CN105944523B - Plasma gas waste gas treatment device - Google Patents
Plasma gas waste gas treatment device Download PDFInfo
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- CN105944523B CN105944523B CN201610403802.6A CN201610403802A CN105944523B CN 105944523 B CN105944523 B CN 105944523B CN 201610403802 A CN201610403802 A CN 201610403802A CN 105944523 B CN105944523 B CN 105944523B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/206—Organic halogen compounds
- B01D2257/2066—Fluorine
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
- B01D2257/553—Compounds comprising hydrogen, e.g. silanes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
Abstract
The invention discloses a plasma gas waste gas treatment device, which comprises a gas inlet pipe and an ion decomposition cavity, wherein the gas inlet pipe is arranged at the upper part of the side wall of the plasma decomposition cavity and is used for introducing waste gas to be treated, the anode and the cathode of a plasma power supply are arranged at the top of the plasma decomposition cavity, a columnar shell electrode plate parallel to the axis of plasma gas formed between the anode and the cathode of the plasma power supply is arranged inside the plasma decomposition cavity, anode conductive liquid is also arranged between the columnar shell electrode plate and the side wall of the plasma decomposition cavity and is in contact with the columnar shell electrode plate, the liquid level of the anode conductive liquid is lower than the horizontal plane of the gas inlet pipe, the columnar shell electrode plate is used for forming the plasma gas between the columnar shell electrode plate and the cathode of the plasma power supply, and the waste gas to be treated is treated. Plasma gas exhaust treatment device through extending plasma flame to column shell plate electrode, has promoted exhaust treatment efficiency.
Description
Technical Field
The invention relates to the field of plasma gas, in particular to a plasma gas waste gas treatment device.
Background
In many industries, such as the semiconductor industry, the types of gas exhaust gases discharged during production are very numerous and contain not only Silane (SiH)4) Such explosive gases, and also contain significant amounts of greenhouse gases such as PFCs (perfluorochemicals) which are extremely difficult to handle and limit emissions. However, only a small portion of these gases are used and the remaining majority are discharged as exhaust gases. For example, CF4 is used for about only 5% of the process and SF6 is used for about only 20%. At present, the common exhaust gas treatment methods include an electrothermal decomposition type, a gas combustion type, a high-temperature plasma type, an adsorption type (a type containing a thermal catalyst), and the like.
Traditionally, such gases are treated most effectively by combustion, but because of the risk of deriving fires, there are instances of treatment by electrothermal methods; however, the electrothermal method is not easily affected by the operation temperature and the flow field distribution control, and the treatment efficiency of treating gases such as CF4 is very low, so it is difficult to meet the strict requirements of industrial waste gas emission.
With the increasing emphasis on environmental protection and safety in the industry, the most common gas combustion type waste gas treatment devices in the past need to be innovated and replaced. The current technical trend is towards the development of a fuel-free treatment technology, wherein a direct-current normal-pressure high-temperature plasma mode is gradually popularized from a laboratory to a factory for trial. This plasma technique uses an inert gas such as argon or nitrogen as a plasma forming medium to convert energy from an arc into plasma. The exhaust gas is treated in a plasma flame treatment zone together with an oxidizing gas or water vapor.
Example 1: SiH4+O2→SiO2+H2O；
Example 2: CF (compact flash)4+2H2O→CO2+4HF。
The existing structure of the device has the following problems:
1. the material of the component in the plasma decomposition treatment area is generally high-temperature-resistant metal or high-temperature-resistant non-metal material. But because the energy of the plasma flame is higher, the plasma flame gradually deteriorates and damages after being used for a long time;
2. the plasma high-energy area has gradually reduced energy from the anode port of the plasma generator and is in a long conical shape, and because the plasma flame has a certain distance with the inlet of the plasma decomposition processing area, the plasma flame can not completely cover the inlet of the plasma decomposition processing area, so that waste gas can directly pass by the plasma flame without penetrating the plasma flame.
The existing high-temperature plasma mode processing device has the problems that the service life of components in a plasma flame processing area is short, and waste gas with low processing efficiency directly passes by the plasma flame without penetrating through the plasma area.
Therefore, how to effectively solve the above problems of the high temperature plasma type exhaust gas treatment device is a problem that needs to be solved by those skilled in the art.
Disclosure of Invention
The invention aims to provide a plasma gas waste gas treatment device, which improves the waste gas treatment efficiency.
