CN107727663A - It is a kind of that the method for carrying out failure detection is characterized to LED chip - Google Patents

It is a kind of that the method for carrying out failure detection is characterized to LED chip Download PDF

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CN107727663A
CN107727663A CN201711141916.9A CN201711141916A CN107727663A CN 107727663 A CN107727663 A CN 107727663A CN 201711141916 A CN201711141916 A CN 201711141916A CN 107727663 A CN107727663 A CN 107727663A
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led chip
chip
analysis
led
failure
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方方
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Guangdong Gold Mirror Detects Science And Technology Ltd
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Guangdong Gold Mirror Detects Science And Technology Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2202Preparing specimens therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622Ion mobility spectrometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/045Investigating materials by wave or particle radiation combination of at least 2 measurements (transmission and scatter)
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/071Investigating materials by wave or particle radiation secondary emission combination of measurements, at least 1 secondary emission
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/101Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016X-ray
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/611Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/646Specific applications or type of materials flaws, defects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/652Specific applications or type of materials impurities, foreign matter, trace amounts
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/66Specific applications or type of materials multiple steps inspection, e.g. coarse/fine

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Abstract

The method for carrying out failure detection is characterized to LED chip the invention discloses a kind of, comprised the following steps:The failure conditions not broken a seal in LED chip through epoxy resin lenses observation detection;When analyzing LED chip surface and having LED chip crackle, burn corrosion condition, based on SEM SEM scanning LED chips crackle, corrosion condition is burnt, and based on failure site output shape, size, size, structure, colouring information;The pollutant component of LED chip surface failure fractions is analyzed based on SIMS analysis SIMS, obtains composition possessed by the pollutant and ion residues thing adhered to during chip manufacturing and equipment;Fractograph analysis is carried out to LED chip.By the embodiment of the present invention, for before Kaifeng, behind Kaifeng and section integral analysis, LED chip failure can be directed to and draw a result data analyzed comprehensively.

