CN110711745A - Ultrasonic cleaning process - Google Patents
Ultrasonic cleaning process Download PDFInfo
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- CN110711745A CN110711745A CN201810761711.9A CN201810761711A CN110711745A CN 110711745 A CN110711745 A CN 110711745A CN 201810761711 A CN201810761711 A CN 201810761711A CN 110711745 A CN110711745 A CN 110711745A
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- ultrasonic
- multiphase flow
- gas
- cleaned
- cleaning process
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B3/00—Methods or apparatus specially adapted for transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses an ultrasonic cleaning process, which comprises the following steps: 1) preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape; 2) starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the cleaned object; adjusting the initial frequency of the ultrasonic wave to
Description
Technical Field
The invention belongs to the technical field of ultrasonic cleaning, and particularly relates to an ultrasonic cleaning process.
Background
Ultrasonic waves are a form of propagation of mechanical vibrational energy. The cavitation action, acceleration action and direct current action of ultrasonic waves in liquid are utilized to directly and indirectly act on the liquid and dirt, so that the dirt layer can be dispersed, emulsified and stripped to achieve the aim of cleaning. At present, ultrasonic cleaning is widely applied to various industrial and civil fields, including the surface spraying treatment industry, the mechanical industry, the electronic industry, the medical industry, the semiconductor industry, the clock and jewelry industry, the optical industry and the textile printing and dyeing industry.
When ultrasonic waves are used for cleaning, the ultrasonic generator generates high-frequency ultrasonic waves, and impact force and friction force are generated in the ultrasonic vibration propagation process, so that stains on an object are removed. In order to improve the cleaning effect of ultrasonic waves, chinese patent No. CN 200510108823.7 discloses an ultrasonic cleaning system and method, which includes an ultrasonic cleaner and a bubble generator, wherein the bubble generator can generate micro-emulsion water containing a plurality of micro-nano bubbles, and the micro-emulsion water containing micro-nano bubbles is used to enhance the cleaning effect of ultrasonic waves and remove the corners of the object to be cleaned which are not easy to clean.
Although the ultrasonic wave is convenient to use and has good cleaning effect, the ultrasonic wave can generate a force on the surface and the inside of the material to be cleaned
Definite corrosion or damage. In particular, in the case of precision parts or fragile materials, if they are corroded or damaged during cleaning, their usability is greatly reduced.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention provides an ultrasonic cleaning process.
In order to solve the technical problems, the invention adopts the technical scheme that:
an ultrasonic cleaning process comprises the following steps:
1) preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape;
2) starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the cleaned object; regulating super
Initial frequency of sound wave is
So that the multiphase flow can flow on the surface of the object to be cleanedForming an ultrasonic wave-blocking layer of which 0.2<k<0.4, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase.
Preferably, the ultrasonic generator comprises a second harmonic feedback circuit.
Preferably, the multiphase flow has a gas fraction of less than 15% and the gas microbubbles have an average radius of from 5 to 100 microns.
Preferably, the gas microbubbles have an average radius of 30 microns.
Preferably, the dispersed phase in the multiphase flow further comprises solid particles.
Preferably, the multiphase stream comprises a surfactant.
Preferably, the average residence time of each particle in the multiphase flow in the ultrasonic wave emitting area is less than 20 milliseconds.
Compared with the prior art, the invention has the beneficial effects that: the invention distributes multiphase flow on the surface of the object to be cleaned at a certain flow rate, then starts the ultrasonic generator to emit ultrasonic waves, so that the multiphase flow can be carried out on the object to be cleaned in an ultrasonic wave radiation area, after the multiphase flow enters the ultrasonic wave radiation area, a part of bubbles in the multiphase flow are broken or disappeared, and a part of bubbles are increased in diameter. When the average diameter distribution of bubbles is continuously close to a resonance region, an ultrasonic wave blocking layer with higher impedance is formed in multiphase flow, the ultrasonic wave blocking layer can absorb, scatter and reflect ultrasonic waves in a large percentage to prevent the ultrasonic energy from being transmitted continuously, only a small part of the ultrasonic energy can directly penetrate through the ultrasonic wave blocking layer and reach the surface of an object to be cleaned, and less ultrasonic waves enter the inside of the object to be cleaned through the surface of the object to be cleaned. Therefore, the ultrasonic cleaning method can avoid direct damage or corrosion of the surface and the interior of the object to be cleaned caused by ultrasonic radiation. In addition, in the ultrasonic wave retardation layer, most of the energy of the ultrasonic wave is transferred to the strong nonlinear vibration of the interface of the gas dispersion phase and the continuous phase, thereby enhancing the cleaning effect on the surface of the object.
Drawings
Fig. 1 is a schematic structural diagram of an embodiment of an ultrasonic cleaning process in the present invention.
