CN107843384A - A kind of quartz thin film piece vacuum gauge - Google Patents
A kind of quartz thin film piece vacuum gauge Download PDFInfo
- Publication number
- CN107843384A CN107843384A CN201610832513.8A CN201610832513A CN107843384A CN 107843384 A CN107843384 A CN 107843384A CN 201610832513 A CN201610832513 A CN 201610832513A CN 107843384 A CN107843384 A CN 107843384A
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- CN
- China
- Prior art keywords
- diaphragm
- ceramic plates
- vacuum gauge
- vacuum
- shell
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
Abstract
The present invention relates to technical field of manufacturing semiconductors, and in particular to a kind of quartz thin film piece vacuum gauge.A kind of quartz thin film piece vacuum gauge, including：Shell, the shell include upper lid entity and base；The housing interior volume is divided into vacuum space and detected space by diaphragm, the diaphragm；The diaphragm surface be coated with one layer it is gold-plated；Ceramic plates, the ceramic plates are fixedly installed in the vacuum space, and the ceramic plates that relative surface parallel with the diaphragm is provided with piece of metal piece；The ceramic plates are provided with via, and the via introduces the electric signal of the sheet metal upper surface of the ceramic plates；First electrode post and second electrode post, are connected with external capacitive measuring circuit.There is the advantages of stress number is high, stability is high, meet the needs of semiconductor equipment as movable electrode using the diaphragm of quartz material in the present invention.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, and in particular to a kind of quartz thin film piece vacuum gauge.
Background technology
As the further development of industry, vacuum technique are more and more important.Vacuum gauge is a kind of biography for measuring vacuum
Sensor, it is widely used in semiconductor manufacturing equipment.The principle of absolute type plenary capacitance diaphragm vacuum gauge is in the prior art：
Diaphragm can produce deformation under its pressure at both sides difference, cause the capacitance of variable capacitance to change, by capacitance measurement electricity
Road and data processing can calculate vacuum.Its measurement be directly reflect the changing value of vacuum pressure and gas componant without
Close.But the diaphragm of absolute type plenary capacitance diaphragm vacuum gauge mainly uses metal foil diaphragm at present, has and is easily corroded
The shortcomings that low with stress number.
The content of the invention
It is an object of the invention to provide a kind of quartz thin film piece vacuum gauge, the vacuum gauge measurement accuracy is high, answers
Power number is high, stability is high, the vacuum measurement suitable for semiconductor manufacturing equipment.
In order to achieve the above object, the technical solution adopted by the present invention is：
A kind of quartz thin film piece vacuum gauge, including：
Shell, the shell include upper lid entity and base, and the upper lid entity connects with tube chamber welds with base；On the base
Extend stomata provided with base；
Diaphragm, the material of the diaphragm is quartz material, and the diaphragm is fixedly installed on the enclosure, and
The housing interior volume is divided into vacuum space and detected space；The diaphragm surface be coated with one layer it is gold-plated；
Ceramic plates, the ceramic plates are fixedly installed in the vacuum space, the ceramic plates and the film
Parallel that the relative surface of piece is provided with piece of metal piece；The ceramic plates are provided with via, and the via is by the metal
The electric signal of piece introduces the upper surface of the ceramic plates；
First electrode post, described first electrode post one end connect with external capacitive measuring circuit, and the other end passes through described outer
Shell connects in the vacuum space with the upper surface of the ceramic plates；
Second electrode post, described second electrode post one end are connected with the external capacitive measuring circuit, and the other end passes through institute
State gold-plated welding of the shell with the diaphragm surface in the vacuum space；
Wherein, the diaphragm is as movable electrode, and the ceramic plates are as fixed electrode, the movable electrode and institute
State fixed electrode and form a variable condenser.
In such scheme, be provided with top extending cavity at the top of the upper lid entity, the top extending cavity with it is described very
Absolutely empty is connected, and the top extending cavity is built with getter.
In such scheme, the thickness of the diaphragm is 120 microns.
In such scheme, the surface of the diaphragm is coated with one layerThick is gold-plated.
In such scheme, the material of the shell is Hastelloy.
In such scheme, the upper lid entity connects with the tube chamber welds with base.
In such scheme, the diaphragm is fixedly connected by welding with the shell.
In such scheme, the top center of the upper lid entity is provided with bleeding point.
