CN108285737A - A kind of resistance to UV disappears shadow film coating materials - Google Patents

A kind of resistance to UV disappears shadow film coating materials Download PDF

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Publication number
CN108285737A
CN108285737A CN201610962340.1A CN201610962340A CN108285737A CN 108285737 A CN108285737 A CN 108285737A CN 201610962340 A CN201610962340 A CN 201610962340A CN 108285737 A CN108285737 A CN 108285737A
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CN
China
Prior art keywords
parts
solvent
resistance
aliphatic polyurethane
coating materials
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610962340.1A
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Chinese (zh)
Inventor
任国伟
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Jiangsu Rijiu Optoelectronics Joint Stock Co Ltd
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Jiangsu Rijiu Optoelectronics Joint Stock Co Ltd
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Priority to CN201610962340.1A priority Critical patent/CN108285737A/en
Publication of CN108285737A publication Critical patent/CN108285737A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2244Oxides; Hydroxides of metals of zirconium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/011Nanostructured additives

Abstract

The present invention relates to optical field, discloses a kind of resistance to UV and disappear shadow film coating materials, which includes following components in parts by mass:5 20 parts of polyfunctionality aliphatic polyurethane acrylic resin, 10 20 parts of nano zircite, 1 15 parts of nano-hafnium oxide, 27 parts of acryloyl morpholine, 0.2 2.0 parts of levelling agent, 13 parts of photoinitiator, 33 80.8 parts of organic solvent.The present invention reduces the usage amount of nano zircite by adding nano-hafnium oxide, simultaneously because nano-hafnium oxide is different with the inherent crystal structure of nano zircite, the external grain structure of the two also differs, thus the gap between can mutually being filled when mixing, the gap between particle is set to have better consistency, more difficult to solve the reduction ratio of zirconium oxide, the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.Since hafnium oxide has better translucidus, light transmittance is further improved.

