CN107910385B - 一种铟镓砷红外探测器制备方法 - Google Patents
一种铟镓砷红外探测器制备方法 Download PDFInfo
- Publication number
- CN107910385B CN107910385B CN201711057712.7A CN201711057712A CN107910385B CN 107910385 B CN107910385 B CN 107910385B CN 201711057712 A CN201711057712 A CN 201711057712A CN 107910385 B CN107910385 B CN 107910385B
- Authority
- CN
- China
- Prior art keywords
- infrared detector
- indium gallium
- gallium arsenic
- inp
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 229910052738 indium Inorganic materials 0.000 title claims abstract description 23
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims abstract description 17
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 10
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 7
- 238000004528 spin coating Methods 0.000 claims abstract description 7
- 239000011521 glass Substances 0.000 claims abstract description 6
- HYJODZUSLXOFNC-UHFFFAOYSA-N [S].[Cl] Chemical compound [S].[Cl] HYJODZUSLXOFNC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052691 Erbium Inorganic materials 0.000 claims description 10
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 claims description 9
- 239000010408 film Substances 0.000 claims description 9
- 229910005228 Ga2S3 Inorganic materials 0.000 claims description 6
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000003786 synthesis reaction Methods 0.000 claims description 2
- -1 rare earth ions Chemical class 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 11
- 238000010521 absorption reaction Methods 0.000 abstract description 6
- 238000009792 diffusion process Methods 0.000 description 10
- 239000011701 zinc Substances 0.000 description 8
- 230000005855 radiation Effects 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910004205 SiNX Inorganic materials 0.000 description 3
- 239000006011 Zinc phosphide Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000000295 emission spectrum Methods 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- HOKBIQDJCNTWST-UHFFFAOYSA-N phosphanylidenezinc;zinc Chemical group [Zn].[Zn]=P.[Zn]=P HOKBIQDJCNTWST-UHFFFAOYSA-N 0.000 description 3
- 229940048462 zinc phosphide Drugs 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910005862 GeS2 Ga2S3 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- OFNGHAYJUVTBAK-UHFFFAOYSA-N 2,3,3-trichlorooxepane Chemical compound ClC1OCCCCC1(Cl)Cl OFNGHAYJUVTBAK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000000695 excitation spectrum Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
