CN108007410A - The machine difference compensation method of display base plate detection device and device, detection device - Google Patents

The machine difference compensation method of display base plate detection device and device, detection device Download PDF

Info

Publication number
CN108007410A
CN108007410A CN201711160927.1A CN201711160927A CN108007410A CN 108007410 A CN108007410 A CN 108007410A CN 201711160927 A CN201711160927 A CN 201711160927A CN 108007410 A CN108007410 A CN 108007410A
Authority
CN
China
Prior art keywords
position deviation
detection device
offset
detection
generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201711160927.1A
Other languages
Chinese (zh)
Other versions
CN108007410B (en
Inventor
戚海平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201711160927.1A priority Critical patent/CN108007410B/en
Publication of CN108007410A publication Critical patent/CN108007410A/en
Application granted granted Critical
Publication of CN108007410B publication Critical patent/CN108007410B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/04Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
    • G01B21/045Correction of measurements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The compensation method of machine difference and device the present invention relates to display base plate detection device, detection device, the compensation method include:The position deviation data on basis is obtained, the basic position deviation data is to carry out position detection generation to the pattern formed on display base plate using benchmaring equipment;The position deviation data of each time is obtained, the position deviation data of described each time is the pattern formed on the display base plate to be carried out using detection device to be adjusted position detection generation is repeated several times;Offset is referred to according to the basic position deviation data and the generation of the position deviation data of each time position deviation, is compensated with the position deviation data generated in the detection to detection device to be adjusted.The measuring machine that this method can reduce detection device is poor, is effectively improved measurement result accuracy and the validity of detection device.

