CN108160601B - Ultrasonic cleaning method - Google Patents
Ultrasonic cleaning method Download PDFInfo
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- CN108160601B CN108160601B CN201711328896.6A CN201711328896A CN108160601B CN 108160601 B CN108160601 B CN 108160601B CN 201711328896 A CN201711328896 A CN 201711328896A CN 108160601 B CN108160601 B CN 108160601B
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- ultrasonic
- multiphase flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Abstract
The invention relates to an ultrasonic cleaning method, which firstly prepares multiphase flow anddistributing multiphase flow on the surface of an object to be cleaned at a certain flow rate; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape; then starting an ultrasonic generator to transmit ultrasonic waves to the cleaned object, wherein the ultrasonic waves reach the cleaned object after being transmitted in the multiphase flow; adjusting the initial frequency of the ultrasonic wave to
The multiphase flow forms an ultrasonic wave retardation layer with higher impedance on the surface of the object to be cleaned. The invention can improve the cleaning effect of the cleaned object and simultaneously avoid damaging the surface and the interior of the cleaned object.
Description
Technical Field
The invention relates to a cleaning method, in particular to an ultrasonic cleaning method.
Background
Ultrasonic waves are a form of propagation of mechanical vibrational energy. The cavitation action, acceleration action and direct current action of ultrasonic waves in liquid are utilized to directly and indirectly act on the liquid and dirt, so that the dirt layer can be dispersed, emulsified and stripped to achieve the aim of cleaning. At present, ultrasonic cleaning is widely applied to various industrial and civil fields, including the surface spraying treatment industry, the mechanical industry, the electronic industry, the medical industry, the semiconductor industry, the clock and jewelry industry, the optical industry and the textile printing and dyeing industry.
When ultrasonic waves are used for cleaning, the ultrasonic generator generates high-frequency ultrasonic waves, and impact force and friction force are generated in the ultrasonic vibration propagation process, so that stains on an object are removed. In order to improve the cleaning effect of ultrasonic waves, chinese patent No. CN200510108823.7 discloses an ultrasonic cleaning system and method, which includes an ultrasonic cleaner and a bubble generator, wherein the bubble generator can generate micro-emulsion water containing a plurality of micro-nano bubbles, and the micro-emulsion water containing micro-nano bubbles is used to enhance the cleaning effect of ultrasonic waves and remove the corners of the object to be cleaned which are not easy to clean.
Although ultrasonic waves are convenient to use and good in cleaning effect, the ultrasonic waves can cause certain corrosion or damage to the surface and the interior of a material to be cleaned. In particular, in the case of precision parts or fragile materials, if they are corroded or damaged during cleaning, their usability is greatly reduced.
Disclosure of Invention
The invention aims to provide an ultrasonic cleaning method which can avoid corrosion or damage to the surface and the inside of an object to be cleaned.
In order to achieve the purpose, the invention adopts the technical scheme that:
an ultrasonic cleaning method, comprising the steps of:
step 1, preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape;
step 2, starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the cleaned object; adjusting the initial frequency of the ultrasonic wave to
The multiphase flow forms an ultrasonic wave retardation layer on the surface of the object to be cleaned, wherein the thickness of the ultrasonic wave retardation layer is 0.1<k<0.5, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase.
The ultrasonic generator comprises a second harmonic feedback circuit.
The gas content of the multiphase flow is less than 15%, and the average radius of the gas microbubbles is 5-100 microns.
The gas microbubbles have an average radius of 10 to 50 microns.
The multiphase flow includes a surfactant.
The average residence time of each particle in the multiphase flow in the ultrasonic wave emission area is less than 20 milliseconds.
The gas-containing rate of the multiphase flow cross section decreases from inside to outside, and the flow rate of the multiphase flow cross section decreases from inside to outside.
The invention distributes multiphase flow on the surface of the object to be cleaned at a certain flow rate, then starts the ultrasonic generator to emit ultrasonic waves, so that the multiphase flow can be carried out on the object to be cleaned in an ultrasonic wave radiation area, after the multiphase flow enters the ultrasonic wave radiation area, a part of bubbles in the multiphase flow are broken or disappeared, and a part of bubbles are increased in diameter. When the average diameter distribution of bubbles is continuously close to a resonance region, an ultrasonic wave blocking layer with higher impedance is formed in multiphase flow, the ultrasonic wave blocking layer can absorb, scatter and reflect ultrasonic waves in a large percentage to prevent the ultrasonic energy from being transmitted continuously, only a small part of the ultrasonic energy can directly penetrate through the ultrasonic wave blocking layer and reach the surface of an object to be cleaned, and less ultrasonic waves enter the inside of the object to be cleaned through the surface of the object to be cleaned. Therefore, the ultrasonic cleaning method can avoid direct damage or corrosion of the surface and the interior of the object to be cleaned caused by ultrasonic radiation. In addition, in the ultrasonic wave retardation layer, most of the energy of the ultrasonic wave is transferred to the strong nonlinear vibration of the interface of the gas dispersion phase and the continuous phase, thereby enhancing the cleaning effect on the surface of the object.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a second embodiment of the present invention.