Description

A kind of resistance to UV disappears shadow film coating materials
Technical field
The present invention relates to optical fields, and in particular to a kind of resistance to UV disappears shadow film coating materials.
Background technology
The shadow film that disappears is the important foundation material of capacitance ITO conductive films, and capacitance ITO films can generally be done in later stage processing procedure Pattern, because there are larger with the etching areas Hou Wu ITO (common refractive index=1.5 HC) for ITO lines (refractive index=1.8 ITO) Refractive index difference causes pattern visual, i.e., so-called aberration can largely effect on TP and use process vision effect.For that purpose it is necessary to The shadow processing that disappears is carried out, usually carries out the shadow that disappears there are two types of method:
--- dry method:The metal oxide of sputter multilayer different refractivity i.e. on PET base materials, by controlling each layer refractive index Reach attenuating aberration with coating layer thickness, reaches the shadow purpose that disappears.
--- wet method:It is pre-coated with a floor height refractive index coating on PET base materials and (is generally configured with hardened layer work( Can), and then etching region coat refractive index is improved close to ITO line refractive index, which is commonly referred to as IM (disappear shadow film) coating. The coating material of the above-mentioned shadow membrane coat that disappears is usually the nano zircite of UV solidified resins+modification dispersion at present, due in ITO It is often required to carry out UV curing process during the use of film later stage, what this material was formed disappears shadow membrane coat through multiple UV irradiations Afterwards, because coating material and PET base material shrinking percentages are inconsistent, the former is more than the latter at shrinking percentage, therefore can cause coating shedding problem, Seriously affect the use of conductive film.
It discloses one kind in the patent application No. is 201510884859.8 to disappear shadow film coating materials, due to zirconium oxide Hardness is larger, and the reduction ratio of zirconium oxide is more difficult, and the cost of nanoscale zirconia is higher, the consistency between homogenous material compared with It is low.Therefore, the prior art need to be improved.
Invention content
Disappear shadow film coating materials the present invention provides a kind of resistance to UV, journey is ground to solve zirconium oxide in the prior art Degree is more difficult, and the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.
To achieve the above object, the technical solution adopted by the present invention is:
A kind of resistance to UV disappears shadow film coating materials, which includes following components in parts by mass:Polyfunctionality fat 5-20 parts of adoption urethane acrylate resin, 10-20 parts of nano zircite, 1-15 parts of nano-hafnium oxide, 2-7 parts of acryloyl morpholine, 0.2-2.0 parts of levelling agent, 1-3 parts of photoinitiator, 33-80.8 parts of organic solvent.
In terms of existing technologies, the usage amount of nano zircite is reduced by adding nano-hafnium oxide, simultaneously because Nano-hafnium oxide is different with the inherent crystal structure of nano zircite, and the external grain structure of the two also differs, to mixed Gap between can mutually being filled when conjunction makes the gap between particle have better consistency, to solve oxidation The reduction ratio of zirconium is more difficult, and the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.Due to oxygen Changing hafnium has better translucidus, further improves light transmittance.
Further, the mass fraction of the component is further as follows:Polyfunctionality aliphatic polyurethane acrylic resin 10-15 parts, 10-20 parts of nano zircite, 2-6 parts of nano-hafnium oxide, 2-5 parts of acryloyl morpholine, 0.2-1.0 parts of levelling agent, light 1-2 parts of initiator, 51-74.8 parts of organic solvent.
Further, the degree of functionality of the polyfunctionality aliphatic polyurethane acrylic resin is 2-6, molecular weight 1000- 20000。
Further, the photoinitiator draws selected from photoinitiator 184, photoinitiator 1173, photoinitiator TPO and light Send out one of agent 651.
Further, the organic solvent is selected from ketones solvent, lipid solvent, alcohols solvent or ether solvent, either Two or more mixture in ketones solvent, lipid solvent, alcohols solvent and ether solvent.
Further, the ketones solvent refers in butanone, acetone, 2- pentanones, isophorone and methyl iso-butyl ketone (MIBK) One or more kinds of mixtures, the lipid solvent refers to one or more of ethyl acetate and butyl acetate Mixture, the alcohols solvent refer to the mixture of one or more of ethyl alcohol and isopropanol;The ether solvent is Refer to the mixture of one or more of propylene glycol monomethyl ether and propylene glycol methyl ether acetate.
Further, the polyfunctionality aliphatic polyurethane acrylic resin is selected from:Aliphatic polyurethane trimethyl third Olefin(e) acid resin, aliphatic polyurethane tetramethyl acrylic resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic poly ammonia Ester hexamethyl acrylic resin, five acrylic resin of aliphatic polyurethane methyl, six acrylic resin of aliphatic polyurethane methyl, One kind in aliphatic polyurethane methyl tetrapropylene acid resin.
Due to the use of above technical scheme, the advantageous effect made it have is the present invention:
The usage amount of nano zircite is reduced by adding nano-hafnium oxide, simultaneously because nano-hafnium oxide and nano zircite Inherent crystal structure is different, and the external grain structure of the two also differs, to it can mutually be filled when mixing between Gap, so that the gap between particle is had better consistency, nanoscale oxygen more difficult to solve the reduction ratio of zirconium oxide The cost for changing zirconium is higher, the relatively low problem of the consistency between homogenous material.Since hafnium oxide has better translucidus, further Improve light transmittance.By further selecting polyfunctionality aliphatic polyurethane acrylic resin and organic solvent, further drop Low production cost improves the effect of coating material, maintains original very high resistance to UV characteristics, holding coating that can be strong The shadow efficiency that disappears, namely improve ITO conduction film qualities.
Specific implementation mode
In order to which so that invention is realized technological means, creation feature, reached purpose and effect are easy to understand, further explain State the present invention.
With reference to embodiment to the resistance to UV that this case provides disappear shadow film coating materials be specifically described it is as follows:
Following table is the mass parts statistics for four kinds of embodiment components that the present invention enumerates:
It carries out matching liquid according to the recipe requirements of each embodiment, dispersion mixing is good, by micro- plate gravure coating method, in the beautiful UH33 in east Dry thick 1.5 μm of the coating of high refractive index primary coat face coating of base material (PET), cures through heated-air drying, 500mj/cm2UV Afterwards at the shadow film that disappears.Light transmittance, mist degree, reflectivity and the adhesive force of resistance to UV test, test result are carried out to the shadow film that disappears see the table below:
Test event Embodiment one Embodiment two Embodiment three Example IV
Light transmittance 92.5% 92.1% 91.8% 91.5%
Mist degree 0.42 0.51 0.58 0.62
Reflectivity 6.34% 6.27% 6.51% 6.42%
The usage amount that nano-hafnium oxide reduces nano zircite is added, simultaneously because the inherence of nano-hafnium oxide and nano zircite Crystal structure is different, and the external grain structure of the two also differs, thus the seam between can mutually being filled when mixing Gap makes the gap between particle have better consistency, to more difficult, the nanoscale zirconia that solves the reduction ratio of zirconium oxide Cost it is higher, the relatively low problem of consistency between homogenous material.Since hafnium oxide has better translucidus, pass through test item The data of mesh light transmittance, the present invention have preferable light transmittance than the prior art, further improve light transmittance.By further selecting Polyfunctionality aliphatic polyurethane acrylic resin and organic solvent are selected, production cost is further decreased, improves coating material Effect maintains original very high resistance to UV characteristics, the shadow efficiency that disappears of holding coating that can be strong, namely improves ITO Conductive film quality.
The specific embodiment of invention is described above.It is to be appreciated that invention be not limited to it is above-mentioned specific Embodiment, wherein the equipment and structure be not described in detail to the greatest extent are construed as being practiced with the common mode in this field; Those skilled in the art can make within the scope of the claims various deformations or amendments make it is several it is simple deduce, deformation or It replaces, this has no effect on the substantive content of invention.

