CN108091607A - A kind of self-cleaning silicon wafer turnover mechanism - Google Patents
A kind of self-cleaning silicon wafer turnover mechanism Download PDFInfo
- Publication number
- CN108091607A CN108091607A CN201810021316.7A CN201810021316A CN108091607A CN 108091607 A CN108091607 A CN 108091607A CN 201810021316 A CN201810021316 A CN 201810021316A CN 108091607 A CN108091607 A CN 108091607A
- Authority
- CN
- China
- Prior art keywords
- self
- cylinder
- sliding panel
- gear
- clamping jaw
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 46
- 230000007246 mechanism Effects 0.000 title claims abstract description 39
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 34
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 34
- 239000010703 silicon Substances 0.000 title claims abstract description 34
- 230000007306 turnover Effects 0.000 title claims abstract description 19
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000000428 dust Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Abstract
The invention discloses a kind of self-cleaning silicon wafer turnover mechanisms, including pedestal, fixed seat, cylinder, sliding panel, bearing, servomotor, first gear, shaft, second gear, rebound, clamping jaw cylinder, self-cleaning mechanism, cylinder can promote the bearing being connected with sliding panel to move forward, when sliding panel triggering first is close to switch, compressed air is pumped into current divider box through air inlet pipe, compressed air is blown out through tap hole, two pieces self-cleaning mechanism mutually cleans the dust on backing plate, then, clamping jaw cylinder drives two self-cleaning mechanisms to close up, so as to by silicon wafer clamping, then, cylinder resets, after sliding panel triggering second is close to switch, servomotor drives shaft to rotate 180 ° by first gear, so as to which the clamping jaw cylinder for being clamped with silicon chip be driven to overturn 180 °.The apparatus structure is simple, can be to silicon chip automatic turning, and first automatic cleaning clamps the backing plate of silicon chip during overturning, prevents the secondary pollution not generated totally due to backing plate.
Description
Technical field
The present invention relates to a kind of mechanical device more particularly to a kind of self-cleaning silicon wafer turnover mechanisms.
Background technology
Silicon chip must be through strictly cleaning in semiconductor devices production, and micropollution also results in component failure, the purpose of cleaning
It is to remove surface contamination impurity, removing the method for pollution has physical cleaning and chemical cleaning, and physical cleaning is mainly using brush
The method washed or cleaned removes impurities on surface of silicon chip, in actual production process, when being cleaned to silicon chip, generally require by
180 ° of silicon wafer turnover, existing method is using manually overturning, and not only efficiency is low, but also it is possible that generates secondary pollution.In view of
Disadvantages described above, it is really necessary to design a kind of self-cleaning silicon wafer turnover mechanism.
The content of the invention
The technical problems to be solved by the invention are：A kind of self-cleaning silicon wafer turnover mechanism is provided, to solve manually
Overturning silicon chip, not only efficiency is low but also it is possible that leads to the problem of secondary pollution.
In order to solve the above technical problems, the technical scheme is that：A kind of self-cleaning silicon wafer turnover mechanism, the bottom of including
Seat, fixed seat, cylinder, sliding panel, bearing, servomotor, first gear, shaft, second gear, rebound, clamping jaw cylinder, from
Wiper mechanism, the fixed seating is on the left of pedestal upper end, and the fixed seat is connected with pedestal by bolt, the gas
Cylinder is located on the left of fixed seat, and the cylinder is connected with fixed seat by bolt, and the sliding panel is located on the left of pedestal upper end
And on the right side of cylinder, the sliding panel is connected with cylinder screw thread, and the bearing is located at the top of sliding panel, the bearing
It is connected with sliding panel by bolt, the servomotor is located on the left of bearing upper end, and the servomotor passes through with bearing
Bolt is connected, and the first gear is located on the right side of servomotor, and the first gear is connected with servomotor key, described
Shaft runs through bearing, and the shaft is rotatedly connected with bearing, and the second gear is located at first gear lower end and by shaft
Running through, the second gear is engaged with first gear to be connected and is connected with shaft key, and the rebound is located on the right side of shaft,
The rebound is connected with shaft thread, and the clamping jaw cylinder is located on the outside of rebound, the clamping jaw cylinder and transition
Plate screw thread is connected, and the self-cleaning mechanism quantity is 2, and the clamping jaw with clamping jaw cylinder is connected respectively.
