CN108235552B - Plasma generation unit having multi-stage vortex structure and exhaust gas treatment device - Google Patents

Plasma generation unit having multi-stage vortex structure and exhaust gas treatment device Download PDF

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Publication number
CN108235552B
CN108235552B CN201611190171.0A CN201611190171A CN108235552B CN 108235552 B CN108235552 B CN 108235552B CN 201611190171 A CN201611190171 A CN 201611190171A CN 108235552 B CN108235552 B CN 108235552B
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anode
working gas
supplied
vortex structure
section
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CN201611190171.0A
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CN108235552A (en
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金翼年
姜成玉
安在闰
严敏钦
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Triple Core Technology Co.,Ltd.
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Triple Cores Korea
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06Spray cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes
    • B01D53/78Liquid phase processes with gas-liquid contact
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437Multilayer systems
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818Employing electrical discharges or the generation of a plasma

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The present invention relates to a plasma generation unit having a multistage vortex structure and an exhaust gas treatment device, and the plasma generation unit having a multistage vortex structure of the present invention includes: a cathode section (10); an anode section (100) disposed apart from the cathode section (10); and a vortex structure (200) disposed so as to surround the cathode section (10) and the anode section (100), wherein the vortex structure (200) is configured to supply a working gas in multiple stages through the anode section (100) in order to generate plasma.