Description

The machine difference compensation method of display base plate detection device and device, detection device
Technical field
The present invention relates to technical field of semiconductors, more particularly to the machine difference compensation method of display base plate detection device and dress Put, detection device.
Background technology
OLED (Active Matrix/Organic Light Emitting Diode) display device is actively sent out to be a kind of The display device of light, includes underlay substrate, the organic light emission list formed with matrix arrangement on underlay substrate in OLED display device The pattern of member, can use fine metal mask plate, form the pattern of organic light-emitting units on substrate by vapour deposition method at present.
After the pattern that organic light-emitting units have been prepared on underlay substrate, it usually needs pattern is detected, detection is closed The preparation processes such as follow-up welding circuit board are carried out after lattice.
The pattern of the organic light-emitting units of formation can be detected using special detection device at present, predominantly detect shape Into each pattern position deviation, deviation size largely influences to form the quality of final OLED display device.
For detection device, even if the distinct device of same model, the sensitivity between each equipment is also variant, because This, inevitable to produce measurement difference, it is poor that the measurement difference between distinct device can be described as measuring machine, shows by experimental test Measuring machine difference can reach 10um or so, and the poor scope of the machine far beyond acceptable 2um, causes the pattern to organic light-emitting units The accuracy and validity for the measurement result being detected, therefore, it is necessary to a kind of measurement knot that can be effectively improved detection device The method of fruit accuracy.
The content of the invention
The present invention provides the compensation method of machine difference and device, the detection device of a kind of display base plate detection device, to solve phase Deficiency in the technology of pass.
First aspect according to embodiments of the present invention, there is provided a kind of machine difference compensation method of display base plate detection device, bag Include:
The position deviation data on basis is obtained, the basic position deviation data is to display using benchmaring equipment The pattern formed on substrate carries out position detection generation;
Obtain the position deviation data of each time, the position deviation data of described each time is to institute using detection device to be adjusted The pattern formed on display base plate is stated to carry out that position detection generation is repeated several times;
Offset is referred to according to the basic position deviation data and the generation of the position deviation data of each time position deviation, Compensated with the position deviation data generated in the detection to detection device to be adjusted.
Optionally, it is described that position deviation is generated according to the basic position deviation data and the position deviation data of each time With reference to offset, including:
The position deviation generated according to the basic position deviation data and detection device to be adjusted wherein one-time detection Data generate position deviation theoretical com-pensation value;
The position deviation data of each time that detection generation is repeated several times according to detection device to be adjusted generates position deviation weight Renaturation offset;
According to the position deviation theoretical com-pensation value and position deviation repeatability offset generation position deviation reference Offset.
Optionally, it is described to be generated according to the basic position deviation data and detection device to be adjusted wherein one-time detection Position deviation data generation position deviation theoretical com-pensation value, including:
By the position deviation number of the basic position deviation data and detection device to be adjusted wherein one-time detection generation According to difference as the position deviation theoretical com-pensation value;
The position deviation data of each time that detection generation is repeated several times according to the detection device to be adjusted generates position Deviation repeatability offset is put, including;
The average value of the position deviation data of each time of detection generation is repeated several times as described in detection device to be adjusted Position deviation repeatability offset;
It is described that position deviation is generated according to the position deviation theoretical com-pensation value and the position deviation repeatability offset With reference to offset, including:
Will be the position deviation theoretical com-pensation value and the position deviation repeatability offset and inclined as the position Difference refers to offset.
Optionally, physical location of the pattern that the position deviation data includes being formed on display base plate on display base plate The difference of coordinate and theoretical position coordinate.
Optionally, the pattern formed on the display base plate is the pattern of the organic light-emitting units formed on display base plate.
Second aspect according to embodiments of the present invention, there is provided a kind of machine difference compensating device of display base plate detection device, bag Include:
Basic deviation data acquiring unit, for obtaining the position deviation data on basis, the basic position deviation number Position detection generation is carried out to the pattern formed on display base plate according to for use benchmaring equipment;
Deviation data acquiring unit is repeated, for obtaining the position deviation data of each time, the position deviation number of described each time According to for using detection device to be adjusted to the pattern formed on the display base plate carry out be repeated several times position detection generation;
Deviation Reference offset generation unit, for according to the basic position deviation data and the position deviation of each time Data generation position deviation refers to offset, is mended with the position deviation data generated in the detection to detection device to be adjusted Repay.
Optionally, the deviation Reference offset generation unit includes:
Deviation theoretical com-pensation value computation subunit, for being set according to the basic position deviation data and detection to be adjusted The position deviation data generation position deviation theoretical com-pensation value of standby wherein one-time detection generation;
Deviation repeatability compensation value calculation subelement, for each of detection generation to be repeated several times according to detection device to be adjusted Secondary position deviation data generation position deviation repeatability offset;
Deviation Reference compensation value calculation unit, for according to the position deviation theoretical com-pensation value and the position deviation weight Renaturation offset generation position deviation refers to offset.
