CN108027718A

CN108027718A - Method and apparatus during automatic wafer is fixed in the transmission

Info

Publication number: CN108027718A
Application number: CN201680053111.6A
Authority: CN
Inventors: B.殷; J.T.穆拉; V.曾; A.高利克; N.斯派克
Original assignee: Brooks Automation Inc
Current assignee: Borucos automation USA Co.,Ltd.
Priority date: 2015-07-13
Filing date: 2016-07-13
Publication date: 2018-05-11
Anticipated expiration: 2036-07-13
Also published as: EP3341831A1; CN108027718B; CN114758975A; TW202224078A; TW201707900A; TWI752910B

Abstract

A kind of substrate processing apparatus, substrate processing apparatus include：Wafer transfer equipment with transfer arm, transfer arm include end effector；Arm posture certainty feature, arm posture certainty feature form entirety with substrate transport equipment and are provided so that the static detection sensor of substrate processing apparatus detects at least one edge of at least one arm posture certainty feature in the transmission in the case of transfer arm radial motion；And controller, controller is configured such that determining for the comparative example factor is realized in the detection to edge, scale factor identifies at least thermal expansion change of transfer arm in the transmission, and including exercise effect resolver, exercise effect resolver is configured as from the detection to edge in the transmission come scale factor determined by determining the discrete relationship between each different Discrete Changes corresponding with each different connecting rods of transfer arm, so that at least thermal expansion of definite transfer arm changes in the transmission.

Description

Method and apparatus during automatic wafer is fixed in the transmission

Cross reference to related applications

The application is on the July 13rd, 2015 of the U.S. Provisional Patent Application submitted the 62/191,863rd and at 2016 4 The non-provisional application and claimed of U.S. Provisional Patent Application the 62/320th, 142 that the moon is submitted on the 8th, in it is open Appearance is fully incorporated herein by reference.

Background technology

1. technical field

Exemplary embodiment is usually related to substrate processing system, and more specifically to the component to substrate processing system Calibration and synchronization.

2. the brief description of linked development

Base treatment equipment usually can perform multiple operations in substrate.Base treatment equipment generally includes transfer chamber and connection To one or more processing modules of the transfer chamber.Substrate transport manipulator makes substrate be moved between processing module in transfer chamber Dynamic, herein, different operations is performed, such as, sputtering, etching, coating, immersion etc..For example, semiconductor device manufacturer and Production technology used in material manufacturer usually needs substrate being positioned accurately in base treatment equipment.

Being accurately positioned for substrate is usually provided by instructing the position of processing module to substrate transport manipulator.In order to Instruct the position of processing module and in order to accurately place the substrate above at substrate holding position, it must be understood that in substrate The heart.In general, algorithm needs to use base center fixing device during automatically substrate or wafer are fixed, so as to by reference substrate position It is limited to relative at the zero bias heart rate for example for the end effector of the substrate transport mechanisms that keep substrate, wherein, zero bias Heart rate is the position of the base center position consistent with the expection center of end effector.In general, fixing device quilt during substrate is fixed It is manually installed on end effector and is referred to as reference surface so as to which substrate is positioned at restriction as zero bias heart rate Position at.Manual place of fixing device can in fixed relative to substrate for the manual placement of fixing device and substrate during substrate is fixed It can cause operator error and cause to produce particle in base treatment is equipped（For example, pollutant）.Fixed dress during substrate is fixed The use put is also to be performed under air, it means that the environment in base treatment equipment is interfered, thus reduces production Time.

In general, the teaching of substrate transport manipulator includes：By using the special teaching for being added into base treatment equipment Sensor comes the position of inspecting manipuator and/or the substrate by manipulator carrying；Use the instrument carried by substrate transport manipulator Device substrate（E.g., including onboard sensor or video camera）；Using be placed on base treatment equip processing module or The other substrates of person keep the removable fixing device in station；Using in processing module or can be from the wafer of outside access Sensor in fixed；Use the sensor being arranged on outside processing module（For example, video camera）；Or by making the mesh in processing module Mark is contacted with substrate transport manipulator or by the object that substrate transport manipulator carries.For instructing in base treatment equipment These methods of position may need to place a sensor in vacuum, it may be necessary to client's processing equipment and/or instrument into Row change, may be not suitable for being used under vacuum environment or high temperature, it may be necessary to by sensor target, mirror or fixed dress Placement location may destroy the vacuum environment of base treatment equipment in processing equipment, and/or may need to pass embedded substrate The code of the controller of defeated manipulator and/or the controller of processing system carries out software change.

Other conventional arm temperature compensation algorithms（Such as, in U.S.'s pre-grant open source literature the 2013/0180448th and Described in U.S. Patent No. 6556887）Can use in robot end effector or arm/on reference marker So that position of manipulator estimates thermal expansion amount compared with when sensor moves between reference temperature and Current Temperatures.Should Conventional method inherently assumes that the upper arm of robotic manipulator and forearm are under lower state, so that manipulator can be by It is modelled as the linear bar at a constant temperature with certain thermal coefficient of expansion.In general, the limit of conventional arm temperature compensation algorithm System is：Temperature transient is in for executor connecting rod（Such as, temperature rises or cools down）Situation, it cannot be mended exactly Repay site error.Such temperature transient scene represents more real client's service condition, because semiconductor cluster tool can With the processing module and loadlock under substantially different operation temperature.These conventional thermal compensation algorithms do not have generally also Have in view of since it moves link angle position relative to the arm caused by the non-linear sensitivity of end effector position Nonlinear effect.

It is also noted that in conventional embodiment, it is defined as（Wherein, R0 is under reference temperature Arm position, and R1 be by control software calculate new position）The robotic manipulator estimated it is relatively hot swollen It is swollen to be counted as there is linear behavior and for estimating machinery at the placement station location farther away from manipulator centralized positioning Hand transmission location corrects.

It would be advantageous that substrate in automatically fixed in the case of without using surely middle fixing device, not disturb place Reason equipment in environment or be not required additional instruments and/or improve base treatment equipment in the case of realize in processing equipment Interior instruct base treatment position gives substrate transport manipulator.

Brief description of the drawings

The foregoing aspect and further feature of disclosed embodiment are described in the following description with reference to attached drawing, in attached drawing In：

Figure 1A to Fig. 1 D is the schematic diagram of the substrate processing apparatus of the aspect comprising disclosed embodiment；

Fig. 2A to Fig. 2 E is the schematic diagram according to the transfer arm of the aspect of disclosed embodiment；

Fig. 3 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Fig. 4 A are the schematic diagrames according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Fig. 4 B to Fig. 4 F are the schematic diagrames according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Fig. 5 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Fig. 6 is the flow chart according to the aspect of disclosed embodiment；

Fig. 7 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Fig. 8 is the flow chart according to the aspect of disclosed embodiment；

Fig. 9 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 10 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 11 is the flow chart according to the aspect of disclosed embodiment；

Figure 12 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 13 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 14 is the flow chart according to the aspect of disclosed embodiment；

Figure 15 is the diagram according to the aspect of disclosed embodiment with the substrate processing apparatus arm link thermal gradient of time change Example chart；

Figure 16 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 17 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 18 is the example chart for illustrating substrate processing apparatus position compensation data according to the aspect of disclosed embodiment；

Figure 19 is the block diagram calculated according to the position of the aspect of disclosed embodiment；

Figure 20 is the flow chart according to the aspect of disclosed embodiment；

Figure 21 is the flow chart according to the aspect of disclosed embodiment；

Figure 22 is the flow chart according to the aspect of disclosed embodiment；

Figure 23 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 24 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 25 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 26 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 27 be deviated according to the end effector illustrated at different temperatures of the aspect of disclosed embodiment it is exemplary Chart；

Figure 28 is the schematic diagram according to a part for the substrate transport equipment of the aspect of disclosed embodiment；

Figure 29 is the schematic diagram according to a part for the substrate processing apparatus of the aspect of disclosed embodiment；

Figure 30 and Figure 31 is the signal according to the exemplary end effector of the substrate transport equipment of the aspect of disclosed embodiment Figure；And

Figure 32 is the flow chart according to the aspect of disclosed embodiment.

Embodiment

With reference to Figure 1A to Fig. 1 D, it illustrates the substrate processing apparatus or instrument of the aspect including disclosed embodiment Schematic diagram, as being described further herein.Although with reference to the accompanying drawings to disclosed embodiment in terms of be described, should Understand, the aspect of disclosed embodiment can be implemented in many forms.In addition it is possible to use any appropriate size, shape The either element or material of type.

As will be described in more detail, the aspect of disclosed embodiment provides substrate or wafer relative to such as base Transmit the automatic of end effector in bottom（For example, intervened without operator）In fixed, the substrate of substrate processing apparatus keep station from Dynamic positioning and the position for keeping standing by substrate instruct and give substrate transport equipment.It should be noted that term " substrate " and " wafer " It is used interchangeably herein.Equally, as used herein, term " substrate keeps station " is that the substrate in processing module is protected Any other suitable substrate held in station or substrate processing apparatus keeps station, such as, load port（Or it is maintained at Substrate box body thereon）, loadlock, buffered station, etc..The aspect of disclosed embodiment is using employed in substrate processing apparatus Existing weaponry and equipment and device, such as, base treatment sensor.As used herein, base treatment sensor is to be used for realization During automatic wafer is fixed（AWC）Active wafer it is fixed in sensor, during base treatment for substrate alignment and/or it is fixed in Substrate aligner and/or other suitable substrate eccentricities（For example, relative to the intended substrate holding position on end effector Put）Detection unit.In other words, when when teaching is neutralized surely according to the automation for the use of disclosed embodiment, for example, client Additional instruments cost will not be substantially produced after initial purchase/configuration substrate processing apparatus.

The aspect of disclosed embodiment can also be substantially to embedded substrate transport equipment and/or substrate processing apparatus Program code in system controller implement in the case of software change.For example, the aspect of disclosed embodiment can make With the existing order associated with substrate transport equipment, such as, " pickup and placement " order and/or " substrate alignment " order.It is public Operating environment is further included in terms of the embodiment opened, such as, compatible vacuum environment（And atmospheric environment, for example, indifferent gas Body, filtered clean air）, because there is no electronic unit in processing environment（For example, cable, printed circuit board (PCB) etc.）.Such as It can be appreciated that, in atmospheric treatment environment, AWC centers can be located in atmospheric treatment environment.Correspondingly, disclosed implementation The aspect of example provides following content：Exist in the automatic downtime for determining the reduction between mid-term, and/or not destroying substantially The processing environment established in substrate processing apparatus（For example, vacuum or atmospheric environment）In the case of（For example, substrate processing apparatus And its component keeps sealing during automatic teaching is handled or otherwise isolates with external environment condition）To substrate transport equipment Instructed.

As will be described below, the aspect of disclosed embodiment provides following content：Eliminate usually by limiting with zero bias The fixed middle method of conventional automatic wafer or substrate of the reference substrate position of heart rate（For example, use fixed middle fixing device）Caused Error.The aspect of disclosed embodiment usually eliminates the calibration steps being conventionally used to during automatic substrate is determined and fixing device.It is public The mistake for example caused by substrate transport equipment and substrate keep the fuel factor between station is also compensated in terms of the embodiment opened Difference, wherein, the temperature in respective handling module is between about 200 DEG C to about 850 DEG C.In an aspect, accordingly The temperature of processing module is more than about 850 DEG C, and in other aspects, the temperature of respective handling module is then less than about 200 DEG C. The aspect of disclosed embodiment also automatically compensates for the hysteresis effect for example caused by sensor error or delay.

With reference to Figure 1A and Figure 1B, it illustrates the processing equipment of the aspect according to disclosed embodiment, such as, partly leads Body tool post 11090.Although semiconductor tools 11090 are shown in the drawings, disclosed embodiment described herein Aspect can be applied to any tool post or application using robotic manipulator.In this example, instrument 11090 is illustrated For cluster tool, however, can be applied to any suitable tool post in terms of disclosed embodiment, such as, linear work Tool station, such as, the entitled " Linearly for showing in Fig. 1 C and Fig. 1 D and being announced on March 19th, 2013 In the U.S. Patent No. 8,398,355 of Distributed Semiconductor workpiece Processing Tool " The tool post of description, the disclosure of which are fully incorporated herein by reference.Tool post 11090 generally includes atmospheric front end 11000th, vacuum load locks 11010 and vacuum rear end 11020.In other aspects, which can have any suitable Configuration.The component of each in front end 11000, loadlock 11010 and rear end 11020 can be connected to controller 11091, controller 11091 can be any suitable control framework（Such as, cluster architecture controls）A part.Control System can be closed loop controller, which has master controller, cluster control unit and autonomous remote controllers, all Such as, on March 8th, 2011 announce it is entitled " U.S. Patent No. 7 of Scalable Motion Control System ", Those controllers disclosed in 904, No. 182, the disclosure of which are fully incorporated herein by reference.In other aspects In, any suitable controller and/or control system can be used.Controller 11091 include any suitable memory and（It is more It is a）Processor, it includes being used for the non-transitory program code for operating processing equipment described herein, to realize bases During the substrate of reason equipment keeps the automatic substrate at station fixed and/or it is automatically positioned and keeps the position at station to instruct substrate to substrate Transmission equipment, as described in this article.For example, in an aspect, controller 11091 includes embedded substrate positioning command （For example, for determining the eccentricity between substrate and the end effector of substrate transport equipment）.In one embodiment, substrate Positioning command can be embedded pickup/placement order, and pickup/placement order of the insertion makes substrate and substrate be maintained at it On end effector move through or by one or more automatic substrates it is fixed in sensors.Controller is configured to determine that The center of substrate and the reference position of end effector and determine substrate relative to the reference position of end effector bias Rate.In an aspect, controller is configured as receiving transfer arm/machinery with end effector and/or substrate transport equipment The corresponding detection signal of one or more features of hand, and determine the base for example caused by the temperature in processing module The thermal expansion or contraction of bottom transmission equipment or the component of substrate transport equipment.

As can be appreciated, and as described in this article, in an aspect, substrate erect-position in processing module simultaneously And automatic teaching described herein occurs in the processing module, which has vacuum pressure environment wherein. In one side, which is high vacuum, such as, 10^-5Support（Torr）Or below it.In an aspect, retouch herein During that states determines automatically and/or teaching occurs in the component of substrate station, for example, the substrate station component is located in processing safe condition Under（For example, for handling substrate）Processing module in.The processing safe condition for handling substrate is the shape of processing module State, wherein, processing module quilt under the clean conditions for being ready for processing vacuum or air being incorporated into processing module Sealing, or it is the state for being ready for introducing production wafer in processing module.

In an aspect, front end 11000 generally includes load port modules 11005 and microenvironment 11060, such as example Such as, front-end module is equipped（EFEM）.Load port modules 11005 can be tool standard（BOLTS）Box opener/loading of interface Device, the interface meet load port, front opening or bottom opening case/cabin for 300 mm and the SEMI marks of box body Quasi- E15.1, E47.1, E62, E19.5 or E1.9.In other aspects, load port modules can be configured as 200 mm's Wafer either the wafer interface of 450 mm or any other suitable substrate interface, such as, larger or smaller crystalline substance Circle or the flat panel for flat-panel monitor.Although two load port modules 11005 are shown in figure ia, at it In its aspect, any appropriate number of load port modules can be incorporated into front end 11000.Load port modules 11005 Reception is can be configured as to guide vehicle, rail guided vehicles from overhead transmission system, automatic guided vehicle, people or come From the substrate carrier or box body 11050 of any other suitable transmission method.Load port modules 11005 can pass through load Docked with microenvironment 11060 port 11040.In an aspect, load port 11040 allows substrate in substrate box body 11050 Pass through between microenvironment 11060.

In an aspect, microenvironment 11060 generally includes any suitable transfer robot arm 11013, transfer robot arm 11013 include the one or more aspects of disclosed embodiment described herein.In an aspect, manipulator 11013 can To be track installation manipulator, such as, in United States Patent (USP) 6, the manipulator of the track installation described in 002,840, it is public Open content to be fully incorporated herein by reference, or in other aspects, it there can be any suitable configurations Any other suitable transmission manipulator.Microenvironment 11060 can provide between multiple load port modules to be turned for substrate The controlled cleaning region moved.

Vacuum load locks 11010 between microenvironment 11060 and rear end 11020 and can be connected to microenvironment 11060 and rear end 11020.Again it should be noted that ought as used herein, term " vacuum " can represent high vacuum, such as, 10^-5Support or its below, substrate under the vacuum be processed.Loadlock 11010 generally includes atmospheric groove valve and vacuum tank valve.These Groove valve can be provided and is environmentally isolated, and be environmentally isolated for emptying loadlock after substrate is loaded from atmospheric front end, and be used for Make lock and inert gas（Such as, nitrogen）The vacuum in transfer chamber is maintained during ventilation.In an aspect, loadlock 11010 Including aligner 11011 for make the datum mark of substrate with for handle desired locations be aligned.In other aspects, vacuum Loadlock can be located in any suitable position of processing equipment and have any suitable configuration and/or Measuring equipment.

Vacuum rear end 11020 generally includes transfer chamber 11025, one or more treating stations or module 11030, Yi Jiren What suitable transfer robot arm or equipment 11014.Transfer robot arm 11014 will be described below and can be located at transmission To transmit substrate between loadlock 11010 and various treating stations 11030 in room 11025.Treating stations 11030 can be by each Kind deposition, etching or other types of processing to operate in substrate so as to formation circuit or other expectations in substrate Structure.Typical processing includes but not limited to handle using the film of vacuum, such as, at plasma etching or other etchings Reason, chemical vapor deposition（CVD）, plasma-based vapour deposition（PVD）, implantation（Such as, it is ion implanted）, measurement, rapid thermal treatment （RTP）, dry type stripped atom layer deposition（ALD）, oxidation/diffusion, the formation of nitride, vacuum lithography, epitaxy art（EPI）、 Wire bonder and the other films processing for evaporating or using vacuum pressure.Treating stations 11030 are connected to transfer chamber 11025 To allow substrate being transferred to treating stations 11030 from transfer chamber 11025, and vice versa.In an aspect, load end Mouth mold block 11005 and load port 11040 are essentially directly attached to vacuum rear end 11020, so that being installed on load port On box body 11050 it is generally direct（For example, in an aspect, at least omit microenvironment 11060；And in other aspects, Vacuum load locks 11010 are also omitted, so that box body 11050 is evacuated in the way of similar to vacuum load locks 11010 To vacuum）Docked with the vacuum environment of transfer chamber 11025 and/or the processing vacuum for the treatment of stations 11030（For example, processing vacuum and/ Or vacuum environment extends between treating stations 11030 and box body 11050 and is shared by it）.

Referring now to Fig. 1 C, it illustrates the schematic plan view of linear substrate processing system 2010, wherein, instrument docking The installation of section 2012 is to transmission room module 3018 so that docking section 2012 generally faces（For example, inwardly）Transfer chamber 3018 longitudinal axis X but from its offset.Transmit room module 3018 can by by other transmission room module 3018A, 3018I, 3018J is attached to interface 2050,2060,2070 and is upwardly extended in any suitable side, such as in U.S. Patent No. 8,398,355 Described in number, it is incorporated herein by reference before.Each transmission room module 3018,3019A, 3018I, 3018J Including any suitable substrate transport mechanisms 2080, substrate transport mechanisms 2080 can include open embodiment described herein One or more aspects, for transmitting substrate in whole processing system 2010 and substrate is passed in and out and is left and for example locate Manage module PM（In an aspect, it is substantially similar to process described above station 11030）.As can be appreciated, often A room module can keep isolate or controlled environment（For example, N2, clean air, vacuum）.

With reference to Fig. 1 D, it illustrates the diagrammatic isometric view of exemplary process instrument 410, such as, can be passed along linear The longitudinal axis X interceptions of defeated room 416.In in terms of the disclosed embodiment shown in Fig. 1 D, instrument docking section 12 can be with Typically it is connected to transfer chamber 416.In this aspect, docking section 12 can limit one end of tool transport room 416.Such as exist See in Fig. 1 D, transfer chamber 416 there can be another workpiece inlet/outlet station 412, for example, opposite with Docking station 12 End.In other aspects, can set for from other inlet/outlet stations of transfer chamber insertion/removal workpiece.At one In aspect, docking section 12 and inlet/outlet station 412 can allow workpiece is loaded and unloaded from instrument.In other aspects, Workpiece can be loaded into instrument from one end and be removed it from the other end.In an aspect, transfer chamber 416 can have There are one or more transfer room module 18B and 18i.Each room module can keep isolate or controlled environment（For example, N2, clean air, vacuum）.As previously noted, transmission room module 18B and 18i, the load lock module 56A shown in Fig. 1 D Configuration/setting with 56 and workpiece station is merely exemplary, and in other aspects, transfer chamber can have according to More or less modules that the mode that any desired module is set is set.In shown in terms of, it 412 can be load to stand Lock.In other aspects, load lock module can be located at end inlet/outlet station（Similar to station 412）Between, or adjacent Transmit room module（Similar to module 18i）It can be configured as and operated as loadlock.

