CN107845560A - High-precision vacuum gauge tube - Google Patents
High-precision vacuum gauge tube Download PDFInfo
- Publication number
- CN107845560A CN107845560A CN201610832523.1A CN201610832523A CN107845560A CN 107845560 A CN107845560 A CN 107845560A CN 201610832523 A CN201610832523 A CN 201610832523A CN 107845560 A CN107845560 A CN 107845560A
- Authority
- CN
- China
- Prior art keywords
- shell
- electrode
- vacuum gauge
- diaphragm
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 14
- 239000010931 gold Substances 0.000 claims description 14
- 229910052737 gold Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 13
- 229910000856 hastalloy Inorganic materials 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 3
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 12
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract 2
- 230000005611 electricity Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
Landscapes
- Measuring Fluid Pressure (AREA)
Abstract
The invention relates to the technical field of semiconductor manufacturing, in particular to a high-precision vacuum gauge tube. A high precision vacuum gauge comprising: a housing; the thin film sheet is fixedly arranged in the shell and divides the inner space of the shell into a vacuum space and a measured space; the fixed electrode is fixedly arranged in the vacuum space, a main electrode is arranged on one surface of the fixed electrode, which is opposite to the thin film sheet, and a gold-plated layer is arranged on the other surface of the fixed electrode; one end of the first electrode column is connected with an external capacitance measuring circuit, and the other end of the first electrode column is connected with the shell; one end of the second electrode column is connected with an external capacitance measuring circuit, and the other end of the second electrode column penetrates through the shell to be connected with the gold-plated layer and is insulated from the shell; and the air inlet is arranged on the shell and is positioned on one side where the measured space is positioned. The invention has accurate measurement and small thermal drift coefficient, and can be suitable for vacuum measurement in semiconductor process equipment.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, and in particular to a kind of high-precision vacuum gauge.
Background technology
Need to carry out under condition of high vacuum degree in many processing steps of field of semiconductor manufacture.Film-type plenary capacitance vacuum gauge
It is widely used in measurement of vacuum in semiconductor equipment.Film-type vacuum gauge is mainly by movable film in both sides atm difference
Deform upon and produce the change of electric capacity.Because measurement accuracy is changed by membrane stress, when the temperature varies film with
The coefficient of expansion difference of shell can cause measurement to produce error.
The content of the invention
It is an object of the invention to provide a kind of high-precision vacuum gauge, the vacuum gauge measurement is accurate, suitable for half
Vacuum measurement in semiconductor process equipment.
In order to achieve the above object, the technical solution adopted by the present invention is：
A kind of high-precision vacuum gauge, including：
Shell；
Diaphragm, the diaphragm is fixedly installed on the enclosure, and the housing interior volume is divided into vacuum
Space and detected space；The material of the diaphragm is to use identical material with the shell；
Fixed electrode, the fixed electrode are fixedly installed in the vacuum space, and the fixed electrode is relative with the diaphragm
That surface be provided with main electrode, another surface of the fixed electrode is provided with Gold plated Layer；The fixed electrode is provided with through hole,
The Gold plated Layer is electrically connected by the through hole with the main electrode；
First electrode post, described first electrode post one end connect with external capacitive measuring circuit, the other end and the shell
Connect；
Second electrode post, described second electrode post one end are connected with the external capacitive measuring circuit, and the other end passes through institute
Shell is stated with the Gold plated Layer to connect, and with the casing insulation；
Air inlet, the air inlet are set on the housing, and positioned at the side where the detected space.
A circle protection ring is provided with such scheme, around the main electrode, the protection ring is located at the fixed electrode surface；
The Gold plated Layer is electrically connected with the main electrode and the protection ring respectively by the through hole；The protection ring and the main electricity
The current potential of pole is identical.
In such scheme, the vacuum gauge also includes：
Support ring, the support ring are fixed in the shell, and the diaphragm is welded in the support ring.
In such scheme, the distance of the diaphragm and the main electrode is 1 millimeter.
In such scheme, gas filtration piece is provided with the inlet port.
In such scheme, getter room is provided with the vacuum space, the getter room is used to place getter.
In such scheme, the material of the shell is Hastelloy.
In such scheme, the shell includes upper cover shell and lower cover housing, the upper cover shell and the lower cover housing
Weld together.
In such scheme, the material of the diaphragm is Hastelloy, and the thickness of the diaphragm is 30 microns.
In such scheme, the fixed electrode is potsherd.
Compared with prior art, the beneficial effects of the invention are as follows：
In the vacuum gauge provided in the present invention, diaphragm is as movable electrode and fixed electrode composition variable capacitance, film
Piece deforms upon under the draught head of its both sides vacuum space and detected space and produces the change of electric capacity, by electrode column access
Capacitance variations are converted to electric signal by external capacitive measuring circuit, so as to measure the vacuum of detected space；Due to the present invention
In shell and diaphragm employ identical material, so measurement is accurate, thermal drift coefficient is small, can be applied to semiconductor work
Vacuum measurement in skill equipment.