Optionally, the deviation theoretical com-pensation value computation subunit be specifically used for by the basic position deviation data with The difference of the detection device to be adjusted wherein position deviation data of one-time detection generation is as the position deviation theoretical com-pensation value;
The deviation repeatability compensation value calculation subelement is specifically used for the detection device to be adjusted detection life is repeated several times Into the position deviation data of each time average value as the position deviation repeatability offset;
The deviation Reference compensation value calculation subelement is specifically used for the position deviation theoretical com-pensation value and institute's rheme Put deviation repeatability offset and refer to offset as the position deviation.
Optionally, physical location of the pattern that the position deviation data includes being formed on display base plate on display base plate The difference of coordinate and theoretical position coordinate.
The third aspect according to embodiments of the present invention, there is provided a kind of display base plate detection device, including any of the above-described institute The compensation device stated.
According to above-described embodiment, in the compensation method, position deviation is generated with reference to offset with benchmaring equipment Position deviation data based on, and consider when measurement is repeated several times in detection device to be adjusted since detection device draws in itself The measuring machine risen is poor, when detection device to be adjusted subsequently carries out position detection, by the position deviation with reference to offset to life Into position deviation data be adjusted, can reduce that the measuring machine of detection device is poor, be effectively improved the measurement knot of detection device Fruit accuracy and validity.
It should be appreciated that the general description and following detailed description of the above are only exemplary and explanatory, not Can the limitation present invention.
Brief description of the drawings
Attached drawing herein is merged in specification and forms the part of this specification, shows the implementation for meeting the present invention Example, and for explaining the principle of the present invention together with specification.
Fig. 1 is the flow chart of the machine difference compensation method for the display base plate detection device that an implementation exemplifies according to the present invention;
Fig. 2 is the flow of the machine difference compensation method of another display base plate detection device for implementing to exemplify according to the present invention Figure;
Fig. 3 is the related abscissa positions bias compensation value that an implementation exemplifies machine difference compensation method acquisition according to the present invention Line chart;
Fig. 4 is the related ordinate position deviation compensation that a machine difference compensation method for implementing to exemplify obtains according to the present invention The line chart of value;
Fig. 5 is the related abscissa positions deviation data that a machine difference compensation method for implementing to exemplify obtains according to the present invention Line chart;
Fig. 6 is the related ordinate position deviation data that a machine difference compensation method for implementing to exemplify obtains according to the present invention Line chart;
Fig. 7 is the block diagram of the machine difference compensating device for the display base plate detection device that an implementation exemplifies according to the present invention.
Embodiment
Here exemplary embodiment will be illustrated in detail, its example is illustrated in the accompanying drawings.Following description is related to During attached drawing, unless otherwise indicated, the same numbers in different attached drawings represent the same or similar key element.Following exemplary embodiment Described in embodiment do not represent and the consistent all embodiments of the present invention.On the contrary, they be only with it is such as appended The example of the consistent apparatus and method of some aspects being described in detail in claims, of the invention.
OLED display device includes underlay substrate, the figure of the organic light-emitting units formed with matrix arrangement on underlay substrate Case, after the pattern that organic light-emitting units have been prepared on underlay substrate, it usually needs using special detection device to formation The pattern of organic light-emitting units carries out position detection, and the position deviation of detection pattern, the position deviation data of acquisition is as measurement As a result, can be as one of reference frame for determining OLED display device quality.
Since detection device is poor there are measuring machine, the accuracy of measurement result that is generated after detection and effectively is influenced Property, poor in order to reduce measuring machine, the method in correlation technique can compensate measuring machine difference using offset, and offset is set Put specifically, by a stage fiducial detection set position deviation data on the basis of, by the position deviation data of other detection devices It is poor to measuring machine by offset using difference therebetween as offset compared with the position deviation data of benchmark It is poor that the measuring machine of detection device can suitably be reduced after compensating, but the accuracy of measurement result is still not ideal enough.
Based on this, the embodiment of the present invention provides a kind of machine difference compensation method of display base plate detection device, and this method can be with The accuracy of the measurement result of detection device acquisition is effectively improved, as shown in Figure 1, this method comprises the following steps:
Step S10, the position deviation data on basis is obtained, the basic position deviation data is to be set using benchmaring The standby pattern to being formed on display base plate carries out position detection generation;
Step S20, the position deviation data of each time is obtained, the position deviation data of described each time is to use detection to be adjusted Equipment carries out multiplicating position detection to the pattern formed on display base plate, generation;
Step S30, according to the position deviation data on basis and the generation position deviation of the position deviation data of each time with reference to benefit Value is repaid, is compensated with the position deviation data generated in the detection to detection device to be adjusted.
The pattern formed on display base plate can be a variety of, if display base plate is the display base plate of liquid crystal display device, In the production process, various patterns can be formed on display base plate, for example, on the display base plate grid, source-drain electrode, active layer or Pattern of person's pixel unit etc., if display base plate is the display base plate of OLED display, can form organic on display base plate The pattern of luminescence unit.
Corresponding detection device can be used to carry out position detection to the pattern on display base plate, the pattern detected for needs Type this implementation this is not limited.
