CN108066789A - 紫外线消毒设备及其工作方法 - Google Patents

紫外线消毒设备及其工作方法 Download PDF

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CN108066789A
CN108066789A CN201710935452.2A CN201710935452A CN108066789A CN 108066789 A CN108066789 A CN 108066789A CN 201710935452 A CN201710935452 A CN 201710935452A CN 108066789 A CN108066789 A CN 108066789A
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安德烈亚斯·科赫
徐宏斌
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Hite Kang Co Ltd
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Abstract

所提出的是紫外线消毒设备及其工作方法，该紫外线消毒设备具有充水的反应室(1)和至少一个以能照射进所述反应室的方式布置的紫外线辐射源，以及具有紫外线传感器(3)和用于传感器信号的分析单元。所述紫外线消毒设备及其工作方法以很低的技术结构耗费实现高净化效率，所述净化效率对于所有被照射的流量体积来说能被证明为精确的，这通过下述方式实现，即，所述辐射源由多个紫外线发光二极管构成，它们至少布置在所述反应室(1)的一侧并且所述紫外线传感器(3)于同一侧布置在所述多个紫外线发光二极管(2)之间，并且所述反应室(1)的、至少与上述侧对置的内表面构造为用于紫外线光的反射面(4)。

Description

紫外线消毒设备及其工作方法
技术领域
本发明涉及紫外线(UV)消毒设备及其工作方法，所述紫外线消毒设备具有充水的反应室和至少一个以能照射进其中的方式布置的紫外线辐射源以及具有紫外线传感器和用于传感器信号的分析单元。
背景技术
已知这样的装置，在文献US2003/0170151A1中，多个以平面方式布置的LED(发光二极管)延伸到液体流中，其中在外壳的若干区域中布置有多个传感器，所述传感器分别在相应区域中探测实时的状态值并且传递给分析单元。
这种已知系统的缺点在于仅能探测液体的很小一部分体积流，以至于为了获得有说服力的结果，必须在所述装置的长度上布置多个传感器。然而根据已知方式，测量仅在“有代表性的”部位进行，从而肯定无法得到有关实际达到的净化效率的足够正确的结论。
发明内容
本发明的任务在于提供一种紫外线消毒设备及其工作方法，所述紫外线消毒设备及其工作方法以很低的技术结构耗费实现高净化效率，所述净化效率对于所有被照射的流量体积来说被证明为精确的。
为此，提供一种紫外线消毒设备，所述设备包括充水的反应室和至少一个以能照射进所述反应室的方式布置的紫外线辐射源、紫外线传感器和用于传感器信号的分析单元，其中所述辐射源由布置在所述反应室一侧的多个紫外线发光二极管构成，并且所述紫外线传感器于同一侧布置在所述多个紫外线发光二极管之间，并且至少所述反应室的与上述侧对置的内侧构造为紫外线光的反射面，通过上述布置方式实现，紫外线在照射进所述反应室之后直至射入所述紫外线传感器至少横穿所述反应室两次，因为所述紫外线在到达所述反应室底部之后，从那里反射回传感器，由此，测量区域的长度是所述反应室的壳体深度的两倍，并且所述传感器信号在质量上得以改进。
借助于这样的紫外线传感器例如能检测这样的参数，比如所述多个紫外线发光二极管的效率或者如有必要检测其由于老化过程引起的削减，或者检测紫外线光的削弱，所述削弱由于在面向水的一侧形成有薄膜或是由溶解在水中的微粒物质造成。
本发明主题的有利设计方案在下文中介绍。布置在所述紫外线传感器旁边的多个紫外线发光二极管以优选方式布置在支承模块上并且能在其数量和有效功率方面简单匹配于所需的净化和消毒效率，由此，借助于所述装置能覆盖很宽的功率谱，或者此外，通过在挑选支承模块方面的自由选择，能以所述紫外线发光二极管的不同波长工作。
根据本发明的一种尤其优选的实施方式，一个或多个支承模块位于充水的反应室以外，其中所述多个紫外线发光二极管直接放在石英窗上，所述石英窗的、背向于多个发光二极管的一侧形成反应器内壁和所述反应室的上封闭部，从而所述多个紫外线发光二极管不与待消毒的液体接触，但是由于所述石英窗，所述多个紫外线发光二极管的有效功率不会被衰减。此外，由于所述多个发光二极管在运行时在面向水的一侧实际上保持为冷的，因此也不会加热所述石英窗，从而无需担心在石英窗上形成薄膜，所述薄膜形成比如经常出现在将气体放电灯作为紫外线光源工作的反应器中。
本装置的特别优点在于，所述多个紫外线发光二极管如此放置和如此放置和取向，使得在所述反应室中由至少一次反射的紫外线、然而也可由在反应室的侧面上多次反射的紫外线形成均匀的紫外线辐射场，从而所述紫外线传感器可准确得多地探测充斥所述反应室的类似均匀漫射的辐射场，并且能以杰出的准确度识别例如可能发生的紫外线透射的变化，其中所述紫外线传感器以优选方式对准所述均匀的紫外线辐射场的在空间上确定的传感区域，由此，通过所述分析单元，由所探测到的所述传感区域的传感器信号在整个均匀的紫外线辐射场内进行推算，并且由于所述紫外线辐射场的均匀性，所述推算的结果又反映出实际产生的消毒效果的最高精度的映像。
附图说明
接下来借助于附图进一步介绍紫外线消毒设备。其中：
图1示出所述紫外线消毒设备的俯视图，和
图2示出按照图1的紫外线消毒设备的、剖切的侧视图。
具体实施方式
所述紫外线消毒设备基本上包括充水或充液体的反应室1，该反应室被石英窗7盖住，多个紫外线发光二极管(UV-LED)2将它们的紫外线光穿过该石英窗照射进反应室1，其中所述紫外线光在构造为反射面4且与石英窗7对置的面上反射，从而与所述紫外线发光二极管2相邻布置的紫外线传感器3可在所述紫外线光两次穿行反应室1之后探测到所述紫外线光，其中将所探测到的数值传递给未以图示方式示出的分析单元并且由所述分析单元进行处理和分析。
在反应室1中生成均匀的紫外线辐射场8，其中如在图2中粗略绘出地，对此不必假定紫外线光近似平行地往返辐射，因为由于紫外线光也在反应室1的侧向反射面上一次或多次反射，在反应室1中可充斥强烈的漫射，所述漫射仍是尽可能均匀的，从而由被紫外线传感器3检测的传感区域9或者被该紫外线传感器的所探测到的数值在整个反应室1的容积内推算，以便生成针对整个容积的精确数值。同样地，通过所述分析单元可探测紫外线透射的变化，所述变化是由溶解在水中的物质或微粒物质或者例如在石英窗7面向水的一侧形成有薄膜引起的。