Description

Plasma generation unit having multi-stage vortex structure and exhaust gas treatment device
Technical Field
The present invention relates to a plasma generating unit having a multi-stage vortex structure and an exhaust gas treatment apparatus having the plasma generating unit, and more particularly, to a plasma generating unit in which a multi-stage vortex structure is disposed around a plurality of electrodes to control the length of a flame formed in order to supply a working gas to be supplied between a cathode electrode and an anode electrode in multi-stages, and an exhaust gas treatment apparatus having the plasma generating unit.
Background
Generally, plasma is in a fourth material state composed of electrons and ions having electric polarity, and is distributed in a density such that the number of negative charges and the number of positive charges are almost equal as a whole, and is electrically almost neutral. The plasma is divided into a high-temperature plasma having a high temperature such as an arc and a low-temperature plasma, and in the low-temperature plasma, the energy of electrons is high but the energy of ions is low, so that the actually sensed temperature corresponds to room temperature, and the plasma is often generated by means of an electric discharge such as a direct current, an alternating current, an ultrahigh frequency, or an electron beam.
In korean laid-open patent No. 10-2016 0043820, a structure of an apparatus for treating exhaust gas and the like using such plasma is disclosed.
Generally, one of the modes of generating such plasma is to generate plasma by arc discharge, and in this case, the exhaust gas treatment device includes: a plasma generating unit for generating plasma by an arc discharge torch, i.e., a flame, using the working gas flowing in; a reaction part for mixing the plasma transferred from the plasma generation part with the inflow exhaust gas to perform treatment; and a washing section for washing the gas treated in the reaction section with water or the like to lower the temperature.
In the plasma generating section, in order to generate plasma between the cathode electrode and the anode electrode, a working gas is injected through a supply pipe so as to be able to make a swirling motion, and arc discharge is generated by applying a power source, thereby forming jet plasma.
On the other hand, it is necessary to generate a flame by means of an electrode gap between a cathode electrode and an anode electrode, and after the flame is formed by ignition, the length of the flame must be controlled by supplying a working gas.
Patent document 1: korean laid-open patent No. 10-2016-0043820A
Disclosure of Invention
The present invention has been made to solve the above-described conventional problems, and an object of the present invention is to provide a plasma generation unit in which a plurality of stages of vortex structures are arranged around a plurality of electrodes to control the length of a flame to be formed in order to supply a working gas to be supplied between a cathode electrode and an anode electrode in a plurality of stages, and an exhaust gas treatment apparatus including the plasma generation unit.
The plasma generation unit having a multistage vortex structure according to an embodiment of the present invention for achieving the above object includes: a cathode section (10); an anode section 100 disposed apart from the cathode section 10; and a vortex structure 200 disposed so as to surround the cathode portion 10 and the anode portion 100, wherein the vortex structure 200 supplies a working gas in multiple stages through the anode portion 100 in order to generate plasma.
The anode 100 includes: an upper anode 110 disposed so as to surround a part of the lower portion of the cathode 10; and a lower anode 120 coupled to the upper anode 110 along a lower direction of the upper anode 110 in a state where a space capable of supplying a working gas is formed between the lower anode and the upper anode 110, wherein the vortex structure 200 includes: a first vortex structure 210 to which a working gas is supplied through a first working gas nozzle 115 formed in the upper anode 110; and a second vortex structure 220 to which the working gas is supplied through a second working gas nozzle 124 formed in the lower anode 120.
Cooling flow paths 216, 223, and 125 are formed so that cooling Water (cooling Water) flows continuously through the first and second scroll structures 210 and 220 and the lower anode 120, respectively.
The working gas supplied through the second scroll structure 220 and the lower anode 120 is supplied to the buffer space 126 disposed between the upper anode 110 and the lower anode 120.
The working gas supplied through the second scroll structure 220 and the lower anode 120 is supplied to the center of the upper end of the lower anode 120 through the second working gas nozzle 124 formed at the stepped portion of the lower anode 120, and then supplied to the plasma formed by the working gas first supplied through the first scroll structure 210 and the upper anode 110.
An exhaust gas treatment device according to an embodiment of the present invention for achieving the above object includes: a plasma generation section 100; a reaction part 200 for mixing the plasma transferred from the plasma generation part 100 with the inflow exhaust gas to perform a treatment; and a washing unit 300 for washing the gas treated in the reaction unit 200 with water or the like to lower the temperature.
The plasma generation unit having the multi-stage vortex structure according to the present invention as described above can control the length of the flame formed by arranging the multi-stage vortex structure around the plurality of electrodes in order to supply the working gas to be supplied between the cathode electrode and the anode electrode in multiple stages.
Drawings
Fig. 1 is a diagram for explaining an overall concept of an exhaust gas treatment device having a plasma generation unit according to the present invention.
Fig. 2 is a diagram showing an external appearance of a plasma generation unit constituting the exhaust gas treatment device.
Fig. 3 is a sectional view showing the inside of a plasma generation section constituting the exhaust gas treatment device.
Fig. 4 is a sectional perspective view showing the inside of a plasma generation unit constituting the exhaust gas treatment device.
Fig. 5 is a perspective view showing a state in which the electrode is coupled to the vortex structure.
Fig. 6 is a sectional perspective view showing a coupling relationship between the lower anode and the vortex structure.
Detailed Description
Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but can be embodied in various different forms, and the embodiments of the present invention are only intended to make the disclosure of the present invention more complete and to inform the scope of the present invention to those of ordinary skill in the art. Like reference symbols in the various drawings indicate like elements.
Hereinafter, the structure and function of an exhaust gas treatment device having a plasma generation unit will be described with reference to fig. 1 to 6.
The exhaust gas treatment device includes: a plasma generating section 1 for generating a flame by arc discharge and generating plasma by the working gas flowing in; a reaction section 5 for mixing the plasma transferred from the plasma generation section 1 with the exhaust gas flowing thereinto to perform a treatment; and a washing section 3 for washing the gas treated in the reaction section 5 with water or the like to lower the temperature.
The plasma generating section 1 decomposes the exhaust gas flowing thereinto for the first time by strong radicals and heat generated by the plasma generated from the working gas.
The reaction section 5 stores the heat generated by the plasma in the internal heat storage body, and performs a step of treating the exhaust gas not treated in the plasma generation section 1 by thermal decomposition.
The washing part 3 passes through a nitrogen curtain (N)2Curtain) performs a buffering of gas molecules and particles to allow for uniform filtration.
On the other hand, cooling and chemical neutralization reaction are performed by a step of supplying the refrigerant by injection from an injection module disposed in the washing section 3 in a detachable manner. Thermal Nox can be reduced by cooling (cooling) and Quenching (Quenching) as described above.