Further improvement of the invention is as follows：
Further, the pedestal is additionally provided with guide rail, and the guide rail is located at pedestal upper end, the guide rail and pedestal
It is connected by bolt.
Further, the pedestal is additionally provided with locating piece, and the locating piece is located on the right side of pedestal upper end, and described determines
Position block is connected with pedestal by bolt.
Further, the locating piece is additionally provided with first close to switch, and the described first close switch runs through locating piece,
Described first is connected close to switch with locating piece screw thread.
Further, the fixed seat is additionally provided with second close to switch, and the described second close switch runs through fixed seat,
Described second is connected close to switch with fixed seat screw thread.
Further, the sliding panel is additionally provided with sliding block, and the sliding block is located at sliding panel bottom and is run through by guide rail,
The sliding block is connected with sliding panel by bolt, and the sliding block can horizontally slip along guide rail.
Further, the self-cleaning mechanism further includes connecting plate, the current divider box equipped with several tap holes, backing plate, institute
The clamping jaw of the connecting plate stated and clamping jaw cylinder is connected, and the current divider box is located at connecting plate lower end, the current divider box and connection
Plate is connected by bolt, and the backing plate is located at current divider box lower end, and the backing plate is Nian Jie with current divider box to be connected, the shunting
Hole is located at current divider box lower end.
Further, the current divider box is additionally provided with air inlet pipe, and the air inlet pipe is located at current divider box upper end, it is described into
Tracheae is connected with current divider box screw thread.
Compared with prior art, self-cleaning silicon wafer turnover mechanism, before cylinder can promote the bearing being connected with sliding panel
Move, first close to switch for set overturning start station, i.e., when sliding panel triggering first close to switch when, through air inlet pipe to point
Compressed air is pumped into stream case, compressed air is blown out through tap hole, is mounted on due to self-cleaning mechanism on the clamping jaw of clamping jaw cylinder
, and clamping jaw is arranged symmetrically, therefore, self-cleaning mechanism is also to be arranged symmetrically, and when compressed air is after tap hole is blown out, two pieces is certainly
Wiper mechanism mutually cleans the dust on backing plate, and then, clamping jaw cylinder drives two self-cleaning mechanisms to close up, so as to by wafer chuck
Tightly, then, cylinder resets, and after sliding panel triggering second is close to switch, servomotor is driven and the second tooth by first gear
The connected shaft of wheel rotates 180 °, so as to which the clamping jaw cylinder for being clamped with silicon chip be driven to overturn 180 °.The apparatus structure is simple, can be right
Silicon chip automatic turning, and the first backing plate of automatic cleaning clamping silicon chip when overturning, prevent due to backing plate do not generate totally it is secondary
Pollution.
Description of the drawings
Fig. 1 shows front view of the present invention
Fig. 2 shows self-cleaning mechanism structure diagram of the present invention
In figure：Pedestal 1, fixed seat 2, cylinder 3, sliding panel 4, bearing 5, servomotor 6, first gear 7, shaft 8, second
The close switch 103, second of gear 9, rebound 10, clamping jaw cylinder 11, self-cleaning mechanism 12, guide rail 101, locating piece 102, first
Close to switch 201, sliding block 401, connecting plate 1201, current divider box 1202, backing plate 1203, tap hole 1204, air inlet pipe 1205.