Description

It is a kind of that the method for carrying out failure detection is characterized to LED chip
Technical field
The present invention relates to LED to test and analyze technical field, and in particular to a kind of characterized to LED chip carries out failure detection Method.
Background technology
In recent years, LED receives much concern in the application of solid state lighting and display field, and comparing, other are artificial Light source, LED have less energy consumption, long lifespan, small volume, it is green, colour purity is high many advantages, such as.With carrying for light efficiency Rise, LED is by broader applications to solid state lighting, display rear-projection etc..Chip is the raw material of LED most criticals, its quality Quality, directly determine LED performance.
Photoelectric properties parameter detecting is only made in the domestic detection of LED chip at present, has no material tests.And material and surface analysis Technology occupies considerable status in LED industry, and this detection is widely used in the links in production process, from new Monitoring in material, new process development, technical process is until failure and dissection and analysis, and existing LED encapsulation factories are due to lacking core The integrity measure of piece failure detection, whole LED chip failure is caused to lack integrity detection process.
The content of the invention
The invention provides it is a kind of to LED chip characterize carry out failure detection method, for before Kaifeng, Kaifeng after and Section integral analysis, LED chip failure can be directed to and draw a result data analyzed comprehensively.
The method for carrying out failure detection is characterized to LED chip the invention provides a kind of, comprised the following steps:
The failure conditions not broken a seal in LED chip through epoxy resin lenses observation detection, the failure conditions include core Piece crackle crack, chip pollutant, electrostatic damage;
After the LED chip that do not break a seal completes failure conditions detection, the LED chip that do not break a seal is broken a seal, and detect core Piece surface defect, bonding situation;
The split LED chip surface being honored as a queen passes through the composition of microscopy analysis chip surface microscopic, structure, state;
When analyzing LED chip surface and having LED chip crackle, burn corrosion condition, based on SEM SEM Scanning LED chip crackle, corrosion condition is burnt, and based on failure site output shape, size, size, structure, colouring information;
The pollutant component of LED chip surface failure fractions is analyzed based on SIMS analysis SIMS, Obtain composition possessed by the pollutant and ion residues thing adhered to during chip manufacturing and equipment;
Fractograph analysis is carried out to LED chip, in lead and chip weld cavity, chip substrate bond crack, chip Impurity diffusion and the analysis of internal injury crackle, are specifically included:
LED chip is placed in cast model, fixed LED chip with mould material;
LED component is ground to position to be analyzed using Ginding process;
Analysis position is treated using electron microprobe, electron microscope, metallographic microscope analysis means to lead and chip Impurity diffusion is analyzed in weld, chip substrate bonding part and chip;
Residuals after grinding are added in the impeller with deionized water and carry out rotary-cleaning;
Using purified water rotation immersion 6 to 8 hours, and carry out centrifugation and obtain the residuals after centrifugation;
The residuals after centrifugation are being dried based on drying technology, and residuals divided based on SIMS Analysis.
It is described based on SEM SEM scannings LED chip crackle, burn corrosion condition and include:
The convex-concave that LED chip surface is smiled is transformed to by electric signal by SEM, then converts the electrical signal to figure shows letter Number.
Composition possessed by the pollutant and ion residues thing for obtaining chip manufacturing and adhering to during equipping includes:
Chip and bonding pad material pollution, mutual molten, counterdiffusion, novel substance generation, external contaminant.
LED component is ground to position to be analyzed by the use Ginding process to be included:
After LED chip pours into grinding, grinding is cut, be ground or ground, afterwards by polishing, burn into Staining procedure, position exposure is analysed to treat failure analysis.
It is described by LED chip be placed on cast model in, with mould material by LED chip fix including:
Cast LED chip makes LED chip stable by retained part in grinding and grinding to make retained part.
In the present invention, it is possible to achieve the integrity analysis characterized to LED chip, the never characteristic features under the process of Kaifeng Analyzed, the failure detection being then transferred to again under opening status, internal structure is carried out for each failure state of LED chip Analyze and draw corresponding failure analysis result.Using fractograph analysis, targetedly split for each internal injury in LED chip Line, impurity etc. realize failure analysis, and carry out centrifugal treating to residue, retain the element object that analysis is available for for SIMS, real The comprehensive of whole failure detection is showed, the comprehensive analysis for realizing LED chip from inside to outside.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is that the method flow diagram for carrying out failure detection is characterized to LED chip in the embodiment of the present invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on Embodiment in the present invention, those of ordinary skill in the art are obtained all other under the premise of creative work is not made Embodiment, belong to the scope of protection of the invention.
Fig. 1, which is shown in the embodiment of the present invention, characterizes the method flow diagram for carrying out failure detection, specific bag to LED chip Include:
S101, for chip surface morphology detection and constituent analysis;