Detailed Description
The invention discloses an ultrasonic cleaning method, which comprises the following specific steps:
preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned at a certain flow rate; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, at least one phase in the dispersed phase is gas, and the gas is initially in a micro-bubble shape;
starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the surface to be cleaned; adjusting the frequency of the ultrasonic wave to
The multiphase flow forms an ultrasonic wave retardation layer with higher impedance on the surface of the object to be cleaned, wherein the impedance is 0.1<k<0.5, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase. The ultrasonic waves emitted by the ultrasonic generator must propagate in a section of the multiphase flowThe distance is sufficient to radiate the gas microbubbles in the multiphase flow and form a retardation layer. In order to ensure the tissue layer formation effect, the propagation direction of the ultrasonic wave is consistent with the flow direction of the multiphase flow.
The ultrasonic generator comprises a second harmonic feedback circuit, and the ultrasonic generator can adjust the frequency, power and duty ratio of the ultrasonic in real time according to a second harmonic feedback signal. The initial average diameter of the microbubbles, the initial static pressure of the fluid and the like can change or deviate along with external factors, so that the formation of the ultrasonic wave blocking layer is influenced, the position and the shape of the ultrasonic wave blocking layer can be reflected by a second harmonic feedback signal, the ultrasonic wave blocking layer is maintained to be close to the surface of an object through the change of the frequency, the power and the duty ratio of the ultrasonic wave during cleaning, and a better cleaning effect is achieved.
The gas fraction of the multiphase flow is less than 15% and the gas microbubbles have an average radius of 5 to 100 microns, preferably 10 to 50 microns. Under the action of ultrasonic waves with proper frequency and intensity, the average radius of the gas microbubbles is continuously increased along with the flowing process, when the gas microbubbles reach the surface of an object, the radius distribution of the microbubbles reaches an acoustic resonance region, so that the acoustic impedance of two-phase or multi-phase flow near the surface is obviously increased, and an ultrasonic wave blocking layer with good ultrasonic wave absorption is formed. Compared with other dispersion modes of gas dispersion phases, the controllability of the micro-bubble gas is higher, and the formed ultrasonic wave retardation layer is more stable.
To enhance the cleaning effect, a surfactant may be included in the multiphase flow. The average residence time of each particle in the multiphase flow in the ultrasonic wave emitting area is less than 20 milliseconds. The gas content of the cross section of the multiphase flow decreases from inside to outside, and the flow rate of the cross section of the multiphase flow decreases from inside to outside.
Fig. 1 is a schematic diagram of an embodiment of the present invention, in which an environment for performing ultrasonic cleaning is a closed circulating solvent tank, multiphase flow is gas-liquid two-phase flow, that is, gas-liquid two-phase flow is used as a cleaning medium, wherein a gas phase is methane, and a liquid phase is composed of saturated chain hydrocarbon and a nonionic surfactant.
The embodiment discloses a device designed for implementing an ultrasonic cleaning method, which comprises a gas containing bottle 11, a liquid storage tank 12, a high-pressure dissolved air tank 13, a high-speed shear pump 14, a jet device 15, an ultrasonic generator 17 and a solvent tank 16, wherein the gas containing bottle 11 and the liquid storage tank 12 are connected with the high-pressure dissolved air tank 13, the outlet of the high-pressure dissolved air tank 13 is connected with one inlet of the high-speed shear pump 14, the other inlet of the high-speed shear pump 14 is connected with the liquid storage tank 12, the outlet of the high-speed shear pump 14 is connected with one inlet of the jet device 15, the other inlet of the jet device 15 is connected with the liquid storage tank 12, and the outlet of the jet device 15 is; the upper part of the solvent tank 16 is provided with an air outlet, the side edge of the lower part is provided with a liquid outlet, the air outlet is connected to the gas containing bottle 11 through a filter bottle 18, and the liquid outlet is connected to the liquid storage tank 12 through a deslagging filter tank 19.