Brief description of the drawings
Fig. 1 is a kind of structural representation of high-precision vacuum gauge provided in an embodiment of the present invention.
Embodiment
In order to be better understood from above-mentioned technical proposal, below in conjunction with Figure of description and specific embodiment to upper
Technical scheme is stated to be described in detail.
As shown in figure 1, the embodiment of the present invention provides a kind of high-precision vacuum gauge, including：Shell, diaphragm 11, fixed electricity
Pole 6, first electrode post 3, second electrode post 2, wherein air inlet 9, diaphragm 11 form a variable capacitance with fixed electrode 6.Institute
Stating shell includes upper cover shell 1 and lower cover housing 8, and the upper cover shell 1 and the lower cover housing 8 weld together, described outer
The material of shell is Hastelloy.The diaphragm 11 is fixedly installed on the enclosure, and the housing interior volume is divided
For vacuum space and detected space；The material of the diaphragm 11 is Hastelloy, and the thickness of the diaphragm 11 is 30 microns.
The fixed electrode 6 is fixedly bonded in the vacuum space by bonding agent, and the fixed electrode 6 is relative with the diaphragm 11
That surface is provided with main electrode 12, and another surface of the fixed electrode 6 is provided with Gold plated Layer 4；The fixed electrode 6 is provided with logical
Hole 5, the Gold plated Layer 4 are electrically connected by the through hole 5 with the main electrode；The fixed electrode is potsherd.First electricity
The one end of pole 3 connects with external capacitive measuring circuit, and the other end connects with the shell, and the shell is as the external capacitive
The ground wire of measuring circuit.Described one end of second electrode post 2 is connected with the external capacitive measuring circuit, and the other end passes through described outer
Shell connects with the Gold plated Layer 4, and with the casing insulation.The air inlet 9 is set on the housing, and is located at the quilt
The side surveyed where space.
In the present embodiment, a circle protection ring 7 is electroplate with around the main electrode 12, the protection ring 7 is positioned at the fixed electricity
The surface of pole 6；The fixed electrode 6 is provided with through hole 5, the Gold plated Layer 4 by the through hole 5 respectively with the main electrode 12 and institute
Protection ring 7 is stated to electrically connect.It is also gold that the material of the protection ring 7, which is, and identical with the current potential of main electrode 12.In main electrode 12 weeks
Enclose the circle gold of plating one and be used as protection ring 7, be to reduce the edge effect of electric capacity.
In the present embodiment, the vacuum gauge also includes：Support ring 10, the support ring 10 are fixed in the shell,
The diaphragm 11 is welded in the support ring 10.Because the deformation of diaphragm 11 is very sensitive to tension force therefore in welding process
The middle tension force for ensureing diaphragm in welding process using specific instrument.
In the present embodiment, the distance of the diaphragm 11 and the main electrode 12 is 1 millimeter.To ensure measurement accuracy, need
Suitable capacitance size is selected, the distance is then calculated.
In the present embodiment, the porch of air inlet 9 is provided with gas filtration piece, for filtering out the particle in tested gas
Thing.
In the present embodiment, getter room 13 is provided with the vacuum space, the getter room 13 is used to place getter,
For keeping the vacuum of the vacuum space inside vacuum gauge for a long time.The vacuum space carries out overall zero before vacuumizing
Pump-down process.
For the present embodiment when for measurement of vacuum, the gas in vacuum space to be measured enters vacuum gauge by air inlet
Detected space, diaphragm produces deformation under the draught head of both sides two spaces, and then produces the change of electric capacity, by electrode column
The capacitance variations collected are converted to electric signal by the external capacitive measuring circuit of access, then electric signal are amplified, analog-to-digital conversion
After handled, finally give the vacuum in vacuum space to be measured.
Advantages of the present invention is as follows：
1st, because the diaphragm in the present invention and shell use Hastelloy material, thermal coefficient of expansion is identical, therefore this
Invention measures still accurate when temperature varies widely.
2nd, due to being provided with gas filtration piece at the air inlet of the present invention, the pollution particle in ambient atmos can be filtered out
Thing, influence of the particulate matter to diaphragm is avoided, ensure that measurement accuracy.
Particular embodiments described above, the purpose of the present invention, technical scheme and beneficial effect are carried out further in detail
Describe in detail it is bright, should be understood that the foregoing is only the present invention specific embodiment, be not intended to limit the invention, it is all
Within the spirit and principles in the present invention, any modification, equivalent substitution and improvements done etc., it should be included in the guarantor of the present invention
Within the scope of shield.