First to LED chip visual examination, it includes internal check, saturating using micro- sem observation under the premise of nondestructive The inner case of funerary objects part.Can be directly under the premise of non-destructive through epoxy resin lenses observation chip for LED component On failure conditions, including die crack crack, chip pollutant, electrostatic damage etc..The benefit of the method is exactly to greatest extent Ground ensures that LED component detects internal failure mechanism under original state.But its accuracy detects far below Kaifeng, it is impossible to complete The whole LED component of detection failure state.
, it is necessary to carry out Kaifeng processing, LED chip to LED component after the LED chip that do not break a seal completes failure conditions detection Detection chip surface defect, bonding situation first after Kaifeng.In analysis LED chip surface material composition, it is therefore an objective to which detection is dirty Situation be present in dye thing.To exposed chip surface by the composition of microscopy analysis surface microscopic, structure, state, it is necessary to observe;Core Sheet material, the misuse of structure, defect, and chip have flawless, burn corrosion condition;It will observe the shape of failure site in detail The information such as shape, size, size, structure, color.
When analyzing LED chip surface and having LED chip crackle, LED core leafing is scanned based on SEM SEM Line, corrosion condition is burnt, be using scanning electron microscope sem method that chip surface is micro- for chip surface measuring shape common method Small convex-concave is transformed to electric signal, then signal is zoomed into figure shows record.Such as LED electrostatic breakdowns can cause chip surface Breakdown is produced, visual inspection sometimes is difficult to find, may also be used for detecting using this equipment in addition to ultramicroscopic observation.ESEM SEM can observe corrosion default.Can also analysis chip surface relief state, epitaxial surface flatness, defect and the shape corroded Depth.Heterojunction structure and epitaxial layer interface position, thickness, uniformity.
The purpose of pollutant component analysis is that failure site composition transfer is analyzed, and detection chip is manufactured and assembled The pollutant and ion residues thing adhered in journey, including chip and bonding pad material pollution, mutually molten, counterdiffusion, novel substance produce, are outer Carry out pollutant etc., its be mainly based upon pollutions of the SIMS analysis SIMS to LED chip surface failure fractions into Analyzed, obtain composition possessed by the pollutant and ion residues thing adhered to during chip manufacturing and equipment.
S102, for LED chip carry out fractograph analysis;
LED fractograph analysis includes bonding impurity diffusion in crack, chip to lead and chip weld cavity, chip substrate And the analysis of internal injury crackle.Purpose is exposed device internal feature, and the chip internal that further checking signature detects is gone Defect.Preparation method is needed LED pouring into grinding, and grinding is cut, is ground or ground, afterwards by polishing, corruption The steps such as erosion, dyeing, by the exposure of LED chip inner case to treat failure analysis.
The characteristics of for LED small sizes, need to pour into a mould LED before preparing section to make retained part, in order to grind Cut and make gripping element stable when grinding.General preparation method is placed on device in appropriate model, with mould material by its It is fixed on best orientation., it is necessary to control the temperature entirely poured into a mould when mould material, general control temperature at 80 ° extremely Between 100 °.The characteristic that the backing material of LED component is hard and crisp, golden and solder ductility is good, using Ginding process by LED devices Part is ground to position to be analyzed.Especially it is careful not to introduce new damage during grinding.Electron microprobe, electronics are utilized after grinding The analysis means such as microscope, metallographic microscope expand impurity in lead and chip weld, chip substrate bonding part and chip Dissipate and analyzed.
And the residuals after grinding are added in the impeller with deionized water and carry out rotary-cleaning; Using purified water rotation immersion 6 to 8 hours, and carry out centrifugation and obtain the residuals after centrifugation;Will be from based on drying technology Residuals after the heart are dried, and carry out elementary analysis to residuals based on X-ray energy spectrometer.Here centrifugal process Some non-analytical elements can be filtered out, retains some and supplies analytical element, based on impeller and after realizing centrifugation, each material point Layer enters row element relative to that under non-Centrifugal dispersion state, can be easier to realize using X-ray energy spectrometer to residuals Analysis.
S103, constituent analysis and fractograph analysis result exported with LED failure examining report.
For the failure conditions analyzed in above procedure, complete examining report is formed, and output retains automatically, with This reaches the integrity detection process that whole LED chip characterizes, and from outside to inside and realizes the analysis of overall composition, has ensured whole Failure analysis it is comprehensive.
In the automobile LED chip such as failure, first to automobile LED chip visual examination, it includes internal check, The inner case of micro- sem observation transparent devices is utilized under the premise of nondestructive.Can be directly non-destructive for LED component Under the premise of through the failure conditions on epoxy resin lenses observation chip, such as including die crack crack, chip pollutant, quiet Electric injury etc., then forms wrong reasons.
Carry out Kaifeng processing to automobile LED device, detection chip surface defect, bonding feelings first after LED chip Kaifeng Condition.In analysis LED chip surface material composition, it is therefore an objective to detect pollutant and situation be present.Mirror is passed through to exposed chip surface The composition for analyzing surface microscopic, structure, state are examined, it is necessary to observe;Chip material, the misuse of structure, defect, and chip whether there is Crackle, burn corrosion condition;It will observe the information such as the shape of failure site, size, size, structure, color in detail.Based on mirror Inspection analyzing and processing forms wrong reasons.