Methane is placed in a gas containing bottle 11, mixed liquid consisting of saturated chain hydrocarbon and nonionic surfactant is placed in a liquid storage tank 12, the gas containing bottle 11 and the liquid storage tank 12 are connected to a high-pressure dissolved gas tank 13 through pipelines, so that the mixed liquid in the liquid storage tank 12 flows into the high-pressure dissolved gas tank 13, methane gas is added and dissolved in the high-pressure dissolved gas tank 13 under pressure, then the methane gas is introduced into liquid phase flow of a high-speed shear pump 14 for preliminary pressure reduction and mixing, then partial low-pressure liquid is sucked in through a jet device 15 and then is discharged together, and gas-liquid two-phase flow with the flow rate and the gas content higher than those of the outer side is obtained, wherein the inner side refers to the center of the cross section of the two-phase flow.
The dispersed phase gas is initially dispersed in a micro-bubble shape, the average radius is less than 30 microns, and micro-bubbles are gradually increased in the flowing process along with the reduction of the pressure borne by the two-phase flow and the increase of time. The proportion of the high-pressure liquid is adjusted to ensure that the integral gas content of the gas-liquid two-phase flow is kept between 3 percent and 5 percent. The two-phase gas-liquid flow was discharged from an annular discharge port located at the bottom of a sealed wash tank at an initial average flow rate of 5 meters per second.
An ultrasonic transducer 171 is installed inside the annular discharge port and emits ultrasonic waves upward. A plurality of ultrasonic probes 172 are arranged outside the annular discharge port and can collect scattered back second harmonic signals. The ultrasonic transducer 171 and the ultrasonic probe 172 are both connected to an ultrasonic generator 17 with a signal processing circuit, and the frequency adjustable range of the ultrasonic generator 17 is 18KHZ to 80 KHZ. Before cleaning, the ultrasonic frequency is adjusted from high to low until a second harmonic signal of a certain intensity is obtained, at which time a distinct ultrasonic wave blocking layer 4 appears shortly after the discharge opening. After the ultrasonic wave retardation layer 4 appears, the surface of the object 3 to be cleaned can be cleaned by being close to the annular discharge port. The position and the shape of the ultrasonic wave retardation layer 4 can be calculated according to the second harmonic feedback signal during cleaning, the power and the duty ratio are adjusted accordingly, the ultrasonic wave retardation layer is maintained to be close to the surface of an object, and a better cleaning effect is achieved.
Fig. 2 is a schematic structural diagram of an embodiment of the present invention, in which cleaning is performed in an open environment, a cleaning medium is a gas-liquid-solid three-phase flow, a gas phase is air, a liquid phase is water, and a solid phase is activated carbon powder with a particle size of 20 to 40 micrometers. In the three-phase flow, the solid particles can serve as cavitation nuclei, so that the cavitation is easier to generate; the solid particles can wash the surface of the cleaned object, so that the cleaning effect is enhanced; the solid component can affect the ultrasonic impedance distribution in the three-phase flow and contribute to the stabilization of the ultrasonic retardation layer.
The embodiment discloses a device designed for implementing an ultrasonic cleaning method, which comprises a micro-nano bubble pump 21, a liquid storage tank 22, an ejector 23 and an ultrasonic generator 24, wherein the micro-nano bubble pump 21 and the liquid storage tank 22 are respectively connected to two inlets of the ejector 23. The liquid storage tank 22 is internally provided with an active carbon suspension, a micro-nano bubble pump 21 is used for generating a micro-bubble mixed liquid with 5% gas content, and the micro-bubble mixed liquid and the active carbon suspension are mixed by an ejector 23 and then flow out together, so that gas-liquid-solid three-phase flow is obtained. An ultrasonic transducer 241 is arranged in the inner side of the outlet of the gas-liquid-solid three-phase flow, and a soft enclosure is arranged on the outer side of the outlet. The ultrasonic probe 242 is located on the soft enclosure and can collect the scattered back second harmonic signals. The ultrasonic transducer 241 and the ultrasonic probe 242 are both connected to an ultrasonic generator 24 with a signal processing circuit, and the frequency of the ultrasonic generator 24 is 50 KHZ. The position and the shape of the ultrasonic wave blocking layer 4 can be calculated by the second harmonic feedback signal during cleaning, the power and the duty ratio of ultrasonic waves are adjusted accordingly, the ultrasonic wave blocking layer 4 is kept close to the surface of the cleaned object 3, and a better cleaning effect is achieved.