Same as previously noted, transfer chamber 18B and 18i have the one or more corresponding transmission equipments being located therein 26B and 26i, it can include the one or more aspects of disclosed embodiment described herein.Corresponding transmission room module 18B It can cooperate with the transmission equipment 26B and 26i of 18i to provide the work-piece transmission system of linear distribution in transfer chamber.At this In aspect, transmission equipment 26B（It can be substantially similar to the transmission equipment of the cluster tool illustrated in Figure 1A and Figure 1B 11013 and 11014）There can be general SCARA arms（Select compliance make-up machinery arm）Configuration（But in other aspects In, transfer arm can have any other desired setting, such as, the linear slide arm 214 that shows in fig. 2b or Other suitable arms with any suitable arm link mechanism）.The suitable examples of arm link mechanism can be in the following literature Find：For example, the U.S. Patent No. 7,578,649 announced on the 25th of August in 2009, the 5th of the announcement on the 18th of August in 1998 the, No. 794,487, on May 24th, 2011 announce No. 7,946,800, on November 26th, 2002 announce No. 6,485,250, No. 8,419,341 and 2011 years announced on 2 22nd, 2011 No. 7,891,935 announced, on April 16th, 2013 Entitled " U.S. Patent Application No. of Dual Arm Robot " 13/293,717 and the September 5 in 2013 submitted November 10 Entitled " the 13/ of Linear Vacuum Robot with Z Motion and Articulated Arm " that day submits 861, No. 693, the disclosure of which is fully incorporated herein by reference.In in terms of the disclosed embodiment, at least one A transfer arm can be derived from the design of conventional SCARA types, it includes upper arm, band driving forearm and belt restraining end and holds Row device, is either designed from telescopic arm or any other suitable arm.The suitable examples of transfer arm can be in following document In find：For example, entitled " the Substrate Transport Apparatus with submitted on May 8th, 2008 The U.S. Patent application of Multiple Movable Arms Utilizing a Mechanical Switch Mechanism " 12/117th, No. 415 and the U.S. Patent No. 7 submitted on January 19th, 2010,648, No. 327, the disclosure of which is by drawing Mode is fully incorporated herein.The operation of transfer arm can be independently from each other（For example, extension/retraction of each arm independently of Each other）, the operation of transfer arm can be carried out by the switch that dallies, or can operationally be carried out in any suitable manner Link is so that arm shares at least one common drive shaft line.In other other side, transfer arm can have any Other desired settings, such as, frog leg arm 216（Such as 2A）Configuration, leapfrog arm 217（Fig. 2 D）Configuration, both sides symmetric arms 218（Figure 2C）Configuration etc..In another aspect, the first articulated jib 219A and the second articulated jib are included at least with reference to Fig. 2 E, transfer arm 219 219B, wherein, each arm 219A and 219B includes end effector 219E, and end effector 219E is configured as at least two Substrate S1 and S2 are abreast maintained in common transfer plane（Share jointly each substrate holding position of end effector 219E Driver is for picking up and place substrate S1 and S2）, wherein, the interval D X between substrate S1 and S2 is kept with substrate side by side Fixed intervals between position are corresponding.The suitable examples of transfer arm can be found in the following literature：On May 15th, 2001 public affairs No. 5,180,276, the announcement on October 15th, 2002 announced in the U.S. Patent No. 6,231,297 of cloth, on January 19th, 1993 No. 6,464,448, on May 1st, 2001 announce No. 6,224,319, nineteen ninety-five September 5 days announce the 5,447,409th Number, the 7th, 578, No. 649 announced on the 25th of August in 2009, the 5th, 794, No. 487 announced on the 18th of August in 1998,2011 years 5 No. 7,946,800, No. 6,485,250 of announcement on November 26th, 2002, on 2 22nd, 2011 announced the moon 24 is announced No. 7,891,935 and the entitled " U.S. Patent application of Dual Arm Robot " submitted on November 10th, 2011 No. 13/293,717 and entitled " the 13/ of Coaxial Drive Vacuum Robot " submitted on October 11st, 2011 270, No. 844, the disclosure of which is fully incorporated herein by reference.In an aspect, the side of disclosed embodiment Face is incorporated into the transfer arm of linear transfer carrier, such as, in U.S. Patent No. 8,293,066 and the 7th, 988, Those described in No. 398, the disclosure of which is fully incorporated herein by reference.

In in terms of the disclosed embodiment shown in Fig. 1 D, the arm of transmission equipment 26B can be configured to provide institute The fast exchange of meaning is set, so as to allow transmitting device rapidly to exchange wafer at pickup/placement location（For example, from substrate Pick up wafer and wafer is placed into identical substrate holding position immediately after in holding position）.Transfer arm 26B can have Any suitable drive section（For example, the drive shaft being coaxially disposed, drive shaft side by side, horizontal neighbouring motor, vertical stacks Folded motor etc.）, for providing any appropriate number of free degree to each arm（It is for example, independent around shoulder and elbow joint Ground rotates and z axis movement）.As seen in Fig. 1 D, in this aspect, module 56A, 56,30i can position with a gap In shift between room module 18B and 18i and suitable processing module can be limited,（It is multiple）Loadlock LL,（It is multiple）Buffering Stand,（It is multiple）Measurement station or（It is multiple）Any other desired station.For example, gap module（Such as, loadlock 56A and 56 And workpiece station 30i）Can have static workpiece supporting item/shelf 56S1,56S2,30S1,30S2, the fixation workpiece branch respectively Support member/shelf 56S1,56S2,30S1,30S2 can be cooperated with transfer arm to realize transmission or to make workpiece along transfer chamber The linear axis X length that passes through transfer chamber.For example, can be incited somebody to action by docking section 12（It is multiple）Workpiece is loaded into transmission In room 416.（It is multiple）Workpiece can be positioned at load lock module 56A's by the transfer arm of docking section（It is multiple）On supporting item. In lock module 56A is loaded, it can be made by the transfer arm 26B in module 18B（It is multiple）Workpiece load lock module 56A with Moved between load lock module 56, and utilize arm 26i（In module 18i）It is set to be loaded according to similar and continuous mode Moved between 56 and workpiece station 30i of lock, and it is moved between station 30i and station 412 using the arm 26i in module 18i.Should Process can be overturned fully or partly to make（It is multiple）Workpiece moves in the opposite direction.Therefore, in one aspect In, workpiece can be made to be moved in any direction along axis X and be moved to any position along transfer chamber, and can be by Load to any desired module connected with transfer chamber（Processing module or other modules）Or from any desired module It is unloaded.In other aspects, can be not provided between room module 18B and 18i with static workpieces supporting item transmitting or The gapization transmission room module of shelf.In these aspects, the transfer arm of adjacent transmission room module can directly by workpiece from End effector or a transfer arm are transferred to the end effector of another transfer arm to make workpiece be moved through transfer chamber. Treating stations module can be operated so as in substrate by various depositions, etching or other types of processing in substrate Form circuit or other desired structures.Treating stations module is connected to transmission room module to allow substrate to be passed from transfer chamber To treating stations, and vice versa.Describe in U.S. Patent No. 8,398,355 and have with the processing equipment described in Fig. 1 D There are the suitable examples of the handling implement of similar general features, it is fully incorporated herein by reference before.

Referring now to Fig. 3, which illustrates the schematic diagram of a part for any suitable handling implement 390.Here, processing work Tool 390 is substantially similar to one or more handling implements as described above.Handling implement 390 can generally include transmission Manipulator 130, at least one static detection sensor（For example, such as, during automatic wafer is fixed（AWC）Sensor 199A and 199B）And Manipulator Controller（In an aspect, it is controller 11091）, for example, above content forms automatic base During bottom is fixed and station teaching equipment 300.Although for example purposes figure 3 illustrates two sensors 199A and 199B, In other aspects, handling implement can have the sensor more or less than two.Fig. 3 also shows handling implement 390 Exemplary processing modules 325.In figure 3, transmission manipulator 330 is entirely and schematically presents, and as alluded to earlier , manipulator 330 can have any desired configuration.Manipulator 330 is shown as keeping substrate S on it, for transmission To processing module 325（Which is substantially similar to treating stations 11030 as described above, PM）.Processing module 325 is protected with substrate Station 315 is held, substrate keeps station 315 to limit predetermined center SC.It is desirable that, when being positioned within station 315, substrate The center of S is substantially consistent with station center SC.In other aspects, substrate station can be limited by any desired part of processing equipment It is fixed, wherein, substrate can be positioned by manipulator.Figure 3 illustrates substrate location relative to manipulator 330 and/or holding Stand 315 and（It is multiple）Sensor 199A and 199B are only exemplary.In other aspects, substrate keep station and（It is multiple）Pass Sensor can be positioned as desired relative to transmission manipulator.In figure 3, as will be described below, substrate transport machinery Hand 330, sensor 199A and 199B and controller 11091 are shown as being connected for being formed in the transmission（on the fly）（For example, during substrate transport moves）Substrate centering system, its can in manipulator along transmission path P by substrate It is transmitted to and keeps at least determining the wafer or substrate holding station 395S being maintained in robot end effector 395 during station 315 （Fig. 4 A）On substrate S eccentricity, and generate it is fixed in the factor for adjusting the position of transmission manipulator 330 so that really Protect manipulator substrate S is placed on the center SC of substrate station.As described in this article, the thermal expansion and/or contraction of manipulator 330 Also be determined so that the thermal expansion and/or contraction at least based on manipulator 330 come perform to substrate S it is fixed in.Equally such as Figure 3 illustrates, in an aspect, handling implement 390 can include aligner or the fixed middle station 362 of automatic wafer. In one side, controller 11091 can use the information or number either from aligner 362 provided by aligner 362 According to（For example, basal diameter, datum mark F positions etc.）In realizing that automatic substrate in the transmission is fixed.

As can be appreciated, substrate transport manipulator 330 is connected to controller 11091 and leads to controller 11091 Letter is so that controller 11091 can control the movement of substrate transport manipulator 330, so as to according to known and controlled side Formula is by robot end effector 395（The especially predetermined end actuator center or reference position of end effector 395 395C）Take any desired position in handling implement 390 to.For example, substrate transport manipulator 330 can have desired position Determining device（For example, such as, position or motor encoder 331）, which is connected to controller 11091 and suitable signal is sent to controller 11091 so that controller 11091 can be related to manipulator 330 The position coordinates and momentum that end effector center 395C is limited in any desired frame of reference of connection limit parameter.For example, machine Tool hand 330 can be pivotably mounted for allowing whole main body to be rotated around shoulder rotation axis Z and can be hinged so as to End effector center 395C is set at least to be moved according to radial manner relative to shoulder rotation axis Z.Substrate transport manipulator 330 Encoder 331 be connected to controller 11091 to identify that manipulator motor realizes mobile relative movement or definitely mobile. In addition, controller 11091 be programmed to conversion encoder data and（With the geometry of programmed manipulator in the controller Information combines）Generate the position coordinates and inertial parameter at end effector center 395.Therefore, controller 11091 is any given Time both knows about the position coordinates of end effector center 395C（In desired coordinate reference system）And end effector The position of any destination（For example, the center SC at substrate station）.

In an aspect, aligner 362 can be any suitable substrate aligner.In an aspect, aligner 362 before equipment or in air section 11000（See Fig. 1）, but in other aspects, aligner can be located at equipment In any desired position in.The example of suitable aligner is disclosed in following file：Entitled " High Speed The U.S. Patent No. of Aligner Apparatus " 8,545,165, entire contents are incorporated herein by reference.Such as Before pointed, aligner 362 can have（It is multiple）Suitable sensor, such as, transmission type sensors, it can be detected Datum mark F on substrate S.As can be appreciated, datum mark F is used to identify the treatment characteristic with one or more processing modules The expectation alignment of relevant substrate S.For example, figure 3 illustrates processing module 325 can be so as to performing on the substrates given Processing, the given processing need substrate to have particular orientation.For example, when substrate S is in aligner, aligner 362 can be with Substrate S is positioned so as to when being transmitted and being placed by substrate transport manipulator 330 in then keeping station 315 in substrate, substrate S With desired orientation.In other aspects, aligner 165 can be with the positional information of identification controller 11091 so that control Device 11091 processed controls substrate transport manipulator 330 to have desired orientation so that substrate S is placed in processing module 325.By right The datum mark F of substrate is positioned in known position by the orientation for the substrate that quasi- device 362 is established.By known to the datum mark of substrate Position is conveyed to controller 11091.Controller 11091 is programmed to：When substrate 315 is transmitted by end effector 395, from right The reference point location information that quasi- device 362 is provided to establish the desired location of datum mark F relative to end effector 395.End During expection reference point location on actuator 395 can be used for realization automatic wafer calmly by controller 11091, for example, using biography Sensor 199A and 199B identifies 1 points on substrate S.

In an aspect, controller 11091 can be programmed to monitor and record each of handling implement 390 and substrate S Kind ephemeral data, in realizing that automatic wafer is fixed.As can be appreciated, the dimensional characteristic of substrate S can be with environment State（Especially temperature）And change.For example, substrate 315 may undergo heat when being subjected to temperature change during processing Expansion and contraction.In an aspect, controller 11091 be configured as substantially depart from substrate S previous position and In the case of the data of temperature in any suitable manner（Such as, by detecting along the sufficient amount of of the edge of substrate Point（For example, three or more））To determine the center of substrate.In other aspects, controller 11091 can have on The information for the environment temperature that the information and substrate of the previous position of substrate can suffer from its previous position, Yi Jibao Reveal time and any other relevant information.For example, substrate S may be removed from baking module in a certain previous time（Should Baking module is placed in transmission container and is kept a period of time herein at a certain temperature）, and be then loaded Into the handling implement 390 with a certain head temperature.Therefore 11091 memory of controller will can be protected on the data of temperature Hold in the multiple regions of handling implement 390（Substrate S can be transmitted by handling implement 390 or substrate S is maintained at it In）And in other expectations sections of semiconductor manufacturing facility.For example, temperature information can be stored in controller 11091 For transmitting container 11050（Fig. 1）, substrate is transferred to equipment in the transmission container 11050.Temperature information can be stored up Deposit and be used for front section 11000（See Fig. 1）, loadlock 11010 and can be used for buffer substrate any buffered station（Do not show Go out）.Similarly, in vacuum section 11090, as can be appreciated, thermal information（Such as, radiating surface or heat absorption table Face（For example, heating plate, coldplate etc.）Temperature）Can also be stored by controller 11091, controller 170 can also monitor and Store the thermal information of substrate, such as, position and time.Therefore, in the exemplary embodiment, controller 11091 can be deposited at it There are the data for being used for it is expected parameter so as within expectation period in reservoir（Such as, when by sensor 199A and 199B）Fill Ground is divided to limit the Warm status of substrate S.For example, controller can have suitable thermal balance algorithm so as to fixing time（Such as, When measuring radius by aligner 362 and when by sensor 199A and 199B）Suitably establish the Warm status of substrate （That is, temperature）.In alternative embodiments, controller can access the heat for being used for identifying substrate from desired external memory locations The data of state.In other other alternate embodiments, the Warm status of substrate can be directly by suitable device（Such as, light Learn thermometer）Measurement.Data on the temperature of substrate can be communicated to controller for determining due to the hot shape of substrate The change in size of substrate S caused by state.In other aspects, the center of substrate S can be determined independently of the temperature of substrate, it is all Such as, by using such as sensor 199A and 199B come detect 1 points on the edge of substrate and based on this at least three A definite point determines center.

Referring now still to Fig. 3, sensor 199A and 199B can have any suitable type, such as, transmission type sensors or Person's reflective sensor, it can detect substrate 315 when making substrate be moved through sensor by substrate transport manipulator 330 In the presence of.In the exemplary embodiment, sensor 199A and 199B can have light beam source and detector, the light beam source and inspection respectively Device is surveyed to detect at it or can produce appropriate signal when could not detect light beam.Sensor 199A and 199B can be positioned as phase Deviated for the transmission path P of substrate, so that basal edge is by one or more sensors 199A and 199B and by it Detection.For illustrative purposes, the transmission path P of substrate S is shown as path generally radially in figure 3（That is, the path Extend through the shoulder rotation axis Z of substrate transport manipulator 330）.In other aspects, substrate S can have any desired Transmission path.For example, the path can be offset radial path P but be substantially parallel to the straight line path P of radial path P, And in other aspects, which can be arched path.In other aspects, the path can deviate radial path P and It is in expected angle relative to radial path P.Sensor 199A and 199B can alternatively be positioned as with improve sensitivity with For detection object edge, such as described in U.S. Patent No. 6,990,430, entire contents are by reference It is incorporated herein.

In an aspect, one or more sensors 199A and 199B can be based on relative to the position of transmission path P The desired orientation of substrate 315 on end effector 395（Namely based on the desired location of datum mark F）, and be therefore based on and place Manage module 325（Substrate is waited to be transferred to the processing module）Associated substrate direction parameter.When processing module and manipulator quilt During installation, it can determine to wait to be transferred to the desired orientation of the substrate of given processing module when setting up equipment.In the transmission Sensor 199A and 199B can correspondingly be positioned relative to transmission path P during automatic substrate is fixed, to ensure in machinery The direction parameter associated with given processing module, datum mark F are depended under expection substrate orientation on hand end effector 395 It is expected that it is not in the discharging area by sensor definition.

In an aspect, controller 11091 be configured as by using one or more sensors 199A and 199B by Impinge upon the centre bit that the mode described in following file determines substrate S relative to the reference position 395C of end effector 395 Put：For example, the U.S. Patent No. 6,990,430 announced on January 24th, 2006 and the 7th of announcement on April 12nd, 2011 the, 925, No. 378, the disclosure of which is fully incorporated herein by reference.In other aspects, controller 11091 is configured It is all to determine the center of substrate S relative to the reference position 395C of end effector 395 in any suitable manner Such as, in the way of being described in the following literature：On April 4th, 1989 announce U.S. Patent No. 4,819,167 and The 5th, 980, No. 174 announced on November 9th, 1999, the disclosure of which is fully incorporated herein by reference.

As described above, controller 11091 is additionally configured in automatically fixed substrate by substrate pickup and to put Put the thermal expansion and/or contraction that substrate transport equipment 395 is determined when substrate is kept at station 315.In an aspect, with reference to figure 4A, what end effector 395 was provided with one or more benchmark or center certainty feature 401 and 402 makes medial end portions by oneself Actuator, the one or more benchmark or center certainty feature 401 and 402 are performed with end in any suitable manner Device forms overall（Be formed as single-piece unified structure element）Or end effector is mounted to for realizing to end effector Reference point locations determine.Although reference characteristic 401 and 402 is described herein by reference to end effector 395, should manage Solution, in other aspects, reference characteristic can be located on any desired part of substrate transport manipulator 330, such as, In arm link.One or more reference characteristics 401 and 402 are the reference position 395C relative to end effector 395（In Fig. 4 A In be also indicated as position Xc and Yc）And therefore determined relative to each locus of end effector.For example, one Or multiple reference characteristics 401 and 402 independently of the temperature of end effector 395 and reference characteristic 401 and 402 and and reference bit Putting 395C has fixed predetermined relationship, as will be described in further detail herein.In an aspect, end effector 395 （Including one or more reference characteristics 401 and 402）Under such as high temperature（Such as, in ceiling temperature scope as described above It is interior（For example, about 850 DEG C or bigger））Size is stable, because 395 material of end effector has substantially limited heat Expansion and contraction.In an aspect, end effector 395 and one or more reference characteristic 401 and 402 include alumina or Person has other suitable materials of substantially limited thermal expansion and amount of contraction at high temperature.It will also be appreciated that end is held Row device and reference characteristic material are also dimensionally stable at a temperature of below about 850 DEG C.It should be noted that although description The thermal expansion of high temperature and end effector 395, it will be appreciated that, it can be applied in terms of disclosed embodiment, for example, About 500 DEG C of medium base treatment temperature and about 200 DEG C of reduction process temperature.

In an aspect, it is shaped as and is determined with reference to Fig. 3 and Fig. 4 A, one or more reference characteristics 401 and 402 Position is at any other suitable position for example on end effector 395 or in substrate transport equipment 330, so as in substrate The transfer arm 330A of transmission equipment 330（For example, in the transmission）By the period of movement 499 of sensor 199A and 199B by automatic Sensor during substrate or wafer are fixed（Such as, one or more sensors 199A and 199B）Detection, wherein, which is as follows One or more of movement：Radially extend/retraction movement（For example, R is moved）, rotary motion（For example, θ is moved）Or appoint What suitable straight line or bending motion.In an aspect, reference characteristic 401 and 402 is performed also relative to end is maintained at Substrate S on device 395 is positioned, so that passing through sensing when being kept by end effector 395 or bearing basement S Device 199A and 199B senses reference characteristic 401 and 402.For example, the substrate of end effector 395 keeps station 395S not by one Or multiple reference characteristics 401 and 402 stop.It is also noted that one or more reference characteristics 401 and 402 are not held by end The substrate S that row device 395 is kept stops.In an aspect, reference characteristic 401 and 402 is arranged on substrate transport manipulator 330 On, separated from substrate holding station 395S and different.In an aspect, as that can see in figure 3, one or more benchmark Feature 401' is located on the arm 330A of substrate transport equipment 330.For example, in an aspect, end effector 395 by for End effector is attached to the connecting rod of arm 330A wrist piece 395WR or other suitable mechanical interfaces and be attached to arm 330A.In an aspect, wrist piece 395WR limits the wrist axis of substrate transport equipment arm 330A and including coupling supporting item Either base end effector 395 is attached to the connection supporting item or base.

As can be appreciated, substrate S may remain on end effector and be located in centred position（For example, substrate Center is consistent with end effector reference point 395C）Or in eccentric position（For example, the center of substrate is not performed with end Device reference point is consistent）.Sensor 199A and 199B are configured as during the movement 499 of end effector 395 in the transmission Detection substrate passes through respective sensor 199A by the transition point 421-422 and reference characteristic of respective sensor 199A and 199B With the transition point 425-428 of 199B.As can be appreciated, substrate S can be rested on end effector 395, wherein, in base There is random eccentric rate e between bottom center WC and end effector reference point 395C.As described herein, reference characteristic 401 Predetermined definite relation between 402 and the reference point 395C of end effector 395 provides following content：Independently of any teaching Fixing device, which provides, deviates base center（For example, eccentric ratio e）Identification, when substrate transport manipulator 330（For example, at least The arm 330A of manipulator）In thermal walking（For example, expansion or contraction）There is provided when lower to end effector center or reference The identification of position 395C, provided relative to the end effector center of sensor 199A and 199B or the knowledge of reference position 395C Not, the holding position SC so that identification and teaching are stood, and it is related to respective sensor transition point 421-428 detecting Make hysteresis effect during 395 position of manipulator of connection（For example, sensor is delayed）Minimize.

Each of reference characteristic 401 and 402 limits unique true with known predetermined shape, the known predetermined shape Scheme is determined for detecting the respective edges relative to end effector reference point 395C scanned by sensor 199A and 199B Or transition point 425,426,427,428.The known predetermined shape is detected or sensed by sensor 199A and 199B, so as to Determined before thermal expansion/contraction the position Xc and Yc of end effector reference point 395C and before thermal expansion/contraction really Determine the position of end effector reference point 395.In an aspect, sensor 199A and 199B is positioned in handling implement 390 So that each sensor offset is to end effector 395 when end effector travels through sensor 199A and 199B Longitudinal centre line CL., can be with here, sensor 199A and 199B are located on the opposite side of center line CL, and in other aspects In the presence of the one or more sensors in the common side of center line CL.