- H01L31/1844—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02322—Optical elements or arrangements associated with the device comprising luminescent members, e.g. fluorescent sheets upon the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PIN type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Light Receiving Elements (AREA)
Abstract
本发明涉及一种铟镓砷红外探测器制备方法,为一种InP/InGaAs/InP类型的P‑I‑N结构红外探测器,用旋涂法制备一层掺杂稀土材料的下转换发光薄膜到铟镓砷红外探测器InP帽层上作为转换层,此转换层吸收400nm~600nm可见光,发射1μm近红外光。利用掺杂稀土元素的氯硫玻璃完成可见光到近红外光的转换,不影响铟镓砷红外探测器对短波红外的吸收,同时吸收400nm~600nm可见光,发射1μm左右的近红外光被铟镓砷红外探测器吸收,实现铟镓砷红外探测器可见光范围的扩展。具有结构简单,成本低的优点。当需要进行多波段探测时,扩展铟镓砷红外探测器探测范围到可见光这种方式优势非常明显、实用性很强。
Description
技术领域
本发明涉及一种红外探测器制备方法,特别涉及一种可见范围扩展的铟镓砷红外探测器制备方法。
背景技术
在自然界中,温度高于绝对零度的任何物体,都会不断地向四周辐射红外谱线,物体发出的辐射,都要通过大气传输才能到达红外接收装置。由于大气中二氧化碳、水蒸气等气体对红外辐射会产生选择性吸收和微粒散射,使红外辐射发生不同程度的衰减。通常将大气窗口分为短波红外(1~3μm)、中波红外(3~6μm)、和长波红外(6~15μm)。
红外探测技术是利用目标与背景间的红外辐射差所形成的热点或图像获取目标及背景信息。根据探测目标波长的不同,所选用的探测器也不同,在短波红外探测领域,铟镓砷红外探测器因其具有常温工作特性以及铟镓砷材料生长的稳定性而倍受青睐。
下转换材料发光材料,是指能够在吸收一个高能光子的可见光后,发射两个或多个低能光子的材料。由于下转换发光可将一个高能光子转换为两个以上的可被利用的低能光子,在理论上量子效率可达到200%以上。在氯硫玻璃GeS2–Ga2S3–CsCl中掺杂稀土元素Er,Yb能有效的将400nm~600nm可见光转换为1μm的近红外光。
随着现代应用的需要,对红外探测器的研究主要集中在以下几个方面:
1)充分利用大气窗口,探测光谱从近红外光谱扩展到长波红外光谱,甚至甚长波红外光谱;
2)实现对目标的非制冷探测;
3)从单元器件发展到多元、凝视型焦平面阵列,以及探测器读出电路实现单片集成;
4)由单波段发展到双波段甚至多波段的红外探测器。
因此,通过组合铟镓砷红外探测器与稀土掺杂GeS2–Ga2S3–CsCl:Er,Yb下转换发光材料来扩展铟镓砷红外探测器探测范围到可见光是符合研究趋势的。
发明内容
本发明是针对目前铟镓砷红外探测器仅能探测单一波长的近红外波的问题,提出了一种铟镓砷红外探测器制备方法,该探测器中InP帽层上的下转换发光材料能够透过近红外波,不影响铟镓砷红外探测器对短波红外的吸收,同时吸收400nm~600nm可见光,发射1μm左右的近红外光被铟镓砷红外探测器吸收,能够实现铟镓砷红外探测器可见光范围的扩展。
本发明的技术方案为:一种铟镓砷红外探测器制备方法,为一种InP/InGaAs/InP类型的P-I-N结构红外探测器,用旋涂法制备一层掺杂稀土材料的下转换发光薄膜到铟镓砷红外探测器InP帽层上作为转换层,此转换层吸收400nm~600nm可见光,发射1μm近红外光。
所述下转换发光薄膜的制作:使用高纯度多晶99.999%锗、99.999%镓、99.999%硫和99.9%氯化铯人工合成GeS2–Ga2S3–CsCl基质氯硫玻璃,以99.9%Er2S3、99.9%Yb2S3的形式掺杂稀土元素Er,Yb到基质氯硫玻璃,用旋涂法制备一层GeS2–Ga2S3–CsCl:Er,Yb下转换发光薄膜。
所述掺杂稀土材料的下转换发光薄膜中的稀土离子为Pr3+或者Tb3+或者Tm3+与Yb3+之间的组合。
所述InP/InGaAs/InP类型的P-I-N结构红外探测器的制作:采用金属有机化学气相沉积技术在InP半绝缘衬底上依次生长
1)、厚度0.5μm,掺Si浓度为2×1018cm-3的N+型InP缓冲层;
2)、N+型InP缓冲层4中间段上面的厚度为2.5μm,掺Si浓度为5×1016cm-3的N-型InGaAs吸收层;
3)整个N-型InGaAs吸收层3上面的厚度为1.0μm,掺Zn浓度为4×1018的P型InP帽层。
在制作后InP/InGaAs/InP类型的P-I-N结构红外探测器上,以SiNx作为扩散阻挡层,扩散源为磷化锌,在InP缓冲层两端生长N型接触电极Au,厚度为20nm,在InP帽层生长欧姆接触P型接触电极Au/Zn/Au,厚度分别为20/70/300nm。
本发明的有益效果在于:本发明一种铟镓砷红外探测器制备方法,利用掺杂稀土元素的氯硫玻璃完成可见光到近红外光的转换,将400nm~600nm可见光转换成铟镓砷探测器可以探测的1μm近红外光,具有结构简单,成本低的优点。当需要进行多波段探测时,扩展铟镓砷红外探测器探测范围到可见光这种方式优势非常明显、实用性很强。
附图说明
图1为本发明扩展后铟镓砷红外探测器结构示意图;
图2为本发明下转换材料GeS2–Ga2S3–CsCl:Er,Yb转换过程图;
图3为本发明下转换膜在458nm激发光谱下的发射光谱图.
