CN101907825B - Photoetching encrypted anti-counterfeiting method - Google Patents
Photoetching encrypted anti-counterfeiting method Download PDFInfo
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- CN101907825B CN101907825B CN2010102196070A CN201010219607A CN101907825B CN 101907825 B CN101907825 B CN 101907825B CN 2010102196070 A CN2010102196070 A CN 2010102196070A CN 201010219607 A CN201010219607 A CN 201010219607A CN 101907825 B CN101907825 B CN 101907825B
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Abstract
The invention relates to the technical field of photoetching anti-counterfeiting, in particular to a photoetching encrypted anti-counterfeiting method, and provides the photoetching encrypted anti-counterfeiting method for miniaturizing characters and patterns on pixel points. The method comprises the following steps of: taking a glass sheet of which the surface is subjected to uniform gluing as a substrate, and designing a character aperture, namely designing a single character aperture design sheet of miniaturized characters by using a computer; preparing a film; turning the film, namely exposing, developing and slitting the film so as to obtain a single character aperture sheet; designing an original drawing according to the resolution and character space; introducing the original drawing into a photoetching machine computer on a photoetching machine, substituting original common metal apertures, such as a nickel hole with only aperture function for the single character aperture sheet, and exposing a photoresist dot matrix; developing by using developing solution; and electroforming, namely injecting silver and reprinting to obtain a mother set. By adopting the method for increasing characters and patterns in photoetching pixel points, the characters and patterns can be observed by a high power magnifier only, while human visual inspection is substantially consistent with common photoetching. Therefore, the anti-counterfeiting capability of holographic identifiers is improved, and the plate-making technical effect is enriched.
Description
Technical field
The present invention relates to a kind of photoetching field of anti-counterfeit technology, particularly a kind of photoetching encrypted anti-counterfeiting method.
Background technology
Domestic holographic security technology has adopted various technological means at present; For example: on the embossed holographic carrier, adopt dynamic holographic technology, multichannel technology, 2D/3D technology, dot matrix holographic technique, photochemical embossment technology, micro encryption technology; Along with popularizing rapidly of holographic technique; Make the dynamics of anti-counterfeiting technology reduce gradually, its false proof difficulty is improving gradually, in order to improve the anti-counterfeiting power of holographic security technology; Must improve constantly the technology content of holographic false proof self, improve and invent new manufacture craft.
Development along with the holographic false proof industry; It is very universal to have the product that the anti-counterfeiting technology of a few kinds of simple functions produces; Like photoetching technique is a kind of new holographic design producing technology popular in recent years, that be used to make radium-shine sign and holographic grating pattern, and it is the technology that combines laser holography and Computer Control Technology to make hologram pattern.The laser dot-matrix hologram pattern also has 360 and spends characteristics visual and dynamic visual impact except having very high diffraction efficiency and abundant colors.Therefore, the radium-shine sign that adopts this technology to process has fabulous anti-counterfeiting performance and visual effect, like dynamic effects such as background gradual change, rotation flickering and scalable flickerings.In photoetching technique; Traditional photoetching technique only is on photoetching point, to add content, and these contents are the simple geometric shape mostly, like square, circle etc.; From holographic laser photoetching anti-counterfeiting technology of the same trade both at home and abroad at present; The anti-counterfeiting technology that the simple geometric shape figure is only arranged on the photoetching point is the demand that is difficult to satisfy social development, and its anti-fake effect is to have a greatly reduced quality, and there is bigger defective in such photoetching technique on the antifalse effect of anti-fake product; Therefore people's microlithography technology that begins one's study; And aspect patent documentation, existing open source literature is research " method that adopts microlithography technology to make miniature Chinese character ", and its patent No. is 200510011686.5, an open source literature is " micro Character array anticounterfeit mark and preparation method thereof " in addition; Its patent No. is 200510086954.x; In these two documents, all do not disclose the method that detailed description goes out to make the common engineering technical personnel in this area to implement, only generally be described as: making phototched mask platemaking equipment and technology are made miniature Chinese character in the employing microlithography technology, and making common engineering technical personnel be interpreted as only is to lean on the phototched mask platemaking equipment just to accomplish the making of miniature Chinese character; This is not simple to the stage of achieving one's aim easily in actual production yet, and the various method of utilizing lithographic equipment to make miniature Chinese character is also still arranged.