In order to solve the technical problem, an embodiment of the present invention provides a plasma gas waste gas treatment apparatus, including a gas inlet pipe and an ion decomposition cavity, wherein the gas inlet pipe is arranged at the upper part of the side wall of the plasma decomposition cavity and is used for introducing waste gas to be treated, an anode and a cathode of a plasma power supply are arranged at the top of the plasma decomposition cavity, a cylindrical shell electrode plate parallel to the axis of plasma gas formed between the anode and the cathode of the plasma power supply is arranged inside the plasma decomposition cavity, an anode conductive liquid is further arranged between the cylindrical shell electrode plate and the side wall of the plasma decomposition cavity, the anode conductive liquid is in contact with the cylindrical shell electrode plate, the liquid level is lower than the horizontal plane of the gas inlet pipe, and the cylindrical shell electrode plate is used for forming plasma gas with the cathode of the plasma power supply, and treating the waste gas to be treated.
The plasma power supply also comprises an anode conducting rod, and the anode conducting liquid is connected with the anode of the plasma power supply through the anode conducting rod.
Wherein the axis of the cylindrical shell electrode plate is the same as the axis of the plasma generated by the plasma power supply.
Wherein, the columnar shell electrode plate is an overflow pipe.
And the anode conductive liquid is filled in an annular area formed by the cylindrical shell electrode plate and the side wall of the plasma decomposition cavity.
The lower end of the columnar shell electrode plate is in contact with the bottom of the plasma decomposition cavity, and the lower end of the columnar shell electrode plate is used as an exhaust port.
The device also comprises a conductive liquid inlet arranged at the lower part of the side wall of the plasma decomposition cavity and used for injecting the anode conductive liquid into the annular region.
Wherein, the plasma decomposition cavity is a cylindrical cavity.
And a high-temperature-resistant insulating layer is arranged on the inner side of the anode of the plasma power supply and/or the inner wall of the columnar shell electrode plate.
Compared with the prior art, the plasma gas waste gas treatment device provided by the embodiment of the invention has the following advantages:
the plasma gas waste gas treatment device provided by the embodiment of the invention comprises a gas inlet pipe and an ion decomposition cavity, wherein the gas inlet pipe is arranged at the upper part of the side wall of the plasma decomposition cavity and is used for introducing waste gas to be treated, the anode and the cathode of a plasma power supply are arranged at the top of the plasma decomposition cavity, a columnar shell electrode plate parallel to the axis of plasma gas formed between the anode and the cathode of the plasma power supply is arranged inside the plasma decomposition cavity, anode conductive liquid is also arranged between the columnar shell electrode plate and the side wall of the plasma decomposition cavity, the anode conductive liquid is in contact with the columnar shell electrode plate, the liquid level is lower than the horizontal plane where the gas inlet pipe is located, and the columnar shell electrode plate is used for forming the plasma gas with the cathode of the plasma power supply, and treating the waste gas to be treated.
Plasma gas exhaust treatment device through set up the positive pole conducting liquid in plasma decomposition chamber for produce plasma flame between cigarette machine conducting liquid and the negative pole of plasma power, the length of plasma flame begins the energy to reduce gradually and is long cone deformation from the positive pole mouth of current plasma power and for the opening length energy of following positive pole conducting liquid reduces gradually and be long cone, because positive pole conducting liquid is located the below of the positive pole of plasma power, just so in other words has increased the length of plasma flame, has improved the probability that waste gas gets into the plasma flame, has improved the treatment effeciency of waste gas.
In summary, the plasma gas exhaust gas treatment device provided in the embodiment of the present invention improves the exhaust gas treatment efficiency by extending the plasma flame to the cylindrical shell electrode plate.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an embodiment of a plasma gas exhaust gas treatment device according to an embodiment of the present invention.
Detailed Description
As described in the background section, the conventional plasma high energy region has a gradually reduced energy from the anode port of the plasma generator and has a long conical shape, and the plasma flame cannot completely cover the plasma decomposition processing region inlet because the plasma flame is spaced from the plasma decomposition processing region inlet, so that the exhaust gas directly passes by the plasma flame without penetrating the plasma flame, and the exhaust gas treatment efficiency is low.
Based on this, the embodiment of the present invention provides a plasma gas waste gas treatment apparatus, which includes an air inlet pipe and an ion decomposition cavity, wherein the air inlet pipe is arranged at the upper part of the side wall of the plasma decomposition cavity and is used for introducing waste gas to be treated, the anode and the cathode of a plasma power supply are arranged at the top of the plasma decomposition cavity, a cylindrical shell electrode plate parallel to the axis of plasma gas formed between the anode and the cathode of the plasma power supply is arranged inside the plasma decomposition cavity, an anode conductive liquid is further arranged between the cylindrical shell electrode plate and the side wall of the plasma decomposition cavity, the anode conductive liquid is in contact with the cylindrical shell electrode plate, the liquid level is lower than the horizontal plane of the air inlet pipe, and the cylindrical shell electrode plate is used for forming plasma gas between the cylindrical shell electrode plate and the cathode of the plasma power supply, and treating the waste gas to be treated.
