CN108285738A - A kind of resistance to UV disappears shadow film coating materials - Google Patents
A kind of resistance to UV disappears shadow film coating materials Download PDFInfo
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- CN108285738A CN108285738A CN201610965105.XA CN201610965105A CN108285738A CN 108285738 A CN108285738 A CN 108285738A CN 201610965105 A CN201610965105 A CN 201610965105A CN 108285738 A CN108285738 A CN 108285738A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
- C08K13/02—Organic and inorganic ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2244—Oxides; Hydroxides of metals of zirconium
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/014—Additives containing two or more different additives of the same subgroup in C08K
Abstract
The present invention relates to optical field, discloses a kind of resistance to UV and disappear shadow film coating materials, including：5 15 parts of 5 20 part, nanometer alpha-aluminium oxide of polyfunctionality aliphatic polyurethane acrylic resin, 17 parts of nano-hafnium oxide, 18 parts of nano silicon oxide, 1 10 parts of silicate solutions, 27 parts of acryloyl morpholine, 0.2 2.0 parts of levelling agent, 13 parts of photoinitiator, 28 83.8 parts of organic solvent.By adding nano silicon oxide and substituting nano zircite with aluminium oxide, the usage amount of zirconium oxide is reduced completely, due to nano silicon oxide and nano aluminium oxide difference, thus the gap between can mutually being filled when mixing, the gap between particle is set to have better consistency, to solve the problems, such as that the consistency between homogenous material is relatively low.
Description
Technical field
The present invention relates to optical fields, and in particular to a kind of resistance to UV disappears shadow film coating materials.
Background technology
The shadow film that disappears is the important foundation material of capacitance ITO conductive films, and capacitance ITO films can generally be done in later stage processing procedure
Pattern, because of ITO lines (refractive index=1.8 ITO) and the etching areas Hou Wu ITO (common refractive index=1.5 HC)
There are larger refractive index differences, cause pattern visual, i.e., so-called aberration can largely effect on TP and be imitated using process vision
Fruit.For that purpose it is necessary to carry out the shadow processing that disappears, usually the shadow that disappears is carried out there are two types of method：
--- dry method：The metal oxide of sputter multilayer different refractivity i.e. on PET base materials, by controlling each layer refractive index
Reach attenuating aberration with coating layer thickness, reaches the shadow purpose that disappears.
--- wet method：It is pre-coated with a floor height refractive index coating on PET base materials and (is generally configured with hardened layer work(
Can), and then etching region coat refractive index is improved close to ITO line refractive index, which is commonly referred to as IM (disappear shadow film) paintings
Layer.The coating material of the above-mentioned shadow membrane coat that disappears is usually the nano zircite that UV solidified resins+modification are disperseed at present, due to
It is often required to carry out UV curing process during ITO film later stage uses, the shadow membrane coat that disappears that this material is formed is through multiple UV
After irradiation, because coating material and PET base material shrinking percentage are inconsistent, the former is more than the latter at shrinking percentage, therefore coating shedding can be caused to ask
Topic, seriously affects the use of conductive film.
It discloses one kind in the patent application No. is 201510884859.8 to disappear shadow film coating materials, due to zirconium oxide
Hardness is larger, and the reduction ratio of zirconium oxide is more difficult, and the cost of nanoscale zirconia is higher, the consistency between homogenous material compared with
It is low.Therefore, the prior art need to be improved.
Invention content
Disappear shadow film coating materials the present invention provides a kind of resistance to UV, journey is ground to solve zirconium oxide in the prior art
Degree is more difficult, and the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.
To achieve the above object, the technical solution adopted by the present invention is：
A kind of resistance to UV disappears shadow film coating materials, which includes following components in parts by mass：Polyfunctionality fat
5-20 parts of adoption urethane acrylate resin, 5-15 parts of nano-alpha aluminium oxide, 1-7 parts of nano-hafnium oxide, nano silicon oxide 1-8
It is part, 1-10 parts of silicate solutions, 2-7 parts of acryloyl morpholine, 0.2-2.0 parts of levelling agent, 1-3 parts of photoinitiator, organic
28-83.8 parts of solvent.
In terms of existing technologies, by adding nano silicon oxide and substituting nano zircite with aluminium oxide, completely
The usage amount of zirconium oxide is reduced, simultaneously because nano silicon oxide is different with the inherent crystal structure of nano aluminium oxide, outside the two
It is also differed in grain structure, so that the gap between can mutually being filled when mixing, makes the gap between particle have
Better consistency, more difficult to solve the reduction ratio of zirconium oxide, the cost of nanoscale zirconia is higher, homogenous material it
Between the relatively low problem of consistency.Due to the refractive index close of the refractive index and base of silica and silicate, it is further reduced
Image influences, improves visual effect.Since hafnium oxide has better translucidus, light transmittance is further improved.