The said step of utilizing original litho machine to make common photoengraving pattern is:
Substrate is prepared: make the glass sheet that the surface scribbles photoresist;
Photoetching: the pattern that designs is imported in the computer of litho machine, adopt the plain metal unthreaded hole such as the nickel hole that have single unthreaded hole effect that photoresist is carried out the dot matrix exposure on the litho machine, make the security pattern that needs;
Develop: use developing liquid developing;
Electroforming: spray silver, electroforming reprint.
Summary of the invention
The purpose of this invention is to provide a kind of photoetching encrypted anti-counterfeiting method that on pixel, carries out micro text, pattern.
The present invention realizes through following technical scheme:
A kind of dot matrix photoetching pixel encryption antiforgery method, concrete steps are following:
1). substrate is prepared: the glass sheet of making the even glue in a surface;
2). design literal unthreaded hole: the single literal unthreaded hole appointment size, that concrete appointment literal is arranged of the microfilm of characters that will make with the computerized mapping software design designs sheet; Promptly make at least one single literal unthreaded hole design sheet; If a plurality of microfilm of characters need to make a plurality of single literal unthreaded hole design sheets;
3). make film sheet: single literal unthreaded hole design sheet is made erect image film sheet or negative-appearing image film sheet based on the characteristic of the film;
4). turn over sheet: with film sheet through overexposure, develop, cut, obtain single literal unthreaded hole sheet;
5). publish picture: use Photoshop resolution and literal spacing as requested, design former picture proof, the pattern that needs are encrypted is separated;
6). photoetching: on litho machine; The former picture proof that will design earlier imports in the computer of litho machine; Use earlier the common metal unthreaded hole that other security patterns are partly carried out common photoetching, promptly under computer control, according to photoresist dot matrix exposure the carrying out photoetching of the former picture proof of input to substrate surface; When the pattern part that needs are encrypted carries out photoetching; Adopt said single literal unthreaded hole sheet to replace original common metal unthreaded hole; Adjustment light path and program parameter carry out photoetching, for the situation of a plurality of microfilm of characters combinations of needs; Just need change corresponding literal unthreaded hole and carry out photoetching successively based on the arrangement mode and the distributing position of design picture Chinese words;
The exposure of described dot matrix: litho machine based on computer by the control of requirements of making, pointwise makes public to optical grating point; Make the grating on each optical grating point add corresponding direction of microfilm of characters and density information; The microfilm of characters that on each optical grating point, adds is that people's naked eyes can not be seen like this; Be merely able to observe and can see on the relevant position of encrypting through high magnified glass, its disguise is very strong;
For single literal unthreaded hole sheet need be repeatedly replaced in the photoetching of carrying out said a plurality of microfilm of characters, be about to each single literal unthreaded hole sheet and put into successively on the position in former plain metal unthreaded hole such as nickel hole, through litho machine the photoresist of substrate surface is carried out the dot matrix exposure;
7). develop: the equal matrix sheet accomplished of single exposure is put into developer solution and is developed at least, on the photoresist film of substrate, forms microfilm of characters or pattern;
8). electroforming: the substrate behind the photoresist developing is sprayed silver, electroforming reprint, and the work nickel plate that obtains having the sightless microfilm of characters of naked eyes is a mother matrix.
Photoetching encrypted anti-counterfeiting method of the present invention, wherein: said substrate selects for use the glass sheet of surfacing as substrate.
Photoetching encrypted anti-counterfeiting method of the present invention, wherein: the even matrix sheet in said surface is to form equal matrix sheet with the sol evenning machine photoresist that even coating one deck is used for photoetching on the glass lamella.
Photoetching encrypted anti-counterfeiting method of the present invention, wherein: said film sheet is an erect image film sheet.
Photoetching encrypted anti-counterfeiting method of the present invention, wherein: said film sheet is a negative-appearing image film sheet, in the pixel of photoetching, increases the literal of hollow out.