In summary, in the plasma gas waste gas treatment apparatus provided in the embodiment of the present invention, the anode conductive liquid is disposed in the plasma decomposition cavity, so that a plasma flame is generated between the smoke machine conductive liquid and the cathode of the plasma power supply, the length of the plasma flame is gradually reduced from the anode port of the existing plasma power supply and is in a long cone shape, and the length of the plasma flame is gradually reduced from the energy of the opening of the anode conductive liquid and is in a long cone shape.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
In the following description, specific details are set forth in order to provide a thorough understanding of the present invention. The invention can be implemented in a number of ways different from those described herein and similar generalizations can be made by those skilled in the art without departing from the spirit of the invention. The invention is therefore not limited to the specific implementations disclosed below.
Referring to fig. 1, fig. 1 is a schematic structural diagram of an embodiment of a plasma gas exhaust gas treatment device according to an embodiment of the present invention.
In a specific embodiment, the plasma gas waste gas treatment device includes an air inlet pipe 40 and an ion decomposition cavity, the air inlet pipe 40 is disposed on the upper portion of the side wall of the plasma decomposition cavity 20 and is used for introducing waste gas to be treated, the anode 12 and the cathode 11 of the plasma power supply 10 are disposed on the top of the plasma decomposition cavity 20, a cylindrical shell electrode plate 21 parallel to the axis of the plasma gas formed between the anode 12 and the cathode 11 of the plasma power supply 10 is disposed inside the plasma decomposition cavity 20, an anode conductive liquid 30 is further disposed between the cylindrical shell electrode plate 21 and the side wall of the plasma decomposition cavity 20, the anode conductive liquid 30 contacts the cylindrical shell electrode plate 21, the liquid level is lower than the horizontal plane where the air inlet pipe 40 is located, the cylindrical shell electrode plate 21 is used for forming plasma gas with the cathode 11 of the plasma power supply 10, and treating the waste gas to be treated.
Plasma gas waste gas treatment device, through set up positive pole 12 conducting liquid in plasma decomposition chamber for produce plasma flame between cigarette machine conducting liquid and the negative pole 11 of plasma power 10, the length of plasma flame begins energy to reduce gradually and is long conical deformation from the positive pole 12 mouth of current plasma power 10 and for the length energy of opening from positive pole conducting liquid 30 reduces gradually and is long conical, because positive pole conducting liquid 30 is located the below of positive pole 12 of plasma power 10, just so be equivalent to the length that has increased plasma flame, the probability that waste gas got into plasma flame has been improved, the treatment effeciency of waste gas has been improved.
In the present invention, the anode conductive liquid 30 is used as the anode 12, which is the same as the positive power supply of the plasma power supply 10, and the plasma flame is formed between the cathode 11 of the plasma power supply 10, because the waste gas passes through the cylindrical shell electrode plate 21 at the center of the anode 12 conductive liquid regardless of whether the waste gas is treated or not, the plasma flame formed between the anode 12 conductive liquid and the cathode 11 of the ion power supply can treat the waste gas certainly, thus improving the waste gas treatment efficiency.
In the present invention, as long as the plasma flame can be formed between the anode conductive liquid 30 and the cathode 11 of the plasma power supply 10, the cylindrical housing electrode plate 21 has a generally cylindrical shape and is coaxial with the cylindrical region formed by the anode 12 and the cathode 11 of the dc plasma power supply 10, and after such plasma flame extends from the anode 12 to the anode conductive liquid 30, the plasma flame rarely burns the cylindrical housing electrode plate 21 directly, so that the service life is improved, the cylindrical housing electrode plate 21 may have a shape other than cylindrical, or rectangular, the axis of the cylindrical housing electrode plate 21 may have an acute angle with the axis of the cylindrical region formed by the anode 12 and the cathode 11 of the dc plasma power supply 10, or even the channel shape of the cylindrical housing electrode plate 21 may be curved, so long as the plasma flame can be formed between the cylindrical housing electrode plate 21 and the cathode 11 of the plasma power supply 10, the exhaust gas may be discharged from the passage of the cylindrical case electrode plate 21.
The positive electrode of the ion power source and the anode 12 conductive liquid are generally connected to a third party, and a conductive rod of the anode 12 is generally used, so that the plasma gas waste gas treatment device further comprises a conductive rod of the anode 12, and the anode conductive liquid 30 is connected to the positive electrode of the plasma power source 10 through the conductive rod of the anode 12. In the present invention, the shape, material and arrangement of the conductive rod of the anode 12 are not particularly limited.