For oled display substrate, since the position of the pattern of the organic light-emitting units of formation largely influences The quality of OLED display is, it is necessary to control the position deviation of the pattern of organic light-emitting units, therefore, prepared on display base plate , it is necessary to be detected using special detection device to the position deviation for forming pattern after the pattern of complete organic light-emitting units.
The pattern formed on display base plate includes many quantity patterns of matrix arrangement, when detecting, can be as needed Select the pattern of a number of and some positions to carry out position detection, and be not usually required to be detected each pattern.
Detection device can carry out position detection, position of the detection pattern on display base plate to the pattern formed on display base plate Deviation size is put, the data of the position deviation size including multiple patterns can be generated, which can be described as position deviation data.
Benchmaring equipment is higher and by test result indicates that the small detection device of measuring machine difference for sensitivity, using base Quasi- detection device carries out the pattern formed on display base plate the position based on the position deviation data of position detection generation Deviation data, the position deviation data are accurate data.
Detection device to be adjusted can be any detection device for detection, using detection device to be adjusted to showing base The pattern formed on plate carries out multiplicating position detection, i.e., using same detection device to be adjusted to same display base plate On same position and the pattern of quantity position detection is repeatedly carried out using identical method, obtain the position deviation of each time Data, when be repeated several times detection, although same detection method is used using same equipment, due to equipment sheet Body is poor there are measuring machine, and the position deviation data generated every time is likely to and differs.
The basic position deviation data of acquisition can be generated into position deviation compared with the position deviation data of each time With reference to offset, which is used to carry out the position measurement of follow-up detection device generation to be adjusted with reference to offset Compensation, the position measurement as measurement result output that detection device to be adjusted finally obtains are the numbers after overcompensation According to.
Above-mentioned position deviation refers to offset based on the position deviation data that benchmaring equipment generates, and examines Considered when detection device to be adjusted is repeated several times measurement due to detection device in itself caused by measuring machine it is poor, set in detection to be adjusted During standby follow-up progress position detection, the position deviation data of generation is adjusted with reference to offset by the position deviation, can It is poor to reduce the measuring machine of measurement equipment to be checked, it is effectively improved measurement result accuracy and the validity of detection device.
After being detected to the pattern formed on display base plate, the product of display base plate can be assessed according to the measurement result of acquisition Matter, can select the good display base plate of quality to carry out the follow-up other processes for preparing display device product as needed, improve detection The measurement result accuracy of equipment provides reliably foundation for the judgement subsequently to product quality, also, the measurement result is also The reference data of the mask plate quality of the pattern of display base plate is prepared for evaluation, the accuracy for improving measurement result is also monitoring The quality of mask plate provides reliable data supporting, improves the monitoring capacity to the quality of mask plate.
In an optional embodiment, as shown in Fig. 2, the position deviation according to basis described in above-mentioned steps S30 Data and the generation of the position deviation data of each time position deviation refer to offset, including:
Step S31, the position generated according to the position deviation data on basis and detection device to be adjusted wherein one-time detection Deviation data generates position deviation theoretical com-pensation value;
Step S32, the position deviation data of each time that detection generation is repeated several times according to detection device to be adjusted generates position Put deviation repeatability offset;
Step S33, according to position deviation theoretical com-pensation value and the generation position deviation reference of position deviation repeatability offset Offset.
In the present embodiment, the basic position deviation data and detection to be adjusted that are generated first by benchmaring equipment are set The position deviation data generation position deviation theoretical com-pensation value of standby one-time detection generation, which is with base The position deviation data of plinth is according to acquisition, which is the position deviation for obtaining detection device to be adjusted Data reach the requirement of the position deviation data of benchmaring equipment acquisition.
But since detection device to be adjusted has in itself, measuring machine is poor, if the position only generated with one-time detection Put and final offset is obtained subject to deviation data, there is larger randomness, it is impossible to sufficiently embody detection device to be adjusted Since measuring machine caused by equipment reason itself is poor, offset is inaccurate, accordingly, further in the present embodiment, root The position deviation data of each time that detection generation is repeated several times according to detection device to be adjusted generates position deviation repeatability offset, The repeatability offset can be poor due to measuring machine caused by randomness to avoid detection device to be adjusted, and then, can be according to above-mentioned Position deviation theoretical com-pensation value and position deviation repeatability offset generation position deviation refer to offset, this refers to offset It can accurately embody that the measuring machine of detection device to be adjusted is poor, pass through the position deviation number with reference to offset to acquisition It according to being adjusted, can reduce that the measuring machine of measurement equipment to be checked is poor, be effectively improved the measurement result accuracy of detection device and have Effect property.
Above-described embodiment is to obtain a kind of embodiment that position deviation refers to offset, and the present invention is not limited to above-mentioned Embodiment, for example, it is also possible to which detection device to be adjusted to be directly repeated several times to the position deviation data of each time of detection generation The position deviation repeatability offset of generation obtains position deviation with reference to compensation compared with the position deviation data on basis Value, can also so achieve the purpose that the measuring machine for reducing measurement equipment to be checked is poor.
In some instances, above-mentioned steps S31 can be:
By the position deviation data on basis and the detection device to be adjusted wherein position deviation data of one-time detection generation Difference is as position deviation theoretical com-pensation value;