具体实施方式
如图1所示扩展后铟镓砷红外探测器结构示意图,为一种InP/InGaAs/InP类型的P-I-N结构红外探测器,本实例采用金属有机化学气相沉积(MOCVD)技术在InP半绝缘衬底上依次生长1)、厚度0.5μm,掺Si浓度为2×1018cm-3的N+型InP缓冲层4;2)、N+型InP缓冲层4中间段上面的厚度为2.5μm,掺Si浓度为5×1016cm-3的N-型InGaAs吸收层3;3)整个N-型InGaAs吸收层3上面的厚度为1.0μm,掺Zn浓度为4×1018的P型InP帽层2。
SiNx作为扩散阻挡层,扩散源为磷化锌,在InP缓冲层4两端生长N型接触电极Au,厚度为20nm,在InP帽层2生长欧姆接触P型接触电极Au/Zn/Au,厚度分别为20/70/300nm。
使用三氯乙烯、乙醚、丙酮、乙醇对外延片进行清洗,用等离子体增强化学气相沉积(200nm)的SiNx作为扩散阻挡层,在SiNx层上利用标准光刻工艺和湿法腐蚀开孔扩散,然后以磷化锌为扩散源,利用闭管扩散工艺进行Zn扩散,形成P-InP帽层。在扩散窗口层再淀积200nm的SiNx层作为抗反射钝化层,开P电极孔并生长Au/Zn/Au作为P型电极,厚度分别为20/70/300nm,然后480℃退火15s。
本实例使用高纯度多晶锗(99.999%)、镓(99.999%)、硫(99.999%)和氯化铯(99.9%)人工合成GeS2–Ga2S3–CsCl基质氯硫玻璃,以Er2S3(99.9%)、Yb2S3(99.9%)的形式掺杂稀土元素Er,Yb到基质玻璃,用旋涂法制备一层GeS2–Ga2S3–CsCl:Er,Yb下转换发光薄膜到铟镓砷红外探测器InP帽层上作为转换层1,该转换层转换一个可见光子为两个近红外光子的过程如图2所示,图3为在458nm可见光激发下下转换材料膜的发射光谱,由结果可以看出发射光谱集中在1μm近红外光波段,体现出铟镓砷红外探测器探测范围由近红外波段向可见光的扩展。
所述旋涂法制备一层掺杂稀土材料的下转换发光薄膜,吸收400nm~600nm可见光,发射1μm近红外光。除了实施例中的掺杂稀土元素Er,Yb外,掺杂的稀土离子还可以为Pr3+或者Tb3+或者Tm3+与Yb3+之间的组合。
Claims (2)
1.一种铟镓砷红外探测器制备方法,为一种InP/InGaAs/InP类型的P-I-N结构红外探测器,其特征在于,用旋涂法制备一层掺杂稀土材料的下转换发光薄膜到铟镓砷红外探测器InP帽层上作为转换层,此转换层吸收400nm~600nm可见光,发射1μm近红外光;
所述下转换发光薄膜的制作:使用高纯度多晶99.999%锗、99.999%镓、99.999%硫和99.9%氯化铯人工合成GeS2–Ga2S3–CsCl基质氯硫玻璃,以99.9%Er2S3、99.9%Yb2S3的形式掺杂稀土元素Er,Yb到基质氯硫玻璃,用旋涂法制备一层GeS2–Ga2S3–CsCl:Er,Yb下转换发光薄膜。
2.根据权利要求1所述铟镓砷红外探测器制备方法,其特征在于,所述掺杂稀土材料的下转换发光薄膜中的稀土离子还可以为Pr3+或者Tb3+或者Tm3+与Yb3+之间的组合。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711057712.7A CN107910385B (zh) | 2017-11-01 | 2017-11-01 | 一种铟镓砷红外探测器制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711057712.7A CN107910385B (zh) | 2017-11-01 | 2017-11-01 | 一种铟镓砷红外探测器制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107910385A CN107910385A (zh) | 2018-04-13 |
CN107910385B true CN107910385B (zh) | 2021-08-27 |
Family
ID=61843342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711057712.7A Active CN107910385B (zh) | 2017-11-01 | 2017-11-01 | 一种铟镓砷红外探测器制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107910385B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109461788A (zh) * | 2018-10-22 | 2019-03-12 | 中国科学院上海技术物理研究所 | 一种背照射型的可见及短波红外宽光谱InGaAs探测器 |
CN109461785A (zh) * | 2018-10-22 | 2019-03-12 | 中国科学院上海技术物理研究所 | 一种正照射型的可见及短波红外宽光谱InGaAs探测器 |
CN113959272B (zh) * | 2018-12-26 | 2023-04-11 | 昆明凯航光电科技有限公司 | 一种近红外激光波长转换靶板 |
CN111694179A (zh) * | 2020-06-02 | 2020-09-22 | 深圳市华星光电半导体显示技术有限公司 | 一种显示装置及其制备方法 |
CN114649423B (zh) * | 2022-03-24 | 2023-03-24 | 中国科学院半导体研究所 | 光谱探测器及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102017167B (zh) * | 2008-04-29 | 2016-05-18 | 皇家飞利浦电子股份有限公司 | 具有波长转换体的光检测器 |
CN102208480A (zh) * | 2010-03-30 | 2011-10-05 | 连洪洲 | 太阳能电池用光转换氟化物纳米粒子的制备 |
