample after gluing is placed on 10~15min of baking in the insulating box of 170~200 DEG C of temperature, then cooled down by S4, rear baking To room temperature;
S5, exposure dry treated sample and carry out electron beam exposure to rear, and it is humorous that exposure figure is that 1-D photon crystal couples micro-loop Resonator structure;
S6, development, fixing develop successively to the sample after exposure-processed, fixing operation, then are cleaned with IPA solution;
S7, etching, using ICP, to developing fixing, treated that sample performs etching operation;
Then S8, post-processing are rinsed, then adopt after first using the cleaning of Piranha solution to the sample after etching processing using DI water It is cleaned with HF solution, finally DI water is used to rinse.
2. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:The SOI samples are made of lower layer's silicon base, intermediate silicon oxide layer and upper layer of silicon ducting layer.
3. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:The step S1 specifically includes following sub-step:
S11, will be blown over nitrogen after SOI samples be put into acetone soln, using 5~10min of ultrasonic cleaning, remove SOI Then processing is dried in the attachment on surface;
S12, the surfaces SOI will be removed through step S11 treated SOI samples are put into Piranha solution 10~15min of cleaning Organic matter, then use DI water rinse, processing is dried;
S13, will be through step S12 treated SOI samples are put into 15~20s of cleaning, the oxidations on the surfaces removal SOI in HF solution Object is dried after being rinsed with DI water;
4. the optical biosensor preparation method according to claim 3 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:The Piranha solution is under the conditions of 150 DEG C, by H2SO4With H2O2By 3:1 ratio mixes.
5. the optical biosensor preparation method according to claim 3 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:It is to be dried using nitrogen to be dried in described step S11, S12, S13.
6. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:The step S3 concrete methods of realizing is:First 4~6s of spin coating under the rotating speed of 1000~1500rpm, then exists 1~1.5min of spin coating under the rotating speed of 2000~3000rpm uses nitrogen pressure-vaccum SOI samples during spin coating.
7. the optical biosensor preparation method based on 1-D photon crystal coupled micro-cavity according to claim 1 or 6, It is characterized in that:The photoresist is positive electronic beam resist ZEP520A.
8. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:Concrete methods of realizing is in the step S6:Sample after exposure develops in ZED-N50 solvents to 1~ Then 1.5min is fixed with MIBK, fixing time is 30~60s.
9. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:Etching depth is 200~300nm in the step S7, and the etching gas used is SF6/C4F8
10. the optical biosensor preparation method according to claim 1 based on 1-D photon crystal coupled micro-cavity, It is characterized in that:In the step S8,10~15min is cleaned using Piranha solution, 15~20s of cleaning is carried out using HF solution.
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CN101339900A (en) * 2007-07-02 2009-01-07 旺宏电子股份有限公司 Method for surface modification of semiconductor layer and method of manufacturing semiconductor device
US9359513B1 (en) * 2010-05-07 2016-06-07 Thin Film Electronics Asa Dopant inks, methods of making dopant inks, and methods of using dopant inks
CN103645158A (en) * 2013-12-05 2014-03-19 中国电子科技集团公司第三十八研究所 Three-ring-shaped athermalized biosensor
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