Specific embodiment
As shown in Figure 1 and Figure 2, a kind of self-cleaning silicon wafer turnover mechanism, including pedestal 1, fixed seat 2, cylinder 3, sliding panel
4th, bearing 5, servomotor 6, first gear 7, shaft 8, second gear 9, rebound 10, clamping jaw cylinder 11, self-cleaning mechanism 12,
The fixed seat 2 is located on the left of 1 upper end of pedestal, and the fixed seat 2 is connected with pedestal 1 by bolt, 3, the cylinder
In 2 left side of fixed seat, the cylinder 3 is connected with fixed seat 2 by bolt, and the sliding panel 4 is located on the left of 1 upper end of pedestal
And positioned at 3 right side of cylinder, the sliding panel 4 is connected with 3 screw thread of cylinder, and the bearing 5 is located at 4 top of sliding panel, described
Bearing 5 be connected with sliding panel 4 by bolt, the servomotor 6 is located on the left of 5 upper end of bearing, the servomotor 6
It is connected with bearing 5 by bolt, the first gear 7 is located at 6 right side of servomotor, the first gear 7 and servo electricity
6 key of machine is connected, and the shaft 8 runs through bearing 5, and the shaft 8 is rotatedly connected with bearing 5, and the second gear 9 is located at
7 lower end of first gear and being run through by shaft 8, the second gear 9 is engaged with first gear 7 to be connected and is connected with 8 key of shaft,
The rebound 10 is located at 8 right side of shaft, and the rebound 10 is connected with 8 screw thread of shaft, 11, the clamping jaw cylinder
In 10 outside of rebound, the clamping jaw cylinder 11 is connected with 10 screw thread of rebound, and 12 quantity of self-cleaning mechanism is 2
Part, respectively the clamping jaw with clamping jaw cylinder 1 be connected, the pedestal 1 is additionally provided with guide rail 101, and the guide rail 101 is located at pedestal 1
Upper end, the guide rail 101 are connected with pedestal 1 by bolt, and the pedestal 1 is additionally provided with locating piece 102, the locating piece
102 are located on the right side of 1 upper end of pedestal, and the locating piece 102 is connected with pedestal 1 by bolt, and the locating piece 102 is additionally provided with
First close switch 103, described first runs through locating piece 102 close to switching 103, and the described first close switch 103 is with determining
Position 102 screw thread of block is connected, and the fixed seat also 2 is equipped with second close to opening 201, and the described second close switch 201 is through solid
Reservation 2, described second is connected close to switch 201 with 2 screw thread of fixed seat, and the sliding panel 4 is additionally provided with sliding block 401, described
Sliding block 401 be located at 4 bottom of sliding panel and run through by guide rail 101, the sliding block 401 is connected with sliding panel 4 by bolt, institute
The sliding block 401 stated can horizontally slip along guide rail 101, and the self-cleaning mechanism 12 further includes connecting plate 1201, equipped with several
Current divider box 1202, the backing plate 1203 of tap hole, the connecting plate 1201 and the clamping jaw of clamping jaw cylinder 11 are connected, the shunting
Case 1202 is located at 1201 lower end of connecting plate, and the current divider box 1202 is connected with connecting plate 1201 by bolt, the backing plate
1203 are located at 1202 lower end of current divider box, and the backing plate 1203 is Nian Jie with current divider box 1202 to be connected, the tap hole 1204
In 1202 lower end of current divider box, the current divider box 1202 is additionally provided with air inlet pipe 1205, and the air inlet pipe 1205 is located at current divider box
1202 upper ends, the air inlet pipe 1205 are connected with 1202 screw thread of current divider box, the self-cleaning silicon wafer turnover mechanism, 3 energy of cylinder
The bearing 5 being connected with sliding panel 4 is promoted to move forward, first starts station close to switch 103 for setting overturning, i.e., when sliding panel 4
When triggering first is close to switch 103, compressed air is pumped into current divider box 1202 through air inlet pipe 1205, compressed air is through tap hole
1204 blowouts, are mounted on due to self-cleaning mechanism 12 on the clamping jaw of clamping jaw cylinder 11, and clamping jaw is arranged symmetrically, therefore, from clearly
Washing machine structure 12 be also be arranged symmetrically, when compressed air through tap hole 1204 blowout after, 12 mutual cleaning pad of two pieces self-cleaning mechanism
Dust on plate 1203, then, clamping jaw cylinder 11 drive two self-cleaning mechanisms 12 to close up, so as to by silicon wafer clamping, then, cylinder
3 reset, and after the triggering of sliding panel 4 second is close to switch 201, servomotor 6 is driven solid with second gear 9 by first gear 7
Shaft 8 even rotates 180 °, so as to which the clamping jaw cylinder 11 for being clamped with silicon chip be driven to overturn 180 °.The apparatus structure is simple, can be right
Silicon chip automatic turning, and the first backing plate 1203 of automatic cleaning clamping silicon chip during overturning, prevent from not producing totally due to backing plate 1203
Raw secondary pollution.
The present invention is not limited to above-mentioned specific embodiment, those of ordinary skill in the art from above-mentioned design,
Without performing creative labour, a variety of conversion made are within the scope of the present invention.