Photoetching encrypted anti-counterfeiting method of the present invention; Wherein: when design literal unthreaded hole; Four microfilm of characters are made into the single literal unthreaded hole design sheet of the microfilm of characters of one two row, two row arrangements; Promptly in a single literal unthreaded hole design sheet, simultaneously four microfilm of characters are made into one two row, two row and are arranged as one and make integral manufacturing and become a single literal unthreaded hole sheet.
The present invention has following remarkable advantage:
Compare with existing program; The invention has the advantages that: adopted a kind of new film sheet that passes through in the pixel of photoetching, to increase literal and method of patterning; And these literal and pattern are merely able to observe through high magnified glass; People's visual inspection then with common photoetching basically identical, the product that promptly adopts the present invention to make becomes and both has that microfilm of characters or password are contained in sightless, inside and appearance has the holographic anti-counterfeiting label of profile hologram pattern, has improved the anti-counterfeiting power of hologram marking; Enrich the technique effect of plate-making, in the pixel of photoetching, can also increase the literal of hollow out.
Description of drawings:
Fig. 1 is the photoetching schematic diagram of a kind of photoetching encrypted anti-counterfeiting method of the present invention
Fig. 2: a kind of photoetching encrypted anti-counterfeiting method of the present invention is made the embodiment synoptic diagram of microfilm of characters under high magnified glass;
Embodiment:
Below in conjunction with accompanying drawing and specific embodiment the present invention is done further introduction, but not as to qualification of the present invention.
The present invention is through a large amount of experiments, works out and utilize litho machine to adopt new different processes method to make the microfilm of characters method of encrypting.
As shown in Figure 1; Be photoetching schematic diagram of the present invention, foregoing microlithography technology is meant the laser dot-matrix hologram pattern, is made up of some minimum optical grating points (about about tens to 100 microns); And each optical grating point comprises very fine grating (less than a micron); In manufacturing process, the computer of litho machine by requirements of making to optical grating point pointwise encode, reach predetermined visual effect thereby direction or the density of the grating on each point are changed; The ultimate principle that this making laser dot-matrix hologram pattern that is prior art has realized identifies; These visual effects comprise: dynamic effect, multichannel technology effect, 2D/3D technique effects such as background gradual change, rotation flickering and scalable flickering; The present invention utilizes existing litho machine exactly; Micro text or the password that need observe through high magnified glass of adding again on laser dot-matrix hologram pattern that these have been realized sign; Its research object is exactly each pixel, in pixel, adds microfilm of characters, and what at first will need micro decides literal or pattern become will reach the target sizes size with the computerized mapping software design microfilm of characters; Promptly design single literal unthreaded hole design sheet
Should go out a film sheet by list literal unthreaded hole design sheet design producing; This film can be that erect image film sheet also can be a negative-appearing image film sheet; Said erect image film sheet is common, and what the light in the image manifested in film sheet is black, and what the black part in image manifested in film sheet is white; Adopting this film mainly is to be used for conventional microfilm of characters effect, like raster effects; Negative-appearing image film sheet then is opposite; What the white portion in image manifested in film sheet is white; Black in image part manifests in film sheet remains black, and the product that adopts such film to make is that the product made from the common conventional film is antipodal, so effect also is very different; Such literal is white; Is black around it, the effect that erect image film sheet and negative-appearing image film sheet produce resembles the effect that characters cut in intaglio and characters cut in relief in the stone inscription contrast very much, and this phenomenon makes full use of now on micro text; Make original because micro make the pattern that the bad micro pattern of brightness of literal or pattern becomes brighter; Make the pattern integral body of microfilm of characters improve lightness, adopting such film mainly is to be used for the plate-making of photoresist hollow out, like rainbow nickel plate microfilm of characters effect;
, selected film sheet is turned over sheet thereafter, be about to film sheet through overexposure, develop, cut, obtain single literal unthreaded hole sheet 4;
The operation of also will publishing picture: use Photoshop resolution and literal spacing as requested, design former picture proof, promptly the designer designs according to the concrete design of pattern coded system and the method to optical grating point;
Simultaneously; Before using litho machine, also need carry out substrate 9 prepares; The glass sheet of promptly making a surfacing is as substrate; At the even glue of its glass sheet surface, on the glass lamella, evenly apply the photoresist 8 that one deck is used for photoetching with sol evenning machine exactly, such substrate 9 is fixed on the grillage 10 of litho machine.