Above-mentioned steps S32 can be:
Using detection device to be adjusted be repeated several times detection generation the position deviation data of each time average value as Position deviation repeatability offset;
Above-mentioned steps S33 can be:
Using position deviation theoretical com-pensation value and position deviation repeatability offset and as position deviation refer to offset.
In the present embodiment, there is provided calculation position deviation theoretical com-pensation value, the compensation of position deviation repeatability and position deviation With reference to a kind of mode of offset, wherein, position deviation data and detection to be adjusted based on position deviation theoretical com-pensation value The difference of the position deviation data of equipment one-time detection generation, position deviation repeatability offset are each secondary position deviation data Average value, and position deviation is position deviation theoretical com-pensation value and the sum of position deviation repeatability offset with reference to offset, is somebody's turn to do Kind mode, which calculates, simply, can accelerate the speed that detection device to be adjusted obtains final measurement result, improve detection efficiency.
Certainly, the present embodiment is a kind of calculation, and those skilled in the art can also design other meters as needed Calculation mode, for example, it is also possible to calculate the weighted average of the position deviation data of each time, or sets according to different detections to be adjusted The position deviation of calculating is further set regulation coefficient etc. by standby sensitivity and precision etc., testing staff with reference to offset, The present invention does not limit this.
In some instances, the pattern that above-mentioned position deviation data includes being formed on display base plate is on display base plate Actual position coordinate and the difference of theoretical position coordinate.
Actual position coordinate of the pattern formed on display base plate on display base plate is that figure has been prepared on display base plate After case, physical location of the pattern on display base plate, and theoretical position coordinate is ideally, pattern is on display base plate According to the position where design requirement, the position deviation data that detection device obtains is the difference of two positions, passes through the difference It can know position deviation size of the pattern on display base plate, judge the product quality of display base plate accordingly.
Position coordinates of the pattern on display base plate can be represented with abscissa and ordinate, be usually formed on display base plate Multiple patterns of matrix arrangement, can be with the coordinate origin that certain is put on display base plate, for example, can be with one of the lower left corner on display base plate Pattern position, a pattern position in the upper left corner, a pattern position in the upper right corner, the pattern place in the lower right corner Position or a pattern position of central point are coordinate origin, and the abscissa size and ordinate of other patterns and origin are big Small to be used as position coordinates, such position deviation data can be the position deviation value of the abscissa for the pattern that needs detect and horizontal seat Target position deviation value.
Above-mentioned position deviation theoretical com-pensation value includes abscissa positions deviation theoretical com-pensation value X1 and ordinate position is inclined Poor theoretical com-pensation value Y1, position deviation repeatability offset include abscissa positions deviation repeatability offset X2 and ordinate position Deviation repeatability offset Y2 is put, position deviation includes abscissa positions deviation Reference offset X and ordinate with reference to offset Position deviation refers to offset Y, X=X1+X2, Y=Y1+Y2.
It is further detailed with reference to compensation method of the experimental data to above-described embodiment.
As shown in Figure 3 and Figure 4, Fig. 3 and Fig. 4 is the line chart of the relevant position bias compensation value obtained, and Fig. 3 is abscissa The line chart of position deviation offset, the lateral coordinates of Fig. 3 represent to carry out position detection to the pattern formed on display base plate Number of patterns, longitudinal coordinate represent the numerical value of the position deviation offset of each pattern;Fig. 4 is ordinate position deviation offset Line chart, the lateral coordinates of Fig. 4 represent to carry out the pattern formed on display base plate the number of patterns of position detection, longitudinal coordinate Represent the numerical value of the position deviation offset of each pattern.
Wherein, Fig. 3 includes:Abscissa positions deviation theoretical com-pensation value X1, the abscissa positions of each pattern of each pattern are inclined The line chart of the line chart of poor repeatability offset X2 and the abscissa positions deviation Reference offset X of each pattern;Fig. 4 includes: The ordinate position deviation theoretical com-pensation value Y1 of each pattern, ordinate position deviation repeatability the offset Y2 and Ge Tu of each pattern The ordinate position deviation of case refers to offset Y.
It can be seen that by above-mentioned Fig. 3 and Fig. 4, when carrying out position detection by detection device to be adjusted, wherein inspection to be adjusted The position deviation repeatability offset that measurement equipment carries out that detection is repeated several times has a significant impact last measurement result, to be adjusted The measuring machine difference of detection device is mainly as caused by the repeatability of equipment to be adjusted, therefore, by setting in the embodiment of the present invention Seated position deviation repeatability offset, according to compensating, can make the position measurement as measurement result output to position testing number Data are more accurate.
As shown in Figure 5 and Figure 6, Fig. 5 and Fig. 6 is shown by detection device to be adjusted to being formed on same display base plate Pattern carries out the line chart of the position deviation data of position detection generation, and Fig. 5 is the line chart of abscissa positions deviation data, is schemed 5 lateral coordinates represent the number of patterns measured to the pattern formed on display base plate, and longitudinal coordinate represents to use and waits to adjust Whole detection device carries out each pattern the numerical value of the abscissa positions deviation of position detection generation with using benchmaring equipment pair Each pattern formed on same display base plate using same method be detected generation abscissa positions deviation numerical value it Between difference (be known as Δ X);Fig. 3 is the line chart of ordinate position deviation data, and the lateral coordinates of Fig. 3 are represented to display base plate The number of patterns that the pattern of upper formation measures, longitudinal coordinate are represented using detection device to be adjusted to each pattern into row position Detect the numerical value of the ordinate position deviation of generation with using benchmaring equipment to each pattern for being formed on same display base plate The difference (being known as Δ Y) being detected using same method between the numerical value of the ordinate position deviation of generation.
