CN108193484A - A kind of fabric of the Low emissivity containing double-deck silver film - Google Patents

A kind of fabric of the Low emissivity containing double-deck silver film Download PDF

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Publication number
CN108193484A
CN108193484A CN201810120200.9A CN201810120200A CN108193484A CN 108193484 A CN108193484 A CN 108193484A CN 201810120200 A CN201810120200 A CN 201810120200A CN 108193484 A CN108193484 A CN 108193484A
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CN
China
Prior art keywords
layer
fabric
low emissivity
containing double
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810120200.9A
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Chinese (zh)
Inventor
王银川
余荣沾
张欣
刘琼溪
尹华平
梁媛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GUANGDONG XINFENG TECHNOLOGY CO., LTD.
Original Assignee
Beijing Nano Chromophore Technology Co Ltd
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Application filed by Beijing Nano Chromophore Technology Co Ltd filed Critical Beijing Nano Chromophore Technology Co Ltd
Priority to CN201810120200.9A priority Critical patent/CN108193484A/en
Publication of CN108193484A publication Critical patent/CN108193484A/en
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/44—Oxides or hydroxides of elements of Groups 2 or 12 of the Periodic System; Zincates; Cadmates
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/46—Oxides or hydroxides of elements of Groups 4 or 14 of the Periodic System; Titanates; Zirconates; Stannates; Plumbates
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/48—Oxides or hydroxides of chromium, molybdenum or tungsten; Chromates; Dichromates; Molybdates; Tungstates
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/49—Oxides or hydroxides of elements of Groups 8, 9, 10 or 18 of the Periodic System; Ferrates; Cobaltates; Nickelates; Ruthenates; Osmates; Rhodates; Iridates; Palladates; Platinates
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/77—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/32—Polyesters

Abstract

The invention discloses a kind of fabrics of the Low emissivity containing double-deck silver film.The present invention uses magnetron sputtered vacuum deposition method, composite film is deposited in fabric surface, the composite film is made of the first dielectric layer, the first oxide skin(coating), the first silver layer, the first barrier layer, the second dielectric layer, the second oxide skin(coating), the second silver layer, the second barrier layer, third dielectric layer, and is stacked gradually outward from fabric surface by each layer.The film layer of this structure is played the role of reflecting infrared emanation by two layers of silver layer jointly, reaches better Low emissivity effect, while respective thickness is little, it is ensured that enough visible light transmittances retain the original color of fabric and texture.The present invention can make all fabrics have the function of to shield infrared emanation quickly, on a large scale, reach better warming and heat insulation.And magnetron sputtered vacuum is deposited without the problem of any chemistry addition, water pollution or air pollution, is the environmentally friendly mode of production.