In the aspect illustrated in Figure 4 A, there are two reference characteristics 401 and 402 from the opposite side of end effector 395 Extend to side or dangle（Wherein, it is typically laterally that X-direction and longitudinal axis are limited by end effector center line CL）, and In other aspects, there may be more or less than two reference characteristics 401 and 402.For example, referring to Fig. 4 B, a side In face, only exist single reference characteristic 401 and be arranged on the single lateral side of end effector 395（For example, from its extension or Person is dangled）.In other aspects, end effector 395 includes the supplement being arranged on common lateral side or relatively lateral side Reference characteristic.For example, referring to Fig. 4 C, reference data 401 and 402' are located on the common lateral side of end effector 395, wherein, Reference characteristic 401 and 402' are joined by using a pair of of transition point 425', 426' and 427,428 to provide supplement end effector 395 location of C of examination point determines, wherein, supplement reference characteristic 401 and 402' each be used to supplement it is another in reference characteristic For the corresponding unique definite scheme of a and offer for determining end effector reference point 395C positions Xc and Yc, it can be as originally Text is described to be combined and equalizes to increase the accuracy of location determination like that.Although supplement reference data feature 401 and 402' is illustrated as on the common lateral side of end effector 395, but in other aspects, supplement reference characteristic can With on the relatively lateral side of end effector.In other aspects, include with reference to Fig. 4 D and Fig. 4 E, end effector 395 One or more reference characteristics 403, wherein, reference characteristic 403 is formed internal reference feature, such as, end effector 395 In aperture（For example, groove or hole）.One or more reference characteristics 403 have any suitable shape and configuration so as to according to Mode described herein is substantially similar to realize to the definite of the position Xc and Yc of end effector reference point 395C.Example Such as, one or more reference characteristics 403 can be single feature either multiple feature 403A and 403B single features or more A feature 403A and 403B is configured to be scanned the position to determine this feature and size in one or more directions, its In, then controller determines that the thermal expansion of end effector or contraction and end effector are joined using its shapes and sizes The position Xc and Yc of examination point 395C.In an aspect, the shapes and sizes of one or more reference characteristics 403 are arranged in base The mobile period of bottom transfer robot arm 330 is swept according to similar to herein for 401 and 402 described mode of reference characteristic Retouch.In an aspect, fuel factor as described herein is independently of determining and being determined for wafer eccentricity, and can be with It is to be felt using the different reference characteristics on arm 330A, end effector 395 and/or wrist piece 395WR Anywhere Survey.For example, in an aspect, one or more internal reference features 403, at least a portion of 403A, 403B and exterior base Quasi- feature is corresponding, such as, the edge 395EG of end effector 395.For example, the edge 403E of reference characteristic 403A and 403B There is predetermined relationship with edge 395EG so that according to the described mode in edge for reference characteristic 401 and 402 come Sensed/detected edge 403E and 395EG determines at least end effector reference point 395C to realize.It should be understood that Reference characteristic 403, the shape of 403A, 403B and quantity are representational, and in other aspects, it is any suitable to there may be The reference characteristic of quantity, it has any suitable shape respectively.In other other side, with reference to Fig. 4 F, reference characteristic 401'' and 402'' is consistent with one or more edges of end effector 395.For example, end effector includes 395 He of wrist Substrate maintaining part 395H.In this aspect, any other desired part of wrist 395W or end effector 395 is configured to So that the edge of wrist 395W is formed integrally as the reference characteristic 401'' and 402'' consistent with the edge of wrist 395W.Other It is described herein in aspect（It is multiple）Reference characteristic is comprised in the arm 330A and end effector of substrate transport equipment 330 Mechanical interface between 395 and arm 330A（For example, it may be possible to the brachialia similar to wrist 395W）One or more of in or On.

In in terms of Fig. 4 A diagrams, reference characteristic 401 and 402 is illustrated as with curved shape so that each phase Answer the leading edge and trailing edge of reference characteristic 401 and 402（It is corresponding with transition part 425-428）Radius with substantial constant, its In, the detection to leading edge and trailing edge at transition point 425-428 is using for example come self-encoding encoder 331 by controller 11091 Position data solve, to establish the position Xc and Yc of end effector reference point 395C.In other aspects, benchmark is special Sign 401 and 402 has any suitable shape, it has unique scheme, the program for end effector reference point 395C By the position Xc and Yc for identifying end effector reference point 395C.For example, in an aspect, with reference to Fig. 5, reference characteristic 501 and 502 include straight edge, which has predetermined relative to the position Xc and Yc of end effector reference point 395C Deviate FS1 and FS2 and angle [alpha].In an aspect, each of reference characteristic described herein is configured as independently Parse the end effector reference point 395C that substrate keeps station 395S.In an aspect, reference characteristic described herein is set Put on end effector 395 or other suitable positions of the arm 330A of substrate transport manipulator 330, so as to benchmark The detection of feature can limit the change of the size of substrate transport manipulator 330 independently of end effector 395, wherein, one In a aspect, which is due to the fuel factor on substrate transport manipulator 330 and produces.

In an aspect, it is arranged on referring now still to Fig. 4 A, multiple reference characteristics 401 and 402 on end effector to carry The high accuracy on determining the reference position Xc and Yc of end effector reference point 395C.For example, reference characteristic 401 and 402 It is essentially similar with each other and be configured to it is relative to each other so that the shape of each of reference characteristic 401 and 402 with One or more common virtual fixed reference features（Such as, for example, the first circle VRW1（It is corresponding with transition point 425 and 427）With Two circle VRW2（It is corresponding with transition point 426 and 428））Alignment.Although illustrate two circles, in other aspects, mistake Crossing a little can be corresponding with single circle and more than two circle.In other aspects, reference characteristic 401 and 402 can limit Go out any suitable geometric properties/shape, make a reservation for for example, the geometric properties/shape has with end effector reference point 395C Relation.Each circle VRW1 and VRW2 have known diameter, and therefore each circle VRW1 and VRW2（And with it is corresponding Circle and transition point 425,427 and 426, the edge of 428 corresponding reference characteristics 401 and 402）With on determining end The position Xc's and Yc of actuator reference point 395C mutually should determine that scheme.In an aspect, controller 11091 can according to appoint What suitable mode by for each scheme of circle VRW1 and VRW2 and carry out self-encoding encoder 331 with transition point 425,427 Be combined with 426,428 corresponding position datas and make its equalization, for example, so as to generally eliminate sensor 199A and Noise variation in 199B signals and manipulator encoder data.In other aspects, for reference characteristic（Such as, it is single Reference characteristic, the reference characteristic on the opposite side of end effector and/or the base in the common side of end effector Quasi- feature（Either complementary features or non-supplemental feature））In the scheme of each can be combined and be averaged with Just the noise variation in sensor and encoder data is eliminated.

As can be appreciated, for example, since Mobile Transmission arm 330A and end effector 395 are one or more in detection Speed effect during transition point 421-428, it is possible that there are hysteresis effect（For example, in sensor 199A and 199B signal In）.For example, since sensor 199A and 199B sense at least time of one or more of transition point 425-428 and control Delay between the time that device 11091 receives sensor signal, thus higher transfer arm 330A speed can cause it is larger Varying effect.In an aspect, the hysteresis effect be by by for example at various speeds with corresponding transition point 425-428 The radially extended position encoder values of the corresponding transfer arm 330A of detection signal are combined to solve.But the radial direction of arm 330A Extension is used as example, and in other aspects, the positional information of the arm 330A obtained from encoder 331 can be and any conjunction The corresponding any suitable position data of suitable coordinate system.For example, transfer arm 330A extends to substrate with First Speed transmission Keep to place substrate S and keep station 315 to retract from substrate with second speed after it placed substrate S in station 315, second Speed is different from First Speed.Controller 11091 receives the transition point for extending past and being withdrawn past for transfer arm 330A 425-428 data, wherein, for example, end effector passes through sensor 199A and 199B, and encoder 331 is by positional value/number According to send to the corresponding controller 11091 of transition point 425-428 data.Controller 11091 is configured to self-encoding encoder in future 331 with being combined simultaneously for the corresponding positional value/data of transition point 425-428 data for extending past and being withdrawn past And make its equalization to compensate hysteresis effect.As can be appreciated, repeatedly it can will extend past and be withdrawn past progress Combine and make its equalization generally to reduce or to eliminate hysteresis effect.Although show for lag compensation as described above Example describes radially extending for arm 330A, but in other aspects, arm 330A can exist along any suitable path Pass through sensor on different directions at different rates, wherein, position data corresponding with sensor transition point is carried out Combine and make its equalization to compensate hysteresis effect.

Referring now still to Fig. 4 A, the exemplary operation of the aspect of disclosed embodiment will be described.As described above, During conventional automatic wafer or substrate are fixed algorithm using substrate it is fixed in fixing device come by reference wafer position restriction in zero bias At heart rate.In in terms of the disclosed embodiment, reference characteristic 401 and 402 and the wafer position at zero bias heart rate（For example, The position of end effector reference point 395C）With predetermined definite relation.In this way, the measurement obtained from reference characteristic 401 and 402 Value just limits end effector reference point 395 position Xc and Yc.Reference characteristic 401 and 402 by respective sensor 199A and Substrate transport machinery is measured as by one or more sensors 199A and 199B the transition point 425-428 detected during 199B The end that 330 encoder 331 of hand detects the moment report of each transition point 425-428 in respective sensor 199A and 199B performs Device position.In an aspect, the position Xc and Yc of end effector reference point 395C is with being performed to being maintained at end In the case that the eccentricity of substrate S on device 395 determines substantially simultaneously（For example, end effector, reference characteristic and/or Substrate is by the identical by upper or single pass of sensor 199A and 199B）It is determined.

In an aspect, in fixed to automatic substrate described herein under predetermined calibration or reference temperature TREF and Teaching equipment 300 of standing is calibrated, so that passing through one or more sensors 199A and 199B in reference characteristic 401-402 When make at least encoder data of substrate transport manipulator 330 and end effector reference point 395C interrelated.Calibrate temperature Can be any suitable temperature, such as, for example, make substrate transport arm 330 from the temperature of thermal expansion or contraction and/or Person to keep station 315 to instruct the temperature to substrate transport equipment 330 substrate.In other aspects, calibration temperature is that heat is swollen Amount that is swollen or shrinking is known temperature for substrate transport equipment 330.In an aspect, in order to calibrate automatic base Neutralization station teaching equipment 300 is determined at bottom, the environment residing for substrate transport manipulator is reached calibration temperature（Fig. 6, frame 600）.For example, Substrate transport manipulator 330 is moved to substrate in transfer chamber and keeps 315 positions of station.It is moved in substrate transport manipulator 330 When substrate keeps station 315, end effector 395（For example,（It is multiple）Reference characteristic）Move through one or more sensors 199A and 199B（Fig. 6, frame 605）.For example, one or more sensors 199A and 199B detects one at transition point 425-428 The leading edge and trailing edge of a or multiple reference characteristics 401 and 402（Fig. 6, frame 610）.At each transition point 425-428, one or Multiple sensor 199A and 199B send signal to indicate to have occurred corresponding transition point 425-428 to controller 11091（Fig. 6, frame 615）, and signal is sent to indicate base to controller 11091 in response to the signal, the encoder of substrate transport manipulator 330 The position of bottom transmission manipulator 330（For example, controller 11091 detects in response to transition point and receives encoder data）（Fig. 6, Frame 620）.Controller is based on encoder data corresponding with transition point 425-428 and reference characteristic 401 and 402 and end Known definite relation between actuator reference point 395C determines end effector reference point in any suitable manner The position Xc and Yc of 395C（For example, the substrate location at zero bias heart rate）, so that the coding of substrate transport manipulator 330 Device data（And for example, radially extended position）With end effector reference point 395C（For example, end effector known to controller The position Xc and Yc of reference point）It is interrelated（Fig. 6, frame 625）.In an aspect, controller 11091 is using for example on mistake Cross a little 427 and 428 and the following equation of reference data 401 determine position Xc and Yc, and with reference to Fig. 4 A and Fig. 7：

, wherein,

, and

Wherein, r1 and r2 is the radius for the virtual circle VRW1 and VRW2 that reference characteristic 401 and 402 is limited respectively；1 Hes of γ γ 2 is to the respective angles of the transition point 427 and 428 on virtual circle VRW1 and VRW2；And Δ R is arm in transition point 427 Difference between radially extending at transition point 428.Class can be performed to the transition point 425 and 426 for reference data 402 Like calculate and by it with being equalized to the result of calculation of transition point 427 and 428 to increase the accuracy of calibration.

Again, it should be understood that depending on the geometric configuration of reference characteristic 401 and 402, can also apply other schemes/ Equation.As can be appreciated, automatic substrate is determined neutralization station teaching equipment 300 calibration be when for example setting up instrument or Person is performed when substrate transport mechanisms are replaced, and when substrate processing apparatus is in the state of processing safety（Example Such as, when the temperature in the processing equipment of sealing is reached base treatment temperature）Avoid the need for being performed.In addition, it is transition point At least one definite substrate transport arm 330A in 425-428 radially extends R at a temperature of calibration_CT, however, in other aspects In, in the case where the extension of substrate transport arm is not radial direction, recorded by controller 11091 for transition point 425-428 In at least one substrate transport X-coordinate and Y-coordinate（Or substrate transport manipulator is in any other suitable coordinate system Coordinate in system）And make it interrelated with transition point 425-428.

As noted, base treatment is equipped（Such as, substrate transport manipulator 330）On temperature effect can It can be the source that substrate S is for example placed on to accuracy error when substrate keeps station 315 and picks up substrate S from it.For example, The thermal expansion and/or contraction of substrate transport manipulator are the position datas using the arm 330A of substrate transport manipulator 330（The position Data are put with keeping standing from substrate（Such as, substrate keeps station 315（Fig. 3））Pick up substrate S and place substrate S to the substrate Keep the transit data of the reference characteristic 401 and 402 during station corresponding）Synchronously（In an aspect substantially with substrate Processing is simultaneously）Compensated.In an aspect, base treatment module 325（And its component, such as, substrate keeps station 315） On fuel factor be compensated also by following manner：For example, configurable scale is stored in controller 11091, this causes The thermal expansion/contraction of base treatment module 325 is related to the thermal expansion/contraction of substrate transport equipment 330.In an aspect, Controller estimates base treatment mould based on the given value of the thermal expansion/contraction of substrate transport equipment 330 as described herein The value of the thermal expansion/contraction of block 325.For example, the thermal expansion/contraction of arm 330A may be used as temperature sensor to estimate bases Expansion/contraction of module 325 is managed, correlation therebetween can show in configurable scale.

As can be appreciated, when the treatment temperature of base treatment equipment changes, due to substrate transport equipment 330（It is all Such as, transfer arm 395）Thermal expansion or contraction, so the detected transition point 425-428 phases of reference characteristic 401 and 402 For the position excursion of substrate transport manipulator 330.In such manner, it is possible to by by the position data of substrate transport equipment 330 and its Relative value in the case where calibrating temperature TREF is made comparisons to measure caused thermal expansion or blockage effect.With reference to Fig. 9, except Such as due to temperature effect and outside existing when deforming, the position of end effector reference point 395C should be unique.If need Will, then can be in calibration temperature T in order to quantify the effect of such as temperature distortion of substrate transport arm 330A_REFLower measurement position Xc A part for calibration procedure is saved as with Yc and by the position（As noted）.When substrate transport manipulator is in office Extended under meaning temperature T base treatment module 325 substrate keep station 315 or from its retract when, can be according to the meter that such as gets off Calculate the effect of temperature：

Wherein, measured deformation is comprised in wafer offsets measurements and calibration value in any suitable manner, so as to So that crystal circle center WC is placed as being aligned with station location SC.In an aspect, Δ X (T), Δ Y (T) be determined for as Fuel factor described herein in base treatment module 325.For example, in an aspect, the profit of substrate transport manipulator 330 With end effector 395 pickup substrate S at station is kept from any suitable substrate（Fig. 8, frame 800）.It should be noted that at one In aspect, thermal compensation is performed in the case where end effector does not keep substrate S（For example, the frame 800 of Fig. 8 is optional 's）And can be before base treatment or period is performed.For example, substrate transport manipulator 330 in transfer chamber or Substrate is moved in other controlled environments and keeps 315 positions of station.In substrate transport manipulator 330 towards base treatment module 325 Substrate keep station 315 movement when（For example, to place substrate S or reference characteristic 401 and 402 is moved through sensor 199A and 199B）, substrate S and/or end effector 395（For example, reference characteristic 401 and 402）Move through one or more Sensor 199A and 199B（Fig. 8, frame 805）.In end effector 395 is remain in terms of substrate, one or more sensing Device 199A and 199B synchronously detect the leading edge and trailing edge of the substrate S for example at transition point 421-424（Fig. 8, frame 810）. In one side, for example, except or in addition to replacing detection to transition point 421-424（For example, to base in the frame 810 of Fig. 8 The detection at bottom is optional in an aspect）, one or more sensors 199A and 199B are also synchronously detected in transition point The leading edge and trailing edge of one or more reference characteristics 401 and 402 at 425-428（Fig. 8, frame 815）.In each transition point 421- At 428, one or more sensors 199A and 199B sends signal to indicate to have occurred corresponding transition point to controller 11091 421-428（Fig. 8, frame 820 and 821, it is noted that frame 820 only just occurs when end effector remains substrate）, And in response to the signal, the encoder of substrate transport manipulator 330 sends signal to indicate substrate transport to controller 11091 The position of manipulator 330（For example, controller 11091 detects in response to transition point and receives encoder data）（Fig. 8, frame 825）. In an aspect, at processing temperatures（For example, under Δ T）Thermal compensation to end effector reference position 395C is to be based on Such as get off definite：For example, substrate transport manipulator 330 is in one or more transition point 425-428（Such as, for example, transition point 428）The radially extended position R at place_ΔT.For example, when sensor 199A detects the volume of transition point 428 and substrate transport equipment 330 When code device 331 sends position signal to indicate the position of substrate transport equipment 330 to controller 11091, pass through controller 11091 To determine R_ΔT.It should be noted that R_ΔTWith the arm of the substrate transport manipulator 330 caused by such as thermal expansion or contraction 330A is corresponding or otherwise react the change in size to the change in size of shoulder Z from sensor 199A.In this way, For example, end effector reference point at processing temperatures simultaneously generally is determined from following equation with base treatment The position X of 395C_CΔTAnd Y_CΔT（Fig. 8, frame 835）：

, and

Wherein, for example, the heat endurance of the material due to end effector 395, soNot from calibration valueChange, and again due to the heat endurance of the material of end effector 395, so X_CΔTIt is less constant （For example, it is equal to XC）In an aspect, can as needed such as by with Y_CΔTAnd X_CΔTSum processing module Size factor（For example, due to fuel factor）It is combined, so as to the effect of the change in size comprising 325 station 315 of processing module, with For making transmission manipulator accommodating movement substrate S is placed at processing module station 315.In an aspect, due to temperature Compensating effect is for example, by detecting transition point 425-428 at processing temperatures naturally from the transition point at a temperature of calibration Opposite change that the correspondence position value of 425-428 occurs realizes, so in order to compensate for the thermal expansion of substrate transport arm 330A, The actual value of known treatment temperature is not required.Controller 11091 is based on end effector reference point 395C's at processing temperatures Position X_CΔTAnd Y_CΔTTo control the movement of substrate transport manipulator 330, synchronously to compensate substrate transport manipulator 330 Thermal expansion and/or contraction, for example, based on R at processing temperatures_ΔTCarry out synchronously adjusting position Xc and Yc.

Although it is above the position made at transition point 428 to end effector reference point 395C at processing temperatures X_CΔTAnd Y_CΔTDetermine, but in other aspects, position X_CΔTAnd Y_CΔTIt is by using for example in the first circle VRW1 and second More than one point on circle VRW2 determines, wherein, the plurality of point is corresponding with the common ground on circle VRW1 and VRW2.Example Such as, using two points（Such as, transition point 426 and 428）（Or in other aspects, use transition point 425 and 427）To determine Position X_CΔTAnd Y_CΔT.For example, referring to Fig. 9, can by using following equation by sense such as transition point 426 and 428 come Find position position X_CΔTAnd Y_CΔT：

Wherein, these equations carry out retaining tips actuator reference point using one or more virtual circle VRW1 and VRW2 395C, one or more virtual circle VRW1 and VRW2 represent the fixed middle substrate kept by end effector 395.It can such as anticipate Know, two circles VRW1 and VRW2 are can be applied to using the equation of two points on circle, wherein so that for holding Each position accordingly produced of portion actuator reference point 395C is equalized to increase to position X_CΔTAnd Y_CΔTIt is definite accurate Property.Here, as the other side of disclosed embodiment, whenever arm 330A is extended to bases by substrate transport equipment 330 Reason module/stand 325 and from base treatment module/stand 325 extension when, can be independently of being maintained on end effector 395 The position of substrate S determines the position of end effector reference point 395C.Again, in an aspect, can be by processing module 325 change in size with as described herein to position X_CΔTAnd Y_CΔTIt is definite combine, substrate S is put to realize Put at processing module station 315.

In an aspect, in the case where end effector keeps substrate S, if desired, then controller 11091 is configured For based on the substrate sensor transit data for transition point 421-424 and end effector reference point at processing temperatures 395 position X_CΔTAnd Y_CΔTTo determine the eccentric ratio e of substrate S（Fig. 8, frame 840）.In an aspect, the eccentric ratio e of substrate S It is synchronously determined according to any suitably mode, such as, for example, in the way of being described in the following literature：The U.S. Patent the 6th, 990, No. 430, the 7th, 925, No. 378, the 4th, 819, No. 167 and the 5th, 980, No. 194, it is before by drawing Mode is fully incorporated herein.For example, referring to Fig. 4 A, it is illustrated that the position XW and YW of base center WC, end effector ginseng The eccentric ratio e of the position Xc and Yc and substrate S of examination point 395C.It is to be understood that the position XW and YW of base center WC and end The position Xc and Yc of actuator reference point 395C represent the position at a temperature of calibration or under treatment temperature Δ T, wherein, position Put XW and YW and position Xc and Yc（X_CΔT、Y_CΔT）It is to be determined as described herein.In an aspect, can be with Eccentric ratio e is determined using following equation：

The position at station 315 is kept to be taught at a temperature of calibration to substrate transport manipulator 330 although substrate has been indicated above, In an aspect, such as reference point locations X is based at processing temperatures_CΔTAnd Y_CΔTAnd/or such as institute at processing temperatures Substrate is kept station 315 by the eccentric ratio e of definite substrate in any suitable manner（It is multiple）Position instruct again to（Or Person replace being instructed outside the teaching at a temperature of calibration to）Substrate transport manipulator（Fig. 8, frame 845）.For example, control Device 11091 is configured as from understanding the base treatment of substrate processing tool 390 to the detection of reference characteristic described herein The center SC of module/stand 325.In an aspect, controller 11091 is configured as from sensing data（The sensor Data are corresponding with the detection at least one edge at least one reference characteristic described herein）To identify and understand base The center SC of the base treatment module 325 of bottom handling implement 390.In an aspect,（It is multiple）Base treatment station 315 （It is multiple）Position is taught to base treatment in the way of being substantially similar to be described in the following literature at processing temperatures Manipulator 330：Submit on November 10th, 2015 it is entitled " Tool Auto-Teach Method and Apparatus' " U.S. Patent Application No. 14/937,676（Attorney docket 390P015016-US (PAR)）, the disclosure of which passes through reference Mode be fully incorporated herein.