Wherein, Fig. 5 includes:The abscissa position of each pattern of position detection generation is carried out using the compensation method of correlation technique The difference DELTA X1 for putting deviation and the compensation method for using the present embodiment carry out the ordinate position of each pattern of position detection generation The difference DELTA X2 of deviation;Fig. 6 includes:The ordinate of each pattern of position detection generation is carried out using the compensation method of correlation technique The compensation method of the difference DELTA Y1 and use the present embodiment of position deviation carry out the ordinate position of each pattern of position detection generation Put the difference DELTA Y2 of deviation, also, with reference to following table, following table for the position deviation in Fig. 5 and Fig. 6 difference into The related data of row statistics.
It can be seen from Fig. 5, Fig. 6 and above table after using the compensation method of present embodiment, the position of generation is inclined Difference (including Δ X and Δ Y) between the numerical value of difference and the numerical value of the position deviation generated using benchmaring equipment is close simultaneously Level off to 0, also, compared with the compensation method using correlation technique, after the compensation method of the present embodiment, above-mentioned difference The excursion of the maxima and minima of Δ X is changed into 0.76um, the change of the maxima and minima of difference DELTA Y from 1.68um Scope is changed into 1.03um from 2.05um, therefore, it is known that after the compensation method of the present embodiment, difference DELTA X and Δ Y reduce nearly two Times, namely after the compensation method of use the present embodiment, detection device to be adjusted is detected the position deviation data and base of generation Quasi- detection device is detected the difference smaller between the position deviation data of generation, and compensation effect greatly promotes.
Corresponding with above-mentioned compensation method, the embodiment of the present invention also provides a kind of machine difference compensation of display base plate detection device Device, as shown in fig. 7, the device includes:
Basic deviation data acquiring unit 20, for obtaining the position deviation data on basis, the basic position deviation Data are to carry out position detection generation to the pattern formed on display base plate using benchmaring equipment;
Deviation data acquiring unit 21 is repeated, for obtaining the position deviation data of each time, the position deviation of described each time Data are the pattern formed on the display base plate to be carried out using detection device to be adjusted position detection generation is repeated several times;
Deviation Reference offset generation unit 22, for inclined according to the basic position deviation data and the position of each time Difference data generation position deviation refers to offset, is carried out with the position deviation data generated in the detection to detection device to be adjusted Compensation.
In an optional embodiment, the deviation Reference offset generation unit includes:
Deviation theoretical com-pensation value computation subunit, for being set according to the basic position deviation data and detection to be adjusted The position deviation data generation position deviation theoretical com-pensation value of standby wherein one-time detection generation;
Deviation repeatability compensation value calculation subelement, for each of detection generation to be repeated several times according to detection device to be adjusted Secondary position deviation data generation position deviation repeatability offset;
Deviation Reference compensation value calculation unit, for according to the position deviation theoretical com-pensation value and the position deviation weight Renaturation offset generation position deviation refers to offset.
In some instances, the deviation theoretical com-pensation value computation subunit is specifically used for the basic position deviation Data and the difference of the detection device to be adjusted wherein position deviation data of one-time detection generation are theoretical as the position deviation Offset;
The deviation repeatability compensation value calculation subelement is specifically used for the detection device to be adjusted detection life is repeated several times Into the position deviation data of each time average value as the position deviation repeatability offset;
The deviation Reference compensation value calculation subelement is specifically used for the position deviation theoretical com-pensation value and institute's rheme Put deviation repeatability offset and refer to offset as the position deviation.
Each unit in above-mentioned compensation device can be integrated in one, and can also be deployed separately.Above-mentioned each unit can be with A unit is merged into, multiple subelements can also be further split into.
Through the above description of the embodiments, the compensation device of the present embodiment can be realized by the mode of software, or Software adds the mode of required common hardware to realize, naturally it is also possible to passes through hardware realization.Based on such understanding, the present invention The part that substantially contributes in other words to the prior art of technical solution can be embodied in the form of software product, should Software product can be applied in detection device, such as the application software as detection device, by being installed in detection device Corresponding application software realizes above-mentioned compensation method, and it is poor to reduce the measuring machine of detection device, is effectively improved detection device Measurement result accuracy and validity.
The embodiment of the present invention also provides a kind of display base plate detection device, including the compensation dress described in any of the above-described embodiment Put.
The display base plate detection device of the present embodiment, due to using above-mentioned compensation device, can reduce detection device Measuring machine is poor, is effectively improved measurement result accuracy and the validity of detection device.
Those skilled in the art will readily occur to the present invention its after considering specification and putting into practice disclosure disclosed herein Its embodiment.It is contemplated that cover the present invention any variations, uses, or adaptations, these modifications, purposes or Person's adaptive change follows the general principle of the present invention and including undocumented common knowledge in the art of the invention Or conventional techniques.Description and embodiments are considered only as exemplary, and true scope and spirit of the invention are by following Claim is pointed out.
It should be appreciated that the invention is not limited in the precision architecture for being described above and being shown in the drawings, and And various modifications and changes may be made without departing from the scope thereof.The scope of the present invention is only limited by appended claim.