When analyzing automobile LED chip surface and having LED chip crackle, LED core is scanned based on SEM SEM Piece crackle, corrosion condition is burnt, be to utilize scanning electron microscope sem method by chip list for chip surface measuring shape common method The small convex-concave in face is transformed to electric signal, then signal is zoomed into figure shows record.Corruption can observe using scanning electron microscope sem Lose defect.Can also analysis chip surface relief state, epitaxial surface flatness, defect and the shape depth corroded.Heterojunction structure With epitaxial layer interface position, thickness, uniformity.Automobile LED chip failure material is formed based on SEM shaping results.
The purpose of pollutant component analysis is that failure site composition transfer is analyzed, and detection chip is manufactured and assembled The pollutant and ion residues thing adhered in journey, including chip and bonding pad material pollution, mutually molten, counterdiffusion, novel substance produce, are outer Carry out pollutant etc., its be mainly based upon pollutions of the SIMS analysis SIMS to LED chip surface failure fractions into Analyzed, obtain composition possessed by the pollutant and ion residues thing adhered to during chip manufacturing and equipment.Formed The corresponding automobile LED chip failure material of pollutant component analysis.
LED fractograph analysis is carried out to automobile LED chip, specifically included to lead and chip weld cavity, chip substrate Bond impurity diffusion and the analysis of internal injury crackle in crack, chip.Purpose is exposed device internal feature, further checking The chip internal detected of signing goes defect.Preparation method needs LED pouring into grinding, to grinding cut, be ground or Person grinds, afterwards by steps such as polishing, burn into dyeing, by the exposure of LED chip inner case to treat failure analysis.
The characteristics of for LED small sizes, need to pour into a mould LED before preparing section to make retained part, in order to grind Cut and make gripping element stable when grinding.General preparation method is placed on device in appropriate model, with mould material by its It is fixed on best orientation., it is necessary to control the temperature entirely poured into a mould when mould material, general control temperature at 80 ° extremely Between 100 °.The characteristic that the backing material of LED component is hard and crisp, golden and solder ductility is good, using Ginding process by LED devices Part is ground to position to be analyzed.Especially it is careful not to introduce new damage during grinding.Electron microprobe, electronics are utilized after grinding The analysis means such as microscope, metallographic microscope expand impurity in lead and chip weld, chip substrate bonding part and chip Dissipate and analyzed.
Ultimately form lead and chip weld cavity, chip substrate bonding crack above, in chip impurity diffusion and The analysis report of internal injury crackle.
After automobile LED chip is ground, residuals are left, it is necessary to handle residuals, analysis residual The correlation material analysis of material, the residuals after grinding are added in the impeller with deionized water and carried out Rotary-cleaning;Using purified water rotation immersion 6 to 8 hours, and carry out centrifugation and obtain the residuals after centrifugation;Based on drying Technology is dried the residuals after centrifugation, and residuals are analyzed based on X-ray energy spectrometer.It is mixed based on rotation Clutch and after realizing centrifugation, each material layering or relative under non-Centrifugal dispersion state, using X-ray energy spectrometer to automobile Each element in LED chip in residuals is analyzed, and analyzes element proportion and composition.
For the failure conditions analyzed in above procedure, complete examining report is formed, and output retains automatically, with This reaches the integrity detection process that whole automobile LED chip characterizes, and from outside to inside and realizes the analysis of overall composition, ensures Entirely failure analysis is comprehensive.
To sum up, it is possible to achieve the integrity analysis characterized to LED chip, the never characteristic features under the process of Kaifeng are divided Analysis, the failure detection being then transferred to again under opening status, the analysis of internal structure is carried out simultaneously for each failure state of LED chip Draw corresponding failure analysis result.Using fractograph analysis, targetedly for each internal injury crackle, impurity in LED chip Etc. realizing failure analysis, and centrifugal treating is carried out to residue, retain the element object that analysis is available for for SIMS, realize whole Comprehensive, the comprehensive analysis for realizing LED chip from inside to outside of failure detection.
One of ordinary skill in the art will appreciate that all or part of step in the various methods of above-described embodiment is can To instruct the hardware of correlation to complete by program, the program can be stored in computer-readable recording medium, and storage is situated between Matter can include:Read-only storage (ROM, Read Only Memory), random access memory (RAM, Random Access Memory), disk or CD etc..
The method that progress failure detection is characterized to LED chip provided above the embodiment of the present invention has carried out detailed Jie Continue, specific case used herein is set forth to the principle and embodiment of the present invention, and the explanation of above example is only It is the method and its core concept for being used to help understand the present invention;Meanwhile for those of ordinary skill in the art, according to this hair Bright thought, there will be changes in specific embodiments and applications, in summary, this specification content should not manage Solve as limitation of the present invention.