So far just can carry out photoetching; On litho machine, the former picture proof that will design earlier imports in the computer of litho machine, and the former picture proof that will design earlier imports in the computer of litho machine; Use the plain metal unthreaded hole that other security patterns are partly carried out common photoetching earlier; When the pattern part that needs are encrypted carries out photoetching, adopt said single literal unthreaded hole sheet to replace original plain metal unthreaded hole such as photoetching is carried out in the nickel hole, adjustment light path and program parameter; The beginning photoetching, promptly the photoresist 8 to substrate surface carries out the dot matrix exposure; As shown in Figure 1 is the photoetching schematic diagram; A branch ofly get into amplifying lens groups 3 through catoptron 2 by laser instrument 1 emitted laser bundle; Through amplifying the wherein a branch of light of choosing through behind the single literal unthreaded hole sheet 4; Arrive through a grating 5, a diaphragm 6 and one group of lens combination 7 successively continuously and have on the substrate 9 of photoresist 8, said substrate 9 is fixed on the grillage 10, has at this moment obtained making the substrate 9 of photoresist 8 exposures; Here said adjustment light path and program parameter only are the work of satisfying some focal lengths adjustment and so on of photoetching requirement, and not tangible parameter changes; On litho machine,, just need change corresponding literal unthreaded hole and carry out photoetching according to the arrangement mode and the distributing position of design picture Chinese words wherein for the situation that needs the literal combination; Litho machine is relatively lined by line scan successively, and only the imaging point of this microfilm of characters is carried out an exposure in its several positions in the pattern of former picture proof each single literal unthreaded hole sheet; Litho machine with regard to different single literal unthreaded hole sheets to several positions in the former picture proof pattern, line by line scan successively respectively; And only the imaging point of this microfilm of characters is carried out an exposure, reach a plurality of microfilm of characters and be imaged onto repeatedly on the photoresist diverse location respectively successively.
Get into developing procedure: the substrate 9 that will have photoresist 8 is used developing liquid developing;
Finishing operation is electroforming: promptly spray silver, the such flow process of electroforming reprint through the substrate 9 after developing, obtaining work nickel plate is mother matrix.
Microfilm of characters is based on to be realized on the basis of pixel; Microfilm of characters itself is exactly a pixel; So it possesses the characteristic of pixel; Promptly can realize miniature add ciphertext word, pattern in; Also realize the various effects that photoengraving pattern had of former litho machine simultaneously, promptly the people still can with the naked eye see the holographic false proof pattern with various antifalse effects on the miniature position that adds ciphertext word, pattern, and on the miniature position that adds ciphertext word, pattern, observes with high magnified glass; Will see miniature literal stroke and pattern clearly, that is to say it is a holographic false proof pattern that contains microfilm of characters and have the photoetching encrypted anti-counterfeiting of profile hologram pattern.
As shown in Figure 2; Be the embodiment synoptic diagram of micro text under high magnified glass that a kind of photoetching encrypted anti-counterfeiting method of the present invention is made, promptly in pixel, add different micro texts, promptly carry out the micro text combination; Realized connecting airtight between the literal, respond well.The micro pattern that equally also can add different pattern.
Another embodiment can also be: when design literal unthreaded hole; Can also change and different forms; Be about to the single literal unthreaded hole design sheet that four microfilm of characters are made into the microfilm of characters of one two row, two row arrangements; In a single literal unthreaded hole design sheet, simultaneously four microfilm of characters are made into one two row, two row and are arranged as an integral manufacturing in single literal unthreaded hole sheet design, the difficulty of so certainly making film increases, but has increased the number that once adds ciphertext word like this; The number of times that has connected airtight in having reduced the number that the film and having made has improved the speed of making.