Detailed Description
So that those skilled in the art can better understand the technical solution of the present invention, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
An ultrasonic cleaning process comprises the following steps:
preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned at a certain flow rate; wherein the multiphase flow comprises
The continuous phase is liquid, at least one phase in the dispersed phase is gas, and the gas is initially in a microbubble shape;
starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the surface to be cleaned; regulating
The frequency of the ultrasonic wave is
So that the multiphase flow forms an ultrasonic wave retardation layer with higher impedance on the surface of the object to be cleaned, wherein the impedance is 0.2<k<0.4, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase. The ultrasonic wave emitted by the ultrasonic generator must propagate in the multiphase flow for a certain distance to be fully radiated to the gas microbubbles in the multiphase flow and form a retardation layer. In order to ensure the tissue layer formation effect, the propagation direction of the ultrasonic wave is consistent with the flow direction of the multiphase flow.
The ultrasonic generator comprises a second harmonic feedback circuit, and the ultrasonic generator can adjust the frequency, power and duty ratio of the ultrasonic in real time according to a second harmonic feedback signal. Initial average diameter of microbubbles and initial hydrostatic pressure of fluid
Changes or deviations occur along with external factors, further influence the formation of an ultrasonic wave retardation layer, and a second harmonic feedback signal can reflect
The position and the shape of the ultrasonic wave retardation layer are maintained by the change of the frequency, the power and the duty ratio of the ultrasonic wave during cleaning
The sound wave retardation layer is close to the surface of the object, so that a better cleaning effect is achieved.
The gas fraction of the multiphase flow is less than 15%, the gas microbubbles have an average radius of from 5 to 100 microns, preferably,
the average radius of the gas microbubbles was 30 microns. Under the action of ultrasonic waves with proper frequency and intensity, the average radius of the gas microbubbles is continuously increased along with the flowing process, when the gas microbubbles reach the surface of an object, the radius distribution of the microbubbles reaches an acoustic resonance region, so that the acoustic impedance of two-phase or multi-phase flow near the surface is obviously increased, and an ultrasonic wave blocking layer with good ultrasonic wave absorption is formed. Compared with other dispersion modes of gas dispersion phases, the controllability of the micro-bubble gas is higher, and the formed ultrasonic wave retardation layer is more stable.
To enhance the cleaning effect, a surfactant may be included in the multiphase flow. Ultrasonic treatment of particles in said multiphase flow
The mean dwell time of the wave launch area is less than 20 milliseconds. The gas content of the cross section of the multiphase flow decreases from inside to outside, and the flow rate of the cross section of the multiphase flow decreases from inside to outside.
Fig. 1 is a schematic structural diagram of an embodiment of the present invention, in which cleaning is performed in an open environment, a cleaning medium is a gas-liquid-solid three-phase flow, a gas phase is air, a liquid phase is water, and a solid phase is activated carbon powder with a particle size of 20 to 40 micrometers. In the three-phase flow, the solid particles can serve as cavitation nuclei, so that the cavitation is easier to generate; the solid particles can wash the surface of the cleaned object, so that the cleaning effect is enhanced; the solid component can affect the ultrasonic impedance distribution in the three-phase flow and contribute to the stabilization of the ultrasonic retardation layer.
The embodiment discloses a device designed for implementing an ultrasonic cleaning method, which comprises a micro-nano bubble pump 1, a liquid storage tank 2, an ejector 3 and an ultrasonic generator 4, wherein the micro-nano bubble pump 1 and the liquid storage tank 2 are respectively connected to two inlets of the ejector 3. An active carbon suspension is arranged in the liquid storage tank 2, and micro bubbles with 5% gas content are generated by using a micro-nano bubble pump 1
The mixed liquid is mixed with the activated carbon suspension liquid by the ejector 3 and then flows out together, and the gas-liquid-solid three-phase flow is obtained. An ultrasonic transducer 41 is arranged in the inner side of the outlet of the gas-liquid-solid three-phase flow, and a soft enclosure is arranged on the outer side of the outlet. The ultrasonic probe 42 is located on the soft enclosure and can collect the scattered back second harmonic signals. The ultrasonic transducer 41 and the ultrasonic probe 42 are both connected to an ultrasonic generator 4 with a signal processing circuit, and the frequency of the ultrasonic generator 4 is 50 KHZ. The position and the shape of the ultrasonic wave blocking layer 5 can be calculated by the second harmonic feedback signal during cleaning, the power and the duty ratio of ultrasonic waves are adjusted accordingly, the ultrasonic wave blocking layer 5 is kept close to the surface of the cleaned object 6, and a good cleaning effect is achieved.