Description

A kind of fabric of the Low emissivity containing double-deck silver film
Technical field
The present invention relates to a kind of fabrics of the Low emissivity containing double-deck silver film.
Background technology
Heat is mainly propagated outward by three kinds of approach：Heat transmission, convection current and infrared emanation.During winter weather cold, The warming approach of clothing is by skin and air exclusion, reduces convection losses heat；And by filling cotton or natural feather Etc. modes stored air, using air heat-proof quality reduce heat transmit loss, and for the third, the infrared hot spoke of human body It penetrates, existing textile fabric is all without good protection effect；And during summer weather sweltering heat, people can only lean on reduction clothing, increase Contact of the skin with air, to reduce body heat, but for accounted in sunlight solar energy 46% infra-red radiation and The infra-red radiation of high ambient temperatures environment, existing fabric is all without good shield effectiveness.Therefore, it is coated in fabric surface a kind of There is the film layer of infrared external reflection, can making fabric, cold snap reduces thermal loss in winter, and completely cuts off the sun in summer With the infrared emanation of ambient enviroment.
Metallic silver has the function of extraordinary infrared external reflection, and the thickness of film layer is bigger, and the reflecting effect of infrared ray is got over It is good.But the thickness of silver film increases, the exponential transmission for reducing visible ray of meeting, so as to hide the original color of fabric and line Reason, brings faulty using effect.Therefore, by one layer of thicker silver film, two layers of relatively thin silver film is disassembled into, Can not only ensure there is higher reflecting effect to infrared ray, play the role of better Low emissivity, but can ensure it is enough can See the transmission of light, retain the original color of textile and texture.
Invention content
The object of the present invention is to provide a kind of fabrics of the Low emissivity containing double-deck silver film, enable all textiles right Infra-red radiation has stronger barrier properties, while retains the original color of textile and texture.
In order to achieve the above objectives, the technical solution adopted by the present invention is：Using magnetron sputtered vacuum deposition method, in fabric Surface deposits composite film, and the composite film is by the first dielectric layer, the first oxide skin(coating), the first silver layer, the first blocking Layer, the second dielectric layer, the second oxide skin(coating), the second silver layer, the second barrier layer, third dielectric layer composition, and by each layer from Fabric surface stacks gradually outward.Wherein, the first dielectric layer is metal oxide or metal nitride, including TiO2、 ZrO、Si3N4, thickness is 1~50nm, it and fabric tightness combine, and can stop air from textile fabric side to entire composite membrane Layer erodes oxidation；First oxide skin(coating) is ZnO or AZO, and thickness is 1~30nm, it can ensure silver layer thereon preferentially Oriented growth；The thickness of first silver layer is 1~20nm, is the functional layer of infrared external reflection, because metallic silver is for more than 500nm's Electromagnetic wave has stable, almost 100% reflection (including some visible light and whole infrared rays)；The material on the first barrier layer It is that reproducibility is better than the metal of silver or the metal of partial oxidation, including Ti, NiCr, NiCrOx, thickness is 0.5~10nm, is The protective layer of silver layer prevents silver layer to be sputtered gas in the sputtering process of dielectric layer --- and argon oxygen gas mixture is aoxidized, Also there is certain infrared external reflection simultaneously；Second dielectric layer is metal oxide or metal nitride, including TiO2、 ZrO、Si3N4, thickness is 1~50nm；Second oxide skin(coating) is ZnO or AZO, and thickness is 1~30nm；The thickness of second silver layer is 1 ~25nm is thicker than the first silver layer；Second barrier layer be reproducibility be better than silver metal or partial oxidation metal, including Ti, NiCr, NiCrOx, thickness are 0.5~10nm；Third dielectric layer is metal oxide or metal nitride, including TiO2、 ZrO、Si3N4, thickness be 1~50nm, be compact nanometer structural membrane, can stop air from top to entire composite film into Row corrodes oxidation.
For example, as a kind of specific embodiment, the structure of the composite film is Si3N4/ZnO/Ag/NiCrOx/ ZnSnOx/ZnO/Ag/NiCrOx/Si3N4/TiO2。
Due to the application of above-mentioned technical proposal, the present invention has the advantage that compared with prior art：It can advise quickly, greatly Mould makes all fabrics have the function of preferable infrared external reflection, and relatively low radiance reaches better heat insulation, while ensures foot Enough visible light transmittances do not influence the original color of fabric and texture.And there is no any chemistry in magnetron sputtering process The problem of addition, water pollution or air pollution, be the environmentally friendly mode of production.
Description of the drawings
Schematic cross-section of the attached drawing 1 for the fabric of the Low emissivity containing double-deck silver film of the present invention.
Wherein 1 is textile substrate, and 2 be the first dielectric layer, and 3 be the first oxide skin(coating), and 4 be the first silver layer, and 5 be first Protective layer, 6 be the second dielectric layer, and 7 be the second oxide skin(coating), and 8 be the second silver layer, and 9 be the second protective layer, and 10 are situated between for third electricity Matter layer.
Specific embodiment
Technical scheme of the present invention is further elaborated in the following with reference to the drawings and specific embodiments.
Referring to attached schematic cross-section shown in FIG. 1：
1 is fabric substrate, white spring Asia woven fabric material.
2 be Si3N4, thickness 15nm, vacuum magnetic-control sputtering 30~50kW of power, sputtering target material SiAl targets are in argon gas and nitrogen It is deposited in gas atmosphere.
3 be ZnO, and thickness 10nm, vacuum magnetic-control sputtering 20~40kW of power, sputtering target material Zn targets are in argon gas and oxygen atmosphere In deposit.
4 be Ag, thickness 11nm, vacuum magnetic-control sputtering 2~10kW of power, sputtering target material Ag targets deposited in argon gas atmosphere and Into.
5 be NiCrOx, and thickness 0.8nm, vacuum magnetic-control sputtering 2~10kW of power, sputtering target material NiCr targets are in argon gas and oxygen It is deposited in gas atmosphere.
6 be ZnSnOx, thickness 30nm, vacuum magnetic-control sputtering 30~50kW of power, sputtering target material Zn90Sn10Target in argon gas and It is deposited in oxygen atmosphere.
7 be ZnO, and thickness 10nm, vacuum magnetic-control sputtering 20~40kW of power, sputtering target material Zn targets are in argon gas and oxygen atmosphere In deposit.
8 be Ag, thickness 12.5nm, vacuum magnetic-control sputtering 2~10kW of power, and sputtering target material Ag targets deposit in argon gas atmosphere It forms.
9 be NiCrOx, and thickness 1nm, vacuum magnetic-control sputtering 2~10kW of power, sputtering target material NiCr targets are in argon gas and oxygen It is deposited in atmosphere.
10 be Si3N4/TiO2, thickness 30nm.Wherein 30~50kW of Si3N4 vacuum magnetic-control sputterings power, sputtering target material SiAl Target deposits in argon gas and nitrogen atmosphere, TiO2Vacuum magnetic-control sputtering 30~50kW of power, rotating cathode ceramic target TiO2 It is deposited in argon gas and oxygen atmosphere.
Through test measurement, the white spring Asia woven fabric material of plated film of the Low emissivity containing double-deck silver film of the present embodiment, radiation Rate ε≤0.05.
And color change of the spring Asia woven fabric material before and after plated film is：
Color before plated film：L*=93.11, a*=0.05, b*=2.61
Color after plated film：L*=69.8, a*=0.23, b*=5.72
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow those skilled in the art The content of present invention can be understood and be embodied, it is not intended to limit the scope of the present invention.It is all spiritual according to the present invention Equivalent change or modification made by essence, should be covered by the protection scope of the present invention.