In an aspect, with reference to Fig. 4 A and Figure 10, once passing through or step in the case of no teaching wafer In determine 330 end effector 395 of substrate transfer robot arm position 395C and will station center SC instruct to substrate transport Equipment 330.For example, sensor 199A and 199B（It is oppositely arranged on the opposite side of center line CL, but need not be symmetrically Arrangement）There is predetermined spatial relationship with station center SC, so that sensing reference characteristic（Such as, reference characteristic 401 and 402）Both For determining that end effector center or reference position 395C are also used for understanding station center SC.For example, it will be held with reference to by end Virtual circle VRW1 that the reference characteristic 401 and 402 of row device 395 limits describes the teaching of station center SC, it should be appreciated that The circle VRW2 limited by reference characteristic and/or substrate S can be used to instruct station center SC in a similar manner.One In a aspect, wafer S and/or reference characteristic 401 and 402 are made towards sensor 199A and 199B by end effector 395 It is mobile（Figure 11, frame 1100）.Wafer S and/or reference characteristic 401 and 402 are sensed using sensor（Figure 11, frame 1110）, And determine the position of one or more crystal circle center WC and substrate transport equipment（That is, reference position 395C）（Figure 11, frame 1120）.For example, as described herein, reference position 395C is determined by using circle VRW1.As can be appreciated, Due to sensor 199A and 199B relative to station center SC position be it is known and due to crystal circle center WC generally with end Portion actuator center reference location 395C is consistent, so substrate keeps position of the station relative to end effector center reference point 395C Putting is also known and is taught and gives substrate transport equipment, wherein, sensing wafer S and/or reference characteristic 401 and 402 can exist End effector once passes through from sensor 199A's and 199B（Or step）Middle realize holds the end relative to station center Row device reference point 395C（That is, the position of substrate transport equipment）Record（Figure 11, frame 1130）.

In an aspect, motion model and/or algorithm are programmed with reference to Figure 1A and Fig. 3, controller 11091, the movement Model and/or algorithm make the position of arm 330A（Or the position of the predetermined reference point on arm 330A, such as, for example, end performs The center 395C of 395/ substrate S of device（XC、YC）Or other suitable reference points）And movement and the transport module of arm 330A The referential of 11025 either treating stations 11030 is related or is otherwise described.In an aspect, the fortune Movable model and/or algorithm are the sizes based on arm 330A（Such as, the size L of each arm link 330AU and 330AF_UiAnd L_Fi, see Figure 12）With the geometry of arm 330A（For example, fixed pivot axi, SCARA, frog leg, leapfrog arm, both sides symmetric arms, linear slide Deng）.In an aspect, either algorithm makes arm reference point or benchmark to the motion model（Such as, for example, 401 He of reference characteristic 402）With the position of end effector 395（Such as, the center 395C of end effector 395）Correlation, wherein, from shoulder Z To end effector 395 center 395C either to arm reference point or benchmark（Such as, center determines/401 He of reference characteristic 402）Distance be generally referred to as radial position or the distance R of arm 330A, such as in Fig. 4 A, Fig. 9, Figure 12 and Figure 13 Diagram.

Reference Figure 12, for example purposes, it is illustrated that SCARA arms（It is also applied for both sides symmetric arms configuration）Signal Represent.In other aspects, arm can be for example above with respect to one in the described arms of Fig. 2A to Fig. 2 E or it is any its Its suitable mechanical arm.On the SCARA arms illustrated in Figure 12, upper arm 330AU has length L_Ui, forearm 330AF, which has, to be grown Spend L_Fi, and end effector 395 can have one or more to refer to spot size L_Ei, such as, for example, the wrist of SCARA arms Size L_EWi、（For example, from wrist）To one or more benchmark or center certainty feature 401 and 402（Similar to as above The described feature 401 and 402 shown in Fig. 4 A to Fig. 4 C of text and/or center shown in such as 4D into Fig. 5 are true Qualitative features）Size（L_EFi）And/or（For example, from wrist）To end effector 395 or the ruler at the center of substrate S Very little L_ECi.The connecting rod of upper arm 330AU and forearm 330AF also have link angle ε i and β i, wherein, for the footpath of SCARA arms 330A To extension（For example, along the axis Y for extending through pivot axis Z）, the angle of end effector 395 is approximately equal to zero（0）.

The value of motion model and/or algorithm generation for the radial position R of SCARA arms 330A, as describing to make a reservation for Extension/retracted position of reference point or the size of the benchmark on SCARA arms 330A.For example, referring to Fig. 4 and Fig. 7, in processing temperature The radial position R of arm 330A under degree_ΔTWith calibration temperature T_REFUnder arm 330A radial position R_CTIt is confirmed as manipulator One or more benchmark or center certainty feature 401 and 402 on end effector 395, and in fig.9, in processing temperature The radial position R of arm 330A under degree_ΔTWith calibration temperature T_REFUnder arm 330A radial position R_CTIt is confirmed as end to hold The center 395C of row device 395.Therefore, for SCARA arms 330A（In the case of the symmetric arms of both sides, for each arm）, R_iIt is L_Ui、L_Fi、L_Ei, ε i and β i function, for example,.For in calibration temperature T_REFUnder The radial position RCT of SCARA arms 330A, upper arm L_UiLength L_UIWith forearm L_FiLength L_FiIt is known, and link angle ε i and β i are to utilize known initial value from motor encoder data（For respective arms）To determine.End effector reference point ruler Very little L_Ei（No matter it is in wrist L_EWi, or in one or more benchmark or center certainty feature 401 and 402（L_EFi）, also It is the center L in end effector or substrate_ECi）Constant can be counted as described above.Therefore, in arm During the movement of 330A, the radial position R of arm 330A at processing temperatures_ΔTWith calibration temperature T_REFUnder arm 330A footpath To position R_CTIt is in any pre-position（Such as, when sensor signal is from the feature or substrate for detection arm 330A Feature（As described above for Fig. 3 descriptions）The automatic wafers of one or more it is fixed in（AWC）During sensor 199A and 199B）By transporting Movable model and/or algorithm are closed from the geometry between the predetermined reference point in arm link 330AU, 330AF and 395 and arm 330A It is to generate.In an aspect, the predetermined reference point on arm is the referential for arm 330A（For example, in radial direction R, θ coordinates In system）And for transmission or the referential of process chamber（For example, in cartesian coordinate system）Come what is determined.

With reference to Fig. 3, Fig. 9 and Figure 13, wherein, for example, the radially extending arm 330A in motion model and/or algorithm Position R is set as the center of end effector 395, wherein：

, wherein,

, and

Wherein, DC is the known dimensions between sensor 199A and 199B, and Y3, Y2, Y1, X₂、X₁Similar to being retouched above State.

In addition, as previously described herein, the radial position R of arm 330A is with transfer chamber 11025 and/or treating stations 11030 thermal change and change, and due to fuel factor produce radial position R_ΔTChange by sensor 199A and 199B is detected（As described previously herein）And it is input into motion model and/or algorithm, so that handling At a temperature of arm 330A radial position R (y)_ΔT（That is, such as by motion model or algorithm determine in the fortune along its axis Radial arm position in dynamic scope）With calibrating temperature T_REFUnder arm radial position R (Y)_CTIt is interrelated（Same such as this paper In before it is described）.In general, and as will be described in further detail, at processing temperatures and in calibration temperature T_REFUnder Arm radial position（R_ΔTAnd R_CT）Limit scale factor or expansion factor K_S, the scale factor or expansion factor K_STransporting It is used for the radial position R (Y) for establishing arm 330A in movable model or algorithm_ΔT。

In an aspect, controller 11091 includes exercise effect resolver 11091R（See Fig. 3）, exercise effect parsing Device 11091R is configured as the effect of motion model and/or algorithm sensitivity resolving to transfer chamber 11025 and/or treating stations The function of 11030 change in temperature Δ T.In an aspect, resolver 11091R is configured as by special to center certainty Sign 401 and 402 at least one edge detection come determine expansion factor change with the case of substrate transport equipment moving （Such as, radial motion）In the transmission by the relation between detections of the sensor 199A and 199B at least one edge, and And further the determined expansion factor of parsing changes the influence to expansion factor, so that it is determined that the change of arm.For example, parsing Device 11091R is configured as the size fixed in upper limit of movement of parsing arm 330A（Such as, for example, R_ΔT）, expansion factor K_SAnd The change of the size of arm 330A（Such as, caused by fuel factor）Between relation, as described further below.For example, Resolver 11091R can be decomposed by motion model and/or algorithm come realization factor, this（For example, by expansion factor or Scale factor K_S）So that the radial position R of SCARA arms 330A at processing temperatures_ΔTWith calibration temperature T_REFUnder SCARA The radial position R of arm 330A_CTCorrelation, wherein, K_SIt can usually be expressed as：

。

In an aspect, expansion factor K_SIt can be applied to all the time in calibration temperature T_REFUnder arm 330A footpath To position R (Y)_CT（For example, in calibration temperature T_REFUnder along Y-axis line arm 330A radial position, or in other words, without heat Effect）Value, so as in the range of the radial motion of arm 330A in the radial direction position of motion model and/or algorithm alignment arm 330A R is put, such as, the radial position R (Y) under treatment temperature or any other temperature_ΔT。

In other aspects, expansion factor K_SIt can be determined for removing to the fuel factor of arm 330A almost without contribution Arm member influence, be heat-staple and XC in end effector 395 such as_ΔTAnd YC_ΔT（See Fig. 4 A）Less constant In the case of, as described in this article.Wherein, K_SIt is determined for removing the arm structure almost without contribution to the fuel factor of arm 330A The influence of part, K_SIt can be expressed as：

And wherein, the radial position R of arm 330A is set to end effector center 395C（Xc and Yc）, such as in Fig. 9, figure Shown in 12 and Figure 13, L_EiEqual to L_ECi。

In an aspect, resolver 11091R can directly apply to expansion factor in motion model and/or algorithm K_S, to filter or compensate size L of the thermal change in arm 330A_UiAnd L_FiIn nonlinear effect, the nonlinear effect be by Arm 330A and nonlinear change in substrate processing system and the generation of other non-linear factors.Nonlinear change includes but unlimited In：Variable expansion in each arm link of arm 330A（Such as, upper arm 330AU and forearm 330AF are swollen with different speed It is swollen）, common base transmission equipment dissimilar arm 216A, 216B, 218A, 218B, 219A, 219B variable expansion（Such as, in the frog There are the feelings of multiple independent arms in the configuration of leg manipulator, in the symmetrical manipulator configuration in both sides or in substrate transport equipment Under condition, for example, seeing Fig. 2A, Fig. 2 C and Fig. 2 E）, substrate transport equipment different arm links or the temperature-changeable that is subjected to of dissimilar arm Degree（For example, arm（Or first arm）A part be subjected to and arm（Or second arm）The different temperature of another different piece Degree）.Example when an arm can suffer from the temperature different from another dissimilar arm of substrate transport equipment is：Work as substrate transport When equipment has the multiple arms self stacked, so that topmost arm can suffer from the temperature higher than foot arm（Example Such as, due to thermal gradient）.It is another when an arm of multi-arm substrate transport equipment can suffer from the temperature different from another dissimilar arm One example is：When an arm is used to pick up hot substrate all the time and another arm is used to pick up cold substrate all the time.Another example again It is：When forearm 330AF is extended in processing module and upper arm 330UA is retained in transfer chamber so that forearm 330AF is subjected to During higher than upper arm 330AU temperature.

In an aspect, resolver 11091R can be based on history and be configured to apply suitable filter （Such as, finite impulse filter or rolling average filter）, size L of the filter compensation thermal change in arm 330A_UiWith L_FiIn nonlinear effect, wherein, size L_UiAnd L_FiIn thermal change be by the nonlinear change in substrate processing system and Therefore nonlinear effect generation caused by, so as to establish the radial dimension R of arm 330A using motion model or algorithm (Y)_ΔT.In an aspect, resolver 11091R is applied directly to expansion factor K under heating environment and cooler environment_S, its In, expansion factor K_S(t)_iIt is to utilize arm 330A（Or it determines part, such as, predetermined reference point/benchmark described herein） Each when passing through sensor 199A and 199B during thermal transient determines through coming.By the expansion factor K when passing through every time_S (t)_iValue be input in resolver 11091R, and the renewal expansion factor K after each pass through_S(t) and controller is passed through 11091 are applied to the movement of arm 330A.The expansion factor K of the parsing_S(t) can be usually expressed as according to following form Finite impulse filter：

Wherein, the Δ t between i=successive arm 330A movements, and n is any suitable measurement window value（Such as, it is any suitable Integer value）.The expansion factor K parsed_S(t) can more specifically be expressed as：

Wherein, N_samplesIt is K_SThe number being sampled.

Therefore, the scope of the radial motion for arm 330A（In definite calibration temperature T_REFUnder calibration after it is any Given traveling time（i=1、2、3、...））, it is used for the radial motion for what arm 330A was determined by motion model or algorithm Radial dimension R (Y)_ΔTIt can be expressed as：

Wherein, R_CTKIt is in predetermined calibration temperature T by motion model or algorithm_REFThe correspondence radial motion of definite arm 330A down, And G is gain or zoom factor, it can be included to compensation in the relevant position of arm 330A（For example, substrate is kept Stand, processing module etc.）The predetermined variation that place identifies（Such as, stable state changes）.Therefore, R_iIt is the radial distance R of motion model, The motion model is compensated for thermal change effect（Such as, when the different connecting rods of arm are not under the steady temperature of equilibrium） And it is applied in determining that automatic wafer is fixed（AWC）It is as described earlier and with it with substrate holding/process station location Known to his mode.

In an aspect, expansion factor K_SThere can be configurable threshold value, wherein, the resolver of controller 11091 11091R is configured as in K_SRolling average filter is continuously applied during higher than predetermined threshold.Work as K_SDuring less than predetermined threshold, by In arm 330A upper arm 330AU and forearm 330AF thermal expansion in the movement of arm 330A caused error can be counted as Stable state, and rolling average filter can not be applied to expansion factor K_S, so that there is no filtering In the case of in motion model or algorithm by controller 11091 by expansion factor K_SIt is applied to the movement of arm.A side In face, resolver 11091R is configurable to based on the initial threshold K being set as needed_S(t-i)（For example, the initial threshold Can be K_S=1.0001）To start and/or the expansion factor K of analytic application_S(t)。

Resolver 11091R for motion model or algorithm can be configured as answer interim when arm 330A leaves unused With backfill value K_S(B).For example, resolver 11091R can be by one or many previously pickup/holding movables of arm 330A（Example Such as, the first forearm before arm becomes idle moves operation）Filtering swell value K_S(t) it is used as not filtering first in measurement window Beginning expansion factor K_S(B).In an aspect, backfill value K_S(B) can be depending in upper once arm 330A movements operation and again Start the idle period between the movement of arm 330A.In an aspect, any suitable backfill value K can be used_S(B), wrap Include the predetermined attenuation function based on idle period.Resolver, which is configured such that, to individually determine solution for each arm Analyse expansion factor K_S(t), for each AWC sensors（For example, for each sensor 199A and 199B or and respective substrates The corresponding each sensor group 199A1-199A7 of holding/treating stations 11030, is shown in Figure 1B）Individually determine parsing expansion factor K_S(t), the heat for one or more arm 330A, which increases, individually determines parsing expansion factor K_S(t) and for one or more The thermal contraction of a arm 330A individually determines parsing expansion factor K_S(t)。

As the example of the embodiment of expansion factor that is parsing and not parsing, with reference to Fig. 3, in an aspect, base Bottom transmission manipulator 330 keeps station pickup substrate S using end effector 395 is made by oneself from any suitable substrate（Figure 14, frame 1400）.As noted, in an aspect, thermal compensation is held in the case where end effector does not keep substrate S Capable（For example, the frame 1400 of Figure 14 is optional）And can be before base treatment or period is performed.Other In aspect, thermal compensation can be when substrate transport manipulator 330 is transmitting one or more substrate S on end effector 395 Synchronously it is performed.Substrate transport manipulator 330 is moved to substrate in such as transfer chamber or other controlled environments and keeps station 315 position.When the substrate of substrate transport manipulator 330 towards base treatment module 325 keeps the movement of station 315（For example, with Just place substrate S or reference characteristic 401 and 402 is moved through sensor 199A and 199B）, substrate S and/or end perform Device 395（For example, reference characteristic 401 and 402）Move through one or more sensors 199A and 199B（Figure 14, frame 1405）. Referring again to Fig. 4 A, in end effector 395 keeps in terms of substrate, one or more sensors 199A and 199B are synchronously Detect the leading edge and trailing edge of the substrate S for example at transition point 421-424（Figure 14, frame 1410）.In an aspect, for example, In addition to the detection to transition point 421-424 or instead of the detection（For example, the detection in the frame 1410 of Figure 14 to substrate It is optional in an aspect）, one or more sensors 199A and 199B are also synchronously detected at transition point 425-428 One or more reference characteristics 401 and 402 leading edge and trailing edge（Figure 14, frame 1415）.At each transition point 421-428, One or more sensors 199A and 199B sends signal to indicate to have occurred corresponding transition point 421-428 to controller 11091 （Figure 14, frame 1420 and 1421, it is noted that frame 1420 only just occurs when end effector remains substrate）, and In response to the signal, the encoder of substrate transport manipulator 330 sends signal to indicate substrate transport machinery to controller 11091 The position of hand 330（For example, controller 11091 detects in response to transition point and receives encoder data）（Figure 14, frame 1425）.This The thermal change effect being simultaneously notified of in end effector center and arm size.Controller 11091 is configured as being based on Encoder data identifies changing and determining change and the arm for making size for the size of the arm 330A of substrate transport manipulator 330 The relevant expansion factor K of size of 330A_S.In an aspect, at processing temperatures（For example, under Δ T）End is performed Device reference position（In an aspect, its be end effector 395 center 395C）Thermal compensation or its expansion factor K_S It is definite based on such as getting off：For example, substrate transport manipulator 330 is in one or more transition point 425-428（Such as, for example, transition Point 428）The radially extended position R at place_ΔT.For example, when sensor 199A detects transition point 428 and substrate transport equipment 330 When encoder 331 sends position signal to indicate the position of substrate transport equipment 330 to controller 11091, pass through controller 11091 determine R_ΔT（Figure 14, frame 1430）.As noted, R_ΔTWith the base caused by such as thermal expansion or contraction The arm 330A of bottom transmission manipulator 330 is corresponding or otherwise to the change in size of shoulder Z from sensor 199A React the change in size.In this way, as described above, for example, generally simultaneously warm in processing to determine with base treatment The position XC of end effector reference point 395C under degree_ΔTAnd YC_ΔTOr R_ΔT（Figure 14, frame 1435）.Controller 11091 will also Expansion factor K_SMake comparisons with predetermined threshold, and if expansion factor K_SValue be higher than predetermined threshold, then when according to being retouched above When the mode stated is to determine the movement of arm 330A, rolling average filter as described above is directly applied to expansion factor K_S （Figure 14, frame 1440）.If K_SValue be less than predetermined threshold, then when determine arm 330A movement when, do not filtering generally In the case of apply expansion factor K_S。

The another aspect of system and method described herein provides a kind of method, and this method is used to estimate described herein Transmission manipulator each single executor/arm link temperature and corresponding thermal expansion, and in view of transmission manipulator arm The nonlinear effect of movement.As an example, clearly to calibrate transmission manipulator arm equation of motion more accurate to report for this method True transmission manipulator arm position.In addition, once transmission manipulator reaches stable state, this method of description more detail below Just analog result is reported to current embodiment.

As noted, in the illustrative aspect of disclosed embodiment, with reference to Figure 12 and Figure 13, controller 11091 are configured as identifying the nonlinear effect to fuel factor relational model from following parameter：

Depending on link angle（For example, such as figure 12 illustrates ε i and β i）KS parameters, and

The temperature of upper arm and forearm can be different（See Figure 15）And can be as the change of time be with the speed different from calculating KS Rate changes.

Referring again to Figure 15, contrast and represent relative to the upper arm temperature curve 1500 of time it illustrates representational The forearm temperature curve 1501 relative to the time of property.The representativeness upper arm temperature curve 1500 and representative forearm temperature curve 1501 be with heat treatment module（For example, processing module is under operation temperature）Exemplary client using it is upper observe 's.As that can see in fig.15, even if when transportation manipulator reaches stable state（For example, hot stable state）When, in transfer arm（It is all Such as, for example, the transfer arm 330A illustrated in fig. 12）Upper arm and forearm between there is also temperature gradient.

Figure 16 illustrates the another exemplary embodiment of the end effector 395 according to the aspect of disclosed embodiment, example Such as, end effector 395 has two reference characteristics 1600 and 1601（It is similar to that described above those end effectors）, Two reference characteristics 1600 and 1601 are located at the different motion position on end effector 395.As noted, base Quasi- feature 1600 and 1601 is representative to be configured and is only shown for example purposes on the side of end effector 395 Go out, however, in other aspects, reference characteristic can be arranged on the opposite side of end effector 395（As described above 's）For making K as described above_SValue equalization.Equally, in other aspects, reference characteristic 1600 and 1601 In one or two can be center Xc and Yc qualitative features really, or be configured to determine that any of transfer arm Other suitable positions（As described above）.In other aspects, reference characteristic 1600 and 1601 can be provided with other Reference characteristic, other reference characteristics are used to determine such as center Xc and Yc（Or the other positions of transfer arm）.One In a aspect, direction 499 that reference characteristic 1600 and 1601 is radially extended/retracted（For example, as generated as motion model Predetermined extension size, is shown in Figure 15 and Figure 17）Linearly displacement, so that the correspondence for each reference characteristic 1600 and 1601 K_SValue（KS1 and KS2）Realize that the nonlinear effect set in upper arm and forearm noted above for given temperature contributes it Between distinguish.Due to the movement of each reference characteristic 1600 and 1601 for example when detecting each reference characteristic 1600 and 1601 Difference, so corresponding K_SValue（Such as, in the identical process of sensor 199A and 199B（For example, in coextensive or retraction Move through（It is multiple）In sensor）, it is related to the detection of the sensor 199A and 199B of reference characteristic 1600 and 1601 respectively The KS1 and KS2 of connection）It is substantially different.Correspondingly, corresponding K_SValue（Such as, K_S1 and K_S2）Therefore instruction is may be used to provide with table Temperature gradient between bright upper arm link and forearm link.Therefore, compared with conventional thermal compensation algorithm, transmission manipulator movement It can be calibrated so that the position that end effector 395 is reported in the case where accuracy improves.