Compared with prior art, the beneficial effects of the invention are as follows：
In the vacuum gauge provided in the present invention, diaphragm is coated with the ceramic plates conduct of main electrode as movable electrode
Under the draught head of its both sides vacuum space and detected space shape occurs for fixed electrode, the two composition variable condenser, diaphragm
Becoming and produce the change of electric capacity, capacitance variations are converted to electric signal by the external capacitive measuring circuit accessed by electrode column, so as to
Measure the vacuum of detected space；There is stress number as movable electrode using the diaphragm of quartz material in the present invention
High, the advantages of stability is high.
Brief description of the drawings
Fig. 1 is the structural representation of vacuum gauge provided in an embodiment of the present invention.
Fig. 2 is the sectional view of vacuum gauge provided in an embodiment of the present invention.
Embodiment
In order to be better understood from above-mentioned technical proposal, below in conjunction with Figure of description and specific embodiment to upper
Technical scheme is stated to be described in detail.
As depicted in figs. 1 and 2, the embodiment of the present invention provides a kind of quartz thin film piece vacuum gauge, including：Shell, it is described
The material of shell is Hastelloy；The shell includes upper lid entity 1 and base 2, and upper lid entity 1 and base 2 welding connects
Connect；The base 2 is provided with base extension stomata 3；Diaphragm 4, the material of the diaphragm 4 are quartz material, the film
Piece 4 is arranged on the enclosure by being welded and fixed, and the housing interior volume is divided into vacuum space and detected space；
The thickness of the diaphragm 4 is 120 microns, and the surface of diaphragm 4 is coated with one layerThick is gold-plated；Ceramic plates 5, institute
State ceramic plates 5 to be fixedly installed in the vacuum space, the ceramic plates 5 relative that parallel with the diaphragm 4
Surface is provided with piece of metal piece；The ceramic plates 5 are provided with via, and the electric signal of the sheet metal is introduced institute by the via
State the upper surface of ceramic plates；First electrode post 6, described one end of first electrode post 6 connects with external capacitive measuring circuit, another
End connects through the shell in the vacuum space with the upper surface of the ceramic plates 5；Second electrode post 7, described second
The one end of electrode column 7 is connected with the external capacitive measuring circuit, and the other end passes through the shell in the vacuum space and institute
State the gold-plated welding on the surface of diaphragm 4；Wherein, the diaphragm 4 is used as movable electrode, and the ceramic plates 5 are as fixed electricity
Pole, the movable electrode form a variable condenser with the fixed electrode.
In the present embodiment, the top of upper lid entity 1 is provided with top extending cavity 9, the top extending cavity 9 with it is described
Vacuum space is connected, and the top extending cavity 9 is built with getter, for absorbing the residual gas in the vacuum space
Body, it is ensured that the vacuum of vacuum space, and when preventing vacuum welding material gas leakage.
In the present embodiment, the top center of the upper lid entity 1 is additionally provided with bleeding point 8, for the vacuum in shell is empty
Between vacuumize.
The present embodiment stretches into the base extension stomata 2 of vacuum gauge in cavity to be measured when for measurement of vacuum,
Under test gas extends stomata 2 into the detected space in shell by base, and diaphragm is under the draught head of both sides two spaces
Deformation is produced, and then produces the change of electric capacity, the capacitance variations that the external capacitive measuring circuit accessed by electrode column will collect
Electric signal is converted to, then is amplified electric signal by operational amplifier, Digital Signal Processing is carried out after A/D is changed, finally
The result for obtaining the vacuum in vacuum space to be measured is shown.
Advantages of the present invention is as follows：
1st, the diaphragm in the present invention uses quartz material, has stress number height, high temperature resistant, thermal coefficient of expansion low, steady
The advantages that qualitative high.
2nd, the shell mechanism in the present invention has shock-absorbing function, can prevent that quartz thin film piece is damaged.
3rd, one layer on the diaphragm in the present invention is gold-plated, not only realizes the electrical connection that can be realized with second electrode post,
It is also prevented from gas leakage.
Particular embodiments described above, the purpose of the present invention, technical scheme and beneficial effect are carried out further in detail
Describe in detail it is bright, should be understood that the foregoing is only the present invention specific embodiment, be not intended to limit the invention, it is all
Within the spirit and principles in the present invention, any modification, equivalent substitution and improvements done etc., it should be included in the guarantor of the present invention
Within the scope of shield.