CN103194231B (zh) * | 2013-04-08 | 2015-03-04 | 北京工业大学 | 一种稀土/金属离子掺杂下转换发光增强材料及其制备方法 |
CN104332527B (zh) * | 2014-10-08 | 2016-08-24 | 中国电子科技集团公司第五十研究所 | 一种提高铟镓砷红外探测器响应率的方法及相应探测器 |
-
2017
- 2017-11-01 CN CN201711057712.7A patent/CN107910385B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN107910385A (zh) | 2018-04-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107910385B (zh) | 一种铟镓砷红外探测器制备方法 | |
Muñoz | (Al, In, Ga) N‐based photodetectors. Some materials issues | |
CN106409968B (zh) | AlGaN基超晶格雪崩型紫外探测器及其制备方法 | |
US20200212237A1 (en) | Short wavelength infrared optoelectronic devices having a dilute nitride layer | |
CN109494275B (zh) | 一种AlGaN基日盲紫外光电晶体管探测器及其制作方法 | |
CN108878576B (zh) | 一种氧化镓基紫外探测器 | |
US20150179863A1 (en) | Avalanche photodiode utilizing interfacial misfit array | |
Vigue et al. | Evaluation of the potential of ZnSe and Zn (Mg) BeSe compounds for ultraviolet photodetection | |
CN105261668A (zh) | 异质结倍增层增强型AlGaN日盲雪崩光电二极管及其制备方法 | |
Nie et al. | The excellent performance of β-Ga2O3 Schottky photodiode under forward bias and its application in solar-blind ultraviolet communication | |
Rogalski et al. | Ultraviolet photodetectors: From photocathodes to low-dimensional solids | |
CN108538930A (zh) | 光电探测器 | |
Parakh et al. | Ensemble GaAsSb/GaAs axial configured nanowire-based separate absorption, charge, and multiplication avalanche near-infrared photodetectors | |
Boltar et al. | Solid-state photoelectronics of the ultraviolet range | |
Cho et al. | Photoresponse of n-ZnO/p-Si photodiodes to violet-green bandwidth light caused by defect states | |
Yang et al. | Zero-biased solar-blind photodetector based on ZnBeMgO/Si heterojunction | |
Joshi et al. | Low-noise UV-to-SWIR broadband photodiodes for large-format focal plane array sensors | |
Lee et al. | Characterization of electron irradiated GaN n+–p diode | |
Dabiran et al. | Direct deposition of GaN-based photocathodes on microchannel plates | |
CN113782403B (zh) | 一种AlGaN/GaN量子阱近红外-紫外双色探测光电阴极及其制备工艺 | |
Maddox et al. | Low-noise high-gain tunneling staircase photodetector | |
Plis et al. | Lateral diffusion of minority carriers in InAsSb-based nBn detectors | |
Hwang et al. | Mg x Zn 1–x O/ZnO Quantum Well Photodetectors Fabricated by Radio-Frequency Magnetron Sputtering | |
Brazzini et al. | Impact of AlN spacer on metal–semiconductor–metal Pt–InAlGaN/GaN heterostructures for ultraviolet detection | |
Liu et al. | Investigation and fabrication of p-Si/N-Mg 0.3 Zn 0.7 O: In self-powered heterojunction photodiodes by mist atmospheric pressure chemical vapor deposition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |