CN108180858B - Optical system for stitch detection - Google Patents
Optical system for stitch detection Download PDFInfo
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- CN108180858B CN108180858B CN201810172487.XA CN201810172487A CN108180858B CN 108180858 B CN108180858 B CN 108180858B CN 201810172487 A CN201810172487 A CN 201810172487A CN 108180858 B CN108180858 B CN 108180858B
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- light
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- source device
- optical system
- light source
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- 230000003287 optical effect Effects 0.000 title claims abstract description 40
- 238000001514 detection method Methods 0.000 title claims abstract description 13
- 230000008033 biological extinction Effects 0.000 claims abstract description 23
- 238000003384 imaging method Methods 0.000 claims description 16
- 239000011324 bead Substances 0.000 claims description 5
- 238000007689 inspection Methods 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/16—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microscoopes, Condenser (AREA)
- Knitting Machines (AREA)
Abstract
The invention discloses an optical system for stitch detection, which comprises a first light source device, wherein the first light source device comprises a first light emitting component, a first diaphragm, a first condensing lens and a first reflecting mirror which are sequentially arranged, and a first slit capable of extinction is formed in the first light source device; the light beam emitted by the first light emitting component passes through the first diaphragm and the first condenser, is reflected by the first reflector, and passes through the first slit to be irradiated on the stitch; in the embodiment of the invention, the light beam emitted by the first light emitting component passes through the first diaphragm and the first collecting lens, is reflected by the first reflecting lens, passes through the first slit and precisely irradiates the stitch, so that the problem that the light irradiates the root of the stitch at the same time is solved, and whether the stitch is deformed and the deformation degree thereof can be accurately judged.
Description
Technical Field
The invention relates to the technical field of detection, in particular to an optical system for stitch detection.
Background
The sectional area of a single pin in the existing high-density connector is smaller and smaller, so that the pin root is connected with the element body in a larger area in order to meet the strength requirement of the pin structure.
The existing optical system for stitch detection is easy to illuminate the root of a stitch when the divergence angle of an illumination light source is large, and when the deformation of the stitch is smaller than the area of the root of the stitch, the area of the root of the stitch is larger than the area of the deformation of the stitch, so that whether the area with a higher gray value is the stitch deformation area or the root of the stitch cannot be judged in an image, and whether the stitch is deformed cannot be accurately judged.
Disclosure of Invention
The invention aims to provide an optical system for stitch detection, so as to solve the technical problems.
To achieve the purpose, the invention adopts the following technical scheme:
an optical system for stitch detection comprises a first light source device, wherein the first light source device comprises a first light emitting component, a first diaphragm, a first condensing lens and a first reflecting lens which are sequentially arranged, and a first slit capable of extinction is formed in the first light source device;
the light beam emitted by the first light emitting component passes through the first diaphragm and the first condenser, is reflected by the first reflector, and passes through the first slit to irradiate on the stitch.
Optionally, the optical system further includes a second light source device, where the first light source device and the second light source device are symmetrically arranged;
the second light source device comprises a second light emitting component, a second diaphragm, a second condenser and a second reflecting mirror which are sequentially arranged, and a second slit capable of extinction is formed in the second light source device;
the light beam emitted by the second light-emitting component passes through the second diaphragm and the second condenser, is reflected by the second reflecting mirror, and passes through the second slit to be irradiated on the stitch.
Optionally, the first light emitting component is an LED lamp bead or a laser; the second light-emitting component is an LED lamp bead or a laser.
Optionally, a first light-absorbing flannelette is arranged in the first slit; and a second light-absorbing flannelette is arranged in the second slit.
Optionally, a first extinction thread is arranged on the side wall of the first slit; and the side wall of the second slit is provided with a second extinction thread.
Optionally, the first reflecting mirror is a plane reflecting mirror or a curved reflecting mirror; the second reflecting mirror is a plane reflecting mirror or a curved reflecting mirror.
Optionally, a first included angle is formed between the light emitting direction of the first slit and the moving direction of the pin, and the first included angle is 5-60 degrees; a second included angle is formed between the light emergent direction of the second slit and the moving direction of the pin, and the second included angle is equal to the first included angle.
Optionally, the first included angle is equal to 30 °.
Optionally, the optical system further comprises an imaging device, and the imaging device comprises a line scanning lens and a CCD scanner.
Optionally, the line scanning lens is a telecentric optical system.
Compared with the prior art, the embodiment of the invention has the following beneficial effects:
in the embodiment of the invention, the light beam emitted by the first light emitting component passes through the first diaphragm and the first collecting lens, is reflected by the first reflecting lens, passes through the first slit and precisely irradiates the stitch, so that the problem that the light irradiates the root of the stitch at the same time is solved, and whether the stitch is deformed and the deformation degree thereof can be accurately judged.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions of the prior art, the drawings which are used in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the invention, and that other drawings can be obtained from these drawings without inventive faculty for a person skilled in the art.
Fig. 1 is a structural view of an optical system for stitch detection according to a first embodiment of the present invention.
Fig. 2 is a schematic diagram of an optical path of an optical system for stitch detection according to an embodiment of the present invention.
Fig. 3 is a structural view of an optical system for stitch detection according to a second embodiment of the present invention.
Fig. 4 is a schematic diagram of an optical path of an optical system for stitch detection according to a second embodiment of the present invention.
Illustration of:
a connector transport jig 10; a stitch 11; a first light source device 20; a first light emitting member 21; a first diaphragm 22; a first condenser lens 23; a first mirror 24; a first slit 25; a first matting member 26; an imaging device 30; a line scanning lens 31; a CCD scanner 32; a second light source device 40; a second light emitting part 41; a second diaphragm 42; a second condenser 43; a second mirror 44; a second slit 45; a second matting member 46; an illumination light path 50; an imaging light path 60; a first included angle alpha; and a second included angle beta.
Detailed Description
In order to make the objects, features and advantages of the present invention more comprehensible, the technical solutions in the embodiments of the present invention are described in detail below with reference to the accompanying drawings, and it is apparent that the embodiments described below are only some embodiments of the present invention, but not all embodiments of the present invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The technical scheme of the invention is further described below by the specific embodiments with reference to the accompanying drawings.
Example 1
Referring to fig. 1, the present embodiment provides an optical system for detecting pins 11, which includes a first light source device 20, wherein the first light source device 20 includes a first light emitting component 21, a first diaphragm 22, a first condenser 23 and a first reflector 24, which are sequentially disposed, and a first slit 25 capable of extinction is further formed in the first light source device 20.
The first diaphragm 22 is used to control the width of the light beam emitted by the first light emitting element 21 to ensure that the light entering the first condenser lens 23 is effective.
The first condenser lens 23 is used for changing the light beam passing through the first diaphragm 22 into a quasi-parallel light.
The first reflecting mirror 24 is used for reflecting the light beam passing through the first condensing mirror 23, so that the irradiation angle of the light beam is deflected, and the light beam can pass through the first slit 25 to be precisely irradiated on the stitch 11. Specifically, the first mirror 24 is a planar mirror or a curved mirror.
Therefore, the light beam emitted by the first light emitting component 21 passes through the first diaphragm 22 and the first condenser 23, and is reflected by the first reflector 24, and then passes through the first slit 25 to be accurately irradiated on the stitch 11, so that the problem that light is simultaneously irradiated on the root of the stitch 11 is solved, and whether the stitch 11 is deformed or not and the deformation degree thereof can be accurately judged.
Specifically, the first light emitting component 21 is an LED lamp bead or a laser, and is used as a light source for irradiating the pins 11. The first slit 25 is provided therein with a first extinction member 26, and the first extinction member 26 may be a first light-absorbing flannel, or may be a first extinction thread, and the first light-absorbing flannel or the first extinction thread is disposed on a side wall of the first slit 25. By the extinction of the first light-absorbing fleece or the first extinction thread, the light beam is prevented from generating reflected light in the first slit 25, so that the effect of the light beam irradiating the stitch 11 is affected.
Further, a first angle α is formed between the light emitting direction of the first slit 25 and the moving direction of the pin 11, and the first angle α is 5 ° to 60 °, preferably, the first angle α is equal to 30 °.
The optical system further includes an imaging device 30, the imaging device 30 including a line scanning lens 31 and a CCD (Charge Coupled Device ) scanner 32, wherein the line scanning lens 31 is a telecentric optical system. The imaging device 30 is used for imaging the stitch 11, and judges whether the stitch 11 is deformed or not by imaging.
Referring to fig. 2, fig. 2 is a schematic optical path diagram of an optical system for detecting a stitch 11 according to an embodiment of the present invention, where the optical path includes an illumination optical path 50 and an imaging optical path 60.
The pins 11 pass through the optical system for pin 11 inspection by high speed movement of the connector transport jig 10 to complete the inspection of the pins 11. The working principle is as follows:
when the connector transport jig 10 is started, the control unit notifies the optical system to start starting;
before the forefront end of the stitch 11 reaches a designated working position, the first light source device 20 is started to irradiate the stitch 11;
when the forefront end of the pin 11 reaches a designated working position, the imaging device 30 is started, and the CCD scanner 32 continuously acquires images of the pin 11;
when the extreme end of the stitch 11 has passed the designated working position, the first light source device 20 is turned off.
Example two
Referring to fig. 3 and 4, unlike the first embodiment, the optical system for detecting the pins 11 according to the present embodiment further includes a second light source device 40, where the first light source device 20 and the second light source device 40 are symmetrically disposed.
Specifically, the second light source device 40 includes a second light emitting component 41, a second diaphragm 42, a second condenser 43, and a second reflector 44, which are sequentially disposed, and a second slit 45 capable of extinction is further formed on the second light source device 40.
The second diaphragm 42 is used to control the width of the light beam emitted by the second light emitting element 41 to ensure that the light entering the second condenser 43 is efficient.
The second condenser 43 is used to convert the light beam after passing through the second diaphragm 42 into a quasi-parallel light.
The second reflecting mirror 44 is configured to reflect the light beam passing through the second condenser 43, so that the irradiation angle of the light beam is deflected and can be irradiated onto the stitch 11 through the second slit 45. Specifically, the second mirror 44 is a planar mirror or a curved mirror.
Specifically, the second light emitting member 41 is an LED lamp or a laser, and is used together with the first light emitting member 21 as a light source for irradiating the pins 11. The second slit 45 is internally provided with a second extinction member 46, and the second extinction member 46 may be a second light-absorbing flannel, or may be a second extinction thread, and the second light-absorbing flannel or the second extinction thread is disposed on a side wall of the second slit 45. By the extinction of the second light-absorbing fleece or the second extinction thread, the light beam is prevented from generating reflected light in the second slit 45, so that the effect of the light beam irradiating the stitch 11 is affected.
Further, a second included angle β is formed between the light emitting direction of the second slit 45 and the moving direction of the pin 11, and the second included angle β is equal to the first included angle α. The first angle α is 5 ° to 60 °, preferably the first angle α is equal to 30 °.
Wherein the imaging device 30 is located on the symmetry center line of the first light source device 20 and the second light source device 40.
The pins 11 pass through the optical system for pin 11 inspection by high speed movement of the connector transport jig 10 to complete the inspection of the pins 11. The working principle is as follows:
when the connector transport jig 10 is started, the control unit notifies the optical system to start starting;
before the foremost end of the stitch 11 reaches the designated working position, the first light source device 20 and the second light source device 40 are started to irradiate the stitch 11;
when the forefront end of the pin 11 reaches a designated working position, the imaging device 30 is started, and the CCD scanner 32 continuously acquires images of the pin 11;
when the extreme end of the stitch 11 has passed the specified working position, the first light source device 20 and the second light source device 40 are turned off.
Therefore, the optical system for detecting the pins 11 according to the present embodiment uses highly collimated parallel light generated by the first light source device 20 and the second light source device 40, and the parallel light is precisely irradiated onto the pins 11, so that the problem that the light is simultaneously irradiated onto the root portions of the pins 11 is solved, and whether the pins 11 are deformed and the degree of deformation thereof can be accurately determined.
The above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (6)
1. An optical system for stitch detection, characterized in that: the optical system comprises a first light source device, wherein the first light source device comprises a first light emitting component, a first diaphragm, a first condensing lens and a first reflecting lens which are sequentially arranged, and a first slit capable of extinction is formed in the first light source device;
the light beam emitted by the first light emitting component passes through the first diaphragm and the first condenser, is reflected by the first reflector, and passes through the first slit to be irradiated on the stitch;
the optical system further comprises a second light source device, and the first light source device and the second light source device are symmetrically arranged;
the second light source device comprises a second light emitting component, a second diaphragm, a second condenser and a second reflecting mirror which are sequentially arranged, and a second slit capable of extinction is formed in the second light source device;
the light beam emitted by the second light emitting component passes through the second diaphragm and the second condenser, is reflected by the second reflecting mirror, and passes through the second slit to be irradiated on the stitch;
the first reflecting mirror is a plane reflecting mirror or a curved reflecting mirror; the second reflecting mirror is a plane reflecting mirror or a curved reflecting mirror;
a first included angle is formed between the light emergent direction of the first slit and the moving direction of the pin, and the first included angle is 5-60 degrees; a second included angle is formed between the light emergent direction of the second slit and the moving direction of the pin, and the second included angle is equal to the first included angle;
the optical system further comprises an imaging device, wherein the imaging device comprises a line scanning lens and a CCD scanner, and the imaging device is positioned on the symmetrical central line of the first light source device and the second light source device.
2. The optical system of claim 1, wherein the first light emitting component is an LED bead or a laser; the second light-emitting component is an LED lamp bead or a laser.
3. The optical system of claim 1, wherein a first light absorbing fleece is disposed within the first slit; and a second light-absorbing flannelette is arranged in the second slit.
4. The optical system of claim 1, wherein a sidewall of the first slit is provided with a first extinction thread; and the side wall of the second slit is provided with a second extinction thread.
5. The optical system of claim 1, wherein the first included angle is equal to 30 °.
6. The optical system of claim 1, wherein the line scan lens is a telecentric optical system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810172487.XA CN108180858B (en) | 2018-03-01 | 2018-03-01 | Optical system for stitch detection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810172487.XA CN108180858B (en) | 2018-03-01 | 2018-03-01 | Optical system for stitch detection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108180858A CN108180858A (en) | 2018-06-19 |
| CN108180858B true CN108180858B (en) | 2024-03-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810172487.XA Active CN108180858B (en) | 2018-03-01 | 2018-03-01 | Optical system for stitch detection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108180858B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112033314A (en) * | 2020-09-09 | 2020-12-04 | 深圳市协川科技有限公司 | Stitch flatness detection device for surface mounted device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0861927A (en) * | 1994-08-26 | 1996-03-08 | Matsushita Electric Works Ltd | Contour measuring method and device therefor |
| CN201757320U (en) * | 2009-12-10 | 2011-03-09 | 深圳清溢光电股份有限公司 | Optical lighting system and non-contact measuring device |
| CN103308007A (en) * | 2013-05-24 | 2013-09-18 | 华南理工大学 | System and method for measuring coplanarity of integrated circuit (IC) pins through multistage reflection and raster imaging |
| CN103733019A (en) * | 2012-07-24 | 2014-04-16 | 精益视觉科技私人有限公司 | Method and apparatus for determining coplanarity in integrated circuit packages |
| CN103954241A (en) * | 2014-04-22 | 2014-07-30 | 华南理工大学 | IC pin coplanarity measuring system and measuring method based on structured light |
| CN206330556U (en) * | 2016-11-30 | 2017-07-14 | 昆山兴基德自动化设备有限公司 | Connector pinout coplane degree detection means |
-
2018
- 2018-03-01 CN CN201810172487.XA patent/CN108180858B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0861927A (en) * | 1994-08-26 | 1996-03-08 | Matsushita Electric Works Ltd | Contour measuring method and device therefor |
| CN201757320U (en) * | 2009-12-10 | 2011-03-09 | 深圳清溢光电股份有限公司 | Optical lighting system and non-contact measuring device |
| CN103733019A (en) * | 2012-07-24 | 2014-04-16 | 精益视觉科技私人有限公司 | Method and apparatus for determining coplanarity in integrated circuit packages |
| CN103308007A (en) * | 2013-05-24 | 2013-09-18 | 华南理工大学 | System and method for measuring coplanarity of integrated circuit (IC) pins through multistage reflection and raster imaging |
| CN103954241A (en) * | 2014-04-22 | 2014-07-30 | 华南理工大学 | IC pin coplanarity measuring system and measuring method based on structured light |
| CN206330556U (en) * | 2016-11-30 | 2017-07-14 | 昆山兴基德自动化设备有限公司 | Connector pinout coplane degree detection means |
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| Publication number | Publication date |
|---|---|
| CN108180858A (en) | 2018-06-19 |
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