In an aspect, with reference to Figure 16 and Figure 17（For example purposes, which illustrates the configuration of frog leg arm, but should manage Solve, the configuration of SCARA arms is equally applicable in terms of disclosed embodiment, both sides symmetric arms configure and above-described Other arm configurations, such as, for example, referring to Fig. 2A to Fig. 2 E）, K_S1And K_S2Between relation --- be otherwise expressed as K_S1：K_S2（Wherein, K_S1And K_S2It is and each 1600 and 1601 associated corresponding K of reference characteristic_SValue, such as previously described above 's）It is to depend on upper arm link 330AU（Equally see L_Ui）And forearm link 330AF（Equally see L_Fi）Corresponding thermal expansion/receipts The effect of contracting.The thermal expansion/contraction L of upper arm link_UiWith the thermal expansion/contraction L of forearm link_FiBetween any difference and Accordingly any difference caused between the temperature of the expansion/difference in shrinkage between upper arm link and forearm link all will be by K_S1：K_S2The correspondence reacting condition of relation comes out or is identified from the change.Therefore, arm 330A during thermal transient Circulated in different processes（For example, extension and/or contraction）When, with passing through every time（i）Under 1600 He of correspondence reference characteristic 1601 corresponding corresponding relative thermal expansion value K_S1(i)And K_S2(i)Determine to pass through for given when being relative to each other（i）Upper arm Connecting rod temperature T_UiWith forearm link temperature T_FiBetween hot discrepancy delta T_U/Ai.It should be noted that respective arms temperature T_UiAnd T_FiCan be with It is counted as being directed to corresponding arm link L_UiAnd L_FiCorrespondence length L1 and L2 equalization.In other aspects, respective arms temperature T_Ui And T_FiCan be with the precalculated position in somewhere in counterpart arm（Such as, at the endpoint of arm link, the centre of arm link or Along corresponding arm link L_UiAnd L_FiLength L1 and L2 any other position or multiple positions at）It is associated.It is also noted that Although by respective arms temperature T_UiAnd T_FiBetween relationship description as difference, but respective arms temperature T can also be used_UiWith T_FiBetween any suitable relation（For example, T_Ui：T_Fi）.

, can be by upper arm link L according to the another aspect of disclosed embodiment_UiWith forearm link L_FiIt is different corresponding Arm temperature（T_UiAnd T_Fi）Between unique relationship and different corresponding expansion factor K_Si1And K_Si2（With each reference characteristic 1600 and 1601 is associated）Between unique relationship express in consult table or any conjunction being stored in controller 11091 In suitable algorithm（See Fig. 1 and Fig. 3）.The relation that consult table/algorithm is embodied can be by experience or by suitably building Mould or its combination identify.

Referring again to Figure 19, it illustrates the schematic diagram of the aspect according to disclosed embodiment, which uses In the nonlinear change resolver 1950 for determining calibration position of manipulator（It can be a part for controller 11091）.According to The aspect of disclosed embodiment, it is described as described above for such as Figure 12 and Figure 13, for each 1600 He of reference characteristic 1601 calculate K_S1And K_S2Value（Figure 20, frame 2000）.In an aspect, by K_S1And K_S2Value be input to such as consult table Or in any suitable algorithm 1900（Figure 20, frame 2005）, the consult table or any suitable algorithm 1900 export respectively Upper arm link 330AU, L_UiWith forearm link 330AF, L_FiModeling temperature T_UiAnd T_Fi（Figure 20, frame 2010）, wherein, upper arm connects Bar 330AU, L_UiWith forearm link 330AF, L_FiThere is respective link length L1i and L2i at a temperature of predetermined calibration.At one In aspect, modeling temperature information is input in Model of Heat Expansion 1910（Figure 20, frame 2015）, which predicts Expansion（Or shrink）Length of connecting rod（For example, in fig. 17 by connecting rod 330AU' and 330AF' represent L1i+ Δs L1i and L2i+ Δ L2i, it is as caused by thermal benefit）, and use the length of connecting rod L1+ Δ L1 and L2+ Δs L2 calibrations for expansion Motion model 1920 calculate the transmission manipulator position of calibration（Figure 20, frame 2020）, it is noted that the length of end effector 395 Degree L3 be generally it is constant, as described above.

In the one side of disclosed embodiment, according to similar to manner described above, referring again to Figure 16, benchmark Feature 1600 and 1601 is provided to substrate S's in substrate/end effector is by the once process of sensor 199A and 199B Center determines（See Fig. 4 A）And the center of end effector 395 is determined（For example, do not instruct wafer be used for record relative to Stand center end effector center --- the center SC of station is taught to substrate transport equipment 330）.For example, as described above , sensor 199A and 199B（Equally see Fig. 4 A, it is oppositely arranged on the opposite side of end effector center line CL, but It need not be arranged symmetrically）There is predetermined spatial relationship with station center SC（Equally see Fig. 4）, so that sensing reference characteristic （Such as, reference characteristic 1600 and 1601）Both it is used to determine in end effector center or reference position 395C, substrate/wafer Heart WC（Equally see Fig. 4）It is also used for understanding station center SC.For example, 1600 He of reference characteristic by reference end effector 395 The teaching of 1601 couples of station center SC（And crystal circle center determines）It is described, it will be appreciated that, substrate/crystalline substance can also be used Circle S instructs station center SC in a similar manner.In an aspect, move end effector 395（Figure 21, frame 2100） To make substrate S and/or reference characteristic 1600 and 1601 be moved towards sensor 199A and 199B.Substrate S is to utilize sensor To sense（Figure 21, frame 2105）, and reference characteristic 1600 and 1601 is sensed using sensor（Figure 21, frame 2110）, and And to the position of base center WC and substrate transport equipment（That is, reference position 395C）It is definite be in any suitable manner （Such as, in manner described above（For example, such as, by using circle VRW1 as described herein））Come what is determined（Figure 21, frame 2115 and 2120）.As can be appreciated, due to sensor 199A and 199B relative to station center SC position be It is knowing and since base center WC is generally consistent with end effector center reference point 395C, so substrate keeps station opposite It is also known in the position of end effector center reference point 395C and is taught and gives substrate transport equipment, wherein, sensing Substrate S and/or reference characteristic 1600 and 1601 understand in end effector once passing through from sensor 199A and 199B（Or step Suddenly）It is middle to realize to the end effector reference point 395C relative to station center（That is, the position of substrate transport equipment）Record（Figure 21, frame 2125）.

In another aspect, relative to station center SC to the record of end effector center 395C and to base center WC Determine can be using once pass through or repeatedly determined through coming.For example, referring now still to Figure 16, heart 395C and station in the substrate Position SC is waited in the case of being taught, and moves end effector 395（Figure 22, frame 2200）To make substrate S and/or benchmark Feature 1600 and 1601 is moved towards sensor 199A and 199B.Substrate S is sensed using sensor（Figure 22, frame 2205）, And reference characteristic 1600 and 1601 is sensed using sensor（Figure 22, frame 2215）, and to base center WC and substrate The position of transmission equipment（That is, reference position 395C）It is definite be in any suitable manner（Such as, in above-described side Formula（For example, such as, by using circle VRW1 as described herein））Come what is determined（Figure 22, frame 2220 and 2225）.Relatively In station, center SC to the record of end effector center reference point 395C is realized according to mode as described above（Figure 22, Frame 2230）.

In the case where only determining base center 395C, move end effector（Figure 22, frame 2200）So that base Bottom is mobile towards sensor 199A and 199B and senses substrate as described above（Figure 22, frame 2205）.Determine The center of substrate（Figure 22, frame 2210）So that it can place the substrate above at station location SC.In an aspect, in erect-position SC is put by before instructing again（In the case where substrate is kept or is not maintained on end effector 395）It will can appoint What appropriate number of substrate is transferred to station location SC or is transferred out of from station location SC.For example, can placed 10 substrates, Station location SC is instructed after 20 substrates or any other appropriate number of substrate.In other aspects, can be in any conjunction Suitable predetermined time interval（For example, 30 minutes, 60 minutes or any other suitable time interval）Station location is instructed afterwards SC.Substrate station SC can be instructed by making end effector be moved towards sensor 199A and 199B（Figure 22, frame 2200）With Just so that sensing reference characteristic 1600 and 1601（Figure 22, frame 2215）.End effector center 395C is according to being retouched above The mode stated determines（Figure 22, frame 2220）And it is according to above to the record at end effector center relative to station center SC Described mode carries out（Figure 22, frame 2230）.If end effector remains substrate, while the center SC of station is taught, Then can be in end effector from the identical process of sensor 199A and 199B（For example, in once passing through）Or in end Actuator determines the center WC of substrate in passing through by second of sensor 199A and 199B, so that in different processes Upper teaching base center WC and station center SC.

Referring again to Figure 18, example chart is illustrated according to the aspect of disclosed embodiment for transfer arm（Such as, Transfer arm described herein）Thermal compensation 1810 and according to conventional prior art compensated technology vulcanizing for transfer arm Repay the comparison between 1800.In the example chart of Figure 18, the position error of transfer arm is drawn out for the time, wherein, can With it is seen that, when compared with conventional thermal compensation algorithm, increase is provided according to the thermal compensation of the aspect of disclosed embodiment Positional accuracy.

With reference to Figure 23, in the one side of disclosed embodiment, come according to the mode similar to manner described above The thermal compensation of transfer arm is provided, wherein, and once arm reaches steady temperature state during the transition when the temperature of arm rises When, parse/determine the conduct caused by the different temperatures of each arm link for each arm link of transmission manipulator The straggling effect of the length change of the function of temperature（For example,）.This aspect of disclosed embodiment is on true Fixed and transmission equipment 2300 of the compensation with SCARA arms 2300A thermal change is described, however, disclosed embodiment This aspect may be equally applied to any suitable transfer arm, such as, those described above arm, and include but not limited to The configuration of leapfrog arm, the configuration of both sides symmetric arms and hinged wrist configuration.In general, transmission equipment 2300 includes SCARA arm 2300A, SCARA arms 2300A has upper arm 23201, forearm 23202, substrate keeper 23203 and drive section 23204.Control Device 11091 can be connected to transmission equipment 2300 as needed to move the arm section of SCARA arms 2300A.In other sides In face, arm component can have any other desired general SCARA configurations.For example, the component can have multiple forearms and/ Or multiple substrate keepers.

The shaft assembly 23754 at wrist 23755 that substrate keeper 23203 passes through transmission equipment 2300 rotatably connects It is connected to forearm 23202.Substrate keeper 23203 can be rotationally attached to forearm 23202 by support shaft 23698.One In a aspect, substrate keeper 23202 can be forked end portions actuator.Substrate keeper 23203 can have active mechanical Clamping piece or reactive edge clamping piece.In other aspects, substrate keeper 23202 can be the paddle for having vacuum cup End effector.Forearm 23202 is rotatably connected by coaxial shaft assembly 23675 at the ancon 23646 of transmission equipment 2300 It is connected to upper arm 23201.Substrate keeper 23203 has to center in advance, here, end effector is configured to keep substrate to make Obtain the center of substrate and the pre- of end effector centers unanimously, which is used in substrate processing apparatus（Such as originally Those described substrate processing apparatus of text）Interior transmission substrate.Upper arm 23201 is rotationally attached to drive at shoulder 23652 Dynamic section 23204.In this aspect, upper arm 23201 and forearm 23202 have equal length, but in other aspects, example Such as, upper arm 23201 can be shorter than forearm 23202 in length or vice versa.

In shown in terms of, drive section 23204 can have shell body 23634H, shell body 23634H to house Coaxial shaft assembly 23660 and three motors 23662,23664,23666.In other aspects, drive section can have more In or less than three motors.Drive shaft assembly 23660 has three drive shafts 23668a, 23668b, 23668c.In other sides In face, more or less than three drive shafts can be provided.First motor 23662 includes stator 23678a and rotor 23680a, Rotor 23680a is connected to interior axle 23668a.Second motor 23662 includes stator 23678b and rotor 23680b, rotor 23680b It is connected to jackshaft 23668b.3rd motor 23666 includes stator 23678c and rotor 23680c, and rotor 23680c is connected to outer Axis 23668c.Three stators 23678a, 23678b, 23678c along at the different vertical height of housing or position regularly It is attached to housing 23634H.In this aspect, the first stator 23678a is bottom stator, and the second stator 23678b is middle fixed Son, and the 3rd stator 23678c is top stator.Each stator generally includes electromagnetic coil.Three axis 23668a, 23668b, And 23668c is arranged to co-axial shafts.Three rotors 23680a, 23680b, 23680c are preferably by set of permanent magnets into but can The magnetic induction rotor without permanent magnet can alternatively be included.Sleeve 23663 is between rotor 23680 and stator 23678 To allow transmission equipment 2300 to be used in vacuum environment, wherein, drive shaft assembly 23660 is located in vacuum environment and fixed Son 23678 is outside vacuum environment.However, if transmission equipment 2300 is merely intended to be used in atmospheric environment, it is not required Sleeve 23663 is provided.

First axle 23668a is interior axle and extends from bottom stator 23678a.Interior axle has and 23678a pairs of bottom stator Accurate the first rotor 23680a.Jackshaft 23668b is upwardly extended from intermediate stator 23678b.Jackshaft has and the second stator Second rotor 23680b of 23678b alignments.Outer shaft 23668c is upwardly extended from top stator 23678c.Outer shaft have with it is upper fixed The third trochanter 23680c of sub- 23678c alignments.It is each to allow that multiple bearings are provided around axis 23668 and housing 23634H Axis can independently be rotated with housing 23634H relative to each other.Each axis 23668 can be equipped with suitable position sensor so as to The signal on rotation position of the axis 23668 relative to each other and/or relative to housing 23634H is sent to controller 11091. Any suitable sensor, such as, optics or inductive pick-up can be used.

Outer shaft 23668c is fixedly connected to upper arm 23201 so that axis 23668c and upper arm 23201 enclose as a whole Rotated together around axis Z1.Jackshaft 23668b is connected to the first transmission device 23620 and interior axle in upper arm 23201 23668a is connected to the second transmission device 23610 in upper arm 23201, as figure 23 illustrates.First transmission device 23620 Preferably include driving wheel 23622, free pulley 23624 and driving hawser or band 23626.Driving wheel 23622 is regularly pacified It is filled to the top of jackshaft 23668b and by driving band 23626 to be connected to free pulley 23624.Free pulley 23624 is regularly Install to the bottom of the interior axle 23672 of coaxial shaft assembly 23675 so as to which forearm 23202 is connected to upper arm 23201.Upper arm The second transmission device 23610 in 23201 preferably includes driving wheel 23612, free pulley 23614 and driving band or cable Rope 23616.Driving wheel 23612 is fixedly mount to the interior axle 23668a's of the coaxial shaft assembly 23660 in drive section 23204 Top.Free pulley 23614 is fixedly mount to the bottom of the outer shaft 23674 of coaxial shaft assembly, so that forearm 23202 be connected to Upper arm 23201.Driving wheel 23612 is connected to free pulley 23614 by driving band 23616.The free pulley of first transmission device 23626 Between between 23624 and driving wheel 23622 and the second transmission device 23610 free pulley 23614 and driving wheel 23612 Diameter ratio（For example, multiplying power ratio）Can be any suitable gearratio, such as, those gearratios described herein.Driving Band 23616 and 23626 is configured to make corresponding free pulley 23614 and 23624 identical with corresponding driving wheel 23612 and 23622 Side rotate up（For example, driving wheel 23612 and 23622 rotates clockwise the up time for causing free pulley 23614 and 23624 Pin rotates）.

The coaxial shaft assembly 23675 that forearm 23202 is connected to upper arm 23201 is rotatably supported by suitable bearing On upper arm 23201, which allows the outer shaft 23674 of shaft assembly and interior axle 23672 to surround axis Z2 relative to each other Rotated with upper arm 23201.The outer shaft 23674 of coaxial shaft assembly 23675 is fixedly mount to forearm 23202 so that axis 23674 and forearm 23202 rotated together around Z2 as a whole.When making upper arm by the interior axle 23668a of drive section 23204 When the free pulley 23614 of the second transmission device 23610 in 23201 rotates, forearm 23202 is rotated around axis Z2.Therefore, drive The interior axle 23668a of dynamic section 23204 is used to independently make forearm 23202 rotate relative to upper arm 23201.

The interior axle 23672 of coaxial shaft assembly is securely attached to the driving of the 3rd transmission device 23752 in forearm 23202 Wheel 23753.The 3rd transmission device 23752 in forearm 23202 preferably include driving wheel 23753, free pulley 23750 and Driving band or hawser 23751.Free pulley 23750 is fixedly mount to axis 23698.Driving band 23751 connects driving wheel 23753 It is connected to free pulley 23750.Axis 23698 is pivotally supported on forearm 23202 by suitable bearing, which allows Axis 23698 is rotated around axis Z3 relative to forearm 23202.In this aspect, the free pulley of the 3rd transmission device 23752 Diameter ratio between 23750 and driving wheel 23753 is any suitable gearratio, such as, those gearratios described herein. Driving band 23751 is configured to make free pulley 23750 rotate up in the side identical with driving wheel 23753（For example, driving wheel 23753 rotate clockwise can cause rotating clockwise for free pulley 23750）.

Axis 23698 is fixedly mount to substrate keeper 23203.Therefore, 23203 conduct of axis 23698 and substrate keeper Rotated together entirely around axis Z3.When rotating the free pulley 23750 of the 3rd transmission device 23752 by driving wheel 23753 When, substrate keeper 23203 is rotated around axis Z3.Make drive further through the interior axle 23672 of coaxial shaft assembly 23675 in turn Driving wheel 23753 rotates.When the jackshaft 23268b by drive section 23204 makes the first transmission device in upper arm 23201 When 23626 free pulley 23624 rotates, interior axle 23672 rotates.Therefore, before substrate keeper 23203 can be independently relative to Arm 23202 and upper arm 23201 are rotated around axis Z3.

Referring again to Figure 24, in an aspect, transmission equipment 2300 can include two end effector 23203A and 23203B, two the end effectors 23203A and 23203B are abreast located such that essentially simultaneously to pass substrate S Transport to the processing module PM equally abreast positioned and substrate S is removed from processing module PM.In an aspect, two End effector 23203A and 23203B can surround wrist axis Z3 and can independently move relative to each other.For example, driver 23204 can include further drive shaft and motor for realizing end effector a 23203A and 23203B relative to another The movement of end effector 23203A and 23203B.

With reference to Figure 25, in an aspect, transmission equipment 2300 can include two SCARA arm 25155A and 25155B, Two SCARA the arms 25155A and 25155B are substantially similar to arm 2300A.For example, each SCARA arms 25155A and 25155B Including upper arm link 25155UA and 25155UB, forearm link 25155FA and 25155FB and end effector 25155EA and 25155EB.In this aspect, end effector 25155EA and 25155EB are dominated by upper arm, but in other aspects, end Actuator can independently be driven.Arm 25155A and 25155B are shown as three-link SCARA arms, and can coaxially join Drive section 23204 is connected to, and can vertically self be stacked to allow independent θ to move（For example, use four axis Driver --- see drive shaft 23668d）Or the θ movements of connection（For example, use Three-axis drive device）, wherein, the θ fortune of connection Dynamic is the rotation that mechanical arm is carried out around shoulder Z1 as a whole, generally without extension or is shunk.Each arm 25155A and 25155B is driven by a pair of of motor and can have any suitable driving wheel arrangement.In an aspect, it is Non-restrictive illustrative purpose, for the diameter ratio between the shoulder wheel, ancon wheel and wrist wheel of each arm can be 1: 1:2 ratios or 2:1:2 ratios.For example, use 1:1:2 ratios extend each arm, then each motor in a pair of of motor Rotated up in substantially equal and opposite side.For example, use 2:1:2 ratios extend each arm, then shoulder wheel is substantially On be retained as fixing（For example, substantially without rotation）And make to be attached to the motor rotation of upper arm to extend arm.It is logical Crossing makes each motor generally rotate at the same speed to control θ to move in a same direction.It is in end effector When in identical plane, the θ movements of each arm relative to each other are restricted, if however, these arms move together, arm can Ad infinitum to be moved in θ.As can be appreciated, in the case of being not in end effector in identical plane, when every When a arm is driven independently of another arm（Such as, when using four axis drivers）, each arm can ad infinitum move in θ It is dynamic.

As noted, in this aspect, and once arm reaches steady during the transition when the temperature of arm rises During state state of temperature, parse/determine due to each arm for each arm link of the SCARA arms illustrated in Figure 23 into Figure 25 Caused by the different temperatures of connecting rod as temperature function length change straggling effect（For example,）. This, is along each SCARA arms there may be temperature gradient, wherein, the temperature T of end effector_EE（And the temperature of wrist axis T_W）More than the temperature T of forearm link_F（And the temperature T of elbow axis_EL）, and the temperature T of forearm link_F（And ancon axis The temperature T of line_EL）More than the temperature T of upper arm link_U（And the temperature T of shoulder_S）（That is, T_EE/T_W＞ T_F/T_EL＞ T_U/T_S）. It is to be understood that temperature gradient can reside in each arm link, wherein, the distal end of arm link（For example, arm link is farthest away from shoulder The end of axis Z1）Temperature higher than identical arm link near-end temperature.With reference to Figure 26 and Figure 27, it is illustrated that performed in end The chart of simulation migration at device crystal circle center point EEC, illustrates half angle value for SCARA arms in figure 27.In Figure 27 Chart is illustrated along both X-axis line and Y-axis line（Especially around sensor trigger positions（For example, around 100 degree of folder Angle））Error.