Further, the mass fraction of the component is further as follows：Polyfunctionality aliphatic polyurethane acrylic resin
10-15 parts, 10-15 parts of nano-alpha aluminium oxide, 2-5 parts of nano-hafnium oxide, 2-6 parts of nano silicon oxide, silicate solutions 2-7
Part, 2-5 parts of acryloyl morpholine, 0.2-1.0 parts of levelling agent, 1-2 parts of photoinitiator, 44-70.8 parts of organic solvent.
Further, the degree of functionality of the polyfunctionality aliphatic polyurethane acrylic resin is 2-6, molecular weight
1000-20000。
Further, the photoinitiator is selected from photoinitiator 184, photoinitiator 1173, photoinitiator TPO and light
One of initiator 651.
Further, the organic solvent is selected from ketones solvent, lipid solvent, alcohols solvent or ether solvent, either
Two or more mixture in ketones solvent, lipid solvent, alcohols solvent and ether solvent.
Further, the ketones solvent refers in butanone, acetone, 2- pentanones, isophorone and methyl iso-butyl ketone (MIBK)
One or more kinds of mixtures, the lipid solvent refers to one or more of ethyl acetate and butyl acetate
Mixture, the alcohols solvent refer to the mixture of one or more of ethyl alcohol and isopropanol；The ether solvent is
Refer to the mixture of one or more of propylene glycol monomethyl ether and propylene glycol methyl ether acetate.
Further, the polyfunctionality aliphatic polyurethane acrylic resin is selected from：Aliphatic polyurethane trimethyl third
Olefin(e) acid resin, aliphatic polyurethane tetramethyl acrylic resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic poly ammonia
Ester hexamethyl acrylic resin, five acrylic resin of aliphatic polyurethane methyl, six acrylic resin of aliphatic polyurethane methyl,
One kind in aliphatic polyurethane methyl tetrapropylene acid resin.
Further, the silicate solutions are one kind in sodium metasilicate, potassium silicate saturated solution.
Due to the use of above technical scheme, the advantageous effect made it have is the present invention：
The usage amount of nano zircite is reduced by adding nano silicon oxide, simultaneously because nano silicon oxide and nano zircite
Inherent crystal structure is different, and the external grain structure of the two also differs, to it can mutually be filled when mixing between
Gap, so that the gap between particle is had better consistency, nanoscale oxygen more difficult to solve the reduction ratio of zirconium oxide
The cost for changing zirconium is higher, the relatively low problem of the consistency between homogenous material.Due to the refractive index and base of silica and silicate
The refractive index close of layer, being further reduced image influences, improves visual effect.By further selecting polyfunctionality aliphatic poly
Urethane acrylate resin and organic solvent, further decrease production cost, improve the effect of coating material, maintain it is original very
High resistance to UV characteristics, the shadow efficiency that disappears of holding coating that can be strong, namely improve ITO conduction film qualities.
Specific implementation mode
In order to which so that invention is realized technological means, creation feature, reached purpose and effect are easy to understand, further explain
State the present invention.
With reference to embodiment to the resistance to UV that this case provides disappear shadow film coating materials be specifically described it is as follows：
Following table is the mass parts statistics for four kinds of embodiment components that the present invention enumerates：
It carries out matching liquid according to the recipe requirements of each embodiment, dispersion mixing is good, by micro- plate gravure coating method, in the beautiful UH33 in east
Dry thick 1.5 μm of the coating of high refractive index primary coat face coating of base material (PET), cures through heated-air drying, 500mj/cm2UV
Afterwards at the shadow film that disappears.Light transmittance, mist degree, reflectivity and the adhesive force of resistance to UV test, test result are carried out to the shadow film that disappears see the table below：
| Test event | Embodiment one | Embodiment two | Embodiment three | Example IV |
| Light transmittance | 92.1% | 91.9% | 92.2% | 91.8% |
| Mist degree | 0.48 | 0.47 | 0.52 | 0.51 |
| Reflectivity | 6.19% | 6.21% | 6.28% | 6.31% |
In terms of existing technologies, it by adding nano silicon oxide and substituting nano zircite with aluminium oxide, reduces completely
The usage amount of zirconium oxide, simultaneously because nano silicon oxide is different with the inherent crystal structure of nano aluminium oxide, external of the two
Kernel structure also differs, so that the gap between can mutually being filled when mixing, makes the gap between particle have more preferably
Consistency, more difficult to solve the reduction ratio of zirconium oxide, the cost of nanoscale zirconia is higher, between homogenous material
The relatively low problem of consistency.Due to the refractive index close of the refractive index and base of silica and silicate, it is further reduced image
It influences, improve visual effect.Since hafnium oxide has better translucidus, light transmittance is further improved.By further selecting
Polyfunctionality aliphatic polyurethane acrylic resin and organic solvent, further decrease production cost, improve the effect of coating material
Fruit maintains original very high resistance to UV characteristics, the shadow efficiency that disappears of holding coating that can be strong, namely improves ITO conductions
Film quality.
