CN107685284A - A kind of method of optics uniform grinding - Google Patents
A kind of method of optics uniform grinding Download PDFInfo
- Publication number
- CN107685284A CN107685284A CN201710923679.5A CN201710923679A CN107685284A CN 107685284 A CN107685284 A CN 107685284A CN 201710923679 A CN201710923679 A CN 201710923679A CN 107685284 A CN107685284 A CN 107685284A
- Authority
- CN
- China
- Prior art keywords
- star wheel
- erratic star
- processing cavity
- optics
- ball
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The present invention relates to optics uniform grinding method, its step is：S1, erratic star wheel is put into polishing machine；S2, optics is put into processing cavity, the processing cavity is located in the polishing hole of erratic star wheel, and processing cavity can freely rotate relative to polishing hole；S3, start to polish, erratic star wheel rotates with polishing machine driving wheel and has rotational velocity w1, and processing cavity rotates with erratic star wheel and optics and has rotational velocity w2, the w1 ≠ w2.Technical scheme makes the abrasion path that optics each several part is passed through in bruting process essentially identical.
Description
Technical field
The present invention relates to a kind of technique for grinding, particularly a kind of method of optics uniform grinding.
Background technology
It is to influence final product quality extremely by the uniformity of optics polishing and planarization during optics polishes
Important parameter is closed, when existing erratic star wheel polishes in polishing machine, because optics can together rotate with erratic star wheel, therefore
The angle that optics is in periphery can pass through longer abrasion path, so as to which same optics flatness after grinding occur
Situation about differing i.e. turned-down edge, in this case the uniformity of product can not also ensure.
The content of the invention
The technical problems to be solved by the invention are to provide and a kind of can made to polish by the method for optics uniform grinding
The abrasion path that optics each several part is passed through in journey is essentially identical.
Technical scheme is used by the present invention solves above-mentioned technical problem：
A kind of erratic star wheel of uniform grinding, circular polishing hole is offered inside the erratic star wheel, and the polishing hole is being polished
During around erratic star wheel central rotation, be provided with processing cavity in the polishing hole, the processing cavity is rotatably connected erratic star wheel, institute
State the coefficient of friction that the coefficient of friction between processing cavity and erratic star wheel is less than between processing cavity and workpiece to be added.
Further, annular raceway is offered in the erratic star wheel, ball is provided with the raceway, the processing cavity connects
Connect ball and do not contacted with erratic star wheel.
Further, connected between the processing cavity and ball by elastic component.
Further, the distance between the processing cavity and ball is equal to the natural length of elastic component.
Preferably, the quantity of the ball is three or four and spaced set.
Preferably, the erratic star wheel contacts connection with processing cavity, lubricating layer is provided between the two.
Method is used by the present invention solves above-mentioned technical problem：
A kind of method of optics uniform grinding, its step are：
S1, erratic star wheel is put into polishing machine；
S2, optics is put into processing cavity, the processing cavity is located in the polishing hole of erratic star wheel, and processing cavity relative can be beaten
Grinding out freely rotates；
S3, start to polish, erratic star wheel rotates with polishing machine driving wheel and has rotational velocity w1, processing cavity with erratic star wheel and
Optics rotates and has rotational velocity w2, the w1 ≠ w2.
Further, the w1<w2.
Preferably, erratic star wheel offers annular raceway in the step S2, ball is provided with the raceway, it is described to add
Work chamber connects ball and not contacted with erratic star wheel, is connected between the processing cavity and ball by elastic component；Add in the step S3
The center of the relative erratic star wheel of work chamber meeting shifts.
The present invention compared with the existing technology has advantages below and effect：Due to setting rotatable add inside erratic star wheel
Work chamber, optics produce change relative to the rotational velocity of erratic star wheel, so as to which optics is relative to the travel path of mill
Changing always, eliminating the phenomenon of turned-down edge.The cooperation requirement of processing cavity and erratic star wheel is reduced by the connection design of ball,
The addition of elastic component further reduces cooperation difficulty, and processing cavity is designed to the non-circular processing beneficial to processing cavity,
Also due to unbalance stress makes processing cavity be shifted with respect to the center of erratic star wheel in bruting process, so as to further change light
Learn the abrasion path of device.Simultaneously by selecting suitable elastic component and ball quantity, ensure that between ball and erratic star wheel compared with
Small coefficient of friction, and in processing stability will not make certain elastic component stress excessive well so as to increase ball and erratic star wheel it
Between frictional force.The cooperation difficulty of processing cavity and erratic star wheel can also be reduced by way of lubricating layer is set in addition.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is the structural representation of the present invention.
Fig. 2 is the enlarged drawing that embodiment 1 processes cavity segment.