In this aspect, it is contemplated that the length change Δ L of end effector_EEAnd shadow of the temperature on wrist axis Z3 Ring.Equally, in this aspect, it is contemplated that for example due to the changes delta L to arm link length_i（Wherein, i=upper arm link, preceding Arm link and end effector）With wheel effect Δ V_i（Wherein, i=shoulder wheel, ancon wheel and wrist wheel）Summation（That is, ∑ ΔL_i, Δ V_i）Caused by the end effector at the position of the heart generate nonlinear effect Δ X and Δ Y wheel effect Δ V. In this aspect, referring again to Figure 26, due to such as thermal expansion of SCARA arm members in shoulder Z1（It is fixed on X-Y In plane）Caused SCARA arms change is to come from SCARA arm links between end effector crystal circle center point EEC（For example, Upper arm, forearm and end effector）Thermal linear expansion and non-uniform temperature from different SCARA arm links Distribution.As an example, the non-uniform Temperature Distribution of different SCARA arm links is due to from end effector to shoulder The non-uniform temperature that one or more the decay heat state paths and SCARA arm links of Z1 are undergone, wherein, for example, end Portion's actuator is exposed to the temperature higher than forearm and upper arm.In addition, the non-uniform temperature meeting that corresponding SCARA arm links are undergone So that thermal expansion occurs for each wheel, which can cause the diameter of each wheel to change, and the diameter change can cause SCARA arms Shoulder wheel, the wheel gearratio between ancon wheel and wrist wheel changes.

Referring now still to Figure 26, in this aspect, at least one SCARA arms 2300A includes at least one posture certainty feature Or flag F 1-F4（It can also be referred to as reference characteristic herein, and in an aspect, it can be similar to described above Mark, either subsequent in terms of in its can be similar to the edge of a part for end effector or SCARA arms its Its connecting rod）, at least one posture certainty feature or flag F 1-F4 and SCARA arms 2300A compositions are overall, wherein, each The deterministic configurations of flag F 1-F4, for example, passing through one or more sensors 199（See Figure 24）Sense at least one During flag F 1-F4, the Discrete Change Δ L of the length of SCARA arm links 23201,23202,23203 is determined_iAnd due to each Wheel effect Δ V caused by the temperature change of corresponding SCARA arm links 23201,23202,23203_i.For example, at least one mark F1-F4 is arranged on SCARA arms, so that the static detection sensor of substrate processing apparatus（Such as, similar to sensor The sensor 199 of 199A and 199B）At least one flag F 1-F4 is synchronously detected in SCARA 2300 radial motions of arm extremely A few edge.Here, the configuration of flag F 1-F4 is determined due at each SCARA arm links 23201,23202,23203 Different temperatures change Delta T_iEach discrete change of difference of caused each different SCARA arm links 23201,23202,23203 Change（For example, Δ L_i）Between difference, and therefore differentially the corresponding different Discrete Changes of application determine that respective wheel changes ΔV_iAnd the correspondence nonlinear effect of the change to SCARA arms（Contribution）.Discrete Change can utilize corresponding scale factor Or expansion factor（K_S(i)）To express, as described above, the scale factor or expansion factor（K_S(i)）Make change with it is pre- Determine reference（For example, reference temperature T_REFWith the initial length of connecting rod L under reference temperature_i）Correlation, as noted above and It is described below.

The difference for being configured to determine 3 link SCARA arm 2300A of flag F 1-F4（Or according to above in each difference Certainty difference between Discrete Change）, 3 link SCARA arm 2300A have upper arm link 23201, forearm link 23202, And end effector 23203, but in other aspects, flag F 1-F4, which can have, to be used to determine n pitman arms（For example, have The arm of any appropriate number of arm link）Difference any suitable configuration.Flag F 1-F4's is configured to using single A sensor 199 synchronously senses at least one edge of one or more flag F 1-F4 to determine difference in once passing through Discrete Change（ΔL_i、ΔV_i）Or（It is multiple）Expansion factor K_S(i)Between difference, following article for equation [1]-[4] more Add detailed description.

In an aspect, controller 11091（Or the movement resolver 11091K of controller）It is configured as from passing through Detection of the sensor 199 at least one edge of flag F 1-F4 and determine in the transmission each arm link 23201,23202, 23203 respective different Discrete Change Δ L_i, and determining from shoulder Z1 to the reference position of end effector 23203 EEC（That is, wafer/end effector center）SCARA arms change（For example, Δ X, Δ Y or R, θ）When it is different from Dissipate and distinguished between changing.As noted, it is expressed as and each arm link 23201,23202,23203 by the change Corresponding expansion factor K_S(i)In the case of, controller 11091 be configured as from the detection to flag F 1-F4 and in the transmission Determine the different expansion factor K of each corresponding arm link 23201,23202,23203_S(i)Between discrete relationship so that true When determining the change of the reference position EEC of end effector 23203 in different correspondence arm links 23201,23202,23203 not With discrete element K_S(i)Between distinguish.In other words, controller includes exercise effect resolver, the exercise effect resolver quilt Be configured to from by detection of the static detection sensor 199 at least one edge of flag F 1-F4 and in 2300 footpath of SCARA arms To determining determined scale factor K in the transmission during movement_S(i)From each different arm links of SCARA arms 2300A 23201st, 23202,23203 respective each different Discrete Change Δ L_iBetween discrete relationship so that in SCARA arms 2300A The change of SCARA arms is synchronously determined during radial motion.Controller 11091 is configured as passing through sensor in SCARA arms 2300 In 199 once process SCARA arms 2300A is determined from the detection at least one edge to one or more flag F 1-F4 Changes delta X, Δ Y.In addition, controller 11091（Or movement resolver 11091K）Parsing is configured as due to temperature change ΔT_iCaused respective wheel（For example, see the wheel 23750,23753,23264,23612,23622 in Figure 23）Nonlinear motion Effect Δ V_i, so that in the different of the respective wheel caused by the different temperatures at shoulder joint or wheel axis Z1, Z2, Z3 Corresponding nonlinear motion effect Δ V_iBetween distinguish.With nonlinear motion effect Δ V_iCorresponding wheel change can be by table Up to the wheel gearratio between the wheel at the opposite end of each corresponding arm link 23201,23202,23203.

With reference to Figure 26, for example purposes with for the sake of convenience, transmission equipment is illustrated as having single SCARA arms, its In, the upper arm link 23201 and forearm link 23202 of SCARA arms 2300A are illustrated as in reference temperature T_REFHave down identical Length L, however, in other aspects, upper arm link and forearm link can have length not etc..In other aspects, Disclosed embodiment can be applied to each arm of multi-arm transmission manipulator（For example, as shown in fig. 25）And/or application At most each end effector of end effector arm（As shown in fig. 24）.In addition, for example purposes and conveniently For the sake of, SCARA arm links are to be formed by similar material construction so as to similar thermal coefficient of expansion, but in other aspects In, arm link can be formed so as to different thermal coefficient of expansions by different material constructions.In an aspect, it is only Exemplary purpose, upper arm link 23201 and forearm link 23202 are by respective motors axis drives, and end effector 23203 Dominated by upper arm link 23201.SCARA arms 2300A is illustrated as identical before and after thermal expansion in fig. 26 Under motor position（The arm of thermal expansion is illustrated by dotted line）.The general motion of SCARA arms can be represented as：

Under reference temperature：

After temperature rising and thermal expansion：

Wherein：

And G1 and G2 are the wheel gear ratio to ancon for upper arm to ancon and wrist.

In calibration temperature T_REFUnder, upper arm link 23201 and forearm link 23202 have length L respectively.Change in temperature Afterwards, the length of upper arm link 23201 is represented as L1 and the length of forearm link 23202 is represented as length L2.

At identical motor position, it is assumed that upper arm temperature changes Δ T1, and forearm temperature changes Δ T2, and Thermal coefficient of expansion for upper arm link 23201 is α 1 and is α 2 for the thermal coefficient of expansion of forearm link 23202, then swollen in heat Upper arm lengths L1 and forearm L2 after swollen are：

Wherein, expansion factor is defined as：

。

Since temperature is to be distributed from end effector 23203 to the shoulder Z1 of SCARA arms 2300A, especially in temperature During degree increases to stable state, so the temperature being distributed is due to taking turns so that different rates carry out thermal expansion and make SCARA shoulder joints（Example Such as, axis Z1, Z2, Z3）The multiplying power of the wheel at place is than changing.The thermal expansion of wheel can change angle and end effector orientation.Again It is secondary to become in the end effector on heart EEC with reference to Figure 27, the example of the analog result of the influence for showing wheel gearratio Change, it is assumed that each wheel is at different temperature, but length of connecting rod does not change.

Following form illustrates the exemplary wheel gearratio respectively taken turns for SCARA arms 2300A, wherein, it have identified wheel Position and represent diameter with universal measurement unit：

Position	Diameter
		UA（Upper arm）Shoulder	2
UA（Upper arm）Ancon	1
		FA（Forearm）Ancon	1
FA（Forearm）Wrist	2

Elbow axis Z2 is connected to for SCARA arm 2300A, shoulder Z1, wherein, transmission device includes having 2:1 Gearratio multiple wheels, and wrist axis Z3 is connected to elbow axis Z2, wherein, transmission device includes having 2:1 biography Multiple wheels of dynamic ratio.

It is assumed that it is Δ T2 that the temperature change at shoulder Z1, which is temperature change at Δ T1 and elbow axis, and α It is the hot coefficient of arm link material, then the multiplying power ratio of shoulder Z1 to elbow axis Z2 can be expressed as：

；

Use equation [3] and [4]：

Therefore, it is than the angle after changing in multiplying power：

It is assumed that the temperature change on end effector is Δ T3, then the multiplying power ratio between wrist axis Z3 and forearm axis Z2 can be with It is expressed as：

And expansion factor can be defined as：

Then：

Wherein, the angle change of end effector 23203 can be expressed as：

。

In an aspect, arm posture certainty feature or flag F 1-F4 form entirety simultaneously with end effector 23203 And any suitable position of end effector 23203 can be located at, as noted.It is same as noted, mark Remember being to determine property of F1-F4 so as in each different Discrete Change Δ L of different arm links 23201,23202,23203_iBetween, And distinguished between the different wheels of SCARA arms 2300A, or determine at least phase of 3 link SCARA arm 2300A Answer each different corresponding expansion factor K of arm link and/or wheel_S(i)And it is distinguished.With reference to Figure 28, which illustrates show Example property end effector 23203.In an aspect, in order to explain the thermal expansion of end effector 23203, end effector by Multiple segment L3-L7 constructions form, wherein, each segment L3-L7 can be by other segment L3- with end effector 23203 The same or different material constructions of L7 form.In this aspect, end effector 23203 includes four flag F 1-F4, but In other aspects, end effector 23203 can have any appropriate number of arm posture certainty feature.Here is example Property form, which illustrates the length and thermal coefficient of expansion of each segment L3-L7, but in other aspects, each segment can have Any suitable length and thermal coefficient of expansion, and flag F 1-F4 can be placed on any conjunction on end effector 23203 At suitable position.

Segment	Thermal coefficient of expansion（μm/(m.k)）	Length（mm）	Remarks
				L₃	α2	About 220	Upper ATEC marks on wrist to clip
L₄	α1	About 40	ATEC marks on titanium clip
				L₅	α3	About 110	EE（End effector）On angled edge
L₆	α3	About 50	The first planar edge on EE
				L₇	α3	About 130	EE centers

It is assumed that end effector by having the different materials segment of corresponding thermal coefficient of expansion to form respectively, then provides as follows Content：

Thermal expansion for each segment of end effector 23203 is：

Flag F 4：

Flag F 3：

Flag F 2：

Flag F 1：

End effector center EEC：

。

The certainty that the combination at flag F 1 to each edge of F4 limits arm posture certainty feature or flag F 1-F4 is matched somebody with somebody Put, so that it is determined that realizing the different Discrete Change Δ L to corresponding SCARA arm links_i（And the Δ V respectively taken turns_i）Determine, mark It is at least one relative to same tag in each edge of F1 to F4（It should be noted that the flag F 3, F3' in Figure 29 have two A angled edge）Or other edges of different flag F 1-F4 are angled（For example, be in non-zero angle, see flag F 2, The angle of F2', F3, F3', F4, F4', it has such as angle beta into Figure 31 in Figure 29₂, it is noted that（It is multiple）What is marked is each Angled edge has may be with angle beta₂Identical or different corresponding angle）.It should be noted that described herein What is marked（Including above with respect to those marks illustrated in Fig. 4 A to Fig. 5 with description）Can be on common mechanical arm（Such as, On end effector 23203）It is combined in any sequence, so that end effector includes angled mark （For example, it is in non-zero angle）With straight mark（For example, the mark of extension/retracted orientation of arm is essentially perpendicular to, for example, seeing Flag F 1 in Figure 29 to Figure 31, F1', F4, F4'）Combination.To the different Discrete Change Δ Li's of corresponding SCARA arm links Differentiation and each different corresponding expansion factor K to corresponding SCARA arm links/wheel_S(i)（For example, due to each SCARA arms The change in temperature Δ T of connecting rod/wheel_i）Carry out to should determine that and distinguish the change that can be realized to SCARA arms（Including becoming due to wheel Nonlinear effect caused by change）Determine.Here, as noted, figure 26 illustrates arm configuration include three SCARA arm links（For example, upper arm 23201, forearm 23202 and end effector 23203）, and flag F 1-F4 has respectively There is at least one edge, which can be detected by static detection sensor 199.Flag F 1-F4（It is or at least one Flag F 1-F4）At least one edge can be unnecessary and for filtering or provided static detection sensor 199 Sensor signal noise " smooth-going（smooth）" and be used to solve path as described below（For example, the R of SCARA arms Or radial motion）" rock（wobble）”.

With reference to Figure 1A, Figure 26 and Figure 27, as noted, controller 11091 can be configured as parsing due to The change in temperature Δ T of SCARA arm links and wheel_iCaused arm changes delta L_i（With Δ V_i）.For example, in order to determine to be drawn by thermal expansion The total drift or change of the SCARA arms 2300A risen, the rotationally-varying of manipulator frame is defined to by local X-Y coordinate（Example Such as, R- θ）, so that Y-axis line is in room temperature T_REFUnder radially extend and retracted orientation.For in room temperature T_REFUnder end The equation of the position of actuator 23203 can be represented as：

Wherein, L_EE0It is the disk body offset that end effector center EEC is offset to from wrist Z3（Term " disk body " is only herein For convenience's sake and it is not intended to be used to describing or limiting end effector structure configuration, which can With with any suitable configuration）, and θ is by motor T1 positions and T2 positions（For example, for driving upper arm 23201 with before The position of the drive shaft of arm 23203, wherein, domination of the end effector 23203 by upper arm 23201）The one of the angle determined Half.Y location with radial coordinate（R-θ）In R positions it is identical.

After temperature rise, the equation for the position of wrist joint Z3 can be represented as：

。

According to expansion factor K_S(i)Value, the position of wrist joint Z3 can be represented as：

。

The overall expansion of end effector 23203 can be represented as caused by thermal expansion（Use equation [15]）：

It can be represented as when being converted to X-Y coordinate：

And according to expansion factor K_S(i)Value expand aforesaid equation：

。

Knowing K_SThe factor（Or the temperature at all SCARA arm links）In the case of, above-mentioned equation can be used Formula calculates the offset of the wafer caused by thermal expansion and end effector 23203 for any given half angle theta.

Referring now to Figure 29 to Figure 31（Each attached drawing is shown according to the different aspect of disclosed embodiment with its other party The different examples for the suitable mark configuration that formula is schematically illustrated in Figure 26 and Figure 28）, by the side to detecting flag F 1-F4 Edge and definite different expansion factor K_S(i)With in different expansion factor K_S(i)Between distinguish and be described.In one aspect In, in order to calculate thermal migration, determine the expansion factor K in equation [24] and [25]_S(i).As described earlier, this can To be accomplished by the following way：The edge and wrist markers of end effector 23203 are detected using static detection sensor 199 The trigger position change of F1-F4.This equivalent to by known target place in systems and measuring signal change so as to reverse Calculate expansion factor K_S(i)Value.In an aspect, signal intensity is probably as caused by following reason：Connecting rod it is linear Expansion, due to for example uneven temperature distribution under joint expansion caused by SCARA arms wheel multiplying power than change and/ Or mark/end effector edge alignment change caused by multiplying power is than change.

SCARA arms（Such as, arm 2300A）In thermal expansion linear expansion and multiplying power ratio can be caused to change, and can create Captured in position（Such as, when sensing mark or when sensing the edge of end effector）Answering between thermal expansion Miscellaneous nonlinear equation.Therefore, the being to determine property of configuration of flag F 1-F4, for determine each SCARA arm links 23201, 23202nd, 23203 respective different expansion factor K_S(i), and in end effector 23203 by static detection sensor 199 Be not more than once（Or only once）Expanded in by synchronous detection to parse total arm.

Representative sensor 199 and wrist markers configuration is illustrated in Figure 29, it will be appreciated that, 199 He of sensor Flag F 1-F4 can have any suitable configuration, be included in those configurations illustrated in Figure 30 and Figure 31.In this aspect, As above, flag F 1-F5 along end effector 23203 be located such that flag F 1-F4 passes through sensor in flag F 1-F5 199（Such as, one in static wafer detection sensor 199A and 199B）Shi Shengcheng is used for the position for capturing SCARA arms 2300A The trigger point put.The movement of SCARA arms is used as by the position of only one sensor 199A and 199B the flag F 1-F4 sensed Analysis equation formula input to determine the associated thermal expansion of corresponding SCARA arm links 23201,23202,23203, such as Noted above.In an aspect, the shape of flag F 1-F4 can be selected for generating appropriate number of sensor/ Mark transitions point, in order to provide answer known variables（I other words each corresponding SCARA arm links 23201,23202,23203 Expansion factor K_S(i)Or discrete element（For example, the expansion factor K for upper arm link 23201_S1, for forearm expansion because Sub- K_S2And the expansion factor K for end effector 23203_S3））Required minimum equation group.The side being described below Formula shows an exemplary equation group in [34], [36] and [39].In this aspect, using in Fig. 4, Fig. 5 A and The mark transitions point of flag F 1-F3 in Fig. 5 B generates these equations.

In an aspect, as shown in figure 5b, it is illustrated that circular flag F 5 and the sensor transition point of F6 are crossed, Wherein, the center of the radius of flag F 5 and F6 is consistent with the center of end effector EEC.In this aspect, by least flag F 5 It can be used for the F6 sensor transition points provided according to similar to above with reference to described by such as Fig. 4 A to Fig. 4 C, Fig. 4 F, Fig. 7 Mode imitate the reference wafer being fixed at the EEC of end effector center（It is with center, and the center is from end effector Center EEC has zero offset）.As noted, the center of flag F 5 and F6 and end effector center EEC are positioned at Same place can be eliminated to for active crystal circle center（AWC）The needs of the zero offset fixing device of calibration.It is also noted that It is exemplary in the shape for the flag F 1-F5 that Figure 29 is illustrated into Figure 31 and other mark shapes can also be used, such as, Those described above shape.In addition, mark shape described herein can be schemed according to similar in Figure 30 and Figure 31 The mode shown is combined on single end actuator, to be passed in end effector 23203 by only one static detection Sensor 199 is determined by thermal expansion of the lower realization to SCARA arms and/automatic wafer in fixed only once.

In an aspect, flag F 1-F6（Or other reference characteristics described herein）It can be integrally formed in Such as any other suitable position on end effector 23203 or on SCARA arms（Such as, in upper arm 23201 or forearm On 23202）.In other aspects, one or more flag F 1-F6 can be mounted to end in any suitable manner and hold Row device 23203（Or the other parts of SCARA arms）And in any suitable position, so that only one static detection passes Sensor 199（Or as noted above, at least one static detection sensor）Flag F 1-F6 can be sensed.

As noted, the aspect of disclosed embodiment and flag F 1-F6 concepts described herein can be with Only one static detection sensor 199 is used together.However, in other aspects, more than one sensor can be used 199A and 199B generates redundancy and improves signal noise ratio, such as, as described above.In an aspect, pass Sensor 199A and 199B are mounted to the transfer chamber 11025 residing for SCARA arms 2300（See Figure 1A and Figure 24）, in process chamber PM On upper, the sluice valve GV between transfer chamber 11025 and process chamber PM or any other suitable position in processing system Place, so that sensor trigger positions can be regarded as to SCARA arm referentials（For example, R- θ or X-Y）Interior fixed bit Put.In an aspect, the flip-flop transition point from two sensors 199A and 199B is saved as during pick up calibration Known reference by location.

In an aspect, by using sensor 199A to flag F 1（For example, in the wrist of end effector 23203 On planar edge）Detection, can be by the position of wrist joint Z3（Use equation [20]-[21]）It is expressed as：

Wherein, as noted, θ is archeokinetic half angle, in an aspect, due to for example for SCARA arms The original motion of the exercise program of 2300A and corresponding report, it is possible to captured from the position of such as flag F 1 to obtain Half angle.

It is assumed that R is the radial values of position capture（Point radially extending axis, sensing flag F 1）：

Shift and can be represented as caused by triggering edge orientations change in the Y direction：

It is assumed that the trigger position of the planar edge of flag F 1 is S during calibration₄, then after inflation, the flat sides of flag F 1 The trigger position of edge can be to be expressed as：

Wherein（Use equation [7]）：

And it is R4 to assume that the radial position on mark is captured after thermal expansion, then half angle is：

；

And expand equation [32]：

By using identical method, the transition point of the planar edge by the flag F 1 of sensor 199A can be expressed as：

Wherein, d1 is the Y distances from end effector center EEC to sensor 199A.