Claims (8)
- A kind of 1. quartz thin film piece vacuum gauge, it is characterised in that including：Shell, the shell include upper lid entity and base, and the upper lid entity is fixedly connected with base；The base is provided with Base extends stomata；Diaphragm, the material of the diaphragm are quartz material, and the diaphragm is fixedly installed on the enclosure, and by institute State housing interior volume and be divided into vacuum space and detected space；The diaphragm surface be coated with one layer it is gold-plated；Ceramic plates, the ceramic plates are fixedly installed in the vacuum space, and the ceramic plates are put down with the diaphragm That relative surface of row is provided with piece of metal piece；The ceramic plates are provided with via, and the via is by the sheet metal Electric signal introduces the upper surface of the ceramic plates；First electrode post, described first electrode post one end connect with external capacitive measuring circuit, and the other end exists through the shell The vacuum space connects with the upper surface of the ceramic plates；Second electrode post, described second electrode post one end are connected with the external capacitive measuring circuit, and the other end passes through described outer Gold-plated welding of the shell in the vacuum space with the diaphragm surface；Wherein, the diaphragm is as movable electrode, the ceramic plates as fixed electrode, the movable electrode with it is described solid Fixed electrode forms a variable condenser.
- 2. vacuum gauge as claimed in claim 1, it is characterised in that：Top extending cavity is provided with the top of the upper lid entity, The top extending cavity is connected with the vacuum space, and the top extending cavity is built with getter.
- 3. vacuum gauge as claimed in claim 1, it is characterised in that：The thickness of the diaphragm is 120 microns.
- 4. vacuum gauge as claimed in claim 1, it is characterised in that：The surface of the diaphragm is coated with one layerThick It is gold-plated.
- 5. vacuum gauge as claimed in claim 1, it is characterised in that：The material of the shell is Hastelloy.
- 6. vacuum gauge as claimed in claim 1, it is characterised in that：The upper lid entity connects with the tube chamber welds with base.
- 7. vacuum gauge as claimed in claim 1, it is characterised in that：The diaphragm passes through the company of being welded and fixed with the shell Connect.
- 8. vacuum gauge as claimed in claim 1, it is characterised in that：The top center of the upper lid entity is provided with bleeding point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832513.8A CN107843384A (en) | 2016-09-19 | 2016-09-19 | A kind of quartz thin film piece vacuum gauge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832513.8A CN107843384A (en) | 2016-09-19 | 2016-09-19 | A kind of quartz thin film piece vacuum gauge |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107843384A true CN107843384A (en) | 2018-03-27 |
Family
ID=61656474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610832513.8A Pending CN107843384A (en) | 2016-09-19 | 2016-09-19 | A kind of quartz thin film piece vacuum gauge |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107843384A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114459670A (en) * | 2022-04-12 | 2022-05-10 | 季华实验室 | Capacitance film vacuum gauge |
| CN115386856A (en) * | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en) * | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| CN1813179A (en) * | 2003-07-03 | 2006-08-02 | 东洋通信机株式会社 | Quartz type pressure sensor, and production method therefor |
| US20090158853A1 (en) * | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN201464109U (en) * | 2009-04-30 | 2010-05-12 | 戴德仁 | Capacitive pressure sensor for vacuum measurement |
| CN102967408A (en) * | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
-
2016
- 2016-09-19 CN CN201610832513.8A patent/CN107843384A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en) * | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| CN1813179A (en) * | 2003-07-03 | 2006-08-02 | 东洋通信机株式会社 | Quartz type pressure sensor, and production method therefor |
| US20090158853A1 (en) * | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN201464109U (en) * | 2009-04-30 | 2010-05-12 | 戴德仁 | Capacitive pressure sensor for vacuum measurement |
| CN102967408A (en) * | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114459670A (en) * | 2022-04-12 | 2022-05-10 | 季华实验室 | Capacitance film vacuum gauge |
| CN115386856A (en) * | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115386856B (en) * | 2022-10-19 | 2023-06-02 | 季华实验室 | Diamond thin film capacitor, method for manufacturing the same, vacuum gauge and method for manufacturing the same |
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Application publication date: 20180327 |
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