CN108088247A - 炉管装置 - Google Patents
炉管装置 Download PDFInfo
- Publication number
- CN108088247A CN108088247A CN201711460077.7A CN201711460077A CN108088247A CN 108088247 A CN108088247 A CN 108088247A CN 201711460077 A CN201711460077 A CN 201711460077A CN 108088247 A CN108088247 A CN 108088247A
- Authority
- CN
- China
- Prior art keywords
- tube chamber
- boiler tube
- pedestal
- wall
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 51
- 238000000034 method Methods 0.000 claims abstract description 37
- 230000008569 process Effects 0.000 claims abstract description 34
- 238000010438 heat treatment Methods 0.000 claims description 24
- 239000005439 thermosphere Substances 0.000 claims description 12
- 238000005485 electric heating Methods 0.000 claims description 6
- 238000009413 insulation Methods 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 77
- 239000007789 gas Substances 0.000 description 39
- 239000010410 layer Substances 0.000 description 34
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 15
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 8
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052895 riebeckite Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Especially adapted for treating semiconductor wafers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/0043—Floors, hearths
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D5/00—Supports, screens, or the like for the charge within the furnace
- F27D5/0037—Supports specially adapted for semi-conductors
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711460077.7A CN108088247B (zh) | 2017-12-28 | 2017-12-28 | 炉管装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711460077.7A CN108088247B (zh) | 2017-12-28 | 2017-12-28 | 炉管装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108088247A true CN108088247A (zh) | 2018-05-29 |
CN108088247B CN108088247B (zh) | 2019-08-13 |
Family
ID=62180496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711460077.7A Active CN108088247B (zh) | 2017-12-28 | 2017-12-28 | 炉管装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108088247B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113584595A (zh) * | 2021-07-28 | 2021-11-02 | 长鑫存储技术有限公司 | 扩散炉 |
US20230031706A1 (en) * | 2021-07-28 | 2023-02-02 | Changxin Memory Technologies, Inc. | Diffusion furnace |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07218154A (ja) * | 1994-02-03 | 1995-08-18 | Ykk Kk | 原料予熱投入装置及び該装置を用いた溶解炉 |
CN1511198A (zh) * | 2002-01-15 | 2004-07-07 | SNECMA����ȼ���ƽ�����˾ | 用于通过化学气相渗透使基底致密化的方法和装置 |
CN102437071A (zh) * | 2010-09-29 | 2012-05-02 | 东京毅力科创株式会社 | 立式热处理装置 |
CN104576330A (zh) * | 2014-05-12 | 2015-04-29 | 上海华虹宏力半导体制造有限公司 | 改善掺杂多晶或非晶硅磷浓度片间均一性的方法和结构 |
CN206758416U (zh) * | 2017-03-28 | 2017-12-15 | 济南兰星电子有限公司 | 一种用于玻璃钝化的载片舟 |
-
2017
- 2017-12-28 CN CN201711460077.7A patent/CN108088247B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07218154A (ja) * | 1994-02-03 | 1995-08-18 | Ykk Kk | 原料予熱投入装置及び該装置を用いた溶解炉 |
CN1511198A (zh) * | 2002-01-15 | 2004-07-07 | SNECMA����ȼ���ƽ�����˾ | 用于通过化学气相渗透使基底致密化的方法和装置 |
CN102437071A (zh) * | 2010-09-29 | 2012-05-02 | 东京毅力科创株式会社 | 立式热处理装置 |
CN104576330A (zh) * | 2014-05-12 | 2015-04-29 | 上海华虹宏力半导体制造有限公司 | 改善掺杂多晶或非晶硅磷浓度片间均一性的方法和结构 |
CN206758416U (zh) * | 2017-03-28 | 2017-12-15 | 济南兰星电子有限公司 | 一种用于玻璃钝化的载片舟 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113584595A (zh) * | 2021-07-28 | 2021-11-02 | 长鑫存储技术有限公司 | 扩散炉 |
WO2023004891A1 (zh) * | 2021-07-28 | 2023-02-02 | 长鑫存储技术有限公司 | 扩散炉 |
US20230031706A1 (en) * | 2021-07-28 | 2023-02-02 | Changxin Memory Technologies, Inc. | Diffusion furnace |
US11862490B2 (en) | 2021-07-28 | 2024-01-02 | Changxin Memory Technologies, Inc. | Diffusion furnace |
Also Published As
Publication number | Publication date |
---|---|
CN108088247B (zh) | 2019-08-13 |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230711 Address after: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee after: Huaian Xide Industrial Design Co.,Ltd. Address before: No. 599, East Changjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: HUAIAN IMAGING DEVICE MANUFACTURER Corp. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230726 Address after: 201100 Room 901-2836, Building 4, No. 2377, Shenkun Road, Minhang District, Shanghai Patentee after: Shanghai Zhaofan Intelligent Technology Co.,Ltd. Address before: 223001 Room 318, Building 6, east of Zhenda Steel Pipe Company, south of Qianjiang Road, Huaiyin District, Huai'an City, Jiangsu Province Patentee before: Huaian Xide Industrial Design Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20231218 Address after: 224045 No. 88 Huangpujiang Road, Yancheng Economic and Technological Development Zone, Yancheng City, Jiangsu Province Patentee after: Jiangsu Xiaoniu automation equipment Co.,Ltd. Address before: 201100 Room 901-2836, Building 4, No. 2377, Shenkun Road, Minhang District, Shanghai Patentee before: Shanghai Zhaofan Intelligent Technology Co.,Ltd. |