In the application process of the ultrasonic cleaning method, bubbles in the two-phase flow or the three-phase flow are partially broken or disappeared, partially combined and partially increased in diameter due to the continuous action of ultrasonic radiation before reaching the surface of an object to be cleaned. After the two-phase flow or the three-phase flow enters the ultrasonic wave radiation area, the impedance of the two-phase flow or the three-phase flow to the ultrasonic wave is increased along with time because the average diameter distribution of the bubbles is continuously close to the resonance interval. When the impedance of the two-phase flow or the three-phase flow to the ultrasonic wave is increased to a certain range, a large percentage of absorption, scattering and reflection can be caused to the ultrasonic wave, and the ultrasonic energy is prevented from being transmitted continuously, wherein the ultrasonic wave blocking layer is an area with suddenly increased impedance. Only a small part of ultrasonic energy can directly penetrate through the ultrasonic wave blocking layer and reach the surface of the cleaned object, and less ultrasonic waves enter the cleaned object through the surface of the cleaned object. Therefore, the ultrasonic cleaning method can avoid direct damage to the surface and the interior of the object to be cleaned caused by ultrasonic radiation. From the indirect damage of the surface of the object to be cleaned, in the ultrasonic wave retardation layer, the number of the microbubbles under stable cavitation is much larger than that of the microbubbles under transient cavitation, namely, the ultrasonic energy ratio of the microbubbles collapsing and generating surface destruction is reduced, and the indirect damage caused by the ultrasonic energy ratio is also reduced.
The above description is only exemplary of the present invention and is not intended to limit the technical scope of the present invention, so that any minor modifications, equivalent changes and modifications made to the above exemplary embodiments according to the technical spirit of the present invention are within the technical scope of the present invention.
Claims (8)
1. An ultrasonic cleaning method is characterized in that: which comprises the following steps:
step 1, preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape;
step 2, starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the cleaned object; adjusting initial frequency of ultrasonic waveA rate of
The multiphase flow forms an ultrasonic wave retardation layer on the surface of the object to be cleaned, wherein the thickness of the ultrasonic wave retardation layer is 0.1<k<0.5, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase.
2. An ultrasonic cleaning method according to claim 1, characterized in that: the ultrasonic generator comprises a second harmonic feedback circuit.
3. An ultrasonic cleaning method according to claim 1, characterized in that: the gas content of the multiphase flow is less than 15%, and the average radius of the gas microbubbles is 5-100 microns.
4. An ultrasonic cleaning method according to claim 3, characterized in that: the gas microbubbles have an average radius of 10 to 50 microns.
5. An ultrasonic cleaning method according to claim 1, characterized in that: the dispersed phase in the multiphase flow also contains solid particles.
6. An ultrasonic cleaning method according to any one of claims 1 to 5, characterized in that: the multiphase flow includes a surfactant.
7. An ultrasonic cleaning method according to claim 1, characterized in that: the average residence time of each particle in the multiphase flow in the ultrasonic wave emission area is less than 20 milliseconds.
8. An ultrasonic cleaning method according to claim 1, characterized in that: the gas-containing rate of the multiphase flow cross section decreases from inside to outside, and the flow rate of the multiphase flow cross section decreases from inside to outside.
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| CN110711745A (en) * | 2018-07-12 | 2020-01-21 | 天津市优尼迪科技有限公司 | Ultrasonic cleaning process |
| CN110180817B (en) * | 2019-05-29 | 2023-09-08 | 西安热工研究院有限公司 | Multiphase flow cleaning device and cleaning method for solid-state electrode in chemical instrument |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103831270A (en) * | 2014-03-19 | 2014-06-04 | 中国科学院声学研究所 | Ultrasonic cavitation intensifying device and ultrasonic cavitation intensifying method |
| CN203737655U (en) * | 2014-03-19 | 2014-07-30 | 中国科学院声学研究所 | Ultrasonic cavitation cloud control device |
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| US9044794B2 (en) * | 2009-12-31 | 2015-06-02 | Lam Research Ag | Ultrasonic cleaning fluid, method and apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103831270A (en) * | 2014-03-19 | 2014-06-04 | 中国科学院声学研究所 | Ultrasonic cavitation intensifying device and ultrasonic cavitation intensifying method |
| CN203737655U (en) * | 2014-03-19 | 2014-07-30 | 中国科学院声学研究所 | Ultrasonic cavitation cloud control device |
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