Claims (11)

1. a kind of fabric of the Low emissivity containing double-deck silver film, it is characterised in that：The surface deposition of the fabric has multiple Film layer is closed, the composite film is situated between by the first dielectric layer, the first oxide skin(coating), the first silver layer, the first barrier layer, the second electricity Matter layer, the second oxide skin(coating), the second silver layer, the second barrier layer, third dielectric layer composition, and it is outside from fabric surface by each layer It stacks gradually.
2. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that the composite membrane Layer is deposited by magnetron sputtering mode.
3. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that first electricity Dielectric layer is metal oxide or metal nitride, including TiO2、ZrO、Si3N4, thickness is 1~50nm.
4. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that first oxygen Compound layer is ZnO or AZO, and thickness is 1~30nm.
5. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that first silver medal The thickness of layer is 1~20nm.
6. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that first resistance The material of barrier is that reproducibility is better than the metal of silver or the metal of partial oxidation, including Ti, NiCr, NiCrOx, thickness 0.5 ~10nm.
7. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that second electricity Dielectric layer is metal oxide or metal nitride, including TiO2、ZrO、Si3N4, thickness is 1~50nm.
8. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that second oxygen Compound layer is ZnO or AZO, and thickness is 1~30nm.
9. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that second silver medal The thickness of layer is 1~25nm, thicker than the first silver layer.
10. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that described second Barrier layer is that reproducibility is better than the metal of silver or the metal of partial oxidation, including Ti, NiCr, NiCrOx, thickness for 0.5~ 10nm。
11. the fabric of the Low emissivity according to claim 1 containing double-deck silver film, which is characterized in that the third Dielectric layer is metal oxide or metal nitride, including TiO2、ZrO、Si3N4, thickness is 1~50nm.
CN201810120200.9A 2018-02-05 2018-02-05 A kind of fabric of the Low emissivity containing double-deck silver film Pending CN108193484A (en)

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CN201810120200.9A CN108193484A (en) 2018-02-05 2018-02-05 A kind of fabric of the Low emissivity containing double-deck silver film

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CN201810120200.9A CN108193484A (en) 2018-02-05 2018-02-05 A kind of fabric of the Low emissivity containing double-deck silver film

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115891338A (en) * 2022-11-15 2023-04-04 佛山纳诺特科技有限公司 Warm-keeping fabric material and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115891338A (en) * 2022-11-15 2023-04-04 佛山纳诺特科技有限公司 Warm-keeping fabric material and preparation method thereof
CN115891338B (en) * 2022-11-15 2023-11-14 佛山纳诺特科技有限公司 Thermal fabric material and preparation method thereof

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Application publication date: 20180622