In order to prevent the generated plasma flame from bending, reduce the direct contact between the plasma flame and the cylindrical shell electrode plate 21 and prolong the service life, the axis of the cylindrical shell electrode plate 21 is the same as the axis of the plasma generated by the plasma power supply 10. Of course, the diameter of the cylindrical housing electrode plate 21 is larger than the diameter of the cylinder formed by the cathode 11 and the anode 12 of the DC plasma power supply 10.
In order to improve the energy density of the plasma flame, the plasma flame covers the channel of the cylindrical shell electrode plate 21, and generally flows into the channel of the cylindrical shell electrode plate 21 in a manner of slowly overflowing the conductive liquid of the anode 12, so that the problems of high-temperature deposition and smoldering of device parts do not exist, namely the cylindrical shell electrode plate 21 is an overflow pipe. It should be noted that the overflow pipe and the overflow rate of the overflow pipe are not particularly limited in the present invention.
In order to increase the energy density of the plasma flame and the exhaust gas treatment capacity, the anode conductive liquid 30 is filled in the annular region formed by the cylindrical shell electrode plate 21 and the side wall of the plasma decomposition chamber 20.
In order to increase the length of the plasma flame, the lower end of the cylindrical shell electrode plate 21 is in contact with the bottom of the plasma decomposition chamber 20, and the lower end of the cylindrical shell electrode plate 21 serves as an exhaust port.
It should be noted that the anode conductive liquid 30 located between the cylindrical shell electrode plate 21 and the annular region formed by the sidewall of the plasma decomposition cavity 20 may be a plurality of columns longitudinally stacked, a plurality of sectors transversely stacked, or an integral body, which is not limited in this respect.
In order to facilitate the injection of the anode conductive liquid 30, and since the volume of the anode conductive liquid 30 is reduced with the increase of the operation time when the cylindrical shell electrode plate 21 is an overflow pipe, the length or energy density of the plasma flame may be attenuated, the injection of the anode conductive liquid 30 is required to maintain the volume of the anode 12 conductive liquid in the annular region formed by the cylindrical shell electrode plate 21 and the sidewall of the plasma decomposition chamber 20 constant, and the plasma gas exhaust gas treatment device generally further includes a conductive liquid inlet 22 disposed at the lower portion of the sidewall of the plasma decomposition chamber 20 for injecting the anode conductive liquid 30 into the annular region.
It should be noted that the anode conductive liquid 30 and the volume thereof are not particularly limited in the present invention.
In order to make the distribution of the anode conductive liquid 30 uniform and the lateral distribution of the generated electric ion flame uniform, the plasma decomposition chamber 20 is a cylindrical chamber.
In order to prolong the service life of the plasma gas waste gas treatment device, generally mainly prolong the service life of the anode 12, the anode 12 conductive liquid is used as the anode 12 in the invention, and simultaneously, the high-temperature energy of the columnar shell electrode plate 21 can be taken away to play a cooling role, but even the burning rate of the plasma gas is reduced, which cannot be avoided fundamentally, therefore, a high-temperature resistant insulating layer 50 is generally arranged on the inner side of the anode 12 of the plasma power supply 10 and/or the inner wall of the columnar shell electrode plate 21, if the electrode plate 21 of the columnar shell is an overflow pipe, the overflow hole of the overflow pipe cannot be blocked by the high-temperature resistant insulating layer 50, and the overflow hole should be reserved, and the material, the thickness and the arrangement mode of the high-temperature resistant insulating layer 50 are not limited in particular.
In summary, in the plasma gas waste gas treatment device provided in the embodiment of the present invention, the anode conductive liquid is disposed in the plasma decomposition cavity, so that a plasma flame is generated between the cigarette machine conductive liquid and the cathode of the plasma power supply, the length of the plasma flame is gradually reduced from the anode opening of the existing plasma power supply, and is deformed into a long cone shape from the length of the opening of the anode conductive liquid, and the energy of the anode conductive liquid is gradually reduced, so that the length of the plasma flame is increased, the probability of the waste gas entering the plasma flame is increased, and the treatment efficiency of the waste gas is improved.