Claims (8)
1. a kind of self-cleaning silicon wafer turnover mechanism, it is characterised in that including pedestal, fixed seat, cylinder, sliding panel, bearing, watch
Motor, first gear, shaft, second gear, rebound, clamping jaw cylinder, self-cleaning mechanism are taken, the fixed seating is in pedestal
On the left of upper end, the fixed seat is connected with pedestal by bolt, and the cylinder is located at fixed seat left side, the cylinder and
Fixed seat is connected by bolt, and the sliding panel is located on the left of pedestal upper end and on the right side of cylinder, the sliding panel with
Cylinder screw thread is connected, and the bearing is located at the top of sliding panel, and the bearing is connected with sliding panel by bolt, and described watches
It takes motor to be located on the left of bearing upper end, the servomotor is connected with bearing by bolt, and the first gear, which is located at, to be watched
It takes on the right side of motor, the first gear is connected with servomotor key, and the shaft runs through bearing, the shaft and bearing
It is rotatedly connected, the second gear is located at first gear lower end and is run through by shaft, the second gear and first gear
Engagement is connected and is connected with shaft key, and the rebound is located on the right side of shaft, and the rebound is connected with shaft thread, institute
The clamping jaw cylinder stated is located on the outside of rebound, and the clamping jaw cylinder is connected with rebound screw thread, the self-cleaning mechanism number
It measures as 2, the clamping jaw with clamping jaw cylinder is connected respectively.
2. self-cleaning silicon wafer turnover mechanism as described in claim 1, it is characterised in that the pedestal is additionally provided with guide rail, institute
The guide rail stated is located at pedestal upper end, and the guide rail is connected with pedestal by bolt.
3. self-cleaning silicon wafer turnover mechanism as described in claim 1, it is characterised in that the pedestal is additionally provided with locating piece,
The locating piece is located on the right side of pedestal upper end, and the locating piece is connected with pedestal by bolt.
4. self-cleaning silicon wafer turnover mechanism as claimed in claim 3, it is characterised in that the locating piece is additionally provided with first
Close to switch, described first is connected through locating piece, described first close to switch close to switch with locating piece screw thread.
5. self-cleaning silicon wafer turnover mechanism as described in claim 1, it is characterised in that the fixed seat is additionally provided with second
Close to switch, described second is connected through fixed seat, described second close to switch close to switch with fixed seat screw thread.
6. self-cleaning silicon wafer turnover mechanism as described in claim 1, it is characterised in that the sliding panel is additionally provided with sliding block,
The sliding block is located at sliding panel bottom and is run through by guide rail, and the sliding block is connected with sliding panel by bolt, the cunning
Block can horizontally slip along guide rail.
7. self-cleaning silicon wafer turnover mechanism as described in claim 1, it is characterised in that the self-cleaning mechanism further includes
Connecting plate, the current divider box equipped with several tap holes, backing plate, the clamping jaw of the connecting plate and clamping jaw cylinder are connected, point
Stream case is located at connecting plate lower end, and the current divider box is connected with connecting plate by bolt, and the backing plate is located at current divider box lower end,
The backing plate is Nian Jie with current divider box to be connected, and the tap hole is located at current divider box lower end.
8. self-cleaning silicon wafer turnover mechanism as claimed in claim 7, it is characterised in that the current divider box is additionally provided with air inlet
Pipe, the air inlet pipe are located at current divider box upper end, and the air inlet pipe is connected with current divider box screw thread.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810021316.7A CN108091607B (en) | 2018-01-10 | 2018-01-10 | Self-cleaning type silicon wafer overturning mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810021316.7A CN108091607B (en) | 2018-01-10 | 2018-01-10 | Self-cleaning type silicon wafer overturning mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108091607A true CN108091607A (en) | 2018-05-29 |
| CN108091607B CN108091607B (en) | 2023-11-21 |
Family
ID=62181883
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810021316.7A Active CN108091607B (en) | 2018-01-10 | 2018-01-10 | Self-cleaning type silicon wafer overturning mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108091607B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112893299A (en) * | 2021-03-04 | 2021-06-04 | 陈盛发 | Turnover type cleaning equipment for medical equipment |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN108091607B (en) | 2023-11-21 |
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