CN108285736A - A kind of resistance to UV disappears shadow film coating materials - Google Patents
A kind of resistance to UV disappears shadow film coating materials Download PDFInfo
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- CN108285736A CN108285736A CN201610962339.9A CN201610962339A CN108285736A CN 108285736 A CN108285736 A CN 108285736A CN 201610962339 A CN201610962339 A CN 201610962339A CN 108285736 A CN108285736 A CN 108285736A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2244—Oxides; Hydroxides of metals of zirconium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/014—Additives containing two or more different additives of the same subgroup in C08K
Abstract
The present invention relates to optical field, discloses a kind of resistance to UV and disappear shadow film coating materials, including：5 20 parts of polyfunctionality aliphatic polyurethane acrylic resin, 5 15 parts of nano zircite, 1 15 parts of nano silicon oxide, 5 15 parts of silicate solutions, 27 parts of acryloyl morpholine, 0.2 2.0 parts of levelling agent, 13 parts of photoinitiator, 23 80.8 parts of organic solvent.The usage amount of nano zircite is reduced by adding nano silicon oxide, since the inherent crystal structure difference of the two, external grain structure also differ, gap between can mutually being filled when mixing, the gap between particle is set to have better consistency, it is more difficult to solve the reduction ratio of zirconium oxide, the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.Due to the refractive index close of the refractive index and base of silica and silicate, being further reduced image influences, improves visual effect.
Description
Technical field
The present invention relates to optical fields, and in particular to a kind of resistance to UV disappears shadow film coating materials.
Background technology
The shadow film that disappears is the important foundation material of capacitance ITO conductive films, and capacitance ito film can generally do figure in later stage processing procedure
Case, because there are larger refringences with the etching areas Hou Wu ITO (common refractive index=1.5 HC) for ITO lines (refractive index=1.8 ITO)
It is different, cause pattern visual, i.e., so-called aberration can largely effect on TP and use process vision effect.For that purpose it is necessary to carry out the shadow that disappears
Processing usually carries out the shadow that disappears there are two types of method：
--- dry method：The metal oxide of sputter multilayer different refractivity i.e. on PET base materials, by controlling each layer refractive index
Reach attenuating aberration with coating layer thickness, reaches the shadow purpose that disappears.
--- wet method：A floor height refractive index coating (being generally configured with hardening layer function) is pre-coated in PET base material,
And then etching region coat refractive index is improved close to ITO line refractive index, which is commonly referred to as IM (disappear shadow film) coating.It is above-mentioned
The coating material of shadow membrane coat of disappearing is usually nano zircite that UV solidified resins+modification are disperseed at present, due in ITO
It is often required to carry out UV curing process during the use of film later stage, what this material was formed disappears shadow membrane coat through multiple UV photographs
After penetrating, because coating material and PET base material shrinking percentage are inconsistent, the former is more than the latter at shrinking percentage, therefore can cause coating shedding problem,
Seriously affect the use of conductive film.
It discloses one kind in the patent application No. is 201510884859.8 to disappear shadow film coating materials, due to zirconium oxide
Hardness is larger, and the reduction ratio of zirconium oxide is more difficult, and the cost of nanoscale zirconia is higher, the consistency between homogenous material compared with
It is low.Therefore, the prior art need to be improved.
Invention content
Disappear shadow film coating materials the present invention provides a kind of resistance to UV, to solve the reduction ratio of zirconium oxide in the prior art
More difficult, the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.
To achieve the above object, the technical solution adopted by the present invention is：
A kind of resistance to UV disappears shadow film coating materials, which includes following components in parts by mass：Polyfunctionality aliphatic
5-20 parts of polyurethane acrylic resin, 5-15 parts of nano zircite, 1-15 parts of nano silicon oxide, 5-15 parts of silicate solutions, third
2-7 parts of dimethomorph, 0.2-2.0 parts of levelling agent, 1-3 parts of photoinitiator, 23-80.8 parts of organic solvent.
In terms of existing technologies, the usage amount of nano zircite is reduced by adding nano silicon oxide, simultaneously because
Nano silicon oxide is different with the inherent crystal structure of nano zircite, and the external grain structure of the two also differs, to mixed
Gap between can mutually being filled when conjunction makes the gap between particle have better consistency, to solve oxidation
The reduction ratio of zirconium is more difficult, and the cost of nanoscale zirconia is higher, the relatively low problem of the consistency between homogenous material.Due to oxygen
The refractive index close of the refractive index and base of SiClx and silicate, being further reduced image influences, improves visual effect.
Further, the mass fraction of the component is further as follows：Polyfunctionality aliphatic polyurethane acrylic resin
10-15 parts, 10-15 parts of nano zircite, 5-10 parts of nano silicon oxide, 5-15 parts of silicate solutions, 2-5 parts of acryloyl morpholine,
0.2-1.0 parts of levelling agent, 1-2 parts of photoinitiator, 47-66.8 parts of organic solvent.