The specific embodiment of invention is described above.It is to be appreciated that invention be not limited to it is above-mentioned specific
Embodiment, wherein the equipment and structure be not described in detail to the greatest extent are construed as being practiced with the common mode in this field；
Those skilled in the art can make within the scope of the claims various deformations or amendments make it is several it is simple deduce, deformation or
It replaces, this has no effect on the substantive content of invention.
Claims (8)
- The shadow film coating materials 1. a kind of resistance to UV disappears, which is characterized in that the coating material includes following components in parts by mass： 5-20 parts of polyfunctionality aliphatic polyurethane acrylic resin, 5-15 parts of nano-alpha aluminium oxide, 1-7 parts of nano-hafnium oxide, 1-8 parts of nano silicon oxide, 1-10 parts of silicate solutions, 2-7 parts of acryloyl morpholine, 0.2-2.0 parts of levelling agent, photoinitiator 1-3 parts, 28-83.8 parts of organic solvent.
- 2. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, which is characterized in that the quality of the component Number is further as follows：10-15 parts of polyfunctionality aliphatic polyurethane acrylic resin, 10-15 parts of nano-alpha aluminium oxide, 2-5 parts of nano-hafnium oxide, 2-6 parts of nano silicon oxide, 2-7 parts of silicate solutions, 2-5 parts of acryloyl morpholine, levelling agent 0.2- 1.0 parts, 1-2 parts of photoinitiator, 44-70.8 parts of organic solvent.
- 3. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The polyfunctionality fat The degree of functionality of fat adoption urethane acrylate resin is 2-6, molecular weight 1000-20000.
- 4. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The photoinitiator choosing From one of photoinitiator 184, photoinitiator 1173, photoinitiator TPO and photoinitiator 651.
- 5. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The organic solvent choosing From ketones solvent, lipid solvent, alcohols solvent or ether solvent or ketones solvent, lipid solvent, alcohols solvent and ethers Two or more mixture in solvent.
- 6. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 5, it is characterised in that：The ketones solvent is Refer to the mixture of one or more of butanone, acetone, 2 pentanone, isophorone and methyl iso-butyl ketone (MIBK), the lipid Solvent refers to the mixture of one or more of ethyl acetate and butyl acetate, and the alcohols solvent refers to ethyl alcohol and different The mixture of one or more of propyl alcohol；The ether solvent refers to propylene glycol monomethyl ether and propylene glycol methyl ether acetate One or more of mixture.
- 7. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 3, which is characterized in that the polyfunctionality fat Fat adoption urethane acrylate resin is selected from：Aliphatic polyurethane trimethacrylate acid resin, aliphatic polyurethane tetramethyl propylene Acid resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic polyurethane hexamethyl acrylic resin, aliphatic polyurethane In five acrylic resin of methyl, six acrylic resin of aliphatic polyurethane methyl, aliphatic polyurethane methyl tetrapropylene acid resin One kind.
- 8. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The silicate solutions For one kind in sodium metasilicate, potassium silicate saturated solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610965105.XA CN108285738A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610965105.XA CN108285738A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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| CN108285738A true CN108285738A (en) | 2018-07-17 |
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| CN201610965105.XA Pending CN108285738A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1653561A (en) * | 2002-05-23 | 2005-08-10 | 日本油脂株式会社 | Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film |
| CN105331278A (en) * | 2015-12-04 | 2016-02-17 | 江苏日久光电股份有限公司 | Anti-UV shadow eliminating film coating material |
-
2016
- 2016-11-04 CN CN201610965105.XA patent/CN108285738A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1653561A (en) * | 2002-05-23 | 2005-08-10 | 日本油脂株式会社 | Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film |
| CN105331278A (en) * | 2015-12-04 | 2016-02-17 | 江苏日久光电股份有限公司 | Anti-UV shadow eliminating film coating material |
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Application publication date: 20180717 |
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