As the working gas used in the present invention, helium, argon, nitrogen, or the like can be used, but the working gas is not limited thereto.
The plasma generating section 1 includes: a cathode section (10); anode portions 100 arranged at intervals along the lower direction of cathode portion 10; and a vortex structure 200 disposed so as to surround cathode portion 10 and anode portion 100.
The anode portion 100 includes: an upper anode 110 disposed so as to surround a part of the lower portion of the cathode portion 10; and a lower anode 120 coupled to the upper anode 110 in a lower direction of the upper anode 110 in a state where a space for supplying a working gas is formed between the lower anode and the upper anode 110.
The upper anode 110 includes: an upper anode body 111 having a hollow cylindrical shape; a first anode flow path 112 formed by inclining inside surface of the upper anode body 111; a second anode channel 113 connected to the lower end of the first anode channel 112; an anode groove 114 formed in a groove shape along a circumferential direction on an upper outer side surface of the upper anode body 111; and a first working gas nozzle 115 extending from the anode tank 114 to the inner peripheral surface of the upper anode body 111.
The lower anode 120 includes: a lower anode body 121 having a hollow cylindrical shape; an anode connection part 122 formed on the upper part of the lower anode body 121; a stepped portion extending with a predetermined thickness so as to form a buffer space 126 above the anode connecting portion 122; a second working gas nozzle 124 that receives the working gas supplied from the vortex structure 200 while penetrating the inner circumferential surface and the outer circumferential surface of the stepped portion; and a cooling channel 125 formed in the lower anode body 121 along the vertical direction.
The vortex structure 200 includes: a first vortex structure 210 to which a working gas is supplied through a first working gas nozzle 115 formed in the upper anode 110; and a second vortex structure 220 to which the working gas is supplied through a second working gas nozzle 124 formed in the lower anode 120.
The first vortex structure 210 includes: a first vortex body 211 having a hollow cylindrical shape; a working gas vertical flow path 212 formed in the first scroll body 211 along the vertical direction; a first working gas filling section 213 communicating with an upper end of the working gas vertical flow path 212; a horizontal working gas flow path 214 which communicates with the anode tank 114 of the upper anode 110 in a state of being connected to the lower end of the vertical working gas flow path 212 in the horizontal direction; a cooling flow path 216 formed in the first scroll body 211 along the vertical direction; and a cooling water filling portion 217 communicating with an upper end of the cooling flow path 216.
The second vortex structure 220 includes: a second vortex body 221 having a hollow cylindrical shape; a protrusion 222 formed on an upper portion of the second scroll body 221; a cooling flow path 223 formed in the second scroll body 221 along the vertical direction; second working gas flow paths 224 and 225 formed in the second scroll body 221 in the radial direction so as to connect the inner and outer surfaces of the second scroll body 221; and a recess 226 formed at a lower portion of the second scroll body 221.
In a state where first scroll structure 210 and second scroll structure 220 are vertically coupled to each other, projection 222 provides a space in which the cooling water passing through cooling channel 216 of first scroll structure 210 temporarily stays before entering cooling channel 223 of second scroll structure 220.
On the other hand, the recessed portion 226 provides a space in which the cooling water passing through the cooling passage 223 of the second scroll structure 220 temporarily stays before entering the cooling passage 125 of the lower anode 120.
The second working gas flow paths 224 and 225 may be configured to communicate with the second working gas nozzle 124 of the lower anode 120. The second working gas flow paths 224 and 225 include: an outer flow path 224 extending inward from the outer surface of the second scroll body 221 by a predetermined distance in the radial direction; and an inner passage 225 extending from the outer passage 224 to the inner surface of the second scroll body 221 in the radial direction.
As described above, the working gas supplied to the upper anode 110 and the lower anode 120 by the first vortex structure 210 and the second vortex structure 220 moves from the upper portion to the lower portion of the plasma generation part by the swirling motion, that is, the swirling motion, of the working gas by the vortex structure 200, the vertically separated anode part 100, the connection structure between the vortex structure 200 and the anode part 100, and the like, which form a plurality of stages.
The flow of the working gas formed by the plasma generating portion according to the embodiment of the present invention will be described below with reference to fig. 3 to 6.
In the present invention, the working gas is supplied in stages divided into upper and lower 2 stages by the multi-stage vortex structure 200 disposed so as to surround the cathode portion 10 and the anode portion 100.
That is, the working gas is supplied for the first time through the working gas vertical flow path 212 of the first vortex structure 210 and the first working gas nozzle 115 of the upper anode 110.
The above-mentioned working gas, which is supplied for the first time, is supplied in a swirling manner through the inner upper end of the upper anode 110.
Next, the working gas is supplied for the second time through the second working gas flow channels 224 and 225 of the second scroll structure 220 and the second working gas nozzle 124 of the lower anode 120.
The second working gas is supplied to the center of the upper end of the lower anode 120 through the second working gas nozzle 124 formed at the stepped portion of the lower anode 120, and is supplied to the plasma formed by the first working gas in the above-described state, thereby supporting the formation of the plasma. That is, the working gas is secondarily supplied to the buffer space 126 disposed between the upper anode 110 and the lower anode 120.
According to the present invention, when power is supplied from a power source of a static current system, ignition is determined by an electrode gap between the cathode portion 10 and the anode portion 100, and after ignition, nitrogen gas as a working gas is appropriately supplied to each of the first and second spiral structures 210 and 220 which are spiral structures formed in a plurality of stages in the vertical direction, thereby controlling the length of the flame.
In the present invention, the longer the length of the flame, the more effective the treatment of the exhaust gas, and the present invention belongs to an improved form compared with the form of supplying the working gas to the primary vortex structure as the conventional art.
That is, the present invention exhibits a stable and long flame control characteristic of 1.5 to 2 times or more as compared with the conventional primary swirl.
The first scroll structure 210 controls the pressure and the flame length based on the flow rate of the working gas to be 5 to 50LPM or less, and the second scroll structure 220 controls the pressure and the flame length based on the working gas to be 10 to 100LPM or less.
Further, by continuously flowing the cooling water through first and second scroll structures 210 and 220 and lower anode 120, the cooling water is continuously and smoothly supplied, and the heat generated at the time of plasma discharge is protected by the electrode.
As described above, the exhaust gas treatment apparatus having the plasma generation part according to the present invention can control the length of the flame formed by supplying the nitrogen gas as the working gas supplied between the cathode and the anode in multiple stages by the multi-stage vortex structure disposed around the electrode.
The above description is only for illustrating the technical idea of the present invention, and a person of ordinary skill in the art to which the present invention pertains can make various modifications and variations without departing from the essential characteristics of the present invention.

