CN107904572A - 一种原子层沉积自动镀膜装置 - Google Patents
一种原子层沉积自动镀膜装置 Download PDFInfo
- Publication number
- CN107904572A CN107904572A CN201711380270.XA CN201711380270A CN107904572A CN 107904572 A CN107904572 A CN 107904572A CN 201711380270 A CN201711380270 A CN 201711380270A CN 107904572 A CN107904572 A CN 107904572A
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- Prior art keywords
- boat
- silicon chip
- atomic layer
- layer deposition
- slide assemblies
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Links
- 238000000231 atomic layer deposition Methods 0.000 title claims abstract description 91
- 239000007888 film coating Substances 0.000 title claims abstract description 18
- 238000009501 film coating Methods 0.000 title claims abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 76
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 76
- 239000010703 silicon Substances 0.000 claims abstract description 76
- 238000000429 assembly Methods 0.000 claims abstract description 47
- 230000000712 assembly Effects 0.000 claims abstract description 47
- 238000006243 chemical reaction Methods 0.000 claims description 36
- 238000001816 cooling Methods 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 11
- 238000000576 coating method Methods 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 8
- 239000010409 thin film Substances 0.000 abstract description 5
- 238000009776 industrial production Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 45
- 238000005516 engineering process Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 2
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 2
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 2
- 238000003877 atomic layer epitaxy Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010574 gas phase reaction Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 240000005373 Panax quinquefolius Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711380270.XA CN107904572B (zh) | 2017-12-19 | 2017-12-19 | 一种原子层沉积自动镀膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711380270.XA CN107904572B (zh) | 2017-12-19 | 2017-12-19 | 一种原子层沉积自动镀膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107904572A true CN107904572A (zh) | 2018-04-13 |
CN107904572B CN107904572B (zh) | 2023-11-03 |
Family
ID=61870341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711380270.XA Active CN107904572B (zh) | 2017-12-19 | 2017-12-19 | 一种原子层沉积自动镀膜装置 |
Country Status (1)
Country | Link |
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CN (1) | CN107904572B (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109536927A (zh) * | 2019-01-28 | 2019-03-29 | 南京爱通智能科技有限公司 | 一种适用于超大规模原子层沉积的给料系统 |
CN110629206A (zh) * | 2019-09-10 | 2019-12-31 | 苏州帕萨电子装备有限公司 | 一种n型单晶异质结太阳能电池薄膜沉积装备及其沉积方法 |
CN112522681A (zh) * | 2020-12-28 | 2021-03-19 | 宁波恒普真空技术有限公司 | 一种常压化学气相沉积设备 |
CN116623143A (zh) * | 2023-07-24 | 2023-08-22 | 等离子体装备科技(广州)有限公司 | 挂架收发系统及连续镀膜生产线 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5765982A (en) * | 1995-07-10 | 1998-06-16 | Amtech Systems, Inc. | Automatic wafer boat loading system and method |
CN102709212A (zh) * | 2012-03-20 | 2012-10-03 | 深圳市大族光伏科技股份有限公司 | 一种用于pecvd设备的自动上下料装置 |
CN104377154A (zh) * | 2014-11-03 | 2015-02-25 | 江阴方艾机器人有限公司 | 管式pecvd石墨舟装卸片系统及其工艺 |
CN104792163A (zh) * | 2015-02-25 | 2015-07-22 | 青海圣诺光电科技有限公司 | 一种基于烧结舟制备粉体的加工装置 |
CN207877856U (zh) * | 2017-12-19 | 2018-09-18 | 江苏微导纳米装备科技有限公司 | 一种原子层沉积自动镀膜装置 |
-
2017
- 2017-12-19 CN CN201711380270.XA patent/CN107904572B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5765982A (en) * | 1995-07-10 | 1998-06-16 | Amtech Systems, Inc. | Automatic wafer boat loading system and method |
CN102709212A (zh) * | 2012-03-20 | 2012-10-03 | 深圳市大族光伏科技股份有限公司 | 一种用于pecvd设备的自动上下料装置 |
CN104377154A (zh) * | 2014-11-03 | 2015-02-25 | 江阴方艾机器人有限公司 | 管式pecvd石墨舟装卸片系统及其工艺 |
CN104792163A (zh) * | 2015-02-25 | 2015-07-22 | 青海圣诺光电科技有限公司 | 一种基于烧结舟制备粉体的加工装置 |
CN207877856U (zh) * | 2017-12-19 | 2018-09-18 | 江苏微导纳米装备科技有限公司 | 一种原子层沉积自动镀膜装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109536927A (zh) * | 2019-01-28 | 2019-03-29 | 南京爱通智能科技有限公司 | 一种适用于超大规模原子层沉积的给料系统 |
CN109536927B (zh) * | 2019-01-28 | 2023-08-01 | 南京爱通智能科技有限公司 | 一种适用于超大规模原子层沉积的给料系统 |
CN110629206A (zh) * | 2019-09-10 | 2019-12-31 | 苏州帕萨电子装备有限公司 | 一种n型单晶异质结太阳能电池薄膜沉积装备及其沉积方法 |
CN112522681A (zh) * | 2020-12-28 | 2021-03-19 | 宁波恒普真空技术有限公司 | 一种常压化学气相沉积设备 |
CN116623143A (zh) * | 2023-07-24 | 2023-08-22 | 等离子体装备科技(广州)有限公司 | 挂架收发系统及连续镀膜生产线 |
CN116623143B (zh) * | 2023-07-24 | 2023-11-10 | 等离子体装备科技(广州)有限公司 | 挂架收发系统及连续镀膜生产线 |
Also Published As
Publication number | Publication date |
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CN107904572B (zh) | 2023-11-03 |
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Address after: 214028 No.11 Lijiang Road, Xinwu District, Wuxi City, Jiangsu Province Applicant after: Jiangsu micro nano technology Co.,Ltd. Address before: 214028, No. four, No. 7 Road, Wuxi New District, Jiangsu Applicant before: JIANGSU LEADMICRO NANO-EQUIPMENT TECHNOLOGY Ltd. |
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CP02 | Change in the address of a patent holder |
Address after: No. 27 Changjiang South Road, Xinwu District, Wuxi City, Jiangsu Province, China Patentee after: Jiangsu micro nano technology Co.,Ltd. Address before: No.11 Lijiang Road, Xinwu District, Wuxi City, Jiangsu Province Patentee before: Jiangsu micro nano technology Co.,Ltd. |
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CP02 | Change in the address of a patent holder |