It is assumed that the radial position of flag F 1 is captured as R1, then half angle is：

And expand equation [35]：

For the angled edge edge of flag F 2, there is the extra shift caused by the thermal expansion in X-direction in the Y direction：

Wherein, β₂It is the edge angle illustrated in Figure 29.Although illustrate β with reference to edge F2'₂, it should be appreciated that it can also make With flag F 2, the angle of any angled edge edge of F2', F3, F3' for example illustrated in Figure 29 into Figure 31.According to similar to upper S2, by using stored trigger value, can be expressed as by the mode of text description：

It is assumed that the radial position capture of flag F 2 is R2, then half angle is：

And expand equation [38]：

。

Equation [34], [36] and [39] is that have three variable K_S1、K_S2And K_S3Three nonlinear equations Formula, which depict change caused by the thermal expansion of 3 link SCARA arms.In other aspects, can provide additional marking/ Edge come distinguish/parse 4 link SCARA arms or with any appropriate number of connecting rod SCARA arms（For example, n connecting rods SCARA arms）Expansion factor（K_S(i)）.In an aspect, such as newton-La Pusen can be used（Newton-Raphson） Method answers this group of nonlinear equation, however, in other aspects, can be answered using any suitable method non-thread Property equation.In an aspect, half angle of positive movement can be found out using any suitable newton-La Pusen algorithms θ.When initial value is close to answer scheme, newton-rapshon method is quickly assembled and makes it possible to realize in an aspect Scheme determines that the single pass for passing through static detection sensor 199 with end effector 23203 is consistent, wherein, sensor 199 is examined At least one edge of at least one flag F 1-F4 of survey/sensing.Original reverse movement provides suitable starting point.If desired, then may be used Last answer scheme to be stored and is used as the initial value of same target position next time.Exemplary newton- Draw in general Senn process, for example, three variables are defined as：

x=K_S1, y=K_S2, and z=K_S3；

Corresponding function is defined as：

F1 (x, y, z)=equation [34]

F2 (x, y, z)=equation [36]

F3 (x, y, z)=equation [39]

Create nonlinear system：

And the Jacobian matrix of partial derivative：

Can be by finding out the answer scheme of this group of nonlinear equation repeatedly as follows：

。

In an aspect, at a lower temperature, for example, due to corresponding SCARA arm links 23201,23202,23203 Leading role of the linear expansion in aforesaid equation, it is possible to multiplying power will be regarded as caused by thermal expansion than change to being The microvariations of system.At relatively high temperatures, for example, slower thermal expansion due to SCARA arm links 23201,23202,23203 Journey, it is possible to which last answer scheme value is used as to the initial value of same target position.

In the case where no multiplying power is than change, thermal expansion can be reduced to three linear equations.It is assumed that multiplying power ratio It is constant, then equation [34] can be changed into：

Equation [36] can also be changed into：

And equation [39] will be：

。

Since linear equation [41], [42] and [43] can have closed analytical plan, so it can be provided Initial value carries out iteratively faster to feed nonlinear equation [40]（For example, so that can be in synchronously sensing at least one The answer scheme of this group of nonlinear equation is found in the case of a flag F 1-F6 in the once process of sensor 199）, with Just in the case of at least one edge of synchronous sensed/detected/flag F 1-F6 this group of nonlinear equation is found out in once passing through The acceptable scheme of formula.Once K_S(i)Value is known for each corresponding SCARA arm links, it is possible to uses such as equation [24] and [25] calculate the thermal expansion shift of any given position of SCARA arms.Therefore, to controlled motion（It is in whole arm Control arm moves in range of movement）Modify to compensate in arm（And more specifically it is end effector）Whole movement In the range of determine thermal expansion shift.As can be appreciated, to offset/change and therefore compensate it is definite be arm pass through Being not more than for sensor 199 is once passed through（Or in other words, pass through only once）When synchronously（Substantially real time）Utilize Arm is realized.

In the case where only determining base center EEC, move end effector（Figure 32, frame 3200）So that substrate Sense towards at least one sensor 199A and 199B movements and as described above substrate（Figure 32, frame 3205）.Determine the center of substrate（Figure 32, frame 3210）So that it can place the substrate above at station location SC.At one In aspect, in station location SC by before instructing again（It is kept or is not maintained on end effector 23203 in substrate In the case of）Any appropriate number of substrate can be transferred to station location SC or be transferred out of from station location SC.For example, can be It placed 10 substrates, 20 substrates or any other appropriate number of substrate and instruct station location SC afterwards.In other aspects In, can be in any suitable predetermined time interval（For example, between 30 minutes, 60 minutes or any other suitable time Every）Station location SC is instructed afterwards.Can be by making end effector 23203 be moved towards at least one sensor 199A and 199B To instruct substrate station SC（Figure 32, frame 3200）（Again it should be noted that can only use single sensor）So that sense Measure at least one flag F 1-F4（Figure 32, frame 3215）.End effector center EEC is come according to mode as described above Determine（Figure 32, frame 3220）And it is according to side as described above to the record at end effector center relative to station center SC Formula carries out（Figure 32, frame 3230）.If end effector remains substrate, while the center SC of station is taught, then can held Portion's actuator is from the identical process of sensor 199A and 199B（For example, in once passing through）Or pass through in end effector Second of sensor 199A and 199B determines the center WC of substrate in passing through, so that the teaching substrate in different processes Center WC and station center SC.

In an aspect, referring again to Figure 29, relative to station center SC to end effector center EEC（It is generally Similar to end effector center 395C above）Record and to base center WC（It is shown as from the end of Figure 29 Actuator center EEC is deviated）Determine can be end effector by only one sensor 199A and 199B only It is determined in the case of once passing through, however, in other aspects, this includes positioning the peripheral characteristic being not belonging to fixed arm, Can be completed in the way of similar to described in following file end effector by least one sensor 199A and The multiple process of 199B：Entitled " the Tool Auto-Teach Method and submitted on November 10th, 2015 The U.S. Patent Application No. of Apparatus " 14/937,676, the disclosure of which is fully incorporated herein by reference. For example, heart EEC and station location SC is waited in the case of being taught in the substrate, move end effector 23203（Figure 32, frame 3200）To make substrate S and/or flag F 1-F4（For example, reference characteristic）Moved towards at least one sensor 199A and 199B It is dynamic.Substrate S is by least one sensor 199A and 199B sensings（Figure 32, frame 3205）, and flag F 1-F4 is by least one A sensor 199A and 199B sensing（Figure 32, frame 3215）, again it should be noted that only a single sensor 199A and single By or be not more than once by being just enough to record end effector center EEC relative to station center SC.As described above for Such as Figure 23 to Figure 31 is described, in the case where carrying out thermal expansion differentiation to linear effect and nonlinear effect, for each SCARA arm links 23201,23202,23203（And each wheel of SCARA arms）Determine the changes delta L of SCARA arms_i（And Δ V_i）（Figure 32, frame 3216）.To the position of base center WC and substrate transport equipment（That is, reference position EEC）It is definite be logical Cross the expansion factor K using each connecting rod_S(i)Determine in any suitable manner, such as, according to as described above Mode（For example, by using curved or other shapes of feature（For example, see the flag F 5 in Figure 31, F5', F6, F6'）, As described above, it has known relation with end effector center, for example, similar to by flag F 5, F5', F6, with And/or person F6'（See Figure 31）The circle VRW1 limited（See Figure 10）, and/or, for example, by using equation above Formula [24] and [25]）.It is according to as described above to the record of end effector center reference point EEC relative to station center SC Mode is realized（Figure 32, frame 3230）.

Referring again to Figure 29 to Figure 31, in an aspect, controller 11091（Or the movement parsing of controller 11091 Device 11091K）The influence for solving disturbance and/or transition is can be configured as, the disturbance and/or transition can be in SCARA arms 2300A Longitudinal axis R in induce change, and can otherwise be referred to as rocking in R axis or change（For example, joint Frictional force, wheel frictional force, drive the nonlinear effect with frictional force, due to the uneven heat distribution in pivot and pivot bearings etc. The oscillating motion of the pivot axis of caused SCARA arm links and wheel）.As can be appreciated, this change of R axis or Rocking can cause in radial position signal S_iIn caused non-thermal change component（Sensed by sensor during arm moves Flag F 1-F6 is realized）It is conveyed to controller 11091 and determines the different connecting rods of SCARA arms 2300A and the thermal change of wheel. In an aspect, appropriate signal averaging can be passed through（Or other suitable weighted arrays）To solve foregoing mistake effect Should（For example, change or rock）, such as, the signal is from redundant marks F1-F6 and in SCARA arms as shown in Figure 29 Sensor 199A and 199B on the opposite side of 2300A or image side（Figure 29 is illustrated in the opposite of end effector 23203 Sensor 199A and 199B on side；Equally see Figure 30 and Figure 31, which illustrates symmetrical end effector）.Illustrated In aspect, sensor 199A and 199B and flag F 1-F6 could be provided as the axis of symmetry relative to SCARA arms 2300A（Its Generally it is aligned in the case of except for wrong effect with R axis）Symmetrically, and make from for sensing opposite correspondence Mark（See flag F 1-F6 and F1'-F6'）Opposite sensor 199A and 199B Si aignal averatings（Such as with movement side Formula expression）It can solve the error component caused by R axis change or rock.In other aspects, controller 11091 can To be configured as：In SCARA arms 2300A in calibration temperature T_REFWhen thermal transient occurring between steady state operating temperature, make each company It is continuous to pass through（For example, by causing similar to the curve of those curves shown in Figure 27, it is recorded in control in an appropriate form In the processor and memory of device 11091 processed）S_iSignal（It can be expressed with motion mode）Linearisation.Then, for End effector 23203 and flag F 1-F6, F1'-F6' can apply each song by each process of sensor 199A and 199B Line（For example, similar to figure 27 illustrates those curves）To adjust S_iSignal, so that each S_iSignal meets given warp The homologous thread crossed.Correspondingly, can be such as previous to solve from the signal for being for example not more than sensor a 199A and 199B Described error component, the error component cause the S from sensor_iDifference between signal and curve map.Furthermore it is possible to The curve passed through every time is made comparisons with the successive previous graph previously passed through, so as to identify what is shown axis change or rock Trend.

As that can see above, the aspect of disclosed embodiment is as shown in such as Figure 23, Figure 24 and Figure 25 As the change determined of transfer arm is compensated using controller, so as to localized delivery arm and end effector 23203, 23203A, 25155EA, 25155EB's（It is multiple）Fixed reference feature or flag F 1-F6, F1'-F6'.In addition, disclosed embodiment Aspect another independent end effector 23203B is compensated using controller（For example, see Figure 24）The change determined Change, another independent end effector 23203B and end effector 23203A, 23203B, 25155E share it is at least one or Multiple arm links 23201,23202, another independent end effector 23203B have relative to end effector 23203A At least one independent free degree.

According to the one or more aspects of disclosed embodiment, a kind of substrate processing apparatus includes：With making medial end portions by oneself The substrate transport equipment of actuator, this, which makes end effector by oneself, has with the wafer holding station to center in advance, and end performs Device is configured as that wafer is maintained at wafer holding station to and transmitted in substrate processing apparatus wafer；And it is at least one in Heart certainty feature, at least one center certainty feature form entirety with substrate transport equipment and are configured such that base The static detection sensor of bottom processing equipment detects at least one in the transmission in the case of substrate transport equipment radial motion At least one edge of center certainty feature, the detection at least one edge at least one center certainty feature only By static detection sensor once in the case of realize on end effector wafer keep station it is pre- center determine.

According to the one or more aspects of disclosed embodiment, wherein, wafer keeps station not determined by least one center Property features block.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is not by wafer Keep the wafer stop for standing kept.

According to the one or more aspects of disclosed embodiment, wherein, at least one certainty feature is arranged on substrate biography On transfer device, separated from wafer holding station and different.

According to the one or more aspects of disclosed embodiment, wherein, end effector includes longitudinal centre line, and extremely A few center certainty feature includes at least two center certainty features being arranged on the opposite side of longitudinal centre line.

According to the one or more aspects of disclosed embodiment, wherein, end effector includes longitudinal centre line, and extremely A few center certainty feature is arranged in the common side of longitudinal centre line.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is included at least Two center certainty features being oppositely disposed.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is included at least Two center certainty features, wherein, at least two centers certainty feature it is at least one relative to this at least two It is in the certainty feature of center the other is supplement.

According to the one or more aspects of disclosed embodiment, wherein, it is each at least one center certainty feature A wafer for being configured as independently parsing on end effector keeps the pre- of station to center.

According to the one or more aspects of disclosed embodiment, wherein, in the certainty feature of center each have pair Shape is answered, which keeps the pre- of station to center with predetermined relationship with the wafer on end effector, so that often A correspondingly-shaped independently determines that the wafer on end effector keeps the pre- of station to center.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is held with end Row device forms overall.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is held from end The sidepiece extension of row device.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is held from end The sidepiece pendency of row device.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is arranged to So that the detection at least one center certainty feature limits the change of the size of substrate transport equipment independently of end effector Change.

According to the one or more aspects of disclosed embodiment, wherein, the change of size is due to caused by fuel factor.

According to the one or more aspects of disclosed embodiment, further comprise controller, which is configured as connecing Receive from static detection sensor with the corresponding sensing data of detection at least one edge, and control substrate to pass Transfer device based on the hot change in size of the substrate transport equipment such as determined from sensing data to adjust the position to center in advance Put.

According to the one or more aspects of disclosed embodiment, further comprise controller, the controller be configured as from The center at the base treatment station of substrate processing apparatus is understood the detection of at least one center certainty feature.

According to the one or more aspects of disclosed embodiment, wherein, during static detection sensor is determined including automatic wafer Sensor.

According to the one or more aspects of disclosed embodiment, further comprise controller, the controller be configured as from Identify and understand with the corresponding sensing data of detection at least one edge at least one center certainty feature The center at the base treatment station of substrate processing apparatus.

According to the one or more aspects of disclosed embodiment, a kind of method includes：There is provided to have and make medial end portions execution by oneself The substrate transport equipment of device, this, which makes end effector by oneself, has with the wafer holding station to center in advance, wherein, end performs Wafer is maintained at wafer and keeps transmitting wafer at station and in substrate processing apparatus by device, and at least one center of offer is true Qualitative features, at least one center certainty feature form overall with substrate transport equipment；And utilize substrate processing apparatus Static detection sensor detect at least one center certainty feature in the transmission in the case of substrate transport equipment moving At least one edge, wherein, the detection at least one edge is at least one center certainty feature merely through static state Detection sensor once in the case of realize on end effector wafer keep station it is pre- center determine.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is not by end The wafer that actuator is kept stops.

According to the one or more aspects of disclosed embodiment, further comprise：Determine to hold using static detection sensor The wafer that portion's actuator is kept keeps the pre- eccentricity to center at station relative to the wafer on end effector.

According to the one or more aspects of disclosed embodiment, wherein, the wafer on end effector is kept for the predetermined of station Center and eccentricity be at least one center certainty feature merely through static detection sensor once in the case of passing It is determined in defeated.

According to the one or more aspects of disclosed embodiment, wherein, static detection sensor detects the edge of wafer.

According to the one or more aspects of disclosed embodiment, further comprise：Received using controller from static inspection Survey sensor with the corresponding sensing data of detection at least one edge；And utilize controller control substrate transport Equipment based on the hot change in size of the substrate transport equipment such as determined from sensing data to adjust the position to center in advance.

According to the one or more aspects of disclosed embodiment, further comprise：Using controller at least one At least one edge of heart certainty feature detection come identify and understand substrate processing apparatus wafer-process station centre bit Put.

According to the one or more aspects of disclosed embodiment, further comprise：Using controller at least one The detection at least one edge of heart certainty feature to limit the change in size of substrate transport equipment independently of end effector.

According to the one or more aspects of disclosed embodiment, wherein, which is due to caused by fuel factor.

According to the one or more aspects of disclosed embodiment, a kind of substrate processing apparatus includes：Frame；Substrate transport is set Standby, which is connected to frame and has end effector, which, which has, carries what is centered in advance Wafer keeps station, and end effector is configured as that wafer is maintained at wafer holding station and is transmitted in substrate processing apparatus Wafer；Sensor during automatic wafer is fixed, sensor is connected to frame and is configured as in substrate transport during the automatic wafer is fixed The sensing at the edge of the wafer to being kept on end effector is realized in the case of equipment moving in the transmission；It is and at least one Center certainty feature, at least one center certainty feature form entirety with substrate transport equipment and are provided so that Sensor detects at least one edge of at least one center certainty feature in the transmission during automatic wafer is fixed, at least one The pre- detection to center that station is kept to the wafer on end effector is realized in the detection at edge.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is included at least Two center certainty features being relatively arranged.

According to the one or more aspects of disclosed embodiment, wherein, each center certainty feature has correspondingly-shaped, The correspondingly-shaped keeps the pre- of station to center with predetermined relationship with the wafer on end effector, so that each corresponding to shape Shape independently determines that the wafer on end effector keeps the pre- of station to center.

According to the one or more aspects of disclosed embodiment, wherein, substrate transport equipment includes being connected to end execution The arm of device, and the arm of at least one center certainty feature and substrate transport equipment forms entirety.

According to the one or more aspects of disclosed embodiment, wherein, substrate transport equipment is included at mechanical interface and connects The arm of end effector is connected to, and at least one center certainty feature forms entirety with mechanical interface.

According to the one or more aspects of disclosed embodiment, wherein, at least one center certainty feature is arranged to So that the detection at least one center certainty feature limits the change in size of substrate transport equipment independently of end effector.

According to the one or more aspects of disclosed embodiment, further comprise controller, which is configured as connecing Receive from the fixed middle sensor of automatic wafer and the corresponding sensing data of detection at least one edge, and control base Bottom transmission equipment based on the hot change in size of the substrate transport equipment such as determined from sensing data to adjust pre- center Position.

According to the one or more aspects of disclosed embodiment, a kind of substrate processing apparatus includes：Frame；Substrate transport is set Standby, which is connected to the frame and has end effector, which has to carry centers in advance Wafer keep station, end effector, which is configured as wafer being maintained at wafer, to be kept at station and passes in substrate processing apparatus Defeated wafer；Sensor during automatic wafer is fixed, sensor is connected to frame during the automatic wafer is fixed；And at least one center determines Property feature, at least one center certainty feature and substrate transport equipment form entirety and are provided so that automatic wafer Sensor detects at least one center certainty feature in the transmission in the case of substrate transport equipment moving in fixed, at least The detection of one center certainty feature determines middle sensor once at least one center certainty feature merely through automatic wafer In the case of realize on end effector wafer keep station the pre- detection to center.

According to the one or more aspects of disclosed embodiment, a kind of substrate processing apparatus includes：

With the substrate transport equipment for making end effector by oneself, this, which makes end effector by oneself, has with the crystalline substance to center in advance Circle keeps station, and end effector is configured as that wafer is maintained at wafer holding station and is transmitted in substrate processing apparatus brilliant Circle；

At least one center certainty feature, at least one center certainty feature and substrate transport equipment form it is overall and It is provided so that the static detection sensor of substrate processing apparatus is transmitting in the case of substrate transport equipment radial motion At least one edge of the middle at least one center certainty feature of detection；And

Controller, the controller are communicably coupled to substrate transport equipment, and controller is configured such that at least one side The detection of edge realize the comparative example factor determine, the scale factor in the case of substrate transport equipment radial motion in the transmission Identify the change of the arm of substrate transport equipment；

Wherein, controller includes exercise effect resolver, which is configured as at least one edge Detect to determine the relation between scale factor change and detection at least one edge, which passes through substrate transport equipment Static detection sensor carried out in the transmission in the case of substrate transport equipment radial motion, and further parsing determine Scale factor change to determine arm change scale factor influence.

According to the one or more aspects of disclosed embodiment, the detection at least one edge is realized to end effector On wafer keep station it is pre- center it is definite be merely through static detection sensor at least one center certainty feature Carried out in the case of once.

According to the one or more aspects of disclosed embodiment, wafer keeps station not by least one center certainty feature Stop.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature does not keep standing by wafer The wafer of holding stops.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is arranged on substrate transport In equipment, separated from wafer holding station and different.

According to the one or more aspects of disclosed embodiment, end effector includes longitudinal centre line, and at least one A center certainty feature includes at least two center certainty features being arranged on the opposite side of longitudinal centre line.

According to the one or more aspects of disclosed embodiment, end effector includes longitudinal centre line, and at least one A center certainty feature is arranged in the common side of longitudinal centre line.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature includes at least two phases The center certainty feature arranged over the ground.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is included at least two Heart certainty feature, wherein, it is at least one true relative at least two center at least two centers certainty feature It is in qualitative features the other is supplement.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature each by with Being set to the wafer independently parsed on end effector keeps the pre- of station to center.

According to the one or more aspects of disclosed embodiment, each center certainty feature has correspondingly-shaped, this is right Shape is answered to keep the pre- of station to center with predetermined relationship with the wafer on end effector, so that each correspondingly-shaped is only On the spot determine that the wafer on end effector keeps the pre- of station to center.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature and end effector structure It is integral.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is from end effector Sidepiece extends.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is from end effector Sidepiece dangles.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is provided so that pair The detection of at least one center certainty feature limits the change in size of substrate transport equipment independently of end effector.

According to the one or more aspects of disclosed embodiment, which is due to caused by fuel factor.

According to the one or more aspects of disclosed embodiment, controller is configured to：

Receive from static detection sensor with the corresponding sensing data of detection at least one edge, and

Substrate transport equipment is controlled to be adjusted based on the hot change in size of the substrate transport equipment such as determined from sensing data Save the position to center in advance.

According to the one or more aspects of disclosed embodiment, controller is configured to at least one center The center for detecting the base treatment station to understand substrate processing apparatus of certainty feature.

According to the one or more aspects of disclosed embodiment, static detection sensor includes sensing during automatic wafer is fixed Device.

According to the one or more aspects of disclosed embodiment, controller is configured as from being determined at least one center Property feature at least one edge the corresponding sensing data of detection come the substrate that identifies and understand substrate processing apparatus The center for the treatment of stations.

Receive the sensing data from static detection sensor, the sensing data with least one center certainty feature Detection it is corresponding,

The change in size of substrate transport equipment is identified based on sensing data, and determines to make the change and substrate transport equipment The relevant scale factor of size.

According to the one or more aspects of disclosed embodiment, exercise effect resolver is configured as parsing substrate transport and sets The relation between the size of motion mode restriction, scale factor and change of standby arm.

According to the one or more aspects of disclosed embodiment, exercise effect resolver includes the filter of scale factor.

According to the one or more aspects of disclosed embodiment, a kind of method includes：

Substrate transport equipment is provided, which has：

Make end effector by oneself, this, which makes end effector by oneself, has with the wafer holding station to center in advance, wherein, end Wafer is maintained at wafer and keeps transmitting wafer at station and in substrate processing apparatus by actuator, and

At least one center certainty feature, at least one center certainty feature form overall with substrate transport equipment；

Using the static detection sensor of substrate processing apparatus detected in the transmission in the case of substrate transport equipment moving to Determining for the comparative example factor is realized at least one edge of a few center certainty feature, the detection at least one edge, The scale factor identifies the change of the arm of substrate transport equipment in the transmission in the case of substrate transport equipment moving；And

Determine scale factor change with passing through static detection from the detection at least one edge using exercise effect resolver Relation between detection of the sensor at least one edge, and further scale factor determined by parsing changes to determining The influence of the scale factor of the change of arm.

According to the one or more aspects of disclosed embodiment, the detection at least one edge is true at least one center Qualitative features merely through static detection sensor once in the case of realize the predetermined of station kept to the wafer on end effector Center determines.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is not by end effector The wafer of holding stops.

According to the one or more aspects of disclosed embodiment, method further comprises：Using static detection sensor come Determine the pre- eccentricity to center that the wafer that end effector is kept keeps standing relative to the wafer on end effector.

According to the one or more aspects of disclosed embodiment, wafer on end effector keep station it is pre- center with And eccentricity be at least one center certainty feature merely through static detection sensor once in the case of in the transmission by Definite.

According to the one or more aspects of disclosed embodiment, static detection sensor detects the edge of wafer.

According to the one or more aspects of disclosed embodiment, this method further comprises：

Using controller receive from static detection sensor with the corresponding sensor number of detection at least one edge According to；And

Substrate transport equipment is controlled so as to the hot ruler based on the substrate transport equipment such as determined from sensing data using controller It is very little to change to adjust the position to center in advance.

According to the one or more aspects of disclosed embodiment, method further comprises：Using controller at least one Detect to identify and understand in the wafer-process station of substrate processing apparatus at least one edge of a center certainty feature Heart position.

According to the one or more aspects of disclosed embodiment, this method further comprises：Using controller at least The detection at least one edge of one center certainty feature to limit the ruler of substrate transport equipment independently of end effector Very little change.

Substrate transport equipment with end effector, which has keeps station, end with the wafer to center in advance Portion's actuator is configured as that wafer is maintained at wafer holding station to and transmitted in substrate processing apparatus wafer；

More than one feature, which is arranged in substrate transport equipment so that the static state of substrate processing apparatus Detection sensor detects each corresponding more than one feature extremely in the transmission in the case of substrate transport equipment radial motion A few edge；And

Controller, the controller are communicably coupled to substrate transport equipment, and controller is configured such that at least one side The detection of edge, which is correspondingly realized, determines the different proportion factor, which is total in the only one of substrate transport equipment The different changes of the common arm of substrate transport equipment are identified in the case of with radial motion in the transmission；

Wherein, controller includes exercise effect resolver, which is configured as in substrate transport equipment only In the case of one associated movement the phase of the different respective links of common arm is parsed from the definite scale factor of difference in the transmission It should change, and determine the Significant Change of the common arm for wafer position.

According to the one or more aspects of disclosed embodiment, controller is configured as further parsing the different proportion factor Influence of the change to the Significant Change of arm.

According to the one or more aspects of disclosed embodiment, the detection at least one edge is realized to end effector On wafer keep station it is pre- center it is definite be in situation of the more than one feature merely through static detection sensor once Lower progress.

According to the one or more aspects of disclosed embodiment, wafer keeps station not by more than one features block.

According to the one or more aspects of disclosed embodiment, more than one feature is not kept the wafer of station holding by wafer Stop.

According to the one or more aspects of disclosed embodiment, more than one feature is arranged in substrate transport equipment, with Wafer keeps station separation and difference.

Substrate transport equipment with transfer arm, the transfer arm include end effector, which has with predetermined The fixed reference feature at center, end effector are configured as keeping wafer and are transmitted based on pre- center in substrate processing apparatus Wafer；

At least one arm posture certainty feature, at least one arm posture certainty feature form overall with substrate transport equipment And it is provided so that the static detection sensor of substrate processing apparatus in the case of transfer arm radial motion in the transmission Detect at least one edge of at least one arm posture certainty feature；And

Controller, the controller are communicably coupled to substrate transport equipment, and controller is configured such that at least one side Determining for the comparative example factor is realized in the detection of edge, and identification passes the scale factor in the transmission in the case of transfer arm radial motion The change of defeated arm；

Wherein, controller includes exercise effect resolver, which is configured as in transfer arm radial motion In the case of in the transmission by static detection sensor from the detection at least one edge come determine determined by scale factor Discrete relationship between each different Discrete Changes corresponding with each different connecting rods of transfer arm, so that in transfer arm radially The change of transfer arm is determined in the case of movement in the transmission.

According to the one or more aspects of disclosed embodiment, exercise effect resolver be configured such that with it is definite Realize in the definite relation of scale factor and distinguished between the corresponding each difference Discrete Changes of each different connecting rods.

According to the one or more aspects of disclosed embodiment, exercise effect resolver is configured such that based on at least The detection at one edge distinguishes to realize between each different Discrete Changes.

According to the one or more aspects of disclosed embodiment, exercise effect resolver is configured as radially transporting in transfer arm Determined in the transmission by static detection sensor from the detection at least one edge in the case of dynamic every with transfer arm The contribution of a difference connecting rod nonlinear motion effect of different Discrete Changes accordingly, so that synchronous in transfer arm radial motion Ground determines the change of arm.

According to the one or more aspects of disclosed embodiment, exercise effect resolver is configured such that for determining Realize in the definite contribution of the nonlinear motion effect of the change of arm and taken turns from each different connecting rods of transfer arm or difference Distinguished between the nonlinear motion effect of corresponding different contributions.

According to the one or more aspects of disclosed embodiment, exercise effect resolver, which is configured such that, is determining arm What at least one different connecting rods or difference realized in the definite contribution of the nonlinear motion effect of change in transfer arm were taken turns Distinguished between the nonlinear motion effect of difference contribution.

According to the one or more aspects of disclosed embodiment, exercise effect resolver is configured such that based on at least The detection at one edge distinguishes to realize between the nonlinear motion effect of different contributions.

According to the one or more aspects of disclosed embodiment, at least one arm posture certainty feature is matched somebody with somebody with certainty Put, so as to realized in the definite relation of the scale factor with being determined each difference corresponding with each different connecting rods from Dissipate and distinguished between changing.

According to the one or more aspects of disclosed embodiment, at least one posture certainty feature is configured such that In the transfer arm radial motion of at least one edge in the transmission merely through static detection sensor once in the case of realize exist Distinguished between each different Discrete Changes corresponding with each different connecting rods of transfer arm, so that static detection senses Device detects at least one edge in the transmission.

According to the one or more aspects of disclosed embodiment, transfer arm is 3 link SCARA arms, and at least one appearance State certainty feature, which is configured such that, to be realized corresponding each different discrete with each different connecting rods of 3 link SCARA arms Distinguished between change.

According to the one or more aspects of disclosed embodiment, end effector is that there is wafer to keep that stands to make middle-end by oneself Portion's actuator, wafer keeps station, and with centering in advance, end effector is configured as wafer being maintained at wafer holding station simultaneously And wafer is transmitted in substrate processing apparatus.

According to the one or more aspects of disclosed embodiment, at least one arm posture certainty feature includes at least one Center certainty feature, at least one center certainty feature is at least one center certainty feature merely through static detection Sensor once in the case of realize on end effector wafer keep station it is pre- center determine.

According to the one or more aspects of disclosed embodiment, at least one center certainty feature is not by end effector The wafer kept stops, and is provided so that static detection sensor is passing in the case of substrate transport equipment moving The defeated middle at least one center certainty feature of detection, the detection at least one center certainty feature are true at least one center Qualitative features merely through static detection sensor once in the case of realize the predetermined of station kept to the wafer on end effector Center determines.

According to the one or more aspects of disclosed embodiment, controller is configured as based on the inspection at least one edge Survey and substantially simultaneously realized with the detection of the change to transfer arm in the transmission in the case of the radial motion of transfer arm pair Wafer keep station it is pre- center determine.

According to the one or more aspects of disclosed embodiment, transfer arm includes upper arm link, forearm link and is more than One end effector, a plurality of end effector is usually from upper arm link and forearm link pendency so that upper arm connects Bar and forearm link be each in more than one end effector common to.

According to the one or more aspects of disclosed embodiment, in the more than one end effector to dangle jointly at least One has the independent free degree, so that at least one end effector to dangle jointly can connect relative to shared upper arm Bar and forearm link independently move, and have corresponding arm posture certainty feature, and the corresponding arm posture certainty is special Sign be different from another corresponding another arm posture certainty feature in the more than one end effector to dangle jointly, So that based on the corresponding arm appearance by static detection sensor at least one end effector independently moved The sensing at least one edge of state certainty feature is from another the biography in the more than one end effector to dangle jointly The change for changing the transfer arm to individually determine at least one end effector independently moved of defeated arm.

According to the one or more aspects of disclosed embodiment, which is SCARA arms.

According to the one or more aspects of disclosed embodiment, controller is configured as localized delivery arm and end performs The fixed reference feature of device, so as to compensate the definite change of transfer arm.

According to the one or more aspects of disclosed embodiment, a kind of substrate treating method includes：

Wafer is transmitted in the substrate processing apparatus with substrate transport equipment, which has transfer arm, transmission Arm includes end effector, and end effector has with the fixed reference feature to center in advance, wherein, wafer is in end effector Wafer keeps being maintained on end effector at station；

At least one arm posture is detected in the transmission using static detection sensor in the case of transfer arm radial motion to determine Property feature at least one edge, at least one arm posture certainty feature and substrate transport equipment form overall；

Ratio is determined using the controller of substrate transport equipment is communicably coupled to based on the detection at least one edge The factor, the scale factor identify the change of transfer arm in the transmission in the case of transfer arm radial motion；And

Passed in the transmission by static detection in the case of transfer arm radial motion using the exercise effect resolver of controller Sensor to the detection at least one edge from determining identified scale factor and corresponding from each different connecting rods of transfer arm Each different Discrete Changes between discrete relationship, so as to determine transmission in the transmission in the case of transfer arm radial motion The change of arm.

According to the one or more aspects of disclosed embodiment, this method further comprises：Utilize exercise effect resolver To realize in the definite relation with identified scale factor in each different Discrete Changes corresponding with each different connecting rods Between distinguish.

According to the one or more aspects of disclosed embodiment, this method further comprises：Utilize exercise effect resolver Distinguished based on the detection at least one edge to realize between each different Discrete Changes.

According to the one or more aspects of disclosed embodiment, method further comprises：Existed using exercise effect resolver Determined in the transmission by static detection sensor from the detection at least one edge in the case of transfer arm radial motion The contribution of the nonlinear motion effect of different Discrete Changes corresponding with each difference connecting rod of transfer arm, so that in transfer arm footpath To the change that arm is synchronously determined during movement.

According to the one or more aspects of disclosed embodiment, this method further comprises：Passed using controller to compensate The definite change of defeated arm, so as to localized delivery arm and the fixed reference feature of end effector.

According to the one or more aspects of disclosed embodiment, method further comprises：Compensate and hold using controller Portion's actuator shares the definite change of another separate end actuator of at least one or more arm link, another separate end Actuator has at least one independent degree relative to end effector.

It should be understood that each side described above for merely illustrating disclosed embodiment.Without departing substantially from disclosed In the case of each side of embodiment, those skilled in the art is contemplated that various alternatives and modification.Correspondingly, it is open Embodiment each side be intended to fall within the scope of appended claims all these alternatives, modification, with And change case.Further, different features is described in subordinate or independent claims different from each other, this is out of question The fact be not intended that the combination that can not advantageously use these features, this combination still be included in each aspect of the present invention In the range of.

Claims (according to the 19th article of modification of treaty)

1. a kind of substrate processing apparatus, the substrate processing apparatus includes：

Substrate transport equipment, the substrate transport equipment have the transfer arm for including end effector, the end effector tool Have with the fixed reference feature that centers in advance, the end effector be configured as based on it is described it is pre- center keep wafer and The transmission wafer in the substrate processing apparatus；

At least one arm posture certainty feature, at least one arm posture certainty feature and the substrate transport equipment structure It is integral, at least one arm posture certainty feature at least one being to determine property of arm posture and independently of the ginseng Feature and different from the fixed reference feature is examined, and is provided so that the static detection sensor of the substrate processing apparatus Detect at least the one of at least one arm posture certainty feature in the transmission in the case of the transfer arm radial motion A edge；And

Controller, the controller are communicably coupled to the substrate transport equipment, and the controller is configured such that pair The detection at least one edge, which is realized, determines the ratio sex factor of the transfer arm independently of the wafer, described Ratio sex factor identifies the change of the transfer arm in the transmission in the case of the transfer arm radial motion；

Wherein, the controller includes exercise effect resolver, and the exercise effect resolver is configured as in the transfer arm In the case of radial motion in the transmission by the static detection sensor from the detection at least one edge come really Between ratio sex factor determined by fixed and each different Discrete Changes corresponding with each different connecting rods of the transfer arm Discrete relationship, the discrete relationship influences transfer arm movement, so that in the case of the transfer arm radial motion in the transmission Determine the change of the transfer arm.

2. substrate processing apparatus according to claim 1, wherein, the exercise effect resolver be configured such that with Realized in the definite relation of identified ratio sex factor between the corresponding each difference Discrete Changes of each different connecting rods Distinguish.

3. substrate processing apparatus according to claim 1, wherein, the exercise effect resolver, which is configured such that, to be based on Detection at least one edge distinguishes to realize between each different Discrete Changes.

4. substrate processing apparatus according to claim 1, wherein, the exercise effect resolver is configured as in the biography In the transmission by the static detection sensor from the detection at least one edge in the case of defeated arm radial motion To determine the contribution of the nonlinear motion effect of different Discrete Changes corresponding with each difference connecting rod of the transfer arm, so that Determine the change of the arm in the transmission in the case of the transfer arm radial motion.

5. substrate processing apparatus according to claim 4, wherein, the exercise effect resolver is configured such that true Realized calmly in the identified contribution of the nonlinear motion effect of the change of the arm in each different companies from the transfer arm Distinguished between bar or the nonlinear motion effect of the corresponding different contributions of different wheels.

6. substrate processing apparatus according to claim 4, wherein, the exercise effect resolver is configured such that true Realized in the identified contribution of the nonlinear motion effect of the change of the fixed arm with the transfer arm it is at least one not Distinguished between nonlinear motion effect with the different contributions of connecting rod or different wheels.

7. substrate processing system according to claim 1, wherein, the exercise effect resolver, which is configured such that, to be based on Detection at least one edge distinguishes to realize between the nonlinear motion effect of different contributions.

8. substrate processing system according to claim 1, wherein, at least one arm posture certainty feature has true Qualitative configuration, so as to being realized in the definite relation of identified ratio sex factor corresponding each with each different connecting rods Distinguished between different Discrete Changes.

9. substrate processing system according to claim 1, wherein, at least one posture certainty feature is configured as So that in the transfer arm radial motion of at least one edge in the transmission merely through the static detection sensor once In the case of realize and distinguish between the corresponding each difference Discrete Changes of each different connecting rods in the transfer arm, from And the static detection sensor is caused to detect at least one edge in the transmission.

10. substrate processing system according to claim 1, wherein, the transfer arm is 3 connecting rods selection compliance assembly machine Tool arm, and at least one posture certainty feature is configured such that realization is selecting compliance with 3 connecting rod Distinguished between each different corresponding each different Discrete Changes of connecting rod of make-up machinery arm.

11. substrate processing system according to claim 1, wherein, there is the end effector wafer to keep station Make end effector by oneself, the wafer keeps station, and the end effector is configured as the wafer with centering in advance The wafer is maintained to keep transmitting the wafer at station and in the substrate processing apparatus.

12. substrate processing system according to claim 11, wherein, at least one arm posture certainty feature includes At least one center certainty feature, at least one center certainty feature is at least one center certainty feature Merely through the static detection sensor once in the case of realize on the end effector the wafer keep station It is described it is pre- center determine.

13. substrate processing system according to claim 12, wherein, at least one center certainty feature is not by institute The wafer for stating end effector holding stops, and is provided so that the static detection sensor is passed in the substrate Transfer device detects at least one center certainty feature in the transmission in the case of moving, true at least one center The detection of qualitative features is in situation of at least one center certainty feature merely through the static detection sensor once It is lower realize on the end effector the wafer keep station it is described it is pre- center determine.

14. substrate processing system according to claim 11, wherein, the controller be configured as being based on to it is described at least The detection at one edge and with the definite base of the change to the transfer arm in the transmission in the transfer arm radial motion In sheet with the case of realize to the wafer keep station it is described it is pre- center determine.

15. substrate processing system according to claim 1, wherein, the transfer arm include upper arm link, forearm link, And more than one end effector, the more than one end effector is usually from the upper arm link and the forearm Connecting rod dangles so that the upper arm link and the forearm link are for every in the more than one end effector One is shared.

16. substrate processing system according to claim 15, wherein, the end effector of more than one shared pendency In it is at least one there is the independent free degree so that at least one energy in the end effector of the shared pendency It is enough to be independently moved relative to the shared upper arm link and forearm link and special with corresponding arm posture certainty Sign, the corresponding arm posture certainty feature be different from in the end effector of the more than one shared pendency Another corresponding another arm posture certainty feature so that based on by the static detection sensor to it is described extremely Few one can movable independently end effector the corresponding arm posture certainty feature at least one edge Sensing, and another corresponding described transfer arm described in from the end effector of the more than one shared pendency Change individually determine with it is described it is at least one can the corresponding transfer arm of movable independently end effector change.

17. substrate processing system according to claim 1, wherein, the transfer arm is selection compliance assembly manipulator Arm.

18. substrate processing system according to claim 1, wherein, the controller is configured as positioning the transfer arm And the fixed reference feature of the end effector, so as to compensate the definite change of the transfer arm.

19. a kind of substrate treating method, the substrate treating method includes：

Transmit wafer in the substrate processing apparatus with substrate transport equipment, the substrate transport equipment has and includes end and hold The transfer arm of row device, the end effector have with the fixed reference feature to center in advance, wherein, the wafer is in the end The wafer of actuator keeps being maintained on the end effector at station；

At least one arm posture is detected in the transmission in the case of the transfer arm radial motion using static detection sensor At least one edge of certainty feature, at least one arm posture certainty feature form whole with the substrate transport equipment Body, at least one arm posture certainty feature is at least one being to determine property of arm posture and special independently of the reference Levy and different from the fixed reference feature；

Using the controller for being communicably coupled to the substrate transport equipment based on the detection at least one edge To determine the ratio sex factor of the transfer arm independently of the wafer, the ratio sex factor is radially transported in the transfer arm The change of the transfer arm is identified in the case of dynamic in the transmission；And

Pass through institute in the transmission in the case of the transfer arm radial motion using the exercise effect resolver of the controller State static detection sensor from the detection at least one edge come ratio sex factor determined by determining and with the biography Discrete relationship between each different corresponding each different Discrete Changes of connecting rod of defeated arm, the discrete relationship influence transfer arm Movement, so as to determine the change of the transfer arm in the transmission in the case of the transfer arm radial motion.

20. according to the method for claim 19, the method is further included：Using the exercise effect sensor with Realized in the definite relation of identified ratio sex factor between the corresponding each difference Discrete Changes of each different connecting rods Distinguish.

21. according to the method for claim 19, the method is further included：It is based on using the exercise effect resolver Detection at least one edge distinguishes to realize between each different Discrete Changes.

22. according to the method for claim 19, the method is further included：Using the exercise effect resolver in institute State in the case of transfer arm radial motion in the transmission by the static detection sensor at least one edge The nonlinear motion effect for detecting to determine the different Discrete Changes corresponding with each difference connecting rod of the transfer arm Contribution, so as to determine the change of the arm in the transmission in the case of the transfer arm radial motion.

23. according to the method for claim 19, wherein, the transfer arm is selection compliance make-up machinery arm.

24. according to the method for claim 19, the method is further included：The biography is compensated using the controller The definite change of defeated arm is to position the fixed reference feature of the transfer arm and the end effector.

25. according to the method for claim 24, the method is further included：Using the controller come compensate with it is described End effector shares the definite change of another separate end actuator of at least one or more arm link, described another only Vertical end effector has at least one independent degree relative to the end effector.

Claims

At least one arm posture certainty feature, at least one arm posture certainty feature and the substrate transport equipment structure Static detection sensor that is integral and being provided so that the substrate processing apparatus is in the transfer arm radial motion In the case of detect at least one edge of at least one arm posture certainty feature in the transmission；And

Controller, the controller are communicably coupled to the substrate transport equipment, and the controller is configured such that pair Determining for the comparative example factor is realized in the detection at least one edge, and the scale factor is in the transfer arm radial motion In the case of identify the change of the transfer arm in the transmission；

Wherein, the controller includes exercise effect resolver, and the exercise effect resolver is configured as in the transfer arm In the case of radial motion in the transmission by the static detection sensor from the detection at least one edge come really Between scale factor determined by fixed and each difference Discrete Changes corresponding with each different connecting rods of the transfer arm from The relation of dissipating, so as to determine the change of the transfer arm in the transmission in the case of the transfer arm radial motion.

2. substrate processing apparatus according to claim 1, wherein, the exercise effect resolver be configured such that with Realized in the definite relation of identified scale factor between the corresponding each difference Discrete Changes of each different connecting rods into Row is distinguished.

8. substrate processing system according to claim 1, wherein, at least one arm posture certainty feature has true Qualitative configuration, so as to realized in the definite relation with identified scale factor it is corresponding with each different connecting rods each not Distinguished between Discrete Change.

14. substrate processing system according to claim 11, wherein, the controller be configured as being based on to it is described at least The detection at one edge and with the change to the transfer arm in the transmission in the case of the transfer arm radial motion Determine substantially simultaneously in the case of realize to the wafer keep station it is described it is pre- center determine.

At least one arm posture is detected in the transmission in the case of the transfer arm radial motion using static detection sensor At least one edge of certainty feature, at least one arm posture certainty feature form whole with the substrate transport equipment Body；

Using the controller for being communicably coupled to the substrate transport equipment based on the detection at least one edge To determine scale factor, the scale factor identifies the transfer arm in the transmission in the case of the transfer arm radial motion Change；And

Pass through institute in the transmission in the case of the transfer arm radial motion using the exercise effect resolver of the controller State static detection sensor from the detection at least one edge come scale factor determined by determining and with the transmission Discrete relationship between each different corresponding each different Discrete Changes of connecting rod of arm, so that in the transfer arm radial motion In the case of in the transmission determine the transfer arm change.

20. according to the method for claim 19, the method is further included：Using the exercise effect sensor with Realized in the definite relation of identified scale factor between the corresponding each difference Discrete Changes of each different connecting rods into Row is distinguished.