Claims (5)

1. A plasma generation section, comprising:
a cathode section (10);
an anode section (100) disposed apart from the cathode section (10); and
a vortex structure (200) disposed so as to surround the cathode section (10) and the anode section (100),
the vortex structure (200) is supplied with a working gas in multiple stages through the anode section (100) in order to generate plasma,
the anode section (100) includes:
an upper anode (110) disposed so as to surround a part of the lower portion of the cathode (10); and
a lower anode (120) coupled to the upper anode (110) in a lower direction of the upper anode (110) in a state where a space capable of supplying a working gas is formed between the lower anode and the upper anode (110),
the vortex structure (200) comprises:
a first vortex structure (210) to which a working gas is supplied through a first working gas nozzle (115) formed in the upper anode (110); and
and a second vortex structure (220) to which a working gas is supplied through a second working gas nozzle (124) formed in the lower anode (120).
2. The plasma generation section according to claim 1, wherein cooling flow paths (216, 223, 125) are formed so that cooling water flows continuously through the first and second spiral structures (210, 220) and the lower anode (120).
3. The plasma generation part according to claim 1, wherein the working gas supplied through the second vortex structure (220) and the lower anode (120) is supplied to a buffer space (126) disposed between the upper anode (110) and the lower anode (120).
4. The plasma generation part according to claim 3, wherein the working gas supplied through the second vortex structure (220) and the lower anode (120) is supplied to the center of the upper end of the lower anode (120) through a second working gas nozzle (124) formed at a stepped portion of the lower anode (120), and then supplied to the plasma formed by the working gas first supplied through the first vortex structure (210) and the upper anode (110).
5. An exhaust gas treatment device, comprising:
the plasma generation section according to any one of claims 1 to 4;
a reaction part (5) for mixing the plasma transferred from the plasma generation part with the inflow exhaust gas for treatment; and
and a washing unit (3) for washing the gas treated in the reaction unit (5) with a substance including water to lower the temperature.
CN201611190171.0A 2016-12-09 2016-12-21 Plasma generation unit having multi-stage vortex structure and exhaust gas treatment device Active CN108235552B (en)

Applications Claiming Priority (2)

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KR1020160167569A KR101930451B1 (en) 2016-12-09 2016-12-09 Plasma generator having multistage swirl structure and waste gas treatment apparatus having the plasma generator
KR10-2016-0167569 2016-12-09

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CN108235552B true CN108235552B (en) 2019-12-24

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CN110402006B (en) * 2019-07-29 2024-06-25 青岛海琅智能装备有限公司 Sleeve type plasma discharge waste gas treatment core device
CN110677971B (en) * 2019-09-09 2024-06-04 可迪尔空气技术(北京)有限公司 Thermal plasma torch generator

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KR200424378Y1 (en) * 2006-06-07 2006-08-22 주식회사 글로벌스탠다드테크놀로지 Apparatus using plasma torch to treat the hazadous waste gas
CN201352880Y (en) * 2009-01-19 2009-11-25 烟台龙源电力技术股份有限公司 Anode of electric arc plasma body generator and electric arc plasma body generator
KR101110888B1 (en) * 2010-05-11 2012-02-16 씨에스케이(주) Hybrid plasma torch
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CN108235552A (en) 2018-06-29
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