The plasma gas exhaust gas treatment apparatus according to the present invention is described in detail above. The principles and embodiments of the present invention are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
Claims (8)
1. The utility model provides a gaseous exhaust treatment device of plasma, its characterized in that, decomposes the cavity including intake pipe and ion, the intake pipe set up in the upper portion of the lateral wall of plasma decomposition cavity for let in pending waste gas, the positive pole and the negative pole setting of plasma power are in the top of plasma decomposition cavity, the inside of plasma decomposition cavity be equipped with the parallel column shell electrode board of the axis of the plasma gas that forms between the positive pole of plasma power and the negative pole, still be provided with positive pole conducting liquid between the lateral wall of column shell electrode board with the plasma decomposition cavity, positive pole conducting liquid with the contact of column shell electrode board, the liquid level is less than the horizontal plane at intake pipe place, column shell electrode board be used for with form plasma gas between the negative pole of plasma power, treating the waste gas to be treated; wherein the plasma gas exhaust gas treatment device further comprises: and the anode conducting rod is used for connecting the anode conducting liquid with the anode of the plasma power supply.
2. The plasma gas exhaust treatment device according to claim 1, wherein an axis of the cylindrical housing electrode plate is the same as an axis of the plasma generated by the plasma power supply.
3. The plasma gas exhaust treatment device according to claim 2, wherein the cylindrical housing electrode plate is an overflow pipe.
4. The plasma gas exhaust treatment device according to claim 3, wherein the anode conductive liquid fills an annular region formed by the cylindrical shell electrode plate and a side wall of the plasma decomposition chamber.
5. The plasma gas exhaust treatment device according to claim 4, wherein a lower end of the cylindrical shell electrode plate is in contact with a bottom of the plasma decomposition chamber, and the lower end of the cylindrical shell electrode plate serves as a gas exhaust port.
6. The plasma gas exhaust treatment device according to claim 5, further comprising a conductive liquid inlet provided at a lower portion of a side wall of the plasma decomposition chamber for injecting the anode conductive liquid into the annular region.
7. The plasma gas exhaust treatment device according to claim 6, wherein the plasma decomposition chamber is a cylindrical chamber.
8. The plasma gas exhaust gas treatment device according to claim 7, wherein a high temperature resistant insulating layer is provided on an inner side of an anode of the plasma power supply and/or an inner wall of the cylindrical shell electrode plate.
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| KR101930451B1 (en) * | 2016-12-09 | 2019-03-11 | (주)트리플코어스코리아 | Plasma generator having multistage swirl structure and waste gas treatment apparatus having the plasma generator |
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| JPH05115746A (en) * | 1991-10-28 | 1993-05-14 | Mitsubishi Heavy Ind Ltd | Exhaust gas treatment apparatus |
| CN1745607A (en) * | 2003-01-31 | 2006-03-08 | 陶氏康宁爱尔兰有限公司 | Plasma generating electrode assembly |
| EP1955757A2 (en) * | 2007-02-08 | 2008-08-13 | Clean Technology Co., Ltd. | Exhaust gas treating system |
| KR20120131959A (en) * | 2011-05-27 | 2012-12-05 | 주식회사 에이피시스 | Apparatus for treating hazardous gas using counterflow of plasma and hazardous gas, method for treating hazardous gas using the same |
| CN105056640A (en) * | 2015-08-05 | 2015-11-18 | 上海瑞津环境科技有限公司 | Cyclone-type low-temperature plasma gas purification dust removal device and application method thereof |
| CN205730816U (en) * | 2016-06-08 | 2016-11-30 | 上海盛剑环境系统科技有限公司 | A kind of plasma gas emission-control equipment |
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Patent Citations (7)
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| JPH05115746A (en) * | 1991-10-28 | 1993-05-14 | Mitsubishi Heavy Ind Ltd | Exhaust gas treatment apparatus |
| CN1745607A (en) * | 2003-01-31 | 2006-03-08 | 陶氏康宁爱尔兰有限公司 | Plasma generating electrode assembly |
| EP1955757A2 (en) * | 2007-02-08 | 2008-08-13 | Clean Technology Co., Ltd. | Exhaust gas treating system |
| TW200914116A (en) * | 2007-02-08 | 2009-04-01 | Clean Technology Co Ltd | Apparatus for treating exhaust gas |
| KR20120131959A (en) * | 2011-05-27 | 2012-12-05 | 주식회사 에이피시스 | Apparatus for treating hazardous gas using counterflow of plasma and hazardous gas, method for treating hazardous gas using the same |
| CN105056640A (en) * | 2015-08-05 | 2015-11-18 | 上海瑞津环境科技有限公司 | Cyclone-type low-temperature plasma gas purification dust removal device and application method thereof |
| CN205730816U (en) * | 2016-06-08 | 2016-11-30 | 上海盛剑环境系统科技有限公司 | A kind of plasma gas emission-control equipment |
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