Further, the degree of functionality of the polyfunctionality aliphatic polyurethane acrylic resin is 2-6, molecular weight 1000-
20000。
Further, the photoinitiator draws selected from photoinitiator 184, photoinitiator 1173, photoinitiator TPO and light
Send out one of agent 651.
Further, the organic solvent is selected from ketones solvent, lipid solvent, alcohols solvent or ether solvent, either
Two or more mixture in ketones solvent, lipid solvent, alcohols solvent and ether solvent.
Further, the ketones solvent refers in butanone, acetone, 2- pentanones, isophorone and methyl iso-butyl ketone (MIBK)
One or more kinds of mixtures, the lipid solvent refers to one or more of ethyl acetate and butyl acetate
Mixture, the alcohols solvent refer to the mixture of one or more of ethyl alcohol and isopropanol；The ether solvent is
Refer to the mixture of one or more of propylene glycol monomethyl ether and propylene glycol methyl ether acetate.
Further, the polyfunctionality aliphatic polyurethane acrylic resin is selected from：Aliphatic polyurethane trimethyl third
Olefin(e) acid resin, aliphatic polyurethane tetramethyl acrylic resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic poly ammonia
Ester hexamethyl acrylic resin, five acrylic resin of aliphatic polyurethane methyl, six acrylic resin of aliphatic polyurethane methyl,
One kind in aliphatic polyurethane methyl tetrapropylene acid resin.
Further, the silicate solutions are one kind in sodium metasilicate, potassium silicate saturated solution.
Due to the use of above technical scheme, the advantageous effect made it have is the present invention：
The usage amount of nano zircite is reduced by adding nano silicon oxide, simultaneously because nano silicon oxide and nano zircite
Inherent crystal structure is different, and the external grain structure of the two also differs, to it can mutually be filled when mixing between
Gap, so that the gap between particle is had better consistency, nanoscale oxygen more difficult to solve the reduction ratio of zirconium oxide
The cost for changing zirconium is higher, the relatively low problem of the consistency between homogenous material.Due to the refractive index and base of silica and silicate
The refractive index close of layer, being further reduced image influences, improves visual effect.By further selecting polyfunctionality aliphatic poly
Urethane acrylate resin and organic solvent, further decrease production cost, improve the effect of coating material, maintain it is original very
High resistance to UV characteristics, the shadow efficiency that disappears of holding coating that can be strong, namely improve ITO conduction film qualities.
Specific implementation mode
In order to which so that invention is realized technological means, creation feature, reached purpose and effect are easy to understand, this is expanded on further
Invention.
With reference to embodiment to the resistance to UV that this case provides disappear shadow film coating materials be specifically described it is as follows：
Following table is the mass parts statistics for four kinds of embodiment components that the present invention enumerates：
It carries out matching liquid according to the recipe requirements of each embodiment, dispersion mixing is good, by micro- plate gravure coating method, in the beautiful UH33 in east
Dry thick 1.5 μm of the coating of high refractive index primary coat face coating of base material (PET), cures through heated-air drying, 500mj/cm2UV
Afterwards at the shadow film that disappears.Light transmittance, mist degree, reflectivity and the adhesive force of resistance to UV test, test result are carried out to the shadow film that disappears see the table below：
| Test event | Embodiment one | Embodiment two | Embodiment three | Example IV |
| Light transmittance | 92.3% | 91.7% | 92.0% | 91.9% |
| Mist degree | 0.49 | 0.46 | 0.56 | 0.53 |
| Reflectivity | 6.04% | 6.23% | 6.47% | 6.37% |
The usage amount of nano zircite is reduced by adding nano silicon oxide, simultaneously because nano silicon oxide and nano zircite
Inherent crystal structure is different, and the external grain structure of the two also differs, to it can mutually be filled when mixing between
Gap, so that the gap between particle is had better consistency, nanoscale oxygen more difficult to solve the reduction ratio of zirconium oxide
The cost for changing zirconium is higher, the relatively low problem of the consistency between homogenous material.Due to the refractive index and base of silica and silicate
The refractive index close of layer, being further reduced image influences, improves visual effect.By further selecting polyfunctionality aliphatic poly
Urethane acrylate resin and organic solvent, further decrease production cost, improve the effect of coating material, maintain it is original very
High resistance to UV characteristics, the shadow efficiency that disappears of holding coating that can be strong, namely improve ITO conduction film qualities.
The specific embodiment of invention is described above.It is to be appreciated that invention be not limited to it is above-mentioned specific
Embodiment, wherein the equipment and structure be not described in detail to the greatest extent are construed as being practiced with the common mode in this field；
Those skilled in the art can make within the scope of the claims various deformations or amendments make it is several it is simple deduce, deformation or
It replaces, this has no effect on the substantive content of invention.