Claims (7)

  1. The shadow film coating materials 1. a kind of resistance to UV disappears, which is characterized in that the coating material includes following components in parts by mass: 5-20 parts of polyfunctionality aliphatic polyurethane acrylic resin, 10-20 parts of nano zircite, 1-15 parts of nano-hafnium oxide, third 2-7 parts of dimethomorph, 0.2-2.0 parts of levelling agent, 1-3 parts of photoinitiator, 33-80.8 parts of organic solvent.
  2. 2. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that:The quality of the component Number is further as follows:10-15 parts of polyfunctionality aliphatic polyurethane acrylic resin, 10-20 parts of nano zircite, nanometer 2-6 parts of hafnium oxide, 2-5 parts of acryloyl morpholine, 0.2-1.0 parts of levelling agent, 1-2 parts of photoinitiator, 51-74.8 parts of organic solvent.
  3. 3. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that:The polyfunctionality fat The degree of functionality of fat adoption urethane acrylate resin is 2-6, molecular weight 1000-20000.
  4. 4. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that:The photoinitiator choosing From one of photoinitiator 184, photoinitiator 1173, photoinitiator TPO and photoinitiator 651.
  5. 5. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that:The organic solvent choosing From ketones solvent, lipid solvent, alcohols solvent or ether solvent or ketones solvent, lipid solvent, alcohols solvent and ethers Two or more mixture in solvent.
  6. 6. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 5, it is characterised in that:The ketones solvent is Refer to the mixture of one or more of butanone, acetone, 2 pentanone, isophorone and methyl iso-butyl ketone (MIBK), the lipid Solvent refers to the mixture of one or more of ethyl acetate and butyl acetate, and the alcohols solvent refers to ethyl alcohol and different The mixture of one or more of propyl alcohol;The ether solvent refers to propylene glycol monomethyl ether and propylene glycol methyl ether acetate One or more of mixture.
  7. 7. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 3, which is characterized in that the polyfunctionality fat Adoption urethane acrylate resin is selected from:Aliphatic polyurethane trimethacrylate acid resin, aliphatic polyurethane tetramethyl acrylic acid Resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic polyurethane hexamethyl acrylic resin, aliphatic polyurethane first In five acrylic resin of base, six acrylic resin of aliphatic polyurethane methyl, aliphatic polyurethane methyl tetrapropylene acid resin It is a kind of.
CN201610962340.1A 2016-11-04 2016-11-04 A kind of resistance to UV disappears shadow film coating materials Pending CN108285737A (en)

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Application Number Priority Date Filing Date Title
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Publications (1)

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CN108285737A true CN108285737A (en) 2018-07-17

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1653561A (en) * 2002-05-23 2005-08-10 日本油脂株式会社 Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film
CN105331278A (en) * 2015-12-04 2016-02-17 江苏日久光电股份有限公司 Anti-UV shadow eliminating film coating material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1653561A (en) * 2002-05-23 2005-08-10 日本油脂株式会社 Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film
CN105331278A (en) * 2015-12-04 2016-02-17 江苏日久光电股份有限公司 Anti-UV shadow eliminating film coating material

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Application publication date: 20180717

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