CN108169897A - A kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius - Google Patents
A kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius Download PDFInfo
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- CN108169897A CN108169897A CN201711445053.4A CN201711445053A CN108169897A CN 108169897 A CN108169897 A CN 108169897A CN 201711445053 A CN201711445053 A CN 201711445053A CN 108169897 A CN108169897 A CN 108169897A
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
The invention discloses a kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius, with reference to the opposite angular shift factor t of translation direction on two elliptical orbitsv, two radial translation factor tsaAn and transverse translation factor tp, in combination with an ellipse diaphragm circ (r), obtain the expression of the complex amplitude transmittance t of the adjustable chiral ellipse spiral light beam mask plate of radius：T=circ (r) (tatv+conj(tatv)+tp), it is the chiral ellipse spiral light beam mask plate based on the described mask plate of the complex amplitude transmittance；The radial translation factor of opposite direction and angular shift factor are can obtain after complex conjugate is taken to radial direction shift factor and angular shift factor；Hybrid modulation is carried out to incident Gaussian beam using this four shift factors, the adjustable chiral ellipse spiral light beam of radius is can obtain in mask plate far field；Mask plate designed by the present invention, which can be realized, generates the adjustable chiral ellipse spiral light beam of radius in the far field of the mask plate.
Description
Technical field
The present invention relates to chiral micro-structure field, the adjustable chiral ellipse spiral light beam mask of specifically a kind of radius
The design method of plate.
Background technology
In recent years, as people deepen continuously to laser technology understanding, a variety of amplitudes, phase, polarization are proposed in succession
Deng the novel light field with special space structure.These novel light fields show the physical effect and phenomenon of a series of novel,
Such as photon trajectory angular momentum, super diffraction limit tightly focused.
These novel physical effects and phenomenon have further expanded the engineer application field of laser technology, and such as dexterous light is grasped
Control, special micro-structure etc. make a big forward position research hotspot of optical field in recent years.
Find that optical eddy can construct complicated chiral structure in a recent study, for example, circular polarisation optical eddy
Chiral nanostructured can be formed with twisted metal【Phys.Rev.Lett.110,143603 2013】, realize light field spiral phase
Conversion of the bit architecture to nano-micro structure.However, since its principle is that the rotary force of optical eddy is used to cause molten metal
Distortion forms chiral micro-structure, therefore this method is harsher to material requirements.
In order to solve this problem, 2017, Hu Yanlei seminars passed through radial translation cytokine regulatory optical eddy and plane
Wave superposition proposes a kind of chiral light field structure of annular, and constructs chiral micro-structure using this light field structure【Light-
Science& Applications 6,e17011 2017】.However, this method can only generate the chiral micro-structure of annular, and
The size of micro-structure is also difficult to regulate and control by optical instrument so that it is restricted using deep.
In conclusion in microscopic carvings quarter field, still lack a kind of engraving light beam available for elliptical chiral structure,
To cope with the different structure demand that field is carved in microscopic carvings.
Invention content
It is an object of the present invention to provide a kind of radius adjustable chiral ellipse to solve problems of the prior art
The design method of spiral light beam mask plate can be realized and the adjustable chiral ellipse spiral light of radius is generated in the far field of the mask plate
Beam.