In the application process of the ultrasonic cleaning method, the bubbles in the two-phase flow or the three-phase flow reach the object to be cleaned
Before the surface, a part is broken or disappeared, a part is merged and a part is increased in diameter due to the continuous action of the ultrasonic radiation. After the two-phase flow or the three-phase flow enters the ultrasonic wave radiation area, the impedance of the two-phase flow or the three-phase flow to the ultrasonic wave is increased along with time because the average diameter distribution of the bubbles is continuously close to the resonance interval. When the impedance of the two-phase flow or the three-phase flow to the ultrasonic wave is increased to a certain range, a large percentage of absorption, scattering and reflection can be caused to the ultrasonic wave, and the ultrasonic energy is prevented from being transmitted continuously, wherein the ultrasonic wave blocking layer is an area with suddenly increased impedance. Only a small part of ultrasonic energy can directly penetrate through the ultrasonic wave blocking layer and reach the surface of the cleaned object, and less ultrasonic waves enter the cleaned object through the surface of the cleaned object. Therefore, the ultrasonic cleaning method can avoid direct damage to the surface and the interior of the object to be cleaned caused by ultrasonic radiation. From the indirect damage of the surface of the object to be cleaned, in the ultrasonic wave retardation layer, the number of the microbubbles under stable cavitation is much larger than that of the microbubbles under transient cavitation, namely, the ultrasonic energy ratio of the microbubbles collapsing and generating surface destruction is reduced, and the indirect damage caused by the ultrasonic energy ratio is also reduced.
The above embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and the scope of the present invention is defined by the claims. Various modifications and equivalents may be made by those skilled in the art within the spirit and scope of the present invention, and such modifications and equivalents should also be considered as falling within the scope of the present invention.
Claims (7)
1. An ultrasonic cleaning process is characterized by comprising the following steps:
1) preparing multiphase flow, and distributing the multiphase flow on the surface of an object to be cleaned; the multiphase flow comprises a continuous phase and a dispersed phase, wherein the continuous phase is liquid, the dispersed phase comprises gas, and the gas in the multiphase flow is initially in a micro-bubble shape;
2) starting an ultrasonic generator to emit ultrasonic waves, wherein the ultrasonic waves are transmitted in the multiphase flow and then reach the cleaned object; regulating super
Initial frequency of sound wave is
So that the multiphase flow forms an ultrasonic wave retardation layer on the surface of the object to be cleaned, wherein 0.2 percent of the ultrasonic wave retardation layer<k<0.4, P is the initial static pressure in the multiphase flow, R is the initial mean radius of the gas microbubbles, and ρ is the density of the continuous phase.
2. An ultrasonic cleaning process according to claim 1 wherein the ultrasonic generator comprises a second harmonic feedback circuit.
3. An ultrasonic cleaning process according to claim 1, wherein the multiphase flow has a gas fraction of less than 15% and gas microbubbles have an average radius of 5 to 100 microns.
4. An ultrasonic cleaning process according to claim 1, wherein the gas microbubbles have an average radius of 30 microns.
5. The ultrasonic cleaning process of claim 1, wherein the dispersed phase in the multiphase flow further comprises solid particles.
6. The ultrasonic cleaning process of claim 1, wherein the multiphase flow comprises a surfactant.
7. An ultrasonic cleaning process according to claim 1, wherein the mean residence time of particles in the multiphase flow in the ultrasonic emission zone is less than 20 milliseconds.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810761711.9A CN110711745A (en) | 2018-07-12 | 2018-07-12 | Ultrasonic cleaning process |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810761711.9A CN110711745A (en) | 2018-07-12 | 2018-07-12 | Ultrasonic cleaning process |
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| CN110711745A true CN110711745A (en) | 2020-01-21 |
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| US20070235064A9 (en) * | 2004-12-24 | 2007-10-11 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and method |
| CN101226874A (en) * | 2006-12-27 | 2008-07-23 | 硅电子股份公司 | Cleaning liquid and cleaning method for electronic material |
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| CN103567181A (en) * | 2012-08-08 | 2014-02-12 | 华仕德科技股份有限公司 | Washing device and system thereof |
| CN206199794U (en) * | 2016-11-17 | 2017-05-31 | 福州德森精工有限公司 | A kind of air bubble ultrasound wave cleaning machine |
| CN108160601A (en) * | 2017-12-13 | 2018-06-15 | 厦门建霖健康家居股份有限公司 | A kind of method for suppersonic cleaning |
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Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1976765A (en) * | 2004-06-29 | 2007-06-06 | 株式会社鹿儿岛超音波综合研究所 | Ultrasonic cleaning method and apparatus |
| US20070235064A9 (en) * | 2004-12-24 | 2007-10-11 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and method |
| CN1939609A (en) * | 2005-09-30 | 2007-04-04 | 台达电子工业股份有限公司 | Ultrasonic cleansing system and method |
| CN101226874A (en) * | 2006-12-27 | 2008-07-23 | 硅电子股份公司 | Cleaning liquid and cleaning method for electronic material |
| KR20100030382A (en) * | 2008-09-10 | 2010-03-18 | 씨엠아이 주식회사 | Device for generating micro bubble |
| US20110155169A1 (en) * | 2009-12-31 | 2011-06-30 | Lam Research Ag | Ultrasonic cleaning fluid, method and apparatus |
| CN103567181A (en) * | 2012-08-08 | 2014-02-12 | 华仕德科技股份有限公司 | Washing device and system thereof |
| CN206199794U (en) * | 2016-11-17 | 2017-05-31 | 福州德森精工有限公司 | A kind of air bubble ultrasound wave cleaning machine |
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| CN108166211A (en) * | 2018-01-05 | 2018-06-15 | 徐亦隽 | A kind of industrial foam washing methods and system and device |
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