Claims (10)

1.紫外线消毒设备，该设备具有充水的反应室(1)和至少一个以能照射进所述反应室的方式布置的紫外线辐射源，以及具有紫外线传感器(3)和用于传感器信号的分析单元，其特征在于，所述辐射源由多个紫外线发光二极管构成，它们至少布置在所述反应室(1)的一侧并且所述紫外线传感器(3)于同一侧布置在所述多个紫外线发光二极管(2)之间，并且至少所述反应室(1)的与上述侧对置的内表面构造为用于紫外线光的反射面(4)。
2.根据权利要求1所述的紫外线消毒设备，其特征在于，所述多个紫外线发光二极管(2)布置在支承模块(5)上并且它们的数量与所需的净化和消毒效率匹配。
3.根据权利要求2所述的紫外线消毒设备，其特征在于，所述支承模块(5)位于被充水的反应室(1)以外，并且所述多个紫外线发光二极管(2)直接放在石英窗(7)上，所述石英窗的背对所述发光二极管(2)的一侧形成反应器内壁(6)和所述反应室(1)的上封闭部。
4.根据权利要求1所述的紫外线消毒设备，其特征在于，所述多个紫外线发光二极管(2)如此放置和取向，使得稳定、均匀的紫外线辐射场(8)照射进所述反应室(1)。
5.根据权利要求4所述的紫外线消毒设备，其特征在于，所述紫外线传感器(3)对准在空间上确定的所述均匀的紫外线辐射场(8)的传感区域(9)。
6.根据权利要求5所述的紫外线消毒设备，其特征在于，通过所述分析单元从所述传感区域(9)的所探测到的传感器信号在整个均匀的紫外线辐射场(8)内进行推算。
7.按照前述权利要求之一所述的紫外线消毒设备的工作方法，其特征在于，多个紫外线发光二极管(2)在反应室(1)内生成稳定的均匀的紫外线辐射场(8)，并且紫外线传感器(3)在空间上限定的传感区域(9)内，检测从所述多个紫外线发光二极管(2)照射进反应室(1)的、至少两次横穿所述反应室(1)后的紫外线光。
8.根据权利要求7所述的工作方法，其特征在于，在所述分析单元内由所述紫外线传感器(3)的传感器信号、对基于在所述传感区域(9)内探测到的数值在整个均匀的紫外线辐射场(8)内进行推算。
9.根据权利要求7或8所述的工作方法，其特征在于，所述分析单元探测可能出现的紫外线透射的变化。
10.根据权利要求9所述的工作方法，其特征在于，所述分析单元探测在所述石英窗(7)面向水的一侧的薄膜形成和/或由于溶解在水中的物质或微粒物质而引起的所述紫外线透射的削弱。
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