Claims (10)

  1. A kind of 1. machine difference compensation method of display base plate detection device, it is characterised in that including:
    The position deviation data on basis is obtained, the basic position deviation data is to display base plate using benchmaring equipment The pattern of upper formation carries out position detection generation
    The position deviation data of each time is obtained, the position deviation data of described each time is to described aobvious using detection device to be adjusted Show that the pattern formed on substrate carries out that position detection generation is repeated several times;
    Offset is referred to according to the basic position deviation data and the generation of the position deviation data of each time position deviation, with right The position deviation data that detection device to be adjusted generates in the detection compensates.
  2. 2. compensation method according to claim 1, it is characterised in that it is described according to the basic position deviation data and The position deviation data generation position deviation of each time refers to offset, including:
    The position deviation data obtained according to the basic position deviation data and detection device to be adjusted wherein one-time detection Generate position deviation theoretical com-pensation value;
    The generation position deviation repeatability of the position deviation data of each time of detection generation is repeated several times according to detection device to be adjusted Offset;
    According to the position deviation theoretical com-pensation value and position deviation repeatability offset generation position deviation with reference to compensation Value.
  3. 3. compensation method according to claim 2, it is characterised in that
    The position deviation generated according to the basic position deviation data and detection device to be adjusted wherein one-time detection Data generate position deviation theoretical com-pensation value, including:
    By the basic position deviation data and the detection device to be adjusted wherein position deviation data of one-time detection generation Difference is as the position deviation theoretical com-pensation value;
    The generation of the position deviation data of each time position according to the detection device multiplicating detection generation to be adjusted is inclined Poor repeatability offset, including;
    The average value of the position deviation data of each time of detection generation is repeated several times as the position in detection device to be adjusted Deviation repeatability offset;
    It is described to be referred to according to the position deviation theoretical com-pensation value and position deviation repeatability offset generation position deviation Offset, including:
    Using the position deviation theoretical com-pensation value and the position deviation repeatability offset and join as the position deviation Examine offset.
  4. 4. according to claim 1-3 any one of them compensation methodes, it is characterised in that the position deviation data includes display Actual position coordinate of the pattern formed on substrate on display base plate and the difference of theoretical position coordinate.
  5. 5. compensation method according to claim 4, it is characterised in that the pattern formed on the display base plate is display base The pattern of the organic light-emitting units formed on plate.
  6. A kind of 6. machine difference compensating device of display base plate detection device, it is characterised in that including:
    Basic deviation data acquiring unit, for obtaining the position deviation data on basis, the basic position deviation data is Position detection generation is carried out to the pattern formed on display base plate using benchmaring equipment;
    Deviation data acquiring unit is repeated, for obtaining the position deviation data of each time, the position deviation data of described each time is The pattern formed on the display base plate is carried out using detection device to be adjusted position detection generation is repeated several times;
    Deviation Reference offset generation unit, for according to the basic position deviation data and the position deviation data of each time Generation position deviation refers to offset, is compensated with the position deviation data obtained in the detection to detection device to be adjusted.
  7. 7. compensation device according to claim 6, it is characterised in that the deviation Reference offset generation unit includes:
    Deviation theoretical com-pensation value computation subunit, for according to the basic position deviation data and detection device to be adjusted its The position deviation data generation position deviation theoretical com-pensation value of middle one-time detection generation;
    Deviation repeatability compensation value calculation subelement, is detected each time generated for being repeated several times according to detection device to be adjusted Position deviation data generates position deviation repeatability offset;
    Deviation Reference compensation value calculation unit, for according to the position deviation theoretical com-pensation value and position deviation repeatability Offset generation position deviation refers to offset.
  8. 8. compensation device according to claim 7, it is characterised in that
    The deviation theoretical com-pensation value computation subunit is specifically used for the basic position deviation data and detection to be adjusted The difference of the equipment wherein position deviation data of one-time detection generation is as the position deviation theoretical com-pensation value;
    The deviation repeatability compensation value calculation subelement is specifically used for the detection device to be adjusted detection generation is repeated several times The average value of the position deviation data of each time is as the position deviation repeatability offset;
    The deviation Reference compensation value calculation subelement is specifically used for the position deviation theoretical com-pensation value and the position is inclined Poor repeatability offset and refer to offset as the position deviation.
  9. 9. according to claim 6-8 any one of them compensation devices, it is characterised in that the position deviation data includes display Actual position coordinate of the pattern formed on substrate on display base plate and the difference of theoretical position coordinate.
  10. 10. a kind of display base plate detection device, it is characterised in that including claim 6-9 any one of them compensation devices.
CN201711160927.1A 2017-11-20 2017-11-20 display substrate detection equipment, machine difference compensation method and device thereof Active CN108007410B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711160927.1A CN108007410B (en) 2017-11-20 2017-11-20 display substrate detection equipment, machine difference compensation method and device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711160927.1A CN108007410B (en) 2017-11-20 2017-11-20 display substrate detection equipment, machine difference compensation method and device thereof