To achieve the above object, the technical solution adopted in the present invention is：A kind of adjustable chiral ellipse spiral light of radius
The design method of beam mask plate, with reference to the opposite angular shift factor t of translation direction on two elliptical orbitsv, two radial directions put down
Move factor taAn and transverse translation factor tp, in combination with an ellipse diaphragm circ (r), obtain the adjustable hand of radius
The expression of the complex amplitude transmittance t of property ellipse spiral light beam mask plate：
T=circ (r) (tatv+conj(tatv)+tp)
It is the chiral ellipse spiral light beam mask plate based on the described mask plate of the complex amplitude transmittance, wherein, institute
The complex amplitude transmittance t stated is established in an elliptical coordinate system (r, θ), is determined with the transformation relation of rectangular coordinate system (x, y)
Justice is Mx=rcos (θ), and My=rsin (θ), M are a constant；Conj () expressions take complex conjugate function to matrix step-by-step；
Circ (r) describes an oval diaphragm, and expression formula is：
It is used as limiting the boundary condition of the mask plate；
The radial translation factor (the ta) expression formula is：
ta(r)=exp (- iar)
In formula, a is radial translation parameter, and i is imaginary unit, and radial translation parameter can make to be incident on the Gauss light of the mask plate
Beam forms a ring in far field；
Angular shift factor (the tv) expression formula is：
tv(θ)=exp (ib θ)
Wherein, b is angular translation parameters；Opposite direction is can obtain after taking complex conjugate to radial direction shift factor and angular shift factor
The radial translation factor and angular shift factor；Hybrid modulation is carried out to incident Gaussian beam using this four shift factors,
It can obtain the adjustable chiral ellipse spiral light beam of radius in mask plate far field；The wherein radial translation factor is controlling spiral light
Elliptical size where valve, angular shift factor is controlling spiral light valve number；
The transverse translation factor representation is：
tp=exp (- icx)
Wherein c is transverse translation parameter；The transverse translation factor is used for what the light beam for modulating mask plate was directly reflected with mask plate
Light beam separates.
Further, radial translation parameter a takes 6 and 12 two values respectively, and angular translation parameters b takes ± 1 and ± 5 respectively.
Further, M=2.
Compared with prior art, beneficial effects of the present invention are：
Mask plate designed by the present invention, which can be realized, generates the adjustable chiral ellipse spiral light of radius in the far field of the mask plate
Beam；Its barber-pole stripes quantity determines by angular translation parameters, the switching of positive setting about property of the negative control striped of angular translation parameters, item
Elliptical size is determined by radial translation parameter where line, thus before there is very important application in chiral microscopic carvings quarter field
Scape；
The radial translation factor can control elliptical size where spiral light valve, and angular shift factor can control spiral light valve
Number；The effect of the transverse translation factor is to separate the light beam that the light beam that mask plate is modulated directly is reflected with mask plate；It is oval
Shape diaphragm is used as limiting the boundary condition of the adjustable chiral ellipse spiral light beam mask plate of proposed radius.
Description of the drawings
Fig. 1 is that the present invention generates chiral ellipse spiral light beam mask plate；Radial translation factor a takes 6 and 12 two values respectively,
Angular shift factor b takes ± 1 and ± 5 respectively.
Fig. 2 is the chiral ellipse spiral light beam of mask plate generation demonstrated in Figure 1.
Specific embodiment
Below in conjunction with the attached drawing in inventive embodiments of the present invention, the technical solution in inventive embodiments of the present invention is carried out
It clearly and completely describes, it is clear that described embodiment is only invention part of the embodiment of the present invention rather than whole
Embodiment.Based on the embodiment in invention of the present invention, those of ordinary skill in the art are without making creative work
All other embodiments obtained belong to the range of present invention invention protection.
A kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius, includes the following steps：
Step 1: with reference to translation direction on two elliptical orbits opposite angular shift factor tv, two radial translation factor t a
And a transverse translation factor t p, in combination with an ellipse diaphragm circ (r), obtain the adjustable chiral oval spiral shell of radius
Optically-active beam mask plate, the expression of the complex amplitude transmittance t of the mask plate：
T=circ (r) (tatv+conj(tatv)+tp)
Wherein, the complex amplitude transmittance t is established in an elliptical coordinate system (r, θ), with rectangular coordinate system (x, y)
Transformation relation is defined as Mx=rcos (θ), My=rsin (θ), M=2；Conj () expressions take complex conjugate function to matrix step-by-step；
Circ (r) describes an oval diaphragm, and expression formula is：
It is used as limiting the boundary condition of the mask plate；
The radial translation factor (the ta) expression formula is：
ta(r)=exp (- iar)
In formula, a is radial translation parameter, and i is imaginary unit, and similarly hereinafter, radial translation parameter can make to be incident on the mask plate
Gaussian beam forms a ring in far field；
Angular shift factor (the tv) expression formula is：
tv(θ)=exp (ib θ)
Wherein, b is angular translation parameters；Opposite direction is can obtain after taking complex conjugate to radial direction shift factor and angular shift factor
The radial translation factor and angular shift factor；Hybrid modulation is carried out to incident Gaussian beam using this four shift factors,
It can obtain the adjustable chiral ellipse spiral light beam of the radius in mask plate far field；
The wherein radial translation factor is to control elliptical size where spiral light valve, and angular shift factor is controlling spiral light
Valve number.