Claims (5)

1. a kind of characterize the method for carrying out failure detection to LED chip, it is characterised in that comprises the following steps:
The failure conditions not broken a seal in LED chip through epoxy resin lenses observation detection, the failure conditions are split including chip Line crack, chip pollutant, electrostatic damage;
After the LED chip that do not break a seal completes failure conditions detection, the LED chip that do not break a seal is broken a seal, and detection chip table Planar defect, bonding situation;
The split LED chip surface being honored as a queen passes through the composition of microscopy analysis chip surface microscopic, structure, state;
When analyzing LED chip surface and having LED chip crackle, burn corrosion condition, scanned based on SEM SEM LED chip crackle, corrosion condition is burnt, and based on failure site output shape, size, size, structure, colouring information;
The pollutant component of LED chip surface failure fractions is analyzed based on SIMS analysis SIMS, obtained Composition possessed by the pollutant and ion residues thing adhered to during chip manufacturing and equipment;
Fractograph analysis is carried out to LED chip, to impurity in lead and chip weld cavity, chip substrate bond crack, chip Diffusion and the analysis of internal injury crackle, are specifically included:
LED chip is placed in cast model, fixed LED chip with mould material;
LED component is ground to position to be analyzed using Ginding process;
Analysis position is treated to weld lead and chip using electron microprobe, electron microscope, metallographic microscope analysis means Impurity diffusion is analyzed in place, chip substrate bonding part and chip;
Residuals after grinding are added in the impeller with deionized water and carry out rotary-cleaning;
Using purified water rotation immersion 6 to 8 hours, and carry out centrifugation and obtain the residuals after centrifugation;
The residuals after centrifugation are being dried based on drying technology, and residuals carried out based on X-ray energy spectrometer Analysis.
2. the method for carrying out failure detection is characterized to LED chip as claimed in claim 1, it is characterised in that described to be based on sweeping Electron microscope SEM scannings LED chip crackle is retouched, corrosion condition is burnt and includes:
The convex-concave that LED chip surface is smiled is transformed to by electric signal by SEM, then converts the electrical signal to graphical display signal.
3. the method for carrying out failure detection is characterized to LED chip as claimed in claim 1, it is characterised in that the acquisition core Composition possessed by the pollutant and ion residues thing adhered to during piece manufacture and equipment includes:
Chip and bonding pad material pollution, mutual molten, counterdiffusion, novel substance generation, external contaminant.
4. the method for carrying out failure detection is characterized to LED chip as claimed in claim 1, it is characterised in that the use is ground LED component is ground to position to be analyzed by mill method to be included:
After LED chip pours into grinding, grinding is cut, be ground or ground, afterwards by polishing, burn into dyeing Step, position exposure is analysed to treat failure analysis.
5. the method for carrying out failure detection is characterized to LED chip as claimed in claim 1, it is characterised in that described by LED core Piece be placed on cast model in, with mould material by LED chip fix including:
Cast LED chip makes LED chip stable by retained part in grinding and grinding to make retained part.
CN201711141916.9A 2017-11-17 2017-11-17 It is a kind of that the method for carrying out failure detection is characterized to LED chip Pending CN107727663A (en)

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* Cited by examiner, † Cited by third party
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CN108508053A (en) * 2018-04-26 2018-09-07 武汉新芯集成电路制造有限公司 A kind of detection method of the atomic physical imperfection of systematicness
CN108535628A (en) * 2018-03-20 2018-09-14 力特半导体(无锡)有限公司 A kind of power semiconductor chip failure positioning method avoiding burn
CN109211928A (en) * 2018-08-31 2019-01-15 胜科纳米(苏州)有限公司 The detection method of chip surface film layer defect
CN109342915A (en) * 2018-08-29 2019-02-15 佛山市国星半导体技术有限公司 A kind of detection method for the LED chip that leaks electricity
CN110793909A (en) * 2019-10-16 2020-02-14 安徽芯瑞达科技股份有限公司 Method for accelerating resin crack test by LED
CN110931350A (en) * 2019-11-30 2020-03-27 闳康技术检测(上海)有限公司 Method for cleaning metal residues and stains on chip surface
CN112179919A (en) * 2020-09-27 2021-01-05 西安立芯光电科技有限公司 Semiconductor laser chip failure analysis method
CN113495122A (en) * 2020-04-07 2021-10-12 海太半导体(无锡)有限公司 Open circuit analysis method for flip product
CN114252402A (en) * 2021-12-21 2022-03-29 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) Analysis processing method for discoloration of solder mask of printed circuit board
CN114486926A (en) * 2021-12-30 2022-05-13 深圳瑞波光电子有限公司 Semiconductor laser chip failure analysis method
CN116572087A (en) * 2023-07-12 2023-08-11 日月新检测科技(苏州)有限公司 Method for grinding semiconductor packaging product

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CN108508053B (en) * 2018-04-26 2021-01-12 武汉新芯集成电路制造有限公司 Method for detecting systematic infinitesimal physical defects
CN108508053A (en) * 2018-04-26 2018-09-07 武汉新芯集成电路制造有限公司 A kind of detection method of the atomic physical imperfection of systematicness
CN109342915A (en) * 2018-08-29 2019-02-15 佛山市国星半导体技术有限公司 A kind of detection method for the LED chip that leaks electricity
CN109211928A (en) * 2018-08-31 2019-01-15 胜科纳米(苏州)有限公司 The detection method of chip surface film layer defect
CN110793909B (en) * 2019-10-16 2022-04-12 安徽芯瑞达科技股份有限公司 Method for accelerating resin crack test by LED
CN110793909A (en) * 2019-10-16 2020-02-14 安徽芯瑞达科技股份有限公司 Method for accelerating resin crack test by LED
CN110931350A (en) * 2019-11-30 2020-03-27 闳康技术检测(上海)有限公司 Method for cleaning metal residues and stains on chip surface
CN110931350B (en) * 2019-11-30 2024-05-14 闳康技术检测(上海)有限公司 Method for cleaning metal residue and contamination on chip surface
CN113495122A (en) * 2020-04-07 2021-10-12 海太半导体(无锡)有限公司 Open circuit analysis method for flip product
CN112179919B (en) * 2020-09-27 2023-11-10 西安立芯光电科技有限公司 Failure analysis method for semiconductor laser chip
CN112179919A (en) * 2020-09-27 2021-01-05 西安立芯光电科技有限公司 Semiconductor laser chip failure analysis method
CN114252402A (en) * 2021-12-21 2022-03-29 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) Analysis processing method for discoloration of solder mask of printed circuit board
CN114252402B (en) * 2021-12-21 2024-01-26 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) Analysis processing method for discoloration of solder mask of printed circuit board
CN114486926A (en) * 2021-12-30 2022-05-13 深圳瑞波光电子有限公司 Semiconductor laser chip failure analysis method
CN114486926B (en) * 2021-12-30 2024-03-26 深圳瑞波光电子有限公司 Failure analysis method for semiconductor laser chip
CN116572087A (en) * 2023-07-12 2023-08-11 日月新检测科技(苏州)有限公司 Method for grinding semiconductor packaging product

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Application publication date: 20180223