Claims (5)
1. photoetching encrypted anti-counterfeiting method is characterized in that:
Concrete steps are following:
1). substrate is prepared: the glass sheet of making the even glue in a surface;
2). design literal unthreaded hole: the appointment size of the microfilm of characters that will make with the computerized mapping software design, have and specify single literal unthreaded hole of literal to design sheet;
3). make film sheet;
4). turn over sheet: film sheet through overexposure, development, is cut, obtain single literal unthreaded hole sheet;
5). publish picture: use Photoshop resolution and literal spacing as requested, design former picture proof, the pattern that needs are encrypted is separated;
6). photoetching: on litho machine; The former picture proof that will design earlier imports in the computer of litho machine, uses the common metal unthreaded hole that other security patterns are partly carried out common photoetching earlier, when the pattern part that needs are encrypted carries out photoetching; Adopt said single literal unthreaded hole sheet to replace original common metal unthreaded hole and carry out photoetching; Wherein, just need change corresponding single literal unthreaded hole sheet and carry out photoetching based on the arrangement mode and the distributing position of design picture Chinese words for the situation that needs the literal combination;
7). develop: use developing liquid developing
8). electroforming: spray silver, electroforming reprint, obtaining work nickel plate is mother matrix.
2. photoetching encrypted anti-counterfeiting method according to claim 1 is characterized in that: said substrate selects for use the glass sheet of surfacing as substrate.
3. photoetching encrypted anti-counterfeiting method according to claim 1 is characterized in that: the even matrix sheet in said surface is on the glass lamella, evenly to apply the photoresist that one deck is used for photoetching with sol evenning machine.
4. photoetching encrypted anti-counterfeiting method according to claim 1 is characterized in that: said film sheet is an erect image film sheet.
5. photoetching encrypted anti-counterfeiting method according to claim 1 is characterized in that: said film sheet is a negative-appearing image film sheet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102196070A CN101907825B (en) | 2010-07-07 | 2010-07-07 | Photoetching encrypted anti-counterfeiting method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102196070A CN101907825B (en) | 2010-07-07 | 2010-07-07 | Photoetching encrypted anti-counterfeiting method |
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| CN101907825A CN101907825A (en) | 2010-12-08 |
| CN101907825B true CN101907825B (en) | 2012-05-09 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246160B (en) * | 2012-02-13 | 2018-08-10 | 吴强 | The production method of microfilm of characters picture |
| CN104636938A (en) * | 2015-03-11 | 2015-05-20 | 四川西铖科技有限公司 | Holographic authentic identifying and tracing method for high-density information integration identification |
| CN108875968A (en) * | 2018-06-06 | 2018-11-23 | 中山新诺科技股份有限公司 | Generation method, product code printing method and the production method of product identification information |
| CN112211035A (en) * | 2019-07-10 | 2021-01-12 | 苏州苏大维格科技集团股份有限公司 | Manufacturing method of high-registration-precision packaging paper |
| CN112652229A (en) * | 2020-12-29 | 2021-04-13 | 中丰田光电科技(珠海)有限公司 | Manufacturing method of film-pressed nickel plate with combination of multiple laser effects |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6883159B2 (en) * | 2002-03-19 | 2005-04-19 | Intel Corporation | Patterning semiconductor layers using phase shifting and assist features |
| EP1501688B8 (en) * | 2002-05-08 | 2008-02-20 | Leonhard Kurz Stiftung & Co. KG | Multilayer image, particularly a multicolor image |
| SG118239A1 (en) * | 2003-04-24 | 2006-01-27 | Asml Netherlands Bv | Lithographic processing method and device manufactured thereby |
| CN1687846A (en) * | 2005-05-09 | 2005-10-26 | 中国科学院光电技术研究所 | Method for making miniature Chinese characters by using microphotography technology |
| CN1741095A (en) * | 2005-07-14 | 2006-03-01 | 中国科学院光电技术研究所 | Miniature anti-fake metal sheet containing micro characters |
| CN1904728A (en) * | 2005-07-26 | 2007-01-31 | 联华电子股份有限公司 | Method for generating dense and isolated contact hole pattern by identical energy twice exposures |
| CN100458845C (en) * | 2007-02-13 | 2009-02-04 | 江苏国盾科技实业有限责任公司 | Production of electronic-physical seal and its synthetic seal |
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