Fig. 3 is the enlarged drawing that embodiment 2 processes cavity segment.
Label declaration
The polishing processing cavity 2 of hole 11 of erratic star wheel 1
The station 4 of 3 elastic component of ball 31
Embodiment
With reference to embodiment, the present invention is described in further detail, following examples be explanation of the invention and
The invention is not limited in following examples.
Embodiment 1：
As shown in figure 1, the present embodiment is made up of erratic star wheel 1 and processing cavity 2, polishing hole 11, polishing are offered on erratic star wheel 1
Hole 11 is in bruting process around the central rotation of erratic star wheel 1.Fig. 2 is the cooperation schematic diagram of erratic star wheel 1 and processing cavity 2, wherein wandering star
The annular raceway coordinated with ball 3 is offered on wheel 1, the other end of ball 3 is arranged in the notch that processing cavity 2 opens up (same
Annular raceway can also be arranged to), and not in contact with offering rectangle work in processing cavity 2 between erratic star wheel 1 and processing cavity 2
Position 4, when contemporary workpiece is put into station polishing, erratic star wheel 1 rotates with the driving gear of polishing machine, due to for workpiece and mill
Between exist and prevent frictional force from workpiece to the rotation direction of erratic star wheel 1 that rotated for, and the frictional force between processing cavity 2 and erratic star wheel 1
It is less than above-mentioned frictional force again, so it is slower relative to the rotational velocity of erratic star wheel 1 for workpiece, send out the abrasion path at each position
Changing.
Specifically procedure of processing is：
S1, erratic star wheel is put into polishing machine；
S2, optics is put into processing cavity, the processing cavity is located in the polishing hole of erratic star wheel, and processing cavity relative can be beaten
Grinding out freely rotates；
S3, start to polish, erratic star wheel rotates with polishing machine driving wheel and has rotational velocity w1, processing cavity with erratic star wheel and
Optics rotates and has rotational velocity w2, due to lapping apparatus and for the frictional force that acting in opposition between workpiece be present,
So that w1<w2.
Embodiment 2：
As described in Figure 3, the present embodiment is substantially the same manner as Example 1, and difference is to pass through elasticity between processing cavity 2 and ball 3
Part 31 connects, and wherein the natural length of elastic component 31 is equal to interval between processing cavity 2 and ball 3, so as to reduce processing cavity 2 with
Cooperation requirement between ball 3.When starting polishing, because unbalance stress makes processing cavity be shifted with respect to the center of erratic star wheel,
So that shifted for workpiece in the position of different parts so as to be ground on different paths.
Embodiment 3：
As shown in figure 1, erratic star wheel 1 directly contacts with processing cavity 2, lubricating layer is provided between the two, and lubricating layer can be alcohol
Acid resin, epoxy resin or acrylic resin, a little less than 5% metal oxide can also be added in above material to increase
Add wearability.
Furthermore, it is necessary to illustrate, the specific embodiment described in this specification, the shape of its parts and components, it is named
Title etc. can be different.The equivalent or simple change that all construction, feature and principles according to described in inventional idea of the present invention are done, is wrapped
Include in the protection domain of patent of the present invention.Those skilled in the art can be to described specific implementation
Example is made various modifications or supplement or substituted using similar mode, structure without departing from the present invention or surmounts this
Scope as defined in the claims, protection scope of the present invention all should be belonged to.
Claims (3)
1. a kind of method of optics uniform grinding, its step are：
S1, erratic star wheel is put into polishing machine；
S2, optics is put into processing cavity, the processing cavity is located in the polishing hole of erratic star wheel, and processing cavity can relative polishing hole
Freely rotate；
S3, start to polish, erratic star wheel rotates with polishing machine driving wheel and has rotational velocity w1, and processing cavity is with erratic star wheel and optics
Device rotates and has rotational velocity w2, the w1 ≠ w2.
2. the method for optics uniform grinding according to claim 1, it is characterised in that：The w1<w2.
3. the method for optics uniform grinding according to claim 2, it is characterised in that：Erratic star wheel in the step S2
Annular raceway is offered, ball is provided with the raceway, the processing cavity connects ball and do not contacted with erratic star wheel, described to add
Connected between work chamber and ball by elastic component；The center of the relative erratic star wheel of processing cavity meeting shifts in the step S3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710923679.5A CN107685284B (en) | 2017-09-30 | 2017-09-30 | Method for uniformly polishing optical device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710923679.5A CN107685284B (en) | 2017-09-30 | 2017-09-30 | Method for uniformly polishing optical device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107685284A true CN107685284A (en) | 2018-02-13 |
| CN107685284B CN107685284B (en) | 2020-05-01 |
Family
ID=61154193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710923679.5A Active CN107685284B (en) | 2017-09-30 | 2017-09-30 | Method for uniformly polishing optical device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107685284B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107553315A (en) * | 2017-09-30 | 2018-01-09 | 德清晶生光电科技有限公司 | A kind of method of optics uniform grinding |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1037262A2 (en) * | 1999-03-15 | 2000-09-20 | Mitsubishi Materials Corporation | Wafer transfer apparatus and wafer polishing apparatus, and method for manufacturing wafer |
| CN2584349Y (en) * | 2002-11-21 | 2003-11-05 | 洛阳轴研科技股份有限公司 | Electromagnetic coreless holder for high-precision rolling bearing grinding |
| JP2010040604A (en) * | 2008-07-31 | 2010-02-18 | Tokyo Seimitsu Co Ltd | Wafer rotation stabilization mechanism in wafer polishing device |
| CN102975114A (en) * | 2012-12-06 | 2013-03-20 | 江苏吉星新材料有限公司 | Wandering star wheel |
| CN105014517A (en) * | 2015-07-24 | 2015-11-04 | 常州博美新材料科技有限公司 | Centrifugal polishing machine |
| CN205021414U (en) * | 2015-10-13 | 2016-02-10 | 中恒日上(江苏)新能源股份有限公司 | Car parts production is with high stability wandering star wheel |
| CN205147994U (en) * | 2014-12-30 | 2016-04-13 | 东莞市兰光光学科技有限公司 | Be used for flexible mirror lens precision grinding device |
| CN205415202U (en) * | 2016-03-17 | 2016-08-03 | 苏州久晶光电科技有限公司 | Ultra -thin lens processing tool |
| JP2017144531A (en) * | 2016-02-19 | 2017-08-24 | 株式会社島津製作所 | Carrier plate and single-side polishing device using the same |
| CN107553315A (en) * | 2017-09-30 | 2018-01-09 | 德清晶生光电科技有限公司 | A kind of method of optics uniform grinding |
-
2017
- 2017-09-30 CN CN201710923679.5A patent/CN107685284B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1037262A2 (en) * | 1999-03-15 | 2000-09-20 | Mitsubishi Materials Corporation | Wafer transfer apparatus and wafer polishing apparatus, and method for manufacturing wafer |
| CN2584349Y (en) * | 2002-11-21 | 2003-11-05 | 洛阳轴研科技股份有限公司 | Electromagnetic coreless holder for high-precision rolling bearing grinding |
| JP2010040604A (en) * | 2008-07-31 | 2010-02-18 | Tokyo Seimitsu Co Ltd | Wafer rotation stabilization mechanism in wafer polishing device |
| CN102975114A (en) * | 2012-12-06 | 2013-03-20 | 江苏吉星新材料有限公司 | Wandering star wheel |
| CN205147994U (en) * | 2014-12-30 | 2016-04-13 | 东莞市兰光光学科技有限公司 | Be used for flexible mirror lens precision grinding device |
| CN105014517A (en) * | 2015-07-24 | 2015-11-04 | 常州博美新材料科技有限公司 | Centrifugal polishing machine |
| CN205021414U (en) * | 2015-10-13 | 2016-02-10 | 中恒日上(江苏)新能源股份有限公司 | Car parts production is with high stability wandering star wheel |
| JP2017144531A (en) * | 2016-02-19 | 2017-08-24 | 株式会社島津製作所 | Carrier plate and single-side polishing device using the same |
| CN205415202U (en) * | 2016-03-17 | 2016-08-03 | 苏州久晶光电科技有限公司 | Ultra -thin lens processing tool |
| CN107553315A (en) * | 2017-09-30 | 2018-01-09 | 德清晶生光电科技有限公司 | A kind of method of optics uniform grinding |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107553315A (en) * | 2017-09-30 | 2018-01-09 | 德清晶生光电科技有限公司 | A kind of method of optics uniform grinding |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107685284B (en) | 2020-05-01 |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210210 Address after: 317000 Funan West Road, Dunan Avenue, Duqiao Town, Linhai City, Taizhou City, Zhejiang Province Patentee after: Taizhou Zhengda optics Co.,Ltd. Address before: 313200 No.6, Yidong Road, Qianyuan Town, Deqing County, Huzhou City, Zhejiang Province Patentee before: CRYSTAL OPTOELECTRONIC TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A Method for Uniform Grinding of Optical Devices Effective date of registration: 20230414 Granted publication date: 20200501 Pledgee: Industrial and Commercial Bank of China Limited Linhai Branch Pledgor: Taizhou Zhengda optics Co.,Ltd. Registration number: Y2023330000767 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right |