Claims (8)
- The shadow film coating materials 1. a kind of resistance to UV disappears, which is characterized in that the coating material includes following groups in parts by mass Point：5-20 parts of polyfunctionality aliphatic polyurethane acrylic resin, 5-15 parts of nano zircite, 1-15 parts of nano silicon oxide, 5-15 parts of silicate solutions, 2-7 parts of acryloyl morpholine, 0.2-2.0 parts of levelling agent, 1-3 parts of photoinitiator, organic solvent 23- 80.8 parts.
- 2. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, which is characterized in that the mass parts of the component Number is further as follows：10-15 parts of polyfunctionality aliphatic polyurethane acrylic resin, 10-15 parts of nano zircite, nano oxygen 5-10 parts of SiClx, 2-5 parts of acryloyl morpholine, 0.2-1.0 parts of levelling agent, 1-2 parts of photoinitiator, has 5-15 parts of silicate solutions 47-66.8 parts of solvent.
- 3. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The polyfunctionality fat The degree of functionality of fat adoption urethane acrylate resin is 2-6, molecular weight 1000-20000.
- 4. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The photoinitiator choosing From one of photoinitiator 184, photoinitiator 1173, photoinitiator TPO and photoinitiator 651.
- 5. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, it is characterised in that：The organic solvent is selected from Ketones solvent, lipid solvent, alcohols solvent or ether solvent or ketones solvent, lipid solvent, alcohols solvent and ethers are molten Two or more mixture in agent.
- 6. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 5, it is characterised in that：The ketones solvent refers to The mixture of one or more of butanone, acetone, 2 pentanone, isophorone and methyl iso-butyl ketone (MIBK), the lipid are molten Agent refers to the mixture of one or more of ethyl acetate and butyl acetate, and the alcohols solvent refers to ethyl alcohol and isopropyl The mixture of one or more of alcohol；The ether solvent refers in propylene glycol monomethyl ether and propylene glycol methyl ether acetate One or more kinds of mixtures.
- 7. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 3, it is characterised in that：The polyfunctionality fat Fat adoption urethane acrylate resin is selected from：Aliphatic polyurethane trimethacrylate acid resin, aliphatic polyurethane tetramethyl propylene Acid resin, aliphatic polyurethane pentamethyl acrylic resin, aliphatic polyurethane hexamethyl acrylic resin, aliphatic polyurethane In five acrylic resin of methyl, six acrylic resin of aliphatic polyurethane methyl, aliphatic polyurethane methyl tetrapropylene acid resin One kind.
- 8. being disappeared shadow film coating materials according to a kind of resistance to UV described in claim 1, which is characterized in that the silicate solutions For one kind in sodium metasilicate, potassium silicate saturated solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610962339.9A CN108285736A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610962339.9A CN108285736A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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| Publication Number | Publication Date |
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| CN108285736A true CN108285736A (en) | 2018-07-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610962339.9A Pending CN108285736A (en) | 2016-11-04 | 2016-11-04 | A kind of resistance to UV disappears shadow film coating materials |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111849342A (en) * | 2020-07-22 | 2020-10-30 | 宁波惠之星新材料科技有限公司 | Low-water-contact high-refractive-index hardening liquid and method for preparing ITO conductive film by using same |
| WO2023216487A1 (en) * | 2022-05-13 | 2023-11-16 | 山东国瓷功能材料股份有限公司 | Photocurable nano zirconium oxide dispersion and preparation method therefor, and optical film |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1653561A (en) * | 2002-05-23 | 2005-08-10 | 日本油脂株式会社 | Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film |
| CN104321831A (en) * | 2012-05-21 | 2015-01-28 | 乐金华奥斯有限公司 | Transparent conductive film including hybrid undercoating layer, method for manufacturing same, and touch panel using same |
| CN105331278A (en) * | 2015-12-04 | 2016-02-17 | 江苏日久光电股份有限公司 | Anti-UV shadow eliminating film coating material |
-
2016
- 2016-11-04 CN CN201610962339.9A patent/CN108285736A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1653561A (en) * | 2002-05-23 | 2005-08-10 | 日本油脂株式会社 | Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film |
| CN104321831A (en) * | 2012-05-21 | 2015-01-28 | 乐金华奥斯有限公司 | Transparent conductive film including hybrid undercoating layer, method for manufacturing same, and touch panel using same |
| CN105331278A (en) * | 2015-12-04 | 2016-02-17 | 江苏日久光电股份有限公司 | Anti-UV shadow eliminating film coating material |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111849342A (en) * | 2020-07-22 | 2020-10-30 | 宁波惠之星新材料科技有限公司 | Low-water-contact high-refractive-index hardening liquid and method for preparing ITO conductive film by using same |
| WO2023216487A1 (en) * | 2022-05-13 | 2023-11-16 | 山东国瓷功能材料股份有限公司 | Photocurable nano zirconium oxide dispersion and preparation method therefor, and optical film |
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Application publication date: 20180717 |
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