Claims (10)
- A kind of 1. high-precision vacuum gauge, it is characterised in that including：Shell；Diaphragm, the diaphragm is fixedly installed on the enclosure, and the housing interior volume is divided into vacuum space And detected space；The material of the diaphragm is to use identical material with the shell；Fixed electrode, the fixed electrode are fixedly installed in the vacuum space, that relative with the diaphragm of the fixed electrode One surface is provided with main electrode, and another surface of the fixed electrode is provided with Gold plated Layer；The fixed electrode is provided with through hole, described Gold plated Layer is electrically connected by the through hole with the main electrode；First electrode post, described first electrode post one end connect with external capacitive measuring circuit, and the other end connects with the shell；Second electrode post, described second electrode post one end are connected with the external capacitive measuring circuit, and the other end passes through described outer Shell connects with the Gold plated Layer, and with the casing insulation；Air inlet, the air inlet are set on the housing, and positioned at the side where the detected space.
- 2. vacuum gauge as claimed in claim 1, it is characterised in that：A circle protection ring is provided with around the main electrode, it is described Protection ring is located at the fixed electrode surface；The Gold plated Layer is electric with the main electrode and the protection ring respectively by the through hole Connection；The protection ring is identical with the current potential of the main electrode.
- 3. vacuum gauge as claimed in claim 1, it is characterised in that：The vacuum gauge also includes：Support ring, the support ring are fixed in the shell, and the diaphragm is welded in the support ring.
- 4. vacuum gauge as claimed in claim 1, it is characterised in that：The distance of the diaphragm and the main electrode is 1 milli Rice.
- 5. vacuum gauge as claimed in claim 1, it is characterised in that：Gas filtration piece is provided with the inlet port.
- 6. vacuum gauge as claimed in claim 1, it is characterised in that：Getter room, the suction are provided with the vacuum space Gas agent room is used to place getter.
- 7. vacuum gauge as claimed in claim 1, it is characterised in that：The material of the shell is Hastelloy.
- 8. vacuum gauge as claimed in claim 1, it is characterised in that：The shell includes upper cover shell and lower cover housing, institute State upper cover shell and the lower cover housing welds together.
- 9. vacuum gauge as claimed in claim 1, it is characterised in that：The material of the diaphragm is Hastelloy, described thin The thickness of diaphragm is 30 microns.
- 10. vacuum gauge as claimed in claim 1, it is characterised in that：The fixed electrode is potsherd.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832523.1A CN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832523.1A CN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107845560A true CN107845560A (en) | 2018-03-27 |
Family
ID=61657239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610832523.1A Pending CN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107845560A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112781756A (en) * | 2020-12-11 | 2021-05-11 | 兰州空间技术物理研究所 | Capacitance pressure sensor for reducing welding stress of pressure sensing film |
| CN115386856A (en) * | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115540916A (en) * | 2022-11-29 | 2022-12-30 | 北京晨晶电子有限公司 | Vacuum gauge capacitor structure and vacuum gauge |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en) * | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| US20090158853A1 (en) * | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN101776502A (en) * | 2008-12-24 | 2010-07-14 | 佳能安内华股份有限公司 | Capacitance diaphragm gauge and vaccum apparatus |
| CN102944352A (en) * | 2012-11-12 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitance film type pressure sensor capable of enhancing stability of electrode plate |
| US20130055820A1 (en) * | 2011-09-01 | 2013-03-07 | Kevin M. Bourbeau | Pressure Measuring Instrument |
| CN102967408A (en) * | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
-
2016
- 2016-09-19 CN CN201610832523.1A patent/CN107845560A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en) * | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| US20090158853A1 (en) * | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN101776502A (en) * | 2008-12-24 | 2010-07-14 | 佳能安内华股份有限公司 | Capacitance diaphragm gauge and vaccum apparatus |
| US20130055820A1 (en) * | 2011-09-01 | 2013-03-07 | Kevin M. Bourbeau | Pressure Measuring Instrument |
| CN102944352A (en) * | 2012-11-12 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitance film type pressure sensor capable of enhancing stability of electrode plate |
| CN102967408A (en) * | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112781756A (en) * | 2020-12-11 | 2021-05-11 | 兰州空间技术物理研究所 | Capacitance pressure sensor for reducing welding stress of pressure sensing film |
| CN115386856A (en) * | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115386856B (en) * | 2022-10-19 | 2023-06-02 | 季华实验室 | Diamond thin film capacitor, method for manufacturing the same, vacuum gauge and method for manufacturing the same |
| CN115540916A (en) * | 2022-11-29 | 2022-12-30 | 北京晨晶电子有限公司 | Vacuum gauge capacitor structure and vacuum gauge |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180327 |