The transverse translation factor representation is：
tp=exp (- icx)
Wherein c is transverse translation parameter；The transverse translation factor is used for what the light beam for modulating mask plate was directly reflected with mask plate
Light beam separates.
Radial translation parameter a takes 6 and 12 two values respectively, and angular translation parameters b takes ± 1 and ± 5 respectively.
Below by taking the mask plate of 512 × 512 sizes as an example, given for the laser that operation wavelength is 532nm chiral ellipse
Circle spiral light beam mask plate.
Mask plate radial translation factor a takes 6 and 12 respectively, and angular shift factor b takes ± 1 and ± 5 respectively, according to specific
Mask plate transmittance function in embodiment finally obtains chiral ellipse spiral light beam mask plate；Fig. 1 gives the hand
Property ellipse spiral light beam mask plate.
This chirality ellipse spiral light beam mask plate can be realized by a spatial light modulator；With Germany
For the pluto-vis-016 model spatial light modulators of Holoeye companies, the chiral ellipse spiral light beam proposed is covered
Template carries out experimental verification.
Shown in Fig. 2, experiment has obtained lens of this chiral ellipse spiral light beam mask plate in NA=0.025 numerical apertures
Light field light distribution on focal plane.
It can be seen from the figure that two different size of chiral ellipse spiral light beams that spiral light valve number is 2b have been obtained,
And the Signed Domination of b the chiral switching of pattern.
The experimental results showed that by the adjustable chiral ellipse spiral light beam mask plate of this radius proposed by the present invention, it can
To obtain the adjustable chiral ellipse spiral light beam of radius；The pattern that more horn of plenty is provided for optics chirality micro-structure is distributed by this.
In conclusion the present invention proposes a kind of specific design side of the adjustable chiral ellipse spiral light beam mask plate of radius
Case and embodiment, and 6 and 12, angular shift factor b are taken with the condenser lens of NA=0.025, radial translation factor a respectively
For taking ± 1 and ± 5 respectively, for the laser that operation wavelength is 532nm, it is proposed that a kind of adjustable chiral ellipse spiral of radius
The technology implementation route of light beam mask plate.
It is specific that the above generates one kind that the adjustable chiral ellipse spiral light beam mask plate of radius only expresses the present invention
Therefore embodiment can not be interpreted as limiting the scope of the invention.It should be pointed out that for the general of this field
It, can also be to specific implementation that this patent is proposed under the premise of basic thought of the present invention is not departed from for logical technical staff
Details makes several modifications and improvements, these belong to protection scope of the present invention.
The foregoing description of the disclosed embodiments enables professional and technical personnel in the field to realize or use the present invention hair
It is bright.A variety of modifications of these embodiments will be apparent for those skilled in the art, determine herein
The General Principle of justice can in other embodiments be realized in the case where not departing from the spirit or scope that the present invention invents.Cause
This, present invention invention is not intended to be limited to the embodiments shown herein, and is to fit to and principles disclosed herein
The most wide range consistent with features of novelty.
Claims (3)
1. a kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius, it is characterised in that：
With reference to the opposite angular shift factor t of translation direction on two elliptical orbitsv, two radial translation factor tsaAnd one
Transverse translation factor tp, in combination with an ellipse diaphragm circ (r), obtain the adjustable chiral ellipse spiral light beam of radius and cover
The expression of the complex amplitude transmittance t of template：
T=circ (r) (tatv+conj(tatv)+tp)
It is the chiral ellipse spiral light beam mask plate based on the described mask plate of the complex amplitude transmittance, wherein, it is multiple
Transmittance function t is established in an elliptical coordinate system (r, θ), and Mx is defined as with the transformation relation of rectangular coordinate system (x, y)
=rcos (θ), My=rsin (θ), M are a constant；Conj () expressions take complex conjugate function to matrix step-by-step；Circ (r) is retouched
An oval diaphragm is stated, expression formula is：
It is used as limiting the boundary condition of the mask plate；
The radial translation factor (the ta) expression formula is：
ta(r)=exp (- iar)
In formula, a is radial translation parameter, and i is imaginary unit, and radial translation parameter can make to be incident on the Gauss light of the mask plate
Beam forms a ring in far field；
Angular shift factor (the tv) expression formula is：
tv(θ)=exp (ib θ)
Wherein, b is angular translation parameters；Opposite direction is can obtain after taking complex conjugate to radial direction shift factor and angular shift factor
The radial translation factor and angular shift factor；Mixing tune is carried out to incident Gaussian beam using four shift factors
System can obtain the adjustable chiral ellipse spiral light beam of radius in mask plate far field；
Wherein, the radial translation factor is to control elliptical size where spiral light valve, and angular shift factor is controlling spiral
Light valve number；
The transverse translation factor representation is：
tp=exp (- icx)
Wherein c is transverse translation parameter；The transverse translation factor is used for what the light beam for modulating mask plate was directly reflected with mask plate
Light beam separates.
2. a kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius according to claim 1, special
Sign is：Radial translation parameter a takes 6 and 12 two values respectively, and angular translation parameters b takes ± 1 and ± 5 respectively.
3. a kind of design method of the adjustable chiral ellipse spiral light beam mask plate of radius according to claim 1, special
Sign is：M=2.
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| CN201711445053.4A CN108169897B (en) | 2017-12-27 | 2017-12-27 | Design method of chiral elliptical spiral beam mask plate with adjustable radius |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109917546A (en) * | 2019-04-04 | 2019-06-21 | 河南科技大学 | A kind of design method for the central symmetry vortex beams mask plate that can freely regulate and control |
| CN111302296A (en) * | 2019-11-19 | 2020-06-19 | 中国工程物理研究院电子工程研究所 | Method for micro-nano electroforming micro device |
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| US20170010397A1 (en) * | 2013-03-01 | 2017-01-12 | Beam Engineering For Advanced Measurements Co. | Vector vortex waveplates |
| CN104635344A (en) * | 2015-02-28 | 2015-05-20 | 河南科技大学 | Bessel light beam generating device with adjustable parameters and production method of bessel beam generating device |
| CN107515470A (en) * | 2017-09-28 | 2017-12-26 | 上海霖迈实业有限公司 | A kind of method that Modulation and Amplitude Modulation device produces Elliptic-Vortex optically-active |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109917546A (en) * | 2019-04-04 | 2019-06-21 | 河南科技大学 | A kind of design method for the central symmetry vortex beams mask plate that can freely regulate and control |
| CN109917546B (en) * | 2019-04-04 | 2021-02-05 | 河南科技大学 | Design method of center symmetrical vortex light beam mask plate capable of being freely regulated and controlled |
| CN111302296A (en) * | 2019-11-19 | 2020-06-19 | 中国工程物理研究院电子工程研究所 | Method for micro-nano electroforming micro device |
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Application publication date: 20180615 Assignee: Luoyang pingconvex Technology Co.,Ltd. Assignor: HENAN University OF SCIENCE AND TECHNOLOGY Contract record no.: X2021980013091 Denomination of invention: A design method of chiral elliptical helical beam mask with adjustable radius Granted publication date: 20200424 License type: Exclusive License Record date: 20211125 |
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