Publications (2)

Publication Number Publication Date
CN108007410A true CN108007410A (en) 2018-05-08
CN108007410B CN108007410B (en) 2019-12-10

Family

ID=62052916

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711160927.1A Active CN108007410B (en) 2017-11-20 2017-11-20 display substrate detection equipment, machine difference compensation method and device thereof

Country Status (1)

Country Link
CN (1) CN108007410B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109596055A (en) * 2018-12-17 2019-04-09 深圳市华星光电技术有限公司 The correction method of padding height measurer
CN113933025A (en) * 2021-09-09 2022-01-14 深圳市富瑞精密制品有限公司 Method and device for compensating machine error of display substrate detection equipment and detection equipment

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1511246A (en) * 2001-05-24 2004-07-07 Oht��ʽ���� Device and method for substrate displacement detection
US20080206654A1 (en) * 2007-02-23 2008-08-28 Nuflare Technology, Inc. Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
CN105280842A (en) * 2014-07-25 2016-01-27 上海和辉光电有限公司 Method used for measuring sub-pixel offset in OLED manufacturing process
CN105593636A (en) * 2013-11-06 2016-05-18 株式会社高永科技 Method for compensating field of view during substrate inspection
CN106129270A (en) * 2016-07-01 2016-11-16 武汉华星光电技术有限公司 Monitoring mask plate forms method and the substrate of pattern position
CN106291488A (en) * 2016-08-16 2017-01-04 中国人民解放军防空兵学院 A kind of Radar Calibration error calibration method
CN106468601A (en) * 2016-09-14 2017-03-01 上海为准电子科技有限公司 A kind of method and device of temperature correction
CN106502045A (en) * 2016-10-31 2017-03-15 京东方科技集团股份有限公司 Method and system for the method for equipment, manufacture mask plate or display base plate

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1511246A (en) * 2001-05-24 2004-07-07 Oht��ʽ���� Device and method for substrate displacement detection
US20080206654A1 (en) * 2007-02-23 2008-08-28 Nuflare Technology, Inc. Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
CN105593636A (en) * 2013-11-06 2016-05-18 株式会社高永科技 Method for compensating field of view during substrate inspection
CN105280842A (en) * 2014-07-25 2016-01-27 上海和辉光电有限公司 Method used for measuring sub-pixel offset in OLED manufacturing process
CN106129270A (en) * 2016-07-01 2016-11-16 武汉华星光电技术有限公司 Monitoring mask plate forms method and the substrate of pattern position
CN106291488A (en) * 2016-08-16 2017-01-04 中国人民解放军防空兵学院 A kind of Radar Calibration error calibration method
CN106468601A (en) * 2016-09-14 2017-03-01 上海为准电子科技有限公司 A kind of method and device of temperature correction
CN106502045A (en) * 2016-10-31 2017-03-15 京东方科技集团股份有限公司 Method and system for the method for equipment, manufacture mask plate or display base plate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
刘万里 等: "便携式三坐标测量臂校准和误差补偿", 《仪器仪表学报》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109596055A (en) * 2018-12-17 2019-04-09 深圳市华星光电技术有限公司 The correction method of padding height measurer
CN113933025A (en) * 2021-09-09 2022-01-14 深圳市富瑞精密制品有限公司 Method and device for compensating machine error of display substrate detection equipment and detection equipment

Also Published As

Publication number Publication date
CN108007410B (en) 2019-12-10

Similar Documents

Publication Publication Date Title
US9390885B2 (en) Superposition measuring apparatus, superposition measuring method, and superposition measuring system
US8768665B2 (en) Site based quantification of substrate topography and its relation to lithography defocus and overlay
CN104894510B (en) Alignment method and system for making mask integrated framework
JP5864455B2 (en) System, method, and computer program product for CAD-based alignment
JP6254763B2 (en) System, method, and computer program product for CAD-based alignment
JP2019529930A (en) Optical measuring apparatus and method
CN108007410A (en) The machine difference compensation method of display base plate detection device and device, detection device
CN110289224A (en) A kind of accurate method for monitoring and improving square resistance and measure stability
CN109075090A (en) For measuring the device and method and its computer program of pattern placement and pattern magnitude
KR20080104131A (en) Device manufacturing method, device manufacturing system, and measuring/examining instrument
DE112012001136B4 (en) Wafer alignment system with optical coherence tomography
US20190235396A1 (en) Optical measurement device and method
CN102435629A (en) Detection method of scanning electron microscope
CN106158679A (en) In conjunction with wafer entity measuring with digital resolution to improve semiconductor element manufacturing method thereof
CN105258642B (en) Based on the relevant real-time optical extensometer measurement method of digital picture
CN104391390B (en) Substrate checking device and method
CN108398091A (en) The accurate vision measuring method of blade tip three-D displacement amount
CN102257593B (en) Simultaneous measurement of beams in lithography system
CN105716497A (en) Method for testing repeated positioning accuracy of machine
CN108803264A (en) The determination method of multiple alignment marks being centrally placed with photoetching position on wafer
CN106165065B (en) High density for generating mask is registrated method, system and the computer program product of mapping graph
CN107036710B (en) Using the light field luminous intensity distribution measurement method of multi-detector
CN110268512A (en) The method that pattern places correction
TW201443458A (en) Alignment support device and alignment support method for probe devices
JP2012242138A (en) Shape measuring device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant